JPH0313318B2 - - Google Patents

Info

Publication number
JPH0313318B2
JPH0313318B2 JP63286433A JP28643388A JPH0313318B2 JP H0313318 B2 JPH0313318 B2 JP H0313318B2 JP 63286433 A JP63286433 A JP 63286433A JP 28643388 A JP28643388 A JP 28643388A JP H0313318 B2 JPH0313318 B2 JP H0313318B2
Authority
JP
Japan
Prior art keywords
iridium
film
oxide film
potential
iridium oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63286433A
Other languages
English (en)
Japanese (ja)
Other versions
JPH02133599A (ja
Inventor
Yoshuki Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP63286433A priority Critical patent/JPH02133599A/ja
Priority to US07/420,061 priority patent/US5030331A/en
Publication of JPH02133599A publication Critical patent/JPH02133599A/ja
Publication of JPH0313318B2 publication Critical patent/JPH0313318B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/34—Anodisation of metals or alloys not provided for in groups C25D11/04 - C25D11/32
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/1514—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material
    • G02F1/1523—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material comprising inorganic material
    • G02F1/1524—Transition metal compounds
    • G02F1/15245—Transition metal compounds based on iridium oxide or hydroxide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Nonlinear Science (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Physical Vapour Deposition (AREA)
JP63286433A 1988-11-11 1988-11-11 酸化イリジウム膜の製造方法 Granted JPH02133599A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP63286433A JPH02133599A (ja) 1988-11-11 1988-11-11 酸化イリジウム膜の製造方法
US07/420,061 US5030331A (en) 1988-11-11 1989-10-11 Process for preparing iridium oxide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63286433A JPH02133599A (ja) 1988-11-11 1988-11-11 酸化イリジウム膜の製造方法

Publications (2)

Publication Number Publication Date
JPH02133599A JPH02133599A (ja) 1990-05-22
JPH0313318B2 true JPH0313318B2 (en, 2012) 1991-02-22

Family

ID=17704323

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63286433A Granted JPH02133599A (ja) 1988-11-11 1988-11-11 酸化イリジウム膜の製造方法

Country Status (2)

