JPH03155551A - Cleaning jig - Google Patents
Cleaning jigInfo
- Publication number
- JPH03155551A JPH03155551A JP1295524A JP29552489A JPH03155551A JP H03155551 A JPH03155551 A JP H03155551A JP 1295524 A JP1295524 A JP 1295524A JP 29552489 A JP29552489 A JP 29552489A JP H03155551 A JPH03155551 A JP H03155551A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- jig
- parts
- present
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 58
- 238000004519 manufacturing process Methods 0.000 claims abstract description 4
- 239000004065 semiconductor Substances 0.000 claims abstract description 4
- 230000003749 cleanliness Effects 0.000 abstract description 2
- 239000004677 Nylon Substances 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 4
- 229920001778 nylon Polymers 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は半導体装置などの製造、工程において用いられ
るフォトマスク等の洗浄装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a cleaning apparatus for photomasks and the like used in the manufacturing and processes of semiconductor devices and the like.
[従来の技術]
従来のフォトマスク洗浄装置は、洗浄を重ねることによ
って汚染された洗浄用部品は新しい洗浄用部品に取り替
えることによってのみ洗浄効果を回復する事が出来た。[Prior Art] In a conventional photomask cleaning apparatus, the cleaning effect could be restored only by replacing cleaning parts that became contaminated through repeated cleaning with new cleaning parts.
[発明が解決しようとする課題]
従来の技術においては頻繁に洗浄用部品を交換する必要
が生じ装置の稼動率を著しく低下させ又交換に至るまで
の期間に汚染の進んだ洗浄用部品によって洗浄されたフ
ォトマスクの洗浄効果も期待できないなど洗浄装置本来
の機能を大きく低下させるものであった。[Problems to be Solved by the Invention] In the conventional technology, it is necessary to frequently replace cleaning parts, which significantly reduces the operating rate of the device, and in the period leading up to the replacement, cleaning parts that are highly contaminated are used for cleaning. The original function of the cleaning device was greatly degraded, such that the cleaning effect of the photomask that had been removed could not be expected.
[課題を解決するための手段]
本発明は上記課題を解決するためになされたものであり
汚染された洗浄用部品を定期的にかつ簡便に洗浄し清浄
度を回復させるために洗浄用部品の表面にブラシ又は突
起などのついた洗浄用治具を往復させるものであり以下
実施例に基づき本発明の詳細な説明を行う。[Means for Solving the Problems] The present invention has been made to solve the above problems, and is a method for cleaning contaminated cleaning parts regularly and easily to restore cleanliness. A cleaning jig having brushes or protrusions on its surface is reciprocated, and the present invention will be described in detail below based on examples.
[実 施 例〕
第1図及び第2図、第3図に本発明の実施例の図を示す
。第1図の(a)の1は平らなガラス面であり、6はナ
イロンブラシ状の突起が存在する部分である。第3図の
(C)は(b)のA部を拡大した部分であり、5はガラ
ス平面であり、6はナイロンブラシ状の突起である。第
1図及び第2図の球面状の突起を様々な密度、大きさに
してその洗浄効果を調べた結果は以下のとおりである。[Example] Figures 1, 2, and 3 show examples of the present invention. In FIG. 1(a), 1 is a flat glass surface, and 6 is a portion where nylon brush-like protrusions are present. FIG. 3(C) is an enlarged view of part A in FIG. 3(b), where 5 is a glass plane and 6 is a nylon brush-like protrusion. The cleaning effects of the spherical protrusions shown in FIGS. 1 and 2 with various densities and sizes were investigated, and the results are as follows.
突起の直径は2mmから20mmまで1mmごとに変化
させて洗浄を行ったところ、何れも洗浄部品の洗浄に効
果があった。また密度は03個/cm’から2個/cr
n’まで01個/ c rn’おきに変化させて洗浄を
行ったところ、何れも洗浄部品の洗浄に効果があった。When cleaning was carried out by changing the diameter of the protrusion from 2 mm to 20 mm in 1 mm increments, all of them were effective in cleaning the parts to be cleaned. Also, the density is from 03 pieces/cm' to 2 pieces/cr
When cleaning was performed by changing the number of parts up to n' every 01 pieces/c rn', all of them were effective in cleaning the parts to be cleaned.
さらに突起の高さは01mmから1mmまでQ、1mm
おきに変化させて洗浄を行ったところ、何れも洗浄部品
の洗浄に効果があった。Furthermore, the height of the protrusion is Q from 01mm to 1mm, 1mm
When cleaning was performed with different cleaning methods, all of them were effective in cleaning the parts to be cleaned.
