JPH03165565A - Master slice semiconductor integrated circuit - Google Patents

Master slice semiconductor integrated circuit

Info

Publication number
JPH03165565A
JPH03165565A JP30520989A JP30520989A JPH03165565A JP H03165565 A JPH03165565 A JP H03165565A JP 30520989 A JP30520989 A JP 30520989A JP 30520989 A JP30520989 A JP 30520989A JP H03165565 A JPH03165565 A JP H03165565A
Authority
JP
Japan
Prior art keywords
integrated circuit
diode
transistor
gate
master slice
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30520989A
Other languages
Japanese (ja)
Inventor
Yasuhisa Hirabayashi
平林 靖久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP30520989A priority Critical patent/JPH03165565A/en
Publication of JPH03165565A publication Critical patent/JPH03165565A/en
Pending legal-status Critical Current

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Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To lessen a chip in area by a method wherein N channel transistors of basic cells are connected together in parallel, and the drain of the transistor is made to serve as an input protection N+ diode. CONSTITUTION:When an N channel transistor 3 of a basic cell is employed as an output driver, the transistor 3 is used in such a manner that a gate signal is connected to an output driver gate control signal 2. The signal concerned is outputted from an inner logic circuit, and the drain is connected to the output terminal of an integrated circuit through an external connection signal wiring. When the N channel transistor 3 is employed as an input protection P+ diode, a gate signal is connected to VSS- and the gate of the transistor 3 is kept in an OFF state. In this case, the transistor 3 functions as a protective diode 6 in such a manner that if static electricity is applied to a negative side from the input terminal of the integrated circuit, it turns into a reverse current and absorbed, so that an input gate is protected. By this setup, an area required for an input protection pattern can be saved.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は多数個のベーシックセルを2次元行列状に配列
してなるマスタースライス半導体集積回路のゲートアレ
イ装置において、ベーシックセルのNチャンネルトラジ
スタのドレイン部を、マスタースライス分のガラスマス
ク変更により、入力保護用N+ダイオードにできるよう
にしていることに関するものである。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a gate array device for a master slice semiconductor integrated circuit in which a large number of basic cells are arranged in a two-dimensional matrix. This relates to the fact that the drain portion of the device can be made into an N+ diode for input protection by changing the glass mask for the master slice.

〔従来の技術〕[Conventional technology]

従来のマスタースライス半導体集積回路は、入力保護用
N+ダイオードを必要とする場合、外付にダイオードを
付けるか、内蔵されている場合、入力保護用N+ダイオ
ード専用形として存在していた。
In conventional master slice semiconductor integrated circuits, when an N+ diode for input protection was required, the diode was attached externally, or when the diode was built-in, it existed as a type exclusively for the N+ diode for input protection.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかし、前述の従来技術ではダイオードを外付し部品点
数が増えコスト高になるという課題があった。またダイ
オードが内蔵されている場合、入力保護用N+ダイオー
ド専用形として存在したため人出力セルの人力保護用パ
ターン面積が大きくなり、チップコスト高になるという
課題があった。
However, the above-mentioned conventional technology has a problem in that the diode is externally attached, which increases the number of parts and increases the cost. Further, in the case where a diode is built-in, there is a problem that the pattern area for human power protection of the human output cell becomes large because it exists as a type exclusively for the N+ diode for input protection, and the chip cost increases.

本発明はこの様な課題を解決するもので、その目的とす
るところは、多数個のベーシックセルを2次元行列状に
配列してなるマスタースライス半導体集積回路のゲート
アレイ装置において、ベーシックセルのNチャンネルト
ランジスタのドレイン部を、マスタースライス分のガラ
スマスク変更により、入力保護用N+ダイオードにでき
るマスタースライス半導体集積回路を提供することにあ
る。
The present invention is intended to solve such problems, and its purpose is to provide a gate array device for a master slice semiconductor integrated circuit in which a large number of basic cells are arranged in a two-dimensional matrix. An object of the present invention is to provide a master slice semiconductor integrated circuit in which the drain portion of a channel transistor can be made into an input protection N+ diode by changing the glass mask for the master slice.

〔課題を解決するための手段〕[Means to solve the problem]

本発明のマスタースライス半導体集積回路はマスタース
ライス半導体集積回路に内蔵されているベーシックセル
のNチャンネルトランジスタのドレイン部を、マスター
スライス分のガラスマスク変更により、人力保護用N+
ダイオードにできることを特徴とする。
In the master slice semiconductor integrated circuit of the present invention, the drain part of the N-channel transistor of the basic cell built in the master slice semiconductor integrated circuit is changed to a glass mask for the master slice, so that the N+
It is characterized by being able to function as a diode.

〔実 施 例〕〔Example〕

以下に本発明について、実施例に基づき詳細に説明する
The present invention will be described in detail below based on examples.

第1図は本発明の実施例を示すレイアウト図である。FIG. 1 is a layout diagram showing an embodiment of the present invention.

ベーシックセルのNチャンネルトランジスタ3を出力ド
ライバーとして使用する場合はゲート信号を出力ドライ
バーゲートコントロール信号2に接続して使用する。こ
の信号は内部論理回路からの出力信号である。また、ド
レインは外部接続信号配線Sにより集積回路の出力端子
に接続される。
When using the basic cell N-channel transistor 3 as an output driver, the gate signal is connected to the output driver gate control signal 2. This signal is an output signal from the internal logic circuit. Further, the drain is connected to the output terminal of the integrated circuit by an external connection signal wiring S.

