JPH03209747A - Sealing member for electronic parts - Google Patents

Sealing member for electronic parts

Info

Publication number
JPH03209747A
JPH03209747A JP489490A JP489490A JPH03209747A JP H03209747 A JPH03209747 A JP H03209747A JP 489490 A JP489490 A JP 489490A JP 489490 A JP489490 A JP 489490A JP H03209747 A JPH03209747 A JP H03209747A
Authority
JP
Japan
Prior art keywords
epoxy resin
lid member
resin
sealing
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP489490A
Other languages
Japanese (ja)
Other versions
JP2816882B2 (en
Inventor
Masahiko Onishi
雅彦 大西
Minoru Matsumura
実 松村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Tire Corp
Original Assignee
Toyo Tire and Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Tire and Rubber Co Ltd filed Critical Toyo Tire and Rubber Co Ltd
Priority to JP489490A priority Critical patent/JP2816882B2/en
Publication of JPH03209747A publication Critical patent/JPH03209747A/en
Application granted granted Critical
Publication of JP2816882B2 publication Critical patent/JP2816882B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To control the fluidity of sealing agent, and restrain the flow into the inside of a semiconductor device or to a connection lead, by using the following as adhesive agent composition used at the bonding part of a substrate and a lid member; epoxy resin wherein a specified amount of thermoplastic resin, inorganic filler, and curing agent are compounded in epoxy resin. CONSTITUTION:As to a sealing member, a lid member is bonded to a substrate for mounting a semiconductor chip, and the inside is hermetically sealed. Adhesive agent composition used at the bonding part of the substrate and the lid member is constituted as follows; thermoplastic resin of 25 pts. wt. or less, inorganic filler of 10-180 pts. wt. and curing agent are compounded in epoxy resin of 100 pts. wt. As the epoxy resin, bisphenol A type epoxy resin is used. As the thermoplastic resin, the following are used; polyamide based resin, polycarbonate based resin, and polyurethane based resin. As the inorganic filler, mica, silica, and glass fiber are used. As examples of the curing agent, ammine based hardener and anhydride based hardener are quoted.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は半導体パッケージなどの封止特性、特に封止剤
の流れ性をコントロールし、かつブローホールの発生を
抑制するようにした電気・電子部品(以下、単に電子部
品という)用封止部材及び封止方法に関する。
Detailed Description of the Invention (Industrial Application Field) The present invention is an electrical/electronic device that controls the sealing properties of semiconductor packages, particularly the flowability of the sealant, and suppresses the occurrence of blowholes. The present invention relates to a sealing member for parts (hereinafter simply referred to as electronic parts) and a sealing method.

(従来の技術) 一般に半導体パッケージは、表面に導体が形成された基
板上にシリコン等の半導体素子を搭載し、ワイヤボンデ
ィングした後蓋部材と基板を接着剤によって接合するこ
とにより内部の半導体素子を気密封止した構造を成して
いる。従来用いられる接着剤としてはプラス、ハンダ、
樹脂が知られている。これらの中で特に熱硬化性のエポ
キシ樹脂が主流を成している。
(Prior art) In general, a semiconductor package is made by mounting a semiconductor element such as silicon on a substrate with a conductor formed on its surface, and bonding the lid member and the substrate with an adhesive after wire bonding. It has an airtight structure. Conventionally used adhesives include plus, solder,
resin is known. Among these, thermosetting epoxy resins are particularly mainstream.

次に、半導体チップが搭載された基板と藍部材との接着
方法は、従来lIn材の周辺面あるいは蓋部材が当接す
るパッケージ上面のいずれか一面(あるいは両面)に予
めエポキシ樹脂を溶融させて低粘度状態にしたものを、
主にスクリーン印刷によって塗布してあり、蓋をする場
合には蓋部材を所定位置に静置した後、加熱、圧着して
接合する方法が広く行われている。
Next, the conventional method of bonding the substrate on which the semiconductor chip is mounted and the blue material is to melt epoxy resin in advance on either the peripheral surface of the lIn material or the top surface of the package that the lid material contacts (or both surfaces). The viscous state is
It is mainly applied by screen printing, and when a lid is attached, a widely used method is to leave the lid member in a predetermined position and then heat and press it to join.

又半導体素子に紫外線を照射して記憶信号を消去するP
ROM(Program  Read  OnlyMe
mory)や撮像装置としての電荷結合デバイス(Ch
arge  Coupled  Devicey  以
下CCDと略称する)などではキャビティ内に収容され
た半導体素子に光をあてる必要があり蓋部材には透光性
の優れるガラスが使用されている。この場合、特にCC
Dでは均質な画像を得る為にガラス表面に透光性を阻害
する埃の付着や汚れがあってはならない。
Also, the semiconductor element is irradiated with ultraviolet rays to erase the memory signal.
ROM (Program Read Only Me
mory) and charge-coupled devices (Ch.
In large coupled devices (hereinafter abbreviated as CCDs), it is necessary to illuminate a semiconductor element housed in a cavity, and glass with excellent translucency is used for the lid member. In this case, especially CC
In D, in order to obtain a homogeneous image, there must be no dust or dirt on the glass surface that would impede translucency.

