JPH03183678A - Method for plating ceramics - Google Patents
Method for plating ceramicsInfo
- Publication number
- JPH03183678A JPH03183678A JP32329789A JP32329789A JPH03183678A JP H03183678 A JPH03183678 A JP H03183678A JP 32329789 A JP32329789 A JP 32329789A JP 32329789 A JP32329789 A JP 32329789A JP H03183678 A JPH03183678 A JP H03183678A
- Authority
- JP
- Japan
- Prior art keywords
- ceramics
- aluminum
- ceramic
- aqueous solution
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 66
- 238000007747 plating Methods 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims description 39
- 238000007772 electroless plating Methods 0.000 claims abstract description 23
- 238000004506 ultrasonic cleaning Methods 0.000 claims abstract description 18
- 238000010438 heat treatment Methods 0.000 claims abstract description 14
- 239000003607 modifier Substances 0.000 claims abstract description 14
- 239000003054 catalyst Substances 0.000 claims abstract description 13
- 238000000354 decomposition reaction Methods 0.000 claims abstract description 5
- 239000007864 aqueous solution Substances 0.000 claims description 25
- 229910052782 aluminium Inorganic materials 0.000 claims description 22
- -1 aluminum compound Chemical class 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 8
- 150000007524 organic acids Chemical class 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 7
- 238000000576 coating method Methods 0.000 abstract description 7
- 239000002253 acid Substances 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 25
- 238000001035 drying Methods 0.000 description 10
- 238000005530 etching Methods 0.000 description 10
- 238000003618 dip coating Methods 0.000 description 8
- 238000011282 treatment Methods 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 3
- ZCLVNIZJEKLGFA-UHFFFAOYSA-H bis(4,5-dioxo-1,3,2-dioxalumolan-2-yl) oxalate Chemical compound [Al+3].[Al+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O ZCLVNIZJEKLGFA-UHFFFAOYSA-H 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000004310 lactic acid Substances 0.000 description 3
- 235000014655 lactic acid Nutrition 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- VXYADVIJALMOEQ-UHFFFAOYSA-K tris(lactato)aluminium Chemical compound CC(O)C(=O)O[Al](OC(=O)C(C)O)OC(=O)C(C)O VXYADVIJALMOEQ-UHFFFAOYSA-K 0.000 description 3
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 2
- ZUGAOYSWHHGDJY-UHFFFAOYSA-K 5-hydroxy-2,8,9-trioxa-1-aluminabicyclo[3.3.2]decane-3,7,10-trione Chemical compound [Al+3].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O ZUGAOYSWHHGDJY-UHFFFAOYSA-K 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- HDYRYUINDGQKMC-UHFFFAOYSA-M acetyloxyaluminum;dihydrate Chemical compound O.O.CC(=O)O[Al] HDYRYUINDGQKMC-UHFFFAOYSA-M 0.000 description 2
- 150000001339 alkali metal compounds Chemical class 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 229940009827 aluminum acetate Drugs 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- WJQZZLQMLJPKQH-UHFFFAOYSA-N 2,4-dichloro-6-methylphenol Chemical compound CC1=CC(Cl)=CC(Cl)=C1O WJQZZLQMLJPKQH-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- HSEYYGFJBLWFGD-UHFFFAOYSA-N 4-methylsulfanyl-2-[(2-methylsulfanylpyridine-3-carbonyl)amino]butanoic acid Chemical compound CSCCC(C(O)=O)NC(=O)C1=CC=CN=C1SC HSEYYGFJBLWFGD-UHFFFAOYSA-N 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- MTEWCUZXTGXLQX-AHUNZLEGSA-H [Al+3].[Al+3].[O-]C(=O)\C=C/C([O-])=O.[O-]C(=O)\C=C/C([O-])=O.[O-]C(=O)\C=C/C([O-])=O Chemical compound [Al+3].[Al+3].[O-]C(=O)\C=C/C([O-])=O.[O-]C(=O)\C=C/C([O-])=O.[O-]C(=O)\C=C/C([O-])=O MTEWCUZXTGXLQX-AHUNZLEGSA-H 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- MJWPFSQVORELDX-UHFFFAOYSA-K aluminium formate Chemical compound [Al+3].[O-]C=O.[O-]C=O.[O-]C=O MJWPFSQVORELDX-UHFFFAOYSA-K 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- GQSZLMMXKNYCTP-UHFFFAOYSA-K aluminum;2-carboxyphenolate Chemical compound [Al+3].OC1=CC=CC=C1C([O-])=O.OC1=CC=CC=C1C([O-])=O.OC1=CC=CC=C1C([O-])=O GQSZLMMXKNYCTP-UHFFFAOYSA-K 0.000 description 1
