JPH03244121A - Vertical type furnace - Google Patents
Vertical type furnaceInfo
- Publication number
- JPH03244121A JPH03244121A JP4217990A JP4217990A JPH03244121A JP H03244121 A JPH03244121 A JP H03244121A JP 4217990 A JP4217990 A JP 4217990A JP 4217990 A JP4217990 A JP 4217990A JP H03244121 A JPH03244121 A JP H03244121A
- Authority
- JP
- Japan
- Prior art keywords
- cassette
- cassettes
- rack
- transfer
- buffer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000032258 transport Effects 0.000 claims description 9
- 230000007723 transport mechanism Effects 0.000 claims description 6
- 235000012431 wafers Nutrition 0.000 abstract description 18
- 230000007246 mechanism Effects 0.000 abstract description 3
- 238000000034 method Methods 0.000 abstract description 2
- 238000011084 recovery Methods 0.000 abstract 2
- 230000008030 elimination Effects 0.000 abstract 1
- 238000003379 elimination reaction Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体製造装置における縦型炉に係り、特に縦
型炉と外部のカセット搬送ロボットとの間で行われるカ
セットの搬送を効率よく行うことができる縦型炉に関す
る。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a vertical furnace in semiconductor manufacturing equipment, and particularly to a method for efficiently transporting cassettes between the vertical furnace and an external cassette transport robot. Regarding vertical furnaces that can be used.
従来の縦型炉では、1つの炉体内に1バッチ分のカセッ
トしか収容できないカセット棚が設けられている構造で
あるため、カセット内のウェハの処理終了後炉体外部へ
カセットを搬出し、その後次のロフト分のカセットを炉
体外部から炉体内のカセット棚へ搬入する必要がある。Conventional vertical furnaces have a structure in which a cassette shelf that can accommodate only one batch of cassettes is provided in one furnace body, so after the wafers in the cassettes have been processed, the cassettes are transported outside the furnace body and then It is necessary to carry the cassettes for the next loft from outside the furnace body to the cassette shelf inside the furnace body.
近年ファクトリオートメーション化により、カセット棚
へのカセットの搬入、搬出はカセット搬送ロボット等に
より行われているが、カセット搬送ロボット等によりカ
セットの搬送速度に制限があるため、多くの半導体製造
装置のあるクリーンルームで効率良く装置を稼働させる
には、多くのカセット搬送ロボットが必要であるととも
に、装置外に設けられカセットを収納するカセットスト
ッカの台数が多くなりあるいはカセットストッカの容量
が大きくなるという課題がある。In recent years, due to factory automation, the loading and unloading of cassettes into and out of cassette shelves has been carried out by cassette transport robots, etc. However, due to limitations on the speed at which cassettes can be transported by cassette transport robots, etc., clean rooms with many semiconductor manufacturing equipment In order to efficiently operate the device, a large number of cassette transport robots are required, and there are also problems in that the number of cassette stockers installed outside the device for storing cassettes increases or the capacity of the cassette stocker increases.
本発明縦型炉は上記の課題を解決するため、図示のよう
に炉体l内にウェハ搬送用のカセットを収納する移動カ
セット棚3と一時的に次のバッチ分等のカセットを収納
するバッファカセット棚2と、炉体外部及び前記2つの
棚2.3の間でカセット搬送を行うカセット搬送機構4
を設けてなる構成としたものである。In order to solve the above-mentioned problems, the vertical furnace of the present invention has a movable cassette shelf 3 for storing cassettes for transporting wafers in the furnace body l and a buffer for temporarily storing cassettes for the next batch, etc., as shown in the figure. A cassette transport mechanism 4 that transports cassettes between the cassette shelf 2, the outside of the furnace body, and the two shelves 2.3.
This is a configuration in which the following is provided.
本発明縦型炉はこのような構成であるから、移動カセッ
ト棚3側のカセット内のウェハを処理している間に、カ
セット搬送機構4により次バッチのカセットをバッファ
カセット棚2内の一部に収納しておく。処理終了時には
処理済みウェハの入ったカセットをバッファカセット棚
2内の他の部分に搬送し、次バッチ用カセットをバッフ
ァカセット棚2内より移動カセット棚3内に搬送後、ウ
ェハの処理を行う。この間にカセットの回収、供給をカ
セット搬送機構4により行うことで、装置のウェハカセ
ットの回収、供給待ちをなくすことができる。Since the vertical furnace of the present invention has such a configuration, while the wafers in the cassettes on the movable cassette shelf 3 are being processed, the cassette transfer mechanism 4 transfers the next batch of cassettes to a part of the buffer cassette shelf 2. Store it in. At the end of processing, the cassette containing the processed wafer is transported to another part of the buffer cassette shelf 2, and the cassette for the next batch is transported from the buffer cassette shelf 2 to the movable cassette shelf 3, after which the wafers are processed. By using the cassette transport mechanism 4 to collect and supply cassettes during this time, it is possible to eliminate the need for the apparatus to wait for collection and supply of wafer cassettes.
