JPH03177060A - Lead frame for semiconductor device - Google Patents

Lead frame for semiconductor device

Info

Publication number
JPH03177060A
JPH03177060A JP31623189A JP31623189A JPH03177060A JP H03177060 A JPH03177060 A JP H03177060A JP 31623189 A JP31623189 A JP 31623189A JP 31623189 A JP31623189 A JP 31623189A JP H03177060 A JPH03177060 A JP H03177060A
Authority
JP
Japan
Prior art keywords
die pad
semiconductor element
lead frame
protrusion
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP31623189A
Other languages
Japanese (ja)
Inventor
Yoji Nagabuchi
長渕 洋二
Yoshiaki Ogawa
義明 小川
Hiroyuki Noguchi
博之 野口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP31623189A priority Critical patent/JPH03177060A/en
Publication of JPH03177060A publication Critical patent/JPH03177060A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent crack of a semiconductor element from occurring and improve reliability in an outer lead bending process by providing a reinforcing fixing part at a die pad part where the semiconductor element of a lead frame is adhered. CONSTITUTION:In a case where a mold resin 4 on the surface of a lead frame 1 are removed. a protrusion 8 corresponding to the reinforcing fixing part is provided at the tip part within a mold resin 4 at a die pad part 5. Then, the protrusion 8 has the same thickness as the die pad part 5, is provided with a rectangular shape a having a horizontal width L1 which is longer than the width in horizontal direction of the die pad 5, and is connected to the die pad part 5 through a connection part 9 with a shorter width l than the horizontal width of this rectangular shape a. Thus, in a process for bending an outer lead 7 of the semiconductor device, the die pad 6 is pulled toward the outside and is subjected to stress. However, since a protrusion 8 is provided at the die pad 5, the protrusion 8 can be resistant at the mold resin 4 even if the die pad 5 is subjected to stress so that the stress cannot be centered to the semiconductor element 2, thus reducing the possibility that a crack may be produced at the semiconductor element 2 drastically.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は、半導体装置のパッケージ、特にトランジス
タのパッケージの半導体装置用リードフレームに関する
ものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a lead frame for a semiconductor device package, particularly a transistor package.

〔従来の技術〕[Conventional technology]

半導体装置のパッケージの多くは、電気的配線及び半導
体素子の搭載のためのリードフレーム。
Most semiconductor device packages include lead frames for mounting electrical wiring and semiconductor elements.

電気的配線のためのボンディングワイヤ及び半導体素子
やボンディングワイヤの保護のためのモールド樹脂から
なっている。
It consists of bonding wires for electrical wiring and molding resin for protecting semiconductor elements and bonding wires.

リードフレームの材料は銅合金または鉄合金が主であり
、プレス打ち抜き加工もしくはエツチング加工を施して
製造され、ボンディングワイヤには直径25μm程度の
金線、モールド樹脂にはエポキシ樹脂が使用されること
が多い。
The main material of the lead frame is copper alloy or iron alloy, and it is manufactured by press punching or etching. Gold wire with a diameter of about 25 μm is used for the bonding wire, and epoxy resin is used for the molding resin. many.

第4図(a)及び(b)は、従来のトランジスタのパッ
ケージの平面図及びB−B線断面図であり、この図はリ
ードフレーム1の表面のモールド樹脂4を取除いた場合
の平面図である。1は3本のリードフレームであり、ボ
ンディングワイヤ3により接続されている。4はモール
ド樹脂であり、3本のリードフレーム1と半導体素子2
がモールド樹脂4内に固定されている。リードフレーム
1において、5はダイパッド、6はインナーリード、7
はアウターリードである。
FIGS. 4(a) and 4(b) are a plan view and a sectional view taken along the line B-B of a conventional transistor package, and this figure is a plan view when the molding resin 4 on the surface of the lead frame 1 is removed. It is. Reference numeral 1 indicates three lead frames, which are connected by bonding wires 3. 4 is a molding resin, which includes three lead frames 1 and a semiconductor element 2.
is fixed in the mold resin 4. In the lead frame 1, 5 is a die pad, 6 is an inner lead, and 7 is a die pad.
is the outer lead.