- DMGNPLVEZUUCBT-UHFFFAOYSA-K aluminum;propanoate Chemical compound [Al+3].CCC([O-])=O.CCC([O-])=O.CCC([O-])=O DMGNPLVEZUUCBT-UHFFFAOYSA-K 0.000 description 1
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 description 1
- XWTXZJITNNRDLC-UHFFFAOYSA-K bis[(2-hydroxyacetyl)oxy]alumanyl 2-hydroxyacetate Chemical compound [Al+3].OCC([O-])=O.OCC([O-])=O.OCC([O-])=O XWTXZJITNNRDLC-UHFFFAOYSA-K 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- NAUHBXFHKWSIPS-UHFFFAOYSA-H dialuminum;butanedioate Chemical compound [Al+3].[Al+3].[O-]C(=O)CCC([O-])=O.[O-]C(=O)CCC([O-])=O.[O-]C(=O)CCC([O-])=O NAUHBXFHKWSIPS-UHFFFAOYSA-H 0.000 description 1
- GSDVGWFPDRNJGY-UHFFFAOYSA-H dialuminum;propanedioate Chemical compound [Al+3].[Al+3].[O-]C(=O)CC([O-])=O.[O-]C(=O)CC([O-])=O.[O-]C(=O)CC([O-])=O GSDVGWFPDRNJGY-UHFFFAOYSA-H 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 235000003642 hunger Nutrition 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 229920002523 polyethylene Glycol 1000 Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000037351 starvation Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
Abstract
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、セラミックスへのめっき処理方法に関する。[Detailed description of the invention] Industrial applications The present invention relates to a method for plating ceramics.
従来の技術及びその問題点
セラミックス上にめっきを行う技術としては、各挿の方
法が知られており、一般的な工程としては、洗浄、エツ
チング、触媒付与、活性化、及び無電解めっきを順次行
なう方法がある。Conventional techniques and their problems Various methods of plating are known as techniques for plating on ceramics, and the general steps include cleaning, etching, catalyst application, activation, and electroless plating in sequence. There is a way to do it.
上記工程の中でエツチング処理は、セラミックス表面を
化学的に侵食することにより凹凸を形成し、この凹凸に
よるアンカー効果によってセラミックスと無電解めっき
皮膜との密着性を向上させるものである。エツチング処
理としては従来、フッ酸あるいはフッ化アンモニア水溶
液に浸漬する方法、アルカリ金属化合物の水溶液に浸漬
後、乾燥することにより表面にアルカリ金属化合物を付
着させた後、アルカリ金属の融点以上に加熱する方法等
がある(例えば特開昭60−16886号公報)。しか
しながら、これらのエツチング方法で形成される凹凸に
よるアンカー効果だけではセラミックスと無電解めっき
皮膜との密着性の向上に限界がある。そのため、従来か
らのセラミックスをエツチングした後無電解めっきを行
う方法では、セラミックスと無電解めっき皮膜との密着
性について実用に耐えるだけの強度を得ることが困難で
あった。また、エツチングによりセラミックスの物性低
下が問題になる可能性もある。Among the above steps, the etching treatment chemically erodes the surface of the ceramic to form irregularities, and the anchoring effect of the irregularities improves the adhesion between the ceramic and the electroless plated film. Conventional etching treatments include immersion in an aqueous solution of hydrofluoric acid or ammonium fluoride, or immersion in an aqueous solution of an alkali metal compound, drying to adhere the alkali metal compound to the surface, and then heating to a temperature above the melting point of the alkali metal. There are various methods (for example, Japanese Patent Laid-Open No. 16886/1986). However, there is a limit to the improvement in the adhesion between ceramics and electroless plating films only by the anchoring effect due to the unevenness formed by these etching methods. Therefore, in the conventional method of etching ceramics and then electroless plating, it is difficult to obtain a strength sufficient for practical use in terms of adhesion between the ceramics and the electroless plating film. Furthermore, etching may cause a problem of deterioration of the physical properties of ceramics.
また、エツチング処理することなく、セラミックスを表
面改質することにより、無電解めっき皮膜の密着性を向
上させる技術が知られている。これは、バインダー(ガ
ラス、ガラスと酸化物の混合物)、および、ビヒクル(
揮発性物質、非揮発性物質)を含有するペーストをセラ
ミックス上にスクリーン印刷し、500〜1000°C
で焼き付けることにより表面改質を施し、次いで、触媒
付与、無電解めっきを行う方法である。この方法では、
ペーストの焼き付けにおいて、まず、揮発性の溶剤が蒸
発した後、樹脂成分が燃焼し、更に温度が上昇するとバ
インダーが溶融してセラミックスと反応する。このよう
にペーストを焼き付けることにより改質を行ったセラミ
ックス上には、5μm程度のガラス質の膜が形成され、
このガラス質表面の凹凸を利用することにより無電解め
っき皮膜の密着性は向上する。しかしながら、この方法
では、セラミックスとめっき皮膜との間にガラス質の層
が存在することになるため、めっき物の性質はガラス質
層の影響を受け、セラミックスの特性が十分発揮されな
い可能性がある。Furthermore, a technique is known in which the adhesion of an electroless plating film is improved by surface-modifying ceramics without etching. It consists of a binder (glass, a mixture of glass and oxides) and a vehicle (
A paste containing volatile substances and non-volatile substances is screen printed on ceramics and heated at 500 to 1000°C.
