JPH03244121A - Vertical type furnace - Google Patents

Vertical type furnace

Info

Publication number
JPH03244121A
JPH03244121A JP4217990A JP4217990A JPH03244121A JP H03244121 A JPH03244121 A JP H03244121A JP 4217990 A JP4217990 A JP 4217990A JP 4217990 A JP4217990 A JP 4217990A JP H03244121 A JPH03244121 A JP H03244121A
Authority
JP
Japan
Prior art keywords
cassette
cassettes
rack
transfer
buffer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4217990A
Other languages
Japanese (ja)
Other versions
JPH0797564B2 (en
Inventor
Hideki Koike
秀樹 小池
Riichi Kano
狩野 利一
Makoto Ozawa
誠 小沢
Fumihide Ikeda
文秀 池田
Shoichiro Izumi
泉 昭一郎
Toru Yoshida
徹 吉田
Ryoji Saito
良二 斉藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Priority to JP2042179A priority Critical patent/JPH0797564B2/en
Publication of JPH03244121A publication Critical patent/JPH03244121A/en
Publication of JPH0797564B2 publication Critical patent/JPH0797564B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To enable elimination of recovery and supply standby of device wafer cassettes by providing a buffer cassette rack that momentarily stores the cassettes for a next batch, etc., a transfer cassette rack, and a cassettes transfer mechanism. CONSTITUTION:A furnace body 1 incorporates a cassette rack 3 that can move the wafer transfer cassette right- and left-ward, a buffer cassette 2 rack that momentarily stores a next batch, etc., and a cassette transfer mechanism (robot) 4 that transfers cassettes between the furnace body exterior and the racks 2, 3. A part of the rack 2 stores next buffer cassettes by means of the robot 4 during treatment of the wafers in the cassette on the rack 3 side. The next step is to transfer cassettes containing treated wafers to another part of the rack 2 upon the end of treatment, to treat wafers after transfer of a next batch cassette from the rack 2 to the rack 3, and to recover and supply cassettes during wafer treatment by means of the robot 4. This process dispenses with deadtime due to recovery and standby supply of device cassettes without increases in the number of robots 4 and can improve the operation factor of devices.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体製造装置における縦型炉に係り、特に縦
型炉と外部のカセット搬送ロボットとの間で行われるカ
セットの搬送を効率よく行うことができる縦型炉に関す
る。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a vertical furnace in semiconductor manufacturing equipment, and particularly to a method for efficiently transporting cassettes between the vertical furnace and an external cassette transport robot. Regarding vertical furnaces that can be used.

〔従来技術とその課題〕[Conventional technology and its issues]

従来の縦型炉では、1つの炉体内に1バッチ分のカセッ
トしか収容できないカセット棚が設けられている構造で
あるため、カセット内のウェハの処理終了後炉体外部へ
カセットを搬出し、その後次のロフト分のカセットを炉
体外部から炉体内のカセット棚へ搬入する必要がある。
Conventional vertical furnaces have a structure in which a cassette shelf that can accommodate only one batch of cassettes is provided in one furnace body, so after the wafers in the cassettes have been processed, the cassettes are transported outside the furnace body and then It is necessary to carry the cassettes for the next loft from outside the furnace body to the cassette shelf inside the furnace body.

近年ファクトリオートメーション化により、カセット棚
へのカセットの搬入、搬出はカセット搬送ロボット等に
より行われているが、カセット搬送ロボット等によりカ
セットの搬送速度に制限があるため、多くの半導体製造
装置のあるクリーンルームで効率良く装置を稼働させる
には、多くのカセット搬送ロボットが必要であるととも
に、装置外に設けられカセットを収納するカセットスト
ッカの台数が多くなりあるいはカセットストッカの容量
が大きくなるという課題がある。
In recent years, due to factory automation, the loading and unloading of cassettes into and out of cassette shelves has been carried out by cassette transport robots, etc. However, due to limitations on the speed at which cassettes can be transported by cassette transport robots, etc., clean rooms with many semiconductor manufacturing equipment In order to efficiently operate the device, a large number of cassette transport robots are required, and there are also problems in that the number of cassette stockers installed outside the device for storing cassettes increases or the capacity of the cassette stocker increases.