また、3木のリードフレーム1の内、真中の1本はダイ
パッド5を兼ねており、半導体素子2はダイパッド5の
表面に接着剤13により接着されている。ダイパッド部
5はインナーリード6やアウターリード7の幅より若干
広くなっている。半導体素子2にはベース14とエミッ
タ15の2つの電極があり、それぞれ両側のリードフレ
ーム1ヘボンディングワイヤ3により接続され、コレク
タ16はダイパッド5との接着側にあり、導電性の接着
剤またははんだを介してリードフレーム1へ接続されて
いる。
Further, among the three lead frames 1, the middle one also serves as a die pad 5, and the semiconductor element 2 is bonded to the surface of the die pad 5 with an adhesive 13. The die pad portion 5 is slightly wider than the inner leads 6 and outer leads 7. The semiconductor element 2 has two electrodes, a base 14 and an emitter 15, which are connected to the lead frame 1 on both sides by bonding wires 3, and the collector 16 is on the adhesive side with the die pad 5, and is connected to the lead frame 1 on both sides using a conductive adhesive or solder. It is connected to the lead frame 1 via.

第5図(a)、(b)、(c)、(d)は半導体装置の
組立工程図を示す。半導体装置の組立工程は、まずリー
ドフレーム1のダイパッド5に半導体素子2をはんだま
たはエポキシ樹脂等で接着し、半導体素子2のヘース1
4とエミッタ15の2つの電極とインナーリード6をボ
ンディングワイヤ3で配線し、次にエポキシ樹脂等でモ
ールド4を成形し、最後にアウターリード7をl111
げて完成している。
FIGS. 5(a), (b), (c), and (d) show assembly process diagrams of the semiconductor device. In the assembly process of the semiconductor device, first, the semiconductor element 2 is bonded to the die pad 5 of the lead frame 1 with solder or epoxy resin, and the base 1 of the semiconductor element 2 is bonded to the die pad 5 of the lead frame 1.
4 and the emitter 15 and the inner lead 6 are wired with the bonding wire 3, then a mold 4 is formed with epoxy resin, etc., and finally the outer lead 7 is wired with the l111.
completed.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の半導体装置、特にトランジスタの場合は、ダイパ
ッド5か1方向たけて支えられている上、アウターリー
ト7とつながっているため、アウターリード7を外側へ
引っ張る力に対して抵抗部の対抗力が小さかった。従っ
て、アウターリード7を曲げる工程において、ダイパッ
ド5か外側に引っ張られ、その応力を半導体素子2が受
けるため、例えば第6図に示すように、半導体素子2に
クラック12が入るという問題があった。
In the case of conventional semiconductor devices, especially transistors, the die pad 5 is supported vertically in one direction and is connected to the outer lead 7, so that the force that pulls the outer lead 7 outward is counterforced by the resistive part. It was small. Therefore, in the process of bending the outer lead 7, the die pad 5 is pulled outward and the semiconductor element 2 receives this stress, resulting in the problem that a crack 12 occurs in the semiconductor element 2, as shown in FIG. 6, for example. .

この発明は、このような従来の問題点を解決するために
なされたもので、アウターリード曲げ工程において、半
導体素子2にクラックの発生しない、イ3頼性の高い半
導体装置用リードフレームを提供することを目的として
いる。
This invention was made to solve these conventional problems, and provides a highly reliable lead frame for a semiconductor device that does not cause cracks in the semiconductor element 2 during the outer lead bending process. The purpose is to

(:1mを解決するための手段) この発明は、半導体素子を固着するダイパッド部に補強
固定部を連設し所望のモールド樹脂に固定してなること
を特徴とする半導体装置用リードフレームに係わり、上
記目的を解決しようとするものである。
(Means for solving the problem of 1 m) The present invention relates to a lead frame for a semiconductor device, which is characterized in that a reinforcing fixing part is connected to a die pad part to which a semiconductor element is fixed, and the reinforcing fixing part is fixed to a desired molding resin. , which attempts to solve the above objectives.

