JPH0316746A - Substrate and thermal head having the same substrate - Google Patents
Substrate and thermal head having the same substrateInfo
- Publication number
- JPH0316746A JPH0316746A JP15178489A JP15178489A JPH0316746A JP H0316746 A JPH0316746 A JP H0316746A JP 15178489 A JP15178489 A JP 15178489A JP 15178489 A JP15178489 A JP 15178489A JP H0316746 A JPH0316746 A JP H0316746A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- glass
- expansion coefficient
- adhesive layer
- thermal head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 38
- 239000011521 glass Substances 0.000 claims abstract description 22
- 239000012790 adhesive layer Substances 0.000 claims abstract description 14
- 239000000843 powder Substances 0.000 claims abstract description 11
- 239000002184 metal Substances 0.000 claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims abstract description 9
- 238000004070 electrodeposition Methods 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 2
- 239000005357 flat glass Substances 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 239000005361 soda-lime glass Substances 0.000 abstract description 13
- 229910001220 stainless steel Inorganic materials 0.000 abstract description 13
- 239000010935 stainless steel Substances 0.000 abstract description 13
- 238000010438 heat treatment Methods 0.000 abstract description 10
- 238000000059 patterning Methods 0.000 abstract description 7
- 238000005530 etching Methods 0.000 abstract description 6
- 239000011230 binding agent Substances 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 2
- 239000002648 laminated material Substances 0.000 abstract 1
- 239000005355 lead glass Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000002245 particle Substances 0.000 description 11
- 230000009477 glass transition Effects 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000006187 pill Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明はサーマルヘッド等に用いられる基板およびこの
基板を用いた物品に関すん
従来の技術
従来の基板として例えば特願昭61−252212号に
開示されているようなサーマルヘッド用の絶縁ホー口基
板を例に挙げ説明すも
この基板は第2図に示すようにステンレス鋼板等の金属
基体1上にニッケルメッキ層7、ホーロガラス層8を被
覆した構成から戒も この基板の製造方法としてはまず
調整したガラスフリットをボールミルで粉砕して平均粒
径が2〜3μmの電気泳動電着(電着)用スラリーとし
このスラリーにステンレス鋼板等の金属基体lを浸鷹
対極と金属基体1との間に直流電圧を印加して帯電し
たガラスフリット粒子を金属基体l上に電著すもこのよ
うな方法で形威したサーマルヘッド用基板の表面粗皮(
友 中心線平均粗さRaで0.05〜0.08μmであ
り従来のホーロ基板(Ra; 0.15 〜0.3,u
m)に比べて極めて平滑性に優れていも
発明が解決しようとする課題
上記構戊の基板表面に圧膜印刷法あるいはスパッタリン
グ等の薄膜技術を用いて、第2図に示すような電極4、
発熱抵抗体5、オーバーコート層6をパターン形威しサ
ーマルヘッドの導電回路を形成する過程において、基板
の表面平滑性が充分でないたべ 精度の高いファインな
パターン形戊ができなL1
また電極4、抵抗体5、あるいはオーバコート層6など
の構戒材料とホーロ基板とが反応し 良好な特性のサー
マルヘッドができな鶏
さらに基板の熱伝導率の制御が極めて困難であるという
課題がありtも
課題を解決するための手段
上記課題を解決するために本発明は 金属基体上に接着
材層と板状のガラスとから戒る積層構戊を有しかつ積層
構戒物の熱膨張係数がそれぞれ整合している基板を構或
すも
作 用
本発明の基板は金属基体上に接着材層と板状のガラスと
から或る積層構或を有しかつ積層構成物の熱膨張係数が
それぞれ整合しているの玄 基板の表面平滑性に優れ
物理化学的に安定かつ熱伝導率の制御容易な基板を得る
ことができも実施例
以下本発明の実施例について説明すも
く第1実施例〉
第1図に示したように厚さ2mmのステンレス鋼板1
(膨張係数114X 10−’)上にガラス転移点40