スクリーン印刷によってエポキシ樹脂が塗布されたパッ
ケージ上面あるいは蓋部材を加圧熱処理して一体化する
封止方法においては、蓋部材に塗布する場合、塗布工程
の途中で透光性を有する蓋部材の所定個所外に飛着しや
すい。特にCCDの場合撮像性能の低下を招く結果とな
る。又パッケージ側の所定個所に予め塗布する場合、半
導体素子のマウントやワイヤボンディング時の熱により
塗布された接着剤が反応硬化したり、流れ去ったりする
。又ワイヤボンディング時の機械的振動により剥離、割
れ、欠けが生じたり、ワイヤボンディング後の化学洗浄
により接着剤が洗い流されるおそれがある。
In a sealing method in which the top surface of the package or the lid member coated with epoxy resin by screen printing is integrated by pressure heat treatment, when applying the epoxy resin to the lid member, the predetermined position of the transparent lid member is removed during the coating process. Easy to fly off site. Particularly in the case of a CCD, this results in a decrease in imaging performance. Furthermore, when the adhesive is pre-applied to a predetermined location on the package side, the applied adhesive may react and harden or flow away due to the heat generated during semiconductor element mounting or wire bonding. Furthermore, mechanical vibration during wire bonding may cause peeling, cracking, or chipping, and the adhesive may be washed away by chemical cleaning after wire bonding.

次に封止時に溶融した接着剤が半導体装置内あるいは接
続リード、スルーホール内に流れ出して接続不良が生じ
るなどの問題がある。又流れを抑制しようとすると、封
止時の密着性が低下する恐れがある。
Next, there is a problem that the adhesive melted during sealing flows out into the semiconductor device, connection leads, and through holes, resulting in poor connection. Moreover, if an attempt is made to suppress the flow, there is a possibility that the adhesiveness during sealing will be reduced.

従ってパッケージ上面あるいは蓋部材に予めスクリーン
印刷によって接着剤を塗布する方法で前記問題点をすべ
て解決することは極めて困難である。
Therefore, it is extremely difficult to solve all of the above problems by applying adhesive to the top surface of the package or the lid member in advance by screen printing.

(発明が解決しようとする課題) 本発明の目的は半導体装置などにおける封止剤の流れ性
をコントロールし、半導体装置内あるいは接続リードへ
の流れを抑制して接続不良が生じることのない電子部品
用封止部材及び特に透光性を有する蓋部材に飛着したり
割れ、欠け、流失せずに、気密裡に蓋部材とパッケージ
を一体接合する封止方法を提供することにある。
(Problem to be Solved by the Invention) The purpose of the present invention is to control the flowability of a sealant in a semiconductor device, etc., and to prevent the flow of the sealant into the semiconductor device or to the connection leads, thereby preventing connection failures in electronic components. To provide a sealing method for integrally joining a lid member and a package in an airtight manner without flying off, cracking, chipping, or washing away the sealing member and especially the lid member having translucency.

(課題を解決するための手段) 本発明は半導体素子を搭載する基板に蓋部材を接着して
、内部が気密封止された封止部材において、前記基板と
蓋部材の接着部に用いられる接着剤組成物がエポキシ樹
脂100重量部に熱可塑性樹脂を25重量部以下、m機
充填材を10〜180重量部、硬化剤を配合して成るこ
とを特徴とする電子部品用封止部材に係る。
(Means for Solving the Problems) The present invention provides a sealing member in which a lid member is adhered to a substrate on which a semiconductor element is mounted and the inside thereof is hermetically sealed, and an adhesive used in the bonding portion between the substrate and the lid member. A sealing member for electronic components characterized in that the agent composition is comprised of 100 parts by weight of an epoxy resin, 25 parts by weight or less of a thermoplastic resin, 10 to 180 parts by weight of a mechanical filler, and a curing agent. .

又、本発明は上記接着剤組成物を未硬化状態で0.01
〜10mm厚みのフィルムないしシートに成形した後、
該フィルムないしシートを半導体チップを収容するキャ
ビティの周辺形状にほぼ適合した形に打ち抜くことを特
徴とする電子部品封止用成形体、並びに、 上記成形体を蓋部材又はパッケージの所定個所に静置し
た後、蓋部材をパッケージに接着せしめることを特徴と
する電子部品における蓋部材の封止方法にも係る。
Further, the present invention provides the above adhesive composition in an uncured state at a concentration of 0.01
After forming into a film or sheet with a thickness of ~10 mm,
A molded article for encapsulating an electronic component, characterized in that the film or sheet is punched into a shape that approximately matches the peripheral shape of a cavity that accommodates a semiconductor chip, and the molded article is placed at a predetermined location on a lid member or package. The present invention also relates to a method for sealing a lid member in an electronic component, characterized in that the lid member is bonded to the package after doing so.