This is a method in which the surface is modified by baking, followed by catalyst application and electroless plating. in this way,
In baking the paste, first the volatile solvent evaporates, then the resin component burns, and as the temperature rises further, the binder melts and reacts with the ceramic. A glassy film of about 5 μm is formed on the ceramics modified by baking the paste in this way.
By utilizing the unevenness of the glassy surface, the adhesion of the electroless plating film is improved. However, in this method, a glassy layer exists between the ceramic and the plating film, so the properties of the plated product are affected by the glassy layer, and the characteristics of the ceramic may not be fully demonstrated. .
問題点を解決するための手段
本発明者は、上記した如き問題点に鑑みて、セラミック
ス上に、セラミックスの物性の低下を生じることなく、
良好な密着性を有するめっき皮膜を形成し得る方法を見
出すべく、鋭意研究を重ねてきた。その結果、セラミッ
クス上に、アルミニウム化合物を含有する表面改質剤を
塗布した後、アルミニウム化合物の分解温度以上に加熱
することによって、セラミックス表面に0.5μm程度
以下の薄い膜厚の密着性の良い改質層が形成され、この
上に無電解めっきを行うことによって、めっき皮膜はセ
ラミックスに対して優れた密着性を有するものとなり、
また、改質層の膜厚が非常に薄いことから、セラミック
スの特性を充分に生かすことが可能であることを見出し
た。Means for Solving the Problems In view of the above-mentioned problems, the inventors of the present invention have developed a method for solving the problems on ceramics without deteriorating the physical properties of the ceramics.
We have been conducting extensive research to find a method that can form a plating film with good adhesion. As a result, by applying a surface modifier containing an aluminum compound onto the ceramic and then heating it above the decomposition temperature of the aluminum compound, a thin film with a thickness of about 0.5 μm or less and good adhesion can be created on the ceramic surface. By forming a modified layer and performing electroless plating on it, the plating film has excellent adhesion to ceramics.
We also discovered that since the thickness of the modified layer is very thin, it is possible to fully utilize the characteristics of ceramics.
即ち、本発明は、有機アルミニウム化合物を含有する水
溶液、有機アルミニウム化合物及び無機アルミニウム化
合物を含有する水溶液、又は無機アルミニウム化合物及
び有機酸を含有する水溶液からなる表面改質剤をセラミ
ックス上に塗布した後、アルミニウム化合物の分解温度
以上に加熱し、次いで、触媒付与及び無電解めっきを行
なうことを特徴とするセラミックスへのめっき処理方法
に係わる。That is, the present invention provides a method for applying a surface modifier consisting of an aqueous solution containing an organic aluminum compound, an aqueous solution containing an organic aluminum compound and an inorganic aluminum compound, or an aqueous solution containing an inorganic aluminum compound and an organic acid onto a ceramic. , relates to a method for plating ceramics, which comprises heating to a temperature above the decomposition temperature of an aluminum compound, followed by application of a catalyst and electroless plating.
本発明方法は、各種のセラミックス材料に対して適用す
ることが可能であり、例えば、アルミナ、窒化ケイ素、
窒化アルミニウム等に適用できる。The method of the present invention can be applied to various ceramic materials, such as alumina, silicon nitride,
Applicable to aluminum nitride, etc.
本発明で用いる表面改質剤は、有機アルミニウム化合物
を含有する水溶液、有機アルミニウム化合物及び無機ア
ルミニウム化合物を含有する水溶液、又は無機アルミニ
ウム化合物及び有機酸を含有する水溶液のいずれかであ
る。The surface modifier used in the present invention is either an aqueous solution containing an organoaluminum compound, an aqueous solution containing an organoaluminum compound and an inorganic aluminum compound, or an aqueous solution containing an inorganic aluminum compound and an organic acid.