5t,軟化点520℃の粒径lOμm以下の鉛系ガラス
粉末(膨張係数110X 10−’)を5wt%の有機
バインダーと共に印刷L,. 800℃の温度で20分
間焼戒し 40μmの接着材層2を形威しt4さらにそ
の上に厚さ50μmの表面平滑に優れたく中心線平均粗
さRaが0. 006)ソーダ石灰ガラス(膨張係数1
10X 10−’)を設置L 800℃で10分間焼
或し ソーダ石灰ガラスから或る板状のガラス3を接着
しtら
このようにして作威した基板上に第1図に示した構戊断
面を有するサーマルヘッドを試作し1,4は電徴 5は
発熱抵抗恢 6はオーバーコート層であも 電極4、発
熱抵抗体5のパターニング、エッチングも非常に良好で
あり従来の構或のも゛のに比べパターン精度が向上しt
も
く第2実施例〉
第1実施例と同様に厚さ2mmのステンレス鋼板1 (
膨張係数114x 10−’)上にガラス転移点405
t,軟化点520℃の粒径lOμm以下の鉛系ガラス粉
末(膨張係数110x 10−▼)を5wt%の有機バ
インダー、ステンレス製微粉末(粒径10μm以下)1
0wt%と共に混合後印刷L 800℃の温度で20
分間焼或し40μmの接着材層2を形戊しtも さら
にその上に厚さ50μmの表面平滑に優れた(中心線革
均粗さRaが0. 006)ソーダ石灰ガラス(膨張係
数110X to−’)を設置L, 800℃で10
分間焼戊し ソーダ石灰ガラスから戒る板状のガラス3
を接着し1,このようにして作威した基板上に第1図に
示した構戒断面を有するサーマルヘッドを試作しtラ電
極4、発熱抵抗体5のバターニング、エッチングも非常
に良好であり従来の構或のものに比べバターン精度が向
上し九
く第3実施例〉
第1実施例と同様に厚さ2mmのステンレス鋼板1 (
膨張係数114X10−▼〉上にガラス転移点390a
軟化点450℃の粒径lOμm以下の鉛系ガラス粉末
(膨張係数118X 10−’)を、 5wt%の有機
バインダー、ステンレス製微粉末(粒径10μm以下)
10wt%.適当量の有機溶媒(プロパロール)と共に
混合眞 スプレイL 650℃の温度で20分間焼戒L
A 40μmの接着材層2を形戒し1, さらにその
上に厚さ50μmの表面平滑に優れた(中心線平均粗さ
Raが0. 006)ソーダ石灰ガラス(膨張係数11
0XIO一▼)を設置IA 650℃で10分間焼威し
ソーダ石灰ガラスから或る板状のガラス3を接着しt
ら
このようにして作威した基板上に第1図に示した構戒断
面を有するサーマルヘッドを試作し1,電極4、発熱抵
抗体5のパターニング、エッチングも非常に良好であり
、従来の構或のものに比べパターン精度が向上した
く第4実施例〉
第l実施例と同様に厚さ2mmのステンレス鋼板l (
膨張係数114X 10−’)上にガラス転移点390
′tl,,軟化点450℃の粒径lOμm以下の鉛系ガ
ラス粉末(膨張係数118X 10−’)を、 5wt
%の有機バインダー、ステンレス製繊維(直径10μ臥
長さ1mm以下) 1 0 wt!%.適当量の有機
溶媒(プロパロール)と共に混合後、スブレイL,65
0℃の温度で20分間焼或I− 40μmの接着材層2
を形成し丸 さらにその上に厚さ50μmの表面平滑に
優れた(中心線平均粗さRaが0. 006)ソーダ石
灰ガラス(膨張係数110x 10−’)を設置L−6
50℃でlO分間焼威し ソーダ石灰ガラスから戊る板
状のガラス3を接着しtも
このようにして作或した基板上に第1図に示した構戒断
面を有するサーマルヘッドを試作した電極4、発熱抵抗
体5のバターニング、エッチングも非常に良好であり従
来の構或のものに比べパターン精度が向上しtら
く第5実施例〉
第1実施例と同様に厚さ2mmのステンレス鋼板1 (
膨張係数114X 10−’)上にエボキシ樹脂とシリ
カ微粉末からなる(膨張係数115X 10−’)を塗
布L,, 30μmの接着材層2を形成L さらにそ
の上に厚さ50μmの表面平滑に優れたく中心線平均粗
さRaが0. 006)ソーダ石灰ガラス(膨張係数1
10×10−’)を設置L,, 250℃で10分間
焼或し ソーダ石灰ガラスから或る板状のガラス3を接
着したこのようにして作戊した基板上に第1図に示した
構戒断面を有するサーマルヘッドを試作した電極4、発
熱抵抗体5のパターニング、エッチングも非常に良好で
あり従来の構或のものに比べパターン精度が向上しt4
く第6実施例〉
第1実施例と同様な厚さ2mmのステンレス鋼板1 (
膨張係数114X 10−’)を説服 水洗 酸丸ニッ
ケルメッキ、水洗し前処理を行った抵 平均粒径が5μ
mのガラス転移点390a 軟化点450℃の鉛系ガラ
ス粉末(膨張係数118X 10”’)とプロパロール
溶液とからなるスラリー中に浸漬して、対極とステンレ
ス鋼板1に直流電圧を印加して鉛系ガラス粉末をステン
レス鋼板lに30μm電着し?= これを室温で乾燥
後、650℃の温度で20分間焼戒し 26μmの接着
材層2を形威し丸 さらにその上に厚さ50μmの表面
平滑に優れた(中心線平均粗さRaが0. 006)ソ
ーダ石灰ガラス(膨張係数110X 10−’)を設置
し 650℃でlO分間焼戊し ソーダ石灰ガラスか
ら或る板状のガラス3を接着した
このようにして作威した基板上に第1図に示した構成断
面を有するサーマルヘッドを試作しtも電極4、発熱抵
抗体5のパターニング、エッチングも非常に良好であり
従来の構或のものに比べパターン精度が向上し氾
く比較例〉
厚さ2mmのステンレス鋼板l (膨張係数l14×1
0−’)を脱服 水九 酸丸 ニッケルメッキ、水洗し
前処理を行った徴 平均粒径が2.5μmのガラス粒子
からなるスラリー中に浸漬して、k転移点390’u
軟化点450℃の鉛系ガラス粉末(膨張係数118X
10−’)とプロパロール溶液とからなるスラリー中
に浸漬して、対極とステンレス鋼板lに直流電圧を印加
して第1表に示す組戒の結晶性ガラス粒子をステンレス
鋼板1に150μm電着した これを室温で乾燥i
900℃の温度で20分間焼戊して基板を形成した そ
の後第2図に示すようにこの基板上に電極4、発熱抵抗
体5、オーバーコート層6を形戊しサーマルヘッドを試
作しtら
第1表
第2表
第3表
以上の実施例1〜5と比較例について基板表面上の中心
線平均粗さR, サーマルヘッドの発熱抵抗体5の抵抗
値バラつき、サーマルヘッドの熱効率(OD濃度1.0
の時の1ドット当りの消費電力)を測定しtラ この
