JPH0316024A - Production of magnetic disk - Google Patents

Production of magnetic disk

Info

Publication number
JPH0316024A
JPH0316024A JP14998589A JP14998589A JPH0316024A JP H0316024 A JPH0316024 A JP H0316024A JP 14998589 A JP14998589 A JP 14998589A JP 14998589 A JP14998589 A JP 14998589A JP H0316024 A JPH0316024 A JP H0316024A
Authority
JP
Japan
Prior art keywords
magnetic
substrate
plating
texturing
coercive force
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14998589A
Other languages
Japanese (ja)
Inventor
Makoto Yonemitsu
誠 米光
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Light Metal Industries Ltd
Original Assignee
Sumitomo Light Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Light Metal Industries Ltd filed Critical Sumitomo Light Metal Industries Ltd
Priority to JP14998589A priority Critical patent/JPH0316024A/en
Publication of JPH0316024A publication Critical patent/JPH0316024A/en
Pending legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To improve magnetic characteristics such as coercive force, squareness ratio and coercive force squareness ratio in the circumferential direction by providing Ni-P plating on an aluminum alloy substrate, forming concentrical lines by a texturing method, and then forming a magnetic recording layer thereon. CONSTITUTION:A disk substrate, 5.25 inch in diameter, of aluminum alloy is coated with Ni-P plating film, polished for finish, and subjected to electroless Ni-P plating to form 10 - 100nm thick film. Then the substrate is treated by texturing to form concentrical lines of 100 - 600Angstrom roughness height Rtm. Then the substrate is washed with pure water to remove abrasives deposited on the surface, dried by use of a spin dryer and then stored. After stored, the substrate is coated with a Co-P magnetic plating film by conventional electroless plating method. Further, a protective film and a lubricating film are formed thereon. Thereby, the obtd. medium is improved in magnetic characteristics such as coercive force, squareness ratio and coercive force squareness ratio in the circumferential direction.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、磁気ディスクの製造法、とくに磁気異方性の
増大化により電磁変換特性を向上させたメッキ型磁気デ
ィスクの製造法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing a magnetic disk, and in particular to a method for manufacturing a plated magnetic disk whose electromagnetic conversion characteristics are improved by increasing magnetic anisotropy.

〔従来の技術〕[Conventional technology]

近年、磁気ディスクの形態は、磁気記録装置の高密度化
に伴って塗布型タイプから記録媒体をメッキもしくはス
パッタリングによって形成した薄膜媒体をもつタイプに
置き換えられてきている.磁気記録装置の高密度化はさ
らに進展の傾向にあり、それに応じて磁気記録媒体の磁
気異方性の増大化要求も一層高まっている。
In recent years, as the density of magnetic recording devices has increased, the form of magnetic disks has been replaced from coated types to types with thin film media formed by plating or sputtering. As the density of magnetic recording devices continues to increase, demands for increasing the magnetic anisotropy of magnetic recording media are also increasing.

このため、例えばメッキ処理により薄膜媒体を形戒する
メッキ型磁気ディスクにおいては、メッキ層の表面にテ
キスチャリング(Texturing)加工と呼ばれる
同心円方向の条痕を付ける研磨をおこない、その研磨面
の上に磁気メッキ層を形戒することによって磁気異方性
を高める方策が採られている. 〔発明が解決しようとする課題] しかしながら、テキスチャリング加工を施した基体を使
用しただけでは十分な磁気異方性が得られないうえに、
テキスチヤング加工の直後に磁性媒体のメッキ処理を・
おこなう必要があるため磁気性能に低下変動を生じる問
題点があった.したがって、本発明の目的は従来より磁
気記録媒体の磁気異方性を増大化し、T4磁変換特性を
安定して向上させることができる磁気ディスクの製造法
を提供することにある。
For this reason, for example, in plated magnetic disks that use plating to form thin film media, the surface of the plated layer is polished to create concentric streaks called texturing, and then the surface of the plated layer is polished. Measures have been taken to increase magnetic anisotropy by modifying the shape of the magnetic plating layer. [Problems to be solved by the invention] However, sufficient magnetic anisotropy cannot be obtained only by using a textured substrate;
Immediately after texturing, the magnetic media is plated.
However, there was a problem in that magnetic performance deteriorated and fluctuated. Therefore, an object of the present invention is to provide a method for manufacturing a magnetic disk that can increase the magnetic anisotropy of a magnetic recording medium and stably improve the T4 magnetic conversion characteristics.