有機アルミニウム化合物含有水溶液では、有機アルミニ
ウム化合物の配合量は、50〜700g/Q程度が適当
であり、100〜500g/Q程度が好ましい。有機ア
ルミニウム化合物及び無機アルミニウム化合物を含有す
る水溶液では、有機アルミニウム化合物の配合量は、2
0〜500g/Q程度が適当てあり、50〜400 g
/Q程度が好ましく、無機アルミニウム化合物の配合量
は50〜400g/Q程度が適当であり、80〜300
g/Q程度が好ましい。無機アルミニウム化合物及び有
機酸を含有する水溶液ては、無機アルミニウム化合物の
配合量は、50〜450g/Q程度が適当であり、10
0〜350 g/9程度が好ましい。In the organoaluminum compound-containing aqueous solution, the amount of the organoaluminum compound blended is suitably about 50 to 700 g/Q, preferably about 100 to 500 g/Q. In an aqueous solution containing an organoaluminum compound and an inorganic aluminum compound, the amount of the organoaluminum compound is 2
Approximately 0~500g/Q is suitable, 50~400g
/Q is preferable, and the appropriate amount of the inorganic aluminum compound is about 50 to 400 g/Q, and 80 to 300 g/Q.
About g/Q is preferable. For an aqueous solution containing an inorganic aluminum compound and an organic acid, the appropriate amount of the inorganic aluminum compound is about 50 to 450 g/Q;
Approximately 0 to 350 g/9 is preferable.
本発明において、表面改質剤に配合する有機アルミニウ
ム化合物としては、ギ酸アルミニウム、酢酸アルミニウ
ム、プロピオン酸アルミニウム等のモノカルボン酸アル
ミニウム、シュウ酸アルミニウム、コハク酸アルミニウ
ム、マロン酸アルミニウム、マレイン酸アルミニウム等
のジカルボン酸アルミニウム、グリコール酸アルミニウ
ム、乳酸アルミニウム、サリチル酸アルミニウム、酒石
酸アルミニウム、クエン酸アルミニウム等のオキシカル
ボン酸アルミニウム等を例示でき、これらを単独又はl
屋台して用いることができる。無影アルミニウム化合物
としては、硫酸アルミニウム、硝酸アルミニウム、塩化
アルミニウム、硫酸アルミニウムアンモニウム、水酸化
アルミニウム等ヲ例示できこれらを単独又は混合して用
いることができる。有機酸としては、ギ酸、酢酸、プロ
ピオン酸、酪酸、吉草酸、アクリル酸等のモノカルボン
酸、シュウ酸、コハク酸、マロン酸、マレイン酸、イタ
コン酸、フタル酸等のジカルボン酸、グリコール酸、乳
酸、サリチル酸、酒石酸、クエン酸等のオキシカルボン
酸等を挙げることができ、単独又は混合して用いること
ができる。In the present invention, organic aluminum compounds to be added to the surface modifier include aluminum monocarboxylate such as aluminum formate, aluminum acetate, aluminum propionate, aluminum oxalate, aluminum succinate, aluminum malonate, aluminum maleate, etc. Examples include aluminum oxycarboxylate such as aluminum dicarboxylate, aluminum glycolate, aluminum lactate, aluminum salicylate, aluminum tartrate, and aluminum citrate.
It can be used as a food stall. Examples of the shadowless aluminum compound include aluminum sulfate, aluminum nitrate, aluminum chloride, aluminum ammonium sulfate, and aluminum hydroxide, which may be used alone or in combination. Examples of organic acids include monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, and acrylic acid; dicarboxylic acids such as oxalic acid, succinic acid, malonic acid, maleic acid, itaconic acid, and phthalic acid; glycolic acid; Examples include oxycarboxylic acids such as lactic acid, salicylic acid, tartaric acid, and citric acid, which can be used alone or in combination.
表面改質剤には、更に、必要に応じて、ノニオン性界面
滑性剤を添加することによって、セラミックス上への塗
布の均一性を向上させることができる。例えば、ポリエ
チレングリコール、ポリプロピレングリコール等にエチ
レンオキサイドを付加させたもの等を用いることができ
、配合量は、0.3〜10g/Q程度の範囲が適当であ
る。The uniformity of application onto ceramics can be improved by further adding a nonionic interfacial lubricant to the surface modifier, if necessary. For example, polyethylene glycol, polypropylene glycol, etc. to which ethylene oxide is added can be used, and the appropriate blending amount is in the range of about 0.3 to 10 g/Q.
本発明方法では、常法に従って、セラミックスを清浄化
した後、表面改質剤の塗布を行う。清浄化方法は、使用
するセラミックスの種類に応じて適宜決定すればよく、
脱脂、超音波洗浄等の処理を常法に従って行えばよい。In the method of the present invention, a surface modifier is applied after cleaning the ceramic according to a conventional method. The cleaning method should be determined appropriately depending on the type of ceramics used.
Treatments such as degreasing and ultrasonic cleaning may be carried out according to conventional methods.
