JPH03173784A - Vacuum vessel - Google Patents
Vacuum vesselInfo
- Publication number
- JPH03173784A JPH03173784A JP31063089A JP31063089A JPH03173784A JP H03173784 A JPH03173784 A JP H03173784A JP 31063089 A JP31063089 A JP 31063089A JP 31063089 A JP31063089 A JP 31063089A JP H03173784 A JPH03173784 A JP H03173784A
- Authority
- JP
- Japan
- Prior art keywords
- sealing material
- vacuum
- cap
- container
- wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001681 protective effect Effects 0.000 claims abstract description 13
- 239000003566 sealing material Substances 0.000 abstract description 19
- 239000000463 material Substances 0.000 abstract description 6
- 230000006866 deterioration Effects 0.000 abstract description 5
- 229910001220 stainless steel Inorganic materials 0.000 abstract description 2
- 239000010935 stainless steel Substances 0.000 abstract description 2
- 229910000831 Steel Inorganic materials 0.000 abstract 1
- 230000002542 deteriorative effect Effects 0.000 abstract 1
- 239000010959 steel Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229920001875 Ebonite Polymers 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、真空中にガスを導入し、あるいは電界を発生
させた状態で被処理物を処理する真空容器におけるキャ
ップ構造に関し、主として半導体製品を製造するための
製造装置を対象とする。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a cap structure for a vacuum container in which a workpiece is processed by introducing a gas into a vacuum or generating an electric field, and is mainly applied to semiconductor products. Targets manufacturing equipment for manufacturing.
半導体装置製造用のドライエッチ装置やCVD(化学気
相堆積法)装置は、真空容器内で腐蝕性ガス(アンモニ
ア、塩素、四塩化炭素、三塩化ホウ素あるいは四塩化ケ
イ素など)や活性ガス(OzやCF4)を使用し、また
、その中でプラズマ放電を発生させる構造になっており
、容器の側面に設けた覗き窓、センサーポートあるいは
メクラ蓋等における保護キャンプは密閉状態を保持する
必要がある。Dry etching equipment and CVD (chemical vapor deposition) equipment for semiconductor device manufacturing use corrosive gases (ammonia, chlorine, carbon tetrachloride, boron trichloride, silicon tetrachloride, etc.) and active gases (Oz or CF4), and has a structure that generates plasma discharge within it, and the protective camp in the viewing window, sensor port, or blind lid on the side of the container must be kept tightly sealed. .
従来のキャップの構造は、第2図に示すように容器の窓
部5に外側から板状のキャップ部材4をあてがい、容器
外壁とキャップ部材との間には真空シール材2を介挿す
る程度で、キャップ押え3等の手段により外壁lに固定
していた。The structure of a conventional cap is such that a plate-shaped cap member 4 is applied from the outside to the window 5 of the container, and a vacuum sealing material 2 is inserted between the outer wall of the container and the cap member, as shown in FIG. The cap was fixed to the outer wall l by means such as a cap holder 3.
従来の技術では、保護キャップにおける真空シール材の
材質についてはその形状や構造的な配慮がなされていな
い。すなわち、第2図に示すようにキャップ部材4の容
器と接する面はフラットであって、容器の開口部(窓部
)からシール材2までの距離はきわめて短い。一般の真
空シール材、たとえば硬質ゴムからなるOリングは、容
器内に導入した腐蝕性ガスや活性ガスが容器外壁との隙
間6を通じて接触しやすく、また真空容器中でプラズマ
を発生させると、真空シール材の劣化速度が非常に大き
くなり、真空シール材自体からの異物発生や真空リーク
が起って、真空中での処理に支障を来し、欠陥処理品を
生じる問題があった。In the conventional technology, no consideration is given to the shape or structure of the material of the vacuum sealing material in the protective cap. That is, as shown in FIG. 2, the surface of the cap member 4 in contact with the container is flat, and the distance from the opening (window) of the container to the sealing material 2 is extremely short. General vacuum sealing materials, such as O-rings made of hard rubber, allow corrosive gas or active gas introduced into the container to easily come into contact with the outer wall of the container through the gap 6, and when plasma is generated in the vacuum container, the The rate of deterioration of the sealing material becomes extremely high, and the generation of foreign matter and vacuum leaks from the vacuum sealing material itself, which impede processing in vacuum and result in defective processed products.
本発明は上記した問題を解決するためのものであって、
その目的は真空容器において真空シール材をガスやプラ
ズマより保護し劣化速度を大幅に抑えることにある。The present invention is intended to solve the above-mentioned problems,
The purpose of this is to protect the vacuum sealing material from gas and plasma in the vacuum container and to significantly reduce the rate of deterioration.
上記目的を達成するために、本発明は容器外壁に設けら
れた窓部を密閉するように容器外部から固定された保護
キャンプを有する真空容器であって、上記保護キャップ
は内側に突出する突出部によって窓部に隙間なく挿嵌さ
れていることを特徴とするものである。In order to achieve the above object, the present invention provides a vacuum container having a protective camp fixed from the outside of the container so as to seal a window provided on the outer wall of the container, wherein the protective cap has a protrusion that projects inward. It is characterized by being inserted into the window portion without any gaps.
保護キャップに突出部を設けて窓部に隙間なく挿嵌する
構造とすることにより、容器内部の腐蝕性ガスや活性ガ
スが真空シール材のある部分まで入り難くなり、特にプ
ラズマ放電からの影響も少なくなり、真空シール材自体
の変質変化による異物の発生や真空リーク等の事故の発
生を大幅に減少することができる。By providing a protruding part on the protective cap and making it fit into the window without leaving any gaps, corrosive gases and active gases inside the container are difficult to enter into the area where the vacuum sealing material is located, and the effects of plasma discharge are also reduced. This greatly reduces the occurrence of accidents such as foreign matter and vacuum leaks due to deterioration of the vacuum sealing material itself.