また人力保護用N+ダイオードとして使用する場合はゲ
ート信号をvSS−に接続し、Nチャンネルトランジス
タ3のゲートをオフして使用する。
When used as an N+ diode for human power protection, the gate signal is connected to vSS-, and the gate of the N-channel transistor 3 is turned off.

この場合、NチャンネルトランジスタのドレインのN型
不純物拡散層とそれが形成されるP型ウェル(又はP型
基板込の間でPN接合ダイオードが形成される。また、
この時、内部接続信号配線4は、内部論理回路へ接続さ
れ、外部接続信号配線5は集積回路の入力端子に接続さ
れる。
In this case, a PN junction diode is formed between the N-type impurity diffusion layer of the drain of the N-channel transistor and the P-type well (or P-type substrate) in which it is formed.
At this time, the internal connection signal wiring 4 is connected to the internal logic circuit, and the external connection signal wiring 5 is connected to the input terminal of the integrated circuit.

人力保護用N+ダイオードとして使用する場合、第2図
に示すように保護ダイオード6として集積回路の入力端
子から一側に静電気が印加されても、逆方向電流となっ
て吸収されてしまい人力ゲートを保護する。
When used as an N+ diode for human power protection, as shown in Figure 2, even if static electricity is applied to one side from the input terminal of the integrated circuit as a protection diode 6, it will be absorbed as a reverse current and the human power gate will be blocked. Protect.

また、複数のベーシックセルでNチャンネルトランジス
タのゲートを接続し、ソース・ドレインを直列接続して
並列接続構成とし、接続数の大小で出力ドライバーの能
力を変えることができる。
Furthermore, by connecting the gates of N-channel transistors using a plurality of basic cells and connecting the sources and drains in series to form a parallel connection configuration, the output driver ability can be changed by changing the number of connections.

本発明では、各Nチャンネルトランジスタのゲート信号
の接続や、複数のPチャンネルトランジスタのソース・
ドレイン間の接続及びゲートの共通接続をマスタースラ
イス分のガラスマスク変更により必要に応じて配線を形
成して行なう。
In the present invention, the connection of the gate signal of each N-channel transistor and the connection of the source signal of multiple P-channel transistors,
Connections between drains and common connections between gates are made by changing the glass mask for the master slice and forming wiring as necessary.

〔発明の効果〕〔Effect of the invention〕

上述の如く本発明の回路構成をもったマスタースライス
半導体集積回路によれば、ベーシックセルのNチャンネ
ルトランジスタのドレイン部を、マスタースライス分の
ガラスマスク変更により、人力保護用N+ダイオードに
できるためチップ面積の縮小化が可能となるコストパフ
ォーマンスの優れた集積回路になる。
According to the master slice semiconductor integrated circuit having the circuit configuration of the present invention as described above, the drain part of the N-channel transistor of the basic cell can be made into an N+ diode for human power protection by changing the glass mask for the master slice, thereby reducing the chip area. This results in an integrated circuit with excellent cost performance that can be downsized.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例を示すレイアウト図である。 第2図は入力保護用N+ダイオードとして使用する場合
を示す図。 1 ・ ・ ・ 2 目 ・ 3・ − 5・ i 7 ・ 8 @ スイッチ 出力ドライバーゲートコントロール 信号 Nチャンネルトランジスタ 内部接続信号配線 外部接続信号配線 入力保護用N+ダイオード 内部接続信号配線 外部接続信号配線 以上
FIG. 1 is a layout diagram showing an embodiment of the present invention. FIG. 2 is a diagram showing the case where it is used as an N+ diode for input protection. 1 ・ ・ ・ 2nd ・ 3 ・ − 5 ・ i 7 ・ 8 @ Switch output driver Gate control signal N channel transistor internal connection signal wiring External connection signal wiring Input protection N+ diode Internal connection signal wiring External connection signal wiring and above

Claims (1)

【特許請求の範囲】[Claims] (1)a)多数個の内部論理ゲートセル(以下ベーシッ
クセルと略す)を2次元行列状に配列してなるマスター
スライス半導体集積回路において、b)ベーシックセル
のNチャンネルトランジスタと c)前記Nチャンネルトランジスタを並列に複数個接続
させ d)前記Nチャンネルトランジスタのドレイン部を、入
力保護用N+ダイオードにできるようにしていることを
特徴とするマスタースライス半導体集積回路。
(1) a) a master slice semiconductor integrated circuit formed by arranging a large number of internal logic gate cells (hereinafter referred to as basic cells) in a two-dimensional matrix, b) an N-channel transistor of the basic cell; and c) the N-channel transistor. A master slice semiconductor integrated circuit, characterized in that a plurality of d) are connected in parallel so that the drain portion of the N-channel transistor can be used as an N+ diode for input protection.
JP30520989A 1989-11-25 1989-11-25 Master slice semiconductor integrated circuit Pending JPH03165565A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30520989A JPH03165565A (en) 1989-11-25 1989-11-25 Master slice semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30520989A JPH03165565A (en) 1989-11-25 1989-11-25 Master slice semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPH03165565A true JPH03165565A (en) 1991-07-17

Family

ID=17942368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30520989A Pending JPH03165565A (en) 1989-11-25 1989-11-25 Master slice semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPH03165565A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160052288A (en) * 2014-11-04 2016-05-12 엘이디라이팅 주식회사 Led flood light
KR101648412B1 (en) * 2016-05-17 2016-08-16 (주)강산조명 Led lamp device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160052288A (en) * 2014-11-04 2016-05-12 엘이디라이팅 주식회사 Led flood light
KR101648412B1 (en) * 2016-05-17 2016-08-16 (주)강산조명 Led lamp device

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