以下図面により本発明の詳細な説明する。 The present invention will be explained in detail below with reference to the drawings.
図面は本発明縦型炉の一実施例の構成を示す説明用斜視
図で、この実施例は炉体l内にウェハ搬送用のカセット
を左右方向に移動可能な移動カセット棚3と、一時的に
次のバッチ分等のカセットを収納する固定されたバッフ
ァカセット棚2と、炉体外部及び前記2つの棚2.3の
間でカセット搬送を行うカセット搬送ロボット4を設け
てなる。The drawing is an explanatory perspective view showing the configuration of an embodiment of the vertical furnace of the present invention. This embodiment includes a movable cassette shelf 3 that can move cassettes for wafer transfer in the left and right direction in the furnace body l, and a temporary A fixed buffer cassette shelf 2 for storing cassettes for the next batch, etc., and a cassette transport robot 4 for transporting cassettes between the outside of the furnace body and the two shelves 2.3 are provided.
本実施例は上記のような構成であるから、移動カセット
棚3側のカセット内のウェハを処理している間に、カセ
ット搬送ロボット4により次バッチのカセットをバッフ
ァカセット棚2内の一部に収納しておく。処理終了時に
は処理済みウェハの入ったカセットをバッファカセット
棚2内の他の部分に搬送し、次バッチ用カセットをバッ
ファカセット棚2内より移動カセット棚3内に搬送後、
ウェハの処理を行う。この間にカセットの回収供給をカ
セット搬送ロボット4により行うことで、装置のウェハ
カセットの回収、供給待ちをなくすことができる。Since this embodiment has the above-described configuration, while the wafers in the cassettes on the movable cassette shelf 3 side are being processed, the cassette transfer robot 4 transfers the next batch of cassettes to a part of the buffer cassette shelf 2. Store it away. At the end of processing, the cassette containing the processed wafers is transported to another part of the buffer cassette shelf 2, and the cassette for the next batch is transported from the buffer cassette shelf 2 to the moving cassette shelf 3.
Performs wafer processing. By having the cassette transfer robot 4 collect and supply cassettes during this time, it is possible to eliminate the need for the apparatus to wait for collection and supply of wafer cassettes.
上述のように本発明によれば、炉体1内にウェハ搬送用
のカセットを収納する移動カセット棚3と一時的に次の
バッチ分等のカセットを収納するバッファカセット棚2
と、炉体外部及び前記2つの棚2,3の間でカセット搬
送を行うカセット搬送機構4を設けてなる構成としたの
で、外部のカセット搬送ロボットの台数を増大すること
なく、装置のカセット回収、供給待ちによる休止時間を
なくすことが可能となり、装置の稼働率を向上すること
ができる。As described above, according to the present invention, the furnace body 1 includes a movable cassette shelf 3 that stores cassettes for transporting wafers and a buffer cassette shelf 2 that temporarily stores cassettes for the next batch, etc.
Since the structure includes a cassette transport mechanism 4 that transports cassettes between the outside of the furnace body and between the two shelves 2 and 3, the cassette collection of the device can be easily performed without increasing the number of external cassette transport robots. , it becomes possible to eliminate downtime due to waiting for supply, and it is possible to improve the operating rate of the device.
またカセット搬送機構4の台数及び装置外に設置すべき
カセットストッカの台数あるいはその容量が少なくて済
むので、それだけコストを低減でき、運用上のソフトウ
ェアの開発も容易となり、ファクトリオートメーション
化を容易に遠戚することができる。In addition, since the number of cassette transport mechanisms 4 and the number or capacity of cassette stockers to be installed outside the device can be reduced, costs can be reduced accordingly, operational software can be easily developed, and factory automation can be easily achieved. can be related.
図面は本発明縦型炉の一実施例の構成を示す説明用斜視
図である。
1・・・・・・炉体、2・・・・・・バッファカセット
棚、3・・・・・・移動カセット棚、4・・・・・・カ
セット搬送機構(ロボット)。The drawing is an explanatory perspective view showing the configuration of an embodiment of the vertical furnace of the present invention. 1... Furnace body, 2... Buffer cassette shelf, 3... Moving cassette shelf, 4... Cassette transport mechanism (robot).
