WO2005108483A1 - Electronic component device - Google Patents

Electronic component device Download PDF

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Publication number
WO2005108483A1
WO2005108483A1 PCT/JP2005/008520 JP2005008520W WO2005108483A1 WO 2005108483 A1 WO2005108483 A1 WO 2005108483A1 JP 2005008520 W JP2005008520 W JP 2005008520W WO 2005108483 A1 WO2005108483 A1 WO 2005108483A1
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WO
WIPO (PCT)
Prior art keywords
electronic component
epoxy resin
component device
group
component
Prior art date
Application number
PCT/JP2005/008520
Other languages
French (fr)
Japanese (ja)
Inventor
Kazumasa Igarashi
Ichiro Hazeyama
Masahiro Kubo
Original Assignee
Nitto Denko Corporation
Nec Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corporation, Nec Corporation filed Critical Nitto Denko Corporation
Publication of WO2005108483A1 publication Critical patent/WO2005108483A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/50Amines
    • C08G59/5033Amines aromatic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/563Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0657Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01004Beryllium [Be]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01012Magnesium [Mg]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/0102Calcium [Ca]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01087Francium [Fr]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/1015Shape
    • H01L2924/10155Shape being other than a cuboid
    • H01L2924/10158Shape being other than a cuboid at the passive surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/102Material of the semiconductor or solid state bodies
    • H01L2924/1025Semiconducting materials
    • H01L2924/10251Elemental semiconductors, i.e. Group IV
    • H01L2924/10253Silicon [Si]

Definitions

  • the present invention relates to a connection electrode section for a semiconductor package such as a BGA (ball-grid 'array) or CSP (chip-scale' package or chip-size 'package) or a semiconductor component such as a semiconductor element.
  • a semiconductor package such as a BGA (ball-grid 'array) or CSP (chip-scale' package or chip-size 'package) or a semiconductor component such as a semiconductor element.
  • the board mounting connection method which electrically connects the semiconductor component and the opposing electrodes of the circuit board via bumps
  • the gap between the semiconductor package and the circuit board is filled with a liquid epoxy resin composition and sealed with a resin.
  • the present invention relates to an electronic component device having good repairability.
  • the liquid resin composition used for the underfill is generally Since a one-pack type thermosetting resin composition containing a siloxane resin as a main component is used, it does not melt, has high adhesive strength, does not decompose, and is insoluble in solvents after being heated and cured.
  • repair cannot be easily performed. Therefore, once underfill is performed, for example, there is a problem that an electronic component device having a defective electrical connection is scrapped and must be discarded. This means that in recent years, recyclability has been required for global environmental protection, and it is necessary to avoid generating waste as much as possible, and it is possible to repair even underfill. Is required.
  • an epoxy resin is used as a main component, a capsule-type curing agent coated with a thermoplastic resin is used as a curing agent, and a resin is imparted with a resin.
  • An electronic component bonding adhesive using an acrylic resin as an agent has been disclosed (see Patent Document 1).
  • Patent Document 1 JP-A-7-102225
  • Patent Document 2 JP 2001-81439A
  • Patent Document 3 JP-A-10-204259
  • the adhesive for bonding electronic components described in Patent Document 1 has thixotropic properties and thus is suitable for fluidity as an underfill. It is desirable for the fill to have flow characteristics that do not exhibit shear rate dependence.
  • the adhesive described in Patent Document 2 obtained by uniformly stirring and mixing generally has a high viscosity in accordance with the molecular weight of the thermoplastic resin. After mixing the prepared inorganic filler, the viscosity increased, and it was difficult to say that the low viscosity required for the underfill could be achieved.
  • the thermoplastic resin is used for electronic parts.
  • thermosetting resin composition described in Patent Document 3 does not describe the effect on the physical properties such as the glass transition point of the cured product which is important for the reliability of the connected mounting structure. It is insufficient as an adhesive material for underfill.
  • thermosetting resin composition such as an epoxy resin
  • a thermoplastic resin such as polymethyl methacrylate is used as described in the above-mentioned technology.
  • the resin is mixed, there is a difficulty in that a step of removing the cured product residue remaining on the circuit board with a solvent after heating the silicon chip and removing the chip needs to be performed at a high temperature. It has been difficult to say that the above-mentioned conventional technique is sufficient because it is desired that the work of repairing the cured body can be performed at around room temperature.
  • the present invention has been made in view of such circumstances, and it is possible to remove a residue near room temperature even in an electronic component device having an electrical connection failure once underfilled.
  • a highly reliable electronic component that is easily sealed with a low-viscosity epoxy resin composition for encapsulation that has excellent repairability and that has a connected mounting structure and high reliability. Its purpose is to provide a device.
  • the electronic component device of the present invention provides the electronic component device, wherein the connection electrode portion provided on the semiconductor component and the connection electrode portion provided on the circuit board face each other.
  • the present inventors have achieved a circuit board and a semiconductor component (semiconductor device) in order to achieve the above object. And semiconductor devices, etc.), the epoxy resin composition which is an underfill material for sealing the voids with the resin.
  • the present inventors have found that a cured product of a specific epoxy resin composition is solvated with a specific solvent and subsequently swells, and as a result, a decrease in the film strength of the cured product as a sealing resin and It has been found that the adhesive strength is reduced, the cured body can be mechanically peeled, and the semiconductor element (flip chip) can be repaired (Japanese Patent Application Laid-Open No. 2003-119454).
  • the specific fluorinated aromatic diamines as the curing agent decrease the solubility parameter [Solubility Parameter (SP)] value of the cured product due to the trifluoromethyl substituent or the fluorine substituent, so that the specific solvent is used.
  • SP solubility Parameter
  • the present inventors have repeatedly studied an epoxy resin composition which is an underfill material for resin sealing a gap between a circuit board and a semiconductor component in order to achieve the above object.
  • an organic additive [component (D)] is blended together with the above components (A) to (C)
  • the cured product of the epoxy resin composition is solvated with a specific solvent, and swelling occurs continuously.
  • the coating strength of the cured resin, which is the sealing resin, and the adhesive strength are reduced, and the cured product can be mechanically peeled off, and the resin residue remaining on the circuit board can be easily removed at room temperature or the like.
  • the present inventors have found that repair of semiconductor components such as the above becomes easier, and arrived at the present invention.
  • the present invention includes the following aspects.
  • a semiconductor component is mounted on the circuit board in a state where the connection electrode section provided on the semiconductor component and the connection electrode section provided on the circuit board face each other.
  • the sealing resin layer contains the following components (A) to (C) together with the following components (D).
  • m is a positive number from 1 to 4.
  • R 1 to R 4 are hydrogen
  • aromatic diamine curing agent as the component (B) is at least one of a fluorinated aromatic diamine represented by the following general formula (2) and a derivative thereof.
  • Y is fluorine and Z or C, F ⁇ , ( ⁇ is from 1 to 10
  • m is a positive number from 1 to 4.
  • R * 5 ⁇ R e is hydrogen
  • a monovalent organic group which may be the same or different 1 /
  • the aromatic diamine curing agent as the component (B) is a monoepoxy compound having one epoxy group in one molecule, and 2,2′-ditrifluoromethyl—4, 4.
  • the inorganic filler as the component (C) is a spherical silica powder having an average particle diameter of 10 m or less, the surface of which is coated with an organic silane compound represented by the following general formula (3).
  • J3 1 is at least
  • organosilane compound represented by the general formula (3) is an organosilane compound represented by the following general formula (4).
  • ⁇ 1 is a monovalent organic group other than hydrogen, and 7 is a divalent organic group.
  • the organic additive as the component (D) is at least one of spherical thermoplastic resin particles having an average particle diameter of 10 m or less and spherical crosslinked resin particles having an average particle diameter of 10 ⁇ m or less.
  • the weight-average molecular weight of the spherical polymethyl methacrylate particles is from 100,000 to 5,000.
  • spherical polymethyl methacrylate particles are spherical crosslinked polymethyl methacrylate particles having a glass transition temperature of 100 ° C. or higher.
  • the present invention provides an organic additive [component (D)] together with the components (A) to (C).
  • This is an electronic component device in which the gap between the circuit board and the semiconductor component is sealed by a sealing resin layer containing a liquid epoxy resin composition. Therefore, the liquid epoxy resin composition easily solvates with a specific organic solvent at room temperature and swells even after being cured with low viscosity and without generation of voids due to filling. As a result, the strength of the cured product is significantly reduced, and the cured product can be easily separated from the adherend (such as an electrode). Therefore, an electronic component device obtained by resin encapsulation using this liquid epoxy resin composition has excellent connection reliability, and even if a connection failure occurs due to positional displacement between electrodes, etc. An electronic component device with excellent repairability can be obtained without discarding the electronic component device itself.
  • aromatic diamine curing agent [component (B)] at least one of an aromatic diamine and a derivative thereof represented by the following general formula (1) or a general formula (2)
  • the use of at least one of the fluorine-containing aromatic diamines and derivatives thereof represented by the following formula (1) is preferred because the effect of rapid swelling and ease of repair can be exhibited.
  • aromatic diamine curing agent a monoepoxy compound containing one epoxy group in one molecule and 2,2′-ditrifluoromethyl-4,4
  • reaction product with '-diaminobiphenyl enhances solvation and swelling, and enables good repair.
  • aromatic diamine curing agent [component (B)] at least one of an aromatic diamine represented by the following general formula (1) and a derivative thereof, or a compound represented by the general formula (2):
  • component (A) the fluorinated aromatic diamines and derivatives thereof and the reaction of the liquid epoxy resin (component (A)) with a prepolymer yields a further improvement in the curing speed. Can be achieved.
  • the liquid epoxy resin composition can be formed in advance from the liquefaction to the viscous paste-like state, complicated steps are not required in the measurement at the time of mixing and the subsequent dispersion step, and the liquid epoxy resin composition can be easily obtained. be able to.
  • FIG. 1 is a cross-sectional view schematically showing one example of an electronic component device of the present invention.
  • FIG. 2 is a cross-sectional view schematically showing another example of the electronic component device of the present invention.
  • the electronic component device of the present invention provides a semiconductor component, a connection electrode portion provided on the semiconductor component, a circuit board, a connection electrode portion provided on the circuit board, and a gap between the circuit board and the semiconductor component.
  • the semiconductor component is mounted on the circuit board such that the connection electrode provided on the semiconductor component and the connection electrode provided on the circuit board face each other.
  • the sealing resin is a cured product of a liquid epoxy resin composition containing the following components (A), (B), (C) and (D).
  • the semiconductor component is a semiconductor element (flip chip)
  • the semiconductor is placed on the printed circuit board 2.
  • Element (flip chip) 1 is mounted. Then, a gap between the wiring circuit board 2 and the semiconductor element (flip chip) 1 is resin-sealed by a sealing resin layer 4 formed using a liquid epoxy resin composition.
  • connection electrode portion 3 provided on the semiconductor element 1 is formed in a bump shape, but is not particularly limited to this, and is provided on the printed circuit board 2.
  • the connection electrode portion 5 may be provided in a bump shape.
  • the semiconductor component is a semiconductor device (semiconductor package)
  • the connection electrode portion (solder bump) 13 provided on the semiconductor device (semiconductor package) 11 and the connection electrode portion (solder pad) 15 provided on the wiring circuit board 12 face each other.
  • the semiconductor package 11 is mounted on the wiring circuit board 12.
  • a gap between the printed circuit board 12 and the semiconductor package 11 is resin-sealed by a sealing resin layer 14 formed using a liquid epoxy resin composition.
  • the shape of the semiconductor package 11 is not particularly limited as long as it is provided with a connection electrode portion (solder bump) 13 and can be mounted on the wiring circuit board 12. Ball 'grids' arrays and CSPs (chip' scale 'packages or chip size' packages) are useful.
  • connection electrode portion 13 provided on the semiconductor package 11 is formed in a bump shape.
  • connection electrode portion 13 provided on the wiring circuit board 12 is not particularly limited to this.
  • the electrode section 15 may be provided in a bump shape.
  • the liquid epoxy resin composition which is a material for forming the sealing resin layer 4 and the sealing resin layer 14, is prepared by curing the liquid epoxy resin (A component) and the aromatic diamines even when the V difference is large. It is obtained by blending an organic additive (D component) together with an agent (B component) and an inorganic filler (C component).
  • the liquid refers to a liquid that exhibits fluidity at 25 ° C.
  • the viscosity at 25 ° C is in the range of 0.1 OlmPa's to: LOOOO Pa's.
  • the viscosity is measured using, for example, an EMD type rotational viscometer. Can be done.
  • the liquid epoxy resin (A component) is not particularly limited as long as it is a liquid epoxy resin containing two or more epoxy groups in one molecule.
  • a liquid epoxy resin containing two or more epoxy groups in one molecule for example, bisphenol A type, Various liquid epoxy resins such as bisphenol F type, hydrogenated bisphenol A type, bisphenol AF type and phenol novolak type, and derivatives thereof, polyhydric alcohol and epichlorohydrinka Induced liquid epoxy resins and derivatives thereof Glycidylamine type, hydantoin type, aminophenol type, arin type, toluidine type, etc.
  • the aromatic diamine curing agent (component B) has a function of curing the liquid epoxy resin (component A), and it is preferable to use at least one of aromatic diamine and a derivative thereof. It is more preferable to use at least one of a fluorine-containing aromatic diamine and a derivative thereof from the viewpoint of solvation with a specific solvent and subsequent swelling.
  • the aromatic diamine in at least one of the above aromatic diamines and derivatives thereof includes p-phenylenediamine, m-phenylenediamine, 2,5 toluenediamine, 2,4 toluenediamine, and 4,6 dimethyl m-diamine.
  • Aromatic mononuclear diamines such as phenylenediamine and 2,4 diaminomesitylene, 4, 4 'diamino diphenyl ether, 3, 3'- diamino diphenyl ether, 3, 4' diamino diphenyl ether, 4, 4 'diaminodiphenylmethane, 3, 3'-diaminodiphenylmethane, 4, 4 'diaminodiphenylsulfone, 3, 3'-diaminodiphenylsulfone, 4, 4 '-diaminodiphenylsulfide, 3, 3'-diaminodiphenyl -Risulfide, 4, 4'-Diaminobenzophenone, 3,3'-Aromatic dinuclear diamine such as diaminobenzophenone, 1,4-bis 4-aminophenoxy) benzene, 1, 4-bis (3-aminophenoxy) benzene, 1,
  • the use of at least one of an aromatic diamine represented by the following general formula (1) and a derivative thereof as the aromatic diamine curing agent (component B) is advantageous in pot life at room temperature. Is also preferably used.
  • X is hydrogen and / or C n H 2n ( ⁇ is 1 to 10
  • R 1 to R 4 are hydrogen or a monovalent organic group.
  • the monovalent organic group include a saturated alkyl group represented by Cn H2n + 1 (n is a positive number of 1 to 10), an aryl group, -CH2CH (OH) CH2—OCnH2n 3 alkoxy substitution represented by +1 — 2 hydroxypropyl group, CH2 CH (OH) CH2 — O — 3 aryl substitution represented by R 9 (R 9 is an aryl group) — 2 hydroxypropyl group, etc. can give .
  • the Ri ⁇ R 4 may be different be the same as each other.
  • the fluorinated aromatic diamine in at least one of the above fluorinated aromatic diamines and derivatives thereof is not particularly limited as long as it is a fluorinated aromatic diamine having a primary amino group.
  • aromatic diamine curing agent component B
  • at least one of a fluorine-containing aromatic diamine represented by the following general formula (2) and a derivative thereof can be used at room temperature. It is preferably used because the pot life becomes longer.
  • m is a positive number from 1 to 4.
  • R 5 is hydrogen
  • R 5 to R ° are hydrogen or a monovalent organic group.
  • the monovalent organic group include a saturated alkyl group represented by Cn H2n + 1 (n is a positive number of 1 to 10), an aryl group, -CH2CH (OH) CH2—OCnH2n 3-alkoxy-substituted 1-hydroxypropyl group represented by +1; 3-aryl-substituted 2-hydroxypropyl group represented by CH2 CH (OH) CH2—O—R 10 (R 10 is aryl group) And so on.
  • R 5 to R 8 may be the same or different from each other.
  • 2,2'-ditrifluoromethyl-4,4'-diaminobihue having the smallest active hydrogen equivalent is used as the aromatic diamine curing agent (component B).
  • the use of p-phenylenediamine or m-phenylenediamine, which also has the lowest active hydrogen equivalent can reduce the amount of compounding, It is preferable from the viewpoint that the viscosity of the epoxy resin composition can be reduced.
  • the aromatic diamine curing agent (component B) the above-mentioned fluorinated aromatic diamine, particularly 2,2′-ditrifluoromethyl-1,4,4′-diaminobiphenyl, in one molecule
  • a reaction product with a monoepoxy compound containing one epoxy group is preferred from the viewpoint that the solvation and swelling properties are improved and good repair is possible.
  • a predetermined amount of each component is charged into a reaction vessel without a catalyst, and the reaction is carried out by nitriding.
  • the reaction is carried out by heating to about 60 to 120 ° C under a stream of air until the epoxy groups are consumed. And, in this way, for example, N, N, ⁇ ′, ⁇ ′—4-substituted fluorine-containing aromatic diamine compound is obtained.
  • the monoepoxy conjugate is not particularly limited as long as it is an epoxy compound containing one epoxy group in one molecule.
  • the mixing ratio of the liquid epoxy resin (Component A) and the aromatic diamine curing agent (Component B) is one epoxy group of the liquid epoxy resin (Component A).
  • the number of active hydrogens in the aromatic diamine curing agent (component B) is preferably set in the range of 0.4 to 1.6. More preferably, it is in the range of 0.6 to 1.2. That is, when the number of active hydrogens per epoxy group exceeds 1.6, the viscosity of the liquid epoxy resin composition tends to increase, and when it is less than 0.4, the liquid epoxy resin composition tends to increase. This is because the glass transition temperature of the cured product tends to decrease.
  • the aromatic diamine represented by the above general formula (1) and its aromatic diamine At least one derivative or a fluorinated aromatic represented by the above general formula (2)
  • the prepolymer is, for example, at least one of the aromatic diamine represented by the general formula (1) and a derivative thereof or the fluorine-containing aromatic diamine represented by the general formula (2) and a derivative thereof And a polyfunctional aliphatic liquid epoxy compound having two or more epoxy groups in one molecule.
  • a predetermined amount of each component is charged into a reaction vessel without a catalyst, and heated to about 60 to 120 ° C under a nitrogen stream to react until a predetermined molecular weight is reached, thereby producing a pre-polymer. .
  • the prepolymer preferably has a molecular weight of about 400 to 5,000 in terms of polystyrene equivalent weight average molecular weight.
  • a prepolymer is used to form a volatile low-boiling low molecular weight compound. It is possible to prevent voids in the underfill sealing resin layer due to evaporation and volatilization of the resin.
  • polyfunctional aliphatic liquid epoxy resin examples include ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, butanediol diglycidyl ether, neopentyl glycol diglycidyl ether, diglycidyl diphosphorus, and triglycidyl diglycidyl ether.
  • Examples include aliphatic diols and triols such as methylolpropane diglycidyl ether, trimethylolpropane triglycidyl ether, glycerin diglycidyl ether, and glycerin triglycidyl ether, and polyfunctional glycidyl ethers of aliphatic polyfunctional alcohols.
  • various known curing accelerators can be used to shorten the curing time.
  • an acidic catalyst such as salicylic acid
  • a Lewis acid such as copper acetyl acetate and zinc acetyl acetate. These may be used alone or in combination of two or more.
  • the amount of the curing accelerator is not particularly limited, but may be a desired curing amount for the mixture of the liquid epoxy resin (A component) and the aromatic diamine curing agent (B component). It is preferable to appropriately set the ratio so that the speed can be obtained. For example, the cure speed As an index, it is possible to easily determine the usage amount while measuring the time of geli dwelling with a hot plate. As an example, it is preferable to set the content in the range of 0.01 to 3% by weight in the whole liquid epoxy resin composition.
  • silica powder such as synthetic silica and fused silica is used.
  • inorganic fillers it is particularly preferable to use spherical silica powder because the effect of reducing the viscosity of the liquid epoxy resin composition is large. It is preferable to use the inorganic filler having a maximum particle diameter of 24 m or less. Further, those having an average particle diameter of 10 m or less are preferably used together with the above-mentioned maximum particle diameter.
  • 5 / zm is preferably used. Further, it is preferable to use one having a specific surface area of 1 to 4 m 2 / g by the BET method.
  • the maximum particle size and the average particle size can be measured using, for example, a laser diffraction / scattering type particle size distribution analyzer.
  • the inorganic filler (component C) preferably has an average particle diameter of 10 ⁇ m or less, the surface of which is coated with an organosilane conjugate represented by the following general formula (3).
  • Spherical silica particles are used, and the above-mentioned surface-coated spherical silica particles having an average particle diameter of 1 to 5 m are particularly preferable.
  • the aminosilane cup represented by the following general formula (4) is included.
  • Spherical silica particles having an average particle diameter of 10 ⁇ m or less whose surface is coated with a ring agent are used, and spherical silica particles having an average particle diameter of 1 to 5 / ⁇ are particularly preferred. in this way, By coating the surface of the spherical silica particles with the above aminosilane coupling agent, the dispersibility is improved and the viscosity is reduced due to the interaction such as wettability with the liquid epoxy resin (component A) and the like.
  • ⁇ ′ is a monovalent group other than hydrogen, and is a divalent group.
  • organosilane conjugate represented by the above general formula (3) examples include, for example, ⁇ -2 (aminoethyl) -3-aminopropyl-methyldimethoxysilane, ⁇ -2 (aminoethyl) -13-aminopro Pill-triethoxysilane, -2- (aminoethyl) -3-aminopropyl-trimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane and the like. These may be used alone or in combination of two or more.
  • spherical silica particles having an average particle diameter of 10 ⁇ m or less and whose surface is coated with an organic titanium compound represented by the following general formula (5) are preferably used. Particularly preferred are spherical silica particles having an average particle diameter of 1 to 5 m coated on the surface.
  • ⁇ 1 is a monovalent group other than hydrogen, and ⁇ is at least
  • organotitanium conjugate represented by the general formula (5) examples include isopropyl triisostearoyl titanate, isopropyl tris (dioctyl pyrophosphate) titanate, and isopropyl tris (dioctyl pyrophosphate) titanate.
  • Such spherical silica particles whose surface is coated with the organosilane compound or the organotitanium conjugate are produced, for example, as follows. That is, using the above-mentioned organosilane compound or organotitanium compound, and using a conventionally known technique such as a treatment for an inorganic filler such as a vapor spray method or a wet method, spherical silica particles whose surface is coated with the compound are used. It is made.
  • the surface can also be obtained by dissolving in an aqueous alcohol solution or solvent and subjecting it to a surface treatment.
  • the amount of the inorganic filler (component C) is preferably set in the range of 10 to 80% by weight of the entire liquid epoxy resin composition, and particularly preferably 30 to 70% by weight. . In other words, if the amount is less than 10% by weight, the effect of reducing the linear expansion coefficient of the liquid epoxy resin composition cured product may be small, and if it exceeds 80% by weight, the liquid epoxy resin composition may not be effective. This is because the viscosity of the product tends to increase.
  • the organic additive (D component) used together with the liquid epoxy resin (A component), the aromatic diamine curing agent (B component) and the inorganic filler (C component) includes the liquid epoxy resin (A Component) is a component which is melted by hardening or heat treatment so as to be incompatible with each other to form a domain structure.
  • a Component is a component which is melted by hardening or heat treatment so as to be incompatible with each other to form a domain structure.
  • spherical thermoplastic resin particles, spherical crosslinked resin particles and the like are used. These may be used alone or in combination of two or more.
  • spherical thermoplastic resin particles include particles having a strong force such as polyacrylic resin, polyethersulfone resin, ethylene-butyl acetate copolymer, polyamide resin, and butadiene-styrene copolymer. These may be used alone or in combination of two or more.