表面改質剤の塗布方法は、特に限定はなく、スピンコー
ド法、デイツプコーティング法、スプレー法等により行
うことができる。塗布量は特に限定的ではなく、塗布に
よりセラミックス上に付着した改質剤を引き続き熱処理
すればよいが、塗布量を0. 03−0. 6mg/c
m2程度、好ましくは0.04〜0 、4 B/ ca
+2程度の範囲とすることが改質層の密着性の点から好
ましく、このような塗布量の範囲では、通常0.5μm
程度以下の密着性の良好な改質層が形成される。The method of applying the surface modifier is not particularly limited, and can be performed by a spin code method, a dip coating method, a spray method, or the like. The coating amount is not particularly limited, and the modifier attached to the ceramics by coating may be subsequently heat-treated, but the coating amount may be 0. 03-0. 6mg/c
m2 or so, preferably 0.04~0.4 B/ca
It is preferable from the viewpoint of adhesion of the modified layer that the coating amount be in the range of about +2, and in this range of coating amount, the coating amount is usually 0.5 μm.
A modified layer with good adhesion of less than a certain degree is formed.
表面改質剤の塗布後、使用したアルミニウム化合物の分
解温度以上の温度で熱処理することによって、アルミニ
ウム化合物が分解してアルミナとなり、これがセラミッ
クスと結合して改質層が形成される。熱処理温度は60
0〜1400°C程度とすることが好ましく、650〜
1300°C程度とすることがより好ましい。処理時間
は、15〜60分程度とすればよい。After applying the surface modifier, heat treatment is performed at a temperature higher than the decomposition temperature of the aluminum compound used, whereby the aluminum compound decomposes into alumina, which is combined with the ceramic to form a modified layer. Heat treatment temperature is 60
It is preferable to set it as about 0-1400 degrees Celsius, and it is 650-
More preferably, the temperature is about 1300°C. The processing time may be about 15 to 60 minutes.
熱処理終了後、洗浄し、無電解めっき用の触媒付与を行
う。触媒付与方法として、例えば公知の方法であるセン
シタイザ−/アクセレーター法、キャタリスト/アクセ
レーター法等を採用すればよい。After the heat treatment is completed, it is washed and a catalyst for electroless plating is applied. As a catalyst application method, for example, a known method such as a sensitizer/accelerator method or a catalyst/accelerator method may be employed.
尚、熱処理終了後、触媒付与前に超音波洗浄を行うこと
によって、めっき皮膜の密着性をより向上させることが
できる。超音波洗浄は常法に従えばよく、例えば、25
〜65°C程度の水中で10〜60分程度処理すればよ
い。Note that the adhesion of the plating film can be further improved by performing ultrasonic cleaning after the heat treatment and before applying the catalyst. Ultrasonic cleaning can be carried out according to the usual method, for example, 25
What is necessary is just to process in water of about 65 degrees Celsius for about 10 to 60 minutes.
触媒付与後、水洗を行い、次いで無電解めっきを行う。After applying the catalyst, washing with water is performed, and then electroless plating is performed.
無電解めっき液としては、公知の無電解めっき液、例え
ば、無電解銅めっき液、無電解ニッケルめっき液などを
いずれも用いることができ、処理条件は常法に従えばよ
い。As the electroless plating solution, any known electroless plating solution such as an electroless copper plating solution or an electroless nickel plating solution can be used, and the processing conditions may be according to a conventional method.
無電解めっき処理を行った後、必要に応じて電気めっき
を行うことが可能である。After performing the electroless plating treatment, it is possible to perform electroplating as necessary.
発明の効果
本発明方法によれば、セラミ・ノクスの特性の低下を生
じることなく、セラミックス上に良好な密着性を有する
めっき皮膜を形成することができ、例えば、セラミック
ス上に電気回路を形成する方法等として極めて有用であ
る。Effects of the Invention According to the method of the present invention, a plating film with good adhesion can be formed on ceramics without deteriorating the properties of ceramic nox. For example, it is possible to form an electric circuit on ceramics. This is extremely useful as a method, etc.
実施例 以下実施例を示して、本発明の詳細な説明する。Example The present invention will be described in detail below with reference to Examples.
実施例1
超音波洗浄により清浄化した96%α−アルミナセラミ
ックス基板(2X2インチ)上に、シュウ酸アルミニウ
ム200g/Qを含有する水溶7夜をデイツプコート法
により塗布した。乾燥後、800℃で30分間熱処理し
た。Example 1 An aqueous solution containing 200 g/Q of aluminum oxalate was applied by dip coating onto a 96% α-alumina ceramic substrate (2×2 inches) that had been cleaned by ultrasonic cleaning. After drying, it was heat-treated at 800°C for 30 minutes.
