JPH03165033A - Apparatus for lifting substrate from super pure water and drying substrate - Google Patents

Abstract

PURPOSE:To decrease impurity ions, particulates and organic materials in pure water and to improve the drying quality of substrates by providing super-pure-water manufacturing unit in or by an apparatus for lifting a substrate from super pure water and drying the substrate, manufacturing super-pure water in the vicinity of a point use, and supplying the super-pure water into a pure water tank. CONSTITUTION:A super-pure-water manufacturing unit 2 is composed of a tank 11, a pump 12, an active carbon cartridge 13, an ion-exchange cartridge 14 and a membrane filter 15. In this unit, the active carbon cartridge 13 mainly removed organic materials in the pure water. The ion-exchange cartridge 14 removes impurity ions. The membrane filter cartridge 15 removes particulates. Thus the super-pure water is manufactured. The super-pure water is supplied into a pure water tank 3 through a pure-water heating unit 4. Since all the liquid contact parts of the pure water tank 3, the pure-water heating unit 4 and the piping systems for these parts are made of Teflon, the quality of the water is hardly changed in the pure water an tank. In this way, impurity ions, particulates and organic materials in the pure water can be decreased, and the drying quality of the substrates can be improved.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention is used in the drying process after cleaning of semiconductor silicon substrates, photomasks, liquid crystal panel glass substrates, optical lenses, etc. (hereinafter simply referred to as substrates). Related to pure water pulling and drying equipment.

[Conventional technology]

Conventionally, by lifting a substrate from a pure water tank at very low speed, the high surface tension of water is used to make the water film that adheres to the substrate as uniformly thin as possible.
In the pure water drying method, which uses external heat to dry the product, the pure water supplied to the pure water tank was ordinary level pure water.

Furthermore, this pure water was generally supplied directly from the pure water supply piping of the factory to the pure water tank of the pure water pulling and drying device.

[Problem to be Solved by the Invention 1] However, in the deionized water pulling drying method, a thin film of water remains on the substrate surface, and in order to dry this, high drying quality is not required as with semiconductor silicon substrates. , the quality of pure water becomes an issue. Even though it is pure water, it is not pure water, and ordinary pure water still contains impurity ions, fine particles, and organic substances, and the amount of these substances affects the drying quality. In particular, since pure water does not dissolve organic substances, once the organic substances in pure water adhere to the substrate, they remain as they are. This point is different from fluorocarbons and alcohols, and when there is a large amount of TOC (total organic matter) in pure water, pure water pulling drying has the problem that the drying quality is lower than that of fluorocarbons or alcohol vapor drying.

In addition, since pure water is produced centrally in a pure water production equipment as factory equipment and sent to the point of use via factory piping, there is a problem that the quality of the water deteriorates before it reaches the pure water tank of the pure water pulling and drying equipment. .

Therefore, in order to solve these conventional problems, the present invention uses ultrapure water as the pure water supplied to the pure water tank of the pure water pulling and drying device, reduces impurity ions, fine particles, and organic substances in the pure water, The purpose is to improve the drying quality of the substrate.

[Means for Solving the Problems] The ultrapure water pulling and drying device of the present invention is a deionized water pulling and drying device that pulls up a substrate from a pure water tank at very low speed and dries it, in which the pure water supplied to the pure water tank is mixed with ultrapure water. It is characterized by

In addition, in the above ultrapure water pulling and drying equipment, an ultrapure water production unit is installed inside or beside the ultrapure water pulling and drying equipment, and ultrapure water is produced near the point of use and supplied to the pure water tank. It is characterized by the following.

[For production]

According to the above configuration of the present invention, impurity ions, fine particles, and organic substances in the pure water in the pure water tank for pulling and drying the pure water can be reduced, and impurity ions, fine particles, and organic substances in the thin water film remaining on the substrate surface can also be reduced. Therefore, the drying quality when drying this can also be improved.

[Embodiment] FIG. 1 is a schematic diagram of an embodiment of the present invention, which is composed of an ultrapure water pulling and drying device main body 1 and an ultrapure water production unit 2 installed beside it. The ultrapure water pulling and drying device main body 1 includes a pure water tank 3, a pure water heating unit 4, a far infrared drying oven 5, a clean bench 8 equipped with a transfer robot 6 and a clean unit 7. Ultrapure water production unit 2
1 is a device for changing pure water to ultrapure water, and is composed of a tank 11, a pump 12, an activated carbon cartridge 13, an ion exchange cartridge 14, and a membrane filter 15. Here, the activated carbon cartridge 13 mainly removes organic matter from pure water, the ion exchange cartridge 14 removes impurity ions, and the membrane filter cartridge 15 removes fine particles. At the outlet of this unit, pure water has a specific resistance of 18 MΩcm.
Above, TOC (total organic matter) 20PPb or less, fine particles 0
．． The ultra-pure water has a level of zero over 5 um and 3 over 0.3 um/CC. This ultrapure water is supplied to the pure water tank 3 through the pure water heating unit 4.
The pure water heating unit 4 and these piping systems are all made of Teflon, so the water quality hardly changes even in the pure water tank.However, as the heating temperature of the pure water heating unit 4 is raised, the water quality deteriorates. , below 40°C.

In the above configuration, the cassette 10 containing the substrate 9 is
The substrate is lifted out of the pure water tank 3 at a very low speed by the transfer robot 6 and dried in the heat capacity of the substrate or in the far-infrared drying oven 5. The drying quality of the substrate pulled and dried using the above-mentioned level of ultrapure water is on the same level as that of fluorocarbon or alcohol vapor drying.

In this embodiment, the removal of organic matter is carried out only by activated carbon force, but if an organic matter oxidation device using ultraviolet rays is incorporated, it is possible to further lower the level of TOC (total organic matter).

In addition, in this example, the ultrapure water production unit is installed beside the ultrapure water pulling and drying device, but if the same level of ultrapure water is supplied to the pure water tank from the factory piping, There is no need to install an ultrapure water production unit.

〔Effect of the invention〕

As explained above, the present invention reduces impurity ions, fine particles, and organic matter in the pure water by using ultrapure water as the pure water supplied to the pure water tank of the pure water pulling and drying device, thereby improving the drying quality of the substrate. It has the effect of improving

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram of the ultrapure water pulling and drying apparatus of the present invention. Ultrapure water pulling and drying equipment main body Ultrapure water production unit pure water tank Pure water heating unit Far infrared drying oven Transfer robot clean unit Clean bench substrate cassette tank pump ・Activated carbon cartridge l　4　・ ・Ion exchange cartridge 5 ・Membrane filter Below Up

Claims (2)

[Claims] (1) An ultrapure water pulling and drying device that lifts and dries a substrate from a pure water tank at very low speed, characterized in that the pure water supplied to the pure water tank is ultrapure water. (2) In the ultrapure water pulling and drying apparatus according to claim 1, an ultrapure water production unit is installed in or beside the ultrapure water drawing and drying apparatus, and ultrapure water is produced near the point of use, and the ultrapure water is purified. A device for pulling and drying ultrapure water, characterized in that it is configured to supply water to an aquarium.