JPH03164241A - Preparation of metal foil-laminated continuous length - Google Patents
Preparation of metal foil-laminated continuous lengthInfo
- Publication number
- JPH03164241A JPH03164241A JP30565189A JP30565189A JPH03164241A JP H03164241 A JPH03164241 A JP H03164241A JP 30565189 A JP30565189 A JP 30565189A JP 30565189 A JP30565189 A JP 30565189A JP H03164241 A JPH03164241 A JP H03164241A
- Authority
- JP
- Japan
- Prior art keywords
- metal foil
- heat
- resin
- resin layer
- resistant film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 43
- 239000002184 metal Substances 0.000 title claims abstract description 43
- 229920005989 resin Polymers 0.000 claims abstract description 69
- 239000011347 resin Substances 0.000 claims abstract description 69
- 239000011888 foil Substances 0.000 claims abstract description 43
- 229920001721 polyimide Polymers 0.000 claims abstract description 13
- 239000004962 Polyamide-imide Substances 0.000 claims abstract description 11
- 229920002312 polyamide-imide Polymers 0.000 claims abstract description 11
- 239000009719 polyimide resin Substances 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 10
- 239000003960 organic solvent Substances 0.000 claims description 9
- 238000004804 winding Methods 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 abstract description 7
- 239000002904 solvent Substances 0.000 abstract description 7
- 239000002075 main ingredient Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 37
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 239000011889 copper foil Substances 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 8
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 229920006015 heat resistant resin Polymers 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000004963 Torlon Substances 0.000 description 3
- 229920003997 Torlon® Polymers 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 241000219112 Cucumis Species 0.000 description 2
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- ICLCCFKUSALICQ-UHFFFAOYSA-N 1-isocyanato-4-(4-isocyanato-3-methylphenyl)-2-methylbenzene Chemical compound C1=C(N=C=O)C(C)=CC(C=2C=C(C)C(N=C=O)=CC=2)=C1 ICLCCFKUSALICQ-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- OONPLQJHBJXVBP-UHFFFAOYSA-N 3-(2-phenylethenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=CC=2C=CC=CC=2)=C1C(O)=O OONPLQJHBJXVBP-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229920001646 UPILEX Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 210000004556 brain Anatomy 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010981 drying operation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- -1 polysiloxane Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は、たとえばフレキシブル配線基E答に用いる
ことのできる、金属箔積層長尺体の製遣方法に関するも
のである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for manufacturing a long metal foil laminate body that can be used, for example, in a flexible wiring board.
[従来の技術]
フレキシブル配線仮は、可撓性を有する印刷回貼阪であ
り、近年、電子回路のl専型化および軽量化の要請に応
えて多用されてきている。[Prior Art] Flexible wiring is a flexible printed circuit board, and has been widely used in recent years in response to demands for specialized electronic circuits and weight reduction.
ここでフレキシブル配線板は、いわゆるフレキシブル四
路板(FPC)、フラットケーブル、およびテープオー
トメーテッドボンディング(TAB)川の回路板などを
含むものの総称である。Here, the flexible wiring board is a general term that includes so-called flexible four-way boards (FPC), flat cables, tape automated bonding (TAB) circuit boards, and the like.
従来の配線板の製遣方法は、たとえばデュポン社製カブ
トンのようなポリイミドフィルムと銅箔を接着剤層を介
して加熱し加圧下に鮎り合わせポリイミドフィルム銅張
板からエッチング加工により製遣している。The conventional manufacturing method for wiring boards is to heat a polyimide film such as DuPont's Kabuton and copper foil through an adhesive layer, and then press them together under pressure.The polyimide film is then etched from a copper-clad board. ing.
また、従来のもう1つの製遣方法は、たとえばポリイミ
ド前駆体であるポリアミド酸溶液のような耐熱性樹脂溶
液を、銅箔の上に流延・塗布し、その後これを乾燥・硬
化して銅張積層板からエッチング加工により製造してい
る。Another conventional manufacturing method is to cast and apply a heat-resistant resin solution such as a polyamic acid solution, which is a polyimide precursor, onto copper foil, and then dry and harden it to form a copper foil. Manufactured from stretched laminate by etching.
■の製造方法の場合、耐熱性フィルムと銅箔の貼り合わ
せに使用する接着剤の耐熱性に制約を受けるため、耐熱
性フィルムが有する本来の優れた耐熱性をそのまま発F
itすることができなという問題があった。In the case of manufacturing method (2), there are restrictions on the heat resistance of the adhesive used to bond the heat-resistant film and the copper foil, so the original excellent heat resistance of the heat-resistant film can be maintained as is.
There was a problem that it could not be done.
■の製造方法の場合には、銅箔上へ耐熱樹脂フィルム層
が直接形威されるので、■の製造方法のような欠点はな
い。In the case of the manufacturing method (2), the heat-resistant resin film layer is directly formed on the copper foil, so there is no drawback as in the manufacturing method (2).
