JPH03213139A - Vacuum apparatus - Google Patents
Vacuum apparatusInfo
- Publication number
- JPH03213139A JPH03213139A JP484290A JP484290A JPH03213139A JP H03213139 A JPH03213139 A JP H03213139A JP 484290 A JP484290 A JP 484290A JP 484290 A JP484290 A JP 484290A JP H03213139 A JPH03213139 A JP H03213139A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chamber
- vacuum
- valve
- evacuation
- suction groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003566 sealing material Substances 0.000 claims description 7
- 239000000428 dust Substances 0.000 abstract description 11
- 239000000463 material Substances 0.000 abstract 3
- 230000000694 effects Effects 0.000 description 4
- 238000007789 sealing Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 2
- 208000034809 Product contamination Diseases 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
Description
【発明の詳細な説明】
（概 要〕
真空装置の開閉扉のシール構造の改良に関し、真空室の
真空排気の初期段階において真空室内に塵埃が流入する
のを防止することが可能となる真空装置の提供を目的と
し、
真空室の開口の周囲を取り囲む複数のシール材の間に真
空吸引溝を有し、該真空室の排気を制御する第１の弁と
、前記真空吸引溝の排気を制御する第２の弁とを個別に
有し、該第１の弁及び第２の弁の操作を独立して行うこ
とが可能なよう構成する。[Detailed Description of the Invention] (Summary) A vacuum device that makes it possible to prevent dust from entering the vacuum chamber during the initial stage of evacuation of the vacuum chamber, regarding the improvement of the sealing structure of the opening/closing door of the vacuum device. A vacuum suction groove is provided between a plurality of sealing materials surrounding an opening of a vacuum chamber, a first valve that controls exhaust of the vacuum chamber, and a first valve that controls exhaust of the vacuum suction groove. The first valve and the second valve are configured to be able to be operated independently.
［産業上の利用分野〕
本発明は、真空装置の開閉扉のシール構造の改良に関す
るものである。[Industrial Application Field] The present invention relates to an improvement in the sealing structure of an opening/closing door of a vacuum device.
近年の半導体装置の高集積化に伴う高密度化により、半
導体装置の製造工程において用いられる真空装置に対し
ては、より高い清浄度が要求されている。2. Description of the Related Art Due to the recent increase in the density of semiconductor devices due to their increased integration, higher cleanliness is required of vacuum equipment used in the manufacturing process of semiconductor devices.
真空装置の真空排気の初期段階においてシール部にリー
クがあると、このリーク部を通って装置外の塵埃を真空
室内に吸い込むことになるから、この真空排気の初期段
階におけるリークを皆無にしておくことが必要である。If there is a leak in the seal part during the initial stage of vacuum evacuation of the vacuum equipment, dust from outside the equipment will be sucked into the vacuum chamber through this leak part, so make sure to eliminate any leaks during this early stage of evacuation. It is necessary.
以上のような状況から真空装置の真空υ卜気の初期段階
におけるシール部のリークを皆無にすることが可能な真
空装置が要望されている。Under the above-mentioned circumstances, there is a need for a vacuum device that can completely eliminate leakage from the sealing portion during the initial stage of vacuum pumping of the vacuum device.
従来の真空装置について第３図〜第４図により詳細に説
明する。A conventional vacuum device will be explained in detail with reference to FIGS. 3 and 4.
第３図に示すように真空装置の真空室１１の開口の周囲
のフランジ１２には、シール材、例えば０リング１３が
図示のように溝の中に設けられている。As shown in FIG. 3, a sealing material, for example an O-ring 13, is provided in a groove in a flange 12 around the opening of a vacuum chamber 11 of the vacuum device, as shown.
真空室１１は弁１５を介してポンプ１７と接続されてお
り、このポンプ１７によって真空室１１の室内の空気を
排気することが可能となっている。The vacuum chamber 11 is connected to a pump 17 via a valve 15, and the pump 17 makes it possible to exhaust the air inside the vacuum chamber 11.