以下、本発明をドライエッチ装置に通用した一実施例に
ついて図面を参照しながら説明する。Hereinafter, an embodiment in which the present invention is applied to a dry etching apparatus will be described with reference to the drawings.
第1図は真空容器における保護キャップ構造を示す一部
断面図である。FIG. 1 is a partial sectional view showing a protective cap structure in a vacuum container.
lはステンレス・スチール等の材料からなる真空容器の
外壁であって、その一部が窓部5として開口している。1 is an outer wall of a vacuum container made of a material such as stainless steel, and a part of the outer wall is open as a window 5.
2は真空シール材で、たとえばフッ素系樹脂などの硬質
ゴムまたは銅などの金属がらなり、0リングと呼ばれて
いるものである。Reference numeral 2 denotes a vacuum sealing material, which is made of hard rubber such as fluororesin or metal such as copper, and is called an O-ring.
3はキャップ押えであって、図示されないがボルト・ナ
ツト等の緊締具を利用してキャップを容器外壁に固定す
るようになっている。Reference numeral 3 denotes a cap holder, which is adapted to fix the cap to the outer wall of the container using tightening tools such as bolts and nuts (not shown).
4は保護キャップであって、覗き窓の場合は透明な5i
Ozまたはガラスの板がらなり、メクラ蓋の場合は不透
明な材料、たとえば金属の板であってもよい。4 is a protective cap, and in the case of a viewing window, it is a transparent 5i
It can be made of a plate of oz or glass, or in the case of a blank lid it can be a plate of an opaque material, for example a metal plate.
7は突出部で保護キャップ4と同質の材料によりこれと
一体的に形成してあり、容器内部(低圧側、真空側)に
向いて窓部に挿嵌されている。Reference numeral 7 denotes a protrusion, which is made of the same material as the protective cap 4 and is integrally formed therewith, and is inserted into the window facing the inside of the container (low pressure side, vacuum side).
この突出部7があることにより窓部との隙間6がきわめ
て小さくなっている。その結果、隙間を通じての腐蝕ガ
スや活性ガス等の真空シール材への侵入は少なくなり、
真空シール材近傍でのプラズマ発生もなく、シール材の
劣化を低減することができる。Due to the presence of this protruding portion 7, the gap 6 with the window portion is extremely small. As a result, the intrusion of corrosive gases, active gases, etc. into the vacuum sealing material through gaps is reduced.
There is no plasma generation near the vacuum sealing material, and deterioration of the sealing material can be reduced.
本発明は以上説明したように構成されており、容器内の
ガスやプラズマで放電によるシール材への影響を極力少
なくでき、異物の発生や真空リーク等によるトラブルを
大幅に減少させ、被処理品の欠陥をなくす効果を奏する
。The present invention is configured as described above, and the influence on the sealing material due to discharge of gas or plasma in the container can be minimized, and troubles such as the generation of foreign matter and vacuum leaks can be greatly reduced, and the It has the effect of eliminating defects.
第1図は本発明の一実施例を示す真空容器の一部断面図
である。
第2図は従来例を示す容器の一部断面図であるl・・・
真空容器外壁、 2・・・真空シール、3・・・キャン
プ押え、 4・・・保護キャップ、5・・・窓部、6・
・・隙間、7・・・突出部。FIG. 1 is a partial sectional view of a vacuum container showing an embodiment of the present invention. Figure 2 is a partial sectional view of a conventional container.
Vacuum container outer wall, 2... Vacuum seal, 3... Camping holder, 4... Protective cap, 5... Window, 6...
...Gap, 7...Protrusion.
Claims (2)
部から固定された保護キャップを有する真空容器であっ
て、上記保護キャップは内側に突出する突出部によって
窓部に隙間なく挿嵌されていることを特徴とする真空容
器。1. A vacuum container having a protective cap fixed from the outside of the container so as to seal a window provided on the outer wall of the container, wherein the protective cap is fitted into the window without a gap by a protrusion projecting inward. A vacuum container characterized by:
は腐蝕性ガスまたは活性ガスが導入されるようになって
いる。2. In the vacuum container according to claim 1, a corrosive gas or an active gas is introduced into the container.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31063089A JPH03173784A (en) | 1989-12-01 | 1989-12-01 | Vacuum vessel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31063089A JPH03173784A (en) | 1989-12-01 | 1989-12-01 | Vacuum vessel |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03173784A true JPH03173784A (en) | 1991-07-29 |
Family
ID=18007571
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31063089A Pending JPH03173784A (en) | 1989-12-01 | 1989-12-01 | Vacuum vessel |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03173784A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0680071A2 (en) * | 1994-04-29 | 1995-11-02 | Applied Materials, Inc. | Protective collar for a vacuum seal in a plasma etch reactor |
JP2014214863A (en) * | 2013-04-30 | 2014-11-17 | Smc株式会社 | Gate valve |
-
1989
- 1989-12-01 JP JP31063089A patent/JPH03173784A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0680071A2 (en) * | 1994-04-29 | 1995-11-02 | Applied Materials, Inc. | Protective collar for a vacuum seal in a plasma etch reactor |
EP0680071A3 (en) * | 1994-04-29 | 1996-04-03 | Applied Materials Inc | Protective collar for a vacuum seal in a plasma etch reactor. |
US5722668A (en) * | 1994-04-29 | 1998-03-03 | Applied Materials, Inc. | Protective collar for vacuum seal in a plasma etch reactor |
JP2014214863A (en) * | 2013-04-30 | 2014-11-17 | Smc株式会社 | Gate valve |
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