JP3463785B2 - Sealing device and processing device - Google Patents

Description

Detailed Description of the Invention

The present invention relates to a sealing device and a processing device .

[0002]

2. Description of the Related Art A processing container having a processing gas atmosphere and a reduced pressure atmosphere inside, and a sealing device is used to seal between the facing surfaces of the sealing portions of the processing container. For example, there is a heat treatment apparatus used in the manufacturing process of semiconductor devices. This heat treatment apparatus has a reaction tube that is a processing container that accommodates a semiconductor wafer that is an object to be processed, and a heater that heats the inside of the reaction tube to a predetermined temperature is provided around the reaction tube.

A manifold having a gas supply pipe portion and an exhaust pipe portion for supplying and exhausting a processing gas and the like is connected to the opening end of the reaction tube, and the opening end of the manifold opening as a furnace opening can be opened and closed. It is designed to be closed by a simple lid. A gas supply pipe for supplying a processing gas or an inert gas is connected to the gas supply pipe portion of the manifold, and the exhaust pipe portion has a vacuum pump or the like for creating a predetermined reduced pressure atmosphere in the reaction pipe. Exhaust pipe is connected.

In the above heat treatment apparatus, in order to keep the inside of the reaction tube in a processing gas atmosphere and a reduced pressure atmosphere, the connecting portion between the reaction tube and the manifold, the contact portion between the manifold and the lid, etc. keep the inside of the reaction tube airtight. And the sealing device is provided in these sealing portions. Various types of such sealing devices have been proposed (see, for example, Japanese Utility Model Laid-Open No. 12336/1990).

Conventionally, a generally used sealing device is configured to seal between mutually facing surfaces of a sealing portion via an O-ring. Further, as a sealing device having high heat resistance, a metal sheet is sandwiched between mutually facing surfaces of a sealing portion, and the metal sheet is adsorbed to the facing surface by an exhaust means through an annular groove formed in the facing surface. There are things that I tried to let you do.

However, in the conventional sealing device, when the inside of the reaction tube is in a high vacuum state, it is difficult to obtain a sufficient sealing effect, and there is a problem that a leak easily occurs from the outside into the container. there were. Further, since the O-ring and the metal sheet are exposed in the reaction tube through the gap between the facing surfaces of the sealing portion, in the case of the O-ring,
Release of gas and water content (also called degassing) from the ring may cause problems in heat treatment, or in the case of metal sheet, the metal sheet may be corroded by contact with corrosive processing gas. However, there is a problem that metal contamination of the wafer is likely to occur.

Therefore, in order to solve the above-mentioned problems, the applicant of the present invention has an inner peripheral seal portion for sealing the inner peripheral side opposing surfaces in mutual contact between the opposing surfaces of the sealing portion, and an outer peripheral surface. An outer peripheral seal portion for sandwiching and sealing a metal sheet is provided between the side facing surfaces,
The first exhaust means for adsorbing the metal sheet is connected to the annular groove part formed on the outer peripheral side facing surface, and the second exhaust means is connected to the annular space part formed between the inner peripheral seal part and the outer peripheral seal part. Applied for a sealing device consisting of the above (Japanese Patent Application No. 9-541).
No. 54, unpublished). According to this sealing device, a high sealing effect can be obtained even when the inside of the processing container is in a high vacuum state, and it becomes possible to sufficiently suppress or prevent leakage, and when applied to a heat treatment device. Problems such as metal contamination can also be solved.

[0008]

However, since the above-mentioned sealing device is designed for processing under high vacuum, the inside of the processing container is evacuated to a pressure near atmospheric pressure. If the annular space is evacuated to a high vacuum by the second evacuation means in the same manner as in a high vacuum process, the pressure difference causes the process. It is conceivable that the processing gas may be sucked from the inside of the container to the annular space side via the inner peripheral seal portion. Further, if the processing gas is sucked out from the inside of the processing container, not only the process environment inside the processing container is adversely affected, but also the device constituting the second exhaust means is exposed to the processing gas and corroded. The problem of occurs.

Therefore, the present invention has been made to solve the above-mentioned problems, and a sealing device and a treatment capable of obtaining a high sealing effect with a simple structure not only in a high vacuum process but also in a so-called slight depressurization process. The purpose is to provide a device .