  • spherical thermoplastic resin particles those having an average particle diameter of 10 m or less are preferably used, and those having an average particle diameter of 1 to 5 / ⁇ are particularly preferably used.
  • the average particle diameter can be measured using, for example, a laser diffraction / scattering type particle size distribution analyzer as described above.
  • spherical polymethyl methacrylate particles are particularly preferably used, and more preferably spherical polymethyl methacrylate particles having a weight average molecular weight of 100,000 or more are used.
  • the weight average molecular weight is 100,000 to 5,000, 0 00 spherical polymethyl methacrylate particles are particularly preferably used.
  • the upper limit of the weight average molecular weight is usually 10,000,000.
  • the spherical polymethyl methacrylate particles also include epoxy group-containing polymethyl methacrylate particles, carboxy group-containing polymethyl methacrylate particles, polymethyl methacrylate-poly acrylate copolymer particles, and the like. It is the purpose.
  • spherical cross-linked resin particles particularly, spherical cross-linked polymethylmetharylate particles are preferably used. More preferably, spherical cross-linked polymethyl methacrylate particles having a glass transition temperature of 100 ° C. or higher are used.
  • the filling temperature can be set high, and the sealing time can be reduced with a low viscosity. The effect is that it can be done.
  • the above glass transition temperature is a value measured by a thermomechanical analysis (TMA) device.
  • the amount of the organic additive (component D) is not particularly limited as long as the effects of the present invention can be obtained, but is set in the range of 2 to 20% by weight of the entire liquid epoxy resin composition. Particularly preferred is 3 to 15% by weight. That is, if the amount of the organic additive is less than 2% by weight, the effect of improving the repairability of the cured liquid epoxy resin composition may not be obtained. ⁇ This is the force that tends to increase the viscosity of the resin composition.
  • a reactive diluent can be appropriately compounded for the purpose of lowering the viscosity and the like.
  • this reactive diluent is volatile. Since it may contain a low boiling point compound, it must be used at the prescribed curing temperature of the liquid epoxy resin composition which is an underfill resin. It is preferable to use the volatile low-boiling compound after removing it in advance. Further, when the reactive diluent itself is volatile, voids are easily generated in the sealing resin layer at a predetermined curing temperature of the liquid epoxy resin thread and the underfill resin, As such, the use of such reactive diluents is limited.
  • Examples of the reactive diluent include n-butyldaricidyl ether, arylglycidylether, 2-ethylhexylglycidylether, styrene oxide, and phen- Luglycidyl ether, cresyl glycidyl ether, lauryl glycidyl ether, p sec butylphenol glycidyl ether, norphenyl glycidyl ether, glycidyl ether of rubinol, glycidyl methacrylate, bulcyclohexene monoepoxide, pinene oxide, tertiary Glycidyl ethers of carboxylic acids, diglycidyl ethers, glycidyl ethers of (poly) ethylene glycol, glycidyl ethers of (poly) propylene glycol, bisphenol A with propylene oxide, bisphenol A epoxy resin and
  • the liquid epoxy resin composition may further contain a flame retardant such as antimony trioxide, antimony pentaoxide, or brominated epoxy resin.
  • Flame-retardant aids, low-stress agents such as silicones, coloring agents, and the like can be appropriately compounded without departing from the spirit of the present invention.
  • Such a liquid epoxy resin composition can be produced, for example, as follows. That is, each component such as the liquid epoxy resin (A component), the aromatic diamine curing agent (B component), the inorganic filler (C component), the organic additive (D component) and, if necessary, the curing accelerator.
  • the desired one-part solvent-free liquid epoxy resin is obtained by mixing and dispersing under a high shearing force such as a three-roll or homomixer, and optionally defoaming under reduced pressure.
  • a composition can be manufactured.
  • a liquid epoxy resin (A component), particularly a polyfunctional aliphatic liquid epoxy resin, and at least one of the aromatic diamine represented by the general formula (1) and a derivative thereof, or
  • these components are preliminarily reacted as described above.
  • the desired one-part solvent-free liquid epoxy resin composition can be produced in the same manner as described above.
  • a semiconductor component eg, a semiconductor element such as a flip chip, a semiconductor package
  • an electronic component device by resin sealing of a wiring circuit board include, for example, It is manufactured as follows. That is, a semiconductor component having a connection electrode portion (solder bump) in advance and a wiring circuit board having a connection electrode portion (solder pad) facing the solder bump are connected by solder metal. Next, by utilizing a capillary phenomenon in a gap between the semiconductor component and the printed circuit board, a liquid epoxy resin composition of one component and no solvent is filled and thermally cured to form a sealing resin layer. Seal with grease.
  • the semiconductor component is a semiconductor element (flip chip), as shown in FIG. 1, the connection electrode portion (solder bump) 3 provided on the semiconductor element 1 and the wiring circuit board
  • the semiconductor element (flip chip) 1 is mounted on the wiring circuit board 2 with the connection electrode portion (solder pad) 5 provided on the wiring circuit 2 facing the wiring circuit board 2 and the wiring circuit board 2 and the semiconductor element (Flip Chip)
  • An electronic component device in which the gap with the flip chip 1 is resin-sealed by the sealing resin layer 4 also having the above-mentioned liquid epoxy resin composition strength is manufactured.
  • the semiconductor component is a semiconductor device (semiconductor package), as shown in FIG. 2, the connection electrode portion (solder bump) 13 provided on the semiconductor package 11 and the wiring circuit board 12
  • the semiconductor package 11 is mounted on the printed circuit board 12 with the provided connection electrode portions (solder pads) 15 facing each other, and the gap between the printed circuit board 12 and the semiconductor package 11 is formed by the liquid epoxy.
  • An electronic component device that is resin-sealed by the sealing resin layer 14 that also has a resin composition power is manufactured.
  • the filling and sealing can be further facilitated.
  • the gap distance between the semiconductor element (flip chip) 1 and the printed circuit board 2 is generally 30 It is about -300 ⁇ m.
  • the gap distance between the semiconductor package 11 and the wiring circuit board 12 is generally about 200 to 300;
  • the cured epoxy resin composition in the resin-sealed portion of the electronic component device thus obtained swells with a specific organic solvent even after it is cured, and its adhesive strength is reduced.
  • the component device can be repaired.
  • a ketone solvent As the specific organic solvent, a ketone solvent, a glycol diether solvent, a nitrogen-containing solvent, and the like are preferable. These may be used alone or in combination of two or more.
  • ketone solvents include acetophenone, isophorone, ethyl n-butyl ketone, diisobutyl ketone, getyl ketone, cyclohexyl ketone, di-n-propyl ketone, methyl oxide, methyl n-amyl ketone, methyl isobutyl ketone, methyl ethyl ketone, and methyl cyclohexane.
  • Xanone, methyl n-heptyl ketone, and holone These may be used alone or in combination of two or more.
  • glycol ether-based solvents examples include ethylene glycol getyl ether, ethylene glycol dibutyl ether, ethylene glycolone resin methine oleate, ethylene glycol diole cholesterol methine oleate, and diethylene glycol oleone terephthalate. Athenole, ethylene glycolone dibutylbutyrene, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether and the like. These may be used alone or in combination of two or more.
  • nitrogen-containing solvent examples include N, N'-dimethylformamide, N, N'-dimethylacetamide, N-methyl-2-pyrrolidone, N, N'-dimethylsulfoxide, hexamethylphosphortriamide and the like. Is raised. These may be used alone or in combination of two or more.
  • a semiconductor component a semiconductor element such as a flip chip or a semiconductor package
  • a repaired portion of a printed circuit board is heated to apply the semiconductor component. Is removed.
  • the heating temperature at this time is The cured body of the epoxy resin composition of the present invention is heated at a temperature of about + 50 ° C or more from the glass transition temperature of the cured body of the epoxy resin composition of the present invention, and is heated at a temperature equal to or higher than the melting point of the joining metal such as solder. With cohesive failure or adhesion to one (semiconductor component or printed circuit board), both can be easily separated.
  • the organic solvent is applied directly or the absorbent obtained by impregnating the organic solvent into absorbent cotton is brought into contact with the residual portion of the cured epoxy resin composition of the printed circuit board at room temperature, more preferably, glass transition.
  • the printed circuit board and the mounting part can be reused.
  • the semiconductor component to which the residue of the cured product of the liquid epoxy resin composition has adhered is immersed in the above-mentioned organic solvent taken in a predetermined container at room temperature to swell the cured product and remove the semiconductor component to thereby re-use the semiconductor component. Can be used.
  • the above organic solvent may be directly applied to the entire repaired portion of the printed circuit board or coated with absorbent cotton impregnated with the organic solvent, although the treatment requires a long time.
  • the semiconductor component can be removed from the wiring circuit board after the cured product is swelled by gradually penetrating the organic solvent from the end of the semiconductor component to reduce the strength and adhesion of the cured product.
  • n is a positive purity of 0 or more, 99%, and a viscosity of 22 dP a ⁇ s
  • Spherical silica particles whose surface has been surface-treated by vapor atomization using 3-aminopropyltriethoxysilane (maximum particle diameter 6 ⁇ m, average particle diameter 2 ⁇ m, specific surface area 2. lm 2 / g) o
  • Spherical silica particles whose surface has been surface-treated by vapor spraying using isopropyl triisostearoyl titanate (organic titanium compound) (maximum particle diameter 6 ⁇ m, average particle diameter 2 m, specific surface area 2. lm 2 / g).
  • Spherical polymethylmetharylate particles (average particle diameter 4 ⁇ m, maximum particle diameter 10 ⁇ m, weight average molecular weight 3,000,000).
  • Spherical polymethylmetharylate particles (average particle diameter 3.3 m, maximum particle diameter 20 ⁇ m, weight average molecular weight 1,750,000).
  • Spherical polymethyl methacrylate particles (average particle diameter 4 ⁇ m, maximum particle diameter 10 ⁇ m, weight average molecular weight 400,000).
  • Spherical polymethyl methacrylate particles (average particle diameter 3.4 m, maximum particle diameter 20 ⁇ m, weight average molecular weight 400,000).
  • Spherical crosslinked polymethyl methacrylate particles (average particle diameter 2.6 m, maximum particle diameter 5 ⁇ m, glass transition temperature 120 ° C).
  • a silicon chip (thickness: 370 / ⁇ , size: 10mm XI Omm) having 64 Sn—3Ag—0.5Cu solder bump electrodes with a diameter of 200 / zm was prepared, and copper wiring with a diameter of 300m was prepared.
  • 1 mm thick FR-4 glass epoxy wiring circuit with 64 pads (board side electrodes) Copper wiring pads (board side electrodes) coated with 63Sn-37Pb solder paste on the board and soldering the silicon chip After mounting the chip on the substrate with the bump electrodes facing each other, the chip was soldered through a heating reflow furnace at 260 ° C for 5 seconds. The gap between the silicon chip and the circuit board was 210 ⁇ m.
  • liquid epoxy resin composition was applied to one side of the gap between the silicon chip (flip chip) and the circuit board by as much as one dollar force.
  • the liquid epoxy resin composition is heated and filled by capillary action on a 60 ° C hot plate, the filling time is measured, and after filling is completed, it is cured at 150 ° C for 4 hours.
  • An electronic component device was manufactured by sealing with grease.
  • the temperature was gradually cooled to room temperature, and then the presence or absence of voids in the sealing resin layer that filled and sealed the gap between the printed circuit board and the semiconductor element was observed with an ultrasonic flaw detector. Then, a force when no void was observed was evaluated as ⁇ , a case where one or two voids were observed was evaluated as ⁇ , and a case where more voids were observed was evaluated as X.
  • the conduction failure rate of the electronic component device immediately after resin sealing was measured. After that, the above electronic component device was subjected to a temperature cycle test at 40 ° C for 10 minutes and 125 ° C for 10 minutes using a thermal test device, and the electrical continuity after 1000 cycles was examined. The conduction failure rate (%) was calculated for all 64 copper wiring pads (board-side electrodes) on the circuit board.
  • the silicon chip was peeled off from the electronic component device on a hot plate heated to 200 ° C, and after returning to room temperature, the epoxy resin composition remaining at the connection was cured.
  • Absorbent cotton containing a mixed solvent of equal amounts of N, N'-dimethylformamide and diethylene glycol dimethyl ether was allowed to stand in the residue of the body, and allowed to stand at 40 ° C for 1 hour. Thereafter, the absorbent cotton is removed, and the cloth is thoroughly wiped with methanol, and the cured epoxy resin composition is peeled off.
  • the peelable electronic component device is supplied with the solder paste to the pad portion of the wiring circuit board again, and after melting the solder, In the same manner as above, a silicon chip was mounted on the wiring circuit board, and the electrical conductivity was examined. Thereafter, resin sealing was performed in the same manner as above, and the repairability (rework) property was evaluated.
  • the cured epoxy resin composition can be completely peeled off and the electrical connection is complete with the force ⁇ , the cured body can be slightly peeled off and the electrical connection is complete.
  • the cured product remains slightly and can be peeled off, but the electrical connection is incomplete.
  • the cured epoxy resin composition can hardly be peeled off and the electrical connection is incomplete. Is X.
  • Viscosity (at 253 ⁇ 4) 120 350 300 900 80 11S 130 (d Pas)
  • Bot life at25U 4 4 4 3 5 4 4 (hours)
  • the liquid epoxy resin compositions of all Examples had a long pot life and low viscosity. It can be seen that in combination with the degree, Voidless is excellent as a one-part, non-solvent type liquid epoxy resin composition. Moreover, it is clear that the fabricated electronic component device is excellent in repairability without generation of voids and poor conduction in the formed sealing resin layer. On the other hand, the liquid epoxy resin composition of the comparative example was void-free with no conduction failure, but was inferior in repairability as compared with the example product.
  • liquid epoxy resin compositions of Examples and Comparative Examples Using the thus obtained liquid epoxy resin compositions of Examples and Comparative Examples, measuring the viscosity at 25 ° C using an MD-type rotational viscometer, the needle having a needle inner diameter of 0.56 mm was used. Into a syringe made of polypropylene. [0148] Thereafter, the syringe was packed and left at 25 ° C to measure the time until the viscosity doubled, and this was defined as the pot life.
  • a CSP package (package height lmm, size 10 mm XI Omm) having 64 Sn—3Ag—0.5Cu solder bump electrodes with a diameter of 200 / zm was prepared, and copper wiring with a diameter of 300 m was prepared.
  • the CSP package was soldered through a heating reflow furnace at 260 ° C for 5 seconds.
  • the gap between the CSP package and the circuit board is 250 ⁇ m.
  • the liquid epoxy resin composition is discharged and applied to one side of the gap between the CSP package and the circuit board with a force of one dollar, and the liquid epoxy resin composition is heated and filled by capillary action on a 60 ° C hot plate. Then, the filling time was measured, and after the filling was completed, the mixture was hardened at 150 ° C. for 4 hours and sealed with a resin to produce an electronic component device.
  • the temperature was gradually cooled to room temperature, and then the presence of voids in the sealing resin layer, which was filled and sealed with the gap between the printed circuit board and the CSP knockage, was observed using an ultrasonic flaw detector. Then, a force when no voids were observed was evaluated as ⁇ , a case where one or two voids were observed was evaluated as ⁇ , and a case where more voids were observed was evaluated as X.
  • the conduction failure rate of the electronic component device immediately after resin sealing was measured. After that, the thermal test Conduct a temperature cycle test of the above electronic component device at 40 ° C for 10 minutes and 125 ° C for 10 minutes using the device to check the electrical continuity after 1000 cycles. The conduction failure rate (%) for all 64 pads (substrate-side electrodes) was calculated.
  • the CSP package was also peeled off on a hot plate heated to 200 ° C, and the CSP package was peeled off and returned to room temperature, but a cured product of the epoxy resin composition remaining at the connection portion Absorbent cotton containing a mixed solvent of equal amounts of N, N'-dimethylformamide and diethylene glycol dimethyl ether was allowed to stand in the residue portion of, and allowed to stand at room temperature (22 ° C) for 1 hour.
  • the cotton wool is removed, the well is thoroughly wiped with methanol, the cured epoxy resin composition is peeled off, and the peelable electronic component device is again supplied with the solder paste to the pad portion of the wiring circuit board, and after melting the solder,
  • the CSP package was mounted on a printed circuit board and the electrical conductivity was examined. Thereafter, the resin was sealed in the same manner as described above, and the repairability (rework) property was evaluated.
  • the cured epoxy resin composition can be completely peeled off and the electrical connection is complete, the cured body can be peeled off with a small amount of the cured body, but the electrical connection is complete.
  • the cured product remains slightly and can be peeled off, but the electrical connection is incomplete.
  • the cured epoxy resin composition can hardly be peeled off and the electrical connection is incomplete. Is X.
  • the liquid epoxy resin compositions of all Examples have a long pot life and, in combination with low viscosity, are excellent as one-part solventless liquid epoxy resin compositions of Voidless. .
  • the formed sealing resin layer is free from voids and poor conduction, has a good drop impact resistance test result, and has excellent repairability. it is obvious.
  • the liquid epoxy resin composition of the comparative example was inferior in repairability as compared with the power example product in which there was no conduction failure and was voidless.
  • the present invention relates to a semiconductor package such as a BGA (ball-grid 'array) or CSP (chip-scale' package or chip-size 'package) or a connection electrode portion of a semiconductor component such as a semiconductor element.
  • a semiconductor package such as a BGA (ball-grid 'array) or CSP (chip-scale' package or chip-size 'package) or a connection electrode portion of a semiconductor component such as a semiconductor element.
  • the gap between the semiconductor package and the circuit board Provided is an electronic component device having good repairability, which is filled with a liquid epoxy resin composition and sealed with a resin.

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Abstract

A high-reliability electronic component device resin-sealed with a low-viscosity sealing epoxy resin composition, which electronic component device even when having a defect in electrical connection after once underfilling, permits removal of any residual at about room temperature to thereby excel in repair easiness and when in connected and mounted structure, ensures high reliability. There is provided an electronic component device having semiconductor element (flip chip) (1) mounted on wiring circuit substrate (2) in such a fashion that electrode part for connection (solder bump) (3) provided on the semiconductor element (flip chip) (1) is opposed to electrode part for connection (solder pad) (5) provided on the wiring circuit substrate (2). Any gap between the wiring circuit substrate (2) and the semiconductor element (flip chip) (1) is resin-sealed with sealing resin layer (4) consisting of a liquid epoxy resin composition comprising not only the undermentioned constituents (A)-(C) but also the undermentioned constituent (D): (A) liquid epoxy resin, (B) aromatic diamine curing agent, (C) inorganic filler, and (D) organic filler.

Description

明 細 書  Specification
電子部品装置  Electronic component equipment
技術分野  Technical field
[0001] 本発明は、 BGA (ボール ·グリッド 'アレイ)や CSP (チップ ·スケール 'パッケージま たはチップ ·サイズ'パッケージ)等の半導体パッケージや半導体素子等の半導体部 品の接続用電極部 (バンプ)を介して半導体部品と回路基板の対向する電極間を電 気的に接続する基板実装接続工法において、半導体パッケージと回路基板の空隙 に液状エポキシ榭脂組成物を充填し榭脂封止してなる、良好なリペア一性を備えた 電子部品装置に関するものである。  [0001] The present invention relates to a connection electrode section for a semiconductor package such as a BGA (ball-grid 'array) or CSP (chip-scale' package or chip-size 'package) or a semiconductor component such as a semiconductor element. In the board mounting connection method, which electrically connects the semiconductor component and the opposing electrodes of the circuit board via bumps), the gap between the semiconductor package and the circuit board is filled with a liquid epoxy resin composition and sealed with a resin. The present invention relates to an electronic component device having good repairability.
背景技術  Background art
[0002] 近年、 BGAや CSP等の半導体パッケージがプリント配線基板に高密度実装されて いる。従来、このようなアレイ型バンプ電極を有する半導体パッケージの基板実装に おいては、バンプ間接続ピッチが広ぐし力も接続用金属バンプが大きいためアンダ 一フィル等による応力分散や機械的補強のための榭脂封止は行われなくとも充分な 信頼性が保たれていた。しかし、近年、このバンプ電極が狭ピッチでし力も小さくなつ てきたことから、アンダーフィル等の榭脂による補強がなされるようになつてきた。  In recent years, semiconductor packages such as BGAs and CSPs have been mounted on printed wiring boards with high density. Conventionally, in mounting a semiconductor package having such an array type bump electrode on a substrate, the connection pitch between the bumps is widened and the connection metal bump is large, so that underfill or the like is required to disperse stress and mechanical reinforcement.と も Sufficient reliability was maintained without resin sealing. However, in recent years, since the bump electrodes have a narrow pitch and a small force, reinforcement with a resin such as underfill has come to be performed.
[0003] 一方、半導体素子フリップチップ等のベアチップによるダイレクトチップアタッチ方 式が注目されている。このフリップチップ方式の接続工法では、チップ側に高融点半 田バンプを形成して、セラミック回路基板側の半田との金属間接合を行う、いわゆる「 C4技術」と呼ばれる工法が著名である。  [0003] On the other hand, a direct chip attachment method using a bare chip such as a semiconductor element flip chip has attracted attention. In this flip-chip connection method, a so-called “C4 technology” is known, in which a high-melting-point solder bump is formed on the chip side and metal-to-metal bonding with the solder on the ceramic circuit board side is performed.
[0004] ところが、セラミックス回路基板に代えてガラス'エポキシ榭脂製プリント回路基板等 の榭脂系基板を用いた場合には、チップと榭脂系基板との熱膨張係数の違いに起 因した半田バンプ接合部の破壊が生じ、接続信頼性が充分ではなくなる等の問題を 有している。このような問題の対策として、半導体素子と榭脂系基板との空隙を、例え ば、液状榭脂組成物を用い封止することにより熱応力を分散させて信頼性を向上さ せる技術、 V、わゆるアンダーフィルを行うことが一般的になって 、る。  However, when a resin-based substrate such as a printed circuit board made of glass epoxy resin is used in place of the ceramic circuit substrate, the difference is caused by a difference in thermal expansion coefficient between the chip and the resin-based substrate. There are problems such as the destruction of the solder bump joints, resulting in insufficient connection reliability. As a countermeasure for such a problem, a technology for improving reliability by dispersing thermal stress by sealing a gap between the semiconductor element and the resin-based substrate using, for example, a liquid resin composition, V It is common to do so-called underfill.
[0005] し力しながら、上記アンダーフィルに用いる液状榭脂組成物としては、一般的にェ ポキシ榭脂等を主成分とした一液型熱硬化性榭脂組成物を用いるため、加熱して硬 ィ匕させた後は、溶融しない、接着力が高い、分解しない、溶剤に不溶である等の点か ら容易にリペア一できないという問題があった。したがって、一度アンダーフィルを行 えば、例えば、電気的接続に不具合のある電子部品装置はスクラップにされてしまい 、廃棄せざるをえないという問題が生じる。このことは、近年、地球環境保全に向けて リサイクル性が要求されるな力、廃棄物を出すことは極力避ける必要があり、アンダー フィル後であってもリペア一を可能とすることのできることが要求されている。 [0005] While pressing, the liquid resin composition used for the underfill is generally Since a one-pack type thermosetting resin composition containing a siloxane resin as a main component is used, it does not melt, has high adhesive strength, does not decompose, and is insoluble in solvents after being heated and cured. However, there is a problem that repair cannot be easily performed. Therefore, once underfill is performed, for example, there is a problem that an electronic component device having a defective electrical connection is scrapped and must be discarded. This means that in recent years, recyclability has been required for global environmental protection, and it is necessary to avoid generating waste as much as possible, and it is possible to repair even underfill. Is required.
