JPH0325123Y2 - - Google Patents
Info
- Publication number
- JPH0325123Y2 JPH0325123Y2 JP9723383U JP9723383U JPH0325123Y2 JP H0325123 Y2 JPH0325123 Y2 JP H0325123Y2 JP 9723383 U JP9723383 U JP 9723383U JP 9723383 U JP9723383 U JP 9723383U JP H0325123 Y2 JPH0325123 Y2 JP H0325123Y2
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- film
- laser
- light
- monitoring device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000012806 monitoring device Methods 0.000 claims description 11
- 239000010408 film Substances 0.000 description 21
- 239000010409 thin film Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 238000005336 cracking Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Description
【考案の詳細な説明】
本考案はレーザ光を利用する膜厚モニタ装置に
関する。[Detailed Description of the Invention] The present invention relates to a film thickness monitoring device that uses laser light.
真空蒸着、スパツタリング光学蒸着等の薄膜成
長装置において、レーザ光の干渉を利用する膜厚
モニタ装置が実用化されている。これは、薄膜が
成長するにしたがい、レーザ光は干渉により周期
的に強弱を示し、その周期から次式を使用して薄
膜の厚さを測定する装置である。 2. Description of the Related Art Film thickness monitoring devices that utilize laser light interference have been put into practical use in thin film growth devices such as vacuum evaporation and sputtering optical evaporation. In this device, as the thin film grows, the laser light periodically exhibits strength and weakness due to interference, and the thickness of the thin film is measured from the period using the following equation.
ここで、Δdは周期当りの膜厚、nは屈折率、
λはレーザ光の波長、θは入射角である。 Here, Δd is the film thickness per period, n is the refractive index,
λ is the wavelength of the laser beam, and θ is the angle of incidence.
この装置は、単に膜厚の監視を行なうだけなら
ば、十分に使用できる。しかしながら、通常使用
される小型He−Neレーザ装置の出力強度の不安
定性の故に、膜質(表面荒れ、ひびの発生)に関
する情報までも得ることはできない。そこで本出
願人は、レーザ装置の出力強度の不安定性を信号
光強度を参照光強度で割り算することによりなく
し、成膜中の表面荒れ、ひびの発生等による干渉
光の減少を観測する膜質膜厚を同時に監視するこ
とができる装置を前に出願した。しかしながら、
第1図に示されるような一般的な成膜装置におい
ては、信号光(干渉光)はベルジヤ内部の光学系
によつて外部に取り出されることが多い。第1図
中、1は真空ベルジヤ、2は形成中の薄膜、3は
蒸発物、4,5は反射鏡、6は窓、7はHe−Ne
レーザ装置、8は参照光を検出するための光検出
器、9はその出力を増幅する差動増幅回路、10
は信号光を検出するための光検出器、11はその
出力を増幅する差動増幅回路、12は差動増幅回
路11の出力を差動増幅回路9の出力で割算する
割算回路12,13は割算回路12の出力を記録
する記録器である。 This device can be used satisfactorily for simply monitoring film thickness. However, due to the instability of the output intensity of commonly used small He-Ne laser devices, it is not possible to obtain even information regarding film quality (surface roughness, crack formation). Therefore, the present applicant has developed a film film that eliminates the instability of the output intensity of the laser device by dividing the signal light intensity by the reference light intensity, and observes the decrease in interference light due to surface roughness, cracks, etc. during film formation. Previous applications have been made for devices that can simultaneously monitor thickness. however,
In a typical film forming apparatus as shown in FIG. 1, signal light (interference light) is often extracted to the outside by an optical system inside the bell gear. In Figure 1, 1 is a vacuum bell gear, 2 is a thin film being formed, 3 is an evaporated material, 4 and 5 are reflecting mirrors, 6 is a window, and 7 is He-Ne
a laser device, 8 a photodetector for detecting reference light, 9 a differential amplifier circuit for amplifying its output, 10
11 is a differential amplifier circuit for amplifying the output of the photodetector for detecting signal light; 12 is a division circuit 12 for dividing the output of the differential amplifier circuit 11 by the output of the differential amplifier circuit 9; 13 is a recorder for recording the output of the divider circuit 12;
図示の装置において、信号光は反射鏡によつて
何回か反射されるから、無偏光で入射されたレー
ザ光は偏光され出力してくる。一方参照光はほぼ
無偏光のままである。しかるにレーザー装置のビ
ーム出力を一定に保持したとしても、その単一の
偏光成分についてみると、ある程度の「揺ぎ」が
発生しており、この揺ぎによる変動を補正するた
めに上記従来の装置では参照光強度で信号光強度
を割算する訳である。しかし参照光は無偏光、即
ち複数の偏光成分を含んでいるので、各成分の揺
ぎは互いに相殺されてしまい時間的にはほとんど
変動しない。従つて第1図の構成では上記割算は
正確に行われず、信号光の揺ぎは補正できない。 In the illustrated device, the signal light is reflected several times by the reflecting mirror, so that the laser light incident without polarization is polarized and output. On the other hand, the reference light remains almost unpolarized. However, even if the beam output of the laser device is held constant, a certain amount of "fluctuation" occurs when looking at the single polarization component, and in order to compensate for the fluctuations caused by this fluctuation, the conventional device described above Then, the signal light intensity is divided by the reference light intensity. However, since the reference light is unpolarized light, that is, it contains a plurality of polarized light components, the fluctuations of each component cancel each other out and hardly change over time. Therefore, in the configuration shown in FIG. 1, the above division is not performed accurately, and fluctuations in the signal light cannot be corrected.