本発明で用いられるエポキシ樹脂としては、ビスフェノ
ールA型エポキシ樹脂〔油化シェルエポキシ(株)製、
エビフート828.834.1001.1002゜10
03、1004.1005.1007.1010. l
100L等〕、臭素化ビス7エ7−ルA型エポキシ樹脂
〔油化シェルエポキシ(株)製、エピコート5050y
  5051y5051 H等〕、o−クレゾールノボ
ラック型エポキシ樹脂〔住人化学(株)製、ESCN−
220L。
The epoxy resin used in the present invention includes bisphenol A epoxy resin [manufactured by Yuka Shell Epoxy Co., Ltd.
Ebihut 828.834.1001.1002゜10
03, 1004.1005.1007.1010. l
100L, etc.], brominated bis7er7-A type epoxy resin [manufactured by Yuka Shell Epoxy Co., Ltd., Epicoat 5050y
5051y5051H, etc.], o-cresol novolac type epoxy resin [manufactured by Juju Kagaku Co., Ltd., ESCN-
220L.

ESCN−220F、ESCN−220H,ESCN−
220HH等〕、臭素化ノボラック型エポキシ樹脂〔日
本化薬(株)製、BREN−8等〕、フェノールノボラ
ック型エポキシ樹脂〔住人化学(株)製、ESPN−1
80等〕及びこれらを変性したエポキシ樹脂が挙げられ
る。これらのエポキシ樹脂は併用することも可能である
ESCN-220F, ESCN-220H, ESCN-
220HH, etc.], brominated novolac type epoxy resins (manufactured by Nippon Kayaku Co., Ltd., BREN-8, etc.), phenol novolak type epoxy resins [manufactured by Sumitomo Chemical Co., Ltd., ESPN-1]
80, etc.] and epoxy resins modified with these. These epoxy resins can also be used in combination.

本発明で用いられる熱可塑性樹脂としては、ボ177 
ミド系樹脂、ポリカーボネート系樹脂、ポリウレタン系
樹脂、ポリエステル系樹脂、シリコン系樹脂、フェノキ
シ樹脂、塩化ビニル系樹脂、ポリスチレン系樹脂、AB
S系樹脂、ポリビニルアルコール系樹脂、アイオノマー
系樹脂、メタクリル系樹脂、ポリフェニレンオキサイド
M樹脂、塩素化ポリエチレンなどの熱可塑性樹脂或いは
エラストマー、天然ゴム、インブレンゴム、ブタノエン
ゴム、スチレンブタジェンゴム、ニトリルゴム、クロロ
ブレンゴム、シリコンゴム、ノルボルネンポリマーなど
のゴムが例示できる。
As the thermoplastic resin used in the present invention, Bo 177
Mido resin, polycarbonate resin, polyurethane resin, polyester resin, silicone resin, phenoxy resin, vinyl chloride resin, polystyrene resin, AB
S-based resin, polyvinyl alcohol-based resin, ionomer-based resin, methacrylic resin, polyphenylene oxide M-resin, thermoplastic resin or elastomer such as chlorinated polyethylene, natural rubber, inbrene rubber, butanoene rubber, styrene-butadiene rubber, nitrile rubber, chlorobrene Examples include rubbers such as rubber, silicone rubber, and norbornene polymer.

本発明で用いる熱可塑性樹脂の配合量はエポキシ樹脂1
001!!lS(重量部、以下同様)に対して25部以
下とする。25部を越えると硬化物の架橋密度が小さく
なり、耐熱、耐湿信頼性が低下してしまう。
The blending amount of the thermoplastic resin used in the present invention is epoxy resin 1
001! ! The amount should be 25 parts or less based on lS (parts by weight, the same applies hereinafter). If the amount exceeds 25 parts, the crosslinking density of the cured product will decrease, resulting in a decrease in heat resistance and moisture resistance reliability.

本発明に用いられる*m充項材としてはマイカ、シリカ
、〃ラス繊維、がラス7レーク、ガラス粉、炭素111
141.タルク、炭酸カルシウム、酸化チタン及び酸化
亜鉛等が例示される。無機充填材の配合lはエポキシ樹
脂100部に対して、10〜180i!Isである。配
合量が10部よりも少ないと封止剤の溶融粘度が低くな
るため、封止時に半導体装置内部に存在する空気の膨張
によりブローホール(風穴現象)が生じ易くなり、18
0部を越えると封止剤の溶融粘度が高くなるため、流動
性に欠は密着できなくなる。又無機充填材の平均粒径が
0.01部未満であると配合物のチクソ性が非常に高く
なり流動性に欠は密着できなくなる。又平均粒径が5μ
を越えると封止剤の溶融粘度が低くなるためにブローホ
ールが生じ易くなる。
*m-filled materials used in the present invention include mica, silica, lath fiber, lath 7 lake, glass powder, carbon 111
141. Examples include talc, calcium carbonate, titanium oxide, and zinc oxide. The proportion of the inorganic filler is 10 to 180 parts per 100 parts of the epoxy resin! Is. If the blending amount is less than 10 parts, the melt viscosity of the encapsulant will be low, making it easier for blowholes to occur due to the expansion of the air present inside the semiconductor device during sealing.
If the amount exceeds 0 parts, the melt viscosity of the sealant increases, resulting in poor fluidity and poor adhesion. If the average particle size of the inorganic filler is less than 0.01 part, the thixotropic properties of the blend will be very high, resulting in poor fluidity and poor adhesion. Also, the average particle size is 5μ
If it exceeds this, the melt viscosity of the sealant decreases, making blowholes more likely to occur.