[発明が解決しようとする課題]
しかしながら、■のh゛法では、いイつゆる両面張りと
称される、耐熱性樹脂フィルム層の両側に金属箔を積層
した長尺の積層板を製逍することは困難であった。これ
は、耐熱性フィルムに直接金属箔を積層するためには、
そのフィルムの軟化点以上に加熱しなければならないか
らである。[Problems to be Solved by the Invention] However, in the h method of (1), a long laminate is produced in which metal foil is laminated on both sides of a heat-resistant resin film layer, which is called double-sided laminate. It was difficult to do so. This means that in order to laminate metal foil directly onto a heat-resistant film,
This is because the film must be heated above its softening point.
それゆえに、この発明の目的は、耐熱性樹脂溶液を金属
箔上に塗布する方法であって、いわゆる雨而張りと称さ
れる金属箔積層長尺体を容易に得ることのできる方法を
択供することにある。Therefore, an object of the present invention is to provide a method for applying a heat-resistant resin solution onto metal foil, which can easily produce a long metal foil laminated body called "Ameji-bari". There is a particular thing.
[課題を解決するための手.段]
この発明の製造方法は、金屈箔または耐熱性フ,fルム
の少なくとも一方の向に、有機溶剤可溶性のポリイミド
樹脂および/またはポリアミドイミド樹脂を主成分とす
る樹脂のn゜機溶剤溶液を塗布し、揮発分含右量が1〜
301m%となるように乾燥させて樹脂脳を形成する王
提と、樹脂層が形成された金属箔または耐熱性フィルム
の曳数を、樹脂層が耳いに対向するように重ね合わせる
か、あるいは、金属箔または耐熱性フィルムの樹脂層の
上に他の金属箔または耐熱性フィルムを重ね合わせてロ
ール状に巻取る王程と、ロール状に巻取った金属箔積層
体を150℃〜250℃に加熱して前記樹脂層中の有機
溶剤を除去する工程とを備えている。[A way to solve problems. [Step] The manufacturing method of the present invention includes applying an organic solvent solution of a resin containing an organic solvent-soluble polyimide resin and/or a polyamide-imide resin as a main component to at least one side of the gold foil or the heat-resistant film. with a volatile content of 1~
The resin layer is dried to 301 m% to form a resin brain, and the metal foil or heat-resistant film on which the resin layer is formed are overlapped so that the resin layer faces the ear hole, or , a process in which another metal foil or heat-resistant film is overlaid on a resin layer of metal foil or a heat-resistant film and wound into a roll, and a metal foil laminate wound into a roll is heated at 150°C to 250°C. and a step of heating to remove the organic solvent in the resin layer.
この発明に用いられる有機溶剤可溶性のポリイミド樹脂
および/またはポリアミドイミド樹脂は、従来より公知
の直接法(酸無水物とアミンの反応)、酸クロライド法
およびイソシアネート法などで製造することができる。The organic solvent-soluble polyimide resin and/or polyamideimide resin used in the present invention can be produced by conventionally known direct methods (reaction of acid anhydride and amine), acid chloride methods, isocyanate methods, and the like.
使用することのでる単量体の例を、酸或分およびアミン
成分の形でド紀に示すが、アミン成分としてこれらのイ
ソシアネ−1・、酸成分としてこれらの酸無水物および
酸塩化物も用いることができる。Examples of monomers that can be used are shown in the following in the form of acid and amine components, but these isocyanes-1 as amine components and their acid anhydrides and acid chlorides as acid components are also included. Can be used.
アミン成分としては、p−フ二二レンジアミン、rl1
−フエニレンジアミン、4.4’ −ジアミノジフエニ
ルエーテル、4.4’ −ジアミノジフエニルメタン、
4.4’ −ジアミノージフエニルスルホン、4.4’
−ジアミノベンゾフエノン、2.27−ビス(4−アミ
ノフエニル)プロパン、2,4−トリレンジアミン、2
.6−1−リレンジアミン、p−キシリレンジアミン、
m−キシリレンジアミン、イソホロン、ヘキサメチレン
ジアミンなどが挙げられる。As the amine component, p-phenyl diamine, rl1
-phenylenediamine, 4.4'-diaminodiphenyl ether, 4.4'-diaminodiphenylmethane,
4.4'-diaminodiphenylsulfone, 4.4'
-diaminobenzophenone, 2,27-bis(4-aminophenyl)propane, 2,4-tolylenediamine, 2
.. 6-1-lylene diamine, p-xylylene diamine,
Examples include m-xylylene diamine, isophorone, hexamethylene diamine, and the like.
酸成分としては、テレフタル酸、イソフタル酸、トリメ
リット酸、4.4’ −ビフエニルジカルボン酸、ピロ
メリット醪、3.3’ .4.4’ −ベンゾフ工ノン
テトラカルボン酸、3.3’ ,4.4′−ビフェニル
スルホンテトラカルボン酸、アジピン酸、セバシン酸、
マレイン酸、フマール酸、ダイマー酸、スチルベンジカ
ルボン酸などが挙げられる。As acid components, terephthalic acid, isophthalic acid, trimellitic acid, 4.4'-biphenyldicarboxylic acid, pyromellitic moromi, 3.3'. 4.4'-benzofonic nontetracarboxylic acid, 3.3',4.4'-biphenylsulfonetetracarboxylic acid, adipic acid, sebacic acid,
Examples include maleic acid, fumaric acid, dimer acid, and stilbene dicarboxylic acid.