[0010]

In order to achieve the above object, the sealing device according to claim 1 of the present invention is a facing surface of a sealing portion of a processing container, the inside of which is a processing gas atmosphere and a reduced pressure atmosphere. In the device for sealing the space, between the facing surfaces,
An annular seal formed on the outer peripheral side facing surface by providing an inner peripheral seal portion that seals the inner peripheral side facing surfaces with each other by sealing and an outer peripheral seal portion that sandwiches and seals a metal sheet between the outer peripheral side facing surfaces. A first exhaust means for adsorbing the metal sheet is connected to the groove portion, and a second exhaust means is connected to an annular space portion formed between the inner peripheral seal portion and the outer peripheral seal portion. It is characterized in that it has a connecting pipe for connecting the exhaust pipe and the annular space when the inside of the processing container is exhausted by an exhaust pipe so as to have a pressure near atmospheric pressure and processing is performed.

The sealing device according to the second aspect is characterized in that the sealing portion is provided at a connecting portion between the processing container and the manifold and at an abutting portion between the manifold and the lid.

The sealing device according to a third aspect is characterized in that the second exhaust means has an inert gas supply pipe for supplying an inert gas to the connection pipe. Claim 4
The inside of the processing equipment has a processing gas atmosphere and a reduced pressure atmosphere.
A processing container having a sealing portion that seals between the opposed surfaces.
In the processing device, the inner peripheral facing surfaces are arranged between the facing surfaces.
Inner peripheral seal part that makes surface contact with and seals against the outer peripheral side
A metal sheet 8 is sandwiched between the outer peripheral seal portion for sealing.
A metal sheet is provided in the annular groove formed on the facing surface on the outer peripheral side.
The first exhaust means for adsorbing the
The second exhaust hand is placed in the annular space formed between the peripheral seal and
The second exhaust means connects the stages and exhausts the inside of the processing container.
Evacuated by the trachea to a pressure near atmospheric pressure for processing
Connect the exhaust pipe and annular space during the slight depressurization process.
It is characterized by having a connecting pipe.

[0013]

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a sectional view of a sealing device showing an embodiment of the present invention, FIG. 2 is a perspective view showing a metal sheet used in the sealing device in a partially cutaway state, and FIG. 3 is a vertical heat treatment device of the present invention. It is a longitudinal section showing an applied example.

First, an example in which the present invention is applied to a vertical heat treatment apparatus which is one of the processing apparatuses used in the manufacturing process of semiconductor devices will be described with reference to FIG. This vertical heat treatment apparatus has, as a processing container, a reaction tube 1 made of a material having heat resistance and corrosion resistance, for example, quartz glass. The outside of the reaction tube 1 is on the atmospheric pressure side. The reaction tube 1 has a vertically long cylindrical shape, and has an upper end closed and a lower end opened. A cylindrical manifold 4 having a gas supply pipe 2 and an exhaust pipe 3 for supplying and exhausting a processing gas and the like on its side wall is connected to the open end of the reaction pipe 1.

The manifold 4 is generally made of a material having heat resistance and corrosion resistance, such as stainless steel. The manifold 4 may be formed of, for example, silicon carbide (SiC) in order to have higher corrosion resistance. The manifold 4 is attached to a base plate 5 horizontally arranged above via a mounting member (not shown), and the reaction tube 1 is installed on the manifold 4.

Inside the manifold 4, a cylindrical inner tube 6 made of quartz glass is attached in an upright state, and the reaction tube 1 is formed by the inner tube 6 and the reaction tube 1 which is an outer tube.
Preferably has a double-tube structure. The gas supply pipe portion 2 is provided so as to supply the processing gas and the like upward along the inner side of the inner pipe 6, and the exhaust pipe portion 3 is an annular shape between the inner pipe 6 and the reaction pipe 1. It is provided so as to exhaust the treated exhaust gas from the passage 7.

A heater 8 is arranged around the reaction tube 1 in order to heat the inside of the reaction tube 1 to a predetermined temperature, for example, 500 to 1200 ° C. In this heater 8, a heater wire (heating resistance wire) 9 is formed into a coil shape, the outside of the heater wire 9 is covered with a heat insulating material 10, and the heat insulating material 10 is further covered.
The outer shell 11 is covered with an outer shell 11 such as a cooling jacket. The heater 8 is installed on the base plate 5.

The open end of the lower end of the manifold 4 is adapted to be opened and closed by a lid 12. The lid 12 is formed of a material having heat resistance and corrosion resistance, for example, stainless steel. On the lid 12, a boat 14 made of, for example, quartz, which is a holder for an object to be processed, is placed via a heat insulating cylinder 13 made of, for example, quartz. In the boat 14, a large number of wafers W, which are the objects to be processed, are held in a horizontal direction at predetermined intervals in the height direction, for example, about 150 wafers.

