JPH03215658A - Structure of ornamental film - Google Patents
Structure of ornamental filmInfo
- Publication number
- JPH03215658A JPH03215658A JP1023290A JP1023290A JPH03215658A JP H03215658 A JPH03215658 A JP H03215658A JP 1023290 A JP1023290 A JP 1023290A JP 1023290 A JP1023290 A JP 1023290A JP H03215658 A JPH03215658 A JP H03215658A
- Authority
- JP
- Japan
- Prior art keywords
- film
- base material
- alloy
- dry plating
- metallic base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 claims abstract description 20
- 239000000463 material Substances 0.000 claims abstract description 15
- 229910001260 Pt alloy Inorganic materials 0.000 claims abstract description 9
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 8
- 239000011248 coating agent Substances 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 238000005260 corrosion Methods 0.000 abstract description 10
- 230000007797 corrosion Effects 0.000 abstract description 10
- 238000007733 ion plating Methods 0.000 abstract description 5
- 229910000881 Cu alloy Inorganic materials 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 4
- 238000001704 evaporation Methods 0.000 abstract description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- 239000010936 titanium Substances 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910001069 Ti alloy Inorganic materials 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、耐食性に優れた装飾被膜の構造に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to the structure of a decorative coating with excellent corrosion resistance.
従来、装飾被膜の構造は特開昭５６−１６６０６３号公
報、特開昭６４−２５９６９号公報に開示されているよ
うに、基材と乾式メッキ膜との間に湿式メノキにより、
ｐｄ％ Ｃｒ等のメッキを形成させることによって耐食
性を向上させていた。Conventionally, the structure of a decorative coating is as disclosed in JP-A-56-166063 and JP-A-64-25969, in which wet agate is used between the base material and the dry plating film.
Corrosion resistance was improved by forming pd% Cr plating or the like.
前記従来の装飾被膜の構造はＰｄ，Ｃｒ等の中間層が湿
式メッキ法によるものであり、上層の硬質膜を乾式メッ
キで形成する前に、湿式メッキをあらかじめ形成させな
くてはならず、工数及び千番がかかっていた。さらにメ
ッキ液の残査による密着不良などあり、品質的にも安定
しないなどの問題があった。In the structure of the conventional decorative coating, the intermediate layer of Pd, Cr, etc. is formed by wet plating, and wet plating must be formed before the upper hard layer is formed by dry plating, which requires a lot of man-hours. And a thousand numbers were on it. Furthermore, there were problems such as poor adhesion due to residual plating solution and unstable quality.
本発明の目的は、上述した従来の欠点を無《し、膜形成
においてすべて乾式メッキで形成し、耐食性に優れた装
飾被膜の構造を提供するものである。An object of the present invention is to provide a decorative coating structure which eliminates the above-mentioned conventional drawbacks, which is entirely formed by dry plating, and which has excellent corrosion resistance.
本発明の構成は、金属基材と乾式メッキ膜との間、また
は金属基材上に形成されたＴｉ膜と乾式メッキ膜との間
に、ＰｔまたはＰｔ合金膜を有するものである。The structure of the present invention has a Pt or Pt alloy film between a metal base material and a dry plating film, or between a Ti film formed on a metal base material and a dry plating film.
以下本発明の実施例を図面に基づいて詳述する。 Embodiments of the present invention will be described in detail below based on the drawings.
第１図は第１実施例で、銅合金製時計ケースに形成した
装飾被膜の構造を示す要部断面図、第２図は第２実施例
で、２つの部品を銀ロー材で接合したＴ５合金製メガネ
フレームに形成した装飾被膜の構造を示す要部断面図で
ある。Figure 1 shows the first embodiment, which is a cross-sectional view of the main part showing the structure of the decorative coating formed on the copper alloy watch case. Figure 2 shows the second embodiment, which is a T5 made by joining two parts with silver brazing material. FIG. 2 is a sectional view of a main part showing the structure of a decorative coating formed on an alloy eyeglass frame.