〔課題を解決するための手段〕[Means to solve the problem]

上記の目的を達威するための本発明による磁気ディスク
の製造法は、アルミニウム合金円板またはNi−Pメッ
キ面を有するアルミニウム合金円板を基体とし、該基体
面を平滑に研磨してNi−Pメッキを施し、ついでテキ
スチャリング加工により円周方向に条痕を形成したのち
磁気記録層を形成することを構成上の要旨とするもので
ある.上記の構或において、テキスチャリング加工後の
基体を、乾燥もしくは不活性ガス雰囲気下で保管する工
程を付加すると磁気異方性の付与効果を長期間持続させ
ることができる.不活性ガスとしては、アルゴン、窒素
などが有効に使用される.本発明の望ましい製造工程の
フローシートを示すと第1図のようになり、第2図に示
した従来技術の製造工程フローシ一トと対比してテキス
チャリング加工の前工程としてNi−Pメッキ処理があ
り、またテキスチャリング加工の後工程として前記した
乾燥もしくは不活性ガス雰囲気下の保管工程を付加した
点に特徴づけられる. [作 用] 本発明の製造工程によれば、従来のテキスチャリング加
工のみの媒体に比べ円周方向における保磁力、角型比、
保磁力角型比等の磁気特性が向上する.また、テキスチ
ャリング加工前のNi−Pメッキ層の淳さ、テキスチャ
リング加工時の基体面粗さなどによって磁気特性に変動
を生じることはなく、常に安定した性能が付与される。
A method for manufacturing a magnetic disk according to the present invention to achieve the above object uses an aluminum alloy disk or an aluminum alloy disk having a Ni-P plated surface as a base, and polishes the base surface smooth to coat the Ni-P plated surface. The gist of the structure is to apply P plating, then to form streaks in the circumferential direction by texturing, and then to form a magnetic recording layer. In the above structure, the effect of imparting magnetic anisotropy can be maintained for a long period of time by adding a step of drying or storing the substrate after texturing under an inert gas atmosphere. Argon, nitrogen, etc. are effectively used as inert gases. The flow sheet of the preferred manufacturing process of the present invention is shown in FIG. 1, and in contrast to the manufacturing process flow sheet of the conventional technology shown in FIG. It is also characterized by the addition of the above-mentioned drying or storage process under an inert gas atmosphere as a post-texturing process. [Function] According to the manufacturing process of the present invention, coercive force in the circumferential direction, squareness ratio,
Magnetic properties such as coercive force squareness ratio are improved. Further, the magnetic properties do not vary depending on the thickness of the Ni--P plating layer before texturing, the roughness of the substrate surface during texturing, etc., and stable performance is always provided.

さらに、テキスチャリング加工後に乾燥もしくは不活性
ガス雰囲気下の保管工程を置くことにより磁気異方性を
長期間に亘って保持するとか可能となる. 〔実施例〕 以下、実施例に基づいて本発明を具体的に説明する。
Furthermore, by performing a drying or storage process under an inert gas atmosphere after texturing, it is possible to maintain magnetic anisotropy for a long period of time. [Example] Hereinafter, the present invention will be specifically described based on Examples.

(1〉磁気ディスクの製造 アルミニウム合金円板の表面にNj−Pメッキを施した
直径5.25インチの基体を使用し、表面を研磨仕上げ
した.この基体面に、市販の無電解Ni−Pメッキ液を
用いて厚さlO〜100n一のメッキ層を形威した。
(1> Manufacture of magnetic disks A 5.25-inch diameter base plated with Nj-P on the surface of an aluminum alloy disc was used, and the surface was polished. Commercially available electroless Ni-P A plating layer with a thickness of 10 to 100 nm was formed using a plating solution.

ついで、テキスチャリング加工をおこなって同心円方向
に表面粗さRtm100〜600人の条痕を形威した.
テキスチャリング加工に用いる砥粒は、有機砥粒、固定
砥粒のいずれであってもよい.テキスチャリング加工後
、純水中で洗浄して付着した砥粒或分を除去した.この
洗浄は、スクラブ洗浄あるいは高圧水洗浄などでおこな
われる.次に、洗浄した基体をスピンドライヤーにより
乾燥して保管し、別の例としてアルゴンガス雰囲気中で
保管した。
Next, a texturing process was performed to create striations with a surface roughness Rtm of 100 to 600 in the concentric direction.
The abrasive grains used for texturing processing may be either organic abrasive grains or fixed abrasive grains. After texturing, some adhering abrasive grains were removed by washing in pure water. This cleaning is performed using scrub cleaning or high-pressure water cleaning. Next, the cleaned substrate was dried with a spin dryer and stored, and as another example, stored in an argon gas atmosphere.