The lid 12 is attached to an elevating arm 16 of an elevating mechanism 15. The elevating mechanism 15 opens and closes the lid 12 and carries the boat 14 into and out of the reaction tube 1. ing. The lid 12
It is preferable that a rotating mechanism (not shown) for rotating the boat 14 around the shaft via the heat retaining cylinder 13 is provided in the. A gas supply pipe portion 2 provided on a side wall of the manifold 4 is connected to a gas supply pipe 17 which communicates with a supply source of processing gas and the like, and an exhaust pipe portion 3 is connected to an exhaust pipe 18 which communicates with an exhaust system. ing. The exhaust pipe 18 has a decompression control device (not shown) having a vacuum pump or the like (not shown) capable of decompressing the inside of the reaction pipe 1 to a predetermined decompressed atmosphere or degree of vacuum, for example, from around atmospheric pressure to about 10 ^-8 Torr. Is provided.

In the vertical heat treatment apparatus constructed as described above, in order to keep the inside of the reaction tube 1 in a predetermined processing gas atmosphere and a reduced pressure atmosphere, the reaction tube 1 and the manifold 4 are arranged.
To the connecting portion of and the contact portion between the manifold 4 and the lid 11,
Sealing portions 19a and 19b for keeping the inside of the reaction tube 1 airtight are provided, and a sealing device is provided to these sealing portions 19a and 19b.

Next, the sealing device will be described with reference to FIG. FIG. 1 shows an example in which a sealing device is applied to the sealing portion 19 a between the reaction tube 1 and the manifold 4.
The sealing device provided in the sealing portion 19b between the manifold 4 and the lid 12 has the same configuration. Sealing portion 18a
Are preferably formed by flanges 21a, 21b so as to have wide facing surfaces 20 facing each other. In this case, flanges 21 a and 21 b facing each other are formed at the open end of the reaction tube 1 and the open end of the manifold 4. When the manifold 4 is made of silicon carbide, the flange portion 21b may not necessarily be formed if the thickness of the manifold 4 is increased.

The facing surface 2 of the reaction tube 1 and the manifold 4
0, an inner circumferential seal portion 22 that seals the inner circumferential side facing surfaces 20a by bringing them into surface contact with each other, and an outer circumferential seal portion 24 that sandwiches and seals the metal sheet 23 between the outer circumferential side facing surfaces 20b are provided. Has been. The inner peripheral side facing surface 20a forming the inner peripheral seal portion 22 is preferably mirror-finished so as to be in close contact with each other by surface contact to obtain a high sealing effect.

The annular groove 2 is formed on the outer peripheral side facing surface 20b.
5 are formed, and the metal sheet 2 is formed in these annular groove portions 25.
A first exhaust means 26 for adsorbing 3 to the outer peripheral side facing surface 20b is connected. The metal sheet 23 is
As shown in FIG. 2, two corrosion-resistant materials such as stainless steel annular thin plates 23a and 23b are overlapped,
Both thin plates 23a and 23b are joined by welding 23c at the inner peripheral portion.

The metal sheet 23 includes two thin plates 23a,
Since the outer peripheral side of 23b is open to the atmosphere side, atmospheric pressure acts between both thin plates 23a and 23b, and each thin plate 23a
Each of a and 23b is sufficiently adsorbed to the outer peripheral side facing surface 20b having the annular groove portion 25 that is exhausted under reduced pressure so that the outer peripheral side facing surface 20b can be sealed. The first exhaust means 26 is provided with the both flanges 21.
pipes 27a and 27b provided in a and 21b so as to communicate with the respective annular groove portions 25, and these pipes 27a and 27a,
27b and a first reduced pressure exhaust device 28 provided in a common exhaust system. It is preferable that the first depressurization exhaust device 28 is composed of, for example, a dry pump.

The inner peripheral sealing portion 22 and the outer peripheral sealing portion 24
An annular space portion 29 is formed between and, and a second exhaust means 30 is connected to the annular space portion 29. The second exhaust means 30 includes the flange 21a,
A pipe 31 provided on one of the flanges 21b, for example, the flange 20a on the reaction tube 1 side so as to communicate with the annular space 29, and a second decompression exhaust device 32 provided on the pipe 31. It is composed of and. It is preferable that the second depressurization exhaust device 32 is configured by, for example, a turbo molecular pump.

