JPH03212929A - Applying device of resist - Google Patents

Abstract

PURPOSE:To facilitate periodical check of the amount and the state of a resist to be discharged, by equipping a device with a jig which enables visual checkup of the amount of the discharged resist and the state of discharge thereof. CONSTITUTION:When a resist is dripped onto a semiconductor wafer 5 by operating a pump 2, the resist passes through a needle valve 8 together with a bubble collected in a filter 3, every time the resist is discharged from a resist nozzle 4, and it drips as a resist liquid 15 from the fore end of an inner tube 14. The amount of this liquid and the state of dripping thereof can be checked up visually with ease through a transparent outer tube 13. According to this constitution, the quantity of the resist drop 15 is adjusted by opening and closing the valve 8 while checking up the quantity visually, and thereby an optimum quantity and an optimum state can be maintained.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to semiconductor manufacturing equipment, particularly to resist coating equipment.

[Conventional technology]

FIG. 3 is a sectional view of a conventional resist (photosensitive resin) coating device. In the figure, (1) is a resist supply container, (
2) is a pump, (8) is a filter, (4) is a resist nozzle, (6) is a semiconductor wafer, (6) is a resist discharge pipe containing air bubbles, (γ) is a resist drain box, (8) (9) is a cup, (9) is a rotation motor, and συ is a resist drain liquid.

Next, the operation will be explained. The resist sucked out by the pump (2) is filtered by a filter (8) and dripped onto the semiconductor wafer (6) from the resist nozzle (4). The semiconductor wafer (6) is rotated by a rotating motor (lle
The semiconductor wafer (6) is rotated by a rotational speed K, and a resist is uniformly applied to the surface of the semiconductor wafer (6). Air bubbles generated in the resist are collected in the upper part of the filter (8) and are discharged together with the resist through the discharge pipe (6) to the resist drainage box (7). The amount of resist drain liquid aυ to be discharged is adjusted by a needle valve (8).

[Problem to be solved by the invention]

Conventional resist devices were configured as described above, and because the tip of the discharge pipe was located inside the resist drain box, it was difficult to regularly check the discharge amount and condition of resist, and it was difficult to check the discharge amount and condition of the resist on a regular basis. There are problems in that the resist is wasted by discharging the resist, or conversely, the resist is not discharged, causing air bubbles to accumulate and foreign matter to occur in the resist, resulting in an uneven coating film thickness.

This invention has been developed to solve the above-mentioned problems, and its purpose is to provide a resist coating device that can easily check the amount and condition of discharged resist on a regular basis. do.

[Means to solve the problem]

The resist coating device according to the present invention has an inner pipe in the middle of the discharge pipe between the needle valve and the resist drain box, which has a larger diameter than the discharge pipe and has a length of about 5 m from the connection part with the discharge pipe. It has a transparent tube with a transparent outer tube.

[Effect]

The transparent tube in the present invention allows the resist to drip from the inner tube in the form of a teardrop, and since the outer tube is transparent, it is possible to easily and reliably confirm the amount and condition of the discharged resist.

〔Example〕

An embodiment of the present invention will be described below with reference to the drawings. 1st
The figure is a sectional view of the resist coating device.

As a matter of fact, (1) to συ are equivalent to those shown in the conventional example of FIG. 2, so their explanation will be omitted. (I2 is a transparent tube installed between the needle valve (8) and the resist drain box (γ).

Figure 2 is a cross-sectional view of the transparent tube (lz) shown in Figure 1, where α3 is a transparent outer tube, (14 is an inner tube, which is connected to the discharge tube (6), and σ9 is a teardrop-shaped droplet. It is a resist drop.

Next, the operation will be explained. When the pump (2) is activated to drop the resist onto the semiconductor wafer (5), each time the resist is discharged from the resist nozzle (4), the resist along with the air bubbles accumulated in the filter (8) closes the needle valve (8). After passing through, the resist droplet (19) is dropped from the tip of the inner tube (2).The amount and state of the drop can be easily confirmed visually through the outer tube (131).

The amount of the resist droplets (151) can be adjusted by opening and closing the needle valve (8) while visually checking the amount, thereby making it possible to maintain the optimum amount and condition.

In the above embodiment, the transparent tube α2 is connected to the resist drain box (γ
), but it can be installed anywhere between the needle valve (8) and the resist drain box (γ) and higher than the resist drain box (γ). ,
It may be installed in a location where it can be easily checked at all times, such as on the front of the device.

Although an example has been shown in which the resist drain liquid αυ is discarded into the resist drain box (γ), the same effect as in the above embodiment can be obtained even when the resist drain liquid αυ is returned to the resist supply container (1).

〔Effect of the invention〕

As described above, according to the present invention, since the transparent tube is provided with a structure in which resist containing bubbles is dripped in a teardrop shape while being discharged, it is possible to accurately check and adjust the amount of resist drained. This has the effect of saving resist and preventing non-uniformity in coating film thickness.

[Brief explanation of drawings]

FIG. 1 is a cross-sectional view of a resist coating apparatus according to an embodiment of the present invention, FIG. 2 is a cross-sectional view of the transparent tube shown in FIG. 1, and FIG. 3 is a cross-sectional view of a conventional resist coating apparatus. In the figure, (1) is a resist supply container, (2) is a pump, (8) is a filter, (4) is a resist nozzle, (
5) is to the semiconductor sea urchin, (6) is the discharge pipe, (7) is the resist drain pipe, (8) is the needle valve, (9) is the cup,
αQ is the rotation motor, συ is the resist liquid drain, z is the transparent tube, αJ is the outer tube, mouth 4 is the inner tube, (151 is the resist droplet. In addition, in the figure, the same reference numerals refer to the same or equivalent parts. Figure 2

Claims (1)

[Claims] A resist coating device having a mechanism for discharging a part of the resist in order to remove air bubbles generated in the resist, characterized in that the resist coating device is equipped with a jig that makes it possible to visually check the amount of resist discharged and the discharge state. Device.