JPH03184338A - Apparatus for lifting out of pure water and drying - Google Patents

Apparatus for lifting out of pure water and drying

Info

Publication number
JPH03184338A
JPH03184338A JP32343889A JP32343889A JPH03184338A JP H03184338 A JPH03184338 A JP H03184338A JP 32343889 A JP32343889 A JP 32343889A JP 32343889 A JP32343889 A JP 32343889A JP H03184338 A JPH03184338 A JP H03184338A
Authority
JP
Japan
Prior art keywords
pure water
tank
water
bubbles
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32343889A
Other languages
Japanese (ja)
Inventor
Haruo Saegusa
三枝 晴夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP32343889A priority Critical patent/JPH03184338A/en
Publication of JPH03184338A publication Critical patent/JPH03184338A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve drying quality by providing a function of removing bubbles in pure water to be supplied to a pure water tank, and lifting a substrate while always allowing the water of the tank to overflow. CONSTITUTION:A lifting out of pure water and drying apparatus for lifting a substrate at an extremely low speed from a pure water tank 1 and drying it has a function of removing bubbles in the pure water to be supplied to the tank 1. For example, before the water heated by a pure water heating unit 15 and mixed with bubbles of steam is introduced to the tank 1, the bubbles in the hot water is separated by a bubble removing tank 12. The bubbles are moved to the top of the tank 12, drained from a bubble drain pipe 13, and the hot pure water is supplied to the tank 1 in a state having no bubble in the water. Thus, since the waving of the surface of the water of the tank 1 due to the bubbles in the wafer is eliminated, the substrate can be lifted while always allowing the water of the tank 1 to overflow. Accordingly, particles of the surface layer of the tank 1 can be reduced, and drying quality of the substrate can be improved.

Description

【発明の詳細な説明】 【産業上の利用分野] 本発明は、半導体のシリコン基板、フォトマスク、液晶
パネルのガラス基板、光学レンズ等(以下、単に基板と
いう)の洗浄後の乾燥工程に用いる純水引き上げ乾燥装
置に関する。
Detailed Description of the Invention [Industrial Application Field] The present invention is used in the drying process after cleaning of semiconductor silicon substrates, photomasks, liquid crystal panel glass substrates, optical lenses, etc. (hereinafter simply referred to as substrates). Related to pure water pulling and drying equipment.

【従来の技術〕[Conventional technology]

従来の純水引き上げ乾燥装置について第4図で説明する
。純水加熱ユニット15ニヨリ加温された純水は、純水
槽1に純水供給バイブ2より供給され分散板3により拡
散して槽内を流動する。純水槽1に純水が満たされると
、純水槽1の上部より純水はあふれ、オーバーフローし
た純水はオーバーフロー槽4で受け、排水バイブ5より
排出される。一方、基板6はカセット7にセットされ、
これをカゴ8で受けている。これらをロボットアーム9
に取り付け、ロボット10で上下動を行う。基板の引き
上げ時は、まず第4図のように基板6を純水槽lに完全
に沈めた状態から、毎秒1〜10mmという微低速で引
き上げ、純水の表面張力を利用して基板に付着する水滴
を極力排除する。この引き上げを行うときに純水槽lの
純水をオーバーフローさせた状態だと、純水が純水加熱
ユニット15で加熱された時に発生した水蒸気の泡が、
温純水に混ざって純水槽に供給されるため、この泡が純
水槽1の水面を出るときに水面が波立ちをおこす、水面
に波立ちがあると、基板6に水滴が残り易くなり、しま
模様のじみが残ったりして乾燥品質が落ちる。従って基
板引き上げ前は純水を供給してオーバーフローさせるが
、基板引き上げ時はバルブ11で純水の供給をストップ
し、水面を静止させて基板の引き上げを行っていた。
A conventional pure water pulling and drying device will be explained with reference to FIG. Pure water heated by the pure water heating unit 15 is supplied to the pure water tank 1 from the pure water supply vibrator 2, diffused by the dispersion plate 3, and flows in the tank. When the pure water tank 1 is filled with pure water, the pure water overflows from the upper part of the pure water tank 1, the overflowing pure water is received in the overflow tank 4, and is discharged from the drainage vibrator 5. On the other hand, the board 6 is set in the cassette 7,
This is received in basket 8. Robot arm 9
The robot 10 moves it up and down. When pulling up the substrate, first, as shown in Fig. 4, the substrate 6 is completely submerged in the pure water tank L, and then it is pulled up at a very slow speed of 1 to 10 mm per second, and the surface tension of the pure water is used to attach it to the substrate. Eliminate water droplets as much as possible. If the deionized water in the deionized water tank l is overflowed when performing this lifting, the steam bubbles generated when the deionized water is heated in the deionized water heating unit 15 will
Since these bubbles are mixed with warm pure water and supplied to the pure water tank, when these bubbles leave the water surface of the pure water tank 1, they cause ripples on the water surface.If the water surface is rippled, water droplets tend to remain on the substrate 6, causing a striped pattern. remains and the drying quality deteriorates. Therefore, before lifting the substrate, pure water is supplied to cause an overflow, but when lifting the substrate, the supply of pure water is stopped using the valve 11, and the water surface is held still while the substrate is lifted.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかし、基板の引き上げ時に純水の供給を止めて水面を
静止させると、液中のパーティクルは上層部分に滞留す
るし、気中のパーティクルも水面上に捕捉され漂うため
、水面上ではパーティクルの濃度がきわめて高くなる。
However, if the supply of pure water is stopped and the water surface is kept still when lifting the substrate, the particles in the liquid will stay in the upper layer, and the particles in the air will also be captured on the water surface and float, resulting in a concentration of particles on the water surface. becomes extremely high.