この発明に用いることのできる金属箔としては、銅箔、
アルミニウム箔、ニッケル済、鉄箔などがあり、これら
の箔の表面が他の金属(たとえば亜鉛、クロム、ニッケ
ルなど)や酸化物で処理されていてもよい。金属箔の厚
さは、通常1μm〜100μmが好ましい。Metal foils that can be used in this invention include copper foil,
There are aluminum foils, nickel coated foils, iron foils, etc., and the surfaces of these foils may be treated with other metals (for example, zinc, chromium, nickel, etc.) or oxides. The thickness of the metal foil is usually preferably 1 μm to 100 μm.
また、大質上アニール処理されていない金属箔を用い、
この発明の最終的な加熱工堤においてアニールを同時に
行なうことも好ましい態様の1つである。In addition, using metal foil that has not been annealed in quality,
It is also one of the preferred embodiments to simultaneously perform annealing in the final heated embankment of this invention.
この発明に用いることのできる耐熱性フィルムとしては
、たとえば、ポリイミド、ポリアミドイミド樹脂などの
イミド系樹脂、ポリアミド系樹脂、ポリエーテルエーテ
ルケl・ンなどのポリエーテルケ1・ン系樹脂、ポリエ
ーテルスルホンなどのスルホン系樹脂、ボリテ1・ラフ
ルオロエチレンなどのフッ素系樹脂、ボリシロキサンな
どのシリコーン系樹脂などのいわゆる耐熱性樹脂から形
成されたフィルムやシート状のものがある。耐熱性フィ
ルムの厚さとしては、通常1μm〜100μmが好まし
い。Examples of heat-resistant films that can be used in the present invention include polyimide, imide resins such as polyamideimide resins, polyamide resins, polyether ketone resins such as polyether ether ketone, polyether sulfone, etc. There are films and sheets made of so-called heat-resistant resins such as sulfone resins, fluororesins such as Volite 1 and lafluoroethylene, and silicone resins such as polysiloxane. The thickness of the heat-resistant film is usually preferably 1 μm to 100 μm.
この発明において、ポリイミドおよび/またはポリアミ
ドイミド樹脂を溶解するための何機溶剤としては、ジメ
チルホルムアミド、ジメチルアセトアミド、N−メチル
−2−ビロリドン、エチルセルソルブ、ジエチレングリ
コールジメチルエーテル、m−クレゾール、0−クロル
フェノールなどがある。また希釈剤としては、アセトン
、トルエン、キシレン、ソルベッソ、ジオキサン、テト
ラヒド口フランなどを任意に用いることができる。In this invention, the solvent for dissolving polyimide and/or polyamideimide resin includes dimethylformamide, dimethylacetamide, N-methyl-2-pyrrolidone, ethyl cellosolve, diethylene glycol dimethyl ether, m-cresol, 0-chloro There are phenols, etc. Further, as the diluent, acetone, toluene, xylene, Solvesso, dioxane, tetrahydrofuran, etc. can be used arbitrarily.
この允明において、金属箔や耐熱性フィルムに樹脂の有
機溶剤溶液を塗工する方法は、従来から公知の方法を適
用することができ、ロールコータ、ナイフコータ、およ
びドクターブレードコータなどを利用することができる
。溶剤を含む塗工膜の厚さは、10μm〜500μmが
奸ましく、さらに好ましくは100μm〜300μmで
ある。また、塗工および乾燥をkV数同繰返し重ね塗り
することも可能である。また、この場合塗エする樹脂の
種類を変えることもこの発明に含まれる。In this case, conventionally known methods can be applied to coat metal foil or heat-resistant film with an organic solvent solution of resin, and roll coaters, knife coaters, doctor blade coaters, etc. can be used. Can be done. The thickness of the coating film containing the solvent is preferably 10 μm to 500 μm, more preferably 100 μm to 300 μm. It is also possible to repeat coating and drying for the same number of kV. Further, in this case, changing the type of resin to be applied is also included in the present invention.
乾燥の操作は、この発明の重要なポイントの1つであり
、金属箔または耐熱性フィルム上に塗工した樹脂層の揮
発分含H量を1〜30重ユ%に詞整する必要がある。揮
発分含b’ulが1重量%未満では、樹脂層が十分な接
着性を”aさず、加熱接着する必要が生じる。また揮発
分含有斂が30重量%を越えると、積層体の内部にトド
発性の有機溶剤が残/7L..たり、気泡が生成し、フ
レキシブルプリント払仮として好ましくないしのとなる
。The drying operation is one of the important points of this invention, and it is necessary to adjust the volatile content H of the resin layer coated on the metal foil or heat-resistant film to 1 to 30% by weight. . If the volatile content b'ul is less than 1% by weight, the resin layer will not have sufficient adhesion and it will be necessary to heat-bond it.If the volatile content b'ul exceeds 30% by weight, the inside of the laminate will 7L of todo-generating organic solvent remains or bubbles are formed, making it undesirable as a flexible printable paper.
この発明においては、樹脂層が形戊された金屈箔耐熱性
フィルムをLiいに重ね合わせるか、あるいは他の金属
箔または耐熱性フィルムを重ね合イつせる前の段階にお
いて、樹脂層山部の揮発性脊機溶剤を樹脂層の表向に移
動させておくことが好ましい。このような移動のために
、金属済かまたは耐熱性フィルム側に加熱ロールなどを
接触させて、煽側から加熱することはこの発明の好まし
い態様の1つである。In this invention, the peaks of the resin layer are stacked on top of each other, or before stacking other metal foils or heat-resistant films on top of each other. It is preferable to move the volatile solvent to the surface of the resin layer. For such movement, one preferred embodiment of the present invention is to bring a heating roll or the like into contact with the metal or heat-resistant film side and heat it from the fan side.