次いで、50°Cの水中で、45KHzで15分間超音
波洗浄を行った後、塩化パラジウム0.64g/9、塩
化第一スズ50g/Q及び36%塩酸350mQ/Qを
含有する触媒水溶液に40°Cで5分間浸漬し、水洗後
、98%硫酸100mQ/Qの水溶液に40℃で4分間
浸漬した。Next, after performing ultrasonic cleaning in water at 50°C for 15 minutes at 45 KHz, 40° C. It was immersed at 40°C for 5 minutes, washed with water, and then immersed in an aqueous solution of 100 mQ/Q of 98% sulfuric acid at 40°C for 4 minutes.
水洗後更に、無電解ニッケルめっき液(商標:トップニ
ジロンN−4フ、奥野製薬玉業■製)に90°Cで20
分間浸漬することによって、3μmのニッケルめっき皮
膜が形成された。得られためっき皮膜の密着強度を下記
の方法で測定した。結果を第1表に示す。After washing with water, apply an electroless nickel plating solution (trademark: Top Nijiron N-4F, manufactured by Okuno Seiyaku Gyokugyo) for 20 minutes at 90°C.
By dipping for minutes, a nickel plating film of 3 μm was formed. The adhesion strength of the obtained plating film was measured by the following method. The results are shown in Table 1.
密着強度測定方法
無電解めっき後、300 ’Cで30分間熱処理し、室
温放置後、エツチングレジストをスクリーン印刷により
2X2mtnのパターンに印刷した。乾燥後、無電解め
っき皮膜をエツチングし、2X2mmのパターンを形成
した。このパターン上に、直径0.64mmのスズめっ
き銅線をL字状にハンダ付けし、引っ張り試験機(■品
性製作所製オートグラフ5D−100−C)を用いてセ
ラミックスに対して乗直に引っ張り、密着強度を測定し
た。Method for Measuring Adhesion Strength After electroless plating, the sample was heat treated at 300'C for 30 minutes, left to stand at room temperature, and etched resist was printed in a 2x2mtn pattern by screen printing. After drying, the electroless plated film was etched to form a 2×2 mm pattern. On this pattern, a tin-plated copper wire with a diameter of 0.64 mm was soldered in an L-shape, and tested directly against the ceramic using a tensile tester (Autograph 5D-100-C manufactured by Konsei Seisakusho). The adhesive strength was measured by pulling.
実施例2
実施例1と同じセラミックス上に、酢酸アルミニウム5
00g/Qを含有する水溶液をデイツプコート法により
塗布した。乾燥後、700°Cで30分間熱処理した。Example 2 Aluminum acetate 5 was added on the same ceramic as in Example 1.
An aqueous solution containing 00 g/Q was applied by dip coating. After drying, it was heat treated at 700°C for 30 minutes.
超音波洗浄以降を実施例1と同様に処理した。セラミッ
クスと無電解めっき皮膜との密着強度を第1表に示す。The process after ultrasonic cleaning was carried out in the same manner as in Example 1. Table 1 shows the adhesion strength between the ceramic and the electroless plating film.
実施例3
実施例1と同じセラミックス上に、乳酸アルミニウム3
00g/Qを含有する水溶液をデイツプコート法により
塗布した。乾燥後、750℃で30分間熱処理した。超
音波洗浄以降を実施例1と同様に処理した。セラミック
スと無電解めっき皮膜との密着強度を第1表に示す。Example 3 Aluminum lactate 3 was deposited on the same ceramic as in Example 1.
An aqueous solution containing 00 g/Q was applied by dip coating. After drying, it was heat-treated at 750°C for 30 minutes. The process after ultrasonic cleaning was carried out in the same manner as in Example 1. Table 1 shows the adhesion strength between the ceramic and the electroless plating film.
実施例4
実施例1と同じセラミックス上に、乳酸アルミニウム2
00g/Q、硫酸アルミニウム100g/Qを含有する
水溶液をデイツプコート法により塗布した。乾燥後、8
00℃で30分間熱処理した。超音波洗浄以降を実施例
1と同様に処理したセラミックスと無電解めっき皮膜と
の密着強度を第1表に示す。Example 4 Aluminum lactate 2 was placed on the same ceramic as in Example 1.
An aqueous solution containing 00 g/Q and 100 g/Q of aluminum sulfate was applied by dip coating. After drying, 8
Heat treatment was performed at 00°C for 30 minutes. Table 1 shows the adhesion strength between the electroless plated film and the ceramics treated in the same manner as in Example 1 after ultrasonic cleaning.
実施例5
実施例1と同じセラミックス上に、硫酸アルミニウム3
00g/Q、乳酸500g/Qを含有する水溶液をデイ
ツプコート法により塗布した。乾燥後、700°Cで3
0分間熱処理した。超音波洗浄以降を実施例1と同様に
処理した。セラミックスと無電解めっき皮膜との密着強
度を第1表に示す。Example 5 Aluminum sulfate 3 was deposited on the same ceramic as in Example 1.