この状態で基板を引き上げて行くと、基板近傍の水面表
層は基板の上昇と共に基板表面に引き寄せられ、基板は
水面表層のパーティクルをくっつけながら上昇すること
となり、その分乾燥品質が落ちるという問題点を有する
。そこで、本発明は従来のこのような問題点を解決する
ため、純水槽に純水を供給する前に純水中の泡を除去し
て供給する、ちしくは純水槽に純水を供給後続水槽で純
水中の泡を除去することにより、純水槽の純水を常にオ
ーバーフローさせながら基板の引き上げを行なえるよう
にし、乾燥品質の向上を図ることを目的とする。
If the substrate is pulled up in this state, the water surface layer near the substrate will be drawn to the substrate surface as the substrate rises, and the substrate will rise while attaching particles on the water surface layer, resulting in a corresponding drop in drying quality. have Therefore, in order to solve these conventional problems, the present invention is designed to remove bubbles from pure water before supplying it to a pure water tank, or to supply pure water to a pure water tank after supplying it. The purpose of this method is to improve drying quality by removing bubbles from pure water in a water tank so that the substrate can be pulled up while constantly overflowing the pure water in the water tank.

[課題を解決するための手段] 上記課題を解決するため、本発明の純水引き上げ乾燥装
置は、純水槽から基板を微低速で引き上げて乾かす純水
引き上げ乾燥装置において、純水槽に供給する純水中の
泡を除去する機能を備えたことを特徴とする。
[Means for Solving the Problems] In order to solve the above problems, the deionized water pulling and drying device of the present invention is a deionized water pulling and drying device that pulls up and dries a substrate from a deionized water tank at a very low speed. It is characterized by the ability to remove bubbles from the water.

[作 用〕 上記のように純水中の泡を除去することにより、純水槽
の純水を常にオーバーフローさせながら基板を引き上げ
られるので、水面表層に滞留するパーティクル濃度が低
減でき、基板に付着するパーティクルの数ち減るので基
板の乾燥品質が向上する。
[Function] By removing the bubbles in the pure water as described above, the substrate can be pulled up while the pure water in the pure water tank is constantly overflowing, which reduces the concentration of particles that remain on the surface layer of the water surface and prevents them from adhering to the substrate. Since the number of particles is reduced, the drying quality of the substrate is improved.

[実 施 例] 以下に本発明の実施例を図面にもとづいて説明する。第
1図に於て、純水加熱ユニット15により加温され、水
蒸気の泡のまざった純水は純水槽1に入る前に、泡除去
槽12にて温純水中の泡を分離する。泡は泡除去槽12
の上部に移動して泡排出バイブ13より排出され、温純
水は純水中に泡がない状態で純水槽lに供給される。こ
れによって純水中の泡による純水槽1の水面の波立ちが
なくなるため、純水槽1の純水を常にオーバーフローさ
せながら基板6を引き上げることができる。これにより
純水槽1の水面表層のパーティクルが低減でき、基板6
の乾燥品質が向上した1本実施例では、純水槽1に入る
前に泡を除去しているが第2図に示すような泡の除去の
方法もある。
[Example] Examples of the present invention will be described below based on the drawings. In FIG. 1, pure water heated by a pure water heating unit 15 and mixed with steam bubbles is separated from the bubbles in the warm pure water in a bubble removal tank 12 before entering the pure water tank 1. Foam is removed from the foam removal tank 12
The warm pure water is moved to the upper part of the tank and discharged from the bubble discharge vibrator 13, and the warm pure water is supplied to the pure water tank 1 without bubbles in the pure water. This eliminates ripples on the water surface of the pure water tank 1 due to bubbles in the pure water, so the substrate 6 can be pulled up while the pure water in the pure water tank 1 is constantly overflowing. As a result, particles on the water surface layer of the pure water tank 1 can be reduced, and the substrate 6
In this embodiment, bubbles are removed before entering the pure water tank 1, but there is also a method of removing bubbles as shown in FIG.