〔作用〕[Effect]

この発明による半導体装置用リードフレームは、半導体
素子を固着するダイパッド部に補強固定部を設けたこと
により、ダイパッドがモールド樹脂によってより完全に
固定される。このようなリードフレームを用いれば、ア
ウターリード曲げ工程においてアウターリート方向へ強
く引っ張られてもダイパッドの位置ずれ及び半導体素子
に対する応力の集中が最小限に抑えられ、半導体素子に
クラックか入る可能性は非常に低くなる。
In the lead frame for a semiconductor device according to the present invention, the reinforcing fixing portion is provided in the die pad portion to which the semiconductor element is fixed, so that the die pad is more completely fixed by the molding resin. If such a lead frame is used, even if the outer lead is strongly pulled in the direction of the outer lead during the outer lead bending process, the displacement of the die pad and the concentration of stress on the semiconductor element can be minimized, and the possibility of cracks in the semiconductor element is minimized. becomes very low.

〔実施例〕〔Example〕

第1図は本発明に係わる半導体装置用リードフレームの
1実施例を示す平面図であり、この図はリードフレーム
1の表面のモールド樹脂4を取除いた場合の平面図であ
る。8は補強固定部に相当する突起であり、この突起8
は、ダイパッド部5のモールド樹脂4内の先端部に連設
している。そして、突起8はダイパッド部5と同一厚さ
を有し、グイバット部5の横方向の幅より長い横幅L1
の長方形状aを備え、この長方形状aの横幅L1より短
い幅2の接続部9によりダイパッド部5と接続している
FIG. 1 is a plan view showing one embodiment of a lead frame for a semiconductor device according to the present invention, and this figure is a plan view when the mold resin 4 on the surface of the lead frame 1 is removed. 8 is a protrusion corresponding to the reinforcing fixing part, and this protrusion 8
is connected to the tip of the die pad portion 5 inside the mold resin 4. The protrusion 8 has the same thickness as the die pad part 5, and has a width L1 longer than the width in the lateral direction of the guibat part 5.
It has a rectangular shape a, and is connected to the die pad portion 5 by a connecting portion 9 having a width 2 shorter than the width L1 of the rectangular shape a.

なお、上述の突起以外の他の構成は従来のパッケージと
同一であり、従来例と同一または相当する構成には同一
符号を付してその説明を省く。
Note that the other configurations other than the above-mentioned protrusions are the same as the conventional package, and the same reference numerals are given to the same or corresponding configurations as in the conventional example, and the explanation thereof will be omitted.

上述の構成になるので、半導体装置のアウタ−リー17
を曲げる工程においてダイパッド5は外側へ引っ張られ
る応力を受けるが、本実施例による半導体装置では、ダ
イパッド5に突起8を設けたため、ダイパッド5が応力
を受けても突起8が十分対抗してモールド樹脂4で食い
止められるので、応力が半導体素子2に集中することは
なくなり半導体素子2にクラックの入る可能性が著しく
低下している。
With the above configuration, the outer layer 17 of the semiconductor device
In the process of bending the die pad 5, the die pad 5 is subjected to stress that is pulled outward. However, in the semiconductor device according to this embodiment, the protrusion 8 is provided on the die pad 5, so that even if the die pad 5 is subjected to stress, the protrusion 8 sufficiently counters the mold resin. 4, stress is no longer concentrated on the semiconductor element 2, and the possibility of cracks occurring in the semiconductor element 2 is significantly reduced.