結果を第2表 第3表に示す。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a substrate used in a thermal head, etc., and an article using this substrate. This will be explained by taking as an example an insulated hole-hole substrate for a thermal head, as shown in FIG. As for the manufacturing method of this substrate, first, the prepared glass frit is ground in a ball mill to form a slurry for electrophoretic electrodeposition (electrodeposition) with an average particle size of 2 to 3 μm. A direct current voltage is applied between the counter electrode and the metal substrate 1, and the charged glass frit particles are electrolyzed onto the metal substrate 1.
The center line average roughness Ra is 0.05 to 0.08 μm, and it is different from the conventional hollow substrate (Ra; 0.15 to 0.3, u
Problem to be Solved by the Invention Even though the surface of the substrate is extremely smooth compared to the electrode 4 shown in FIG.
In the process of patterning the heating resistor 5 and overcoat layer 6 to form the conductive circuit of the thermal head, the surface smoothness of the substrate is insufficient, making it impossible to form a fine pattern with high accuracy. There is also the problem that the thermal conductivity of the substrate is extremely difficult to control due to the reaction between the resistor 5 or overcoat layer 6 and other structural materials and the hollow substrate, making it impossible to form a thermal head with good characteristics. Means for Solving the Problems In order to solve the above problems, the present invention has a laminated structure consisting of an adhesive layer and a sheet of glass on a metal substrate, and the thermal expansion coefficients of the laminated structures are respectively The substrate of the present invention has a laminated structure consisting of an adhesive layer and a sheet of glass on a metal base, and the coefficients of thermal expansion of the laminated structures are matched, respectively. Excellent surface smoothness of the substrate
As shown in FIG. 1, a substrate with a thickness of 2 mm can be obtained. stainless steel plate 1
(Expansion coefficient 114X 10-') and glass transition point 40
Printing L,. After baking at a temperature of 800°C for 20 minutes, a 40 μm thick adhesive layer 2 is formed, and on top of that, a 50 μm thick adhesive layer 2 with an excellent surface smoothness and a center line average roughness Ra of 0. 006) Soda lime glass (expansion coefficient 1
10X 10-') was baked at 800°C for 10 minutes, and a plate-shaped glass 3 made of soda-lime glass was glued onto the substrate thus created to form the structure shown in Figure 1. A thermal head with a cross section was prototyped, and 1 and 4 were electrical symbols, 5 was a heating resistor, and 6 was an overcoat layer.The patterning and etching of the electrodes 4 and heating resistor 5 were also very good, compared to the conventional structure. The pattern accuracy is improved compared to ゛.
