JPS6059514A - Production of double azimuth head - Google Patents

Abstract

PURPOSE:To produce two gaps having a prescribed azimuth angle simultaneously under the same condition and to improve accuracy and mass-productivity by working a head shape by a photolithographic process and combining a dry etching method with the photolithographic process. CONSTITUTION:A head core-shaped resist layer 4 is formed on a magnetic film 2 formed on a substrate 1 by the photolithographic process and then inclination etching is performed by the dry etching method to remove a magnetic film from a part on which the resist layer 4 is not formed. Anisotropic beam etching is applied to the inclination etching to work the azimuth angle highly accurately. A gap material 5 is formed between both the magnetic films 2 and an upper magnetic layer 6 is formed between the magnetic film 2 through the gap material 5 to form a gap G with a prescribed azimuth angle. A glass material 7 is made to flow into the intermediate part of the magnetic layer 6 to separate two heat parts.

Description

DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to a method of manufacturing a double azimuth head used as a recording/playback head of a VTR.

(Prior art and problems) Conventional double azimuth heads create an azimuth angle in the gap by machining a magnetic material, such as ferrite, sendust, permalloy, amorphous, etc. S
io2, glass, metal foil) to form one head with a gap, and then combine the two heads with another head made in the same way using glass or adhesive. was.

Therefore, there are many problems such as an increase in the number of steps and the requirement for equal characteristics of the two heads, and the cost is also high.

(Objective of the Invention) The present invention improves the drawbacks listed in - 1. It is possible to manufacture two gaps with a predetermined azimuth angle under the same conditions at the same time, and improves accuracy. - 1. Improves mass productivity and reduces costs. The present invention aims to provide a method for manufacturing a double azimuth head that allows for the production of double azimuth heads.

(Characteristics of the Invention) The main steps of the present invention are to apply semiconductor thin film technology to deposit, sputter, and deposit the magnetic material part of the head.
It can be formed using a broadly defined thin film manufacturing method such as plating. In addition, dry thin film technology can be mainly applied to form the gap portion.

The characteristic process of the present invention lies in the processing of the head shape and the gap surface processing method, in that it is possible to apply anisotropic beam etching that can process the azimuth angle of the gap surface with a tilt angle of 5 to 6 degrees with high precision. It is.

The double azimuth head needs to be manufactured with a pitch between gears of about 370μ and a tolerance of 23μ or less, and it is also necessary to form a separation gap in the center.

Therefore, as a method to manufacture these with satisfactory accuracy,
For example, a double azimuth head can be formed by using a combination of the 7 otolithography method (a method of exposing and developing an organic photosensitive film into a desired shape) and the dry etching method (etching in a gas phase). can be manufactured simultaneously under the same conditions, and can exhibit the characteristics of manufacturing in large quantities with high precision.

(Embodiments of the Invention) Hereinafter, embodiments of a method for manufacturing a double azimuth rad according to the present invention will be described with reference to the drawings.

As shown in FIG. 1, first, a ceramic substrate 1 is cleaned, and then a predetermined magnetic film 2 is formed thereon to a desired thickness using an ordinary thin film manufacturing technique. For example, when producing a permalloy film by sputtering method: DC or RF sputtering (magnetron is also acceptable) Ar pressure: 4. Xl 0-2-4×10-1 pa
Power density: 10-100W/cm2 Substrate temperature:
It can be formed at room temperature to 300°C. In particular, adhesion may be poor depending on the material of the substrate, and in this case, a Cr film or the like is provided in advance on the substrate surface as the adhesive layer 3, as shown in FIG.

Next, a photosensitive resist material such as AZ, CIR, etc. is formed on the formed magnetic film 2 to a predetermined thickness using a spinner or spray, and the paired head core shapes are exposed using a photomask (positive or negative). Then, a resist layer 4 having the shape of the head core as shown in FIG. 2 is formed using a developer. 2-7 The process using the otolithography method is important, and the characteristics of the resist material should be thoroughly understood and the process should be carried out under appropriate conditions. For example, when using CT R70 as the resist material, the following conditions are used.