第2図は本発明の他の実施例を示す平面図であり、ダイ
パッド5とインナーリード6との間に補強固定部に相当
する突起10を設けている。突起10は、ダイパッド部
5と同一厚さを有し、ダイパッド部5の横方向の幅より
長い幅L2で両側に突き出した長方形状すであり、ダイ
パッド部5に連設している。その働きは第1図の実施例
と全く同様である。
FIG. 2 is a plan view showing another embodiment of the present invention, in which a protrusion 10 corresponding to a reinforcing fixing portion is provided between the die pad 5 and the inner lead 6. The protrusion 10 has the same thickness as the die pad portion 5 and has a rectangular shape protruding from both sides with a width L2 longer than the width of the die pad portion 5 in the lateral direction, and is connected to the die pad portion 5. Its operation is exactly the same as the embodiment shown in FIG.

第3図も本発明の他の実施例を示す平面図であり、補強
固定部に相当するアンカーホール11をダイパッド5の
先端部及びダイパッド5とインナーリード6との間に設
けている。アンカーホール11の長さはダイパッド5の
厚さと同一であり、ダイパッド5の横方向の幅より短い
直径を有し、ダイパッド5内に設けられている。
FIG. 3 is also a plan view showing another embodiment of the present invention, in which an anchor hole 11 corresponding to a reinforcing fixing portion is provided at the tip of the die pad 5 and between the die pad 5 and the inner lead 6. The length of the anchor hole 11 is the same as the thickness of the die pad 5, and the anchor hole 11 has a diameter shorter than the width of the die pad 5 in the lateral direction, and is provided in the die pad 5.

上述の構成になるのでアンカーホール11はその中に充
填されたモールド樹脂4て食い止められ、ダイパッド5
が動いて半導体素子2に応力が集中して半導体素子2に
クラックが入るといった不都合を著しく減少させること
ができた。
With the above configuration, the anchor hole 11 is stopped by the mold resin 4 filled therein, and the die pad 5
This makes it possible to significantly reduce the inconvenience that the semiconductor element 2 moves and stress concentrates on the semiconductor element 2, causing cracks in the semiconductor element 2.

なお、突起8,10の形状及び大きさは第1図及び第2
図の実施例に限ったものではなく、ダイパッド5かアウ
ターリート7方向へ動くのを姑げるような形状であれば
良い。また、アンカーホール11の形状、大きさ及び個
数も、箪3図の実施例に限ったものではなく、突起8.
10と同様の働きをするものであれば良い。
The shapes and sizes of the protrusions 8 and 10 are as shown in Figures 1 and 2.
The shape is not limited to the illustrated embodiment, and any shape may be used as long as it prevents movement toward the die pad 5 or the outer reel 7. Further, the shape, size, and number of the anchor holes 11 are not limited to the embodiment shown in FIG.
Any material that functions similarly to 10 may be used.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、この発明によれば、半導体装置用
リードフレームの半導体素子を固着するダイパッド部に
補強固定部を設けたことにより、アウターリード曲げ工
程において半導体素子にクラックが入らないという効果
がある。
As explained above, according to the present invention, by providing the reinforcing fixing part in the die pad part of the lead frame for a semiconductor device to which the semiconductor element is fixed, it is possible to prevent the semiconductor element from cracking during the outer lead bending process. be.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による半導体装置用リードフレームの1
実施例を示すモールド樹脂を取除いた場合の平面図、第
2図及び第3図は本発明の他の異なる2つの実施例を示
すモールド樹脂を取除いた場合の平面図、第4図(a)
及び(b)は従来のトランジスタのパッケージのリード
フレームを示す平面図及びB−B線断面図、第5図(a
)。 (b)、(C)、(d)は従来の半導体装置の組立工程
図、第6図はアウターリード曲げ工程における半導体素
子のクラック発生を示す断面図である。 1はリードフレーム、2は半導体素子、3はボンディン
グワイヤ、4はモールド樹脂、5はダイパッド、6はイ
ンナーリード、7はアウターリート、8及び!0は突起
、9は接続部、11はアンカーホール、14はベース、
15はエミッタである。なお、Ll及びL2は突起の横
幅、児は接続部の横幅、a及びbは突起の長方形状であ
る。 なお。 各図中間 符号は同 または相当部分を 示す。
FIG. 1 shows one of the lead frames for semiconductor devices according to the present invention.
FIGS. 2 and 3 are plan views showing an embodiment with the mold resin removed, and FIG. 4 is a plan view showing two other different embodiments of the present invention with the mold resin removed. a)
and (b) is a plan view and a sectional view taken along the line B-B of the lead frame of a conventional transistor package, and FIG.
). (b), (C), and (d) are assembly process diagrams of a conventional semiconductor device, and FIG. 6 is a cross-sectional view showing the occurrence of cracks in a semiconductor element during the outer lead bending process. 1 is a lead frame, 2 is a semiconductor element, 3 is a bonding wire, 4 is a mold resin, 5 is a die pad, 6 is an inner lead, 7 is an outer lead, 8 and! 0 is a projection, 9 is a connection part, 11 is an anchor hole, 14 is a base,
15 is an emitter. Note that L1 and L2 are the widths of the protrusions, L1 is the width of the connecting portion, and a and b are the rectangular shapes of the protrusions. In addition. The symbols in the middle of each figure indicate the same or corresponding parts.

