JPH03237605A - Production of composite type magnetic head - Google Patents

Production of composite type magnetic head

Info

Publication number
JPH03237605A
JPH03237605A JP22036390A JP22036390A JPH03237605A JP H03237605 A JPH03237605 A JP H03237605A JP 22036390 A JP22036390 A JP 22036390A JP 22036390 A JP22036390 A JP 22036390A JP H03237605 A JPH03237605 A JP H03237605A
Authority
JP
Japan
Prior art keywords
magnetic head
thin film
magnetic
etching
grooves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22036390A
Other languages
Japanese (ja)
Other versions
JPH0479042B2 (en
Inventor
Yoshiaki Shimizu
良昭 清水
Masaru Doi
勝 土井
Kazuo Ino
伊野 一夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP22036390A priority Critical patent/JPH03237605A/en
Publication of JPH03237605A publication Critical patent/JPH03237605A/en
Publication of JPH0479042B2 publication Critical patent/JPH0479042B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the peeling of thin films by removing a part of the thin films, then mechanically grooving the removed parts, thereby forming the grooves arriving at members to constitute magnetic head half bodies. CONSTITUTION:The thin films 3, 3 of 'SENDUST(R)' (Fe-Al-Si alloy) to be used as a high saturation magnetic density material are provided in the butt parts of a pair of the magnetic head half bodies 2, 2 consisting of a ferrite material opened with the grooves 5 for regulating a track width. Further, a nonmagnetic material layer 4 consisting of SiO2 is provided between the two thin films to form the magnetic gap part parallel with the butt parts. Glass is packed in the grooves 5 for regulating the track width. The thin film 3 consisting of the 'SENDUST(R)' and the nonmagnetic material layer 4 are formed by etching. The formation of the grooves 5 is executed by mechanically grooving the removed parts formed after the thin films 3 are partly removed by etching. The peeling of the thin films is prevented in this way and the improvement in the yield of production is made. In addition, the track width W is exactly regulated.

Description

【発明の詳細な説明】 本発明は磁気記録再生装置に用いられる複合型磁気ヘッ
ドの製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a composite magnetic head used in a magnetic recording/reproducing device.

VTR等の磁気記録再生装置に用いられる磁気ヘッドと
して第6図に示す複合型磁気ヘッドが提案されている(
実開昭56−174119号公報)。これはフェライト
材等の高固有抵抗磁性材によって形成された一対の磁気
ヘッド半体(2)(2)の突き合わせ面に該磁性材より
も更に飽和磁束密度の高い磁性体、例えばセンダスト、
パーマロイ、アモルファス磁性体等の薄膜(3)(3)
を形成して磁気空隙部近傍に於ける飽和磁束密度を高め
たものである。
A composite magnetic head shown in FIG. 6 has been proposed as a magnetic head for use in magnetic recording and reproducing devices such as VTRs (
Utility Model Application Publication No. 56-174119). This is because the abutting surfaces of a pair of magnetic head halves (2) (2) made of a high resistivity magnetic material such as a ferrite material are coated with a magnetic material having a higher saturation magnetic flux density than the magnetic material, such as sendust.
Thin films such as permalloy and amorphous magnetic materials (3) (3)
This increases the saturation magnetic flux density near the magnetic gap.

従来の複合型磁気ヘッドに於ては、センダスト等の薄膜
によって飽和磁束密度を高めても、薄膜(3)が磁気ヘ
ッド半体の接合面に接合する幅Tは目的とするトラック
幅と同一とし、且つ磁気ヘッド半体はフェライト材によ
って形成されているので、該接合面で磁気飽和が生ずる
虞れがあった。
In conventional composite magnetic heads, even if the saturation magnetic flux density is increased by using a thin film such as sendust, the width T where the thin film (3) joins the bonding surface of the magnetic head half is the same as the target track width. Moreover, since the magnetic head half is formed of a ferrite material, there is a risk that magnetic saturation will occur at the bonding surface.

