JPH03156793A - Semiconductor memory - Google Patents

Semiconductor memory

Info

Publication number
JPH03156793A
JPH03156793A JP1296836A JP29683689A JPH03156793A JP H03156793 A JPH03156793 A JP H03156793A JP 1296836 A JP1296836 A JP 1296836A JP 29683689 A JP29683689 A JP 29683689A JP H03156793 A JPH03156793 A JP H03156793A
Authority
JP
Japan
Prior art keywords
line
preamplifier
level
semiconductor memory
inverse
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1296836A
Other languages
Japanese (ja)
Inventor
Seiji Sawada
誠二 澤田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1296836A priority Critical patent/JPH03156793A/en
Publication of JPH03156793A publication Critical patent/JPH03156793A/en
Pending legal-status Critical Current

Links

Landscapes

  • For Increasing The Reliability Of Semiconductor Memories (AREA)
  • Dram (AREA)

Abstract

PURPOSE:To select a semiconductor memory having a marginal preamplifier by increasing the precharge capability of a precharge circuit in the test mode more than that in the normal mode. CONSTITUTION:Transistors (TRs) 1 and 2 are turned on to precharge I/O and the inverse of I/O lines to a level Vco-Vth (power supply voltage - threshold voltage of the TR 1). Then the input signal Y goes to an H level from L, the TR 2 is turned on, the level of a bit line and inverse of bit line amplified by a sense amplifier is sent respectively to the I/O and inverse of I/O lines, then a level difference is caused between the I/O and inverse of I/O lines. Then a level difference at a time T when the preamplifier is started is a level DELTAVT, which is smaller than a level DELTAVn in the normal mode because the capability of the preamplifier is high. Since the level difference between the I/O and inverse of I/O lines when the preamplifier is in operation in the test mode is smaller than that in the normal mode, a tight test is conducted to the preampli fier. Thus, a semiconductor memory having a marginal preamplifier is selected out.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は半導体記憶装置、特にそのテスト時(以下テ
ストモードと呼ぶ)に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor memory device, particularly during testing thereof (hereinafter referred to as test mode).

〔従来の技術〕[Conventional technology]

第4図は従来の半導体記憶装置のエフ0線プリチヤージ
回路の回路図、第6図は第4図における各入力信号’h
Al 4y#及びI/O線、Ilo線の電圧波形図であ
る。
Fig. 4 is a circuit diagram of a conventional F0 line precharge circuit of a semiconductor memory device, and Fig. 6 shows each input signal 'h' in Fig. 4.
It is a voltage waveform diagram of Al 4y#, I/O line, and Ilo line.

次に動作について説明する0読み時し動作時において、
まず入力信号Aが%7.ow I (以下りと記す)か
ら4H1gh”(以下Hと記す)になり、トランジスタ
(1)をONして、I/O線及びI/O線をマao −
Vth (電源電圧−トランジスタ(1)のしきい値電
圧)にプリチャージする。このプリチャージ能力は通常
動作時(以下ノーマルモードと呼ぶ)とテストモードと
では変わらない0その後、入力信号!がLからHとなり
、センスアンプで増幅されたb口線及びbit線の電位
がそれぞれI/O.1111及びI/O線に伝わり、I
/O線とIlo線に電位差が生ずる。そして、プリアン
プが動きだす時間Tての電位差はΔVとなり、このΔV
はノーマルモードとテストモードでは変わらない。
Next, we will explain the operation.At the time of 0 reading and operation,
First, input signal A is %7. ow I (hereinafter referred to as below) becomes 4H1gh” (hereinafter referred to as H), transistor (1) is turned on, and the I/O line and I/O line are changed to 4H1gh” (hereinafter referred to as H).
Precharge to Vth (power supply voltage - threshold voltage of transistor (1)). This precharge ability does not change between normal operation (hereinafter referred to as normal mode) and test mode.0 After that, the input signal! changes from L to H, and the potentials of the b-line and bit line amplified by the sense amplifier become I/O. 1111 and the I/O line, and the I
A potential difference occurs between the /O line and the Ilo line. Then, the potential difference at time T when the preamplifier starts to operate is ΔV, and this ΔV
is the same in normal mode and test mode.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の半導体記憶装置は以上のように構成されていたの
で、ノーマルモードとテストモードではIlo 線、I
lo線の電位差△Vに差が見られないので、テストモー
ドにおいてマージナルなプリアンプを持つ半導体記憶装
置を選別することができないという問題点があつ九。
Since the conventional semiconductor memory device is configured as described above, in the normal mode and test mode, the Ilo line and I
Another problem is that semiconductor memory devices with marginal preamplifiers cannot be selected in test mode because no difference is seen in the potential difference ΔV of the lo line.

この発明は上記のような問題点を解消するためになされ
たもので、テストモード時にマーシナ〜なプリアンプを
持つ半導体記憶装置を選別することを目的とする。
The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to select semiconductor memory devices having a preamplifier that is insignificant during a test mode.

〔課題を解決するための手段〕[Means to solve the problem]

この発明に係る半導体記憶装置は、テストモード時にお
いてI10線、I/O線をプリチャージする能力を高く
するようにしたものである。
The semiconductor memory device according to the present invention has a high ability to precharge the I10 line and the I/O line during the test mode.