実施例ｌ
金属基材として銅合金製時計ケース１ａを洗浄後、乾式
メッキ装置であるイオンプレーティング装置に配置する
。イオンプレーティング装置の真空槽内を排気後Ａｒガ
スを導入し、ＩＸＩＯ−’Ｐａの圧力、負電位５０Ｖの
加速電圧，アノード電流４０ＡでＡｒガスをイオン化し
、時計ケース１ａの表面にボンバードクリーニングを行
なう。次に、Ｔｉを電子ビーム加熱によって蒸発させ、
時計ケース１ａの表面にＴ１膜２を形成させる。さらに
、同一装置で抵抗加熱源からＰｔを蒸発させ、Ｔ１膜２
の上にＰｔ膜６を０．３μｍ形成させる。その後真空槽
内にエチレンガスを導入し、
７Ｘ１０−’Ｐａの圧力下で再びＴ１を電子ビーム加熱
によって蒸発させ、Ｔｉ蒸気とエチレンガスをイオン化
させ厚さ２μｍの硬質膜であるグレー色の炭化チタン膜
４ａ（乾式メッキ膜）を形成した。Example 1 After cleaning a copper alloy watch case 1a as a metal base material, it is placed in an ion plating device which is a dry plating device. After evacuating the vacuum chamber of the ion plating device, Ar gas was introduced, and the Ar gas was ionized using a pressure of IXIO-'Pa, an accelerating voltage of a negative potential of 50 V, and an anode current of 40 A, and bombard cleaning was performed on the surface of the watch case 1a. Let's do it. Next, Ti is evaporated by electron beam heating,
A T1 film 2 is formed on the surface of a watch case 1a. Furthermore, Pt was evaporated from a resistance heating source in the same apparatus, and the T1 film 2
A Pt film 6 having a thickness of 0.3 μm is formed thereon. After that, ethylene gas was introduced into the vacuum chamber, and T1 was evaporated again by electron beam heating under a pressure of 7 x 10-'Pa to ionize the Ti vapor and ethylene gas, forming a gray titanium carbide film with a thickness of 2 μm. A film 4a (dry plating film) was formed.
この方法にて処理した時計ケース１ａを、キャス試験（
ＪＩＳ Ｈ−８６１７）を行った結果，従来の湿式メ
ッキによる中間層を形成させたものと比べ、すぐれた耐
食性を示す結果が得られた。The watch case 1a treated by this method was tested by Cath test (
JIS H-8617) results showed superior corrosion resistance compared to the intermediate layer formed by conventional wet plating.
実施例２
２つの部品が銀ロウ６で接合されているチタン合金製メ
ガネフレーム１ｂを洗浄し、乾式メノギ装置であるイオ
ンプレーティング装置の真空槽内にセノトする。実施例
１と同様にＴｉ膜２、Ｐｔ膜６を形成した後、真空槽内
にＮ２ガスを導入し、Ｎ２ガスをイオン化し、イオン化
したチタンと反応させ、膜厚１μｍの硬質膜である金色
の窒化チタン膜４ｂ（乾式メノキ膜）を形成した。つぎ
にＮ２ガスを止め仕上げに、金５を膜厚０． ５μｍで
形成させた。その後、真空槽内からメガネフレム１ｂを
取り出し、金５上の一部に溶剤溶解タイプの有機マスク
層を印刷後、金５をシアン系剥離液でエッチングし、つ
づいて硝酸系剥離液で窒化チタン４ｂをエノチングし、
さらにトリクロロエタン中に浸漬して有機マスク層を剥
離した。その結果、金５とＰｔ３の美しいデザイン化さ
れたツ一トンカラーのメガネフレーム１ｂが得られた。Example 2 A titanium alloy eyeglass frame 1b, in which two parts are joined with silver solder 6, is cleaned and placed in a vacuum chamber of an ion plating device, which is a dry agate device. After forming the Ti film 2 and the Pt film 6 in the same manner as in Example 1, N2 gas was introduced into the vacuum chamber, the N2 gas was ionized, and reacted with the ionized titanium to form a hard film of gold color with a thickness of 1 μm. A titanium nitride film 4b (dry agate film) was formed. Next, stop the N2 gas and finish with gold 5 to a thickness of 0. It was formed to have a thickness of 5 μm. After that, the eyeglass frame 1b is taken out from the vacuum chamber, and after printing a solvent-soluble organic mask layer on a part of the gold 5, the gold 5 is etched with a cyanide stripper, and then the titanium nitride 4b is etched with a nitric acid stripper. enoching,
Furthermore, the organic mask layer was peeled off by immersion in trichloroethane. As a result, a beautifully designed two-tone color eyeglass frame 1b of gold 5 and platinum 3 was obtained.
この方法にて処理したメガネフレーム１ｂを実施例１と
同様に耐食性試験をした結果、通常耐食性の悪い銀ロウ
接合部においても良い結果が得られた。The glasses frame 1b treated by this method was subjected to a corrosion resistance test in the same manner as in Example 1, and as a result, good results were obtained even in the silver solder joint, which normally has poor corrosion resistance.