保管後の基体面に通常の無電解メッキ手段を用いてCo
−Pからなる磁性メッキ層を形威し、さらに常法により
保護膜および潤滑膜を形戊した.(2)特性の評価 このようにして得られた本発明による磁気ディスクの磁
気特性を評価するために、振動試料型磁力計(VMS)
を使用し最大5KOeの磁場を印加した場合の磁気ヒス
テリシス曲線を測定した。その代表的結果を第3図に示
した。
Co is applied to the substrate surface after storage using normal electroless plating means.
A magnetic plating layer made of -P was formed, and a protective film and a lubricating film were further formed using conventional methods. (2) Evaluation of characteristics In order to evaluate the magnetic characteristics of the magnetic disk according to the present invention obtained in this way, a vibrating sample magnetometer (VMS) was used.
The magnetic hysteresis curve was measured when a maximum magnetic field of 5 KOe was applied using the . The typical results are shown in Figure 3.

比較例として、第4図にNi−Pメッキ層にテキスチャ
リング加工を施した従来の磁気ディスクのヒステリシス
曲線を示した。
As a comparative example, FIG. 4 shows a hysteresis curve of a conventional magnetic disk in which the Ni--P plating layer was subjected to texturing.

また、表1に実施例および比較例について測定した磁気
特性を対比して示した。
Further, Table 1 shows a comparison of the magnetic properties measured for Examples and Comparative Examples.

表  1 第3図、第4図および表1の結果から、本発明により製
造された磁気ディスクは、従来のものど比べ円周方向の
保磁力、角型比、保磁力角型比などの磁気特性が向上し
ていることが判明する。これらの磁気特性は、テキスチ
ャリング加工前のNi−Pメッキ処理による皮膜厚さを
相違させても変動することはなく、テキスチャリング加
工による基体粗さが変化しても影響を受けることはなか
った. 第5図に、テキスチャリング加工からの放置時間が磁気
特性に及ぼす経時変化を、本発明の実施例(乾燥保管お
よびアルゴンガス保管)と超純水中で保管した例につき
対比して図示した.乾燥保管およびアルゴンガス中保管
では200時間に亘る長期保管でも安定した保磁力が保
持されるが、水中保管の例では約4時間の経過で磁気特
性の低下が認められた.なお、アルゴンガスの代わりに
非酸化性の窒素ガスを使用した場合にも磁気特性の長期
安定効果があり、ガスの純度を制御することで保管可能
な時間を変化させることが可能であった. 表2は、実施例と比較例による各磁気ディスクについて
市販の単板テスターを用いて電磁変換特性を測定した結
果を示したものである。
Table 1 From the results shown in Figures 3 and 4 and Table 1, it can be seen that the magnetic disk manufactured by the present invention has magnetic properties such as coercive force in the circumferential direction, squareness ratio, coercive force squareness ratio, etc. compared to the conventional magnetic disk. It turns out that the characteristics are improved. These magnetic properties did not change even if the film thickness was changed by Ni-P plating before texturing, and they were not affected by changes in the substrate roughness caused by texturing. .. Figure 5 compares and contrasts the changes in magnetic properties of magnetic properties over time after texturing for examples of the present invention (dry storage and argon gas storage) and examples stored in ultrapure water. In dry storage and storage in argon gas, stable coercive force was maintained even after 200 hours of long-term storage, but in the case of underwater storage, a decrease in magnetic properties was observed after about 4 hours. Note that using non-oxidizing nitrogen gas instead of argon gas also had a long-term stabilizing effect on magnetic properties, and it was possible to change the storage time by controlling the purity of the gas. Table 2 shows the results of measuring the electromagnetic conversion characteristics of each magnetic disk according to Examples and Comparative Examples using a commercially available single plate tester.

表2 使用ヘッド:yl膜タイプ 浮上量  : 0.20I!m トラック幅: 11.O* ギャップ長:0.8,n 表2の結果から、本発明の磁気ディスクにおいては、分
解能、オーバーライトおよびSRN特性を低下させるこ
となしに再生出力を20%程度向上させることができる
. 〔発明の効果〕 以上のとおり、本発明に係る磁気ディスクの製造法によ
れば、磁気媒体の磁気異方性を増大化させることができ
、従来品に比べ再生出力を約20%向上させることが可
能となる.そのうえ、工程的にテキスチャリング加工直
後に媒体メッキ処理をする必要がないからテキスチ中リ
ング加工から媒体メッキ処理までの放置時間を多くとる
ことができ、磁気特性を長期間安定して保持することが
できる。
Table 2 Head used: yl film type Flying height: 0.20I! m Track width: 11. O* Gap length: 0.8, n From the results in Table 2, the magnetic disk of the present invention can improve the playback output by about 20% without reducing resolution, overwriting, and SRN characteristics. [Effects of the Invention] As described above, according to the method of manufacturing a magnetic disk according to the present invention, the magnetic anisotropy of the magnetic medium can be increased, and the reproduction output can be improved by about 20% compared to conventional products. becomes possible. In addition, since there is no need to perform media plating immediately after texturing, it is possible to allow more time to stand between texturing and media plating, and the magnetic properties can be maintained stably for a long period of time. can.