[0006] このようなリペア一可能な液状エポキシ榭脂組成物として、主剤にエポキシ榭脂を 用い、硬化剤に熱可塑性榭脂でコーティングされたカプセル型硬化剤を、そしてリぺ ァー性付与剤にアクリル樹脂を用いた電子部品接合用接着剤が開示されている (特 許文献 1参照)。  [0006] As such a repairable liquid epoxy resin composition, an epoxy resin is used as a main component, a capsule-type curing agent coated with a thermoplastic resin is used as a curing agent, and a resin is imparted with a resin. An electronic component bonding adhesive using an acrylic resin as an agent has been disclosed (see Patent Document 1).
[0007] また、熱硬化性榭脂とポリメチルメタタリレート等の熱可塑性榭脂と無機質充填剤と カップリング剤とを含む接着剤組成物が提案されて!ヽる (特許文献 2参照)。  [0007] Further, an adhesive composition comprising a thermosetting resin, a thermoplastic resin such as polymethyl methacrylate, an inorganic filler, and a coupling agent has been proposed! Puru (see Patent Document 2).
[0008] そして、エポキシ榭脂と硬化剤、可塑剤を含むリペア一可能な熱硬化性榭脂組成 物が開示されている (特許文献 3参照)。しかし、接続した実装構造の信頼性にとって 重要な硬化体のガラス転移点等の物性への影響は述べられて 、な 、。  [0008] A repairable thermosetting resin composition containing an epoxy resin, a curing agent, and a plasticizer has been disclosed (see Patent Document 3). However, the effect on physical properties such as the glass transition point of the cured product, which is important for the reliability of the connected mounting structure, is described.
特許文献 1 :特開平 7— 102225号公報  Patent Document 1: JP-A-7-102225
特許文献 2:特開 2001—81439号公報  Patent Document 2: JP 2001-81439A
特許文献 3:特開平 10— 204259号公報  Patent Document 3: JP-A-10-204259
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0009] しカゝしながら、上記特許文献 1に記載された電子部品接合用接着剤は、チクソトロ ピー性を有するためアンダーフィルとしての流動性に適して 、るとは言 、難く、アンダ 一フィルとしては、ズリ速度依存性がみられな ヽような流動特性を有することが望まし い。また、上記特許文献 2に記載された均一に攪拌混合してなる接着剤は、一般的 に熱可塑性榭脂の分子量に応じて高粘度になるため、硬化体の線膨張係数の低減 を目的にした無機質充填剤を混合した後は高粘度になり、アンダーフィルに要求さ れる低粘度を達成できるとは言い難力 た。また、上記熱可塑性榭脂は電子部品の 加熱取り外し容易性向上のために、硬化体のガラス転移点な 、し軟化点の低下を目 的とされており、接続信頼性確保のためのガラス転移点保持の観点力ゝらは言及され ていない。さら〖こ、上記特許文献 3に記載された熱硬化性榭脂組成物は、接続した 実装構造の信頼性にとって重要な硬化体のガラス転移点等の物性への影響は述べ られておらず、アンダーフィル用接着材料としては不充分である。 [0009] However, it is difficult to say that the adhesive for bonding electronic components described in Patent Document 1 has thixotropic properties and thus is suitable for fluidity as an underfill. It is desirable for the fill to have flow characteristics that do not exhibit shear rate dependence. In addition, the adhesive described in Patent Document 2 obtained by uniformly stirring and mixing generally has a high viscosity in accordance with the molecular weight of the thermoplastic resin. After mixing the prepared inorganic filler, the viscosity increased, and it was difficult to say that the low viscosity required for the underfill could be achieved. In addition, the thermoplastic resin is used for electronic parts. The aim is to lower the glass transition point and softening point of the cured product in order to improve the ease of removal by heating, and the viewpoint of maintaining the glass transition point to ensure connection reliability has been mentioned. Absent. Furthermore, the thermosetting resin composition described in Patent Document 3 does not describe the effect on the physical properties such as the glass transition point of the cured product which is important for the reliability of the connected mounting structure. It is insufficient as an adhesive material for underfill.
[0010] 一般に、エポキシ榭脂等の熱硬化性榭脂組成物硬化体のリペア一性を向上させる 手段としては、上記のような技術にみられるようにポリメチルメタタリレート等の熱可塑 性榭脂を配合するが、シリコンチップを加熱してチップを取り外した後、回路基板に 残った硬化体残渣を溶剤によって除去する工程を高温で行う必要がある等の困難さ があった。この硬化体のリペア一作業は室温近傍で行えることが望ましぐ上述の従 来の技術では充分とは言 ヽ難 、ものであった。  [0010] Generally, as a means for improving the repairability of a thermosetting resin composition such as an epoxy resin, a thermoplastic resin such as polymethyl methacrylate is used as described in the above-mentioned technology. Although the resin is mixed, there is a difficulty in that a step of removing the cured product residue remaining on the circuit board with a solvent after heating the silicon chip and removing the chip needs to be performed at a high temperature. It has been difficult to say that the above-mentioned conventional technique is sufficient because it is desired that the work of repairing the cured body can be performed at around room temperature.
[0011] 本発明は、このような事情に鑑みなされたもので、一度、アンダーフィルした後の電 気的接続に不具合のある電子部品装置であっても、室温近傍で残渣除去が可能で ありリペア一容易性に優れ、しかも接続された実装構造である電子部品装置が高信 頼性となる低粘度の封止用エポキシ榭脂組成物によって榭脂封止されてなる信頼性 の高い電子部品装置の提供をその目的とする。  [0011] The present invention has been made in view of such circumstances, and it is possible to remove a residue near room temperature even in an electronic component device having an electrical connection failure once underfilled. A highly reliable electronic component that is easily sealed with a low-viscosity epoxy resin composition for encapsulation that has excellent repairability and that has a connected mounting structure and high reliability. Its purpose is to provide a device.
課題を解決するための手段  Means for solving the problem
[0012] 上記の目的を達成するために、本発明の電子部品装置は、半導体部品に設けられ た接続用電極部と回路基板に設けられた接続用電極部を対向させた状態で上記回 路基板上に半導体部品が搭載され、上記回路基板と半導体部品との空隙が封止榭 脂層によって封止されてなる電子部品装置であって、上記封止榭脂層が下記の (A) 〜 (C)成分とともに下記の(D)成分を含有する液状エポキシ榭脂組成物によって形 成されてなると ヽぅ構成をとる。  [0012] In order to achieve the above object, the electronic component device of the present invention provides the electronic component device, wherein the connection electrode portion provided on the semiconductor component and the connection electrode portion provided on the circuit board face each other. An electronic component device in which a semiconductor component is mounted on a substrate and a gap between the circuit board and the semiconductor component is sealed by a sealing resin layer, wherein the sealing resin layer has the following (A) to When it is formed by a liquid epoxy resin composition containing the following component (D) together with the component (C), the composition takes the following structure.
(A)液状エポキシ榭脂。  (A) Liquid epoxy resin.
(B)芳香族ジァミン類硬化剤。  (B) Aromatic diamine curing agents.
(C)無機質充填剤。  (C) an inorganic filler.
(D)有機質添加剤。  (D) Organic additives.
[0013] 本発明者らは、上記目的を達成するために、回路基板と半導体部品(半導体装置 や半導体素子等)との空隙を榭脂封止するためのアンダーフィル材料であるェポキ シ榭脂組成物について研究を重ねた。先に本発明者らは、特定のエポキシ榭脂組 成物の硬化体が特定の溶剤により溶媒和、そして引き続き膨潤が生起し、結果、封 止榭脂である硬化体の被膜強度の低下や接着力の低下が起こり、硬化体の機械的 剥離が可能となり、半導体素子 (フリップチップ)のリペア一が可能となることを見出し 提案している(特開平 2003— 119454号公報)。すなわち、硬化剤である特定の含 フッ素芳香族ジァミン類は、トリフルォロメチル置換基またはフッ素置換基により硬化 体の溶解性パラメーター [Solubility Parameter (SP)〕値を低下させるため、特定の溶 剤により溶媒和、そして引き続き膨潤が生起しやすいことを奏功してリペア一性を発 現している。 [0013] The present inventors have achieved a circuit board and a semiconductor component (semiconductor device) in order to achieve the above object. And semiconductor devices, etc.), the epoxy resin composition which is an underfill material for sealing the voids with the resin. First, the present inventors have found that a cured product of a specific epoxy resin composition is solvated with a specific solvent and subsequently swells, and as a result, a decrease in the film strength of the cured product as a sealing resin and It has been found that the adhesive strength is reduced, the cured body can be mechanically peeled, and the semiconductor element (flip chip) can be repaired (Japanese Patent Application Laid-Open No. 2003-119454). In other words, the specific fluorinated aromatic diamines as the curing agent decrease the solubility parameter [Solubility Parameter (SP)] value of the cured product due to the trifluoromethyl substituent or the fluorine substituent, so that the specific solvent is used. The effect of solvation and subsequent swelling is easy to occur, and repairability is exhibited.
[0014] さらに、本発明では、有機質添加剤を併用することにより、一層のリペア一性の改善 効果が得られることを突き止めたのである。すなわち、本発明者らは、上記目的を達 成するために、回路基板と半導体部品との空隙を榭脂封止するためのアンダーフィ ル材料であるエポキシ榭脂組成物について研究を重ねた。その結果、上記 (A)〜( C)成分とともに、有機質添加剤〔(D)成分〕を配合すると、このエポキシ榭脂組成物 の硬化体が特定の溶剤により溶媒和、そして引き続き膨潤が生起し、結果、封止榭 脂である硬化体の被膜強度の低下や接着力の低下が起こり、硬化体の機械的剥離 が可能となり、回路基板に残った榭脂残渣が室温等で容易に除去できる等の半導体 部品のリペア一が一層容易となることを見出し本発明に到達した。  Further, in the present invention, it has been found that the combined use of an organic additive can further improve the repairability. That is, the present inventors have repeatedly studied an epoxy resin composition which is an underfill material for resin sealing a gap between a circuit board and a semiconductor component in order to achieve the above object. As a result, when an organic additive [component (D)] is blended together with the above components (A) to (C), the cured product of the epoxy resin composition is solvated with a specific solvent, and swelling occurs continuously. As a result, the coating strength of the cured resin, which is the sealing resin, and the adhesive strength are reduced, and the cured product can be mechanically peeled off, and the resin residue remaining on the circuit board can be easily removed at room temperature or the like. The present inventors have found that repair of semiconductor components such as the above becomes easier, and arrived at the present invention.
[0015] すなわち、本発明は、以下の態様を含む。  That is, the present invention includes the following aspects.
[0016] 1. 半導体部品に設けられた接続用電極部と回路基板に設けられた接続用電極 部を対向させた状態で上記回路基板上に半導体部品が搭載され、上記回路基板と 半導体部品との空隙が封止榭脂層によって封止されてなる電子部品装置であって、 上記封止榭脂層が下記の (A)〜 (C)成分とともに下記の (D)成分を含有する液状ェ ポキシ榭脂組成物によって形成されてなることを特徴とする電子部品装置。  [0016] 1. A semiconductor component is mounted on the circuit board in a state where the connection electrode section provided on the semiconductor component and the connection electrode section provided on the circuit board face each other. Wherein the sealing resin layer contains the following components (A) to (C) together with the following components (D). An electronic component device formed by a epoxy resin composition.
(A)液状エポキシ榭脂。  (A) Liquid epoxy resin.
(B)芳香族ジァミン類硬化剤。  (B) Aromatic diamine curing agents.
(C)無機質充填剤。 (D)有機質添加剤。 (C) an inorganic filler. (D) Organic additives.
[0017] 2. 上記 (B)成分である芳香族ジァミン類硬化剤が、下記の一般式(1)で表される 芳香族ジァミンおよびその誘導体の少なくとも一つである上記 1記載の電子部品装 置。  [0017] 2. The electronic component device according to the above item 1, wherein the aromatic diamine curing agent as the component (B) is at least one of an aromatic diamine represented by the following general formula (1) and a derivative thereof. Place.
[0018] [化 1]  [0018] [Formula 1]
Figure imgf000006_0001
Figure imgf000006_0001
〔式 (1 ) 中、 Xは水素および/または C„ HE+1 ( nは 1〜1 0の [In the formula (1), X is hydrogen and / or C „H E+1 (n is 1 to 10
正数である) である。 mは 1〜4の正数である。 R 1 〜R4は水素 Is a positive number). m is a positive number from 1 to 4. R 1 to R 4 are hydrogen
または一価の^ ISであり、 互レ、に同じであっても異なって L、ても  Or monovalent ^ IS, which is the same or different,
よい。 〕  Good. ]
3. 上記 (B)成分である芳香族ジァミン類硬化剤が、下記の一般式(2)で表される 含フッ素芳香族ジァミンおよびその誘導体の少なくとも一つである上記 1記載の電子 部品装置。 3. The electronic component device according to the above item 1, wherein the aromatic diamine curing agent as the component (B) is at least one of a fluorinated aromatic diamine represented by the following general formula (2) and a derivative thereof.
[化 2]  [Formula 2]
Figure imgf000006_0002
Figure imgf000006_0002
〔式 (2 ) 中、 Yはフッ素および Zまたは C,、 F^, ( ηは 1〜: 1 0の  [In the formula (2), Y is fluorine and Z or C, F ^, (η is from 1 to 10
正数である。 ) である。 mは 1〜4の正数である。 R*5 〜Reは水素 It is a positive number. ). m is a positive number from 1 to 4. R * 5 ~R e is hydrogen
または一価の有機基であり、 互 、に同じであっても異なって 1/、てもよ  Or a monovalent organic group, which may be the same or different 1 /
い。 〕  No. ]
[0020] 4. 上記 (B)成分である芳香族ジァミン類硬化剤が、 1分子中に 1個のエポキシ基 を含有するモノエポキシ化合物と、 2, 2' —ジトリフルォロメチル— 4, 4' —ジァミノ ビフエニルとの反応生成物である上記 1記載の電子部品装置。  [0020] 4. The aromatic diamine curing agent as the component (B) is a monoepoxy compound having one epoxy group in one molecule, and 2,2′-ditrifluoromethyl—4, 4. The electronic component device according to the above item 1, which is a reaction product with 4'-diaminobiphenyl.
[0021] 5. 上記 1分子中に 1個のエポキシ基を含有するモノエポキシィ匕合物力 n—ブチ ルグリシジルエーテル、ァリルグリシジルエーテル、 2—ェチルへキシルグリシジルェ 一テル、スチレンオキサイド、フエニルダリシジルエーテル、クレジルグリシジルエーテ ル、ラウリルグリシジルエーテル、 p— sec—ブチルフエ-ルグリシジルエーテル、ノ- ルフエ-ルグリシジルエーテル、カルビノールのグリシジルエーテル、グリシジルメタク リレート、ビュルシクロへキセンモノェポキサイドおよび α—ピネンオキサイドからなる 群力 選ばれた少なくとも一つである上記 4記載の電子部品装置。 [0021] 5. Monoepoxy conjugate containing one epoxy group in one molecule of n-butyl glycidyl ether, aryl glycidyl ether, 2-ethylhexyl glycidyl ether Tere, styrene oxide, phenyldaricidyl ether, cresyl glycidyl ether, lauryl glycidyl ether, p-sec-butylphenol glycidyl ether, phenol glycidyl ether, glycidyl ether of carbinol, glycidyl methacrylate 5. The electronic component device according to the above item 4, wherein the device is at least one selected from the group consisting of butylcyclohexene monoepoxide and α-pinene oxide.
[0022] 6. 上記一般式(1)で表される芳香族ジァミンおよびその誘導体の少なくとも一つ と、(Α)成分である液状エポキシ榭脂とを反応させてなるプレボリマーを含有する上 記 2記載の電子部品装置。  [0022] 6. The above-mentioned compound containing a prepolymer obtained by reacting at least one of the aromatic diamine represented by the general formula (1) and a derivative thereof with a liquid epoxy resin as the component (II). Electronic component device according to the above.
[0023] 7. 上記一般式(2)で表される含フッ素芳香族ジァミンおよびその誘導体の少なく とも一つと、 (Α)成分である液状エポキシ榭脂とを反応させてなるプレボリマーを含有 する上記 3記載の電子部品装置。  7. The above-mentioned resin containing a prepolymer obtained by reacting at least one of the fluorine-containing aromatic diamine represented by the above general formula (2) and a derivative thereof with a liquid epoxy resin as the component (Α). Electronic component device according to 3.
[0024] 8. 上記 (C)成分である無機質充填剤が、平均粒子径 10 m以下の球状シリカ 粉末である上記 1〜7のいずれか一項に記載の電子部品装置。  8. The electronic component device according to any one of the above items 1 to 7, wherein the inorganic filler as the component (C) is a spherical silica powder having an average particle diameter of 10 m or less.
[0025] 9. 上記 (C)成分である無機質充填剤が、下記の一般式 (3)で表される有機シラ ン化合物によって表面が被覆された、平均粒子径 10 m以下の球状シリカ粉末であ る上記 1〜7のいずれか一項に記載の電子部品装置。  9. The inorganic filler as the component (C) is a spherical silica powder having an average particle diameter of 10 m or less, the surface of which is coated with an organic silane compound represented by the following general formula (3). 8. The electronic component device according to any one of 1 to 7 above.
[0026] [化 3]  [0026]
( α ' -O -^- S i - " f 3 l ) b ■■■ ( 3 ) (α '-O-^-S i-"f 3 l ) b ■■■ (3)
[式 (3 ) 中、 α ' は水素以外の一価の であり、 J3 1 は少なくとも Wherein (3), α 'is than monovalent than hydrogen, J3 1 is at least
1個のアミノ基、 エポキシ基、 ビニル基、 スチリル基、 メタクリロキシ  1 amino group, epoxy group, vinyl group, styryl group, methacryloxy
基、 ウレイド基を含む一価の有機基である。 また、 a , bは a + b = 4  And monovalent organic groups including ureido groups. A and b are a + b = 4
であり、 それぞれ 1 ~ 3の正の正数である。 〕  And each is a positive number between 1 and 3. ]
10. 上記一般式 (3)で表される有機シランィ匕合物が、下記の一般式 (4)で表され る有機シラン化合物である上記 9記載の電子部品装置。 [0028] [化 4] 10. The electronic component device according to the above item 9, wherein the organosilane compound represented by the general formula (3) is an organosilane compound represented by the following general formula (4). [0028]
{ a 1 -Oh^— S i—— y - NI I2 … (4 ) {a 1 -Oh ^ — S i—— y-NI I 2 … (4)
〔式 (4 ) 中、 α 1 は水素以外の一価の有機基であり、 7は二価の有 [In the formula (4), α 1 is a monovalent organic group other than hydrogen, and 7 is a divalent organic group.
である。 〕  It is. ]
[0029] 11. 上記 (C)成分である無機質充填剤が、下記の一般式 (5)で表される有機チ タンィ匕合物によって表面が被覆された、平均粒子径 10 m以下の球状シリカ粉末で ある上記 1〜7のいずれか一項に記載の電子部品装置。 [0029] 11. A spherical silica having an average particle diameter of 10 m or less, wherein the surface of the inorganic filler as the component (C) is coated with an organic titanium conjugate represented by the following general formula (5): The electronic component device according to any one of the above items 1 to 7, which is a powder.
[0030] [化 5]  [0030] [Formula 5]
( α 1 -0)- ^—T i― { β ι ) b -- ( 5 ) 1 -0)-^ —T i− (β ι ) b- (5)
〔式 (5 ) 中、 1 ί¾Κ素 の一価の ¾¾Sであり, β ΐ は少なくとも [In equation (5), 1- element is monovalent 1S, and β ΐ is at least
1個のアミノ基、 エポキシ基、 ビュル基、 スチリル基、 メタクリロキシ  1 amino group, epoxy group, butyl group, styryl group, methacryloxy
基、 ウレイド基を^ tf """価の ¾ ¾Sである。 また、 a , bは a + b = 4  Group, ureido group is t ¾S with ^ tf "" "valence, and a and b are a + b = 4
であり、 それぞれ 1〜 3の正の正数である。 〕  And each is a positive number between 1 and 3. ]
[0031] 12. 上記 (D)成分である有機質添加剤が、平均粒子径 10 m以下の球状熱可 塑性榭脂粒子および平均粒子径 10 μ m以下の球状架橋榭脂粒子の少なくとも一つ である上記 1〜: L 1のいずれか一項に記載の電子部品装置。 12. The organic additive as the component (D) is at least one of spherical thermoplastic resin particles having an average particle diameter of 10 m or less and spherical crosslinked resin particles having an average particle diameter of 10 μm or less. (1) The electronic component device according to any one of (1) to (1).
[0032] 13. 上記球状熱可塑性榭脂粒子および球状架橋榭脂粒子の少なくとも一つが、 球状ポリメチルメタタリレート粒子である上記 12記載の電子部品装置。 13. The electronic component device according to the above item 12, wherein at least one of the spherical thermoplastic resin particles and the spherical crosslinked resin particles is a spherical polymethylmetharylate particle.
[0033] 14. 上記球状ポリメチルメタタリレート粒子の重量平均分子量が、 100, 000〜5,14. The weight-average molecular weight of the spherical polymethyl methacrylate particles is from 100,000 to 5,000.
000, 000の範囲である上記 13記載の電子部品装置。 14. The electronic component device according to the above item 13, wherein the number is in the range of 000,000,000.
[0034] 15. 上記球状ポリメチルメタタリレート粒子力 ガラス転移温度 100°C以上の球状 架橋ポリメチルメタタリレート粒子である上記 13記載の電子部品装置。 15. The electronic component device according to the above item 13, wherein the spherical polymethyl methacrylate particles are spherical crosslinked polymethyl methacrylate particles having a glass transition temperature of 100 ° C. or higher.
[0035] 16. 上記半導体部品が、半導体素子である上記 1〜15のいずれか一項に記載 の電子部品装置。 16. The electronic component device according to any one of the above 1 to 15, wherein the semiconductor component is a semiconductor element.
[0036] 17. 上記半導体部品が、半導体装置である上記 1〜15のいずれか一項に記載 の電子部品装置。  [0036] 17. The electronic component device according to any one of the above 1 to 15, wherein the semiconductor component is a semiconductor device.
発明の効果  The invention's effect
[0037] このように、本発明は、前記 (A)〜(C)成分とともに、有機質添加剤〔(D)成分〕を 含有する液状エポキシ榭脂組成物力 なる封止榭脂層によって回路基板と半導体 部品との空隙が封止された電子部品装置である。このため、上記液状エポキシ榭脂 組成物は、低粘度で充填によるボイドの発生も無ぐ硬化した後においても特定の有 機溶剤によって室温で容易に溶媒和して膨潤する。その結果、硬化体の強度が著し く減少し、被着体 (電極等)から容易に剥離することが可能となる。したがって、この液 状エポキシ榭脂組成物を用い榭脂封止して得られた電子部品装置は優れた接続信 頼性を備えるとともに、電極間の位置ずれ等により接続不良が発生した場合でも、電 子部品装置そのものを廃棄することなく優れたリペア一性を備えた電子部品装置を 得ることができる。 As described above, the present invention provides an organic additive [component (D)] together with the components (A) to (C). This is an electronic component device in which the gap between the circuit board and the semiconductor component is sealed by a sealing resin layer containing a liquid epoxy resin composition. Therefore, the liquid epoxy resin composition easily solvates with a specific organic solvent at room temperature and swells even after being cured with low viscosity and without generation of voids due to filling. As a result, the strength of the cured product is significantly reduced, and the cured product can be easily separated from the adherend (such as an electrode). Therefore, an electronic component device obtained by resin encapsulation using this liquid epoxy resin composition has excellent connection reliability, and even if a connection failure occurs due to positional displacement between electrodes, etc. An electronic component device with excellent repairability can be obtained without discarding the electronic component device itself.