更に従来の複合型磁気ヘッドに於ては、!!!遣方法に
よる理由から下記の如き構造上の問題があった。即ち、
複合型の磁気ヘッドを製造するには第2図に示す如く、
一対の磁気ヘッドブロック半体(11)(12)の夫々
にトラック幅規制用溝(2I)を開設し、両ブロック半
体の突き合わせ部に例えばセンダストの薄膜(3)を真
空蒸着或はスパッタリング等の公知の成膜技術によって
厚さ数μmに形成する。
Furthermore, in conventional composite magnetic heads,! ! ! Due to the method of transportation, there were structural problems as described below. That is,
To manufacture a composite magnetic head, as shown in Figure 2,
Track width regulating grooves (2I) are formed in each of the pair of magnetic head block halves (11) and (12), and a thin film (3) of, for example, sendust is formed by vacuum evaporation or sputtering on the abutting portions of both block halves. The film is formed to a thickness of several μm using a known film forming technique.

該薄膜(3)の上面には更にSin、の非磁性体層(4
)を同様の成膜技術によって厚さ約0.1μmに形成し
、その後両ブロック半体を第3図に示す如く突き合わせ
てトラック幅規制用溝(5)に溶融ガラスを充填し、両
ブロック半体を一体化する。
Further on the upper surface of the thin film (3) is a non-magnetic layer (4) of Sin.
) is formed to a thickness of approximately 0.1 μm using the same film-forming technique, and then the two block halves are butted together as shown in Figure 3, and the track width regulating groove (5) is filled with molten glass. Unify your body.

そして、これを第4図に示す如く適当な厚さにスライス
すれば、上記の非磁性体層(4〉を磁気空隙部とする磁
気ヘッド(1)が得られる。
Then, by slicing this to an appropriate thickness as shown in FIG. 4, a magnetic head (1) having the above-described non-magnetic layer (4> as a magnetic gap portion) can be obtained.

ところ゛が上述の製造方法の成膜工程に於ては、両ブロ
ック半体の突き合わせ部にスリット状の開口を有するマ
スクを介してセンダストの真空蒸着或はスパッタリング
を施すので、センダストの粒子の付着状態がマスクの開
口縁付近と開口中央部とで異なったり、或はセンダスト
の粒子がマスクの裏側にも侵入して、均一な厚さの膜が
形成されず、第6図に示す如く製品となった複合型磁気
ヘッドのセンダストの薄膜(3)には両端になで肩部(
31)(31)が生じる。この様な磁気ヘッドに於ては
トラック幅Wを正確に規定することが出来ないので、製
品間に記録再生性能のバラツキを引き起こしていた。
However, in the film forming process of the above manufacturing method, sendust is vacuum-deposited or sputtered through a mask having slit-shaped openings at the abutting portions of the two block halves, so that the adhesion of sendust particles may occur. The condition may be different between the area near the edge of the opening of the mask and the center of the opening, or the sendust particles may also enter the back side of the mask, preventing a film of uniform thickness from being formed, causing the product to deteriorate as shown in Figure 6. The Sendust thin film (3) of the new composite magnetic head has rounded shoulders (
31) (31) occurs. In such magnetic heads, the track width W cannot be accurately defined, which causes variations in recording and reproducing performance between products.

又、上記の問題を解決する為に、両プロ1.り半体にト
ラック幅規制用溝を開設する前に接合面全面にセンダス
ト及びSin、の膜を形成し、その後これらの膜とフェ
ライトウエノ)とに同時にダイヤモンドブレード或はC
BNブレードによる機械加工を施して、トラック幅規制
用溝(5)及び非磁性体層(4)を形成する方法も採用
出来るが、この方法によるとセンダストの薄膜が加工の
際に剥離することがあった。剥離部分が大きければ製品
として使用することが出来ないのは勿論であるが、剥離
が軽微であっても第6図に示す如く欠は部(32)が生
じていることがあり、前述したなで肩部(31)と同様
、磁気ヘッドの実質的なトラック幅Wを不確定なものと
していた。
Also, in order to solve the above problem, both professionals 1. Before forming track width regulating grooves in the half body, a film of Sendust and Sin is formed on the entire joint surface, and then these films and ferrite ware are simultaneously coated with a diamond blade or C.
It is also possible to adopt a method of forming the track width regulating groove (5) and the non-magnetic layer (4) by machining with a BN blade, but with this method, the thin film of sendust may peel off during processing. there were. Of course, if the peeling area is large, it cannot be used as a product, but even if the peeling is slight, there may be a chipped part (32) as shown in Figure 6, and the above-mentioned flat shoulder Similar to section (31), the substantial track width W of the magnetic head is uncertain.