第1図 第2Figure 1 Second

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の製造工程を示したフローシ一ト、第2
図は従来技術の製造工程を示したフローシ一トである.
第3図は本発明の磁気ディスクについて測定された磁気
ヒステリシス曲線、第4図は従来の磁気ディスクの磁気
ヒステリシス曲線である。第5図はテキスチャリング加
工からの放置時間と磁気特性との関係を示した経時変化
図である. 第 3図 第 4 図 手続補正書(自発) 1.事件の表示 平或1年特許願第149985号 2.発明の名称 磁気ディスクの製造法 3.補正をする者 事件との関係      特許出願人 住 所  東京都港区新橋五丁目11番3号名 称  
(227)住友軽金属工業株式会社代表者 内田克己 4.代理人 〒171 第 5 図 0 乾燥保管(θ方向) ● 乾燥保管(r方向) 八Ar中保管(θ方向〉 ▲ Ar中保管(r方向) 口水中保管(θ方向) 1 水中保管(r方向) (1)明細書第4頁、12行目から13行目の「基体面
粗さ・・・」を「基仮面粗さ・・・」に補正する。 (2)明細書第5頁、lO行目からll行目の「有機砥
粒、・・・」を「遊離砥粒、・・・」に補正する。 (3)明細書第7頁、6行目の「基体粗さ・・・」を「
基板粗さ・・・」に補正する。 以
Figure 1 is a flow sheet showing the manufacturing process of the present invention;
The figure is a flow sheet showing the manufacturing process of the conventional technology.
FIG. 3 shows a magnetic hysteresis curve measured for the magnetic disk of the present invention, and FIG. 4 shows a magnetic hysteresis curve for a conventional magnetic disk. Figure 5 is a graph showing the relationship between the leaving time after texturing and the magnetic properties. Figure 3 Figure 4 Procedural amendment (voluntary) 1. Case description: Patent Application No. 149985 of 2007 2. Name of the invention Method for manufacturing magnetic disks 3. Relationship with the case of the person making the amendment Patent applicant address 5-11-3 Shinbashi, Minato-ku, Tokyo Name
(227) Katsumi Uchida, Representative of Sumitomo Light Metal Industries, Ltd. 4. Agent 〒171 Figure 5 0 Dry storage (θ direction) ● Dry storage (r direction) 8 Storage in Ar (θ direction) ▲ Storage in Ar (r direction) Storage in water (θ direction) 1 Underwater storage (r direction ) (1) "Substrate surface roughness..." on page 4 of the specification, lines 12 to 13 is corrected to "base surface roughness..." (2) Page 5 of the specification, Correct "Organic abrasive grains, ..." from line 10 to line 11 to "free abrasive grains, ...". (3) "Substrate roughness..." on page 7, line 6 of the specification. ·"of"
Substrate roughness..." is corrected. Below

Claims (2)

【特許請求の範囲】[Claims] 1. アルミニウム合金円板またはNi−Pメッキ面を
有するアルミニウム合金円板を基体とし、該基体面を平
滑に研磨してNi−Pメッキを施し、ついでテキスチャ
リング加工により円周方向に条痕を形成したのち磁気記
録層を形成することを特徴とする磁気ディスクの製造法
1. An aluminum alloy disk or an aluminum alloy disk having a Ni-P plated surface was used as a base, the base surface was polished smooth and Ni-P plated, and then striations were formed in the circumferential direction by texturing processing. A method for manufacturing a magnetic disk, which comprises subsequently forming a magnetic recording layer.
2. テキスチャリング加工後の基体を、乾燥もしくは
不活性ガス雰囲気下で保管する工程を含む請求項1記載
の磁気ディスクの製造法。
2. 2. The method of manufacturing a magnetic disk according to claim 1, further comprising the step of drying or storing the textured substrate under an inert gas atmosphere.
JP14998589A 1989-06-13 1989-06-13 Production of magnetic disk Pending JPH0316024A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14998589A JPH0316024A (en) 1989-06-13 1989-06-13 Production of magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14998589A JPH0316024A (en) 1989-06-13 1989-06-13 Production of magnetic disk

Publications (1)

Publication Number Publication Date
JPH0316024A true JPH0316024A (en) 1991-01-24

Family

ID=15486950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14998589A Pending JPH0316024A (en) 1989-06-13 1989-06-13 Production of magnetic disk

Country Status (1)

Country Link
JP (1) JPH0316024A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020001671A (en) * 2001-10-05 2002-01-09 이정훈 Freeze Water Meter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020001671A (en) * 2001-10-05 2002-01-09 이정훈 Freeze Water Meter

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