本考案の目的は、したがつて、レーザ発生装置
から放射されるビームを二つに分け、一方を参照
光とし、他方を信号光とし、形成中の膜によつて
反射された信号光の強度を参照光の強度で割算し
て得られる商から膜厚を検出する膜厚モニタ装置
であつて、上記割算が正確に行なわれ、表面荒れ
やひびの発生等に関する膜質情報までも得ること
を可能にする膜厚モニタ装置を提供することであ
る。 Therefore, the purpose of the present invention is to divide the beam emitted from the laser generator into two parts, use one as a reference beam and the other as a signal beam, and increase the intensity of the signal beam reflected by the film being formed. Provided is a film thickness monitoring device that detects film thickness from the quotient obtained by dividing by the intensity of a reference light, in which the above division is performed accurately and information on film quality regarding surface roughness, cracking, etc. can also be obtained. An object of the present invention is to provide a film thickness monitoring device that enables the following.
上記目的を達成するために、本考案による膜厚
モニタ装置はレーザ発生装置のビームの出口に直
線偏光板を有することを要旨とする。 In order to achieve the above object, the film thickness monitoring device according to the present invention has a linear polarizing plate at the beam exit of the laser generator.
以下に、図面を参照しながら、実施例を用いて
本考案を一層詳細に説明するが、それらは例示に
過ぎず、本考案の枠を越えることなしにいろいろ
な変形や改良があり得ることは勿論である。 Hereinafter, the present invention will be explained in more detail using examples with reference to the drawings, but these are merely illustrative and it is understood that various modifications and improvements may be made without going beyond the scope of the present invention. Of course.
第2図は本考案による膜厚モニタ装置の構成を
示すブロツク図で、図中第1図と共通する引用番
号は第1図におけるものと同じ部分を表わし、1
4は直線偏光板である。 FIG. 2 is a block diagram showing the configuration of the film thickness monitoring device according to the present invention. Reference numbers common to those in FIG. 1 in the figure represent the same parts as in FIG.
4 is a linear polarizing plate.
一般に無偏光レーザ光はベルジヤ内部の反射鏡
によつて反射されると単一直線偏光レーザ光とな
る。したがつて、レーザ発生装置7の出口に設け
られた直線偏光板14を使つて出力レーザ光をそ
の装置の光学系(反射鏡の組合せ)にかなつた直
線偏光レーザ光に前もつて変換しておくことによ
り、信号光と参照光が同一時間変動をもつことに
なり、正確な割算が可能となり、形成中の膜の膜
厚だけではなく、膜質も監視することができる。 Generally, unpolarized laser light becomes a single linearly polarized laser light when reflected by a reflecting mirror inside the bell gear. Therefore, a linearly polarizing plate 14 provided at the exit of the laser generator 7 is used to convert the output laser beam into a linearly polarized laser beam that matches the optical system (combination of reflecting mirrors) of the device. By doing so, the signal light and the reference light have the same time fluctuation, allowing accurate division, and making it possible to monitor not only the thickness of the film being formed, but also the quality of the film.
出力が安定した直線偏光レーザ装置を使用すれ
ば、レーザ光の出力不安定性による割算回路およ
び直線偏光板の必要性はなくなるが、このような
装置は非常に高価である。本考案による膜厚モニ
タ装置を用いることにより、可成り安価にこれと
同等の性能を得ることができる。 Using a linearly polarized laser device with stable output eliminates the need for a divider circuit and a linear polarizer due to the instability of the output of the laser light, but such a device is very expensive. By using the film thickness monitoring device according to the present invention, performance equivalent to this can be obtained at a considerably lower cost.
第1図は従来の膜厚モニタ装置の構成を示すブ
ロツク図、第2図は本考案による膜厚モニタ装置
の構成を示すブロツク図である。
1……真空ベルジヤ、2……形成中の薄膜、3
……蒸発物、4,5……反射鏡、6……窓、7…
…He−Neレーザ装置、8,10……光検出器、
9,11……差動増幅回路、12……割算回路、
13……記録器、14……偏光板。
FIG. 1 is a block diagram showing the structure of a conventional film thickness monitoring device, and FIG. 2 is a block diagram showing the structure of a film thickness monitoring device according to the present invention. 1... Vacuum bell gear, 2... Thin film being formed, 3
...evaporated matter, 4,5...reflector, 6...window, 7...
...He-Ne laser device, 8,10...photodetector,
9, 11...differential amplifier circuit, 12...divider circuit,
13...Recorder, 14...Polarizing plate.
Claims (1)
分け、一方を参照光とし、他方を信号光とし、形
成中の膜によつて反射された信号光の強度を参照
光の強度で割算して得られる商から膜厚を検出す
る膜厚モニタ装置において、上記レーザ発生装置
のビームの出口に直線偏光板を有することを特徴
とする膜厚モニタ装置。 The beam emitted from the laser generator is divided into two, one is used as a reference beam and the other is used as a signal beam, and the intensity of the signal beam reflected by the film being formed is divided by the intensity of the reference beam. A film thickness monitoring device for detecting film thickness from the obtained quotient, characterized in that the film thickness monitoring device has a linear polarizing plate at the exit of the beam of the laser generator.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9723383U JPS604905U (en) | 1983-06-23 | 1983-06-23 | Film thickness monitor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9723383U JPS604905U (en) | 1983-06-23 | 1983-06-23 | Film thickness monitor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS604905U JPS604905U (en) | 1985-01-14 |
JPH0325123Y2 true JPH0325123Y2 (en) | 1991-05-31 |
Family
ID=30231377
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9723383U Granted JPS604905U (en) | 1983-06-23 | 1983-06-23 | Film thickness monitor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS604905U (en) |
-
1983
- 1983-06-23 JP JP9723383U patent/JPS604905U/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS604905U (en) | 1985-01-14 |
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