〔課題を解決するための手段〕[Means to solve the problem]

本発明縦型炉は上記の課題を解決するため、図示のよう
に炉体l内にウェハ搬送用のカセットを収納する移動カ
セット棚3と一時的に次のバッチ分等のカセットを収納
するバッファカセット棚2と、炉体外部及び前記2つの
棚2.3の間でカセット搬送を行うカセット搬送機構4
を設けてなる構成としたものである。
In order to solve the above-mentioned problems, the vertical furnace of the present invention has a movable cassette shelf 3 for storing cassettes for transporting wafers in the furnace body l and a buffer for temporarily storing cassettes for the next batch, etc., as shown in the figure. A cassette transport mechanism 4 that transports cassettes between the cassette shelf 2, the outside of the furnace body, and the two shelves 2.3.
This is a configuration in which the following is provided.

〔作 用〕[For production]

本発明縦型炉はこのような構成であるから、移動カセッ
ト棚3側のカセット内のウェハを処理している間に、カ
セット搬送機構4により次バッチのカセットをバッファ
カセット棚2内の一部に収納しておく。処理終了時には
処理済みウェハの入ったカセットをバッファカセット棚
2内の他の部分に搬送し、次バッチ用カセットをバッフ
ァカセット棚2内より移動カセット棚3内に搬送後、ウ
ェハの処理を行う。この間にカセットの回収、供給をカ
セット搬送機構4により行うことで、装置のウェハカセ
ットの回収、供給待ちをなくすことができる。
Since the vertical furnace of the present invention has such a configuration, while the wafers in the cassettes on the movable cassette shelf 3 are being processed, the cassette transfer mechanism 4 transfers the next batch of cassettes to a part of the buffer cassette shelf 2. Store it in. At the end of processing, the cassette containing the processed wafer is transported to another part of the buffer cassette shelf 2, and the cassette for the next batch is transported from the buffer cassette shelf 2 to the movable cassette shelf 3, after which the wafers are processed. By using the cassette transport mechanism 4 to collect and supply cassettes during this time, it is possible to eliminate the need for the apparatus to wait for collection and supply of wafer cassettes.

〔実施例〕〔Example〕

以下図面により本発明の詳細な説明する。 The present invention will be explained in detail below with reference to the drawings.

図面は本発明縦型炉の一実施例の構成を示す説明用斜視
図で、この実施例は炉体l内にウェハ搬送用のカセット
を左右方向に移動可能な移動カセット棚3と、一時的に
次のバッチ分等のカセットを収納する固定されたバッフ
ァカセット棚2と、炉体外部及び前記2つの棚2.3の
間でカセット搬送を行うカセット搬送ロボット4を設け
てなる。
The drawing is an explanatory perspective view showing the configuration of an embodiment of the vertical furnace of the present invention. This embodiment includes a movable cassette shelf 3 that can move cassettes for wafer transfer in the left and right direction in the furnace body l, and a temporary A fixed buffer cassette shelf 2 for storing cassettes for the next batch, etc., and a cassette transport robot 4 for transporting cassettes between the outside of the furnace body and the two shelves 2.3 are provided.

本実施例は上記のような構成であるから、移動カセット
棚3側のカセット内のウェハを処理している間に、カセ
ット搬送ロボット4により次バッチのカセットをバッフ
ァカセット棚2内の一部に収納しておく。処理終了時に
は処理済みウェハの入ったカセットをバッファカセット
棚2内の他の部分に搬送し、次バッチ用カセットをバッ
ファカセット棚2内より移動カセット棚3内に搬送後、
ウェハの処理を行う。この間にカセットの回収供給をカ
セット搬送ロボット4により行うことで、装置のウェハ
カセットの回収、供給待ちをなくすことができる。
Since this embodiment has the above-described configuration, while the wafers in the cassettes on the movable cassette shelf 3 side are being processed, the cassette transfer robot 4 transfers the next batch of cassettes to a part of the buffer cassette shelf 2. Store it away. At the end of processing, the cassette containing the processed wafers is transported to another part of the buffer cassette shelf 2, and the cassette for the next batch is transported from the buffer cassette shelf 2 to the moving cassette shelf 3.
Performs wafer processing. By having the cassette transfer robot 4 collect and supply cassettes during this time, it is possible to eliminate the need for the apparatus to wait for collection and supply of wafer cassettes.