〔目 的〕〔the purpose〕

本発明の目的は、磁気ヘッド半体となる部材にトラック
幅規制用溝加工等の溝加工を行う際、薄膜が剥離するの
を防止した複合型磁気ヘッドの製造方法を提供すること
である。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a composite magnetic head in which peeling of a thin film is prevented when grooves such as track width regulating grooves are formed on a member forming a magnetic head half.

〔11或〕 本発明の製造方法は、磁気ヘッド半体(2)となる部材
に達する溝(5)の形成を、薄膜(3)の一部をエツチ
ングにより除去した後、該除去部に機械的溝加工を施す
ことにより行うことを特徴とする。
[11] In the manufacturing method of the present invention, the groove (5) reaching the member that becomes the magnetic head half (2) is formed by removing a part of the thin film (3) by etching, and then applying a machine to the removed part. It is characterized in that it is performed by performing target groove machining.

〔作 用〕[For production]

上記製造方法に依れば、機械的溝加工により除去される
薄膜(3)は無く、若しくは少なく、該薄膜(3)の剥
離は防止される。
According to the above manufacturing method, no or less thin film (3) is removed by mechanical grooving, and peeling of the thin film (3) is prevented.

〔特有の効果〕[Special effects]

本発明に係る複合型磁気ヘッドの製造方法に依れば、薄
膜の剥離は防止され、製造歩留りが向上すると共にトラ
ック幅Wを正確に規定することが出来る。
According to the method of manufacturing a composite magnetic head according to the present invention, peeling of the thin film is prevented, manufacturing yield is improved, and the track width W can be accurately defined.

以下図示する実施例に基づき本発明を詳述する。The present invention will be described in detail below based on the illustrated embodiments.

第1図は本発明に係る複合型磁気ヘッドの磁気空隙部付
近の拡大平面図であって、トラック幅規制用溝(5)が
開設されたフェライト材よりなる1対の磁気ヘッド半体
(2)(2)の突き合わせ部に高飽和磁気密度材となる
センダス)(Fe−Al−5i系合金)の薄膜(3)(
3)を設け、更に両薄膜間にはSin、の非磁性体層(
4)を設けて前記突き合わせ部に平行である磁気空隙部
を形成している。又、トラック幅規制用溝(5)にはガ
ラスが充填されている。上記のセンダストの薄膜(3)
及び非磁性体層(4)は後記の如くエツチングにより成
形される。
FIG. 1 is an enlarged plan view of the vicinity of the magnetic gap of the composite magnetic head according to the present invention, showing a pair of magnetic head halves (2) made of ferrite material with track width regulating grooves (5). )(2) is covered with a thin film (3)(
3), and a non-magnetic layer of Sin (
4) to form a magnetic gap parallel to the abutting portion. Further, the track width regulating groove (5) is filled with glass. The above Sendust thin film (3)
The nonmagnetic layer (4) is formed by etching as described later.

第2図乃至第5図は本発明に係る複合型磁気ヘッドを製
造する工程を示している。
2 to 5 show the steps for manufacturing a composite magnetic head according to the present invention.

第2図はトラック幅規制用溝となるU字状溝(21)が
開設されたl対の7エライトウエハ(20)(20)の
突き合わせ部にセンダストの薄膜(3)(3)を設けて
ブロック半#(11)(12)が!Il戒されている状
況を示している。尚、一方の7エライトウエハ(2o)
には後にコイル巻装孔(8)となるコイル溝(13)が
開設されている。
Figure 2 shows a block in which sendust thin films (3) (3) are provided at the abutting portions of a pair of 7-elite wafers (20) (20) in which U-shaped grooves (21) are formed to serve as track width regulating grooves. Half # (11) (12)! It shows a situation where the person is under a precept. In addition, one 7 elite wafer (2o)
A coil groove (13) that will later become a coil winding hole (8) is provided in the coil groove (13).

