JPH05243200A - Method of cleaning glass substrate - Google Patents

Abstract

PURPOSE:To provide a method of cleaning a glass substrate, where static electricity is prevented from being generated the glass substrate when it is rinsed as moving up and down in pure water so as to protect a pattern against damage caused by electric discharge and to prevent dust from attaching the glass substrate. CONSTITUTION:A glass substrate 2 held in a substrate holder 1 is made to move up and down in pure water 4 in a cleaning tank 3 to be rinsed, a magnetic field is applied vertical to the moving direction of the glass substrate 2 to move positive or negative charge 5 generated on the glass substrate 2 to tire side of the glass substrate 2, and charge 5 is transferred to a ground wire 6.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning a glass substrate. In recent years, with the increase in speed and density of electronic parts, the device patterns of integrated circuits have become finer and finer, and even the minute amount of dust on the mask used in the wafer process or on the glass substrate of the reticle, device quality characteristics and yield. Have a great influence on. For this reason, meticulous care is required in cleaning the glass substrate, and a method for removing fine dust that adheres due to static electricity is required.

[0002]

2. Description of the Related Art FIG. 3 is an explanatory view of a conventional example. In the figure, 12 is a glass substrate and 13 is a metal pattern.

The glass masks for integrated circuits (LSI) are required to have higher and higher quality as the elements become finer. Currently, as the method for cleaning this glass mask, ultrasonic waves are used, or chemicals such as pure water, acids, alkalis, and organic solvents are used to remove dust or foreign substances, and chemical residues or grease are removed. Dirt is removed.

In either method, the final process of cleaning is generally performed by rinsing pure water, but since pure water (De-Ionized Water) is an insulator, the glass substrate
Due to the friction between 12 and water, static electricity is generated, and when it accumulates on the glass substrate 12 to a certain extent, it is discharged, whereby
As shown in the plan view and sectional view of FIG. 3, the metal pattern 13 on the glass substrate 12 may be destroyed.

[0005]

Therefore, in a glass mask for an integrated circuit having a large number of fine patterns, the pattern destruction due to this discharge causes fatal damage to the mask.

Further, even in a glass substrate on which no pattern is formed, even if dust is once removed by the static electricity, ultrafine dust floating in the air after being pulled from pure water is attracted by the static electricity. It causes pollution.

In order to solve the above-mentioned problems, the present invention is provided for the purpose of suppressing static electricity generated on a glass substrate and preventing discharge damage of a pattern and adhesion of dust.

[0008]

FIG. 1 illustrates the principle of the present invention. In the figure, 1 is a substrate holder, 2 is a glass substrate, 3 is a cleaning tank, 4 is pure water, 5 is electric charge, 6 is a ground wire, 7
Is a resin frame, 8 is a thin metal wire, 9 is an ionizer gun, 10 is a gas, and 11 is an electromagnet.

In the present invention, in order to solve the above problems, the glass substrate 2 held in the substrate holder 1 is washed with a cleaning tank 3
In the method of rinsing by moving up and down in pure water 4 in the inside, FIG. 1 (a) is a perspective view, FIG. 1 (b) is a sectional view from the side of the substrate, and FIG. As shown in the elevation view from FIG. 1, the glass substrate 2 held in the substrate holder 1 is vertically moved in pure water 4 in the cleaning tank 3 to rinse the glass substrate 2, and the glass substrate 2 is vertically moved. By applying a magnetic field in the direction perpendicular to the positive and negative charges 5 generated on the glass substrate 2 to one side of the surface of the glass substrate 2 and moving the charges 5 to the ground line 6, As shown in (b), the substrate holder 1 holding the glass substrate 2 is densely planted in an insulating resin frame 7, and
By having a structure in which the end portion of the glass substrate 2 is held by the thin metal wire 8 connected to the ground wire 6, the glass substrate 2 can be moved up and down and pulled up from the pure water 4 surface. This is accomplished by spraying a gas 10 on the surface of the glass with an ionizer gun 9 and further changing the SN direction of the magnetic field in synchronization with the vertical movement of the glass substrate 2.

[0010]

In the present invention, in the final deionized water rinsing process, when the glass substrate is moved up and down in the rinsing deionized water, a magnetic field is applied at a right angle to the glass substrate, which is generated by the magnetic field on the glass substrate. The electric charge is collected on one side and escaped through the ground wire (earth), and the influence of static electricity can be minimized.