An aqueous solution containing 00 g/Q and 500 g/Q of lactic acid was applied by dip coating. After drying, at 700°C
Heat treatment was performed for 0 minutes. The process after ultrasonic cleaning was carried out in the same manner as in Example 1. Table 1 shows the adhesion strength between the ceramic and the electroless plating film.
実施例6
実施ff7!l 1と同じセラミックス上に、クエン酸
アルミニウム50 g/Q、シュウ酸アルミニウム20
0g/Q、ノニオン性界面活性剤(PEG−1000)
Ig/Qを含有する水溶液をデイツプコート法により塗
布した。乾燥後、1200°Cで30分間熱処理した。Example 6 Implementation ff7! l On the same ceramic as 1, aluminum citrate 50 g/Q, aluminum oxalate 20
0g/Q, nonionic surfactant (PEG-1000)
An aqueous solution containing Ig/Q was applied by dip coating. After drying, it was heat treated at 1200°C for 30 minutes.
超音波洗浄以降を実施例1と同様に処理した。セラミッ
クスと無電解めっき皮膜との密着強度を第1表に示す。The process after ultrasonic cleaning was carried out in the same manner as in Example 1. Table 1 shows the adhesion strength between the ceramic and the electroless plating film.
実施Ff117
実施例1と同じセラミックス上に、硝酸アルミニウム1
00g/Q、酢酸100g/(2,乳酸100g/i2
を含有する水溶液をデイツプコート法により塗布した。Implementation Ff117 On the same ceramic as in Example 1, aluminum nitrate 1
00g/Q, acetic acid 100g/(2, lactic acid 100g/i2
An aqueous solution containing the above was applied by dip coating.
乾燥後、1100℃で30分間熱処理した。超音波洗浄
以降を実施ff11と同様に処理した。セラミックスと
無電解めっき皮膜との密着強度を第1表に示す。After drying, it was heat-treated at 1100°C for 30 minutes. The process after ultrasonic cleaning was carried out in the same manner as in implementation ff11. Table 1 shows the adhesion strength between the ceramic and the electroless plating film.
邦
表
比較例1
実施例1と同じセラミックスに、表面改質処理を施さす
に、超音波洗浄後、触媒水溶液に浸漬、以降実施例1と
同様に処理した。セラミックスと無電解めっき皮膜との
密着強度を第2表に示す。Comparative Example 1 The same ceramic as in Example 1 was subjected to a surface modification treatment. After ultrasonic cleaning, the ceramic was immersed in an aqueous catalyst solution, and then treated in the same manner as in Example 1. Table 2 shows the adhesion strength between the ceramic and the electroless plated film.
比較例2
実施例1と同じセラミックスを、フッ化アンモニア12
0g/Q、塩化ナトリウム80 g / Qを含有する
エツチング1夜に50°Cで5分間浸漬し、更に超音波
洗浄以降を実施例1と同様に処理した。Comparative Example 2 The same ceramic as in Example 1 was treated with 12% ammonia fluoride.
Etching containing 0 g/Q and 80 g/Q of sodium chloride was immersed overnight at 50°C for 5 minutes, and the process after ultrasonic cleaning was carried out in the same manner as in Example 1.
セラミックスと無電解めっき皮膜との密着強度を第2表
に示す。Table 2 shows the adhesion strength between the ceramic and the electroless plated film.
比較例3
実施例1と同じセラミックスを、10%フッ酸水溶液に
50°Cで10分間浸漬し、更に超音波洗浄以降を実施
例1と同様に処理した。セラミックスと飢電解めっき皮
膜との密着強度を第2表に示す。Comparative Example 3 The same ceramics as in Example 1 were immersed in a 10% hydrofluoric acid aqueous solution at 50°C for 10 minutes, and were further treated in the same manner as in Example 1 after ultrasonic cleaning. Table 2 shows the adhesion strength between the ceramic and the starvation electroplating film.
比較例4
実施例1と同じセラミックスを、水酸化ナトリウム10
00g/Qを含有する水溶液に60℃で5分間浸漬し、
乾燥後、450℃で5分間熱処理することによりエツチ
ング処理を行った。更に超音波洗浄以降を実施例1と同
様に処理した。セラミックスと無電解めっき皮膜との密
着強度を第2表に示す。Comparative Example 4 The same ceramics as Example 1 were treated with 10% sodium hydroxide.
Immersed in an aqueous solution containing 00g/Q at 60°C for 5 minutes,
After drying, etching treatment was carried out by heat treatment at 450° C. for 5 minutes. Furthermore, the process after ultrasonic cleaning was carried out in the same manner as in Example 1. Table 2 shows the adhesion strength between the ceramic and the electroless plated film.