この発明においては、樹脂層が形或された金属箔または
耐貼性フィルムの庚数を、樹脂層が互いに対向するよう
に重ね合わせるか、あるいは、金属箔または耐熱性フィ
ルムの樹脂喘の上に他の金属箔または耐熱性フィルムを
重ね合わせる。このような重ね合わせの王程において重
ね合わせた金属箔または耐熱性フィルムを1χ・lのロ
ール間に挾み、加熱および加圧しながら重ね合わせるこ
とが好ましい。もちろん、単に重ね合わせて巻取るだけ
でもよい。In this invention, the metal foil or heat-resistant film formed with a resin layer is stacked on top of each other so that the resin layers face each other, or on top of the resin layer of the metal foil or heat-resistant film. Overlay with other metal foil or heat-resistant film. In this overlapping process, it is preferable that the overlapping metal foils or heat-resistant films are sandwiched between 1.chi..l rolls and overlapped while being heated and pressurized. Of course, it is also possible to simply overlap them and wind them up.
次に、ロール状に金属箔積層体を150℃〜250℃に
加熱する。この加熱の間に、樹脂層中に含まれる揮発性
有機溶剤が除去される。加熱時間は、巻取った金属箔成
形体のロール状体の幅や、樹脂層中に残77シている溶
剤量および温度などに関係するが、通常は3時間〜20
時間程度加熱状態を保たなければならない。この加熱の
際窒素などの不活性雰囲気ド、あるいは減圧下で加熱す
ることが好ましい。Next, the metal foil laminate is heated in roll form to 150°C to 250°C. During this heating, volatile organic solvents contained in the resin layer are removed. The heating time is related to the width of the rolled metal foil molded body, the amount of solvent remaining in the resin layer, the temperature, etc., but is usually 3 hours to 20 hours.
It must be kept heated for about an hour. During this heating, it is preferable to heat in an inert atmosphere such as nitrogen or under reduced pressure.
加熱後の樹脂層の厚みは、通常1μm〜150μmが好
ましく、さらに好ましくは5μm〜50μn1である
この発明により製逍される金属箔積層長尺体の摺成は、
樹脂jφを挾み金属箔または耐ハ性フィルムが積層され
ていれば特に限定されるものではない。たとえば耐熱性
フィルムをF、樹脂層をR、企属箔をMとすれば、以下
のような構成のものが含まれる。The thickness of the resin layer after heating is generally preferably 1 μm to 150 μm, more preferably 5 μm to 50 μm.
There is no particular limitation as long as metal foil or a film-resistant film is laminated between the resin jφ. For example, if the heat-resistant film is F, the resin layer is R, and the foil is M, the following configurations are included.
F/R/M
M/R/F/R/M
M/R/M/R/M
M/R/M
このようにして得られた金属箔枯層長尺体は、従来より
公知のサブトラクテ,fブl去などにより配線仮に加工
することができる。F/R/M M/R/F/R/M M/R/M/R/M M/R/M The metal foil dry layer elongated body obtained in this way is processed by conventionally known subtracting techniques, The wiring can be temporarily processed by f-blowing or the like.
また、この発明においては、樹脂図の諸特性、たとえば
接青性、耐熱性、磯城特性、電気特性、および熱融着性
などを改良する1−1的で、他の樹脂、有機化合物およ
び無機化合物等をu合および/または反応させてυE用
することができる。たとえば、エボキシ化合物、シリコ
ーン化語物、およびフッ素化合物などの樹脂やh゛機化
a物、酸化珪素、酸化チタン、および炭酸カルシウムな
どの無機化合物などを、この発明の目的を阻害しない範
囲、すなわち通常、樹脂同;じ分に対し1重瓜%〜30
重量96で併用することができる。In addition, in this invention, other resins, organic compounds, and inorganic υE can be used by combining and/or reacting compounds and the like. For example, resins such as epoxy compounds, silicone compounds, and fluorine compounds, and inorganic compounds such as organic compounds, silicon oxide, titanium oxide, and calcium carbonate may be used within the range that does not impede the purpose of the present invention, i.e. Normally, 1 weight melon% to 30% for the same amount of resin.
It can be used in combination with a weight of 96.
[発明の作用効果]
この発明では、高融点、高ガラス転移点の耐熱性樹脂層
に少量の有機溶剤を含有させることによって、可塑化し
、融点およびガラス転移点以ドの温度で熱接着させるも
のである。熱接着後、樹脂層に残存している有機溶媒は
、ロール状に巻取られた状態で、長時間加熱することに
より、拡散除表される。[Operations and Effects of the Invention] In this invention, a heat-resistant resin layer with a high melting point and a high glass transition point is plasticized by containing a small amount of an organic solvent, and is thermally bonded at a temperature below the melting point and the glass transition point. It is. After thermal bonding, the organic solvent remaining in the resin layer is diffused and removed by heating the resin layer for a long time while the resin layer is wound up into a roll.