〔発明の効果〕〔Effect of the invention〕

上述のように本発明によれば、炉体1内にウェハ搬送用
のカセットを収納する移動カセット棚3と一時的に次の
バッチ分等のカセットを収納するバッファカセット棚2
と、炉体外部及び前記2つの棚2,3の間でカセット搬
送を行うカセット搬送機構4を設けてなる構成としたの
で、外部のカセット搬送ロボットの台数を増大すること
なく、装置のカセット回収、供給待ちによる休止時間を
なくすことが可能となり、装置の稼働率を向上すること
ができる。
As described above, according to the present invention, the furnace body 1 includes a movable cassette shelf 3 that stores cassettes for transporting wafers and a buffer cassette shelf 2 that temporarily stores cassettes for the next batch, etc.
Since the structure includes a cassette transport mechanism 4 that transports cassettes between the outside of the furnace body and between the two shelves 2 and 3, the cassette collection of the device can be easily performed without increasing the number of external cassette transport robots. , it becomes possible to eliminate downtime due to waiting for supply, and it is possible to improve the operating rate of the device.

またカセット搬送機構4の台数及び装置外に設置すべき
カセットストッカの台数あるいはその容量が少なくて済
むので、それだけコストを低減でき、運用上のソフトウ
ェアの開発も容易となり、ファクトリオートメーション
化を容易に遠戚することができる。
In addition, since the number of cassette transport mechanisms 4 and the number or capacity of cassette stockers to be installed outside the device can be reduced, costs can be reduced accordingly, operational software can be easily developed, and factory automation can be easily achieved. can be related.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明縦型炉の一実施例の構成を示す説明用斜視
図である。 1・・・・・・炉体、2・・・・・・バッファカセット
棚、3・・・・・・移動カセット棚、4・・・・・・カ
セット搬送機構(ロボット)。
The drawing is an explanatory perspective view showing the configuration of an embodiment of the vertical furnace of the present invention. 1... Furnace body, 2... Buffer cassette shelf, 3... Moving cassette shelf, 4... Cassette transport mechanism (robot).

Claims (1)

【特許請求の範囲】[Claims] 炉体(1)内にウェハ搬送用のカセットを収納する移動
カセット棚(3)と一時的に次のバッチ分等のカセット
を収納するバッファカセット棚(2)と、炉体外部及び
前記2つの棚(2、3)の間でカセット搬送を行うカセ
ット搬送機構(4)を設けてなる縦型炉。
A movable cassette shelf (3) that stores cassettes for wafer transfer inside the furnace body (1), a buffer cassette shelf (2) that temporarily stores cassettes for the next batch, etc. A vertical furnace equipped with a cassette transport mechanism (4) that transports cassettes between shelves (2, 3).
JP2042179A 1990-02-21 1990-02-21 Vertical semiconductor manufacturing equipment Expired - Lifetime JPH0797564B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2042179A JPH0797564B2 (en) 1990-02-21 1990-02-21 Vertical semiconductor manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2042179A JPH0797564B2 (en) 1990-02-21 1990-02-21 Vertical semiconductor manufacturing equipment

Publications (2)

Publication Number Publication Date
JPH03244121A true JPH03244121A (en) 1991-10-30
JPH0797564B2 JPH0797564B2 (en) 1995-10-18

Family

ID=12628764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2042179A Expired - Lifetime JPH0797564B2 (en) 1990-02-21 1990-02-21 Vertical semiconductor manufacturing equipment

Country Status (1)

Country Link
JP (1) JPH0797564B2 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5464313A (en) * 1993-02-08 1995-11-07 Tokyo Electron Kabushiki Kaisha Heat treating apparatus
US5822498A (en) * 1995-06-22 1998-10-13 Tokyo Electron Limited Teaching method for loading arm for objects to be processed
WO1999002436A1 (en) * 1997-07-11 1999-01-21 Asyst Technologies, Inc. Smif pod storage, delivery and retrieval system
JP2000138283A (en) * 1998-08-28 2000-05-16 Tadahiro Omi Wafer stocker having wafer replacing function
US6283692B1 (en) * 1998-12-01 2001-09-04 Applied Materials, Inc. Apparatus for storing and moving a cassette
JP2005538541A (en) * 2002-09-06 2005-12-15 ルシフ Semiconductor wafer container transfer and storage system, and transfer mechanism
US7234908B2 (en) 2000-03-16 2007-06-26 Applied Materials, Inc. Apparatus for storing and moving a cassette
US7433756B2 (en) 2003-11-13 2008-10-07 Applied Materials, Inc. Calibration of high speed loader to substrate transport system
US7577487B2 (en) 2005-09-14 2009-08-18 Applied Materials, Inc. Methods and apparatus for a band to band transfer module