[0038] そして、上記芳香族ジァミン類硬化剤〔(B)成分〕として、後述の一般式 (1)で表さ れる芳香族ジァミンおよびその誘導体の少なくとも一つ、または後述の一般式(2)で 表される含フッ素芳香族ジァミンおよびその誘導体の少なくとも一つを用いると、迅速 な膨潤性によるリペア一の容易性が発現できると 、う効果を奏し好まし 、。  [0038] Then, as the aromatic diamine curing agent [component (B)], at least one of an aromatic diamine and a derivative thereof represented by the following general formula (1) or a general formula (2) The use of at least one of the fluorine-containing aromatic diamines and derivatives thereof represented by the following formula (1) is preferred because the effect of rapid swelling and ease of repair can be exhibited.
[0039] また、上記芳香族ジァミン類硬化剤〔(B)成分〕として、 1分子中に 1個のエポキシ基 を含有するモノエポキシ化合物と 2, 2' —ジトリフルォロメチル— 4, 4' —ジアミノビ フエニルとの反応生成物を用いると、溶媒和と膨潤性を高め、良好なリペア一が可能 となる。  As the aromatic diamine curing agent [component (B)], a monoepoxy compound containing one epoxy group in one molecule and 2,2′-ditrifluoromethyl-4,4 Use of the reaction product with '-diaminobiphenyl enhances solvation and swelling, and enables good repair.
[0040] また、上記芳香族ジァミン類硬化剤〔(B)成分〕として、後述の一般式 (1)で表され る芳香族ジァミンおよびその誘導体の少なくとも一つ、または一般式(2)で表される 含フッ素芳香族ジァミンおよびその誘導体の少なくとも一つを用い、これと液状ェポ キシ榭脂〔 (A)成分〕とを反応させてなるプレボリマーを用いると、より一層の硬化速 度の向上を図ることができるようになる。しかも、予め液状化から粘稠ペースト状ィ匕ま での状態に形成できるため、配合時の計量とその後の分散工程において煩雑なェ 程を必要とせず、容易に液状エポキシ榭脂組成物を得ることができる。  As the aromatic diamine curing agent [component (B)], at least one of an aromatic diamine represented by the following general formula (1) and a derivative thereof, or a compound represented by the general formula (2): The use of at least one of the fluorinated aromatic diamines and derivatives thereof and the reaction of the liquid epoxy resin (component (A)) with a prepolymer yields a further improvement in the curing speed. Can be achieved. Moreover, since the liquid epoxy resin composition can be formed in advance from the liquefaction to the viscous paste-like state, complicated steps are not required in the measurement at the time of mixing and the subsequent dispersion step, and the liquid epoxy resin composition can be easily obtained. be able to.
[0041] さらに、上記無機質充填剤〔(C)成分〕として、特定の有機シランィ匕合物あるいは特 定の有機チタン化合物によって表面が被覆された、特定の平均粒子径の球状シリカ 粉末を用いると、配合物の粘度が低減できたり、またはチクソトロピー性が低減できる という効果を奏する。 [0042] そして、上記有機質添加剤〔 (D)成分〕として、特定の平均粒子径の球状熱可塑性 榭脂粒子および特定の平均粒子径の球状架橋榭脂粒子の少なくとも一つを用いると 、半導体部品と榭脂系回路基板との狭ギャップ空隙を充分に注入充填できるという 効果を奏する。 [0041] Furthermore, when the above-mentioned inorganic filler [component (C)] is used, spherical silica powder having a specific average particle diameter, the surface of which is coated with a specific organosilane compound or a specific organic titanium compound, is used. The effect is that the viscosity of the composition can be reduced or the thixotropy can be reduced. [0042] When at least one of the spherical thermoplastic resin particles having a specific average particle diameter and the spherical crosslinked resin particles having a specific average particle diameter is used as the organic additive [(D) component], This has the effect that the narrow gap between the component and the resin-based circuit board can be sufficiently injected and filled.
図面の簡単な説明  Brief Description of Drawings
[0043] [図 1]本発明の電子部品装置の一例を模式的に示す断面図である。 FIG. 1 is a cross-sectional view schematically showing one example of an electronic component device of the present invention.
[図 2]本発明の電子部品装置の他の例を模式的に示す断面図である。  FIG. 2 is a cross-sectional view schematically showing another example of the electronic component device of the present invention.
符号の説明  Explanation of symbols
[0044] 1 半導体素子 (フリップチップ) [0044] 1 Semiconductor element (flip chip)
2, 12 配線回路基板  2, 12 Wiring circuit board
3 半導体素子の接続用電極部(半田バンプ)  3 Connecting electrodes for semiconductor devices (solder bumps)
4, 14 封止榭脂層  4, 14 Sealing resin layer
5, 15 配線回路基板の接続用電極部(半田パッド)  5, 15 Connection electrode part of printed circuit board (solder pad)
11 半導体装置 (半導体パッケージ)  11 Semiconductor device (semiconductor package)
13 半導体装置の接続用電極部(半田バンプ)  13 Electrodes for connecting semiconductor devices (solder bumps)
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0045] 本発明の電子部品装置は、半導体部品、半導体部品に設けられた接続用電極部 、回路基板、回路基板に設けられた接続用電極部、回路基板と該半導体部品との空 隙を封止する榭脂を含み、ここで、半導体部品に設けられた接続用電極部と回路基 板に設けられた接続用電極部が対向するように回路基板上に半導体部品が搭載さ れており、さらに、封止榭脂が下記の (A)、 (B)、 (C)、 (D)成分を含有する液状ェポ キシ榭脂組成物の硬化物である。 [0045] The electronic component device of the present invention provides a semiconductor component, a connection electrode portion provided on the semiconductor component, a circuit board, a connection electrode portion provided on the circuit board, and a gap between the circuit board and the semiconductor component. Including resin to be sealed, the semiconductor component is mounted on the circuit board such that the connection electrode provided on the semiconductor component and the connection electrode provided on the circuit board face each other. Further, the sealing resin is a cured product of a liquid epoxy resin composition containing the following components (A), (B), (C) and (D).
(A)液状エポキシ榭脂。  (A) Liquid epoxy resin.
(B)芳香族ジァミン類硬化剤。  (B) Aromatic diamine curing agents.
(C)無機質充填剤。  (C) an inorganic filler.
(D)有機質添加剤。  (D) Organic additives.
[0046] 本発明の電子部品装置の構成の一例として、半導体部品が半導体素子 (フリップ チップ)の場合について述べる。すなわち、図 1に示すように、半導体素子 (フリツプチ ップ) 1に設けられた接続用電極部(半田バンプ) 3と配線回路基板 2に設けられた接 続用電極部(半田パッド) 5を対向させた状態で、配線回路基板 2上に半導体素子( フリップチップ) 1が搭載されている。そして、上記配線回路基板 2と半導体素子 (フリ ップチップ) 1との空隙が液状エポキシ榭脂組成物を用いて形成されてなる封止榭脂 層 4によって榭脂封止されて 、る。 As an example of the configuration of the electronic component device of the present invention, a case where the semiconductor component is a semiconductor element (flip chip) will be described. That is, as shown in FIG. With the connection electrode portion (solder bump) 3 provided on 1 and the connection electrode portion (solder pad) 5 provided on the printed circuit board 2 facing each other, the semiconductor is placed on the printed circuit board 2. Element (flip chip) 1 is mounted. Then, a gap between the wiring circuit board 2 and the semiconductor element (flip chip) 1 is resin-sealed by a sealing resin layer 4 formed using a liquid epoxy resin composition.
[0047] なお、上記電子部品装置では、半導体素子 1に設けられた接続用電極部 3がバン プ形状に形成されているが特にこれに限定するものではなぐ配線回路基板 2に設 けられた接続用電極部 5がバンプ形状に設けられて 、てもよ 、。  In the above electronic component device, the connection electrode portion 3 provided on the semiconductor element 1 is formed in a bump shape, but is not particularly limited to this, and is provided on the printed circuit board 2. The connection electrode portion 5 may be provided in a bump shape.
[0048] つぎに、本発明の電子部品装置の構成の他の例として、半導体部品が半導体装 置(半導体パッケージ)の場合について述べる。すなわち、図 2に示すように、半導体 装置 (半導体パッケージ) 11に設けられた接続用電極部(半田バンプ) 13と配線回 路基板 12に設けられた接続用電極部(半田パッド) 15を対向させた状態で、配線回 路基板 12上に半導体パッケージ 11が搭載されている。そして、上記配線回路基板 1 2と半導体パッケージ 11との空隙が液状エポキシ榭脂組成物を用いて形成されてな る封止榭脂層 14によって榭脂封止されて 、る。  Next, as another example of the configuration of the electronic component device of the present invention, a case where the semiconductor component is a semiconductor device (semiconductor package) will be described. That is, as shown in FIG. 2, the connection electrode portion (solder bump) 13 provided on the semiconductor device (semiconductor package) 11 and the connection electrode portion (solder pad) 15 provided on the wiring circuit board 12 face each other. In this state, the semiconductor package 11 is mounted on the wiring circuit board 12. Then, a gap between the printed circuit board 12 and the semiconductor package 11 is resin-sealed by a sealing resin layer 14 formed using a liquid epoxy resin composition.
[0049] 上記半導体パッケージ 11としては、接続用電極部(半田バンプ) 13が設けられ配 線回路基板 12に搭載可能なものであれば特にその形状等限定するものではないが 、例えば、 BGA (ボール'グリッド 'アレイ)や CSP (チップ 'スケール'パッケージまた はチップ ·サイズ'パッケージ)等が有用なものとしてあげられる。  The shape of the semiconductor package 11 is not particularly limited as long as it is provided with a connection electrode portion (solder bump) 13 and can be mounted on the wiring circuit board 12. Ball 'grids' arrays and CSPs (chip' scale 'packages or chip size' packages) are useful.
[0050] なお、上記電子部品装置では、半導体パッケージ 11に設けられた接続用電極部 1 3がバンプ形状に形成されているが特にこれに限定するものではなぐ配線回路基板 12に設けられた接続用電極部 15がバンプ形状に設けられて 、てもよ 、。  In the above electronic component device, the connection electrode portion 13 provided on the semiconductor package 11 is formed in a bump shape. However, the connection electrode portion 13 provided on the wiring circuit board 12 is not particularly limited to this. The electrode section 15 may be provided in a bump shape.
[0051] 上記封止榭脂層 4および封止榭脂層 14の形成材料である液状エポキシ榭脂組成 物は、 Vヽずれも、液状エポキシ榭脂 (A成分)と、芳香族ジァミン類硬化剤 (B成分)と 、無機質充填剤 (C成分)とともに、有機質添加剤 (D成分)を配合して得られるもので ある。なお、本発明に用いられる液状エポキシ榭脂組成物において、液状とは 25°C で流動性を示す液状のことをいう。すなわち、 25°Cで粘度が 0. OlmPa' s〜: LOOOO Pa' sの範囲のものをいう。上記粘度の測定は、例えば、 EMD型回転粘度計を用い て行うことができる。 [0051] The liquid epoxy resin composition, which is a material for forming the sealing resin layer 4 and the sealing resin layer 14, is prepared by curing the liquid epoxy resin (A component) and the aromatic diamines even when the V difference is large. It is obtained by blending an organic additive (D component) together with an agent (B component) and an inorganic filler (C component). In the liquid epoxy resin composition used in the present invention, the liquid refers to a liquid that exhibits fluidity at 25 ° C. In other words, the viscosity at 25 ° C is in the range of 0.1 OlmPa's to: LOOOO Pa's. The viscosity is measured using, for example, an EMD type rotational viscometer. Can be done.
[0052] 上記液状エポキシ榭脂 (A成分)としては、 1分子中に 2個以上のエポキシ基を含有 する液状エポキシ榭脂であれば特に限定されるものではなぐ例えば、ビスフ ノー ル A型、ビスフエノール F型、水添ビスフエノール A型、ビスフエノール AF型、フエノー ルノボラック型等の各種液状エポキシ榭脂およびその誘導体、多価アルコールとェピ クロルヒドリンカ 誘導される液状エポキシ榭脂およびその誘導体、グリシジルァミン 型、ヒダントイン型、ァミノフエノール型、ァ-リン型、トルイジン型等の各種グリシジル 型液状エポキシ榭脂およびその誘導体 (実用プラスチック辞典編集委員会編、「実用 プラスチック辞典材料編」、初版第 3刷、 1996年 4月 20日発行、第 211ページ〜第 2 25ページにかけて記載)およびこれら上記液状エポキシ榭脂と各種グリシジル型固 形エポキシ榭脂の液状混合物等があげられる。これらは単独でもしくは 2種以上併せ て用いられる。  The liquid epoxy resin (A component) is not particularly limited as long as it is a liquid epoxy resin containing two or more epoxy groups in one molecule. For example, bisphenol A type, Various liquid epoxy resins such as bisphenol F type, hydrogenated bisphenol A type, bisphenol AF type and phenol novolak type, and derivatives thereof, polyhydric alcohol and epichlorohydrinka Induced liquid epoxy resins and derivatives thereof Glycidylamine type, hydantoin type, aminophenol type, arin type, toluidine type, etc. various glycidyl type liquid epoxy resins and derivatives thereof First edition, 3rd printing, issued on April 20, 1996, pages 211 to 225) and these liquid epoxy resins Liquid mixture of various glycidyl type solid-type epoxy 榭脂 the like. These may be used alone or in combination of two or more.
[0053] 上記芳香族ジァミン類硬化剤 (B成分)は、上記液状エポキシ榭脂 (A成分)の硬化 作用を奏するものであり、芳香族ジァミンおよびその誘導体の少なくとも一つを用いる ことが好ましぐさらに含フッ素芳香族ジァミンおよびその誘導体の少なくとも一つを 用いることが特定の溶剤により溶媒和、そして引き続き膨潤し易くなる観点力 より好 ましい。  The aromatic diamine curing agent (component B) has a function of curing the liquid epoxy resin (component A), and it is preferable to use at least one of aromatic diamine and a derivative thereof. It is more preferable to use at least one of a fluorine-containing aromatic diamine and a derivative thereof from the viewpoint of solvation with a specific solvent and subsequent swelling.
[0054] 上記芳香族ジァミンおよびその誘導体の少なくとも一つにおける芳香族ジァミンとし ては、 p—フエ二レンジァミン、 m—フエ二レンジァミン、 2, 5 トルエンジァミン、 2, 4 トルエンジァミン、 4, 6 ジメチルー m—フエ二レンジァミン、 2, 4 ジァミノメシチ レン等の芳香族 1核体ジァミン、 4, 4' ージアミノジフエ-ルエーテル、 3, 3' —ジァ ミノジフエニルエーテル、 3, 4' —ジアミノジフエニルエーテル、 4, 4' ージアミノジフ ェニルメタン、 3, 3' —ジアミノジフエニルメタン、 4, 4' ージアミノジフエニルスルホ ン、 3, 3' —ジアミノジフエ-ルスルホン、 4, 4' —ジアミノジフエ-ルスルフイド、 3, 3' —ジアミノジフエ-ルスルフイド、 4, 4' —ジァミノべンゾフエノン、 3, 3' —ジアミ ノベンゾフエノン等の芳香族 2核体ジァミン、 1, 4 ビス(4 アミノフエノキシ)ベンゼ ン、 1, 4 ビス(3 アミノフエノキシ)ベンゼン、 1, 3 ビス(4 アミノフエノキシ)ベン ゼン、 1, 3 ビス(3 アミノフエノキシ)ベンゼン等の芳香族 3核体ジァミン、 4, 4' —ジ一(4—アミノフエノキシ)ジフエ-ルスルホン、 4, 4' —ジ一(3—ァミノフエノキシ )ジフエ-ルスルホン、 4, 4' —ジ一(4—アミノフエノキシ)ジフエ-ルプロパン、 4, 4 ' —ジ一(3—アミノフエノキシ)ジフエ-ルプロパン、 4, 4' —ジ一(4—ァミノフエノキ シ)ジフエ-ルエーテル、 4, 4' ージー(3—アミノフエノキシ)ジフエ-ルエーテル等 の芳香族 4核体ジァミン等があげられ、これらは単独でもしくは 2種以上併せて用いら れる。 The aromatic diamine in at least one of the above aromatic diamines and derivatives thereof includes p-phenylenediamine, m-phenylenediamine, 2,5 toluenediamine, 2,4 toluenediamine, and 4,6 dimethyl m-diamine. Aromatic mononuclear diamines such as phenylenediamine and 2,4 diaminomesitylene, 4, 4 'diamino diphenyl ether, 3, 3'- diamino diphenyl ether, 3, 4' diamino diphenyl ether, 4, 4 'diaminodiphenylmethane, 3, 3'-diaminodiphenylmethane, 4, 4 'diaminodiphenylsulfone, 3, 3'-diaminodiphenylsulfone, 4, 4 '-diaminodiphenylsulfide, 3, 3'-diaminodiphenyl -Risulfide, 4, 4'-Diaminobenzophenone, 3,3'-Aromatic dinuclear diamine such as diaminobenzophenone, 1,4-bis 4-aminophenoxy) benzene, 1, 4-bis (3-aminophenoxy) benzene, 1, 3-bis (4-aminophenoxy) benzene, 1, 3-bis (3-aminophenoxy) aromatic trinuclear Jiamin such as benzene, 4, 4 ' —Di- (4-aminophenoxy) diphenylsulfone, 4, 4 ′ —Di- (3-aminophenoxy) diphenylsulfone, 4, 4 ′ —Di- (4-aminophenoxy) diphenylpropane, 4, 4′-Di Aromatic tetranuclear diamines such as mono (3-aminophenoxy) diphenylpropane, 4,4'-di (4-aminophenoxy) diphenyl ether, and 4,4'-di (3-aminophenoxy) diphenyl ether These may be used alone or in combination of two or more.
[0055] 特に、上記芳香族ジァミン類硬化剤 (B成分)として、下記の一般式(1)で表される 芳香族ジァミンおよびその誘導体の少なくとも一つを用いることが、室温でのポットラ ィフが長くなるとの観点力も好適に用いられる。  [0055] In particular, the use of at least one of an aromatic diamine represented by the following general formula (1) and a derivative thereof as the aromatic diamine curing agent (component B) is advantageous in pot life at room temperature. Is also preferably used.
[0056] [化 1]  [0056] [Formula 1]
Figure imgf000013_0001
Figure imgf000013_0001
〔式 (1 ) 中、 Xは水素および/または Cn H2n (ηは 1〜1 0の [In the formula (1), X is hydrogen and / or C n H 2n (η is 1 to 10
正数である) である。 mは 1〜4の正数である。 R1 〜! T は水素 Is a positive number). m is a positive number from 1 to 4. R 1 ~! T is hydrogen
または一価の有機基であり、 互いに同じであっても異なっていても  Or a monovalent organic group, even if they are the same or different
よい。 ]  Good. ]
[0057] 上記式(1)において、 R1〜R4は水素または一価の有機基である。上記一価の有 機基としては、例えば、 Cn H2n+l (nは 1〜10の正数である。)で示される飽和ァ ルキル基、ァリール基、 -CH2 CH (OH) CH2— OCn H2n+1で示される 3 アルコ キシ置換— 2 ヒドロキシプロピル基、 CH2 CH (OH) CH2— O— R9 (R9はァリー ル基である。)で示される 3 ァリール置換— 2 ヒドロキシプロピル基等があげられる 。そして、上記 Ri〜R4は互いに同じであっても異なっていてもよい。 In the above formula (1), R 1 to R 4 are hydrogen or a monovalent organic group. Examples of the monovalent organic group include a saturated alkyl group represented by Cn H2n + 1 (n is a positive number of 1 to 10), an aryl group, -CH2CH (OH) CH2—OCnH2n 3 alkoxy substitution represented by +1 — 2 hydroxypropyl group, CH2 CH (OH) CH2 — O — 3 aryl substitution represented by R 9 (R 9 is an aryl group) — 2 hydroxypropyl group, etc. can give . Then, the Ri~R 4 may be different be the same as each other.
[0058] また、上記含フッ素芳香族ジァミンおよびその誘導体の少なくとも一つにおける含 フッ素芳香族ジァミンとしては、 1級のアミノ基を有するフッ素置換芳香族ジァミンであ れば特に限定されるものではなぐ例えば、 2, 2' ージトリフルォロメチルー 4, 4' ジアミノビフエ-ル、 2, 2 ビス(4 ァミノフエ-ル)へキサフルォロプロパン、 2, 2— ビス(3 アミノー 4—メチルフエ-ル)へキサフルォロプロパン、 2, 2 ビス(3 ァミノ —4 ヒドロキシフエ-ル)へキサフルォロプロパン、 2, 2 ビス〔4— (4 アミノフエノ キシ)フエ-ル〕へキサフルォロプロパン、 2, 2 ビス(3 アミノー 4, 5 ジメチルフエ -ル)へキサフルォロプロパン、 2, 2 ビス(4 ヒドロキシ一 3 ァミノフエ-ル)へキ サフルォロプロパン、 4, 4' ビス〔2—(4 カルボキシフエ-ル)へキサフルォロイ ソプロピル〕ジフエ-ルエーテル、 4, 4' —ビス〔2— (4—ァミノフエノキシフエ-ル)へ キサフルォロイソプロピル〕ジフエ-ルエーテル等があげられ、これらは単独でもしく は 2種以上併せて用いられる。 [0058] The fluorinated aromatic diamine in at least one of the above fluorinated aromatic diamines and derivatives thereof is not particularly limited as long as it is a fluorinated aromatic diamine having a primary amino group. For example, 2,2'-ditrifluoromethyl-4,4'-diaminobiphenyl, 2,2 bis (4-aminophenyl) hexafluoropropane, 2,2-bis (3 amino-4-methylphenyl) ) Hexafluoropropane, 2, 2 bis (3 amino —4 hydroxyphenyl) hexafluoropropane, 2,2-bis [4- (4 aminophenoxy) phenyl] hexafluoropropane, 2,2 bis (3 amino-4,5 dimethylphenyl) ) Hexafluoropropane, 2,2 bis (4-hydroxy-13-aminophenol) hexafluoropropane, 4,4'bis [2- (4 carboxyphenyl) hexafluoroisopropyl] diphenyl ether And 4,4'-bis [2- (4-aminophenoxyphenyl) hexafluoroisopropyl] diphenyl ether and the like, which may be used alone or in combination of two or more.
[0059] 特に、上記芳香族ジァミン類硬化剤 (B成分)としては、下記の一般式 (2)で表され る含フッ素芳香族ジァミンおよびその誘導体の少なくとも一つを用いることが、室温で のポットライフが長くなるということから好適に用いられる。  [0059] In particular, as the aromatic diamine curing agent (component B), at least one of a fluorine-containing aromatic diamine represented by the following general formula (2) and a derivative thereof can be used at room temperature. It is preferably used because the pot life becomes longer.
[0060] [化 2]  [0060] [Formula 2]
Figure imgf000014_0001
Figure imgf000014_0001
〔式 ( 2 ) 中、 Yはフッ素および/または C„ F ( n ii l〜l 0の  [In the formula (2), Y is fluorine and / or C „F (niil to l0
正数である。 ) である。 mは 1〜4の正数である。 R5 は水素 It is a positive number. ). m is a positive number from 1 to 4. R 5 is hydrogen
または一価の; であり、 互いに同じであっても異なっていてもよ  Or monovalent; which may be the same or different
[0061] 上記式(2)にお 、て、 R5〜R°は水素または一価の有機基である。上記一価の有 機基としては、例えば、 Cn H2n+l (nは 1〜10の正数である。)で示される飽和ァ ルキル基、ァリール基、 -CH2 CH (OH) CH2— OCn H2n+1で示される 3 アルコ キシ置換一 2 ヒドロキシプロピル基、 CH2 CH (OH) CH2— O— R10 (R10はァリ ール基である。)で示される 3 ァリール置換— 2 ヒドロキシプロピル基等があげら れる。そして、 R5〜R8は互いに同じであっても異なっていてもよい。 [0061] In the above formula (2), R 5 to R ° are hydrogen or a monovalent organic group. Examples of the monovalent organic group include a saturated alkyl group represented by Cn H2n + 1 (n is a positive number of 1 to 10), an aryl group, -CH2CH (OH) CH2—OCnH2n 3-alkoxy-substituted 1-hydroxypropyl group represented by +1; 3-aryl-substituted 2-hydroxypropyl group represented by CH2 CH (OH) CH2—O—R 10 (R 10 is aryl group) And so on. And, R 5 to R 8 may be the same or different from each other.