この場合純水槽lの底より供給された純水中の泡は、純
水供給バイブ2の出口の上にある泡除去ボックス14に
入り、泡排出バイブ13より純水槽1の外に排出される
。又他の方法として第3図に示すような方法ちある、泡
除去槽12に供給された純水中の泡は、泡除去槽12の
上部より排出され、純水は泡除去槽12よりオーバーフ
ローされ中間槽16に入り、中間槽16の下から純水槽
1に供給される。または泡除去槽12を設けないで、中
間槽16より純水を供給して純水中の泡を中間槽16の
上部より排出し、純水を中間槽16の下から純水槽lに
供給する方法もある。
In this case, bubbles in the pure water supplied from the bottom of the pure water tank 1 enter the bubble removal box 14 located above the outlet of the pure water supply vibrator 2, and are discharged from the pure water tank 1 through the bubble discharge vibrator 13. . Another method is as shown in FIG. 3, in which the bubbles in the pure water supplied to the bubble removal tank 12 are discharged from the upper part of the bubble removal tank 12, and the pure water overflows from the bubble removal tank 12. The water enters the intermediate tank 16 and is supplied to the pure water tank 1 from below the intermediate tank 16. Alternatively, without providing the bubble removal tank 12, pure water is supplied from the intermediate tank 16, the bubbles in the pure water are discharged from the upper part of the intermediate tank 16, and the pure water is supplied from the bottom of the intermediate tank 16 to the pure water tank l. There is a way.

[発明の効果] 本発明の純水中の泡を除去する機能を設けた純水引き上
げ乾燥装置は、純水中の泡による純水槽の水面の波立ち
がないので、純水槽の純水を常にオーバーフローさせな
がら基板の引き上げを行える為、水面表層のパーティク
ルを低減でき基板の乾燥品質を向上させる効果がある。
[Effects of the Invention] The pure water lifting and drying device of the present invention equipped with a function of removing bubbles from pure water does not cause ripples on the water surface of the pure water tank due to bubbles in the pure water, so the pure water in the pure water tank is always kept clean. Since the substrate can be pulled up while overflowing, particles on the water surface layer can be reduced and the drying quality of the substrate can be improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図、第2図及び第3図は、本発明の純水中の泡を除
去する機能を備えた純水引き上げ乾燥装置の概略図。 第4図は従来の純水引き上げ乾燥装置の概略図。 1・・・純水槽 2・・・純水供給バイブ 3・・・分散板 4・・・オーバーフロー槽 5 ・ 6 ・ 7 ・ 8 ・ 9 ・ 10 ・ 11  ・ l 2 ・ 13 ・ 14 ・ l 5 ・ l 6 ・ ・排水パイプ ・基板 ・カセット ・カゴ ・ロボットアーム ・ロボット ・バルブ ・泡除去槽 ・泡排出パイプ ・泡除去ボックス ・純水加熱ユニット ・中間槽
1, 2, and 3 are schematic diagrams of a deionized water pulling and drying device having a function of removing bubbles from deionized water according to the present invention. FIG. 4 is a schematic diagram of a conventional pure water pulling and drying device. 1...Pure water tank 2...Pure water supply vibrator 3...Dispersion plate 4...Overflow tank 5 ・ 6 ・ 7 ・ 8 ・ 9 ・ 10 ・ 11 ・ l 2 ・ 13 ・ 14 ・ l 5 ・l 6 ・・Drainage pipe, board, cassette, basket, robot arm, robot, valve, foam removal tank, foam discharge pipe, foam removal box, pure water heating unit, intermediate tank

Claims (1)

【特許請求の範囲】[Claims] 純水槽から基板を微低速で引き上げて乾かす純水引き上
げ乾燥装置において、純水槽に供給する純水中の泡を除
去する機能を備えたことを特徴とする純水引き上げ乾燥
装置。
A deionized water pulling and drying device for drying a substrate by pulling it up at a very low speed from a deionized water tank, characterized in that the deionized water pulling and drying device is equipped with a function of removing bubbles from the pure water supplied to the deionized water tank.
JP32343889A 1989-12-13 1989-12-13 Apparatus for lifting out of pure water and drying Pending JPH03184338A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32343889A JPH03184338A (en) 1989-12-13 1989-12-13 Apparatus for lifting out of pure water and drying

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32343889A JPH03184338A (en) 1989-12-13 1989-12-13 Apparatus for lifting out of pure water and drying

Publications (1)

Publication Number Publication Date
JPH03184338A true JPH03184338A (en) 1991-08-12

Family

ID=18154674

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32343889A Pending JPH03184338A (en) 1989-12-13 1989-12-13 Apparatus for lifting out of pure water and drying

Country Status (1)

Country Link
JP (1) JPH03184338A (en)

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