この真空室１１内の空気を排気する場合に、まず開閉扉
１４をこのＯリング１３に押し付け、弁１５を開いて真
空室１１内の空気をポンプ１７によって排気すると、真
空室１１の内圧と外圧との差圧により開閉扉１４がＯリ
ング１３に押し付けられてシールされ、真空室１１内圧
を低下させることが可能となるが、第４図に示すように
０リング１３が一個のため、もしもこのＯリング１３と
開閉扉１４の間にわずかでも隙間が生じると、外部の塵
埃が吸引されることがある。When exhausting the air in the vacuum chamber 11, first press the opening/closing door 14 against this O-ring 13, open the valve 15, and exhaust the air in the vacuum chamber 11 with the pump 17. Due to the pressure difference between If there is even a slight gap between the O-ring 13 and the opening/closing door 14, external dust may be sucked in.
以上説明した従来の真空装置においては、真空室の内圧
と外圧との差圧が小さな真空室の初期排気段階において
、開閉扉を押し付ける力が弱い場合や、この力が不均一
な場合には、真空室外の空気が室内に流入することがあ
り、このため外部の塵埃が流入して室内で舞い上がるこ
とになり、このために真空室内において処理する製品が
汚染されるという問題点があった。In the conventional vacuum apparatus described above, in the initial evacuation stage of the vacuum chamber where the differential pressure between the internal pressure and the external pressure is small, if the force pressing the opening/closing door is weak or if this force is uneven, Air from outside the vacuum chamber may flow into the vacuum chamber, which causes dust from the outside to flow into the vacuum chamber, causing a problem in that products processed in the vacuum chamber are contaminated.
本発明は以上のような状況から、真空室の真空排気の初
期段階に真空室内において塵埃が流入するのを防止する
ことが可能となる真空装置の提供を目的としたものであ
る。SUMMARY OF THE INVENTION In view of the above-mentioned circumstances, the present invention aims to provide a vacuum device that can prevent dust from entering a vacuum chamber during the initial stage of evacuation of the vacuum chamber.
本発明の真空装置は、真空室の開口の周囲を取り囲む複
数のシール材の間に真空吸引溝を有し、この真空室の排
気を制御する第１の弁と、この真空吸引溝の排気を制御
する第２の弁とを個別に有し、これらの第１の弁及び第
２の弁の操作を独立して行うことが可能なよう構成する
。The vacuum device of the present invention has a vacuum suction groove between a plurality of sealing materials surrounding an opening of a vacuum chamber, and includes a first valve that controls exhaust of the vacuum chamber, and a first valve that controls exhaust of the vacuum suction groove. and a second valve to be controlled separately, and the first valve and the second valve are configured to be able to be operated independently.
即ち本発明においては、真空室の開口の周囲を取り囲む
複数のシール材の間に真空吸引溝を設け、この真空室の
排気を制御する第１の弁と、この真空吸引溝の排気を制
御する第２の弁とを別々に設けているので、まずこの第
２の弁を開いて真空吸引溝の中の空気を排気すると、こ
の真空吸引溝が減圧されて開閉扉がシール材に押しつけ
られてシールされる。That is, in the present invention, a vacuum suction groove is provided between a plurality of sealing materials surrounding the opening of the vacuum chamber, and a first valve that controls the exhaust of the vacuum chamber and a first valve that controls the exhaust of the vacuum suction groove are provided. Since the second valve is provided separately, when the second valve is first opened to exhaust the air in the vacuum suction groove, the pressure in the vacuum suction groove is reduced and the opening/closing door is pressed against the sealing material. It will be sealed.
この際リークがあっても直ちに真空吸引溝を経由して排
気されるから、仮りに隙間が生じて塵埃が吸引されるこ
とがあっても真空室内には流入しない。At this time, even if there is a leak, it is immediately exhausted via the vacuum suction groove, so even if a gap occurs and dust is sucked in, it will not flow into the vacuum chamber.