[0062] なかでも、本発明にお ヽては、上記芳香族ジァミン類硬化剤 (B成分)として、最も 活性水素当量が小さい、 2, 2' —ジトリフルォロメチルー 4, 4' —ジアミノビフエ-ル を用いること、または同様に最も活性水素当量が小さい、 p フエ-レンジァミン、 m —フエ-レンジアミンを用いることが、配合量を少なくすることができ、一液無溶剤ェ ポキシ榭脂組成物の粘度を低減できると ヽぅ観点から好まし ヽ。 [0062] In particular, in the present invention, 2,2'-ditrifluoromethyl-4,4'-diaminobihue having the smallest active hydrogen equivalent is used as the aromatic diamine curing agent (component B). Or the use of p-phenylenediamine or m-phenylenediamine, which also has the lowest active hydrogen equivalent, can reduce the amount of compounding, It is preferable from the viewpoint that the viscosity of the epoxy resin composition can be reduced.
[0063] さらに、上記芳香族ジァミン類硬化剤 (B成分)として、上記含フッ素芳香族ジァミン 、特に 2, 2' —ジトリフルォロメチル一 4, 4' —ジアミノビフエ-ルと、 1分子中に 1個 のエポキシ基を含有するモノエポキシ化合物との反応生成物を用いることが、溶媒和 と膨潤性を高め、良好なリペア一が可能となるという点から好適に用いられる。上記 含フッ素芳香族ジァミンと 1分子中に 1個のエポキシ基を含有するモノエポキシ化合 物との反応は、一般的には、無触媒下に、所定量の各成分を反応容器に仕込み、窒 素気流下、 60〜120°C程度に加温してエポキシ基が消費されるまで反応が行われ る。そして、このようにして、例えば、 N, N, Ν' , Ν' —4置換含フッ素芳香族ジアミ ン化合物が得られる。 Further, as the aromatic diamine curing agent (component B), the above-mentioned fluorinated aromatic diamine, particularly 2,2′-ditrifluoromethyl-1,4,4′-diaminobiphenyl, in one molecule The use of a reaction product with a monoepoxy compound containing one epoxy group is preferred from the viewpoint that the solvation and swelling properties are improved and good repair is possible. In the reaction of the above-mentioned fluorinated aromatic diamine with a monoepoxy compound having one epoxy group in one molecule, generally, a predetermined amount of each component is charged into a reaction vessel without a catalyst, and the reaction is carried out by nitriding. The reaction is carried out by heating to about 60 to 120 ° C under a stream of air until the epoxy groups are consumed. And, in this way, for example, N, N, Ν ′, Ν′—4-substituted fluorine-containing aromatic diamine compound is obtained.
[0064] 上記モノエポキシィ匕合物としては、 1分子中に 1個のエポキシ基を含有するェポキ シ化合物であれば特に限定されるものではなぐ例えば、 η—ブチルダリシジルエー テル、ァリルグリシジルエーテル、 2—ェチルへキシルグリシジルエーテル、スチレン オキサイド、フエ-ルグリシジルエーテル、クレジルグリシジルエーテル、ラウリルグリ シジルエーテル、 ρ— sec—ブチルフエ-ルグリシジルエーテル、ノ-ルフエ-ルグリ シジルエーテル、カルビノールのグリシジルエーテル、グリシジルメタタリレート、ビ- ルシクロへキセンモノェポキサイド、 a—ビネンオキサイド等があげられる。これらは単 独でもしくは 2種以上併せて用いられる。 The monoepoxy conjugate is not particularly limited as long as it is an epoxy compound containing one epoxy group in one molecule. For example, η-butyldaricidyl ether, aryl glycidyl ether , 2-ethylhexyl glycidyl ether, styrene oxide, phenol glycidyl ether, cresyl glycidyl ether, lauryl glycidyl ether, ρ-sec-butyl phenyl glycidyl ether, norphenyl glycidyl ether, glycidyl ether of carbinol Glycidyl methacrylate, vinylcyclohexene monoepoxide, a- binene oxide and the like. These may be used alone or in combination of two or more.
[0065] 本発明にお ヽて、液状エポキシ榭脂 (A成分)と芳香族ジァミン類硬化剤 (B成分) との配合割合は、上記液状エポキシ榭脂 (A成分)のエポキシ基 1個に対して、上記 芳香族ジァミン類硬化剤(B成分)の活性水素の個数を 0. 4〜1. 6個の範囲に設定 することが好ましい。より好ましくは 0. 6〜1. 2個の範囲である。すなわち、エポキシ 基 1個に対して活性水素の個数が 1. 6を超えると、液状エポキシ榭脂組成物の粘度 が増加する傾向がみられ、また、 0. 4未満では、液状エポキシ榭脂組成物硬化体の ガラス転移温度が低下する傾向がみられるからである。  [0065] In the present invention, the mixing ratio of the liquid epoxy resin (Component A) and the aromatic diamine curing agent (Component B) is one epoxy group of the liquid epoxy resin (Component A). On the other hand, the number of active hydrogens in the aromatic diamine curing agent (component B) is preferably set in the range of 0.4 to 1.6. More preferably, it is in the range of 0.6 to 1.2. That is, when the number of active hydrogens per epoxy group exceeds 1.6, the viscosity of the liquid epoxy resin composition tends to increase, and when it is less than 0.4, the liquid epoxy resin composition tends to increase. This is because the glass transition temperature of the cured product tends to decrease.
[0066] 一方、本発明では、上記液状エポキシ榭脂 (A成分)、特にその中でも多官能脂肪 族液状エポキシ榭脂を用いる場合、上記一般式(1)で表される芳香族ジァミンおよ びその誘導体の少なくとも一つあるいは上記一般式(2)で表される含フッ素芳香族 ジァミンおよびその誘導体の少なくとも一つと、多官能脂肪族液状エポキシ榭脂とを 予備反応させプレボリマーとすることにより、多官能脂肪族液状エポキシ榭脂等に含 有する低沸点化合物の蒸発'揮発に起因したボイドの発生の可能性を低減すること ができる。 On the other hand, in the present invention, when the above-mentioned liquid epoxy resin (component A), particularly, a polyfunctional aliphatic liquid epoxy resin is used, the aromatic diamine represented by the above general formula (1) and its aromatic diamine At least one derivative or a fluorinated aromatic represented by the above general formula (2) Preliminary reaction of at least one of diamine and its derivatives with a polyfunctional aliphatic liquid epoxy resin to form a prepolymer resulted in evaporation and volatilization of low-boiling compounds contained in the polyfunctional aliphatic liquid epoxy resin and the like. The possibility of generation of voids can be reduced.
[0067] 上記プレボリマーは、例えば、上記一般式(1)で表される芳香族ジァミンおよびそ の誘導体の少なくとも一つあるいは上記一般式(2)で表される含フッ素芳香族ジアミ ンおよびその誘導体の少なくとも一つと、 1分子中に 2個以上のエポキシ基を有する 多官能脂肪族液状エポキシ化合物とを反応させることにより得られる。一般的には、 無触媒下に、所定量の各成分を反応容器に仕込み、窒素気流下、 60〜120°C程度 に加温して所定の分子量になるまで反応を行い、プレボリマーを作製する。このプレ ポリマーの分子量としては、ポリスチレン換算の重量平均分子量で 400〜5000程度 となるまで反応させたプレボリマーとすることが好ましぐこのようなプレボリマーとする ことにより揮発性の低沸点の低分子量化合物の蒸発'揮発に起因するアンダーフィ ル封止榭脂層のボイド発生を防止することができる。  The prepolymer is, for example, at least one of the aromatic diamine represented by the general formula (1) and a derivative thereof or the fluorine-containing aromatic diamine represented by the general formula (2) and a derivative thereof And a polyfunctional aliphatic liquid epoxy compound having two or more epoxy groups in one molecule. Generally, a predetermined amount of each component is charged into a reaction vessel without a catalyst, and heated to about 60 to 120 ° C under a nitrogen stream to react until a predetermined molecular weight is reached, thereby producing a pre-polymer. . The prepolymer preferably has a molecular weight of about 400 to 5,000 in terms of polystyrene equivalent weight average molecular weight.Preferably, such a prepolymer is used to form a volatile low-boiling low molecular weight compound. It is possible to prevent voids in the underfill sealing resin layer due to evaporation and volatilization of the resin.
[0068] 上記多官能脂肪族液状エポキシ榭脂としては、具体的には、エチレングリコールジ グリシジルエーテル、プロピレングリコールジグリシジルエーテル、ブタンジオールジ グリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、ジグリシジルァ 二リン、トリメチロールプロパンジグリシジルエーテル、トリメチロールプロパントリグリシ ジルエーテル、グリセリンジグリシジルエーテル、グリセリントリグリシジルエーテル等 の脂肪族ジオールやトリオール、または脂肪族多官能アルコールの多官能グリシジ ルエーテル等があげられる。  [0068] Specific examples of the polyfunctional aliphatic liquid epoxy resin include ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, butanediol diglycidyl ether, neopentyl glycol diglycidyl ether, diglycidyl diphosphorus, and triglycidyl diglycidyl ether. Examples include aliphatic diols and triols such as methylolpropane diglycidyl ether, trimethylolpropane triglycidyl ether, glycerin diglycidyl ether, and glycerin triglycidyl ether, and polyfunctional glycidyl ethers of aliphatic polyfunctional alcohols.
[0069] また、本発明では、硬化時間の短縮のために公知の各種硬化促進剤を用いること ができる。具体的には、サリチル酸等の酸性触媒、銅ァセチルァセトナート、亜鉛ァ セチルァセトナート等のルイス酸等があげられる。これらは単独でもしくは 2種以上併 せて用いられる。  [0069] In the present invention, various known curing accelerators can be used to shorten the curing time. Specific examples include an acidic catalyst such as salicylic acid, and a Lewis acid such as copper acetyl acetate and zinc acetyl acetate. These may be used alone or in combination of two or more.
[0070] 上記硬化促進剤の配合量は、特に限定するものではな 、が、上記液状エポキシ榭 脂 (A成分)および芳香族ジァミン類硬化剤 (B成分)の混合物に対して、所望の硬化 速度が得られる割合となるように適宜設定することが好ましい。例えば、硬化速度の 指標として、熱盤でゲルィ匕時間を計測しながら容易にその使用量を決定することがで きる。その一例として、液状エポキシ榭脂組成物全体中の 0. 01〜3重量%の範囲に 設定することが好ましい。 [0070] The amount of the curing accelerator is not particularly limited, but may be a desired curing amount for the mixture of the liquid epoxy resin (A component) and the aromatic diamine curing agent (B component). It is preferable to appropriately set the ratio so that the speed can be obtained. For example, the cure speed As an index, it is possible to easily determine the usage amount while measuring the time of geli dwelling with a hot plate. As an example, it is preferable to set the content in the range of 0.01 to 3% by weight in the whole liquid epoxy resin composition.
[0071] 上記液状エポキシ榭脂 (A成分)および芳香族ジァミン類硬化剤 (B成分)とともに 用いられる無機質充填剤 (C成分)としては、合成シリカや溶融シリカ等のシリカ粉末 [0071] As the inorganic filler (component C) used together with the liquid epoxy resin (component A) and the aromatic diamine curing agent (component B), silica powder such as synthetic silica and fused silica is used.
、アルミナ、窒化珪素、窒化アルミニウム、窒化硼素、マグネシア、珪酸カルシウム、 水酸化マグネシウム、水酸ィ匕アルミニウム、酸ィ匕チタン等の各種粉末があげられる。 上記無機質充填剤のなかでも、特に球状シリカ粉末を用いることが液状エポキシ榭 脂組成物の粘度低減の効果が大きく好ましい。そして、上記無機質充填剤としては、 最大粒子径が 24 m以下のものを用いることが好ましい。さらに、上記最大粒子径と ともに、平均粒子径が 10 m以下のものが好ましく用いられ、特に平均粒子径が 1〜, Alumina, silicon nitride, aluminum nitride, boron nitride, magnesia, calcium silicate, magnesium hydroxide, aluminum hydroxide, titanium oxide and the like. Among the above-mentioned inorganic fillers, it is particularly preferable to use spherical silica powder because the effect of reducing the viscosity of the liquid epoxy resin composition is large. It is preferable to use the inorganic filler having a maximum particle diameter of 24 m or less. Further, those having an average particle diameter of 10 m or less are preferably used together with the above-mentioned maximum particle diameter.
5 /z mのものが好適に用いられる。また、 BET法による比表面積が l〜4m2 /gのも のを用いることが好適である。なお、上記最大粒子径および平均粒子径は、例えば、 レーザー回折散乱式粒度分布測定装置を用いて測定することができる。 5 / zm is preferably used. Further, it is preferable to use one having a specific surface area of 1 to 4 m 2 / g by the BET method. The maximum particle size and the average particle size can be measured using, for example, a laser diffraction / scattering type particle size distribution analyzer.
[0072] さらに、上記無機質充填剤(C成分)としては、好適には、下記の一般式(3)で表さ れる有機シランィ匕合物によって表面が被覆された平均粒子径 10 μ m以下の球状シ リカ粒子が用いられ、特に好ましくは上記表面が被覆された平均粒子径 1〜5 mの 球状シリカ粒子である。  [0072] Further, the inorganic filler (component C) preferably has an average particle diameter of 10 µm or less, the surface of which is coated with an organosilane conjugate represented by the following general formula (3). Spherical silica particles are used, and the above-mentioned surface-coated spherical silica particles having an average particle diameter of 1 to 5 m are particularly preferable.
[0073] [化 3]  [0073]
(a 1 -O)-^— S i ~ β ι ) b ■■■ ( 3 ) (a 1 -O)-^ — S i ~ β ι ) b ■■■ (3)
〔式 (3 ) 中、 ¾ k素以外の一価の ¾«aであり、 β 1 は少なくとも [In equation (3), ¾ «a is a monovalent other than 素 k element, and β 1 is at least
1 IIのァミノ基、 エポキシ基、 ビニル基、 スチリル基、 メタクリロキシ  1 II Amino group, epoxy group, vinyl group, styryl group, methacryloxy
基、 ゥレイド基を 一価の ¾«Sである。 また、 a, bは a + b = 4  Group and a peridot group are monovalent S. A, b is a + b = 4
であり、 それぞれ 1〜3の正の正数である。 )  Where each is a positive number between 1 and 3. )
[0074] 上記一般式 (3)で表される有機シラン化合物によって表面が被覆された平均粒子 径 10 m以下の球状シリカ粒子のなかでも、下記の一般式 (4)で表されるアミノシラ ンカップリング剤で表面が被覆された平均粒子径 10 μ m以下の球状シリカ粒子が用 いられ、特に好ましくは平均粒子径 1〜5 /ζ πιの球状シリカ粒子である。このように、 上記アミノシランカップリング剤を用いて球状シリカ粒子の表面を被覆することにより、 液状エポキシ榭脂 (A成分)等との濡れ性等の相互作用により分散性の向上や粘度 の低減が図られる。 [0074] Among the spherical silica particles having an average particle diameter of 10 m or less whose surface is coated with the organosilane compound represented by the general formula (3), the aminosilane cup represented by the following general formula (4) is included. Spherical silica particles having an average particle diameter of 10 μm or less whose surface is coated with a ring agent are used, and spherical silica particles having an average particle diameter of 1 to 5 / ζπι are particularly preferred. in this way, By coating the surface of the spherical silica particles with the above aminosilane coupling agent, the dispersibility is improved and the viscosity is reduced due to the interaction such as wettability with the liquid epoxy resin (component A) and the like.
[0075] [化 4] [0075] [Formula 4]
(a 5 -OH?— S i — y -NH2 -" (4 ) (a 5 -OH? — S i — y -NH 2 -"(4)
[式 (4 ) 中、 α ' は水素以外の一価の有榻基であり、 は二価の有 ¾6Ϊ  [In the formula (4), α ′ is a monovalent group other than hydrogen, and is a divalent group.
である。 〕  It is. ]
[0076] 上記一般式(3)で表される有機シランィ匕合物としては、例えば、 Ν— 2 (アミノエチル )—3—ァミノプロピル一メチルジメトキシシラン、 Ν— 2 (アミノエチル)一3—ァミノプロ ピル一トリエトキシシラン、 Ν— 2 (アミノエチル)一3—ァミノプロピル一トリメトキシシラ ン、 3—ァミノプロピルトリメトキシシラン、 3—ァミノプロピルトリエトキシシラン等があげ られる。これらは単独でもしくは 2種以上併せて用いられる。 Examples of the organosilane conjugate represented by the above general formula (3) include, for example, Ν-2 (aminoethyl) -3-aminopropyl-methyldimethoxysilane, Ν-2 (aminoethyl) -13-aminopro Pill-triethoxysilane, -2- (aminoethyl) -3-aminopropyl-trimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane and the like. These may be used alone or in combination of two or more.
[0077] 一方、上記無機質充填剤 (C成分)として、下記の一般式 (5)で表される有機チタン 化合物によって表面が被覆された平均粒子径 10 μ m以下の球状シリカ粒子が好適 に用いられ、特に好ましくは上記表面が被覆された平均粒子径 1〜5 mの球状シリ 力粒子である。  On the other hand, as the above-mentioned inorganic filler (component C), spherical silica particles having an average particle diameter of 10 μm or less and whose surface is coated with an organic titanium compound represented by the following general formula (5) are preferably used. Particularly preferred are spherical silica particles having an average particle diameter of 1 to 5 m coated on the surface.
[0078] [化 5]  [0078] [Formula 5]
1 — O —T i ~ (β 1 ) b ■·· ( 5) 1 — O —T i ~ (β 1 ) b ■ ·· (5)
〔式 (5 ) 中、 α 1 は水素以外の一価の有 «|¾であり、 β は少なくとも [In the formula (5), α 1 is a monovalent group other than hydrogen, and β is at least
1健のアミノ基、 エポキシ基、 ビニル基、 スチリル基、 メタクリロキシ  1 Healthy amino group, epoxy group, vinyl group, styryl group, methacryloxy
基、 ウレイド基^"む一価の である。 また、 a , bは a + b = 4  Group, ureido group ^ ", and a and b are a + b = 4
であり、 それぞれ 1〜 3の正の正数である。 〕  And each is a positive number between 1 and 3. ]
[0079] 上記一般式(5)で表される有機チタンィ匕合物としては、例えば、イソプロピルトリイソ ステアロイルチタネート、イソプロピルトリス(ジォクチルパイロホスフェート)チタネート 、イソプロピルトリス(ジォクチルパイロホスフェート)チタネート、イソプロピルトリ(N— アミノエチル一アミノエチル)チタネート、テトラオクチルビス(ジトリデシルホスフアイト) チタネート、テトラ(2, 2—ジァリルォキシメチル— 1—ブチル)ビス(ジトリデシル)ホス ファイトチタネート、ビス(ジォクチルパイロホスフェート)ォキシアセテートチタネート、 ビス(ジォクチルパイロホスフェート)エチレンチタネート等があげられる。これらは単 独でもしくは 2種以上併せて用いられる。 Examples of the organotitanium conjugate represented by the general formula (5) include isopropyl triisostearoyl titanate, isopropyl tris (dioctyl pyrophosphate) titanate, and isopropyl tris (dioctyl pyrophosphate) titanate. , Isopropyl tri (N-aminoethyl monoaminoethyl) titanate, tetraoctyl bis (ditridecyl phosphite) titanate, tetra (2,2-diallyloxymethyl-1-butyl) bis (ditridecyl) phosphite titanate, Bis (dioctyl pyrophosphate) oxyacetate titanate, Bis (dioctyl pyrophosphate) ethylene titanate and the like can be mentioned. These may be used alone or in combination of two or more.
[0080] このような有機シラン化合物あるいは有機チタンィ匕合物によって表面が被覆された 球状シリカ粒子は、例えば、つぎのようにして作製される。すなわち、上記有機シラン 化合物あるいは有機チタン化合物を用い、蒸気噴霧法や湿式法等の無機質充填剤 への処理等の従来公知の技術を用いることにより上記化合物によって表面が被覆さ れた球状シリカ粒子が作製される。さら〖こは、アルコール水溶液や溶剤に溶解して表 面処理する方法によっても得ることができる。  [0080] Such spherical silica particles whose surface is coated with the organosilane compound or the organotitanium conjugate are produced, for example, as follows. That is, using the above-mentioned organosilane compound or organotitanium compound, and using a conventionally known technique such as a treatment for an inorganic filler such as a vapor spray method or a wet method, spherical silica particles whose surface is coated with the compound are used. It is made. The surface can also be obtained by dissolving in an aqueous alcohol solution or solvent and subjecting it to a surface treatment.
[0081] 上記無機質充填剤(C成分)の配合量は、液状エポキシ榭脂組成物全体の 10〜8 0重量%の範囲に設定することが好ましぐ特に好ましくは 30〜70重量%である。す なわち、配合量が 10重量%未満では、液状エポキシ榭脂組成物硬化体の線膨張係 数の低減への効果が少ない場合があり、また 80重量%を超えると、液状エポキシ榭 脂組成物の粘度が増加する傾向がみられるからである。  [0081] The amount of the inorganic filler (component C) is preferably set in the range of 10 to 80% by weight of the entire liquid epoxy resin composition, and particularly preferably 30 to 70% by weight. . In other words, if the amount is less than 10% by weight, the effect of reducing the linear expansion coefficient of the liquid epoxy resin composition cured product may be small, and if it exceeds 80% by weight, the liquid epoxy resin composition may not be effective. This is because the viscosity of the product tends to increase.
[0082] 上記液状エポキシ榭脂 (A成分)、芳香族ジァミン類硬化剤 (B成分)および無機質 充填剤 (C成分)とともに用いられる有機質添加剤 (D成分)は、上記液状エポキシ榭 脂 (A成分)とは相溶性がなぐ硬化や熱処理により溶融してドメイン構造をとるもので あり、例えば、球状熱可塑性榭脂粒子,球状架橋榭脂粒子等が用いられる。これら は単独でもしくは 2種以上併せて用いられる。  [0082] The organic additive (D component) used together with the liquid epoxy resin (A component), the aromatic diamine curing agent (B component) and the inorganic filler (C component) includes the liquid epoxy resin (A Component) is a component which is melted by hardening or heat treatment so as to be incompatible with each other to form a domain structure. For example, spherical thermoplastic resin particles, spherical crosslinked resin particles and the like are used. These may be used alone or in combination of two or more.
[0083] 上記球状熱可塑性榭脂粒子としては、ポリアクリル榭脂、ポリエーテルスルホン榭 脂、エチレン 酢酸ビュル共重合体、ポリアミド榭脂、ブタジエン スチレン共重合 体等力もなる粒子があげられる。これらは単独でもしくは 2種以上併せて用いられる。 そして、上記球状熱可塑性榭脂粒子としては、平均粒子径が 10 m以下のものが好 ましく用いられ、特に平均粒子径が 1〜5 /ζ πιのものが好適に用いられる。なお、上記 平均粒子径は、先に述べたと同様、例えば、レーザー回折散乱式粒度分布測定装 置を用いて測定することができる。  [0083] Examples of the above-mentioned spherical thermoplastic resin particles include particles having a strong force such as polyacrylic resin, polyethersulfone resin, ethylene-butyl acetate copolymer, polyamide resin, and butadiene-styrene copolymer. These may be used alone or in combination of two or more. As the spherical thermoplastic resin particles, those having an average particle diameter of 10 m or less are preferably used, and those having an average particle diameter of 1 to 5 / ζπι are particularly preferably used. The average particle diameter can be measured using, for example, a laser diffraction / scattering type particle size distribution analyzer as described above.