Claims (1)
カセット棚(3)と一時的に次のバッチ分等のカセット
を収納するバッファカセット棚(2)と、炉体外部及び
前記2つの棚(2、3)の間でカセット搬送を行うカセ
ット搬送機構(4)を設けてなる縦型炉。A movable cassette shelf (3) that stores cassettes for wafer transfer inside the furnace body (1), a buffer cassette shelf (2) that temporarily stores cassettes for the next batch, etc. A vertical furnace equipped with a cassette transport mechanism (4) that transports cassettes between shelves (2, 3).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2042179A JPH0797564B2 (en) | 1990-02-21 | 1990-02-21 | Vertical semiconductor manufacturing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2042179A JPH0797564B2 (en) | 1990-02-21 | 1990-02-21 | Vertical semiconductor manufacturing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03244121A true JPH03244121A (en) | 1991-10-30 |
JPH0797564B2 JPH0797564B2 (en) | 1995-10-18 |
Family
ID=12628764
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2042179A Expired - Lifetime JPH0797564B2 (en) | 1990-02-21 | 1990-02-21 | Vertical semiconductor manufacturing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0797564B2 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5464313A (en) * | 1993-02-08 | 1995-11-07 | Tokyo Electron Kabushiki Kaisha | Heat treating apparatus |
US5822498A (en) * | 1995-06-22 | 1998-10-13 | Tokyo Electron Limited | Teaching method for loading arm for objects to be processed |
WO1999002436A1 (en) * | 1997-07-11 | 1999-01-21 | Asyst Technologies, Inc. | Smif pod storage, delivery and retrieval system |
JP2000138283A (en) * | 1998-08-28 | 2000-05-16 | Tadahiro Omi | Wafer stocker having wafer replacing function |
US6283692B1 (en) * | 1998-12-01 | 2001-09-04 | Applied Materials, Inc. | Apparatus for storing and moving a cassette |
JP2005538541A (en) * | 2002-09-06 | 2005-12-15 | ルシフ | Semiconductor wafer container transfer and storage system, and transfer mechanism |
US7234908B2 (en) | 2000-03-16 | 2007-06-26 | Applied Materials, Inc. | Apparatus for storing and moving a cassette |
US7433756B2 (en) | 2003-11-13 | 2008-10-07 | Applied Materials, Inc. | Calibration of high speed loader to substrate transport system |
US7577487B2 (en) | 2005-09-14 | 2009-08-18 | Applied Materials, Inc. | Methods and apparatus for a band to band transfer module |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60258459A (en) * | 1984-06-04 | 1985-12-20 | Deisuko Saiyaa Japan:Kk | Transferring apparatus of wafer for vertical type heat-treating furnace |
JPS6324615A (en) * | 1986-05-16 | 1988-02-02 | シリコン・バレイ・グル−プ・インコ−ポレイテッド | Method and apparatus for transferring wafer between cassette and boat |
JPH01121923U (en) * | 1988-02-12 | 1989-08-18 |
-
1990
- 1990-02-21 JP JP2042179A patent/JPH0797564B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60258459A (en) * | 1984-06-04 | 1985-12-20 | Deisuko Saiyaa Japan:Kk | Transferring apparatus of wafer for vertical type heat-treating furnace |
JPS6324615A (en) * | 1986-05-16 | 1988-02-02 | シリコン・バレイ・グル−プ・インコ−ポレイテッド | Method and apparatus for transferring wafer between cassette and boat |
JPH01121923U (en) * | 1988-02-12 | 1989-08-18 |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5464313A (en) * | 1993-02-08 | 1995-11-07 | Tokyo Electron Kabushiki Kaisha | Heat treating apparatus |
US5822498A (en) * | 1995-06-22 | 1998-10-13 | Tokyo Electron Limited | Teaching method for loading arm for objects to be processed |
WO1999002436A1 (en) * | 1997-07-11 | 1999-01-21 | Asyst Technologies, Inc. | Smif pod storage, delivery and retrieval system |
US6579052B1 (en) | 1997-07-11 | 2003-06-17 | Asyst Technologies, Inc. | SMIF pod storage, delivery and retrieval system |
JP2000138283A (en) * | 1998-08-28 | 2000-05-16 | Tadahiro Omi | Wafer stocker having wafer replacing function |
US6283692B1 (en) * | 1998-12-01 | 2001-09-04 | Applied Materials, Inc. | Apparatus for storing and moving a cassette |
US7637707B2 (en) | 1998-12-01 | 2009-12-29 | Applied Materials, Inc. | Apparatus for storing and moving a cassette |
US7234908B2 (en) | 2000-03-16 | 2007-06-26 | Applied Materials, Inc. | Apparatus for storing and moving a cassette |
JP2005538541A (en) * | 2002-09-06 | 2005-12-15 | ルシフ | Semiconductor wafer container transfer and storage system, and transfer mechanism |
US7433756B2 (en) | 2003-11-13 | 2008-10-07 | Applied Materials, Inc. | Calibration of high speed loader to substrate transport system |
US7912576B2 (en) | 2003-11-13 | 2011-03-22 | Applied Materials, Inc. | Calibration of high speed loader to substrate transport system |
US7577487B2 (en) | 2005-09-14 | 2009-08-18 | Applied Materials, Inc. | Methods and apparatus for a band to band transfer module |
Also Published As
Publication number | Publication date |
---|---|
JPH0797564B2 (en) | 1995-10-18 |
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