The inside of the reaction tube 1 is in a high vacuum, for example, 10 ^-7 Tor
When a high vacuum process of r is performed, the value of the leak in the inner peripheral seal portion 22 is extremely small, for example, 10 ^-2.
In order for the inner peripheral facing surfaces 20a to be in close contact with each other so that the leak rate is 10 ^-4 Torr · l / sec or less,
The annular space 29 has a predetermined high degree of vacuum, for example, 10 ⁻⁴ to 10 ⁻⁷ TorrTo by the second decompression exhaust device 32.
It is preferable to evacuate to rr. Further, the annular groove portion 25 of the outer peripheral seal portion 24 is provided in the first reduced pressure exhaust device 2
8 has a predetermined low vacuum degree, for example, 10 to 10 ^-2 Tor
It is preferable to evacuate to r.

On the other hand, the second exhaust means 30 exhausts the inside of the reaction tube 1 by the exhaust tube 18 so that the pressure becomes close to the atmospheric pressure and performs the processing (slight decompression process) and the exhaust tube 18 and the above-mentioned. It has a connecting pipe (also called a bypass pipe) 33 that connects the annular space 29. In this case, the connecting pipe 33
Has one end connected to the pipe 31 of the second exhaust means 30,
The other end is connected to the exhaust pipe 18. Second exhaust means 3
In order to switch to either reduced pressure exhaust by the second reduced pressure exhaust device 32 constituting 0 or reduced pressure exhaust using the exhaust pipe 18, valves 34 and 35 are provided in the pipe 31 and the connecting pipe 33.
Is provided. The valve 34 is provided between the connection portion of the connection pipe 33 in the pipe 31 and the second depressurization exhaust device 32.

The above-mentioned slight decompression process is performed by exhausting the inside of the reaction tube to a pressure near atmospheric pressure, for example, 100 to 760 Torr, so that the annular space 29 and the exhaust pipe 18 are connected to each other by the connecting pipe 33.
The annular space 29 is connected to the reaction tube 1
The pressure can be made almost the same as that in the inside, and the suction of the processing gas from the inside of the reaction tube 1 to the annular space portion 29 through the inner peripheral seal portion 22 can be prevented with an extremely simple structure.
Also in the case of this slight decompression process, as in the case of the high vacuum process, the annular groove portion 25 of the outer peripheral seal portion 24 is formed.
Is a predetermined low vacuum degree by the first depressurization exhaust device 28,
For example, it is preferable to evacuate to 10 to 10 ^-2 Torr.

Further, the second exhaust means 30 is provided with an inert gas in the connecting pipe 33 in order to prevent the reverse inflow of exhaust gas from the exhaust pipe 18 into the annular space 29 through the connecting pipe 33. It has an inert gas supply pipe 36 for supplying (also called purge gas). A valve 37 is provided in the inert gas supply pipe 36. As the inert gas, for example, nitrogen (N ₂ ) gas is preferable. Inert gas supply pipe 3
Although 6 is connected to the connecting portion between the pipe 31 and the connecting pipe 33 in the illustrated example, it may be connected to the pipe 31 or may be connected to the connecting pipe 33.

According to the sealing device configured as described above, in the device for sealing between the facing surfaces 20 of the sealing portions 19a and 19b of the reaction tube 1 whose inside is the processing gas atmosphere and the reduced pressure atmosphere, The inner peripheral facing surface 2 is provided between the facing surfaces 20.
An inner peripheral seal portion 22 that seals 0a by making surface contact with each other;
An outer peripheral seal portion 24 for sandwiching and sealing the metal sheet 23 is provided between the outer peripheral side facing surfaces 20b, and a first exhaust means 26 for adsorbing the metal sheet 23 is connected to an annular groove 25 formed in the outer peripheral side facing surface 20b. Then, the second exhaust means 30 is connected to the annular space 29 formed between the inner peripheral seal portion 22 and the outer peripheral seal portion 24.

Therefore, when performing a high vacuum process in which the inside of the reaction tube 1 is set to a high vacuum, the annular space portion 29 is subjected to the second exhaust so that the pressure difference between the inside and the outside of the inner peripheral seal portion 22 becomes small. By performing the reduced pressure exhaust by the means 30, a high sealing effect can be obtained, leakage can be sufficiently suppressed or prevented, and problems such as metal contamination and heat resistance when applied to a heat treatment apparatus can be solved. When performing the high vacuum process, the valve 35 of the connection pipe 33 and the valve 37 of the inert gas supply pipe 36 are closed, and the second exhaust means 3 is closed.
The valve 34 of the 0 pipe 31 may be opened.