〔作用〕[Effect]

この発明における半導体記憶装置のI/O線。 An I/O line of a semiconductor memory device according to the present invention.

I/O線プリチャージ回路は、テストモードによりプリ
アンプに厳しいテストが行なわれ、マージナルなプリア
ンプを持つ半導体記憶装置を選別できる0 〔実施例〕 以下、この発明の一実施例を図について説明する。第1
図はこの発明の一実施例である半導体記憶装置のI/O
線プリチャージ回路の回路図である。
In the I/O line precharge circuit, the preamplifier is subjected to a severe test in the test mode, and a semiconductor memory device having a marginal preamplifier can be selected. [Embodiment] An embodiment of the present invention will be described below with reference to the drawings. 1st
The figure shows an I/O of a semiconductor memory device which is an embodiment of the present invention.
FIG. 3 is a circuit diagram of a line precharge circuit.

図において、(1)はノーマルモード時、テストモード
時にI/O,5ItI10線をプリチャージするトラン
ジスタ、(2)はbit Is、 tels線の電位を
それぞれI/O線、I10線に伝えるI10ゲートトラ
ンジスタ、(3)はテストモード時のみにI10線*x
101aをプリチャージするトランジスタである。
In the figure, (1) is a transistor that precharges the I/O and 5ItI10 lines in normal mode and test mode, and (2) is an I10 gate that transmits the potential of the bit Is and tels lines to the I/O line and I10 line, respectively. Transistor, (3) is I10 line *x only in test mode
This is a transistor that precharges 101a.

第2図は第1図におけるノーマルモード時の入力信号%
A夕%2B$4y#及びI/O線、I/O#!の電圧波
形図である。
Figure 2 shows the input signal percentage in normal mode in Figure 1.
A evening%2B$4y# and I/O line, I/O#! FIG.

第3図は第1図におけるテストモード時の入力信号%)
、I %Tzl %yN及びI/O破、I10線の電圧
波形図である。
Figure 3 shows the input signal percentage in test mode in Figure 1)
, I%Tzl%yN and I/O failure, which is a voltage waveform diagram of the I10 line.

次に動作について説明する。Next, the operation will be explained.

初めに、ノーマルモード時の読み出し動作について説明
する。
First, the read operation in normal mode will be explained.

入力信号ムがLからHになりトランジスタ(1)が’0
Nt(、、x7o線及びI/OIIIAをTco −v
thにプリチャージする。その後、入力信号rがLから
Rとなりトランジスタ(2)が%□ Nヶし、センスア
ンプで増幅されたbit線及び1)it !i&の電位
が、それぞれI10線及びxyo線に伝わりI/O線と
I/O線に電位差が生ずる。そしてプリアンプが動きだ
−t−時間Tでの電位差はΔvnとなる。
The input signal becomes H from L and transistor (1) becomes '0'.
Nt(,,x7o line and I/OIIIA as Tco -v
Precharge to th. After that, the input signal r changes from L to R, transistor (2) changes to %□N, and the bit line amplified by the sense amplifier and 1) it! The potential of i& is transmitted to the I10 line and the xyo line, respectively, and a potential difference is generated between the I/O line and the I/O line. Then, when the preamplifier starts moving - t - the potential difference at time T becomes Δvn.

次に、テストモード時の読み出し動作について説明する
。テストモードでは入力信号Aと同時に入力信号TNも
LからHになる(この時の入力信号でlは、外部テスト
モードビンへの電圧印加、または、タイ之ング制御によ
って発生する)0そして、トランジスタ(t) t (
2)が0NLI/111及びI/O@を”0O−7th
にプリチャージする。この時のプリチャージ能力はノー
マルモードと比べて、トランジスタ(3)がONしてい
るので高くなっている。その後、入力信号τが乙からE
となり、トランジスタ(2)がONし、センスアンプで
増幅されたbit fl及びbit+liの電位がそれ
ぞれI/O#I及びI/O線に伝わり、I/O線とxy
o線に電位差が生ずる。そして、プリアンプが動きだす
時間Tでの電位差はΔVτとなる。ΔV!はノーマルモ
ード時のΔvnと比べると、プリアンプの能力が高いの
で小さくなっている。
Next, the read operation in the test mode will be explained. In the test mode, the input signal TN also changes from L to H at the same time as the input signal A (l in the input signal at this time is generated by voltage application to the external test mode bin or timing control). (t) t (
2) is 0NLI/111 and I/O@”0O-7th
Precharge to. The precharge capability at this time is higher than in the normal mode because the transistor (3) is turned on. After that, the input signal τ is changed from B to E.
Then, the transistor (2) turns on, and the potentials of bit fl and bit+li amplified by the sense amplifier are transmitted to the I/O #I and I/O lines, respectively, and the I/O line and xy
A potential difference occurs in the o line. Then, the potential difference at time T when the preamplifier starts operating is ΔVτ. ΔV! is smaller than Δvn in the normal mode because the preamplifier has a high ability.

