JPH03206690A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH03206690A
JPH03206690A JP2002821A JP282190A JPH03206690A JP H03206690 A JPH03206690 A JP H03206690A JP 2002821 A JP2002821 A JP 2002821A JP 282190 A JP282190 A JP 282190A JP H03206690 A JPH03206690 A JP H03206690A
Authority
JP
Japan
Prior art keywords
semiconductor device
base plate
insulating layer
base board
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002821A
Other languages
Japanese (ja)
Inventor
Toshihiro Nakajima
中嶋 利廣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2002821A priority Critical patent/JPH03206690A/en
Publication of JPH03206690A publication Critical patent/JPH03206690A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0201Thermal arrangements, e.g. for cooling, heating or preventing overheating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/05Insulated conductive substrates, e.g. insulated metal substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/303Surface mounted components, e.g. affixing before soldering, aligning means, spacing means

Abstract

PURPOSE:To improve heat dissipating effect by providing a spacer between a resin part and a base board of an IC in a semiconductor device having a resin sealing IC on an insulating layer of the base board with a heat dissipating surface. CONSTITUTION:A plurality of projections 22 are provided to a metallic base board 21 with a heat dissipating surface as a space in contact with a resin part 5a of an IC 5 through an insulating layer 2. A height of the projection 22 is sized to allow a lead 6 to be connected to a control circuit pattern of a metallic pattern 7. Thereby, it is possible to realize good heat dissipation to the base board 21 of the IC 5 by the projection 22 when it is enerziged. Compactness of the IC 5 can be realized in this way.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、例えばパワーICモジュール等に使用して好
適な半導体装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor device suitable for use in, for example, a power IC module.

〔従来の技術〕[Conventional technology]

近年、半導体装置としては、パワーデバイスと制御回路
を一体化してなるパワー”ICモジュールがエアコン・
汎用インバータ等に広く使用されている。
In recent years, as a semiconductor device, power "IC" modules that integrate power devices and control circuits are used in air conditioners and
Widely used in general-purpose inverters, etc.

従来、この種の半導体装置は第3図に示すように構威さ
れている。これを同図に基づいて説明すると、同図にお
いて、符号lで示すものは金属製のベース板で、一方側
に30〜200μのエポキシ系樹脂からなる絶縁層2が
形成されており、他方側には外部に露呈する放熱面3が
形或されている。
Conventionally, this type of semiconductor device has been constructed as shown in FIG. To explain this based on the same figure, in the same figure, what is indicated by the symbol l is a metal base plate, on one side of which an insulating layer 2 made of epoxy resin with a thickness of 30 to 200 μm is formed, and on the other side. A heat dissipation surface 3 exposed to the outside is formed on the surface.

4は枠状のケースで、前記ベース板1の周囲に立設され
ている。5は例えばsop <樹脂封止形の半導体装置
)等からなるICで、リード6が前記絶縁層2上に金属
パターン7の制御回路用パターンを介して接続され、か
つゲル状樹脂としてのシリコーン8によって封止されて
いる。9はパワーデバイスとしてのチップで、前記金属
パターン7のパワーデバイス用パターン上に金属プロソ
ク10を介して接合され、かつ前記IC5と同様に前記
シリコーン8によって封止されている。また、11は前
記金属パターン7のバンドと前記チソプ9の電極とを接
続するAIワイヤ、12は前記ケース4に内封されかつ
前記シリコーン8上に積層されたエボキシ系樹脂である
。なお、l3は前記金属パターン7の制御回路用パター
ンと前記IC5のり−ド6問および前記金属ブロック1
0と前記金属パターン7のパワーデバイス用パターン間
に介在する半田ペースト、14は前記金属ブロック10
と前記チソプ9との間に介在する半田である。
Reference numeral 4 denotes a frame-shaped case, which is erected around the base plate 1. Reference numeral 5 denotes an IC consisting of, for example, a sop (semiconductor device of resin-sealed type), etc., in which a lead 6 is connected to the insulating layer 2 via a control circuit pattern of a metal pattern 7, and silicone 8 is formed as a gel-like resin. is sealed by. Reference numeral 9 denotes a chip as a power device, which is bonded onto the power device pattern of the metal pattern 7 via a metal protuberance 10, and is sealed with the silicone 8 similarly to the IC 5. Further, 11 is an AI wire connecting the band of the metal pattern 7 and the electrode of the chisop 9, and 12 is an epoxy resin sealed in the case 4 and laminated on the silicone 8. Note that l3 is the control circuit pattern of the metal pattern 7, the six IC5 boards, and the metal block 1.
0 and the solder paste interposed between the power device patterns of the metal pattern 7, and 14 the metal block 10.
This is the solder interposed between the solder plate 9 and the solder plate 9.

