JPH03125344U - - Google Patents

Info

Publication number
JPH03125344U
JPH03125344U JP3535890U JP3535890U JPH03125344U JP H03125344 U JPH03125344 U JP H03125344U JP 3535890 U JP3535890 U JP 3535890U JP 3535890 U JP3535890 U JP 3535890U JP H03125344 U JPH03125344 U JP H03125344U
Authority
JP
Japan
Prior art keywords
light amount
light
detected
detection means
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3535890U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3535890U priority Critical patent/JPH03125344U/ja
Publication of JPH03125344U publication Critical patent/JPH03125344U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の一実施例に係る露光装置を示
す概略説明図、第2図イ及びロは本考案の露光装
置による光量の検出状態を示す説明図であり、同
図イは平面図を、同図ロは光量分布図である。第
3図イ及びロは本考案の露光装置による光量異常
の検出状態を示す説明図であり、同図イは平面図
を、同図ロは光量分布図である。第4図は従来の
露光装置の概略説明図、第5図は従来の露光装置
を構成するレチクル遮蔽機構の一例を示す一部破
断分解斜視図である。 1……光量検出手段、2……検出光量記憶部、
3……基準光量記憶部、4……光量比較手段、5
……インターロツク機構、100……レチクル、
101……光源、110……レンズ系、123,
124……遮蔽板、W……半導体ウエハ、P……
パターン。
FIG. 1 is a schematic explanatory diagram showing an exposure apparatus according to an embodiment of the present invention, FIG. The figure B is a light amount distribution diagram. FIGS. 3A and 3B are explanatory diagrams showing the state of detection of abnormality in light amount by the exposure apparatus of the present invention; FIG. 3A is a plan view, and FIG. 3B is a light amount distribution diagram. FIG. 4 is a schematic explanatory diagram of a conventional exposure apparatus, and FIG. 5 is a partially cutaway exploded perspective view showing an example of a reticle shielding mechanism constituting the conventional exposure apparatus. 1... Light amount detection means, 2... Detected light amount storage section,
3...Reference light amount storage unit, 4...Light amount comparison means, 5
...Interlock mechanism, 100...Reticle,
101...Light source, 110...Lens system, 123,
124... Shielding plate, W... Semiconductor wafer, P...
pattern.

Claims (1)

【実用新案登録請求の範囲】 光源から照射された光を半導体ウエハ上に収束
させるレンズ系と、上記光源から照射される光路
の途中に配置され、上記半導体ウエハ上に露光す
るパターンを形成したレチクルと、上記レチクル
に形成された所定のパターンの周囲を透過する余
分な光を遮蔽する遮蔽板とを備えた露光装置にお
いて、 上記遮蔽板によつて遮蔽され、レチクルのパタ
ーンの周縁と遮蔽板とで遮蔽された部分との間に
照射される光量を検出する光量検出手段と、上記
光量検出手段で検出された光量を記憶する検出光
量記憶部と、 上記光量検出手段によつて検出された検出光量
を、予め検出されて基準光量記憶部に記憶された
基準光量と比較する光量比較手段と、 上記光量比較手段によつて不一致と判断される
と露光作業を停止させるインターロツク機構とを
有することを特徴とする露光装置。
[Claims for Utility Model Registration] A lens system that focuses light emitted from a light source onto a semiconductor wafer, and a reticle that is placed in the middle of the optical path emitted from the light source and forms a pattern to be exposed on the semiconductor wafer. and a shielding plate for shielding excess light passing through the periphery of a predetermined pattern formed on the reticle, wherein the light is shielded by the shielding plate and that the periphery of the pattern on the reticle and the shielding plate are a light amount detection means for detecting the amount of light irradiated between the portion shielded by the light amount detection means; a detected light amount storage section for storing the amount of light detected by the light amount detection means; and a detection light amount detected by the light amount detection means. It has a light amount comparing means for comparing the light amount with a reference light amount detected in advance and stored in a reference light amount storage unit, and an interlock mechanism that stops the exposure operation when the light amount comparing means determines that there is a discrepancy. An exposure device featuring:
JP3535890U 1990-03-30 1990-03-30 Pending JPH03125344U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3535890U JPH03125344U (en) 1990-03-30 1990-03-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3535890U JPH03125344U (en) 1990-03-30 1990-03-30

Publications (1)

Publication Number Publication Date
JPH03125344U true JPH03125344U (en) 1991-12-18

Family

ID=31540645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3535890U Pending JPH03125344U (en) 1990-03-30 1990-03-30

Country Status (1)

Country Link
JP (1) JPH03125344U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011147202A (en) * 2010-01-12 2011-07-28 Tdk-Lambda Corp Switching power unit
WO2012099169A1 (en) * 2011-01-19 2012-07-26 株式会社 テクノバ Contactless power transfer system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011147202A (en) * 2010-01-12 2011-07-28 Tdk-Lambda Corp Switching power unit
WO2012099169A1 (en) * 2011-01-19 2012-07-26 株式会社 テクノバ Contactless power transfer system

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