本発明において硬化剤の例として、アミン系硬化剤、R
無水物系硬化剤、フェノール樹脂系硬化剤、触媒系硬化
剤等、エポキシ樹脂と硬化反応可能な硬化剤であれば特
に限定はない。
Examples of the curing agent in the present invention include amine curing agent, R
There are no particular limitations on the curing agent as long as it is capable of curing reaction with the epoxy resin, such as anhydride curing agents, phenol resin curing agents, catalyst curing agents, and the like.

アミン類の具体例としては、ジエチレントリアミン、ト
リエチレンテトラミン、ビス(ヘキサメチレン)トリア
ミン、トリノチルヘキサメチレンジアミン、メンセンジ
アミン、イソホロンジアミン、メタキシリレンジアミン
、3,9−ビス(3−アミノプロピル)−2,4,8−
テトラスピロ(5,5)ウンデカン、メタフェニレンジ
アミン、ジアミノジフェニルメタン、ジアミノジフェニ
ルスルホン、4.4゛−メチレンビス(2−クロロ7ニ
リン)及びこれとエポキシ樹脂との7ダクト等を、酸無
水物の具体例としては、無水7タル酸、無水トリメット
酸、無水ピロメリット酸、無水ベンゾフェノンテトラカ
ルボン酸、無水マレイン酸、テトラヒドロ無水7タル酸
、ヘキサヒドロ無水7タル酸、無水メチルナジック酸、
無水メチルシクロヘキセンテトラカルボン酸、テトラク
ロロ無水7タル酸、テトラブロモ無水7タル酸等を、7
エ/−ル類の具体例としては、フェノール、0−クレゾ
ールノボラック、フェノールノボラック、フェノールア
ラルキル等を挙げることができる。触媒系硬化剤として
は例えばペンシルツメチルアミン、2,4.6−Fリス
(ジメチルアミノメチル)7エ/−ル・ピペリジン、ピ
リノン、ピコリン等の3級アミンや、2−エチル−4−
メチルイミグゾールで代表されるイミダゾール類、その
他1,8−ノアザビシクロ(5,4,0)ウンデセン、
BF3等のルイス酸、ノンアンジアミド、アミンイミド
、有機酸ヒドラノド等、またこれらを組合せた混合物や
、塩、錯体等に変性したもの等を挙げることができる。
Specific examples of amines include diethylenetriamine, triethylenetetramine, bis(hexamethylene)triamine, trinotylhexamethylenediamine, menthenediamine, isophoronediamine, metaxylylenediamine, 3,9-bis(3-aminopropyl) -2,4,8-
Specific examples of acid anhydrides include tetraspiro(5,5)undecane, metaphenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone, 4.4゛-methylenebis(2-chloro7niline), and 7-ducts of this and epoxy resin. Examples include 7-talic anhydride, trimetic anhydride, pyromellitic anhydride, benzophenone tetracarboxylic anhydride, maleic anhydride, tetrahydro-7-talic anhydride, hexahydro-7-talic anhydride, methylnadic anhydride,
Methylcyclohexenetetracarboxylic anhydride, tetrachloro heptatalic anhydride, tetrabromo heptatalic anhydride, etc.
Specific examples of air/ols include phenol, 0-cresol novolak, phenol novolak, phenol aralkyl, and the like. Examples of the catalytic curing agent include tertiary amines such as pencilzmethylamine, 2,4.6-F lis(dimethylaminomethyl)7ethyl-piperidine, pyrinone, and picoline, and 2-ethyl-4-
Imidazole represented by methyl imiguzole, other 1,8-noazabicyclo(5,4,0) undecene,
Examples include Lewis acids such as BF3, non-andiamides, amine imides, organic acid hydranides, mixtures of these, and those modified into salts, complexes, and the like.

硬化剤の配合量は通常触媒系硬化剤の場合はエポキシ樹
脂100重量部に対し1〜10重!部、その他の場合は
エポキシ基に対して当量比で0.5〜2の範囲とするの
が好ましい。
The amount of curing agent is usually 1 to 10 parts by weight per 100 parts by weight of epoxy resin in the case of a catalytic curing agent! In other cases, the equivalent ratio to the epoxy group is preferably in the range of 0.5 to 2.