Claims (1)

【特許請求の範囲】[Claims]  半導体素子を固着するダイパッド部に補強固定部を連
設し所望のモールド樹脂に固定してなることを特徴とす
る半導体装置用リードフレーム。
A lead frame for a semiconductor device, characterized in that a reinforcing fixing part is provided in series with a die pad part to which a semiconductor element is fixed, and the reinforcing fixing part is fixed to a desired molding resin.
JP31623189A 1989-12-05 1989-12-05 Lead frame for semiconductor device Pending JPH03177060A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31623189A JPH03177060A (en) 1989-12-05 1989-12-05 Lead frame for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31623189A JPH03177060A (en) 1989-12-05 1989-12-05 Lead frame for semiconductor device

Publications (1)

Publication Number Publication Date
JPH03177060A true JPH03177060A (en) 1991-08-01

Family

ID=18074772

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31623189A Pending JPH03177060A (en) 1989-12-05 1989-12-05 Lead frame for semiconductor device

Country Status (1)

Country Link
JP (1) JPH03177060A (en)

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US8154111B2 (en) 1999-12-16 2012-04-10 Amkor Technology, Inc. Near chip size semiconductor package
US8691632B1 (en) 2002-11-08 2014-04-08 Amkor Technology, Inc. Wafer level package and fabrication method
US8866278B1 (en) 2011-10-10 2014-10-21 Amkor Technology, Inc. Semiconductor device with increased I/O configuration
US8900995B1 (en) 2010-10-05 2014-12-02 Amkor Technology, Inc. Semiconductor device and manufacturing method thereof
US8937381B1 (en) 2009-12-03 2015-01-20 Amkor Technology, Inc. Thin stackable package and method
US8981572B1 (en) 2011-11-29 2015-03-17 Amkor Technology, Inc. Conductive pad on protruding through electrode semiconductor device
US9048298B1 (en) 2012-03-29 2015-06-02 Amkor Technology, Inc. Backside warpage control structure and fabrication method
US9082833B1 (en) 2011-01-06 2015-07-14 Amkor Technology, Inc. Through via recessed reveal structure and method
US9129943B1 (en) 2012-03-29 2015-09-08 Amkor Technology, Inc. Embedded component package and fabrication method
US9159672B1 (en) 2010-08-02 2015-10-13 Amkor Technology, Inc. Through via connected backside embedded circuit features structure and method
US9324614B1 (en) 2010-04-06 2016-04-26 Amkor Technology, Inc. Through via nub reveal method and structure
US9631481B1 (en) 2011-01-27 2017-04-25 Amkor Technology, Inc. Semiconductor device including leadframe with a combination of leads and lands and method
US9673122B2 (en) 2014-05-02 2017-06-06 Amkor Technology, Inc. Micro lead frame structure having reinforcing portions and method
US9691734B1 (en) 2009-12-07 2017-06-27 Amkor Technology, Inc. Method of forming a plurality of electronic component packages
US9704725B1 (en) 2012-03-06 2017-07-11 Amkor Technology, Inc. Semiconductor device with leadframe configured to facilitate reduced burr formation

