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Hitachi Ltd
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Hitachi Ltd
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Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to JP2214273ApriorityCriticalpatent/JPH03123017A/ja
Publication of JPH03123017ApublicationCriticalpatent/JPH03123017A/ja
Publication of JPH0546089B2publicationCriticalpatent/JPH0546089B2/ja
Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates
Method of measuring image-forming error of projection optical system, method of manufacturing exposure apparatus, and method of manufacturing semiconductor device