Particle size: 100cp Temperature: 80°C, time: 30 minutes Exposure: 4 seconds, 10 mW/CIIT2 development: 1 minute OMR rinsing: N-butyl acetate In the above process, the resist layer 4 in the shape of a moon-shaped head core is formed into a magnetic film 2. After the resist layer 4 is formed on the resist layer 4, the magnetic film is then etched using a dry etching method as shown in FIG. 3 to remove the magnetic film in the portion where the resist layer 4 is not formed.

In order to perform a tilted etch, it is necessary to use an anisotropic etch such as an ion beam etch rather than an isotropic etch such as a sputter etch. When ion beam etching is used, the etching is performed with the beam angle set close to the desired azimuth angle θ. At this time, a reactive gas may be used in addition to Ar gas, taking into account the etching rate and the flatness of the etched surface. 5-Optimization of these conditions is determined by experiment. For example, when a Kauffman type ion beam device is used, the etching conditions are: beam angle 26°, Ar pressure: 2 x 10-2 pa, acceleration voltage: 1 kV, current: 4. (10mA stage current: 300mA. If etching is performed under these conditions, approximately 300mA
Azimuth angle 5-6° with etching speed of 400A/min
It is possible to create a slanted side surface for forming a head gap of a certain degree.

Thereafter, as shown in FIG. 4, a gap material 5 is formed and patterned on the top and side surfaces of the gap portions of the pair of magnetic films 2 and between the ceramic films. Then, a two-part magnetic layer is formed on the gap material s-h by plating, sputtering, vapor deposition, etc.
Unnecessary portions are ground to leave the upper magnetic layer 6 between the paired magnetic films as shown in FIG.

As a result, a gap G having a desired azimuth angle is formed between the inclined side surface of the magnetic film 2 and the two-part magnetic layer 6. Then, a groove is cut in the middle of the magnetic layer 6 using a disk 6-live machine, and a glass material 7 is poured into the groove to separate it into two head parts, thereby completing a double azimuth head on the substrate 1. In reality -1-, a large number of double azimuth heads are simultaneously created on the substrate 1-1-, but in the end, the substrate 1 is cut into one double azimuth head.

Note that it is also possible to use a ring graphie pattern that is completely opposite to that shown in the tIS2 diagram, and to use a flame deposition method (a method that leaves a desired pattern when thinning is performed) or a lift-off method.

In addition, the winding for the head core made of magnetic film is
This can be done by mechanically drilling holes or by depositing a winding pattern.

(Effects of the Invention) As explained below in 1-1, according to the method for manufacturing a double azimuth heald of the present invention, two gaps of a predetermined azimuth angle can be manufactured simultaneously under the same conditions, and the accuracy can be improved. , mass productivity can be improved and costs can be reduced.

7-

[Brief explanation of drawings]

Figure 1 is a front cross-sectional view showing the process of forming a magnetic film on a substrate, Figure 2 is a perspective view of the process of applying Renost material on the magnetic film, exposing it to light, developing it, and patterning it. FIG. 2 is a sectional view taken along line III-Tll in FIG. 2 showing the surface of the gear part after tilted ion beam etching. FIG. It is a cross-sectional view of a process in which a two-part magnetic layer is formed, unnecessary parts are ground, a groove is cut in the center using a scribe machine, a glass material is poured in, and separation is completed. DESCRIPTION OF SYMBOLS 1... Ceramic substrate, 2... Magnetic layer, 3... Adhesive layer, 4... Resist layer, 5... Gap material, 6...
- l: Part magnetic layer, 7... Glass material. Patent applicant TDC Co., Ltd. Representative Patent attorney Takashi Murai 8-

Claims (1)

[Claims] (1) Substrate: Form a pair of magnetic films in the shape of a head core using an otolithography method, and then tilt the sides of the magnetic film to make an inclined surface with a desired azimuth angle by etching the remaining pairs. After forming a gap material between the head core-shaped magnetic film and the ceramic film, and further forming a two-part magnetic layer between the ceramic films through the gap material, forming a pair of gaps with desired azimuth angles. . A method for manufacturing a double azimuth head, characterized in that the two-part magnetic layer is magnetically separated.