[0084] 上記球状熱可塑性榭脂粒子のなかでも、特に球状ポリメチルメタタリレート粒子が 好ましく用いられ、さらに好適には重量平均分子量が 100, 000以上の球状ポリメチ ルメタタリレート粒子が用いられ、なかでも重量平均分子量が 100, 000〜5, 000, 0 00の球状ポリメチルメタタリレート粒子が特に好適に用いられる。なお、上記重量平 均分子量の上限は、通常、 10, 000, 000である。 [0084] Among the above-mentioned spherical thermoplastic resin particles, spherical polymethyl methacrylate particles are particularly preferably used, and more preferably spherical polymethyl methacrylate particles having a weight average molecular weight of 100,000 or more are used. Among them, the weight average molecular weight is 100,000 to 5,000, 0 00 spherical polymethyl methacrylate particles are particularly preferably used. The upper limit of the weight average molecular weight is usually 10,000,000.
[0085] 上記球状ポリメチルメタタリレート粒子としては、エポキシ基含有ポリメチルメタクリレ ート粒子、カルボキシ基含有ポリメチルメタタリレート粒子、ポリメチルメタクリレートー ポリアタリレート共重合体粒子等も包含する趣旨である。  [0085] The spherical polymethyl methacrylate particles also include epoxy group-containing polymethyl methacrylate particles, carboxy group-containing polymethyl methacrylate particles, polymethyl methacrylate-poly acrylate copolymer particles, and the like. It is the purpose.
[0086] また、上記球状架橋榭脂粒子としては、特に球状架橋ポリメチルメタタリレート粒子 が好ましく用いられる。さらに好適には、ガラス転移温度が 100°C以上の球状架橋ポ リメチルメタタリレート粒子が用いられる。このように上記ガラス転移温度が 100°C以上 の球状架橋ポリメチルメタタリレート粒子を用いることにより、充填する温度を高く設定 することが可能となるため、低粘度で封止時間を短縮することができるという効果がえ られる。なお、上記ガラス転移温度は、熱機械分析 (TMA)装置によって測定される 値である。  [0086] As the above-mentioned spherical cross-linked resin particles, particularly, spherical cross-linked polymethylmetharylate particles are preferably used. More preferably, spherical cross-linked polymethyl methacrylate particles having a glass transition temperature of 100 ° C. or higher are used. By using the spherical crosslinked polymethyl methacrylate particles having a glass transition temperature of 100 ° C. or higher as described above, the filling temperature can be set high, and the sealing time can be reduced with a low viscosity. The effect is that it can be done. The above glass transition temperature is a value measured by a thermomechanical analysis (TMA) device.
[0087] このような有機質添加剤 (D成分)の配合量は、本発明の効果が得られる限り特に 限定されな 、が、液状エポキシ榭脂組成物全体の 2〜20重量%の範囲に設定する ことが好ましぐ特に好ましくは 3〜 15重量%である。すなわち、有機質添加剤の配 合量が 2重量%未満では、液状エポキシ榭脂組成物硬化体のリペア一性の向上効 果が得られない場合があり、また 20重量%を超えると、液状エポキシ榭脂組成物の 粘度が増加する傾向がみられる力 である。  [0087] The amount of the organic additive (component D) is not particularly limited as long as the effects of the present invention can be obtained, but is set in the range of 2 to 20% by weight of the entire liquid epoxy resin composition. Particularly preferred is 3 to 15% by weight. That is, if the amount of the organic additive is less than 2% by weight, the effect of improving the repairability of the cured liquid epoxy resin composition may not be obtained.力 This is the force that tends to increase the viscosity of the resin composition.
[0088] さらに、上記各成分以外に、粘度低下等を目的として、反応性希釈剤を適宜配合 することができるが、先のプレボリマーの説明にて述べたように、この反応性希釈剤は 揮発性の低沸点化合物を含むことがあるので、使用に際しては、アンダーフィル榭脂 である液状エポキシ榭脂組成物の所定の硬化温度で封止榭脂層にボイド発生を弓 I き起こす揮発性の蒸発性低沸点化合物を予め除去して使用することが好ましい。ま た、反応性希釈剤自体が揮発性である場合には、アンダーフィル榭脂である液状ェ ポキシ榭脂糸且成物の所定の硬化温度で封止榭脂層にボイドが発生し易 、ので、この ような反応性希釈剤は使用が制限される。  [0088] Further, in addition to the above-mentioned components, a reactive diluent can be appropriately compounded for the purpose of lowering the viscosity and the like. However, as described in the description of the prepolymer, this reactive diluent is volatile. Since it may contain a low boiling point compound, it must be used at the prescribed curing temperature of the liquid epoxy resin composition which is an underfill resin. It is preferable to use the volatile low-boiling compound after removing it in advance. Further, when the reactive diluent itself is volatile, voids are easily generated in the sealing resin layer at a predetermined curing temperature of the liquid epoxy resin thread and the underfill resin, As such, the use of such reactive diluents is limited.
[0089] 上記反応性希釈剤としては、例えば、 n—ブチルダリシジルエーテル、ァリルグリシ ジルエーテル、 2—ェチルへキシルグリシジルエーテル、スチレンオキサイド、フエ- ルグリシジルエーテル、クレジルグリシジルエーテル、ラウリルグリシジルエーテル、 p sec ブチルフエ-ルグリシジルエーテル、ノ-ルフエ-ルグリシジルエーテル、力 ルビノールのグリシジルエーテル、グリシジルメタタリレート、ビュルシクロへキセンモノ ェポキサイド、 ピネンオキサイド、 3級カルボン酸のグリシジルエーテル、ジグリシ ジルエーテル、 (ポリ)エチレングリコールのグリシジルエーテル、 (ポリ)プロピレングリ コールのグリシジルエーテル、ビスフエノール Aのプロピレンオキサイド付カ卩物、ビスフ ェノール A型エポキシ榭脂と重合脂肪酸との部分付加物、重合脂肪酸のポリグリシジ ルエーテル、ブタンジオールのジグリシジルエーテル、ビニルシクロへキセンジォキ サイド、ネオペンチルグリコールジグリシジルエーテル、ジグリシジルァ二リン、トリメチ 口 ~~ノレプロノ ンジグリシシノレエ ~~テノレ、卜リメチロ ~~ノレプロノ ン卜リグリシジノレエ ~~テノレ 、グリセリンジグリシジルエーテル、グリセリントリグリシジルエーテル等があげられる。 これらは単独でもしくは 2種以上併せて用いられる。 [0089] Examples of the reactive diluent include n-butyldaricidyl ether, arylglycidylether, 2-ethylhexylglycidylether, styrene oxide, and phen- Luglycidyl ether, cresyl glycidyl ether, lauryl glycidyl ether, p sec butylphenol glycidyl ether, norphenyl glycidyl ether, glycidyl ether of rubinol, glycidyl methacrylate, bulcyclohexene monoepoxide, pinene oxide, tertiary Glycidyl ethers of carboxylic acids, diglycidyl ethers, glycidyl ethers of (poly) ethylene glycol, glycidyl ethers of (poly) propylene glycol, bisphenol A with propylene oxide, bisphenol A epoxy resin and polymerized fatty acids With polyglycidyl ether of polymerized fatty acid, diglycidyl ether of butanediol, vinylcyclohexenedioxide, neopentyl glycol digly Jill ether, Jigurishijirua diphosphate, trimethylene opening ~~ Norepurono down diglycidyl Shishi Norre d ~ ~ Tenore, I Rimechiro ~~ Norepurono down Bok Rigurishijinoree ~~ Tenore, glycerin diglycidyl ether, glycerin triglycidyl ether, and the like. These may be used alone or in combination of two or more.
[0090] そして、本発明にお 、て、上記液状エポキシ榭脂組成物には、上記各成分以外に 、三酸ィ匕アンチモン、五酸ィ匕アンチモン、臭素化エポキシ榭脂等の難燃剤や難燃助 剤、シリコーン等の低応力化剤、着色剤等を、本発明の趣旨を逸脱しない範囲内で 適宜配合することができる。  [0090] In the present invention, in addition to the above components, the liquid epoxy resin composition may further contain a flame retardant such as antimony trioxide, antimony pentaoxide, or brominated epoxy resin. Flame-retardant aids, low-stress agents such as silicones, coloring agents, and the like can be appropriately compounded without departing from the spirit of the present invention.
[0091] このような液状エポキシ榭脂組成物は、例えば、つぎのようにして製造することがで きる。すなわち、前記液状エポキシ榭脂 (A成分)、芳香族ジァミン類硬化剤 (B成分) 、無機質充填剤 (C成分)、有機質添加剤 (D成分)および必要に応じて硬化促進剤 等の各成分を所定量配合し、これを 3本ロールやホモミキサー等の高剪断力下で混 合,分散し、場合により減圧下で脱泡することにより目的とする一液無溶剤の液状ェ ポキシ榭脂組成物を製造することができる。  [0091] Such a liquid epoxy resin composition can be produced, for example, as follows. That is, each component such as the liquid epoxy resin (A component), the aromatic diamine curing agent (B component), the inorganic filler (C component), the organic additive (D component) and, if necessary, the curing accelerator. The desired one-part solvent-free liquid epoxy resin is obtained by mixing and dispersing under a high shearing force such as a three-roll or homomixer, and optionally defoaming under reduced pressure. A composition can be manufactured.
[0092] もしくは、液状エポキシ榭脂 (A成分)、特にその中でも多官能脂肪族液状エポキシ 榭脂と、前記一般式(1)で表される芳香族ジァミンおよびその誘導体の少なくとも一 つ、あるいは前記一般式(2)で表される含フッ素芳香族ジァミンおよびその誘導体の 少なくとも一つとのプレボリマーを用いる場合は、これら成分を先に述べたように予備 反応させる。ついで、このプレボリマーと他の成分を所定量配合した後、上記と同様 にして目的とする一液無溶剤の液状エポキシ榭脂組成物を製造することができる。 [0093] このようにして得られた液状エポキシ榭脂組成物を用いた半導体部品(例えば、フリ ップチップ等の半導体素子,半導体パッケージ)と配線回路基板の榭脂封止による 電子部品装置は、例えば、つぎのようにして製造される。すなわち、予め接続用電極 部(半田バンプ)を有する半導体部品と、上記半田バンプに対向する接続用電極部( 半田パッド)を備えた配線回路基板を、半田金属接続する。ついで、上記半導体部 品と配線回路基板との空隙に毛細管現象を利用して、一液無溶剤の液状エポキシ 榭脂組成物を充填し熱硬化して封止榭脂層を形成することにより榭脂封止する。 [0092] Alternatively, a liquid epoxy resin (A component), particularly a polyfunctional aliphatic liquid epoxy resin, and at least one of the aromatic diamine represented by the general formula (1) and a derivative thereof, or When using a prepolymer with at least one of the fluorine-containing aromatic diamine represented by the general formula (2) and its derivative, these components are preliminarily reacted as described above. Next, after blending a predetermined amount of this prepolymer and other components, the desired one-part solvent-free liquid epoxy resin composition can be produced in the same manner as described above. [0093] A semiconductor component (eg, a semiconductor element such as a flip chip, a semiconductor package) using the liquid epoxy resin composition obtained in this way and an electronic component device by resin sealing of a wiring circuit board include, for example, It is manufactured as follows. That is, a semiconductor component having a connection electrode portion (solder bump) in advance and a wiring circuit board having a connection electrode portion (solder pad) facing the solder bump are connected by solder metal. Next, by utilizing a capillary phenomenon in a gap between the semiconductor component and the printed circuit board, a liquid epoxy resin composition of one component and no solvent is filled and thermally cured to form a sealing resin layer. Seal with grease.
[0094] このようにして、例えば、半導体部品が半導体素子 (フリップチップ)の場合は、図 1 に示すように、半導体素子 1に設けられた接続用電極部(半田バンプ) 3と配線回路 基板 2に設けられた接続用電極部(半田パッド) 5を対向させた状態で、配線回路基 板 2上に半導体素子 (フリップチップ) 1が搭載され、かつ上記配線回路基板 2と半導 体素子 (フリップチップ) 1との空隙が上記液状エポキシ榭脂組成物力もなる封止榭 脂層 4によって榭脂封止された電子部品装置が製造される。  Thus, for example, when the semiconductor component is a semiconductor element (flip chip), as shown in FIG. 1, the connection electrode portion (solder bump) 3 provided on the semiconductor element 1 and the wiring circuit board The semiconductor element (flip chip) 1 is mounted on the wiring circuit board 2 with the connection electrode portion (solder pad) 5 provided on the wiring circuit 2 facing the wiring circuit board 2 and the wiring circuit board 2 and the semiconductor element (Flip Chip) An electronic component device in which the gap with the flip chip 1 is resin-sealed by the sealing resin layer 4 also having the above-mentioned liquid epoxy resin composition strength is manufactured.
[0095] 一方、例えば、半導体部品が半導体装置 (半導体パッケージ)の場合は、図 2に示 すように、半導体パッケージ 11に設けられた接続用電極部(半田バンプ) 13と配線 回路基板 12に設けられた接続用電極部(半田パッド) 15を対向させた状態で、配線 回路基板 12上に半導体パッケージ 11が搭載され、かつ上記配線回路基板 12と半 導体パッケージ 11との空隙が上記液状エポキシ榭脂組成物力もなる封止榭脂層 14 によって榭脂封止された電子部品装置が製造される。  On the other hand, for example, when the semiconductor component is a semiconductor device (semiconductor package), as shown in FIG. 2, the connection electrode portion (solder bump) 13 provided on the semiconductor package 11 and the wiring circuit board 12 The semiconductor package 11 is mounted on the printed circuit board 12 with the provided connection electrode portions (solder pads) 15 facing each other, and the gap between the printed circuit board 12 and the semiconductor package 11 is formed by the liquid epoxy. An electronic component device that is resin-sealed by the sealing resin layer 14 that also has a resin composition power is manufactured.
[0096] 上記製造工程において、上記半導体素子 (フリップチップ) 1と配線回路基板 2との 空隙、あるいは半導体パッケージ 11と配線回路基板 12との空隙に液状エポキシ榭 脂組成物を充填する場合には、まず、液状エポキシ榭脂組成物をシリンジにつめた 後、上記半導体素子 (フリップチップ) 1あるいは上記半導体パッケージ 11の一端に ニードルカゝら液状エポキシ榭脂組成物を押し出して塗布し、毛細管現象を利用して 充填する。この毛細管現象を利用して充填する際には、 60〜120°C程度に加熱した 熱盤上で充填し封止すると液粘度が低下するため、一層容易に充填 ·封止すること が可能となる。さらに、上記配線回路基板 2, 12に傾斜をつければ、より一層充填 '封 止が容易となる。 [0097] このようにして得られる電子部品装置において、半導体部品が半導体素子 (フリツ プチップ) 1の場合は、半導体素子 (フリップチップ) 1と配線回路基板 2との空隙間距 離は、一般に、 30-300 μ m程度である。 [0096] In the above manufacturing process, when the gap between the semiconductor element (flip chip) 1 and the wiring circuit board 2 or the gap between the semiconductor package 11 and the wiring circuit board 12 is filled with the liquid epoxy resin composition, First, after the liquid epoxy resin composition is filled in a syringe, the liquid epoxy resin composition is extruded and applied to one end of the semiconductor element (flip chip) 1 or the semiconductor package 11 by a needle cap, and a capillary phenomenon is caused. Use to fill. When filling using this capillary phenomenon, liquid viscosity decreases when filling and sealing on a hot plate heated to about 60 to 120 ° C, making it easier to fill and seal. Become. Furthermore, if the printed circuit boards 2 and 12 are inclined, the filling and sealing can be further facilitated. In the electronic component device thus obtained, when the semiconductor component is the semiconductor element (flip chip) 1, the gap distance between the semiconductor element (flip chip) 1 and the printed circuit board 2 is generally 30 It is about -300 μm.
[0098] また、半導体部品が半導体パッケージ 11の場合は、半導体パッケージ 11と配線回 路基板 12との空隙間距離は、一般に、 200〜300 ;ζ ΐη程度である。  When the semiconductor component is the semiconductor package 11, the gap distance between the semiconductor package 11 and the wiring circuit board 12 is generally about 200 to 300;
[0099] このようにして得られた電子部品装置の榭脂封止部分のエポキシ榭脂組成物硬化 体は、硬化した後においても、特定の有機溶剤によって膨潤して接着力が低下し、 電子部品装置をリペア一することができる。  [0099] The cured epoxy resin composition in the resin-sealed portion of the electronic component device thus obtained swells with a specific organic solvent even after it is cured, and its adhesive strength is reduced. The component device can be repaired.
[0100] 上記特定の有機溶剤としては、ケトン系溶剤、グリコールジエーテル系溶剤、含窒 素系溶剤等が好まし ヽ。これらは単独でもしくは 2種以上併せて用いられる。  [0100] As the specific organic solvent, a ketone solvent, a glycol diether solvent, a nitrogen-containing solvent, and the like are preferable. These may be used alone or in combination of two or more.
[0101] 上記ケトン系溶剤としては、ァセトフエノン、イソホロン、ェチルー n—ブチルケトン、 ジイソプチルケトン、ジェチルケトン、シクロへキシルケトン、ジー n プロピルケトン、 メチルォキシド、メチルー n アミルケトン、メチルイソブチルケトン、メチルェチルケト ン、メチルシクロへキサノン、メチル n—へプチルケトン、ホロン等があげられる。こ れらは単独でもしくは 2種以上併せて用いられる。  [0101] Examples of the above ketone solvents include acetophenone, isophorone, ethyl n-butyl ketone, diisobutyl ketone, getyl ketone, cyclohexyl ketone, di-n-propyl ketone, methyl oxide, methyl n-amyl ketone, methyl isobutyl ketone, methyl ethyl ketone, and methyl cyclohexane. Xanone, methyl n-heptyl ketone, and holone. These may be used alone or in combination of two or more.
[0102] 上記グリコールジェ一テル系溶剤としては、エチレングリコールジェチルエーテル、 エチレングリコールジブチルエーテル、エチレングリコーノレジメチノレエーテノレ、ジェチ レングリコーノレェチノレメチノレエーテノレ、ジエチレングリコーノレジェチノレエーテノレ、ジェ チレングリコーノレジブチノレエーテノレ、ジエチレングリコールジメチルエーテル、トリエ チレングリコールジメチルエーテル等があげられる。これらは単独でもしくは 2種以上 併せて用いられる。  [0102] Examples of the glycol ether-based solvents include ethylene glycol getyl ether, ethylene glycol dibutyl ether, ethylene glycolone resin methine oleate, ethylene glycol diole cholesterol methine oleate, and diethylene glycol oleone terephthalate. Athenole, ethylene glycolone dibutylbutyrene, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether and the like. These may be used alone or in combination of two or more.
[0103] 上記含窒素系溶剤としては、 N, N' —ジメチルホルムアミド、 N, N' —ジメチルァ セトアミド、 N—メチル—2—ピロリドン、 N, N' —ジメチルスルホキシド、へキサメチ ルホスホルトリアミド等があげられる。これらは単独でもしくは 2種以上併せて用いられ る。  [0103] Examples of the nitrogen-containing solvent include N, N'-dimethylformamide, N, N'-dimethylacetamide, N-methyl-2-pyrrolidone, N, N'-dimethylsulfoxide, hexamethylphosphortriamide and the like. Is raised. These may be used alone or in combination of two or more.
[0104] 上記電子部品装置のリペア一方法としては、熱盤等を用いて例えば半導体部品( フリップチップ等の半導体素子や半導体パッケージ)または配線回路基板のリペア一 該当部分を加熱して上記半導体部品を除去する。このときの加熱温度としては、本 発明のエポキシ榭脂組成物の硬化体のガラス転移温度からさらに +約 50°C以上の 温度で加熱することで、かつ半田等の接合金属の溶融点以上の温度で加熱すること で硬化体が凝集破壊または一方 (半導体部品または配線回路基板)に接着した状態 で、両者が容易に剥離できるようになる。その後、上記有機溶剤を直接塗布するかあ るいは脱脂綿に上記有機溶剤をしみ込ませたものを配線回路基板のエポキシ榭脂 組成物の硬化体の残渣部分に室温で接触、より好適にはガラス転移温度以上で接 触させた後、硬化体の膨潤を確認して残渣物を除去すれば配線回路基板ならびに 実装部分を再利用することができる。一方、液状エポキシ榭脂組成物の硬化体の残 渣が接着した半導体部品は、所定の容器にとった上記有機溶剤中に室温で浸漬し 硬化体を膨潤させて除去することにより半導体部品を再利用することができる。 As a method of repairing the electronic component device, for example, using a hot plate or the like, a semiconductor component (a semiconductor element such as a flip chip or a semiconductor package) or a repaired portion of a printed circuit board is heated to apply the semiconductor component. Is removed. The heating temperature at this time is The cured body of the epoxy resin composition of the present invention is heated at a temperature of about + 50 ° C or more from the glass transition temperature of the cured body of the epoxy resin composition of the present invention, and is heated at a temperature equal to or higher than the melting point of the joining metal such as solder. With cohesive failure or adhesion to one (semiconductor component or printed circuit board), both can be easily separated. Thereafter, the organic solvent is applied directly or the absorbent obtained by impregnating the organic solvent into absorbent cotton is brought into contact with the residual portion of the cured epoxy resin composition of the printed circuit board at room temperature, more preferably, glass transition. After contacting at the temperature or higher, if the swelling of the cured body is confirmed and the residue is removed, the printed circuit board and the mounting part can be reused. On the other hand, the semiconductor component to which the residue of the cured product of the liquid epoxy resin composition has adhered is immersed in the above-mentioned organic solvent taken in a predetermined container at room temperature to swell the cured product and remove the semiconductor component to thereby re-use the semiconductor component. Can be used.
[0105] または、長時間にわたる処理を必要とするものの、上記配線回路基板のリペアー該 当部分全体に、上記有機溶剤を直接塗布するかまたは脱脂綿に有機溶剤をしみ込 ませたものを被覆して、半導体部品の端部から徐々に有機溶剤を浸透させることによ り硬化体を膨潤させて硬化体の強度と接着力を低下させた後、半導体部品を配線回 路基板から取り外すこともできる。  [0105] Alternatively, the above organic solvent may be directly applied to the entire repaired portion of the printed circuit board or coated with absorbent cotton impregnated with the organic solvent, although the treatment requires a long time. Alternatively, the semiconductor component can be removed from the wiring circuit board after the cured product is swelled by gradually penetrating the organic solvent from the end of the semiconductor component to reduce the strength and adhesion of the cured product.
[0106] つぎに、実施例について比較例と併せて説明する。  Next, examples will be described together with comparative examples.
[0107] まず、下記に示す各成分を準備した。  [0107] First, the following components were prepared.
[0108] 〔液状エポキシ榭脂 a〕  [Liquid epoxy resin a]
下記の構造式 (a)で表されるエポキシ榭脂。  An epoxy resin represented by the following structural formula (a).
[化 6]  [Formula 6]
0 OH 0 OH
CH2-CH-CH2†0 -<QVCH2 -0 CH2-CH CH2 -|-0 -(ΟΥ CH2- * CH 2 -CH-CH 2 † 0-<QVCH 2 -0 CH 2 -CH CH 2- | -0-(ΟΥ CH 2- *
i  i
0  0
* - ) 0 - CH2-CH-CH2 *-) 0-CH 2 -CH-CH 2
〔式 (a ) 中、 nは 0以上の正 純度 9 9 %、 粘度 2 2 d P a · s [In the formula (a), n is a positive purity of 0 or more, 99%, and a viscosity of 22 dP a · s
( 2 5¾) 、 エポキシ当量 1 6 5 g / e q ]  (25¾), epoxy equivalent 1 65 g / eq]
[0109] 〔液状エポキシ榭脂 b〕 下記の構造式 (b)で表される脂肪族多官能エポキシィ匕合物。 [Liquid epoxy resin b] An aliphatic polyfunctional epoxy conjugate represented by the following structural formula (b).