Second Example> As in the first example, a stainless steel plate 1 with a thickness of 2 mm (
Expansion coefficient 114 x 10-') and glass transition point 405
t, lead-based glass powder (expansion coefficient 110x 10-▼) with a softening point of 520°C and a particle size of 10 μm or less, an organic binder of 5 wt%, and stainless steel fine powder (particle size of 10 μm or less) 1
Printing after mixing with 0wt% L 20 at a temperature of 800℃
An adhesive layer 2 of 40 μm thickness was formed by baking for a minute, and on top of that was formed a soda lime glass (expansion coefficient 110X to -') installed L, 10 at 800℃
Minute baking Plate glass 3 different from soda lime glass
1. On the substrate thus prepared, a thermal head having the cross section shown in Fig. 1 was fabricated as a prototype, and the patterning and etching of the electrode 4 and heating resistor 5 were very good. 3rd Embodiment> Similar to the 1st embodiment, a stainless steel plate 1 with a thickness of 2 mm (
Glass transition point 390a on expansion coefficient 114X10-▼〉
Lead-based glass powder (expansion coefficient 118 x 10-') with a softening point of 450°C and a particle size of 10 μm or less, 5 wt% organic binder, and stainless steel fine powder (particle size of 10 μm or less)
10wt%. Mix with an appropriate amount of organic solvent (proparol), spray L, and burn for 20 minutes at a temperature of 650°C.
A 40 μm adhesive layer 2 is applied 1, and on top of that is a 50 μm thick soda lime glass with excellent surface smoothness (center line average roughness Ra of 0.006) (expansion coefficient 11).
0XIO1▼) was installed IA and burned at 650℃ for 10 minutes, and a certain plate-shaped glass 3 was glued from soda lime glass.
We fabricated a prototype thermal head with the structural cross section shown in Figure 1 on the substrate created in this way, and found that the patterning and etching of the electrodes 4 and heating resistor 5 were very good, compared to the conventional structure. Fourth Embodiment In order to improve the pattern accuracy compared to the previous example, a 2 mm thick stainless steel plate l (
Expansion coefficient 114X 10-') and glass transition point 390
'tl,, 5wt of lead-based glass powder (expansion coefficient 118X 10-') with a softening point of 450°C and a particle size of 10 μm or less
% organic binder, stainless steel fiber (diameter 10μ, length 1mm or less) 10 wt! %. After mixing with an appropriate amount of organic solvent (proparol), Soubrei L, 65
Baked for 20 minutes at a temperature of 0°C. Adhesive layer 2 of 40 μm.
Further, on top of that, soda lime glass (expansion coefficient 110 x 10-') with a thickness of 50 μm and excellent surface smoothness (center line average roughness Ra of 0.006) was installed L-6
After baking at 50°C for 10 minutes, a plate-shaped glass 3 made from soda-lime glass was adhered, and a thermal head having the cross-section shown in Figure 1 was fabricated on the thus prepared substrate. The patterning and etching of the electrode 4 and heating resistor 5 are also very good, and the pattern accuracy is improved compared to the conventional structure. Steel plate 1 (
Apply a layer of epoxy resin and fine silica powder (expansion coefficient: 115 x 10-') onto the surface (with an expansion coefficient of 114 x 10-'), form an adhesive layer 2 with a thickness of 30 μm, and then smooth the surface with a thickness of 50 μm on top. Excellent center line average roughness Ra of 0. 006) Soda lime glass (expansion coefficient 1
10 x 10-') was baked at 250°C for 10 minutes, and the structure shown in Figure 1 was placed on the substrate made in this way, on which a certain plate-shaped glass 3 was glued from soda-lime glass. The patterning and etching of the electrode 4 and the heating resistor 5 of which a prototype thermal head having a cross section was made was very good, and the pattern accuracy was improved compared to the conventional structure.6th Example〉 First Example Stainless steel plate 1 with a thickness of 2 mm similar to (
Expansion coefficient: 114 x 10-') Washed with water Acid round nickel plated, washed with water and pretreated, average particle size is 5μ
glass transition point 390a, softening point 450°C, lead-based glass powder (expansion coefficient 118 x 10''') and proparol solution. A 30 μm thick glass powder was electrodeposited on a stainless steel plate, dried at room temperature, and then burned at a temperature of 650°C for 20 minutes. Soda lime glass (expansion coefficient: 110 x 10-') with excellent surface smoothness (center line average roughness Ra: 0.006) was installed and annealed at 650°C for 10 minutes to produce a plate-shaped glass 3 from soda lime glass. A prototype thermal head having the cross section shown in Fig. 1 was fabricated on the thus-produced substrate bonded to the substrate. Comparative example with improved pattern accuracy compared to a certain one > 2 mm thick stainless steel plate l (expansion coefficient l14 x 1
0-') was taken off. Water Nine acid pills were nickel plated, washed with water, and pretreated. Immersed in a slurry consisting of glass particles with an average particle size of 2.5 μm, and the k transition point was 390'u.