Country Link
US (1) US5030331A (en, 2012)
JP (1) JPH02133599A (en, 2012)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2777677B2 (ja) * 1990-12-13 1998-07-23 工業技術院長 酸化イリジウム膜／金属接合体の製造方法
US5520851A (en) * 1993-11-12 1996-05-28 Ppg Industries, Inc. Iridium oxide film for electrochromic device
US6052271A (en) * 1994-01-13 2000-04-18 Rohm Co., Ltd. Ferroelectric capacitor including an iridium oxide layer in the lower electrode
US5798134A (en) * 1994-10-11 1998-08-25 Agency Of Industrial Science & Technology Process for producing nickel oxide film
US5702575A (en) * 1995-01-27 1997-12-30 Chiron Diagnostics Corporation Method of preparing an electrochemical planar metal/metal oxide electrode
US5935392A (en) * 1995-06-01 1999-08-10 Upscale Water Technologies, Inc. Electrodes for electrolytic removal of nitrates from water, methods of making same, and apparatus incorporating said electrodes
US5958196A (en) * 1995-06-01 1999-09-28 Upscale Water Technologies, Inc. Planar carbon fiber and noble metal oxide electrodes and methods of making the same
US5798860A (en) * 1996-01-16 1998-08-25 Ppg Industries, Inc. Iridium oxide film for electrochromic device
US20030031928A1 (en) * 1999-05-20 2003-02-13 Saint-Gobain Vitrage Electrochemical device
US6586260B2 (en) * 2001-03-28 2003-07-01 Sharp Laboratories Of America, Inc. Single c-axis PGO thin film electrodes having good surface smoothness and uniformity and methods for making the same
US6863792B1 (en) * 2001-10-11 2005-03-08 The Ohio State University Method of making electrochemical detectors based on iridium oxide
US8236443B2 (en) 2002-08-09 2012-08-07 Infinite Power Solutions, Inc. Metal film encapsulation
US20070264564A1 (en) 2006-03-16 2007-11-15 Infinite Power Solutions, Inc. Thin film battery on an integrated circuit or circuit board and method thereof
US8431264B2 (en) 2002-08-09 2013-04-30 Infinite Power Solutions, Inc. Hybrid thin-film battery
US8404376B2 (en) 2002-08-09 2013-03-26 Infinite Power Solutions, Inc. Metal film encapsulation
US8394522B2 (en) 2002-08-09 2013-03-12 Infinite Power Solutions, Inc. Robust metal film encapsulation
US8445130B2 (en) 2002-08-09 2013-05-21 Infinite Power Solutions, Inc. Hybrid thin-film battery
US7993773B2 (en) 2002-08-09 2011-08-09 Infinite Power Solutions, Inc. Electrochemical apparatus with barrier layer protected substrate
US8021778B2 (en) 2002-08-09 2011-09-20 Infinite Power Solutions, Inc. Electrochemical apparatus with barrier layer protected substrate
US8728285B2 (en) 2003-05-23 2014-05-20 Demaray, Llc Transparent conductive oxides
KR100533973B1 (ko) * 2003-06-30 2005-12-07 주식회사 하이닉스반도체 하부전극과 강유전체막의 접착력을 향상시킬 수 있는강유전체캐패시터 형성 방법
CN101931097B (zh) 2004-12-08 2012-11-21 希莫菲克斯公司 LiCoO2的沉积
US7959769B2 (en) 2004-12-08 2011-06-14 Infinite Power Solutions, Inc. Deposition of LiCoO2
US8062708B2 (en) 2006-09-29 2011-11-22 Infinite Power Solutions, Inc. Masking of and material constraint for depositing battery layers on flexible substrates
US8197781B2 (en) 2006-11-07 2012-06-12 Infinite Power Solutions, Inc. Sputtering target of Li3PO4 and method for producing same
US8268488B2 (en) 2007-12-21 2012-09-18 Infinite Power Solutions, Inc. Thin film electrolyte for thin film batteries
CN101903560B (zh) 2007-12-21 2014-08-06 无穷动力解决方案股份有限公司 用于电解质膜的溅射靶的方法
US8518581B2 (en) 2008-01-11 2013-08-27 Inifinite Power Solutions, Inc. Thin film encapsulation for thin film batteries and other devices
US8350519B2 (en) 2008-04-02 2013-01-08 Infinite Power Solutions, Inc Passive over/under voltage control and protection for energy storage devices associated with energy harvesting
KR102155933B1 (ko) 2008-08-11 2020-09-14 사푸라스트 리써치 엘엘씨 전자기 에너지를 수확하기 위한 일체형 컬렉터 표면을 갖는 에너지 디바이스 및 전자기 에너지를 수확하는 방법
EP2332127A4 (en) 2008-09-12 2011-11-09 Infinite Power Solutions Inc ENERGY DEVICE HAVING AN INTEGRATED CONDUCTIVE SURFACE FOR DATA COMMUNICATION VIA ELECTROMAGNETIC ENERGY AND ASSOCIATED METHOD
WO2010042594A1 (en) * 2008-10-08 2010-04-15 Infinite Power Solutions, Inc. Environmentally-powered wireless sensor module
CN102576828B (zh) 2009-09-01 2016-04-20 萨普拉斯特研究有限责任公司 具有集成薄膜电池的印刷电路板
EP2577777B1 (en) 2010-06-07 2016-12-28 Sapurast Research LLC Rechargeable, high-density electrochemical device
US9422154B2 (en) 2010-11-02 2016-08-23 International Business Machines Corporation Feedback control of dimensions in nanopore and nanofluidic devices
US10797238B2 (en) * 2016-01-26 2020-10-06 Arm Ltd. Fabricating correlated electron material (CEM) devices

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4191453A (en) * 1978-06-27 1980-03-04 Bell Telephone Laboratories, Incorporated Iridium oxide based electrochromic devices
US4258984A (en) * 1979-09-14 1981-03-31 Bell Telephone Laboratories, Incorporated Iridium oxide based electrochromic devices

Also Published As

Publication number Publication date
US5030331A (en) 1991-07-09
JPH02133599A (ja) 1990-05-22

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Legal Events

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EXPY Cancellation because of completion of term