[化 7] [Formula 7]
CHE 一 O— CH2 — CH— CH2 CH E- O— CH 2 — CH— CH 2
、、、、 /  ,,,, /
O O
CH3 -CH2 -C-CH2 -OH (b) CH 3 -CH 2 -C-CH 2 -OH (b)
CH2 -0-CH2 — CH— CH2 CH 2 -0-CH 2 — CH— CH 2
\ /  \ /
O  O
〔式 (b) 中、 粘度 0. 6dPa · s :) 、  [In formula (b), the viscosity is 0.6 dPa · s :),
エポキシ当量 125g/e q] 〔硬化剤 a〕  Epoxy equivalent 125g / e q] [Curing agent a]
下記の構造式 (c)で表される含フッ素芳香族ジァミン。  A fluorine-containing aromatic diamine represented by the following structural formula (c).
[化 8] [Formula 8]
Figure imgf000025_0001
Figure imgf000025_0001
〔式 (c) 中、 敏点 182 、活性水素当量 80 g/e q] 〔硬化剤 b〕 [In the formula (c), the sensitivity point 182, active hydrogen equivalent 80 g / eq] [Curing agent b]
上記構造式(c)で表される 2, 2' —ジトリフルォロメチルー 4, ージアミノビフエ -ルを 1モル、ブチルダリシジルエーテルを 0. 5モルの割合で反応容器に仕込み、 2 00°Cにて反応させることにより得られた下記の構造式 (d)で表される含フッ素芳香族 ジァミン誘導体。  2,2′-Ditrifluoromethyl-4, diaminobiphenyl represented by the above structural formula (c) was charged into a reaction vessel at a ratio of 1 mol and butyldaricidyl ether at a ratio of 0.5 mol, and the mixture was heated at 200 ° C. And a fluorine-containing aromatic diamine derivative represented by the following structural formula (d).
[化 9] [Formula 9]
Figure imgf000025_0002
Figure imgf000025_0002
〔式 (d) 中、 4個の Rは平均で 3. 5個が水素、 平均で  [In formula (d), four Rs are on average 3.5 hydrogens,
0. 5個が— CH2 -CH (OH) CH2 — O— C4 Ηθ 0.5 are — CH 2 —CH (OH) CH 2 — O— C 4 Η θ
である。 また平均 SfeK素当量 1 10 g/e qである。 〕 [0112] 〔硬化剤 c〕 It is. The average SfeK elemental equivalent is 110 g / eq. ] [0112] [Curing agent c]
下記の構造式 (e)で表される非含フッ素芳香族ジァミン。  A non-fluorinated aromatic diamine represented by the following structural formula (e).
[化 10]  [Formula 10]
L^J … ( e ) L ^ J… ( e )
〔式 (e ) 中、 Si^ 6 4 、 iStt*素当量 2 7 gZ e q]  [In the formula (e), Si ^ 64, iStt * elemental equivalent 27 gZeq]
[0113] 〔硬化剤 d〕 [0113] [Curing agent d]
上記構造式(e)で表される m フエ-レンジァミン 1モルと、ブチルダリシジルエーテ ル 0. 5モルとを反応容器に仕込み、 200°Cにて反応させることにより得られた下記の 構造式 (f )で表される非含フッ素芳香族ジァミン誘導体。  The following structural formula was obtained by charging 1 mol of m-phenylenediamine represented by the above structural formula (e) and 0.5 mol of butyldaricidyl ether into a reaction vessel and reacting at 200 ° C. A non-fluorinated aromatic diamine derivative represented by (f).
[化 11]
Figure imgf000026_0001
[Formula 11]
Figure imgf000026_0001
〔式 (f ) 中、 4個の R' は平均で 3 . 5倆が水素、 平均で [In formula (f), four R's have an average of 3.5 hydrogen and an average of
0. 5個が C H2 — CH (OH) CH2 0— C4 HQ 0.5 is CH 2 — CH (OH) CH 2 0— C 4 H Q
である。 また平均 S fc 素当量 4 9. 4 g / e qである。 〕  It is. The average S fc element equivalent is 49.4 g / eq. ]
[0114] 〔プレポリマー a (含フッ素)〕 [Prepolymer a (Fluorine-Containing)]
上記構造式 (c)で表される含フッ素芳香族ジァミンの活性水素 1当量 (80g)に対し て、上記構造式 (a)で表されるエポキシ榭脂 0. 5当量(82. 5g)を 150°Cにて 15分 間反応させて冷却したことにより得られた、水飴状の粘稠液体であるプレボリマー a ( 活性水素当量 325)。  For 1 equivalent (80 g) of active hydrogen of the fluorinated aromatic diamine represented by the above structural formula (c), 0.5 equivalent (82.5 g) of the epoxy resin represented by the above structural formula (a) is added. Prevolimer a (active hydrogen equivalent: 325), a syrup-like viscous liquid obtained by reacting at 150 ° C for 15 minutes and cooling.
[0115] 〔プレポリマー b (含フッ素)〕 [Prepolymer b (fluorine-containing)]
上記構造式 (d)で表される含フッ素芳香族ジァミン誘導体 1モルと、上記構造式 (b )で表される脂肪族多官能エポキシィ匕合物 1. 75モルとを反応容器に仕込み、 100 °Cにて 2分間反応させることにより得られた、プレボリマー b (粘度 190dPa' s)。  1 mol of the fluorinated aromatic diamine derivative represented by the above structural formula (d) and 1.75 mol of the aliphatic polyfunctional epoxy conjugate represented by the above structural formula (b) are charged into a reaction vessel, and 100 Prevolimer b (viscosity 190 dPa's) obtained by reacting at ° C for 2 minutes.
[0116] 〔無機質充填剤 a〕 [0116] [Inorganic filler a]
球状シリカ粒子の表面を、 3—ァミノプロピルトリエトキシシランを用いて蒸気噴霧法 により表面処理したもの(最大粒子径 6 μ m、平均粒子径 2 μ m、比表面積 2. lm2 / g) o Spherical silica particles whose surface has been surface-treated by vapor atomization using 3-aminopropyltriethoxysilane (maximum particle diameter 6 μm, average particle diameter 2 μm, specific surface area 2. lm 2 / g) o
[0117] 〔無機質充填剤 b〕  [0117] [Inorganic filler b]
球状シリカ粒子の表面を、イソプロピルトリイソステアロイルチタネート (有機チタン化 合物)を用いて蒸気噴霧法により表面処理したもの (最大粒子径 6 μ m、平均粒子径 2 m、比表面積 2. lm2 /g)。 Spherical silica particles whose surface has been surface-treated by vapor spraying using isopropyl triisostearoyl titanate (organic titanium compound) (maximum particle diameter 6 μm, average particle diameter 2 m, specific surface area 2. lm 2 / g).
[0118] 〔有機質添加剤 al〕 [0118] [Organic additive al]
球状ポリメチルメタタリレート粒子(平均粒子径 4 μ m、最大粒子径 10 μ m、重量平 均分子量 3, 000, 000)。  Spherical polymethylmetharylate particles (average particle diameter 4 μm, maximum particle diameter 10 μm, weight average molecular weight 3,000,000).
[0119] 〔有機質添加剤 a2〕 [0119] [Organic additive a2]
球状ポリメチルメタタリレート粒子(平均粒子径 3. 3 m、最大粒子径 20 μ m、重量 平均分子量 1, 750, 000)。  Spherical polymethylmetharylate particles (average particle diameter 3.3 m, maximum particle diameter 20 μm, weight average molecular weight 1,750,000).
[0120] 〔有機質添加剤 bl〕 [Organic additive bl]
球状ポリメチルメタタリレート粒子(平均粒子径 4 μ m、最大粒子径 10 μ m、重量平 均分子量 400, 000)。  Spherical polymethyl methacrylate particles (average particle diameter 4 μm, maximum particle diameter 10 μm, weight average molecular weight 400,000).
[0121] 〔有機質添加剤 b2〕 [0121] [Organic additive b2]
球状ポリメチルメタタリレート粒子(平均粒子径 3. 4 m、最大粒子径 20 μ m、重量 平均分子量 400, 000)。  Spherical polymethyl methacrylate particles (average particle diameter 3.4 m, maximum particle diameter 20 μm, weight average molecular weight 400,000).
[0122] 〔有機質添加剤 c〕 [0122] [Organic additive c]
球状架橋ポリメチルメタタリレート粒子(平均粒子径 2. 6 m、最大粒子径 5 μ m、 ガラス転移温度 120°C)。  Spherical crosslinked polymethyl methacrylate particles (average particle diameter 2.6 m, maximum particle diameter 5 μm, glass transition temperature 120 ° C).
実施例  Example
[0123] (1)半導体部品として半導体素子 (フリップチップ)を用いた例  [0123] (1) Example using semiconductor element (flip chip) as semiconductor component
〔実施例 1〜18、比較例 1〜3〕  (Examples 1 to 18, Comparative Examples 1 to 3)
上記準備した各成分を下記の表 1〜表 4に示す割合で配合し、 3本ロールを用いて 室温 (25°C)で均質混合分散することにより一液無溶剤の液状エポキシ榭脂組成物 を作製した。  The above-prepared components are blended in the ratios shown in Tables 1 to 4 below, and are homogenously mixed and dispersed at room temperature (25 ° C) using three rolls to form a one-part solvent-free liquid epoxy resin composition. Was prepared.
[0124] [表 1] (≤量部) [0124] [Table 1] (≤ volume part)
Figure imgf000028_0001
2]
Figure imgf000028_0001
2]
(重量部) 実 施 例(Parts by weight) Example
8 9 10 1 1 1 2 13 14 a 0.825 0.825 0.825 0.825 0, 825 0.825 0.825 ί^ίェポキ、 «}Jj旨 8 9 10 1 1 1 2 13 14 a 0.825 0.825 0.825 0.825 0, 825 0.825 0.825 ί ^ ίepoki, «} Jj
b 0.625 0.625 0.625 0.625 0.625 625 0.625 a 一 ― ― - ― - - b ― ― - ― - - 硬化剤  b 0.625 0.625 0.625 0.625 0.625 625 0.625 a 1 ― ―-―--b ― ―-―--
c - 0.27 - ― d 0.49 0.49 0.49 0, 9 --- 0.49 0.49 a - 一 一 - - プレポリマー  c-0.27--d 0.49 0.49 0.49 0, 9 --- 0.49 0.49 a-One--Prepolymer
b - ― - - - ― a 1.03 1.90 1.54 2.86 1.22 - b - - - - - 1.03 a 1 0.09 0.16 0,09 0.09 0- 11 - 0.09 b 1 - - - 0.09 一 c - - ―  b------a 1.03 1.90 1.54 2.86 1.22-b-----1.03 a 1 0.09 0.16 0,09 0.09 0- 11-0.09 b 1---0.09 one c---
― 3] - 3]
(重量部) 実 施 例 (Parts by weight) Example
15 16 17 18 a - 0, 825 0.825 0.825 エポキシ榭旨  15 16 17 18 a-0, 825 0.825 0.825 Epoxy
b 0.625 - 0, 625 0.625 a ― - —― b ― 1.10 1.10 硬侧  b 0.625-0, 625 0.625 a ―-―― b ― 1.10 1.10 Hard
c 一 ― ― d ―  c one--d-
a 1.625 ― ― ブレポリマー  a 1.625 ― ― Blepolymer
b 一 L725 一 a 1.61 1.82 L82 2.73 b ― 一 i 1 0.16 0.18 - b 1 - - - c ― 0.18 0' 18 m) 比 較 例  b-L725-a 1.61 1.82 L82 2.73 b-i1 0.16 0.18-b1---c-0.18 0 '18 m) Comparison example
2 3 a α 825 825 0.825 ί ^エポキシ樹脂  2 3 a α 825 825 0.825 ί ^ Epoxy resin
b 0, 625 ― 0.625 a _ - —― b 1,10 - c ― - ― d - 0.49 a ―  b 0, 625 ― 0.625 a _-―― b 1,10-c ―-― d-0.49 a ―
プレボリマ一 Prebolima I
b - 1.725 - a  b-1.725-a
b ― - a 1 - - b 1 [0128] このようにして得られた実施例および比較例の液状エポキシ榭脂組成物を用い、 E MD型回転粘度計を用いて 25°Cでの粘度を測定した後、針内径 0. 56mmのニード ルがついたポリプロピレン製シリンジに充填した。 b ―-a 1--b 1 Using the thus obtained liquid epoxy resin compositions of Examples and Comparative Examples, the viscosity at 25 ° C. was measured using an EMD type rotational viscometer, and the needle inner diameter was 0.56 mm. Was filled into a polypropylene syringe having a needle.
[0129] その後、上記シリンジ詰めの状態で 25°Cで放置して粘度が 2倍になるまでの時間 を測定してそれをポットライフとした。  [0129] Thereafter, the syringe was packed at 25 ° C, and the time until the viscosity doubled was measured to determine the pot life.
[0130] 一方、直径 200 /z mの Sn— 3Ag— 0. 5Cu半田バンプ電極を 64個有するシリコン チップ(厚み 370 /ζ πι、大きさ 10mm X I Omm)を準備し、直径が 300 mの銅配線 パッドが 64個開口(基板側電極)した厚み lmmの FR— 4ガラスエポキシ製配線回路 基板の 63Sn— 37Pb半田ペーストが塗布されて ヽる銅配線パッド (基板側電極)と、 上記シリコンチップの半田バンプ電極とが対向するように位置合わせして基板にチッ プを搭載した後、これを 260°Cで 5秒間の条件で加熱リフロー炉を通して半田接合し た。上記シリコンチップと回路基板の空隙(隙間)は 210 μ mであった。  [0130] On the other hand, a silicon chip (thickness: 370 / ζπι, size: 10mm XI Omm) having 64 Sn—3Ag—0.5Cu solder bump electrodes with a diameter of 200 / zm was prepared, and copper wiring with a diameter of 300m was prepared. 1 mm thick FR-4 glass epoxy wiring circuit with 64 pads (board side electrodes) Copper wiring pads (board side electrodes) coated with 63Sn-37Pb solder paste on the board and soldering the silicon chip After mounting the chip on the substrate with the bump electrodes facing each other, the chip was soldered through a heating reflow furnace at 260 ° C for 5 seconds. The gap between the silicon chip and the circuit board was 210 μm.
[0131] ついで、上記液状エポキシ榭脂組成物が充填されたシリンジに空気圧力をかけて 、上記シリコンチップ (フリップチップ)と回路基板の空隙の一辺に-一ドル力も液状 エポキシ榭脂組成物を吐出して塗布し、 60°Cホットプレート上で毛細管現象により液 状エポキシ榭脂組成物を加温充填し、充填時間を計測するとともに、充填終了後 15 0°Cで 4時間硬化させて榭脂封止することにより電子部品装置を作製した。  [0131] Next, air pressure was applied to the syringe filled with the liquid epoxy resin composition, and the liquid epoxy resin composition was applied to one side of the gap between the silicon chip (flip chip) and the circuit board by as much as one dollar force. The liquid epoxy resin composition is heated and filled by capillary action on a 60 ° C hot plate, the filling time is measured, and after filling is completed, it is cured at 150 ° C for 4 hours. An electronic component device was manufactured by sealing with grease.
[0132] 硬化終了後、室温まで徐冷した後、超音波探傷装置により、配線回路基板と半導 体素子の空隙を充填 ·封止した封止榭脂層のボイドの有無を観察した。そして、ボイ ドが観察されな力つた場合を〇、 1〜2個のボイドが観察された場合を△、それ以上 のボイドの数が観察された場合を Xとして評価した。  [0132] After the curing was completed, the temperature was gradually cooled to room temperature, and then the presence or absence of voids in the sealing resin layer that filled and sealed the gap between the printed circuit board and the semiconductor element was observed with an ultrasonic flaw detector. Then, a force when no void was observed was evaluated as 〇, a case where one or two voids were observed was evaluated as △, and a case where more voids were observed was evaluated as X.
[0133] このようにして得られた各電子部品装置を用いて、導通不良率およびリペア一性を 下記に示す方法に従って測定'評価した。その結果を上記液状エポキシ榭脂組成物 の特性測定とともに後記の表 5〜表 8に示す。  [0133] Using each of the electronic component devices thus obtained, the conduction failure rate and the repairability were measured and evaluated according to the following methods. The results are shown in Tables 5 to 8 below together with the measurement of the properties of the liquid epoxy resin composition.
[0134] 〔導通不良率〕  [Conduction Failure Rate]
上記電子部品装置の榭脂封止直後の導通不良率を測定した。その後、冷熱試験 装置を用いて、上記電子部品装置を 40°CZ 10分 125°C/10分の温度サイク ル試験を実施し、 1000サイクル後の電気的導通を調べ、上記ガラスエポキシ製配線 回路基板の銅配線パッド (基板側電極)の 64個全部に対する導通不良率 (%)を算 出した。 The conduction failure rate of the electronic component device immediately after resin sealing was measured. After that, the above electronic component device was subjected to a temperature cycle test at 40 ° C for 10 minutes and 125 ° C for 10 minutes using a thermal test device, and the electrical continuity after 1000 cycles was examined. The conduction failure rate (%) was calculated for all 64 copper wiring pads (board-side electrodes) on the circuit board.
[0135] 〔リペア一性〕 [Repairability]
上記導通不良率を測定した後、 200°Cに加熱した熱盤上にて、上記電子部品装置 力 シリコンチップを剥離し、室温に戻したものの接続部に残存するエポキシ榭脂組 成物の硬化体の残渣部分に、 N, N' —ジメチルホルムアミドとジエチレングリコール ジメチルエーテルの等量混合溶剤を含ませた脱脂綿を静置し、 40°Cで 1時間放置し た。その後、この脱脂綿を取り除きメタノールでよく拭き、エポキシ榭脂組成物硬化体 の剥離を行い、剥離可能な電子部品装置は再度、配線回路基板のパッド部に半田 ペーストの供給、そして、半田溶融後、上記と同様にしてシリコンチップを配線回路基 板上に搭載して電気的導通性を調べた。その後、上記と同様にして榭脂封止してリ ペア一(リワーク)性の評価を行った。  After measuring the above continuity failure rate, the silicon chip was peeled off from the electronic component device on a hot plate heated to 200 ° C, and after returning to room temperature, the epoxy resin composition remaining at the connection was cured. Absorbent cotton containing a mixed solvent of equal amounts of N, N'-dimethylformamide and diethylene glycol dimethyl ether was allowed to stand in the residue of the body, and allowed to stand at 40 ° C for 1 hour. Thereafter, the absorbent cotton is removed, and the cloth is thoroughly wiped with methanol, and the cured epoxy resin composition is peeled off. The peelable electronic component device is supplied with the solder paste to the pad portion of the wiring circuit board again, and after melting the solder, In the same manner as above, a silicon chip was mounted on the wiring circuit board, and the electrical conductivity was examined. Thereafter, resin sealing was performed in the same manner as above, and the repairability (rework) property was evaluated.
[0136] そして、エポキシ榭脂組成物硬化体が完全に剥離可能で、し力も電気的接続が完 全な場合を◎、硬化体がわずかに残存して剥離できるが、電気的接続が完全な場合 を〇、硬化体がわずかに残存して剥離できるが、電気的接続が不完全な場合を△、 エポキシ榭脂組成物硬化体がほとんど剥離できず、しかも電気的接続が不完全な場 合を Xとした。  [0136] In the case where the cured epoxy resin composition can be completely peeled off and the electrical connection is complete with the force ◎, the cured body can be slightly peeled off and the electrical connection is complete. In the case of (1), the cured product remains slightly and can be peeled off, but the electrical connection is incomplete. In the case of (2), the cured epoxy resin composition can hardly be peeled off and the electrical connection is incomplete. Is X.
[0137] [表 5]  [Table 5]
Figure imgf000031_0001
Figure imgf000031_0001
[0138] [表 6] 実 施 例 [Table 6] Example
8 9 10 11 12 13 1  8 9 10 11 12 13 1
粘度 (a t 25¾) 120 350 300 900 80 11S 130 (d Pa · s)  Viscosity (at 25¾) 120 350 300 900 80 11S 130 (d Pas)
ボットライフ (at25U 4 4 4 3 5 4 4 (時間)  Bot life (at25U 4 4 4 3 5 4 4 (hours)
规時間 (分) 2 3 3 6 1.5 2 2.5 導通不良率 (%) 0 0 0 0 0 0 0 ボイド 0 O O 〇 O 〇 〇  规 Time (min) 2 3 3 6 1.5 2 2.5 Conduction failure rate (%) 0 0 0 0 0 0 0 Void 0 O O 〇 O 〇 〇
i)ペア H4 (22V.) 〇 〇 O 〇 〇 〇 〇  i) Pair H4 (22V.) 〇 〇 O 〇 〇 〇 〇
[0139] [表 7][Table 7]
Figure imgf000032_0001
Figure imgf000032_0001
[0141] 上記の結果、全ての実施例の液状エポキシ榭脂組成物はポットライフが長く、低粘 度と相まってボイドレスの一液無溶剤型の液状エポキシ榭脂組成物として優れている ことがわかる。しかも、作製した電子部品装置において、形成された封止榭脂層にボ イドの発生や導通不良も無ぐリペア一性にも優れていることは明らかである。これに 対して、比較例の液状エポキシ榭脂組成物は、導通不良が無くボイドレスであつたが 、実施例品と比べてリペア一性に劣っていた。 [0141] As a result, the liquid epoxy resin compositions of all Examples had a long pot life and low viscosity. It can be seen that in combination with the degree, Voidless is excellent as a one-part, non-solvent type liquid epoxy resin composition. Moreover, it is clear that the fabricated electronic component device is excellent in repairability without generation of voids and poor conduction in the formed sealing resin layer. On the other hand, the liquid epoxy resin composition of the comparative example was void-free with no conduction failure, but was inferior in repairability as compared with the example product.
[0142] (2)半導体部品として半導体装置 (半導体パッケージ)を用いた例  [0142] (2) Example using semiconductor device (semiconductor package) as semiconductor component
[0143] 〔実施例 19〜29、比較例 4〜6〕 [Examples 19 to 29, Comparative Examples 4 to 6]
上記準備した各成分を下記の表 9〜表 11に示す割合で配合し、 3本ロールを用い て室温 (25°C)で均質混合分散することにより一液無溶剤の液状エポキシ榭脂組成 物を作製した。  The above-prepared components are blended in the ratios shown in Tables 9 to 11 below, and homogenously mixed and dispersed at room temperature (25 ° C) using three rolls to form a one-part solvent-free liquid epoxy resin composition. Was prepared.
[0144] [表 9] [0144] [Table 9]
(重量部) (Weight part)
実 施 例  Example
Figure imgf000033_0001
Figure imgf000033_0001
[0145] [表 10] (重量部) [0145] [Table 10] (Weight parts)
Figure imgf000034_0001
[表 11]
Figure imgf000034_0001
[Table 11]
(重量部)  (Weight parts)
Figure imgf000034_0002
このようにして得られた実施例および比較例の液状エポキシ榭脂組成物を用い、 Ε MD型回転粘度計を用いて 25°Cでの粘度を測定した後、針内径 0. 56mmのニード ルがついたポリプロピレン製シリンジに充填した。 [0148] その後、上記シリンジ詰めの状態で 25°Cで放置して粘度が 2倍になるまでの時間 を測定してそれをポットライフとした。
Figure imgf000034_0002
Using the thus obtained liquid epoxy resin compositions of Examples and Comparative Examples, measuring the viscosity at 25 ° C using an MD-type rotational viscometer, the needle having a needle inner diameter of 0.56 mm was used. Into a syringe made of polypropylene. [0148] Thereafter, the syringe was packed and left at 25 ° C to measure the time until the viscosity doubled, and this was defined as the pot life.