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8154111B2 (en) 1999-12-16 2012-04-10 Amkor Technology, Inc. Near chip size semiconductor package
US9054117B1 (en) 2002-11-08 2015-06-09 Amkor Technology, Inc. Wafer level package and fabrication method
US8691632B1 (en) 2002-11-08 2014-04-08 Amkor Technology, Inc. Wafer level package and fabrication method
US9871015B1 (en) 2002-11-08 2018-01-16 Amkor Technology, Inc. Wafer level package and fabrication method
US9406645B1 (en) 2002-11-08 2016-08-02 Amkor Technology, Inc. Wafer level package and fabrication method
US8952522B1 (en) 2002-11-08 2015-02-10 Amkor Technology, Inc. Wafer level package and fabrication method
US10665567B1 (en) 2002-11-08 2020-05-26 Amkor Technology, Inc. Wafer level package and fabrication method
US8937381B1 (en) 2009-12-03 2015-01-20 Amkor Technology, Inc. Thin stackable package and method
US10546833B2 (en) 2009-12-07 2020-01-28 Amkor Technology, Inc. Method of forming a plurality of electronic component packages
US9691734B1 (en) 2009-12-07 2017-06-27 Amkor Technology, Inc. Method of forming a plurality of electronic component packages
US9324614B1 (en) 2010-04-06 2016-04-26 Amkor Technology, Inc. Through via nub reveal method and structure
US9159672B1 (en) 2010-08-02 2015-10-13 Amkor Technology, Inc. Through via connected backside embedded circuit features structure and method
US8900995B1 (en) 2010-10-05 2014-12-02 Amkor Technology, Inc. Semiconductor device and manufacturing method thereof
US9082833B1 (en) 2011-01-06 2015-07-14 Amkor Technology, Inc. Through via recessed reveal structure and method
US9978695B1 (en) 2011-01-27 2018-05-22 Amkor Technology, Inc. Semiconductor device including leadframe with a combination of leads and lands and method
US9631481B1 (en) 2011-01-27 2017-04-25 Amkor Technology, Inc. Semiconductor device including leadframe with a combination of leads and lands and method
US8866278B1 (en) 2011-10-10 2014-10-21 Amkor Technology, Inc. Semiconductor device with increased I/O configuration
US9431323B1 (en) 2011-11-29 2016-08-30 Amkor Technology, Inc. Conductive pad on protruding through electrode
US9947623B1 (en) 2011-11-29 2018-04-17 Amkor Technology, Inc. Semiconductor device comprising a conductive pad on a protruding-through electrode
US10410967B1 (en) 2011-11-29 2019-09-10 Amkor Technology, Inc. Electronic device comprising a conductive pad on a protruding-through electrode
US8981572B1 (en) 2011-11-29 2015-03-17 Amkor Technology, Inc. Conductive pad on protruding through electrode semiconductor device
US11043458B2 (en) 2011-11-29 2021-06-22 Amkor Technology Singapore Holding Pte. Ltd. Method of manufacturing an electronic device comprising a conductive pad on a protruding-through electrode
US9704725B1 (en) 2012-03-06 2017-07-11 Amkor Technology, Inc. Semiconductor device with leadframe configured to facilitate reduced burr formation
US10090228B1 (en) 2012-03-06 2018-10-02 Amkor Technology, Inc. Semiconductor device with leadframe configured to facilitate reduced burr formation
US9129943B1 (en) 2012-03-29 2015-09-08 Amkor Technology, Inc. Embedded component package and fabrication method
US10014240B1 (en) 2012-03-29 2018-07-03 Amkor Technology, Inc. Embedded component package and fabrication method
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