第5図はフェライトウェハ(2o)にセンダストの薄膜
(3)を公知技術であるエツチングによって形成する手
順を示し、先ず第5図(a)に示す如くフェライトウェ
ハ(20)の表面全面にセンダストの薄膜(3)をスパ
ッタリンダ等の成膜方法によって厚さ約l乃至10μm
に形成し、その上面にトラック幅Wによって規定される
幅W、の帯状耐蝕層(6)を一定のピッチで繰り返し形
成する。帯状耐蝕層(6)は例えば重クロム酸塩系の感
光液をセンダストの薄膜表面に厚さ約1μmにコーティ
ングして乾燥の後、幅W、のスリット状開口を有するフ
ォトマスクをその上にのせ、紫外線を照射する露光工程
と、現像液によって前記原版に覆われない部分を除去す
る現像工程を経て形成される。
FIG. 5 shows the procedure for forming a thin film (3) of sendust on a ferrite wafer (2o) by etching, which is a known technique. First, as shown in FIG. The thin film (3) is formed to a thickness of about 1 to 10 μm using a film forming method such as a sputtering cylinder.
A band-shaped corrosion-resistant layer (6) having a width W defined by the track width W is repeatedly formed on the top surface at a constant pitch. The strip-shaped corrosion-resistant layer (6) is formed by coating the surface of a thin film of Sendust with a dichromate-based photosensitive liquid to a thickness of approximately 1 μm, and after drying, a photomask having a slit-like opening with a width W is placed on top of the coating. , is formed through an exposure process of irradiating ultraviolet rays and a development process of removing the portions not covered by the original plate using a developer.

次に第5図(b)に示す如く、センダストの薄膜(3)
の耐蝕層(6)に覆われない部分をエツチング液で溶解
させる。本実施例ではエツチング液として30%の硝酸
液を25℃で使用した。この際、腐蝕は深さ方向のみな
らず、横方向即ち耐蝕層(6)の下方にも進行し、所謂
サイドエッチが生じるが、サイドエッチ量Rはセンダス
トの薄膜(3)が10μm以下の厚さであれば再現性が
良いことが確かめられている。従って予めサイドエッチ
量を予測して、目的のトラック幅Wが得られる耐蝕層(
6)の幅W、を決めることが可能である。例えばセンダ
ストの薄膜(3)の厚さが10μmであって、上記のエ
ツチング液を使用して6分30秒のエツチングを行うと
、サイドエッチ量は約8μmとなる。本実施例の場合、
トラック幅Wを24±2μmとする必要があり、この為
には耐蝕層(6)の幅W0を40μmとすれば良い。
Next, as shown in Figure 5(b), a thin film of sendust (3)
The portions not covered by the corrosion-resistant layer (6) are dissolved with an etching solution. In this example, a 30% nitric acid solution was used at 25° C. as an etching solution. At this time, corrosion progresses not only in the depth direction but also in the lateral direction, that is, below the corrosion-resistant layer (6), resulting in so-called side etching. It has been confirmed that the reproducibility is good. Therefore, by predicting the amount of side etching in advance, the corrosion-resistant layer (
6) It is possible to determine the width W. For example, if the thickness of the Sendust thin film (3) is 10 .mu.m and etching is performed for 6 minutes and 30 seconds using the above etching solution, the amount of side etching will be about 8 .mu.m. In the case of this example,
It is necessary to set the track width W to 24±2 μm, and for this purpose, the width W0 of the corrosion-resistant layer (6) may be set to 40 μm.

本実施例ではこのサイドエッチを利用してセンダストの
薄膜(3)を目的の断面形状としている。
In this embodiment, this side etching is utilized to give the sendust thin film (3) a desired cross-sectional shape.