Although the metal sheet 23 is made of a material having corrosion resistance, it is corroded when it comes into contact with a processing gas having corrosiveness, and is made of metal. It also becomes a pollution source. However, since the inner peripheral seal portion 22 is provided in the sealing portion 19a, the metal sheet 23 is not exposed in the reaction tube 1, and the annular space portion 29 is evacuated, so that Since the pressure difference between the inside and the outside of the peripheral seal portion 22 is reduced to suppress or prevent the leak in the inner peripheral seal portion 22, the metal sheet 23 is corroded even if a corrosive process gas is used. In addition, the metal sheet 23 does not become a contamination source of the wafer W.

And, in particular, the second exhaust means 30
However, when the inside of the reaction tube 1 is evacuated by the exhaust pipe 18 so as to have a pressure near atmospheric pressure, the exhaust pipe 18
When the so-called slight decompression process is performed, the exhaust pipe 1 is provided because it has the connecting pipe 33 that connects the above-mentioned annular space 29.
The annular space 29 can be made to have almost the same pressure as that in the reaction tube 1 with a simple configuration using the valve 8, and the suction from the inside of the reaction tube 1 to the annular space 29 via the inner peripheral seal portion 22 is prevented. It is possible to obtain a high sealing effect. Therefore, the process environment in the reaction tube 1 can be maintained in an optimum state, and the equipment constituting the second exhaust means 30 is not exposed to the processing gas to cause corrosion or the like. When performing the above-mentioned slight decompression process, the pipe 3 of the second exhaust means 30
The valve 34 of No. 1 may be closed, and the valve 35 of the connecting pipe 33 and the valve 37 of the inert gas supply pipe 36 may be opened.

As described above, according to the above sealing device, a high sealing effect can be obtained with a simple structure not only in the high vacuum process but also in the so-called slight depressurization process. Further, since the second exhaust means 30 has the inert gas supply pipe 36 for supplying the inert gas to the connection pipe 33, a small amount of the inert gas is supplied to the connection pipe 33 during the slightly depressurizing process. By flowing, the connection pipe 3 from the exhaust pipe 18 to the annular space 29
It is possible to prevent the reverse infiltration of exhaust gas through 3, and it is possible to protect the metal sheet 23 and the like from corrosive exhaust gas.

Although the embodiments of the present invention have been described in detail with reference to the drawings, the present invention is not limited to the above embodiments, and various design changes and the like without departing from the gist of the present invention. Is possible. For example, since the sealing device of the present invention has high heat resistance, the reaction tube 1 and the manifold 4 are
It is preferably applied to the connecting portion (sealing portion) 19a and the contact portion (sealing portion) 19b between the manifold 4 and the lid 12,
It is also applicable to the connection portion (sealing portion) 19c between the gas supply pipe portion 2 and the gas supply pipe 17 of the manifold 4 and the connection portion (sealing portion) 19d between the exhaust pipe portion 3 and the exhaust pipe 18. In the above embodiment, the vertical heat treatment apparatus is described as an example, but it may be applied to a heat treatment apparatus such as a diffusion furnace or an atmospheric pressure CVD apparatus, and is not limited to the vertical type apparatus and can be applied to a horizontal type apparatus. Is. Further, the present invention is not limited to the heat treatment apparatus, and can be applied to a processing apparatus such as an etching apparatus or an ion implantation apparatus as long as it has a sealing portion.

[0036]

In summary, according to the present invention, the following excellent effects can be obtained.

(1) According to the sealing device of the first aspect,
In a device for sealing between facing surfaces of a sealing portion of a processing container, the inside of which is a processing gas atmosphere and a reduced pressure atmosphere, the inside facing surfaces are mutually brought into surface contact with each other and sealed. A peripheral seal part and an outer peripheral seal part for sandwiching and sealing the metal sheet between the outer peripheral side facing surfaces are provided, and a first exhaust means for adsorbing the metal sheet is connected to the annular groove part formed on the outer peripheral side facing surface, A second exhaust means is connected to an annular space portion formed between the inner peripheral seal portion and the outer peripheral seal portion, and the second exhaust means keeps the pressure inside the processing container near the atmospheric pressure by the exhaust pipe. Since there is a connection pipe that connects the exhaust pipe and the annular space when performing exhaustion and processing, a high sealing effect can be obtained with a simple configuration not only in the high vacuum process but also in the so-called slight decompression process.