この発明の方法では、金屈済または耐熱性フィルム上に
杉成した樹脂雇により金属済または耐熱性フィルムを接
着させるものであるで、従来の接着剤を用いる方法より
も冶,い耐想性が得られ、またいわゆる両市張りの金属
箔積層長尺体を容易にiりることかできる。In the method of this invention, a metal or heat-resistant film is bonded to a metal or heat-resistant film using a resin layer formed on the metal or heat-resistant film. is obtained, and it is also possible to easily cut a so-called double-sided metal foil laminated elongated body.
このため、この発明の製造方法は、フレキシブル配線板
などの製遣方法として広< 111用され得るものであ
る。Therefore, the manufacturing method of the present invention can be widely used as a manufacturing method for flexible wiring boards and the like.
[実施例コ 以下に示す?6はすべてIn%を愈味する。[Example code] It is shown below? 6 all enjoy In%.
実施例]
長尺で厚さが35μmである電解銅箔(日本鉱業製JT
C箔)の上に、固形分20%の市販ポリアミドイミド樹
脂(商品名:トーロン4000T)のN, N−ジメチ
ルアセトアミド(DMAc)溶液を、厚みが1 5 0
It IT+となるようにコンマコー夕にて流延塗布
した。塗布後、80℃に設定されたトンネル炉内を約4
分間で通過させた。このときの樹脂層の揮発分含有量は
15%であった。Example] A long electrolytic copper foil with a thickness of 35 μm (JT manufactured by Nippon Mining Co., Ltd.
A solution of commercially available polyamide-imide resin (trade name: Torlon 4000T) with a solid content of 20% in N,N-dimethylacetamide (DMAc) was placed on top of the C foil to a thickness of 150.
It was cast and coated using a comma coat so that it became IT+. After coating, the inside of the tunnel furnace set at 80℃ was heated for about 4 hours.
Passed it in minutes. The volatile content of the resin layer at this time was 15%.
このようにして得られた積層体(1)の樹脂層の上にポ
リイミドフィルム(商品名:カプトン100H)を重ね
、150℃、60kg/Cm20.5m/minでロー
ルラミネーションにより、貼り合わせて積層体(n)を
作製した。次に、この積層体(n)のフィルム面の上に
、予め製遣しておいた積層体(1)の樹脂雇の面が対向
するように重ね合わせ、150゜C、60kg/am2
0.5m/minでロールラミネーションし、巻取った
。A polyimide film (trade name: Kapton 100H) was layered on the resin layer of the laminate (1) thus obtained, and the laminate was laminated by roll lamination at 150°C and 60 kg/cm at 20.5 m/min. (n) was produced. Next, on the film surface of this laminate (n), the laminate (1) prepared in advance was placed so that the resin side faced to each other, and heated at 150°C and 60 kg/am2.
Roll lamination was carried out at 0.5 m/min and the film was wound up.
得られたロール状体を160℃に加温された熱風乾燥機
で15時間加熱し、長尺の両面フレキシブル印刷回路用
風板を得た。この両面フレキシブル印刷回路用配線基板
について、外観、接着強度、’I’−ITJ耐熱および
エッチング後の外観を評価した。The obtained roll-shaped body was heated in a hot air dryer heated to 160° C. for 15 hours to obtain a long double-sided flexible printed circuit air plate. This double-sided flexible printed circuit wiring board was evaluated for appearance, adhesive strength, 'I'-ITJ heat resistance, and appearance after etching.
接着強度は、引張速度50mm/分で90゜剥離を行な
い7lpj定した。また十111耐熱は、260℃の半
川浴に浮かべ、膨れ剥がれが発生するまでの所堡時間を
測定し評価した。結果を第1表に示す。The adhesive strength was determined to be 7 lpj by peeling at 90° at a tensile speed of 50 mm/min. The heat resistance of 1111 was evaluated by floating the sample in a half-river bath at 260° C. and measuring the time it took for the sample to swell and peel. The results are shown in Table 1.
実施例2
(ポリアミドイミド樹脂の製造)
温度計、撹拌装置、還流コンデンサおよび窒素導入管を
備えた4っ■セバラブルフラスコに、無水トリメリット
酸19.28g (0.10モル)、2.4−トリレン
ジイソシアネート(2.4−TDI)3.5L)g (
0.02モル)、ビトリレンジイソシアネート(TOD
I)21.10g (0.08モル)を、N−メチル−
2−ビロリドン(NMP)150gに加え、撹押しなが
ら160℃まで1]I.1間で昇瓜し、さらに160゜
Cで5 ■,lr間反応させた。得られたポリマーのN
MP中での対数粘度は1.81であった。Example 2 (Manufacture of polyamide-imide resin) 19.28 g (0.10 mol) of trimellitic anhydride and 2.4 g of trimellitic anhydride were placed in a 4-separable flask equipped with a thermometer, a stirring device, a reflux condenser, and a nitrogen inlet tube. -Tolylene diisocyanate (2.4-TDI) 3.5 L) g (
0.02 mol), bitolylene diisocyanate (TOD
I) 21.10 g (0.08 mol) of N-methyl-
Add to 150 g of 2-pyrrolidone (NMP) and heat to 160° C. with stirring. The mixture was heated for 1 hour and further reacted at 160°C for 5 hours. N of the obtained polymer
Logarithmic viscosity in MP was 1.81.