即ち、サイドエッチはセンダスト膜の耐蝕層(6)に近
い部分がより速く進行し、この結果図示の如く成形後の
薄膜(3)のフェライトウェハ(20)との接合面の幅
Tは上面の幅Wよりも大きくなる。
That is, the side etching progresses faster in the part of the sendust film closer to the corrosion-resistant layer (6), and as a result, as shown in the figure, the width T of the bonding surface of the thin film (3) with the ferrite wafer (20) after forming is equal to that of the upper surface. It becomes larger than the width W.

又、該薄膜(3)の側面(30)は上面に対して略90
度をなす。
Also, the side surface (30) of the thin film (3) is approximately 90 degrees from the top surface.
Be moderate.

エツチングが終了した後、第5図(C)に示す如くフェ
ライトウェハ(20)にトラック幅規制用溝となるU字
状溝(21)をダイヤモンドブレードを用いて開設する
。この場合、ブレードをセンダストの薄膜(3)に接触
しない範囲で可及的に接近させる必要があるが、機械加
工のみでセンダストの薄膜やフェライトウェハを成形す
る場合に比べて、粗い加工で可い。センダストの薄膜(
3)の上面には更に前記同様の成膜技術によってS+0
*の薄い膜を形成し、ギャップ長を規定する為の非磁性
体層(4)とする。尚、非磁性体層(4)を第5図(a
)に示す段階でセンダストの薄膜(3)の上面に全面に
形成し、第5図(b)に示す段階で先ずこの非磁性体層
にぶつ酸等によるウェットエツチング或はドライエツチ
ングを施すことにより、非磁性体層の所定の形状に成形
しても可い。
After the etching is completed, as shown in FIG. 5(C), a U-shaped groove (21) which will become a track width regulating groove is formed in the ferrite wafer (20) using a diamond blade. In this case, it is necessary to bring the blade as close as possible to the sendust thin film (3) without touching it, but compared to forming a sendust thin film or ferrite wafer using only machining, rough machining is required. . Sendust thin film (
3) The upper surface is further coated with S+0 using the same film formation technique as described above.
A thin film marked * is formed to serve as a non-magnetic layer (4) for defining the gap length. The non-magnetic layer (4) is shown in Figure 5 (a).
) is formed on the entire upper surface of the sendust thin film (3), and in the step shown in FIG. 5(b), this non-magnetic layer is first subjected to wet etching or dry etching using oxidized acid or the like. , the nonmagnetic material layer may be formed into a predetermined shape.

上記の如く形成された2つのブロック半体(11)(1
2)を第3図に示す如く非磁性体層(4)にて当接せし
め、トラック幅規制用溝(5)には溶融ガラスを充填し
、両ブロック半体を接着一体化すると、非磁性体層(4
)からなる磁気空隙部、トラック幅規制用溝(5)及び
コイル巻装孔(8)を有する磁気ヘッドブロック(10
)が出来上がる。これを適当な厚さにスライスすれば、
第4図に示す複合型磁気ヘッド(1)が複数個得られる
Two block halves (11) (1) formed as above
2) are brought into contact with a non-magnetic material layer (4) as shown in Fig. 3, the track width regulating groove (5) is filled with molten glass, and both block halves are bonded and integrated. Body layer (4
), a track width regulating groove (5), and a coil winding hole (8).
) is completed. If you slice this into appropriate thickness,
A plurality of composite magnetic heads (1) shown in FIG. 4 are obtained.

この様にして製作された磁気ヘッド(1)のセンダスト
の薄膜(3)は第1図に示す如く、幅がトラック幅Wと
厳密に一致する高い平面度を有する上面と、該上面から
略垂直方向に伸びた側面(30)と、前記上面より大な
る幅を有する磁気ヘッド半体との接合面を具備し、不均
一な底膜に基づくなで肩部や機械加工に基づく欠は部は
無い。
As shown in FIG. 1, the sendust thin film (3) of the magnetic head (1) manufactured in this way has an upper surface with a high degree of flatness whose width closely matches the track width W, and a substantially perpendicular upper surface from the upper surface. It has a side surface (30) extending in the direction and a joining surface between the magnetic head half having a width larger than the upper surface, and there are no rounded shoulders due to an uneven bottom film or holes due to machining.