次に、このように構威された半導体装置の製造方法につ
いて説明する。
Next, a method for manufacturing a semiconductor device configured as described above will be explained.

先ず、ベース板1上に絶縁層2を形戒する。次いで、こ
の絶縁層2上にパワーデバイス用と制御回路用の金属パ
ターン7を形或する。しかる後、金属パターン7の回路
制御用パターンとパワーデバイス用パターンに半田ペー
スト13を塗布してIC5のリード6を接続すると共に
、パワーデバイス用パターンに金属ブロック10を接合
し、このうち金属ブロック10上に半田14によってチ
ソプ9を接合する。そして、リフロー炉内での半田付け
後に金属パターン7のパッドとチソプ9の電極とをAl
ワイヤ11によって接続し、ベース板1の側面に接着剤
によってケース4を接着してから、ケース4内にシリコ
ーン8,エポキシ系樹脂12を順次封入する。
First, the insulating layer 2 is formed on the base plate 1. Next, metal patterns 7 for power devices and control circuits are formed on this insulating layer 2. After that, solder paste 13 is applied to the circuit control pattern and the power device pattern of the metal pattern 7 to connect the leads 6 of the IC 5, and the metal block 10 is joined to the power device pattern. The chisop 9 is joined on top with solder 14. After soldering in a reflow oven, the pads of the metal pattern 7 and the electrodes of the chisop 9 are bonded to Al.
After connecting with wires 11 and adhering the case 4 to the side surface of the base plate 1 with an adhesive, silicone 8 and epoxy resin 12 are sequentially sealed inside the case 4.

このようにして、半導体装置を製造することができる。In this way, a semiconductor device can be manufactured.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

ところで、従来の半導体装置においては、IC5の樹脂
部5aと絶縁層2との間にシリコーン8が介在する構造
であるため、IC5からベース板1への放熱が良好に行
われず、IC5に使用されるバヮーチソプを小型化する
ことができなかった。すなわち、小型チップとして例え
ばIGBT等のMOS系パワーチップを使用すると、通
電時の発熱によって規定以上の温度までIC5のジャン
クション温度が上昇してしまい、IC5が誤動作したり
信頼性が低下したりするからである。この結果、IC5
全体が大型化し、コストが嵩むという問題があった。
By the way, in the conventional semiconductor device, since the silicone 8 is interposed between the resin part 5a of the IC5 and the insulating layer 2, heat dissipation from the IC5 to the base plate 1 is not performed well, and the silicone 8 is not used for the IC5. However, it was not possible to downsize the robot. In other words, if a MOS power chip such as an IGBT is used as a small chip, the junction temperature of IC5 will rise to a temperature higher than the specified temperature due to the heat generated during energization, which may cause IC5 to malfunction or reduce reliability. It is. As a result, IC5
There was a problem in that the overall size increased and the cost increased.

本発明はこのような事情に鑑みてなされたもので、使用
ICの小型化を図ることができ、もってコストの低廉化
を図ることができる半導体装置を提供するものである。
The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a semiconductor device that can reduce the size of the IC used and thereby reduce the cost.

〔課題を解決するための手段〕[Means to solve the problem]

本発明に係る半導体装置は、ICの樹脂部とべース板上
のベース板との間にスペーサを介在させたものである。
A semiconductor device according to the present invention has a spacer interposed between a resin portion of an IC and a base plate on a base plate.

〔作 用〕[For production]

本発明においては、通電時にスペーサによってICから
ベース板への放熱を良好に行うことができる。
In the present invention, heat can be effectively dissipated from the IC to the base plate by the spacer when electricity is applied.

〔実施例〕〔Example〕

以下、本発明の構或等を図に示す実施例によって詳細に
説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The structure of the present invention will be explained in detail below with reference to embodiments shown in the drawings.

第1図は本発明に係る半導体装置を示す断面図で、同図
以下において第3図と同一の部材については同一の符号
を付し、詳細な説明は省略する。
FIG. 1 is a cross-sectional view showing a semiconductor device according to the present invention, and in the following figures, the same members as in FIG. 3 are designated by the same reference numerals, and detailed explanations will be omitted.

同図において、符号21で示す金属製のベース板には、
前記IC5の樹脂部5aに前記絶縁層2を介して対接す
るスペーサとしての複数個の突子22が一体に設けられ
ている。これら突子22の高さは、前記リード6が前記
金属パターン7の制御回路用パターンに接続し得るよう
な寸法に設定されている。
In the same figure, the metal base plate indicated by the reference numeral 21 includes:
A plurality of protrusions 22 as spacers are integrally provided on the resin portion 5a of the IC 5 and are in contact with each other with the insulating layer 2 interposed therebetween. The heights of these protrusions 22 are set to such a size that the leads 6 can be connected to the control circuit pattern of the metal pattern 7.