その後この第１の弁を開いて真空室内の空気を排気する
と、真空室を清浄な状態でその室内圧を所望の圧力に保
持することが可能となる。Thereafter, by opening this first valve and exhausting the air in the vacuum chamber, it becomes possible to maintain the vacuum chamber in a clean state and maintain the indoor pressure at a desired pressure.
以下第１図〜第２図により本発明による一実施例の真空
装置について詳細に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS A vacuum apparatus according to an embodiment of the present invention will be described in detail below with reference to FIGS. 1 and 2.
第１図に示すように真空装置の真空室１の開口の周囲の
フランジ２には、真空吸引溝２ａが設けられており、こ
の内側及び外側にはシール材、例えば０リング３ａと３
ｂとが図示のように溝の中に設けられている。真空室１
は第１の弁５を介してポンプ７と接続されており、この
ポンプ７によって真空室１の室内の空気を排気すること
が可能である。As shown in FIG. 1, a vacuum suction groove 2a is provided in the flange 2 around the opening of the vacuum chamber 1 of the vacuum device, and sealing materials such as O-rings 3a and 3 are provided on the inside and outside of this groove.
b are provided in the groove as shown. Vacuum chamber 1
is connected to a pump 7 via a first valve 5, and the pump 7 can exhaust the air inside the vacuum chamber 1.
また、真空吸引溝２ａは第２の弁６を介してポンプ７と
接続されており、このポンプ７によって真空吸引溝２ａ
内の空気を排気することが可能である。Further, the vacuum suction groove 2a is connected to a pump 7 via a second valve 6, and this pump 7 connects the vacuum suction groove 2a.
It is possible to exhaust the air inside.
まず、第２の弁６を開いて真空吸引溝２ａ内の空気を排
気すると、開閉扉４が外圧と真空吸引溝２ａ内の空気圧
との差圧によってこのＯリング３ａ及び３ｂに押し付け
られる。First, when the second valve 6 is opened to exhaust the air in the vacuum suction groove 2a, the opening/closing door 4 is pressed against the O-rings 3a and 3b due to the differential pressure between the external pressure and the air pressure in the vacuum suction groove 2a.
この場合内側のＯリング３ａの直径を１００ｃｍ、外側
の０リング３ｂの直径を１０４Ｑとし、真空吸引溝２ａ
内の圧力をＩ Ｘ １０−’Ｔｏｒｒとすると、開閉扉
４は６４０ｋｇの力でＯリング３ａ及び３ｂに押し付け
られる。In this case, the diameter of the inner O-ring 3a is 100 cm, the diameter of the outer O-ring 3b is 104Q, and the vacuum suction groove 2a is
If the internal pressure is I x 10-'Torr, the opening/closing door 4 is pressed against the O-rings 3a and 3b with a force of 640 kg.
その後、第１の弁５を開いて真空室１内の空気をポンプ
７によって排気すると、真空室を清浄な状態でその室内
圧を所望の圧力に保持することが可能となる。Thereafter, the first valve 5 is opened and the air in the vacuum chamber 1 is evacuated by the pump 7, thereby making it possible to keep the vacuum chamber in a clean state and maintain the indoor pressure at a desired pressure.
このように真空室１の開口の周囲に設けたフランジ２に
、Ｏリング３ａと３ｂの間に設けた真空吸引溝２ａを独
立して排気することにより、真空室１の真空排気の初期
段階において真空室ｌへ吸い込まれる塵埃を除去するこ
とが可能となるので、真空室１を清浄な状態に保つこと
が可能となり、製品の汚染を防止することが可能である
。In this way, by independently evacuating the vacuum suction groove 2a provided between the O-rings 3a and 3b in the flange 2 provided around the opening of the vacuum chamber 1, it is possible to Since it is possible to remove dust sucked into the vacuum chamber 1, it is possible to maintain the vacuum chamber 1 in a clean state, and it is possible to prevent product contamination.