尚、上述の実施例ではセンダストの薄膜を全てエツチン
グによってtCyfIしているが、該薄膜の上層部のみ
をエツチングによって成形し、残りの下層部をU字状溝
と共に機械加工で同時に成形しても良く、下層部の厚さ
が1μm程度であれば、機械加工による剥離は殆んど生
じないことが実験的に確かめられている。
Incidentally, in the above-mentioned example, the thin film of sendust is entirely coated with tCyfI by etching, but it is also possible to form only the upper layer of the thin film by etching and simultaneously form the remaining lower layer along with the U-shaped groove by machining. It has been experimentally confirmed that if the thickness of the lower layer is approximately 1 μm, peeling due to machining will hardly occur.

又、本実施例ではケミカルエツチングによってセンダス
トの薄膜を成形しているが、他の周知のエツチング方法
を用いて可いのは勿論であって、例えばイオンビームエ
ツチングによっても可い。
Further, in this embodiment, the sendust thin film is formed by chemical etching, but it goes without saying that other well-known etching methods may be used, such as ion beam etching.

更に、高飽和磁束密度の薄膜の材質としてセンダスト以
外にパーマロイやアモルファス磁性体を用いても本実施
例と同様の効果が得られる。
Furthermore, the same effect as in this embodiment can be obtained by using permalloy or an amorphous magnetic material other than sendust as the material of the thin film having a high saturation magnetic flux density.

本発明に係る磁気ヘッドの製造に於ては、高飽和磁束密
度の薄膜をフェライトウェハの突き合わせ部全面につい
て同時に成形することが出来、然もU字状溝は比較的粗
い精度で加工出来るので、従来の製造方法に比べて高い
生産性が得られる。
In manufacturing the magnetic head according to the present invention, a thin film with a high saturation magnetic flux density can be simultaneously formed on the entire surface of the butt part of the ferrite wafer, and the U-shaped groove can be processed with relatively rough precision. Higher productivity can be obtained compared to conventional manufacturing methods.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る複合磁気ヘッドの拡大部分平面図
、第2図は1対のブロック半体の斜視図、第3図は磁気
ヘッドブロックの斜視図、第4図は完成した磁気ヘッド
の斜視図、第5図(a)(b )(c )はエツチング
による薄膜の成形方法を示す説明図、第6図は従来の複
合型磁気ヘッドの拡大部分平面図を示す。 (2)・・・磁気ヘッド半体、(3)・・・センダスト
の薄膜、(4)・・・非磁性体層、(5)・・・トラッ
ク幅規制用溝、(20)・・・フェライトウェハ(磁気
ヘッド半体となる部材)、(21)・・・U字状溝、W
・・・トラック幅。
FIG. 1 is an enlarged partial plan view of a composite magnetic head according to the present invention, FIG. 2 is a perspective view of a pair of block halves, FIG. 3 is a perspective view of a magnetic head block, and FIG. 4 is a completed magnetic head. FIGS. 5(a), 5(b), and 5(c) are explanatory diagrams showing a method of forming a thin film by etching, and FIG. 6 is an enlarged partial plan view of a conventional composite magnetic head. (2)...Magnetic head half, (3)...Sendust thin film, (4)...Nonmagnetic layer, (5)...Track width regulating groove, (20)... Ferrite wafer (member that becomes half of the magnetic head), (21)...U-shaped groove, W
...Track width.