次に第3図のナイロンブラシ状の突起を様々な密度、形
状にしてその洗浄用部品に対する洗浄効果を調べた結果
は以下のとおりである。突起の直径を0.05mmから
0.5mmまで0.05mmごとに変化させて洗浄を行
ったところ、どれも洗浄部品の洗浄に効果があった。ま
た突起の高さを0.5mmから2mmまで0.1mmご
とに変化させて洗浄を行ったところ、どれも洗浄部品の
洗浄に効果があった。さらに突起の密度を25個/ c
rn”から1000個/ c rn’まで25個/
c rn’おきに変化させて洗浄を行ったところ、どれ
も洗浄部品の洗浄に効果があった。Next, the cleaning effects of the nylon brush-like protrusions shown in FIG. 3 on cleaning parts were investigated using various densities and shapes, and the results are as follows. When cleaning was performed by changing the diameter of the protrusion from 0.05 mm to 0.5 mm in 0.05 mm increments, all were effective in cleaning the cleaned parts. Furthermore, when cleaning was performed by changing the height of the protrusions from 0.5 mm to 2 mm in 0.1 mm increments, all cases were effective in cleaning the cleaned parts. Furthermore, the density of protrusions was increased to 25/c
1000 pieces from rn''/25 pieces from crn'/
When cleaning was performed by changing the temperature at crn' intervals, all of them were effective in cleaning the parts to be cleaned.
[発明の効果]
以上述べたように本発明によれば、半導体装置などの製
造工程において用いられるフォトマスク等の洗浄装置内
部の洗浄用部品の洗浄を、特別な装置を付属することな
(、ブラシ及び突起を付けたマスク状の治具を用い、そ
れを洗浄装置に掛るだけで行えるという効果がある。[Effects of the Invention] As described above, according to the present invention, parts for cleaning inside a cleaning device such as a photomask used in the manufacturing process of semiconductor devices can be cleaned without attaching any special equipment. It has the advantage that it can be done simply by using a mask-like jig with brushes and protrusions and hanging it on the cleaning device.
第1図の(a)は、本発明のマスク状洗浄用治具の正面
図、第1図の(b)は、本発明のマスク状洗浄用治具の
側面図、第2図の(a)は、本発明のマスク状洗浄用治
具の正面図。第2図の(b)は、本発明のマスク状洗浄
用治具の側面図、第3図の(a)は、本発明のマスク状
洗浄用治具の正面図、第3図の(b)は、本発明のマス
ク状洗浄用治具の側面図、第3図の(c)は、本発明の
マスク状洗浄用治具の側面図(b)のAの部分の拡大図
。
1 ・ ・
2 ・ ・ ・
3 ・ ・ ・
4 ・ ・ ・
5 ・ ・
6 ・ ・
平面ガラス
突起
平面ガラス
突起
平面ガラス
ナイロンブラシ
以上FIG. 1(a) is a front view of the mask-like cleaning jig of the present invention, FIG. 1(b) is a side view of the mask-like cleaning jig of the present invention, and FIG. ) is a front view of the mask-like cleaning jig of the present invention. FIG. 2(b) is a side view of the mask-like cleaning jig of the present invention, FIG. 3(a) is a front view of the mask-like cleaning jig of the present invention, and FIG. ) is a side view of the mask-like cleaning jig of the present invention, and FIG. 3(c) is an enlarged view of part A in the side view (b) of the mask-like cleaning jig of the present invention. 1 ・ ・ 2 ・ ・ 3 ・ ・ 4 ・ ・ 5 ・ 6 ・ ・ Flat glass protrusion Flat glass protrusion Flat glass Nylon brush or higher
Claims (1)
スク等の洗浄装置内部の洗浄用部品にブラシ及び突起を
つけたマスク状の治具を用いて洗浄用部品表面を往復運
動することによって洗浄用部品表面を洗浄化する機能を
有する事を特徴とする洗浄用治具。The surface of the cleaning component is cleaned by reciprocating the surface of the cleaning component using a mask-like jig with brushes and protrusions attached to the cleaning component inside the cleaning device, such as a photomask used in the manufacturing process of semiconductor devices. A cleaning jig characterized by having a cleaning function.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1295524A JPH03155551A (en) | 1989-11-14 | 1989-11-14 | Cleaning jig |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1295524A JPH03155551A (en) | 1989-11-14 | 1989-11-14 | Cleaning jig |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03155551A true JPH03155551A (en) | 1991-07-03 |
Family
ID=17821741
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1295524A Pending JPH03155551A (en) | 1989-11-14 | 1989-11-14 | Cleaning jig |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03155551A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10790167B2 (en) | 2014-02-20 | 2020-09-29 | Entegris, Inc. | Nodule ratios for targeted enhanced cleaning performance |
-
1989
- 1989-11-14 JP JP1295524A patent/JPH03155551A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10790167B2 (en) | 2014-02-20 | 2020-09-29 | Entegris, Inc. | Nodule ratios for targeted enhanced cleaning performance |
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