JPH032231B2 - - Google Patents
Info
- Publication number
- JPH032231B2 JPH032231B2 JP4469282A JP4469282A JPH032231B2 JP H032231 B2 JPH032231 B2 JP H032231B2 JP 4469282 A JP4469282 A JP 4469282A JP 4469282 A JP4469282 A JP 4469282A JP H032231 B2 JPH032231 B2 JP H032231B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- targets
- magnetic field
- core
- facing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004544 sputter deposition Methods 0.000 claims description 35
- 239000000758 substrate Substances 0.000 claims description 11
- 239000000696 magnetic material Substances 0.000 claims description 4
- 238000012546 transfer Methods 0.000 claims description 2
- 230000004907 flux Effects 0.000 claims 2
- 239000010408 film Substances 0.000 description 14
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000003628 erosive effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000012827 research and development Methods 0.000 description 2
- 230000000452 restraining effect Effects 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 229910000976 Electrical steel Inorganic materials 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4469282A JPS58164781A (ja) | 1982-03-23 | 1982-03-23 | 対向タ−ゲツト式スパツタ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4469282A JPS58164781A (ja) | 1982-03-23 | 1982-03-23 | 対向タ−ゲツト式スパツタ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58164781A JPS58164781A (ja) | 1983-09-29 |
| JPH032231B2 true JPH032231B2 (enrdf_load_stackoverflow) | 1991-01-14 |
Family
ID=12698466
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4469282A Granted JPS58164781A (ja) | 1982-03-23 | 1982-03-23 | 対向タ−ゲツト式スパツタ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58164781A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63468A (ja) * | 1986-06-20 | 1988-01-05 | Teijin Ltd | 対向タ−ゲツト式スパツタ装置 |
-
1982
- 1982-03-23 JP JP4469282A patent/JPS58164781A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58164781A (ja) | 1983-09-29 |
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