本発明において必要に応じて配合剤、添加剤として充填
材、難燃材、補強材、滑材、分散材、界面活性材、顔料
、染料、カップリング剤等が用いられる。充填材として
は無機充填材以外のアラミド繊維、ナイロン繊維等の有
機充填材、聾燃材としては二酸化アンチモン、水酸化ア
ルミニウム、赤リン、ハロゲン化合物など、滑材、分散
材、界面活性剤としではワックス、ステアリン酸亜鉛、
シリコンオイルなど、顔料及び染料としてはカーボンブ
ラック、ベンガラ、チタン白、シアニンブルーなと、カ
ップリング剤としてはシランカップリング剤、チタンカ
ップリング剤などを例示できる。
In the present invention, fillers, flame retardants, reinforcing materials, lubricants, dispersants, surfactants, pigments, dyes, coupling agents, and the like are used as compounding agents and additives as necessary. Fillers include organic fillers such as aramid fibers and nylon fibers other than inorganic fillers; anti-inflammatory materials include antimony dioxide, aluminum hydroxide, red phosphorus, and halogen compounds; lubricants, dispersants, and surfactants. wax, zinc stearate,
Examples of pigments and dyes such as silicone oil include carbon black, red iron, titanium white, and cyanine blue, and examples of coupling agents include silane coupling agents and titanium coupling agents.

エポキシ樹脂にこれらの硬化剤、配合材、添加剤等を溶
融混合する手段としては、混練押出機、加熱撹拌槽、ニ
ーグー、バンバリーミキサ−ロール等が例示される。
Examples of means for melt-mixing these curing agents, compounding materials, additives, etc. with the epoxy resin include a kneading extruder, a heated stirring tank, a Ni-Goo, and a Banbury mixer roll.

本発明において、エポキシ樹脂組成物を実質上未硬化状
態でフィルムないしシート(以後、単にシートという)
に成形する方法として、シートグイを装着した押出機に
よる押出成形、カレングーロールにより材料を圧蓋しシ
ート化する方法の他に、コーテイング機を用いて溶液コ
ーティング、熱溶融コーティング等の方法により離型性
基材の上にシートを形成することも可能である。
In the present invention, the epoxy resin composition is used in a substantially uncured state as a film or sheet (hereinafter simply referred to as a sheet).
In addition to extrusion molding using an extruder equipped with a sheet guide, pressing the material with a Karen roll to form a sheet, and releasing the mold using methods such as solution coating and hot melt coating using a coating machine. It is also possible to form the sheet on a plastic substrate.

いずれの方法を用いても、適宜、ガラス繊維の不織布或
いはガラスクロス等の繊維状の基材を供給することによ
り、前記エポキシ樹脂混合物を基材に含浸或いはラミネ
ートした複合シートに成形することも可能である。前記
の方法で得た実質上未硬化状態のエポキシ樹脂混合物の
シートを更に打抜金型又はトムソン刃型又は彫刻刃型等
の抜型を用いて、打抜ブレス等の打抜機で打抜き、所要
の形状を有するエポキシ樹脂成形体を得る。ここで実質
上未硬化状態とは架橋が一部進行しているが完結してい
ない状態を意味する。シートの厚みについては0.01
mm未満の場合、打抜時の衝撃に耐えられない。又、た
とえ打抜けたとしても成形品の強度は非常に小さく取扱
い上困難である。一方厚みが10−曽を越えると精度良
い打抜きが困難となる。打抜においてシートをプラス転
移温度以下、軟化温度未満に保つことが肝要である。こ
れは実質上未硬化状態でシート状に成形された前記エポ
キシ樹脂混合物の材料強度が、ガラス転移温度未満では
打抜加工に耐えるに十分でなく、又軟化温度以上では材
料の抜型に粘着したり打抜後の形状保持が不可能である
等、打抜加工に適さないためである。このため本発明に
おいて用いられる打抜機には、熱盤又は恒温槽などエポ
キシ樹脂混合物のシートをがラス転移温度以上、軟化温
度未満の、打抜きに適した温度に温調する装置が装備さ
れていることが好ましい。又打抜金型を用いて打抜く場
合には、打抜金型も温調する必要がある。尚、例えば押
出機によってシートを成形する場合、押出されたシート
が冷却引取ロール等により軟化温度以下に冷却された後
、プラス転移温度以下に冷却される前に、押出成形と連
続して打抜加工を行うことも可能で、この場合は特にシ
ートの温潤装置を打抜機に装備する必要はない。
Regardless of which method is used, it is also possible to form a composite sheet by impregnating or laminating the epoxy resin mixture into the base material by supplying a fibrous base material such as glass fiber non-woven fabric or glass cloth as appropriate. It is. The sheet of the substantially uncured epoxy resin mixture obtained by the above method is further punched out with a punching machine such as a punching press using a punching die, a Thomson blade type, a carving blade type, etc., to obtain the desired shape. An epoxy resin molded body having a shape is obtained. Here, the term "substantially uncured state" means a state where crosslinking has partially progressed but has not been completed. 0.01 for sheet thickness
If it is less than mm, it will not be able to withstand the impact during punching. Moreover, even if punched through, the strength of the molded product is very low and it is difficult to handle. On the other hand, if the thickness exceeds 10 mm, accurate punching becomes difficult. It is important to keep the sheet below the plus transition temperature and below the softening temperature during punching. This is because the material strength of the epoxy resin mixture, which is formed into a sheet in a substantially uncured state, is not sufficient to withstand punching at temperatures below the glass transition temperature, and may stick to the cutting die at temperatures above its softening temperature. This is because it is not suitable for punching, as it is impossible to maintain the shape after punching. For this reason, the punching machine used in the present invention is equipped with a device such as a heating plate or a constant temperature bath that controls the temperature of the epoxy resin mixture sheet to a temperature suitable for punching, which is higher than the lath transition temperature and lower than the softening temperature. It is preferable. Furthermore, when punching is performed using a punching die, the temperature of the punching die must also be controlled. For example, when forming a sheet using an extruder, after the extruded sheet is cooled to below the softening temperature by a cooling take-off roll, etc., and before being cooled to below the plus transition temperature, the extruded sheet is continuously punched. It is also possible to process the sheet, and in this case there is no need to equip the punching machine with a sheet warming device.