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60258459A (en) * 1984-06-04 1985-12-20 Deisuko Saiyaa Japan:Kk Transferring apparatus of wafer for vertical type heat-treating furnace
JPS6324615A (en) * 1986-05-16 1988-02-02 シリコン・バレイ・グル−プ・インコ−ポレイテッド Method and apparatus for transferring wafer between cassette and boat
JPH01121923U (en) * 1988-02-12 1989-08-18

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60258459A (en) * 1984-06-04 1985-12-20 Deisuko Saiyaa Japan:Kk Transferring apparatus of wafer for vertical type heat-treating furnace
JPS6324615A (en) * 1986-05-16 1988-02-02 シリコン・バレイ・グル−プ・インコ−ポレイテッド Method and apparatus for transferring wafer between cassette and boat
JPH01121923U (en) * 1988-02-12 1989-08-18

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5464313A (en) * 1993-02-08 1995-11-07 Tokyo Electron Kabushiki Kaisha Heat treating apparatus
US5822498A (en) * 1995-06-22 1998-10-13 Tokyo Electron Limited Teaching method for loading arm for objects to be processed
WO1999002436A1 (en) * 1997-07-11 1999-01-21 Asyst Technologies, Inc. Smif pod storage, delivery and retrieval system
US6579052B1 (en) 1997-07-11 2003-06-17 Asyst Technologies, Inc. SMIF pod storage, delivery and retrieval system
JP2000138283A (en) * 1998-08-28 2000-05-16 Tadahiro Omi Wafer stocker having wafer replacing function
US6283692B1 (en) * 1998-12-01 2001-09-04 Applied Materials, Inc. Apparatus for storing and moving a cassette
US7637707B2 (en) 1998-12-01 2009-12-29 Applied Materials, Inc. Apparatus for storing and moving a cassette
US7234908B2 (en) 2000-03-16 2007-06-26 Applied Materials, Inc. Apparatus for storing and moving a cassette
JP2005538541A (en) * 2002-09-06 2005-12-15 ルシフ Semiconductor wafer container transfer and storage system, and transfer mechanism
US7433756B2 (en) 2003-11-13 2008-10-07 Applied Materials, Inc. Calibration of high speed loader to substrate transport system
US7912576B2 (en) 2003-11-13 2011-03-22 Applied Materials, Inc. Calibration of high speed loader to substrate transport system
US7577487B2 (en) 2005-09-14 2009-08-18 Applied Materials, Inc. Methods and apparatus for a band to band transfer module

Also Published As

Publication number Publication date
JPH0797564B2 (en) 1995-10-18

Similar Documents

Publication Publication Date Title
US6487791B2 (en) Vacuum processing apparatus
KR100235917B1 (en) Vacuum apparatus
JP2009147368A (en) Method of manufacturing semiconductor device by multichamber system
JPH0936198A (en) Vacuum processor and semiconductor production line using the processor
JP3486462B2 (en) Decompression / normal pressure processing equipment
JPH03244121A (en) Vertical type furnace
US6354781B1 (en) Semiconductor manufacturing system
JPH01251734A (en) Semiconductor manufacturing apparatus
JP3127073B2 (en) Cleaning device and cleaning method
JP4886669B2 (en) Substrate processing equipment
JP2873761B2 (en) Semiconductor manufacturing equipment
JP2011066423A (en) Apparatus for processing substrate and method of manufacturing semiconductor device
JPH0252449A (en) Loading and unloading of substrate
JP2582578Y2 (en) Multi-chamber semiconductor processing equipment
JPS63129641A (en) Block system for constituting semiconductor manufacturing line of various processes
JPH04298059A (en) Vacuum processor
JP2000332080A (en) Manufacturing method and apparatus for processed product
JP3251566B2 (en) Stocker transport system
JP3413567B2 (en) Substrate transfer processing apparatus and substrate transfer processing method
JP3665716B2 (en) Processing system
JP2892380B2 (en) Cleaning device and cleaning method
JP2004096075A (en) Vacuum processing apparatus
JPH0466119A (en) Vacuum treatment device
JP2834970B2 (en) Substrate storage device
JPH11145251A (en) Substrate processor

Legal Events

Date Code Title Description
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20071018

Year of fee payment: 12

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081018

Year of fee payment: 13

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091018

Year of fee payment: 14

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091018

Year of fee payment: 14

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101018

Year of fee payment: 15

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101018

Year of fee payment: 15