(積)φ体の製巡)
ポリアミドイミド樹脂のN M P溶lfkに、市販の
エボキシ樹脂(商品名,エピコート1 54)を10?
6配合し、NMPを加えて15%溶戚とした。(Product) Production of φ body) Add 10% of commercially available epoxy resin (trade name, Epicoat 154) to NMP solution lfk of polyamideimide resin.
6 and added NMP to make a 15% solution.
この溶液を丈施例1と同様に、流延塗酊し、次いで10
0℃に設定されたトンネル炉内を連過させた。このとき
の樹脂層の揮発分含ら゜量は2896であった。このよ
うにして1′}られた債層体の樹脂層同士を互いに対向
させて重ね合わせ、150℃、60kg/cm2、0.
5m/m i nでロールラミネーションし巻取った。This solution was cast in the same manner as in Example 1, and then
The mixture was continuously passed through a tunnel furnace set at 0°C. The volatile content of the resin layer at this time was 2,896. The resin layers of the bond layer body thus prepared were stacked facing each other, and then heated at 150°C, 60kg/cm2, and 0.5°C.
It was roll laminated and wound up at 5 m/min.
得られたロール状物を200℃に加温された熱風乾燥機
にて20時間加熱し、長尺の両面フレキシブル印刷回路
用基板を得た。この両面フレキシブル印刷回路用基板の
lP価を失施例1と同様にして行なった。拮果を第1表
に示す。The obtained roll-shaped product was heated in a hot air dryer heated to 200° C. for 20 hours to obtain a long double-sided flexible printed circuit board. The IP value of this double-sided flexible printed circuit board was determined in the same manner as in Example 1. The results are shown in Table 1.
丈施例3
丈施例1で用いた市販のポリアミドイミド樹脂(商品名
:トーロン4000T)の因形分20%DMAc溶1f
kにエポキシ樹脂(商品名:エピコート154)を2U
%を配合し、実施例lと同様にして積層体を製逍した。Length Example 3 A 20% DMAc solution of the commercially available polyamide-imide resin (trade name: Torlon 4000T) used in Length Example 1.
Add 2U of epoxy resin (product name: Epicoat 154) to k.
%, and a laminate was produced in the same manner as in Example 1.
このときの樹脂層の揮発分D (−r’Gkは12%で
あった。このようにして得られた積雇体の樹脂jφを7
H.いにχ・I向させるように重ね合わせ、150℃、
601cg/crn2、0.5m / m i nでロ
ールラミネーションし巻取った。The volatile content D (-r'Gk) of the resin layer at this time was 12%.
H. Layer them so that they are oriented in the χ・I direction, and heat them at 150°C.
Roll lamination was performed at 601 cg/crn2 and 0.5 m/min, and the material was wound up.
得られたロール状物を、150℃にて15時間加熱し、
長尺の両面フレキシブル印刷回路用基阪を得た。この両
面フレキシブル印刷川路用基板の評価を丈施例1と同様
にして行なった。結果を第1表に併せて示す。The obtained roll-shaped product was heated at 150°C for 15 hours,
A long double-sided flexible printed circuit board was obtained. Evaluation of this double-sided flexible printed substrate for river passage was carried out in the same manner as in Example 1. The results are also shown in Table 1.
丈施例4
丈施例3で用いた中販のポリアミドイミド樹脂(商品名
:トーロン4000T)に代えて、市販のポリイミド樹
脂(アップジョン肚製2080)のN, N−ジメチル
ホルムアミド(DMF)の固形分20%溶戚に、エボキ
シ樹脂(西品名:エピコート154)を1096配合し
、実施例1と同様にして積層体を得た。このときの樹脂
層の揮允分6 l−T Qは7%であった。このように
して得られた積層体の樹脂層の上にポリイミドフィルム
(商品名;ユーピレックスS)を重ね合わせ、150℃
、601cg/cm2、0.5m/mi nでロールラ
ミネーションし巻取った。得られたロール状物を160
℃にて15rl.’j間加熱し、長尺の片面フレキシブ
ル印刷回路用話板をvtた。この片面フレキシブル印刷
口路用基板を丈施例1と同様にして計価した。結果を第
1表に併せて示す。Length Example 4 Instead of the commercially available polyamide-imide resin (trade name: Torlon 4000T) used in Length Example 3, N,N-dimethylformamide (DMF) of a commercially available polyimide resin (Up John Chu 2080) was used. A laminate was obtained in the same manner as in Example 1 by blending 1096 epoxy resins (Nishi product name: Epicoat 154) into a solution having a solid content of 20%. The volatile content 6l-TQ of the resin layer at this time was 7%. A polyimide film (trade name: Upilex S) was superimposed on the resin layer of the laminate thus obtained, and
, 601 cg/cm 2 and 0.5 m/min, and the film was rolled up. The obtained roll-shaped product was heated to 160
15 rl. A long, single-sided flexible printed circuit board was heated for a period of 10 minutes. This single-sided flexible printed circuit board was measured in the same manner as in Example 1. The results are also shown in Table 1.