[0149] 一方、直径 200 /z mの Sn— 3Ag— 0. 5Cu半田バンプ電極を 64個有する CSPパ ッケージ(パッケージ高さ lmm、大きさ 10mm X I Omm)を準備し、直径が 300 m の銅配線パッドが 64個開口(基板側電極)した厚み lmmの FR— 4ガラスエポキシ製 配線回路基板の 63Sn— 37Pb半田ペーストが塗布されて 、る銅配線パッド (基板側 電極)と、上記 CSPパッケージの半田バンプ電極とが対向するように位置合わせして 基板に CSPパッケージを搭載した後、これを 260°Cで 5秒間の条件で加熱リフロー炉 を通して半田接合した。上記 CSPパッケージと回路基板の空隙(隙間)は 250 μ mで めつに。  On the other hand, a CSP package (package height lmm, size 10 mm XI Omm) having 64 Sn—3Ag—0.5Cu solder bump electrodes with a diameter of 200 / zm was prepared, and copper wiring with a diameter of 300 m was prepared. The 63Sn-37Pb solder paste of FR-4 glass epoxy wiring circuit board of lmm thickness with 64 pads opened (board side electrode) is coated with copper wiring pad (board side electrode) and solder of above CSP package. After mounting the CSP package on the substrate with the bump electrodes facing each other, the CSP package was soldered through a heating reflow furnace at 260 ° C for 5 seconds. The gap between the CSP package and the circuit board is 250 μm.
[0150] ついで、上記液状エポキシ榭脂組成物が充填されたシリンジに空気圧力をかけて [0150] Next, air pressure was applied to the syringe filled with the liquid epoxy resin composition.
、上記 CSPパッケージと回路基板の空隙の一辺に-一ドル力も液状エポキシ榭脂組 成物を吐出して塗布し、 60°Cホットプレート上で毛細管現象により液状エポキシ榭脂 組成物を加温充填し、充填時間を計測するとともに、充填終了後 150°Cで 4時間硬 ィ匕させて榭脂封止することにより電子部品装置を作製した。 The liquid epoxy resin composition is discharged and applied to one side of the gap between the CSP package and the circuit board with a force of one dollar, and the liquid epoxy resin composition is heated and filled by capillary action on a 60 ° C hot plate. Then, the filling time was measured, and after the filling was completed, the mixture was hardened at 150 ° C. for 4 hours and sealed with a resin to produce an electronic component device.
[0151] 硬化終了後、室温まで徐冷した後、超音波探傷装置により、配線回路基板と CSP ノ ッケージの空隙を充填.封止した封止樹脂層のボイドの有無を観察した。そして、 ボイドが観察されな力つた場合を〇、 1〜2個のボイドが観察された場合を△、それ以 上のボイドの数が観察された場合を Xとして評価した。  [0151] After the curing was completed, the temperature was gradually cooled to room temperature, and then the presence of voids in the sealing resin layer, which was filled and sealed with the gap between the printed circuit board and the CSP knockage, was observed using an ultrasonic flaw detector. Then, a force when no voids were observed was evaluated as 〇, a case where one or two voids were observed was evaluated as △, and a case where more voids were observed was evaluated as X.
[0152] このようにして得られた各電子部品装置を用いて、導通不良率およびリペア一性を 下記に示す方法に従って測定'評価した。その結果を上記液状エポキシ榭脂組成物 の特性測定とともに後記の表 12〜表 14に示す。 [0152] Using each of the electronic component devices thus obtained, the conduction failure rate and the repairability were measured and evaluated according to the following methods. The results are shown in Tables 12 to 14 below together with the measurement of the properties of the liquid epoxy resin composition.
[0153] 〔耐落下衝撃試験〕 [0153] [Drop impact test]
上記電子部品装置の榭脂封止後の基板両端に lOOg錘を取り付け、 1. 2mの高さ から木製床に落下させ、上記電子部品装置が取り付けられた基板について導通不 良が発生する回数を求めた。  Attach a lOOg weight to each end of the board after resin sealing of the above electronic component device, drop it on a wooden floor from a height of 1.2m, and count the number of times that the board with the above electronic component device has a conduction failure. I asked.
[0154] 〔導通不良率〕 [Continuous defective rate]
上記電子部品装置の榭脂封止直後の導通不良率を測定した。その後、冷熱試験 装置を用いて、上記電子部品装置を 40°CZ 10分 125°C/10分の温度サイク ル試験を実施し、 1000サイクル後の電気的導通を調べ、上記ガラスエポキシ製配線 回路基板の銅配線パッド (基板側電極)の 64個全部に対する導通不良率 (%)を算 出した。 The conduction failure rate of the electronic component device immediately after resin sealing was measured. After that, the thermal test Conduct a temperature cycle test of the above electronic component device at 40 ° C for 10 minutes and 125 ° C for 10 minutes using the device to check the electrical continuity after 1000 cycles. The conduction failure rate (%) for all 64 pads (substrate-side electrodes) was calculated.
[0155] 〔リペア一性〕  [Repairability]
上記導通不良率を測定した後、 200°Cに加熱した熱盤上にて、上記電子部品装置 力も CSPパッケージを剥離し、室温に戻したものの接続部に残存するエポキシ榭脂 組成物の硬化体の残渣部分に、 N, N' —ジメチルホルムアミドとジエチレングリコー ルジメチルエーテルの等量混合溶剤を含ませた脱脂綿を静置し、室温(22°C)で 1時 間放置した。その後、この脱脂綿を取り除きメタノールでよく拭き、エポキシ榭脂組成 物硬化体の剥離を行い、剥離可能な電子部品装置は再度、配線回路基板のパッド 部に半田ペーストの供給、そして、半田溶融後、上記と同様にして CSPパッケージを 配線回路基板上に搭載して電気的導通性を調べた。その後、上記と同様にして榭脂 封止してリペア一(リワーク)性の評価を行った。  After measuring the conduction failure rate, the CSP package was also peeled off on a hot plate heated to 200 ° C, and the CSP package was peeled off and returned to room temperature, but a cured product of the epoxy resin composition remaining at the connection portion Absorbent cotton containing a mixed solvent of equal amounts of N, N'-dimethylformamide and diethylene glycol dimethyl ether was allowed to stand in the residue portion of, and allowed to stand at room temperature (22 ° C) for 1 hour. Thereafter, the cotton wool is removed, the well is thoroughly wiped with methanol, the cured epoxy resin composition is peeled off, and the peelable electronic component device is again supplied with the solder paste to the pad portion of the wiring circuit board, and after melting the solder, In the same manner as above, the CSP package was mounted on a printed circuit board and the electrical conductivity was examined. Thereafter, the resin was sealed in the same manner as described above, and the repairability (rework) property was evaluated.
[0156] そして、エポキシ榭脂組成物硬化体が完全に剥離可能で、し力も電気的接続が完 全な場合を◎、硬化体がわずかに残存して剥離できるが、電気的接続が完全な場合 を〇、硬化体がわずかに残存して剥離できるが、電気的接続が不完全な場合を△、 エポキシ榭脂組成物硬化体がほとんど剥離できず、しかも電気的接続が不完全な場 合を Xとした。  In the case where the cured epoxy resin composition can be completely peeled off and the electrical connection is complete, the cured body can be peeled off with a small amount of the cured body, but the electrical connection is complete. In the case of (1), the cured product remains slightly and can be peeled off, but the electrical connection is incomplete. In the case of (2), the cured epoxy resin composition can hardly be peeled off and the electrical connection is incomplete. Is X.
[0157] [表 12] [Table 15]
実 施 例 Example
19 20 21 22 23 24 25 粘度 (a t 25 ) 300 800 600 1400 200 280 305 (d P a · s)  19 20 21 22 23 24 25 Viscosity (at 25) 300 800 600 1400 200 280 305 (d P a
ポットライフ (at25t) 36 36 34 35 120 32 35 (時間)  Pot life (at25t) 36 36 34 35 120 32 35 (hours)
時間 (分) 1 1.5 1.5 3 0.8 1 1.3 rnrw (回) 5000回 5000回 漏回 5000回 5000回 5000回 5000回 以上 以上 以上 以上 以上 以上 以上 導通不良率 (%) 0 0 0 0 0 0 0 ボイド O o 〇 〇 〇 o 〇 リペア (22V) ◎ ◎ o o o o  Time (min) 1 1.5 1.5 3 0.8 1 1.3 rnrw (times) 5000 times 5000 times Leakage 5000 times 5000 times 5000 times 5000 times or more or more or more or more or more Conduction failure rate (%) 0 0 0 0 0 0 0 Void O o 〇 〇 〇 o 〇 Repair (22V) ◎ ◎ oooo
[0158] [表 13] [Table 15]
Figure imgf000037_0001
Figure imgf000037_0001
[0159] [表 14] [0159] [Table 14]
比 較 例 Comparative example
4 5 6  4 5 6
粘度 (a t 2 5V,) 250 I 370 180  Viscosity (at 25 V,) 250 I 370 180
( d P a, s )  (d P a, s)
ポットライフ (at25O 37 24 12S  Pot life (at25O 37 24 12S
(時間)  (Time)
充填時閒 (分) 0.8 1 1. 3 0. 7  Filling time (min) 0.8 1 1. 3 0.7
rn^rm (回) 5000回 5000回 5000回  rn ^ rm (times) 5000 times 5000 times 5000 times
以上 i以上 以上  Over i over
導通不良率 (%) 0 0 0  Conduction failure rate (%) 0 0 0
ボイド 〇 O 0  Void 〇 O 0
リペア H* ( 2 2V.) X Δ X  Repair H * (2 2V.) X Δ X
[0160] 上記の結果、全ての実施例の液状エポキシ榭脂組成物はポットライフが長く、低粘 度と相まってボイドレスの一液無溶剤型の液状エポキシ榭脂組成物として優れている ことがわかる。しかも、作製した電子部品装置において、形成された封止榭脂層にボ イドの発生や導通不良も無ぐ耐落下衝撃試験の結果も良好であり、しかもリペア一 性にも優れていることは明らかである。これに対して、比較例の液状エポキシ榭脂組 成物は、導通不良が無くボイドレスであった力 実施例品と比べてリペア一性に劣つ ていた。 [0160] The above results show that the liquid epoxy resin compositions of all Examples have a long pot life and, in combination with low viscosity, are excellent as one-part solventless liquid epoxy resin compositions of Voidless. . Moreover, in the manufactured electronic component device, the formed sealing resin layer is free from voids and poor conduction, has a good drop impact resistance test result, and has excellent repairability. it is obvious. On the other hand, the liquid epoxy resin composition of the comparative example was inferior in repairability as compared with the power example product in which there was no conduction failure and was voidless.
[0161] 本発明を詳細にまた特定の実施態様を参照して説明したが、本発明の精神と範囲 を逸脱することなく様々な変更や修正を加えることができることは当業者にとって明ら かである。  [0161] Although the present invention has been described in detail and with reference to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention. is there.
本出願は、 2004年 5月 11日出願の日本特許出願 (特願 2004— 141583)、および、 2004年 12月 9日出願の日本特許出願 (特願 2004— 357098)、に基づくものであり、そ の内容はここに参照として取り込まれる。  This application is based on a Japanese patent application filed on May 11, 2004 (Japanese Patent Application No. 2004-141583) and a Japanese patent application filed on December 9, 2004 (Japanese Patent Application No. 2004-357098), Its contents are incorporated herein by reference.
産業上の利用可能性  Industrial applicability
[0162] 本発明は、 BGA (ボール ·グリッド 'アレイ)や CSP (チップ ·スケール 'パッケージま たはチップ ·サイズ'パッケージ)等の半導体パッケージや半導体素子等の半導体部 品の接続用電極部 (バンプ)を介して半導体部品と回路基板の対向する電極間を電 気的に接続する基板実装接続工法において、半導体パッケージと回路基板の空隙 に液状エポキシ榭脂組成物を充填し榭脂封止してなる、良好なリペア一性を備えた 電子部品装置を提供する。 [0162] The present invention relates to a semiconductor package such as a BGA (ball-grid 'array) or CSP (chip-scale' package or chip-size 'package) or a connection electrode portion of a semiconductor component such as a semiconductor element. In the board mounting connection method that electrically connects the semiconductor component and the opposing electrode of the circuit board via bumps, the gap between the semiconductor package and the circuit board Provided is an electronic component device having good repairability, which is filled with a liquid epoxy resin composition and sealed with a resin.

Claims

請求の範囲 [1] 半導体部品に設けられた接続用電極部と回路基板に設けられた接続用電極部を 対向させた状態で上記回路基板上に半導体部品が搭載され、上記回路基板と半導 体部品との空隙が封止榭脂層によって封止されてなる電子部品装置であって、上記 封止榭脂層が下記の (A)〜 (C)成分とともに下記の (D)成分を含有する液状ェポキ シ榭脂組成物によって形成されてなることを特徴とする電子部品装置。 (A)液状エポキシ榭脂。 (B)芳香族ジァミン類硬化剤。 (C)無機質充填剤。 (D)有機質添加剤。 [2] 上記 (B)成分である芳香族ジァミン類硬化剤が、下記の一般式(1)で表される芳香 族ジァミンおよびその誘導体の少なくとも一つである請求項 1記載の電子部品装置。 Claims [1] A semiconductor component is mounted on the circuit board in a state where the connection electrode section provided on the semiconductor component and the connection electrode section provided on the circuit board face each other. An electronic component device in which a gap with a body component is sealed by a sealing resin layer, wherein the sealing resin layer contains the following components (A) to (C) and the following component (D): An electronic component device formed of a liquid epoxy resin composition. (A) Liquid epoxy resin. (B) Aromatic diamine curing agents. (C) an inorganic filler. (D) Organic additives. [2] The electronic component device according to claim 1, wherein the aromatic diamine curing agent as the component (B) is at least one of an aromatic diamine represented by the following general formula (1) and a derivative thereof.
[化 1]  [Chemical 1]
Figure imgf000040_0001
Figure imgf000040_0001
〔式 (1 ) 中、 Xは水秦および/または C„ Sn+i (nは 1〜1 0の [In the formula (1), X is Mizunin and / or C „ Sn + i (n is 1 to 10
正数である) である。 mは 1〜4の正数である。 R 1 〜R4は水素 Is a positive number). m is a positive number from 1 to 4. R 1 to R 4 are hydrogen
または一価の^ ISであり、 互レ、に同じであっても異なって L、ても  Or monovalent ^ IS, which is the same or different,
よい。 〕 上記 (B)成分である芳香族ジァミン類硬化剤が、下記の一般式 (2)で表される含フ ッ素芳香族ジァミンおよびその誘導体の少なくとも一つである請求項 1記載の電子部  Good. The electronic part according to claim 1, wherein the aromatic diamine curing agent as the component (B) is at least one of a fluorine-containing aromatic diamine represented by the following general formula (2) and a derivative thereof.
[化 2] [Formula 2]
(Y) ™
Figure imgf000041_0001
(Y) ™
Figure imgf000041_0001
〔式 (2 ) 中、 Yはフッ素および/または ,、 Fs,^, ( ηは 1〜; 1 0の  [In the formula (2), Y is fluorine and / or, Fs, ^, (η is 1 to 10;
正数である。 ) である。 mは 1〜4の正数である。 R*5 〜Reは水素 It is a positive number. ). m is a positive number from 1 to 4. R * 5 ~R e is hydrogen
または一価の有機基であり、 互 、に同じであつても異なって 、てもよ  Or a monovalent organic group, which may be the same as or different from each other.
い。 〕  No. ]
[4] 上記 (B)成分である芳香族ジァミン類硬化剤が、 1分子中に 1個のエポキシ基を含 有するモノエポキシ化合物と、 2, 2' —ジトリフルォロメチル— 4, 4' —ジアミノビフ ニルとの反応生成物である請求項 1記載の電子部品装置。  [4] The aromatic diamine curing agent as the component (B) is a monoepoxy compound having one epoxy group in one molecule, and a 2,2′-ditrifluoromethyl—4,4 ′ -The electronic component device according to claim 1, which is a reaction product with diaminobiphenyl.
[5] 上記 1分子中に 1個のエポキシ基を含有するモノエポキシィ匕合物力 n—ブチルダ リシジルエーテル、ァリルグリシジルエーテル、 2—ェチルへキシルグリシジルエーテ ル、スチレンオキサイド、フエ-ルグリシジルエーテル、クレジルグリシジルエーテル、 ラウリルグリシジルエーテル、 ρ— sec—ブチルフエ-ルグリシジルエーテル、ノ -ルフ ェニルダリシジルエーテル、カルビノールのグリシジルエーテル、グリシジルメタクリレ ート、ビュルシクロへキセンモノェポキサイドおよび α—ピネンオキサイドからなる群か ら選ばれた少なくとも一つである請求項 4記載の電子部品装置。  [5] The monoepoxy conjugate containing one epoxy group in one molecule of the above n-butyldaricidyl ether, arylglycidyl ether, 2-ethylhexylglycidylether, styrene oxide, phenylglycidylether, Cresyl glycidyl ether, lauryl glycidyl ether, ρ-sec-butylphenylglycidyl ether, norphenylphenylicidyl ether, glycidyl ether of carbinol, glycidyl methacrylate, bulcyclohexene monoepoxide and α-pinene 5. The electronic component device according to claim 4, wherein the device is at least one selected from the group consisting of oxides.
[6] 上記一般式(1)で表される芳香族ジァミンおよびその誘導体の少なくとも一つと、 ( Α)成分である液状エポキシ榭脂とを反応させてなるプレボリマーを含有する請求項 2記載の電子部品装置。  [6] The electron according to claim 2, which comprises a prepolymer obtained by reacting at least one of the aromatic diamine represented by the general formula (1) and a derivative thereof with a liquid epoxy resin as a component (ii). Parts equipment.
[7] 上記一般式 (2)で表される含フッ素芳香族ジァミンおよびその誘導体の少なくとも 一つと、 (Α)成分である液状エポキシ榭脂とを反応させてなるプレボリマーを含有す る請求項 3記載の電子部品装置。  [7] A prepolymer which is obtained by reacting at least one of the fluorinated aromatic diamine represented by the general formula (2) and a derivative thereof with a liquid epoxy resin as the component (II). Electronic component device according to the above.
[8] 上記 (C)成分である無機質充填剤が、平均粒子径 10 μ m以下の球状シリカ粉末 である請求項 1〜7のいずれか一項に記載の電子部品装置。  [8] The electronic component device according to any one of claims 1 to 7, wherein the inorganic filler as the component (C) is a spherical silica powder having an average particle size of 10 µm or less.
[9] 上記 (C)成分である無機質充填剤が、下記の一般式 (3)で表される有機シランィ匕 合物によって表面が被覆された、平均粒子径 10 m以下の球状シリカ粉末である請 求項 1〜7のいずれか一項に記載の電子部品装置。 [化 3] '— oH^~ sレ一 ) b … ) [9] The inorganic filler as the component (C) is a spherical silica powder having an average particle diameter of 10 m or less, the surface of which is coated with an organosilane conjugate represented by the following general formula (3). The electronic component device according to any one of claims 1 to 7. [Formula 3] '— oH ^ ~ s レ) b …)
〔式 (3) 中、 α' は水素以外の一価の であり、 は少なくとも  [In the formula (3), α 'is a monovalent other than hydrogen, and at least
1個のアミノ基、 エポキシ基、 ビニル基、 スチリル基、 メタクリロキシ  1 amino group, epoxy group, vinyl group, styryl group, methacryloxy
基、 ウレイド基を含む一価の有 である。 また、 a, bは a + b = 4  And monovalent, including ureido groups. A, b is a + b = 4
であり、 それぞれ 1〜3の正の正数である。 〕  Where each is a positive number between 1 and 3. ]
[10] 上記一般式 (3)で表される有機シランィ匕合物が、下記の一般式 (4)で表される有機 シランィ匕合物である請求項 9記載の電子部品装置。 10. The electronic component device according to claim 9, wherein the organosilane conjugate represented by the general formula (3) is an organosilane conjugate represented by the following general formula (4).
[化 4]  [Formula 4]
(a1 -OH? S i—— y— ΝΉ2 -■- (4) (a 1 -OH? S i—— y— ΝΉ 2- ■-(4)
〔式 (4) 中、 は水素以外の一価の有 (S基であり、 γは二価の有 S  [In the formula (4), is a monovalent valence other than hydrogen (S group, γ is a divalent valence S
である。 〕  It is. ]
[11] 上記 (C)成分である無機質充填剤が、下記の一般式 (5)で表される有機チタンィ匕 合物によって表面が被覆された、平均粒子径 10 m以下の球状シリカ粉末である請 求項 1〜7のいずれか一項に記載の電子部品装置。 [11] The inorganic filler as the component (C) is a spherical silica powder having an average particle diameter of 10 m or less, the surface of which is coated with an organotitanium conjugate represented by the following general formula (5). The electronic component device according to any one of claims 1 to 7.
[化 5]  [Formula 5]
(a1 -o ~τ i—ίβ1 ) b … (5) (a 1 -o ~ τ i—ίβ 1 ) b … (5)
〔式 (5) 中、 ί¾素 tuの一価の であり、 β1 は少なくとも [In equation (5), the hydrogen tu is monovalent and β 1 is at least
1個のアミノ基、 エポキシ基、 ビュル基、 スチリル基、 メタクリロキシ  1 amino group, epoxy group, butyl group, styryl group, methacryloxy
基、 ウレイド基を^ tf"価の^ «Sである。 また、 a, bは a + b = 4  Group, ureido group is ^ «S with ^ tf" value. A, b is a + b = 4
であり、 それぞれ 1〜 3の正の正数である。 〕  And each is a positive number between 1 and 3. ]
[12] 上記 (D)成分である有機質添加剤が、平均粒子径 10 μ m以下の球状熱可塑性榭 脂粒子および平均粒子径 10 μ m以下の球状架橋榭脂粒子の少なくとも一つである 請求項 1〜11のいずれか一項に記載の電子部品装置。 [12] The organic additive as the component (D) is at least one of spherical thermoplastic resin particles having an average particle diameter of 10 μm or less and spherical crosslinked resin particles having an average particle diameter of 10 μm or less. Item 12. The electronic component device according to any one of Items 1 to 11.
[13] 上記球状熱可塑性榭脂粒子および球状架橋榭脂粒子の少なくとも一つが、球状ポ リメチルメタタリレート粒子である請求項 12記載の電子部品装置。 13. The electronic component device according to claim 12, wherein at least one of the spherical thermoplastic resin particles and the spherical crosslinked resin particles is a spherical polymethylmetharylate particle.
[14] 上記球状ポリメチルメタタリレート粒子の重量平均分子量が、 100, 000〜5, 000,[14] The weight average molecular weight of the spherical polymethyl methacrylate particles is from 100,000 to 5,000,
000の範囲である請求項 13記載の電子部品装置。 14. The electronic component device according to claim 13, wherein the range is 000.
[15] 上記球状ポリメチルメタタリレート粒子力 ガラス転移温度 100°C以上の球状架橋ポ リメチルメタタリレート粒子である請求項 13記載の電子部品装置。 15. The electronic component device according to claim 13, wherein the spherical polymethyl methacrylate particles are spherical crosslinked polymethyl methacrylate particles having a glass transition temperature of 100 ° C. or higher.
[16] 上記半導体部品が、半導体素子である請求項 1〜15のいずれか一項に記載の電 子部品装置。  [16] The electronic component device according to any one of claims 1 to 15, wherein the semiconductor component is a semiconductor element.
[17] 上記半導体部品が、半導体装置である請求項 1〜15のいずれか一項に記載の電 子部品装置。  [17] The electronic component device according to any one of claims 1 to 15, wherein the semiconductor component is a semiconductor device.
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