JPH0323925U - - Google Patents

Info

Publication number
JPH0323925U
JPH0323925U JP8415289U JP8415289U JPH0323925U JP H0323925 U JPH0323925 U JP H0323925U JP 8415289 U JP8415289 U JP 8415289U JP 8415289 U JP8415289 U JP 8415289U JP H0323925 U JPH0323925 U JP H0323925U
Authority
JP
Japan
Prior art keywords
semiconductor wafer
organic solvent
tray
drying apparatus
wafer drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8415289U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8415289U priority Critical patent/JPH0323925U/ja
Publication of JPH0323925U publication Critical patent/JPH0323925U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Solid Materials (AREA)
JP8415289U 1989-07-18 1989-07-18 Pending JPH0323925U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8415289U JPH0323925U (enrdf_load_stackoverflow) 1989-07-18 1989-07-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8415289U JPH0323925U (enrdf_load_stackoverflow) 1989-07-18 1989-07-18

Publications (1)

Publication Number Publication Date
JPH0323925U true JPH0323925U (enrdf_load_stackoverflow) 1991-03-12

Family

ID=31632400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8415289U Pending JPH0323925U (enrdf_load_stackoverflow) 1989-07-18 1989-07-18

Country Status (1)

Country Link
JP (1) JPH0323925U (enrdf_load_stackoverflow)

Similar Documents

Publication Publication Date Title
JPH0247046U (enrdf_load_stackoverflow)
JPH01104022U (enrdf_load_stackoverflow)
JPH0323925U (enrdf_load_stackoverflow)
JP3477994B2 (ja) 半導体ウエハ乾燥装置
JP2511873B2 (ja) ベ−パ乾燥装置
JP3506851B2 (ja) 蒸気乾燥装置及び半導体ウエハの乾燥方法
JPH0629276A (ja) 乾燥装置および洗浄装置
JPS5988827A (ja) 蒸気乾燥装置
JP2522546Y2 (ja) 温純水乾燥装置
JPH0622225B2 (ja) 表面処理装置
JPH04346433A (ja) ベーパ乾燥装置
JPH0312372Y2 (enrdf_load_stackoverflow)
US1516131A (en) Waste-preventing chute for centrifugal extractors
JPH0331432Y2 (enrdf_load_stackoverflow)
JPH06138648A (ja) 基板洗浄方法及び洗浄装置
KR980011979A (ko) 웨이퍼 세정/건조 장치 및 방법
JPH04159714A (ja) イソプロピルアルコールベーパー乾燥装置
JPS6166937U (enrdf_load_stackoverflow)
JPH0360124A (ja) ベーパ乾燥装置
JPH0352147Y2 (enrdf_load_stackoverflow)
JPH0319988Y2 (enrdf_load_stackoverflow)
JPH02187182A (ja) 洗浄方法
JPS6194567U (enrdf_load_stackoverflow)
JPS5835325Y2 (ja) スプレ−ガンの塗料容器
JPH0396036U (enrdf_load_stackoverflow)