このようにして、半導体を収容するキャビティの周辺形
状に適合した形に打ち抜かれたエポキシ樹脂成形体を、
蓋部材あるいはパッケージの所定個所に静置し、加圧子
加熱することによって気密封止することができる。
In this way, the epoxy resin molded body is punched into a shape that matches the peripheral shape of the cavity that accommodates the semiconductor.
It can be airtightly sealed by placing it at a predetermined location on the lid member or package and heating it with a presser.

(発明の効果) 本発明の電子部品用封止部材によれば、充填材の配合量
と平均粒径をコントロールすることにより、気密封止に
好適な接着朋が提供される。
(Effects of the Invention) According to the sealing member for electronic components of the present invention, an adhesive suitable for airtight sealing is provided by controlling the blending amount and average particle size of the filler.

本発明のエポキシ樹脂成形体によれば、より小型で微細
な形状、寸法の接着性熱硬化性成形体を割れ、欠けなく
成形することができる。又、本発明の方法によって得ら
れた成形体は、パー′/フィーグーやロボット等の自動
化機器で取扱うのに十分な強度を持っているため、工程
の自動化、コスト低減に優れた効果を発揮する。又本発
明の方法によって得られた成形体は、搬送時の取扱いや
振動に対しても強いため、破損することがなく、摩耗に
よる粉を発生することも少ないので、被着体である部品
等を汚損することが少ない。
According to the epoxy resin molded article of the present invention, it is possible to mold an adhesive thermosetting molded article having a smaller, finer shape and size without cracking or chipping. In addition, the molded product obtained by the method of the present invention has sufficient strength to be handled by automated equipment such as Par'/Figu and robots, so it has excellent effects on process automation and cost reduction. . In addition, the molded product obtained by the method of the present invention is resistant to handling and vibration during transportation, so it does not break and generates little powder due to wear, so it is suitable for adherends such as parts, etc. less likely to contaminate the

一方、本発明の接着性エポキシ樹脂成形体によれば、接
着剤、封止剤の量的管理(=体積)、被接着物或いは被
封止物の位置決め(=形状)、及びロボット等の自動化
への適応(固型、^強度)が可能であり、接着、封止に
よる組立が非常に容易になる。又エポキシ樹脂を主成分
とする為、耐熱性、耐薬品性、耐溶剤性、電気特性、接
着性、密着性等も優れたものとなる。
On the other hand, according to the adhesive epoxy resin molded article of the present invention, quantitative management (=volume) of adhesives and sealants, positioning (=shape) of objects to be adhered or sealed, and automation of robots, etc. (solidity, strength), and assembly by adhesion and sealing becomes extremely easy. Furthermore, since the main component is epoxy resin, it has excellent heat resistance, chemical resistance, solvent resistance, electrical properties, adhesion, adhesion, etc.

(実 施 例) 以下に実施例及び比較例を挙げて説明する。尚、単に部
とあるは重量部を示す。
(Example) Examples and comparative examples will be described below. Note that parts simply indicate parts by weight.

実施例及び比較例 エポキシ樹脂(ビスフェノールA型エポキシ樹脂、二ピ
コ−) 1001、油化シェルエポキシ社1)100部
に硬化剤として芳香族ノ7ミン()7ミノノフエニルメ
タン)を11部、ポリエステル系熱可塑性樹脂(バイロ
ンRV30P:東洋紡績社製)を25部、充填材として
シリカ微粉末を第1表に示す割合で配合して成る組成物
を、100℃に調整された混練押出機にて溶融混合し、
約31大のベレット化したエポキシ樹脂混合物を得た。
Examples and Comparative Examples Epoxy resin (bisphenol A type epoxy resin, dipico) 1001, Yuka Shell Epoxy Co., Ltd. 1) 100 parts, as a hardening agent, 11 parts of aromatic 7mine (7minophenylmethane), A composition prepared by blending 25 parts of a polyester thermoplastic resin (Vylon RV30P, manufactured by Toyobo Co., Ltd.) and fine silica powder as a filler in the proportions shown in Table 1 was placed in a kneading extruder adjusted to 100°C. Melt and mix
Approximately 31 pellets of epoxy resin mixture were obtained.

これを更にリップ長200糟輸のTグイを装着したシリ
ング−口径50mmの押出機を用いて、まず厚み0.2
−輸、幅155mmの実質上未硬化状態のシートを得た
This was further processed using a Schilling-diameter 50 mm extruder equipped with a T-guidge with a lip length of 200 mm, and the thickness was 0.2 mm.
- A substantially uncured sheet with a width of 155 mm was obtained.