Claims (2)

【特許請求の範囲】[Claims] (1)高固有抵抗磁性材よりなる1組の磁気ヘッド半体
のうち少なくとも一方の磁気ヘッド半体となる部材に前
記磁性材よりも高い飽和磁束密度を有する磁性材の薄膜
を形成した後、該薄膜に前記部材に達する所定幅の溝を
形成し、次いで前記一方の磁気ヘッド半体となる部材に
残存している前記薄膜と他方の磁気ヘッド半体となる部
材とを磁気空隙部を介して接合する複合型磁気ヘッドの
製造方法において、前記溝の形成を、前記薄膜の一部を
エッチングにより除去した後、該除去部に機械的溝加工
を施すことにより行うことを特徴とする複合型磁気ヘッ
ドの製造方法。
(1) After forming a thin film of a magnetic material having a higher saturation magnetic flux density than the magnetic material on at least one of a pair of magnetic head halves made of a high resistivity magnetic material, A groove of a predetermined width reaching the member is formed in the thin film, and then the thin film remaining on the member that will become the one half of the magnetic head and the member that will become the other half of the magnetic head are connected through a magnetic gap. A method for manufacturing a composite magnetic head in which the grooves are bonded by using a method, wherein the grooves are formed by removing a part of the thin film by etching, and then mechanically forming grooves on the removed portion. A method of manufacturing a magnetic head.
(2)前記エッチングをイオンビームエッチングにより
行うことを特徴とする特許請求の範囲第(1)項記載の
複合型磁気ヘッドの製造方法。
(2) The method for manufacturing a composite magnetic head according to claim (1), wherein the etching is performed by ion beam etching.
JP22036390A 1990-08-21 1990-08-21 Production of composite type magnetic head Granted JPH03237605A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22036390A JPH03237605A (en) 1990-08-21 1990-08-21 Production of composite type magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22036390A JPH03237605A (en) 1990-08-21 1990-08-21 Production of composite type magnetic head

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP22036290A Division JPH03141006A (en) 1990-08-21 1990-08-21 Composite type magnetic head

Publications (2)

Publication Number Publication Date
JPH03237605A true JPH03237605A (en) 1991-10-23
JPH0479042B2 JPH0479042B2 (en) 1992-12-14

Family

ID=16749965

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22036390A Granted JPH03237605A (en) 1990-08-21 1990-08-21 Production of composite type magnetic head

Country Status (1)

Country Link
JP (1) JPH03237605A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0583889A2 (en) * 1992-07-22 1994-02-23 Ngk Insulators, Ltd. Method of etching sendust and method of pattern-etching sendust and chromium films

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0583889A2 (en) * 1992-07-22 1994-02-23 Ngk Insulators, Ltd. Method of etching sendust and method of pattern-etching sendust and chromium films
EP0583889A3 (en) * 1992-07-22 1994-10-12 Ngk Insulators Ltd Method of etching sendust and method of pattern-etching sendust and chromium films.
US5413672A (en) * 1992-07-22 1995-05-09 Ngk Insulators, Ltd. Method of etching sendust and method of pattern-etching sendust and chromium films

Also Published As

Publication number Publication date
JPH0479042B2 (en) 1992-12-14

Similar Documents

Publication Publication Date Title
JPH0574127B2 (en)
JPH0785289B2 (en) Method of manufacturing magnetic head
US5695656A (en) Method for fabricating a magnetic thin-film head
JPH0216409Y2 (en)
JPH03237605A (en) Production of composite type magnetic head
JPH054722B2 (en)
JPS61151818A (en) Thin film magnetic head
JPH0582649B2 (en)
JPH0827892B2 (en) Manufacturing method of magnetic head
JP3015546B2 (en) Resist coating method
JPS62229512A (en) Thin film magnetic head and its production
JPH04263105A (en) Manufacture of magnetic head
JP2000099909A (en) Manufacture of magnetic head
JPH06290423A (en) Method for trimming pole of thin film magnetic head
JPH0276111A (en) Thin film magnetic head
JPH087212A (en) Production of magnetic head
JPS61104307A (en) Production of magnetic head
JPH05234025A (en) Production of magnetic head
JPS6059514A (en) Production of double azimuth head
JPS62256210A (en) Thin-film multichannel magnetic head
JPH0416841B2 (en)
JPS63108510A (en) Magnetic head
JPS61287017A (en) Production of magnetic head
JPS63257910A (en) Thin film magnetic head
JPS60254408A (en) Multiple-layer film magnetic head