Lead-based glass powder with a softening point of 450℃ (expansion coefficient 118X)
10-') and a proparol solution, and a DC voltage was applied to the counter electrode and the stainless steel plate 1 to electrodeposit crystalline glass particles having a thickness of 150 μm as shown in Table 1 on the stainless steel plate 1. Dry this at room temperature.
A substrate was formed by baking at a temperature of 900°C for 20 minutes. Then, as shown in Fig. 2, an electrode 4, a heating resistor 5, and an overcoat layer 6 were formed on this substrate, and a thermal head was prototyped. Table 1 Table 2 Table 3 Regarding the above Examples 1 to 5 and comparative examples, center line average roughness R on the substrate surface, resistance value variation of the heating resistor 5 of the thermal head, thermal efficiency of the thermal head (OD concentration 1.0
The results are shown in Tables 2 and 3.
発明の効果
以上説明したように本発明によれば 基板の表面平滑性
に優れ 物理化学的に安定かつ熱伝導率の制御容易な基
板を得ることができも
またサーマルヘッドとしたとき、抵抗値バラッキの減少
と熱効率を向上させることができもEffects of the Invention As explained above, according to the present invention, a substrate with excellent surface smoothness, physicochemical stability, and easy control of thermal conductivity can be obtained, and when used as a thermal head, there is no resistance value variation. It can also reduce and improve thermal efficiency
第1図は本発明の一実施例における基板を使用したサー
マルヘッドの構戊断面は 第2図は従来の基板を使用し
たサーマルヘッドの構戒断面図であも
1・・・ステンレスR楓 2・・・接着材# 3・・・
板状のガラ入Fig. 1 is a cross-sectional view of a thermal head using a substrate according to an embodiment of the present invention, and Fig. 2 is a cross-sectional view of a thermal head using a conventional substrate. ...Adhesive material #3...
Plate-shaped container
Claims (4)
積層構成を有しかつ積層構成物の熱膨張係数がそれぞれ
整合していることを特徴とする基板。(1) A substrate characterized in that it has a laminated structure consisting of an adhesive layer and a plate-shaped glass on a metal substrate, and the thermal expansion coefficients of the laminated structures are matched.
法のいずれかにより形成され、板状のガラスより低軟化
点を有する鉛系ガラス等のガラスあるいは樹脂であるこ
とを特徴とする請求項1記載の基板。(2) The adhesive layer is formed by spraying, printing, or electrophoretic electrodeposition, and is made of glass such as lead-based glass or resin, which has a lower softening point than sheet glass. The substrate according to claim 1.
属繊維を混合したことを特徴とする請求項2記載の基板
。(3) The substrate according to claim 2, wherein the adhesive layer contains metal powder or metal fibers having good thermal conductivity.
積層構成を有しかつ積層構成物の熱膨張係数がそれぞれ
整合している基板を用いたことを特徴とするサーマルヘ
ッド。(4) A thermal head characterized by using a substrate having a laminated structure consisting of an adhesive layer and a plate-shaped glass on a metal base, and in which the coefficients of thermal expansion of the laminated structures are matched.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15178489A JPH0316746A (en) | 1989-06-14 | 1989-06-14 | Substrate and thermal head having the same substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15178489A JPH0316746A (en) | 1989-06-14 | 1989-06-14 | Substrate and thermal head having the same substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0316746A true JPH0316746A (en) | 1991-01-24 |
Family
ID=15526225
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15178489A Pending JPH0316746A (en) | 1989-06-14 | 1989-06-14 | Substrate and thermal head having the same substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0316746A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017081167A (en) * | 2012-07-12 | 2017-05-18 | コーニング インコーポレイテッド | Laminated structure and method of manufacturing laminated structure |
JP2018197187A (en) * | 2018-07-12 | 2018-12-13 | 日本電気硝子株式会社 | Tablet shaped sealing material, and manufacturing method therefor |
-
1989
- 1989-06-14 JP JP15178489A patent/JPH0316746A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017081167A (en) * | 2012-07-12 | 2017-05-18 | コーニング インコーポレイテッド | Laminated structure and method of manufacturing laminated structure |
US11225052B2 (en) | 2012-07-12 | 2022-01-18 | Corning Incorporated | Laminated structures and methods of manufacturing laminated structures |
JP2018197187A (en) * | 2018-07-12 | 2018-12-13 | 日本電気硝子株式会社 | Tablet shaped sealing material, and manufacturing method therefor |
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