なお本実施例においては、一つの真空吸引溝と二つの０
リングを用いたが、真空吸引溝を二つ以上にし、それに
応じてＯリングを増設すれば、更に本発明の効果を高め
ることが可能となる。In this embodiment, there is one vacuum suction groove and two vacuum suction grooves.
Although a ring is used, the effects of the present invention can be further enhanced by providing two or more vacuum suction grooves and adding O-rings accordingly.
また、真空源としてのポンプ７を共用しているが、それ
ぞれに適したポンプを単独に設けることも可能である。Further, although the pump 7 is shared as a vacuum source, it is also possible to provide independent pumps suitable for each.
以上の説明から明らかなように本発明によれば極めて簡
単な構造の変更により、真空室の排気の初期段階におい
て外気とともに塵埃が流入するのを防止することが可能
となり、真空室内にて処理する製品の品質低下を防止す
ることが可能となる等の利点があり、著しい信頼性向上
の効果が期待できる真空装置の提供が可能となる。As is clear from the above description, according to the present invention, by extremely simple structural changes, it is possible to prevent dust from flowing in together with outside air during the initial stage of evacuation of the vacuum chamber. It is possible to provide a vacuum device that has advantages such as being able to prevent product quality deterioration, and can be expected to have the effect of significantly improving reliability.
第１図は本発明による一実施例を示す側断面図、第２図
は第１図のＡ−Ａ矢視図、
第３図は従来の真空装置を示す側断面図、第４図は第３
図のＢ−Ｂ矢視図、
である。
図において、
１は真空室、
２はフランジ、
２ａは真空吸引溝、
３ａ、３ｂは０リング、
４は開閉扉、
５は第１の弁、
６は第２の弁、
７はポンプ、
を示す。
本発明による一実施例を示す側断面１
第
図
第１図のべ
Ａ矢視図
朱
図
従来の真空装置を示す側断面図FIG. 1 is a side sectional view showing an embodiment of the present invention, FIG. 2 is a view taken along the line A-A in FIG. 1, FIG. 3 is a side sectional view showing a conventional vacuum device, and FIG. 3
This is a view taken along the line B-B in the figure. In the figure, 1 is a vacuum chamber, 2 is a flange, 2a is a vacuum suction groove, 3a and 3b are O rings, 4 is an opening/closing door, 5 is a first valve, 6 is a second valve, and 7 is a pump. . Side cross-section 1 showing one embodiment of the present invention Fig. 1 A-arrow view in red Red side cross-sectional view showing a conventional vacuum device
Claims (1)
（３ａ，３ｂ）の間に真空吸引溝（２ａ）を有し、該真
空室（１）の排気を制御する第１の弁（５）と、前記真
空吸引溝（２ａ）の排気を制御する第２の弁（６）とを
個別に有し、該第１の弁（５）及び第２の弁（６）の操
作を独立して行うことが可能なことを特徴とする真空装
置。A first valve (5) having a vacuum suction groove (2a) between a plurality of sealing materials (3a, 3b) surrounding the opening of the vacuum chamber (1) and controlling the exhaust of the vacuum chamber (1). ) and a second valve (6) for controlling the exhaust of the vacuum suction groove (2a), and the first valve (5) and the second valve (6) can be operated independently. A vacuum device characterized in that it is capable of performing
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP484290A JPH03213139A (en) | 1990-01-11 | 1990-01-11 | Vacuum apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP484290A JPH03213139A (en) | 1990-01-11 | 1990-01-11 | Vacuum apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03213139A true JPH03213139A (en) | 1991-09-18 |
Family
ID=11594940
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP484290A Pending JPH03213139A (en) | 1990-01-11 | 1990-01-11 | Vacuum apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03213139A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011084788A (en) * | 2009-10-16 | 2011-04-28 | Sharp Corp | Gate valve, vacuum treatment apparatus, and method for producing semiconductor device |
-
1990
- 1990-01-11 JP JP484290A patent/JPH03213139A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011084788A (en) * | 2009-10-16 | 2011-04-28 | Sharp Corp | Gate valve, vacuum treatment apparatus, and method for producing semiconductor device |
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