なお、上記各実施例で金属基材とＰｔ膜との間にＴｉ膜
を設けたのは密着性をより向上させるためで、金属基材
の表面に直接Ｐｔ又はｐｉ合金膜を形成しても実用上ま
ったく問題はない。また、Ｐｔ膜は、純Ｐｔ以外にＰｔ
とＡｇ，Ｎｉ、ＣＯ、Ｒｈ，Ｐｄ等とのＰｔ合金でも可
能である。膜形成においては、イオンプレーティング法
での例を示したが、これに代えてアーク式蒸着法やスパ
ンタリング法などのＰＶＤ法やＣＶＤ法の通用なども可
能であることは言うまでもない。本発明において、基材
と上層の間に中間層としてＰｉまたはＰｔ合金層を形成
させることにより耐食性を向上させるものであるので、
基材の種類及び上層の種類に限定されるものではない。In addition, the reason why the Ti film was provided between the metal base material and the Pt film in each of the above examples was to further improve the adhesion. There is no practical problem at all. In addition, the Pt film is made of Pt in addition to pure Pt.
It is also possible to use a Pt alloy with Ag, Ni, CO, Rh, Pd, etc. In film formation, an example of the ion plating method has been shown, but it goes without saying that PVD methods and CVD methods such as arc evaporation method and sputtering method can also be used instead. In the present invention, corrosion resistance is improved by forming a Pi or Pt alloy layer as an intermediate layer between the base material and the upper layer.
The type of base material and the type of upper layer are not limited.
以上の説明で明らかなように、本発明によれば、中間層
としてＰｔまたはＰｔ合金層を乾式メッキにより形成し
たので、Ｐｄ１Ｃｒ等の湿式メッキをすることなく同一
バッチで処理できるので、歩留りよく、短千番かつ安価
に耐食性の良い装飾被膜が得られた。As is clear from the above description, according to the present invention, since the Pt or Pt alloy layer is formed as the intermediate layer by dry plating, processing can be performed in the same batch without wet plating with Pd1Cr, etc., resulting in a high yield. A decorative coating with good corrosion resistance was obtained in a short length and at low cost.
第１図は本発明の第１実施例で、完成した銅合金製時計
ケースの要部断面図、第２図は第２実施例で、銀ロウ材
で２部品乞接合し完成したＴｉ合金製メガネフレームの
要部断面図である。
１ａ・・・・・・時計ケース、
１ｂ・・・・・・メガネフレーム、
２・・・・・・Ｔｉ膜、
６・・・・・・Ｐｔ膜、
４ａ・・・・・・炭化チタン膜、
４ｂ・・・・・・窒化チタン膜、
５・・・・・・金、
６・・・・・・銀ロウ。Fig. 1 shows the first embodiment of the present invention, which is a sectional view of the main parts of a completed copper alloy watch case, and Fig. 2 shows the second embodiment, which is a Ti alloy watch case made by joining two parts with silver brazing material. FIG. 3 is a sectional view of main parts of the glasses frame. 1a...Watch case, 1b...Glasses frame, 2...Ti film, 6...Pt film, 4a...Titanium carbide film , 4b...Titanium nitride film, 5...Gold, 6...Silver solder.
Claims (1)
形成されたＴｉ膜と乾式メッキ膜との間に、Ｐｔまたは
Ｐｔ合金膜を有することを特徴とする装飾被膜の構造。A structure of a decorative coating characterized by having a Pt or Pt alloy film between a metal base material and a dry plating film, or between a Ti film formed on a metal base material and a dry plating film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1023290A JPH03215658A (en) | 1990-01-19 | 1990-01-19 | Structure of ornamental film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1023290A JPH03215658A (en) | 1990-01-19 | 1990-01-19 | Structure of ornamental film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03215658A true JPH03215658A (en) | 1991-09-20 |
Family
ID=11744549
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1023290A Pending JPH03215658A (en) | 1990-01-19 | 1990-01-19 | Structure of ornamental film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03215658A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0651071A1 (en) * | 1993-10-27 | 1995-05-03 | Degussa Aktiengesellschaft | Method for producing parts with wear-resistant coatings |
-
1990
- 1990-01-19 JP JP1023290A patent/JPH03215658A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0651071A1 (en) * | 1993-10-27 | 1995-05-03 | Degussa Aktiengesellschaft | Method for producing parts with wear-resistant coatings |
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