次にこのシートを打抜プレスに供給し、打抜金型で打ち
抜き、割れや変形を伴うことなく所要のエポキシ樹脂成
形体を得た。この打抜プレスには打抜金型を含む部分を
含む恒温槽が装備されており、内部温度を40″C1こ
設定し、打抜金型及び材料シートを予熱した後打ち抜い
た。打ち抜かれた成形体の寸法、形状は外寸21+ui
X 16−曽、M幅3mmの枠形状であり厚みは0.2
論論である。
Next, this sheet was supplied to a punching press and punched out using a punching die to obtain a desired epoxy resin molded product without cracking or deformation. This punching press was equipped with a constant temperature bath including the part containing the punching die, and the internal temperature was set to 40"C1, and the punching die and material sheet were preheated and then punched. The dimensions and shape of the molded body are external dimensions 21+ui
X 16-Zen, M frame shape with a width of 3 mm and a thickness of 0.2
It is an argument.

このエポキシ樹脂成形体を、半導体パッケージのセラミ
ック基板上の所定の位置に静置し、更に蓋部材を載置す
る。接着面同士の位置合わせを行った後クリップを用い
て、接着面と垂直方向に約1.5kgの圧力を加えて圧
着する。その後150℃に設定したオーブン中で1時間
加熱してwJ1表の試料1〜23を得た。
This epoxy resin molded body is placed at a predetermined position on a ceramic substrate of a semiconductor package, and a lid member is further placed thereon. After aligning the adhesive surfaces, a clip is used to apply pressure of about 1.5 kg in a direction perpendicular to the adhesive surfaces. Thereafter, it was heated in an oven set at 150° C. for 1 hour to obtain samples 1 to 23 in table wJ1.

かくして得られた各試料について初期封止のグロスリー
クテスト及び流れ性の評価を行った。各試料のそれぞれ
10ケずつの半導体装置を125部5℃に温度設定した
70リナート中に60秒問浸漬し、封止面からの気泡の
発生を目視により判断し良品率をパーセントで評価した
Each sample thus obtained was subjected to an initial sealing gross leak test and evaluation of flowability. Ten semiconductor devices of each sample were immersed in 125 parts of 70 Linate at a temperature of 5° C. for 60 seconds, and the generation of bubbles from the sealing surface was visually judged and the non-defective rate was evaluated as a percentage.

プレッシャークツカーテストは各試料の半導体パッケー
ジをプレッシャークツカーテスト(PCT)装置に入れ
て121℃、2.1気圧の飽和水蒸気雰囲気の条件下で
50時間置き、乾燥後グロスリークテストを行って良品
率を決定した。
In the pressure test, each sample semiconductor package is placed in a pressure tester test (PCT) device and left in a saturated steam atmosphere of 121°C and 2.1 atm for 50 hours. After drying, a gross leak test is performed to determine whether the product is acceptable. determined the rate.

接着剤の封止時の流れ性については、加熱溶融した接着
剤が半導体装置のスルーホール内に殆ど流れ込まないも
のについて「O印」、やや流れているものについて「Δ
印」、流れ込みすぎて使用に供しないものについて「×
印」として評価した。結果を第1表に示す。
Regarding the flowability of the adhesive during sealing, the adhesive that has been heated and melted hardly flows into the through-hole of the semiconductor device is marked "O", and the adhesive that flows slightly is marked "Δ".
"mark", and "×" for items that have flowed too much and cannot be used.
It was evaluated as ``a mark''. The results are shown in Table 1.

第 表 1印は本発明の範囲外のものである。No. table Items marked 1 are outside the scope of the present invention.

v&1表から明らかなとおり試料番号5〜7.10〜1
2.15〜17は本発明の範囲内のものであり、封止時
の流れ抑制効果、初期封止の良品率、PCT後の良品率
のいずれもが優れていることを示している。
As is clear from the v&1 table, sample numbers 5-7.10-1
2.15 to 17 are within the scope of the present invention, indicating that the flow suppression effect during sealing, the good product rate in initial sealing, and the good product rate after PCT are all excellent.

試料1,2.3においては、充填材が少なすぎて、封止
時の粘度が低すぎ素子を内蔵する空隙間のが大の熱膨張
によるブローホール(風穴現象)が発生し又流れ性も大
きかった。試料4においては初期封止、PCT後の良品
率は良好であるが、流れ性が大きすぎて、使用には供し
得なかった。試料8においては、充填材の平均粒径が大
きく、封止時の粘度が低すぎブローホールが発生した。
In samples 1 and 2.3, there was too little filler, and the viscosity at the time of sealing was too low, causing blowholes (air hole phenomenon) due to large thermal expansion of the void containing the element, and poor flowability. It was big. In sample 4, the yield rate after initial sealing and PCT was good, but the flowability was too high and it could not be used. In sample 8, the average particle size of the filler was large and the viscosity during sealing was too low, causing blowholes.