比較例5
実施例1と同じセラミックスを、水酸化ナトリウム80
0g/Q及び水酸化リチウム200g/Qを含有する水
溶液に70℃で5分間浸漬し、乾燥後、450°Cで1
0分間熱処理することによりエツチング処理を行った。Comparative Example 5 The same ceramics as in Example 1 were treated with 80% sodium hydroxide.
It was immersed in an aqueous solution containing 0g/Q and 200g/Q of lithium hydroxide at 70°C for 5 minutes, dried, and then heated at 450°C for 1
Etching treatment was performed by heat treatment for 0 minutes.
更に超音波洗浄以降を実施例1と同様に処理した。セラ
ミックスと無電解めっき皮膜との密着強度を第2表に示
す。Furthermore, the process after ultrasonic cleaning was carried out in the same manner as in Example 1. Table 2 shows the adhesion strength between the ceramic and the electroless plated film.
Claims (2)
アルミニウム化合物及び無機アルミニウム化合物を含有
する水溶液、又は無機アルミニウム化合物及び有機酸を
含有する水溶液からなる表面改質剤をセラミックス上に
塗布した後、アルミニウム化合物の分解温度以上に加熱
し、次いで、触媒付与及び無電解めっきを行なうことを
特徴とするセラミックスへのめっき処理方法。(1) After applying a surface modifier consisting of an aqueous solution containing an organoaluminum compound, an aqueous solution containing an organoaluminum compound and an inorganic aluminum compound, or an aqueous solution containing an inorganic aluminum compound and an organic acid onto ceramics, the aluminum compound 1. A method for plating ceramics, which comprises heating above the decomposition temperature of , followed by applying a catalyst and electroless plating.
行なうことを特徴とする請求項(1)に記載のセラミッ
クスへのめっき処理方法。(2) The method for plating ceramics according to claim (1), wherein ultrasonic cleaning is performed after heating the surface modifier and before applying the catalyst.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1323297A JPH0647514B2 (en) | 1989-12-12 | 1989-12-12 | Method for plating ceramics |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1323297A JPH0647514B2 (en) | 1989-12-12 | 1989-12-12 | Method for plating ceramics |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03183678A true JPH03183678A (en) | 1991-08-09 |
JPH0647514B2 JPH0647514B2 (en) | 1994-06-22 |
Family
ID=18153214
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1323297A Expired - Fee Related JPH0647514B2 (en) | 1989-12-12 | 1989-12-12 | Method for plating ceramics |
Country Status (1)
Country | Link |
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JP (1) | JPH0647514B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0747506A1 (en) * | 1995-06-05 | 1996-12-11 | International Business Machines Corporation | Plating on nonmetallic disks |
JP2013001936A (en) * | 2011-06-15 | 2013-01-07 | Adeka Corp | Pretreatment method for electroless plating |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5687658A (en) * | 1979-12-17 | 1981-07-16 | Tokyo Mekki:Kk | Method of making electroless plating on nonconductor surface |
JPS5878491A (en) * | 1981-11-05 | 1983-05-12 | セイコーエプソン株式会社 | Plated insulator substrate and method of producing same |
JPS60166287A (en) * | 1984-02-07 | 1985-08-29 | 日立化成工業株式会社 | Ceramic body for metal coating |
-
1989
- 1989-12-12 JP JP1323297A patent/JPH0647514B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5687658A (en) * | 1979-12-17 | 1981-07-16 | Tokyo Mekki:Kk | Method of making electroless plating on nonconductor surface |
JPS5878491A (en) * | 1981-11-05 | 1983-05-12 | セイコーエプソン株式会社 | Plated insulator substrate and method of producing same |
JPS60166287A (en) * | 1984-02-07 | 1985-08-29 | 日立化成工業株式会社 | Ceramic body for metal coating |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0747506A1 (en) * | 1995-06-05 | 1996-12-11 | International Business Machines Corporation | Plating on nonmetallic disks |
US5871810A (en) * | 1995-06-05 | 1999-02-16 | International Business Machines Corporation | Plating on nonmetallic disks |
KR100235087B1 (en) * | 1995-06-05 | 1999-12-15 | 포만 제프리 엘 | Method for plating on nonmetallic disks and recording-reproducing apparatus using it |
US6183828B1 (en) | 1995-06-05 | 2001-02-06 | International Business Machines Corporation | Plating on nonmetallic disks |
JP2013001936A (en) * | 2011-06-15 | 2013-01-07 | Adeka Corp | Pretreatment method for electroless plating |
Also Published As
Publication number | Publication date |
---|---|
JPH0647514B2 (en) | 1994-06-22 |
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