比較例1
塗布後の乾燥として2分間でトンネル内を通過させる以
外は、丈施例2と同様にして積層体を作製した。樹脂の
不揮発分含6゛エは、丈施例2では28%であったのに
対し、この比較例1では45%であった。丈施F!AI
2と同様の方広で、この積層体を用いて、長尺のフレキ
シブル印刷同路用基板を得た。得られた両面フレギシブ
ル印刷回路用裁仮は、樹脂層の流れ出し、および銅箔の
膨れが著しかった。夫施例1と同様にしてs・+r価し
、結果を第1表に併せて示した。Comparative Example 1 A laminate was produced in the same manner as in Example 2, except that the coating was passed through a tunnel for 2 minutes to dry after coating. The non-volatile content of the resin was 28% in Example 2, while it was 45% in Comparative Example 1. Joshi F! AI
Using this laminate, a long flexible printing circuit board was obtained, which had the same square width as in Example 2. The obtained double-sided flexible printed circuit preliminaries had significant flow of the resin layer and swelling of the copper foil. The s/+r value was carried out in the same manner as in Example 1, and the results are also shown in Table 1.
比較例2
塗布後の樹脂層の乾燥を80℃、4分間でトンネル炉内
を通過させた後、さらに200℃にて4分間トンネル内
を通過させること以外は、実施例1とI,i1様にして
積層体を作製した。この比較例2における樹脂層の不揮
発分含右瓜は、0. 5%であった。この積層体を用
いて実施例1と同様にしてポリイミドフィルム(商品名
:カブトン100H)を重ね合わせ、200℃、60k
g/cm20.5m/minでロールラミネーションを
iテなったところ、接着良好な積層体を得ることができ
なかった。丈施例1と同様にして評価し、第1表に桔果
を併せて示した。Comparative Example 2 Example 1 and I, i1 except that the resin layer after coating was dried by passing through a tunnel furnace at 80°C for 4 minutes and then passing through a tunnel at 200°C for 4 minutes. A laminate was produced. The non-volatile content of the resin layer of the right melon in Comparative Example 2 was 0. It was 5%. Using this laminate, a polyimide film (trade name: Kabuton 100H) was overlaid in the same manner as in Example 1, and the film was heated at 200°C for 60k.
When roll lamination was carried out at a speed of 20.5 g/cm/min, a laminate with good adhesion could not be obtained. Length The results were evaluated in the same manner as in Example 1, and the results are also shown in Table 1.
第1表から明らかなように、この発明に従う丈施例1〜
4のものは、接着強度が安定して高く、また耐熱性も良
好である。これに対し、樹脂層中の揮発性含有量がこの
発明の範囲を越える比較例1では、銅箔膨れや最終的な
加熱処理後の樹脂層における気泡発生が認められた。ま
た変色も認められた。接着強度は非常にばらついた値を
示した。As is clear from Table 1, length examples 1 to 1 according to the present invention
No. 4 has stable and high adhesive strength and good heat resistance. On the other hand, in Comparative Example 1 in which the volatile content in the resin layer exceeds the range of the present invention, blistering of the copper foil and generation of bubbles in the resin layer after the final heat treatment were observed. Discoloration was also observed. The adhesive strength showed highly variable values.
またこの発明における樹脂雇の揮発分含有量の範四より
も低い比較81I2では、接着強度が不十分でありほと
んど接着させることができなかった。Furthermore, in Comparative 81I2, which had a lower volatile content than the fourth range of the resin composition of the present invention, the adhesive strength was insufficient and almost no bonding could be achieved.
Claims (1)
面に、有機溶剤可溶性のポリイミド樹脂および/または
ポリアミドイミド樹脂を主成分とする樹脂の有機溶剤溶
液を塗布し、揮発分含有量が1〜30重量%となるよう
に乾燥させて樹脂層を形成する工程と、 前記樹脂層が形成された金属箔または耐熱性フィルムの
複数を、前記樹脂層が互いに対向するように重ね合わせ
るか、あるいは、前記金属箔または耐熱性フィルムの樹
脂層の上に他の金属箔または耐熱性フィルムを重ね合わ
せてロール状に巻取る工程と、 ロール状に巻取った金属箔積層体を150℃〜250℃
に加熱して前記樹脂層中の有機溶剤を除去する工程とを
備える、金属箔積層長尺体の製造方法。(1) At least one surface of the metal foil or heat-resistant film is coated with an organic solvent solution of a resin whose main component is an organic solvent-soluble polyimide resin and/or a polyamide-imide resin, and the volatile content is 1 to 30%. % by weight, and stacking a plurality of metal foils or heat-resistant films on which the resin layers are formed so that the resin layers face each other, or A process of overlaying another metal foil or heat-resistant film on the resin layer of the metal foil or heat-resistant film and winding it into a roll, and heating the rolled metal foil laminate at 150°C to 250°C.