このように構威された半導体装置においては、1C5の
樹脂部5aに絶縁層2を介して突子22を対接させるこ
とにより、通電時に突子22によってIC5からベース
板2lへの放熱を良好に行うことができるから、IC5
の小型化を図ることができる。
In the semiconductor device configured in this manner, by bringing the protrusions 22 into contact with the resin portion 5a of the IC5 through the insulating layer 2, the heat dissipation from the IC5 to the base plate 2l is improved by the protrusions 22 when electricity is applied. IC5
can be made smaller.

なお、本実施例においては、ベース板2lに突子22を
一体に設ける構造を示したが、本発明はこれに限定され
るものではなく、第2図に示すようにIC5の樹脂部5
aとベース板21上の絶縁層2との間に金属ブロック2
3を介在させても実施例と同様の効果を奏する。この場
合、スペーサとしてエボキシ系樹脂からなるブロックを
IC5の樹脂部5aとベース板21上の絶縁層2との間
に介在させてもIC5からベース板21への放熱を効果
的に行うことができる。
Although this embodiment shows a structure in which the protrusions 22 are integrally provided on the base plate 2l, the present invention is not limited to this, and as shown in FIG.
a and the insulating layer 2 on the base plate 21.
Even if 3 is interposed, the same effects as in the embodiment can be obtained. In this case, even if a block made of epoxy resin is interposed as a spacer between the resin portion 5a of the IC 5 and the insulating layer 2 on the base plate 21, heat can be effectively radiated from the IC 5 to the base plate 21. .

また、本発明において使用されるICは実施例に限定さ
れるものでないことは勿論である。
Furthermore, it goes without saying that the IC used in the present invention is not limited to the embodiments.

因に、本発明における半導体装置の製造方法は従来技術
と同様に行うことができるから、その記載については省
略する。
Incidentally, since the method for manufacturing a semiconductor device according to the present invention can be performed in the same manner as in the prior art, the description thereof will be omitted.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明によれば、rcの樹脂部とベ
ース板上のベース板との間にスベーサを介在させたので
、通電時にスペーサによってICからヘース板への放熱
を良好に行うことができる。したがって、使用ICの小
型化を図ることができるから、コストの低廉化を図るこ
とができる。
As explained above, according to the present invention, since the spacer is interposed between the resin part of the RC and the base plate on the base plate, the spacer can effectively dissipate heat from the IC to the base plate when electricity is applied. can. Therefore, since it is possible to reduce the size of the IC used, it is possible to reduce costs.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る半導体装置を示す断面図、第2図
は他の実施例を示す断面図、第3図は従来の半導体装置
を示す断面図である。 2・・・・絶縁層、5・・・・IC、5a・樹脂部、6
・・・・リード、7・・・・金属パターン、21・・・
・ベース板、22・・・・突子。 代 理 人′大岩増雄
FIG. 1 is a sectional view showing a semiconductor device according to the present invention, FIG. 2 is a sectional view showing another embodiment, and FIG. 3 is a sectional view showing a conventional semiconductor device. 2...Insulating layer, 5...IC, 5a/resin part, 6
...Lead, 7...Metal pattern, 21...
・Base plate, 22...Protrusion. Representative: Masuo Oiwa

Claims (1)

【特許請求の範囲】[Claims]  一方側に絶縁層が形成され他方側に放熱面を有するベ
ース板と、このベース板の前記絶縁層上に導電パターン
を介して接続されるリードを有する樹脂封止形のICと
を備えた半導体装置において、前記ICの樹脂部と前記
ベース板との間にスペーサを介在させたことを特徴とす
る半導体装置。
A semiconductor comprising a base plate having an insulating layer formed on one side and a heat dissipation surface on the other side, and a resin-sealed IC having leads connected to the insulating layer of the base plate via a conductive pattern. A semiconductor device, characterized in that a spacer is interposed between the resin portion of the IC and the base plate.
JP2002821A 1990-01-09 1990-01-09 Semiconductor device Pending JPH03206690A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002821A JPH03206690A (en) 1990-01-09 1990-01-09 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002821A JPH03206690A (en) 1990-01-09 1990-01-09 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH03206690A true JPH03206690A (en) 1991-09-10

Family

ID=11540080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002821A Pending JPH03206690A (en) 1990-01-09 1990-01-09 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH03206690A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2480428A (en) * 2010-05-11 2011-11-23 Quanta Light Ind Ltd PCB with metal core having extended heatsink bosses for mounting LEDs

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2480428A (en) * 2010-05-11 2011-11-23 Quanta Light Ind Ltd PCB with metal core having extended heatsink bosses for mounting LEDs

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