以上のように、プリアンプが動作する時のX70線xy
o  線の電位差が、ノーマルモード時よシナストモー
ド時の方が小さいために、プリアンプに厳しいテストが
行なえる。
As mentioned above, when the preamplifier operates, the X70 line xy
Since the potential difference between the o lines is smaller in the synast mode than in the normal mode, severe tests can be performed on the preamplifier.

〔発明の効果〕〔Effect of the invention〕

以上のようにこの発明によれば、工yo M をI/O
線のプリチャージ能力を7−マμモードに比ベテストモ
ードにおいて高くすることによって、プリアンプに厳し
いテストが行なえ、マージナルなプリアンプを持つ半導
体記憶装置を選別できる。
As described above, according to the present invention, the I/O
By increasing the precharge capability of the line in the 7-maμ mode in the comparison test mode, the preamplifier can be subjected to severe testing, and semiconductor memory devices with marginal preamplifiers can be selected.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の一実施例による半導体記憶装置のI
10線プリチャージ回路の回路図、第2図は第1図の入
力信号ゞA′ ゞTll1′令!夕及びI/O線、I/
O線のノーマルモード時の波形図、第3図は第1図の入
力信号%AI  %11 令Y′及びI/O線、I/O
線のテストモード時の波形図、第4図は従来の半導体記
憶装置のI/O 線プリチャージ回路の回路図、第5図
は第4図の入力信号SA#1!夛  及びI/O線、 
エフo線の波形図である。 図において、(1)〜(3)はトランジスタを示す。 なお、図中、同一符号は同一 または相当部分を示す。
FIG. 1 shows I of a semiconductor memory device according to an embodiment of the present invention.
The circuit diagram of the 10-wire precharge circuit, Figure 2 shows the input signal ゞA'ゞTll1' command of Figure 1! evening and I/O line, I/
The waveform diagram of the O line in normal mode, Figure 3 shows the input signal %AI%11 of Figure 1, the input signal Y', the I/O line, and the I/O line.
4 is a circuit diagram of a conventional I/O line precharge circuit of a semiconductor memory device, and FIG. 5 is a waveform diagram of the input signal SA#1! of FIG. 4 in the line test mode.夛 and I/O line,
It is a waveform diagram of the F-o line. In the figure, (1) to (3) indicate transistors. In addition, the same symbols in the figures indicate the same or equivalent parts.

Claims (1)

【特許請求の範囲】[Claims]  半導体記憶装置のテスト時において、通常動作時より
I/O線及び■線のプリチャージ能力を高くしたことを
特徴とする半導体記憶装置。
1. A semiconductor memory device characterized in that during testing of the semiconductor memory device, the precharge capability of an I/O line and a line is made higher than during normal operation.
JP1296836A 1989-11-14 1989-11-14 Semiconductor memory Pending JPH03156793A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1296836A JPH03156793A (en) 1989-11-14 1989-11-14 Semiconductor memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1296836A JPH03156793A (en) 1989-11-14 1989-11-14 Semiconductor memory

Publications (1)

Publication Number Publication Date
JPH03156793A true JPH03156793A (en) 1991-07-04

Family

ID=17838787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1296836A Pending JPH03156793A (en) 1989-11-14 1989-11-14 Semiconductor memory

Country Status (1)

Country Link
JP (1) JPH03156793A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06195974A (en) * 1992-10-19 1994-07-15 Nec Corp Dynamic ram
EP0709388A1 (en) 1994-10-25 1996-05-01 Hüls Aktiengesellschaft Process for the preparation of alkoxy silanes

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06195974A (en) * 1992-10-19 1994-07-15 Nec Corp Dynamic ram
EP0709388A1 (en) 1994-10-25 1996-05-01 Hüls Aktiengesellschaft Process for the preparation of alkoxy silanes

Similar Documents

Publication Publication Date Title
JP3001342B2 (en) Storage device
US5991910A (en) Microcontroller having special mode enable detection circuitry and a method of operation therefore
JPH0159677B2 (en)
JPH03156793A (en) Semiconductor memory
JPS6212991A (en) Semiconductor memory device
KR950020710A (en) Semiconductor memory with high speed and low power data read / write circuit
US4214175A (en) High-performance address buffer for random-access memory
JPH02299034A (en) Semiconductor integrated circuit device
JP3948592B2 (en) Semiconductor device
JPH0469896A (en) Sense amplifying circuit
JPH0487100A (en) Dram
JPS6361495A (en) Semiconductor memory device
JPS61156596A (en) Semiconductor storage device
JPH0982895A (en) Semiconductor integrated circuit device
JPS62293597A (en) Semiconductor storage device
JP2505571B2 (en) Storage device diagnostic method
JPS60245141A (en) Semiconductor integrated circuit device
JPH03209698A (en) Semiconductor memory device
JP2850390B2 (en) Semiconductor memory
JPH0320837B2 (en)
JPS63142919A (en) Output buffer circuit
JPH02265096A (en) Semiconductor memory device
JPH0159550B2 (en)
JPH0312094A (en) Random access memory for image processing
JPH01136260A (en) Semiconductor integrated device