(2) According to the sealing device of the second aspect,
Since the sealing portion is provided at each of the connecting portion between the processing container and the manifold and the contact portion between the manifold and the lid, the airtightness of the processing container can be significantly improved.

(3) According to the sealing device of the third aspect,
Since the second exhaust means has an inert gas supply pipe for supplying an inert gas to the connection pipe, the exhaust pipe is connected to the annular space by flowing a small amount of inert gas into the connection pipe. It is possible to prevent the reverse entry of exhaust gas through the pipe. (4) According to the processing apparatus of claim 4, the inside is a processing gas.
Between the opposing surfaces of the processing container that is in a vacuum atmosphere or a reduced pressure atmosphere
In a processing device having a sealing part for sealing
Between the surfaces, the inner peripheral side facing surfaces are in surface contact with each other and sealed.
The metal sheet 8 is sandwiched between the peripheral seal portion and the outer peripheral side facing surface.
Provided with the outer peripheral seal part that is sealed with
Exhaust means for adsorbing a metal sheet in the formed annular groove
Connected between the inner and outer peripheral seals.
The second exhaust means is connected to the annular space, and the second exhaust means is connected.
The gas means is a pressure in the vicinity of atmospheric pressure in the processing container by an exhaust pipe.
During the slight decompression process in which exhaust is performed to force and processing is performed
It had a connecting pipe connecting the exhaust pipe and the annular space.
Therefore, not only high vacuum process but also so-called slight decompression process
Even in the case of a sheet, a high sealing effect can be obtained with a simple structure.

[Brief description of drawings]

FIG. 1 is a cross-sectional view of a sealing device showing an embodiment of the present invention.

FIG. 2 is a perspective view showing a metal sheet used in the sealing device in a partially cutaway state.

FIG. 3 is a vertical sectional view showing an example in which the present invention is applied to a vertical heat treatment apparatus.

[Explanation of symbols]

1 Reaction tube (processing container) 4 manifold 12 Lid 18 Exhaust pipe 18a, 18b Sealing part 20 Opposing surface 20a Inner peripheral side facing surface 20b Outer peripheral side facing surface 22 Inner circumference seal part 23 Metal Sheet 24 Perimeter seal 25 annular groove 26 First Exhaust Means 29 Ring space 30 Second exhaust means 33 Connection tube 36 Inert gas supply pipe

Front page continued (58) Fields surveyed (Int.Cl. ⁷ , DB name) H01L 21/26-21/268 H01L 21/322-21/324 B01J 3/02 H01L 21/205 H01L 21/22-21 /twenty four

Claims (4)

(57) [Claims] 1. An apparatus for sealing between facing surfaces of a sealing portion of a processing container, the inside of which is a processing gas atmosphere and a reduced pressure atmosphere, wherein inner facing surfaces are in surface contact with each other. A first exhaust for adhering the metal sheet to an annular groove formed on the outer peripheral facing surface, the inner peripheral seal portion for sealing and the outer peripheral sealing portion sandwiching the metal sheet 8 between the outer peripheral facing surfaces for sealing. A second exhaust means is connected to an annular space formed between the inner peripheral seal portion and the outer peripheral seal portion, and the second exhaust means is connected to the inside of the processing container by an exhaust pipe to near atmospheric pressure. A sealing device having a connecting pipe that connects an exhaust pipe and an annular space portion when performing processing by exhausting to a pressure of 1. 2. The sealing device according to claim 1, wherein the sealing portion is provided at a connecting portion between the processing container and the manifold and at an abutting portion between the manifold and the lid. 3. The sealing device according to claim 1, wherein the second exhaust means has an inert gas supply pipe for supplying an inert gas to the connection pipe. 4. Inside is a processing gas atmosphere and a reduced pressure atmosphere
Has a sealing portion that seals between the facing surfaces of the processing container
In the processing apparatus, the inner peripheral side facing surfaces are mutually opposed between the facing surfaces.
Inner peripheral seal part that makes surface contact with the outer surface and seals the outer peripheral side
An outer peripheral seal portion for sandwiching and sealing the metal sheet 8 between the surfaces
And the metal groove is formed in the annular groove formed on the facing surface on the outer peripheral side.
The first exhaust means for adsorbing heat is connected to the inner peripheral seal portion.
The second exhaust is placed in the annular space formed between the outer peripheral seal and
Means for connecting the second exhaust means to the inside of the processing container.
Evacuate the exhaust pipe to a pressure near atmospheric pressure and
Connect the exhaust pipe and the annular space during the slight decompression process
A processing device having a connecting pipe for