[0011]

DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 2 is an explanatory view of an embodiment of the present invention. In the figure, 1 is a substrate holder, 2 is a glass substrate, 3 is a cleaning tank, 4 is pure water, 5 is electric charge, 6 is a ground wire, 7 is a resin frame, 8
Is a fine metal wire, 9 is an ionizer gun, 10 is a gas, and 11 is an electromagnet.

As shown in FIG. 2 (a), the resin frame 7 in the glass substrate holding portion of the resinous substrate holder 1 for accommodating the glass substrate 2 contained in the cleaning tank 3 shown by the chain line is a thin platinum metal. As shown in FIG. 2 (b), which is a top view and FIG. 2 (c) is a perspective view, in which the thin metal wires 8 are densely planted, the end surface of the glass substrate 2 is covered with metal thin wires 8 from both sides. It has a sandwich structure. And the densely planted platinum wires are grouped together at the root to form the ground wire 6. Further, electromagnets 11 whose outer shape is shown by a dotted line are provided on both outer sides of the cleaning tank 3 so as to face the front and back surfaces of the glass substrate 2 in the cleaning tank 3.

After immersing the glass substrate 2 in pure water 4,
The handle of the substrate holder 1 is moved up and down to rinse the chemicals on the glass substrate 2 and rinse them. At the time of the vertical movement, the ultrapure water 4 which is an insulator rubs against the glass substrate 2 to generate static electricity, and positive and negative charges 5 are generated on the glass substrate 2 as shown in FIG.

In the present invention, a current is passed through the electromagnet 11
Since a magnetic field of 0 Gauss is applied in synchronization with the vertical movement of the glass substrate 2, and the peripheral end face of the glass substrate 2 is held by the thin metal wire 8 connected to the ground wire 6, the electric charge 5 gradually increases. The electric charge 5 on the glass substrate 2 disappears by moving to the ground wire 6 and escaping from the ground wire 6.

At the same time when the glass substrate 2 is pulled up, air, nitrogen gas or the like is blown from the ionizer gun 9 onto the surface of the glass substrate 2 at a low pressure of 1 kg or less to prevent generation of static electricity.

[0016]

As described above, according to the present invention,
The accumulation of static electricity on the glass substrate is reduced, and it is possible to prevent electrostatic breakdown of the fine pattern on the glass substrate.

Further, since the dust and the foreign substances are not adsorbed on the glass substrate after the final cleaning due to static electricity, and the cleanliness of the glass substrate can be maintained, the present invention greatly contributes to the quality improvement of the integrated circuit.

[Brief description of drawings]

FIG. 1 is an explanatory view of the principle of the present invention.

FIG. 2 is an explanatory diagram of an embodiment of the present invention.

FIG. 3 is an explanatory diagram of a conventional example.

[Explanation of symbols]

 1 substrate holder 2 glass substrate 3 cleaning tank 4 pure water 5 electric charge 6 ground wire 7 resin frame 8 thin metal wire 9 ionizer gun 10 gas 11 electromagnet

Claims (4)

[Claims] 1. A glass substrate held in a substrate holder (1).
A method of rinsing by moving (2) vertically in pure water (4) in a cleaning tank (3), applying a magnetic field in a direction perpendicular to the vertical movement of the glass substrate (2), A glass characterized in that positive and negative charges (5) generated on the glass substrate (2) are moved to one side of the glass substrate (2) surface respectively, and the charges (5) are moved to the ground wire (6). Substrate cleaning method. 2. The substrate holder (1) for holding the glass substrate (2) is a metal that is densely implanted in an insulating resin frame (7) and is connected to the ground wire (6). The glass substrate cleaning method according to claim 1, wherein the glass substrate (2) has a structure in which an end portion of the glass substrate (2) is held by a thin wire (8). 3. When the glass substrate (2) is moved up and down and pulled up from the surface of the pure water (4), a gas (10) is blown onto the surface of the glass substrate (2) by an ionizer gun (9). The method for cleaning a glass substrate according to claim 1 or 2, characterized in that. 4. The glass substrate cleaning method according to claim 1, wherein the SN direction of the magnetic field is changed in synchronization with the vertical movement of the glass substrate (2).