試料9゜14においては、充填Hの平均粒径が非常に小
さいため、配合物のチクソ性が高くなり、流動性に欠は
封止時に密着できなかった。試料13においては、封止
時の粘度が低くやや流れ性が大きかった。試料18にお
いては初期封止、PCT後の良品率は良好であるが、や
や流れ性が大きく使用には供し得なかった。試料19.
20においては配合物の封止時の粘度が高くなり、もは
や密着できなかった。試料21〜23において見かけ上
の流れ抑制効果は良好であるが、完全に密着しておらず
初期封止性は非常に低かった。
In sample 9.14, since the average particle size of the filling H was very small, the thixotropy of the compound was high, and the lack of fluidity made it impossible to achieve close contact during sealing. In sample 13, the viscosity at the time of sealing was low and the flowability was slightly large. Sample 18 had a good yield rate after initial sealing and PCT, but had a rather large flowability and could not be used. Sample 19.
In No. 20, the viscosity of the compound at the time of sealing became so high that it was no longer possible to adhere tightly. In Samples 21 to 23, the apparent flow suppressing effect was good, but the initial sealing properties were very low because they were not completely adhered.

(以 上) 出 願 人  東洋ゴム工業株式会社 代 理 人  弁理士 1)村  巖(that's all) Sender: Toyo Tire & Rubber Industries Co., Ltd. Representative Patent Attorney 1) Iwao Mura

Claims (4)

【特許請求の範囲】[Claims] (1)半導体素子を搭載する基板に蓋部材を接着して、
内部が気密封止された封止部材において、前記基板と蓋
部材の接着部に用いられる接着剤組成物がエポキシ樹脂
100重量部に熱可塑性樹脂を25重量部以下、無機充
填材を10〜180重量部、硬化剤を配合して成ること
を特徴とする電子部品用封止部材。
(1) Glue the lid member to the substrate on which the semiconductor element is mounted,
In the sealing member whose interior is hermetically sealed, the adhesive composition used for the bonding portion between the substrate and the lid member includes 100 parts by weight of epoxy resin, 25 parts by weight or less of thermoplastic resin, and 10 to 180 parts by weight of inorganic filler. 1. A sealing member for electronic components, characterized in that it contains part by weight of a curing agent.
(2)請求項1記載の無機充填材の平均粒径が0.01
〜5μである電子部品用封止部材。
(2) The average particle size of the inorganic filler according to claim 1 is 0.01.
A sealing member for electronic components having a thickness of ~5μ.
(3)請求項1記載の接着剤組成物を未硬化状態で0.
01〜10mm厚みのフィルムないしシートに成形した
後、該フイルムないしシートを半導体チップを収容する
キャビティの周辺形状にほぼ適合した形に打ち抜くこと
を特徴とする電子部品封止用成形体。
(3) The adhesive composition according to claim 1 is applied in an uncured state to 0.
1. A molded article for encapsulating an electronic component, which is formed into a film or sheet having a thickness of 0.01 to 10 mm, and then punched out into a shape that approximately conforms to the peripheral shape of a cavity for accommodating a semiconductor chip.
(4)請求項3記載の成形体を蓋部材又はパッケージの
所定個所に静置した後、蓋部材をパッケージに接着せし
めることを特徴とする電子部品における蓋部材の封止方
法。
(4) A method for sealing a lid member in an electronic component, which comprises placing the molded article according to claim 3 at a predetermined location on the lid member or package, and then bonding the lid member to the package.
JP489490A 1990-01-11 1990-01-11 Molded products for sealing electronic components Expired - Fee Related JP2816882B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP489490A JP2816882B2 (en) 1990-01-11 1990-01-11 Molded products for sealing electronic components

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP489490A JP2816882B2 (en) 1990-01-11 1990-01-11 Molded products for sealing electronic components

Publications (2)

Publication Number Publication Date
JPH03209747A true JPH03209747A (en) 1991-09-12
JP2816882B2 JP2816882B2 (en) 1998-10-27

Family

ID=11596380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP489490A Expired - Fee Related JP2816882B2 (en) 1990-01-11 1990-01-11 Molded products for sealing electronic components

Country Status (1)

Country Link
JP (1) JP2816882B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997031393A1 (en) * 1996-02-20 1997-08-28 Cti Semiconductor Corp. Method of making an air tight cavity in an assembly package
JP2003017979A (en) * 2001-06-28 2003-01-17 Nagase Chemtex Corp Surface acoustic wave device and its manufacturing method
WO2016072236A1 (en) * 2014-11-07 2016-05-12 日東電工株式会社 Resin composition, semiconductor device manufacturing method and semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997031393A1 (en) * 1996-02-20 1997-08-28 Cti Semiconductor Corp. Method of making an air tight cavity in an assembly package
JP2003017979A (en) * 2001-06-28 2003-01-17 Nagase Chemtex Corp Surface acoustic wave device and its manufacturing method
WO2016072236A1 (en) * 2014-11-07 2016-05-12 日東電工株式会社 Resin composition, semiconductor device manufacturing method and semiconductor device

Also Published As

Publication number Publication date
JP2816882B2 (en) 1998-10-27

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