A method for manufacturing a metal foil laminated elongated body, comprising a step of heating the resin layer to remove an organic solvent in the resin layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30565189A JPH03164241A (en) | 1989-11-24 | 1989-11-24 | Preparation of metal foil-laminated continuous length |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30565189A JPH03164241A (en) | 1989-11-24 | 1989-11-24 | Preparation of metal foil-laminated continuous length |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP34541998A Division JP3223894B2 (en) | 1998-12-04 | 1998-12-04 | Metal foil laminate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03164241A true JPH03164241A (en) | 1991-07-16 |
Family
ID=17947701
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30565189A Pending JPH03164241A (en) | 1989-11-24 | 1989-11-24 | Preparation of metal foil-laminated continuous length |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03164241A (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06190967A (en) * | 1992-09-11 | 1994-07-12 | Mitsui Toatsu Chem Inc | Production of flexible extremely thin metal foil laminated sheet |
JP2001105530A (en) * | 1999-08-04 | 2001-04-17 | Toyobo Co Ltd | Flexible metal laminate and production method therefor |
JP2002217519A (en) * | 2001-01-16 | 2002-08-02 | Matsushita Electric Ind Co Ltd | Method for manufacturing printed wiring board |
KR20020086455A (en) * | 2002-10-31 | 2002-11-18 | 이병금 | Manufacturing method of copper foil |
WO2006118239A1 (en) * | 2005-04-28 | 2006-11-09 | Nippon Kayaku Kabushiki Kaisha | Process for producing double-sided flexible printed board and double-sided flexible printed board |
JP2010234810A (en) * | 1999-08-04 | 2010-10-21 | Toyobo Co Ltd | Flexible metal laminate |
US8114940B2 (en) | 2005-10-31 | 2012-02-14 | Nippon Kayaku Kabushiki Kaisha | Rubber-modified polyamide resin, epoxy resin composition and cured product thereof |
JP2012138586A (en) * | 2012-02-07 | 2012-07-19 | Nippon Kayaku Co Ltd | Method of manufacturing double-sided flexible printed board and double-sided flexible printed board |
US9480154B2 (en) | 2005-07-21 | 2016-10-25 | Nippon Kayaku Kabushiki Kaisha | Polyamide resin, epoxy resin compositions, and cured articles thereof |
JP2017203146A (en) * | 2016-05-10 | 2017-11-16 | 住友化学株式会社 | Production method of transparent resin film and production method of laminate having transparent resin film |
WO2020203983A1 (en) * | 2019-03-29 | 2020-10-08 | 東洋紡株式会社 | Heat-resistant polymer film laminate and method for producing heat-resistant polymer film laminate |
-
1989
- 1989-11-24 JP JP30565189A patent/JPH03164241A/en active Pending
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06190967A (en) * | 1992-09-11 | 1994-07-12 | Mitsui Toatsu Chem Inc | Production of flexible extremely thin metal foil laminated sheet |
JP4560697B2 (en) * | 1999-08-04 | 2010-10-13 | 東洋紡績株式会社 | Flexible metal laminate and manufacturing method thereof |
JP2001105530A (en) * | 1999-08-04 | 2001-04-17 | Toyobo Co Ltd | Flexible metal laminate and production method therefor |
JP2010234810A (en) * | 1999-08-04 | 2010-10-21 | Toyobo Co Ltd | Flexible metal laminate |
JP2002217519A (en) * | 2001-01-16 | 2002-08-02 | Matsushita Electric Ind Co Ltd | Method for manufacturing printed wiring board |
JP4639473B2 (en) * | 2001-01-16 | 2011-02-23 | パナソニック株式会社 | Method for manufacturing printed wiring board |
KR20020086455A (en) * | 2002-10-31 | 2002-11-18 | 이병금 | Manufacturing method of copper foil |
WO2006118239A1 (en) * | 2005-04-28 | 2006-11-09 | Nippon Kayaku Kabushiki Kaisha | Process for producing double-sided flexible printed board and double-sided flexible printed board |
EP1876873A4 (en) * | 2005-04-28 | 2009-07-22 | Nippon Kayaku Kk | Process for producing double-sided flexible printed board and double-sided flexible printed board |
EP1876873A1 (en) * | 2005-04-28 | 2008-01-09 | Nippon Kayaku Kabushiki Kaisha | Process for producing double-sided flexible printed board and double-sided flexible printed board |
JP2006310574A (en) * | 2005-04-28 | 2006-11-09 | Nippon Kayaku Co Ltd | Double-sided flexible printed circuit board and manufacturing method thereof |
US9480154B2 (en) | 2005-07-21 | 2016-10-25 | Nippon Kayaku Kabushiki Kaisha | Polyamide resin, epoxy resin compositions, and cured articles thereof |
US8114940B2 (en) | 2005-10-31 | 2012-02-14 | Nippon Kayaku Kabushiki Kaisha | Rubber-modified polyamide resin, epoxy resin composition and cured product thereof |
JP2012138586A (en) * | 2012-02-07 | 2012-07-19 | Nippon Kayaku Co Ltd | Method of manufacturing double-sided flexible printed board and double-sided flexible printed board |
JP2017203146A (en) * | 2016-05-10 | 2017-11-16 | 住友化学株式会社 | Production method of transparent resin film and production method of laminate having transparent resin film |
WO2020203983A1 (en) * | 2019-03-29 | 2020-10-08 | 東洋紡株式会社 | Heat-resistant polymer film laminate and method for producing heat-resistant polymer film laminate |
EP3950273A4 (en) * | 2019-03-29 | 2022-12-28 | Toyobo Co., Ltd. | Heat-resistant polymer film laminate and method for producing heat-resistant polymer film laminate |
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