JPH0312233B2 - - Google Patents
Info
- Publication number
- JPH0312233B2 JPH0312233B2 JP60043936A JP4393685A JPH0312233B2 JP H0312233 B2 JPH0312233 B2 JP H0312233B2 JP 60043936 A JP60043936 A JP 60043936A JP 4393685 A JP4393685 A JP 4393685A JP H0312233 B2 JPH0312233 B2 JP H0312233B2
- Authority
- JP
- Japan
- Prior art keywords
- cryopanel
- film
- aluminum
- substrate
- alumite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 25
- 229910052782 aluminium Inorganic materials 0.000 claims description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 13
- 239000007769 metal material Substances 0.000 claims description 10
- 239000010407 anodic oxide Substances 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 238000007743 anodising Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 19
- 239000001307 helium Substances 0.000 description 12
- 229910052734 helium Inorganic materials 0.000 description 12
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 239000003463 adsorbent Substances 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 108010083687 Ion Pumps Proteins 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052754 neon Inorganic materials 0.000 description 3
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 208000016253 exhaustion Diseases 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical group 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Landscapes
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4393685A JPS61205382A (ja) | 1985-03-06 | 1985-03-06 | クライオパネル |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4393685A JPS61205382A (ja) | 1985-03-06 | 1985-03-06 | クライオパネル |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61205382A JPS61205382A (ja) | 1986-09-11 |
| JPH0312233B2 true JPH0312233B2 (zh) | 1991-02-19 |
Family
ID=12677577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4393685A Granted JPS61205382A (ja) | 1985-03-06 | 1985-03-06 | クライオパネル |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61205382A (zh) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1244689B (it) * | 1991-01-25 | 1994-08-08 | Getters Spa | Dispositivo per eliminare l'idrogeno da una camera a vuoto, a temperature criogeniche,specialmente in acceleratori di particelle ad alta energia |
| AT409818B (de) * | 1999-04-26 | 2002-11-25 | Nikolai Dr Korpan | Kryostat |
| WO2010002884A2 (en) * | 2008-07-01 | 2010-01-07 | Brooks Automation, Inc. | Method and apparatus for providing temperature control to a cryopump |
| CN103397999B (zh) * | 2013-07-17 | 2016-03-16 | 安徽万瑞冷电科技有限公司 | 一种增加低温泵抽速的方法 |
| CN111989487B (zh) * | 2018-04-25 | 2022-11-18 | 住友重机械工业株式会社 | 低温泵、低温泵系统及低温泵的再生方法 |
| CN113167435B (zh) | 2018-09-12 | 2023-09-22 | 科罗拉多大学董事会,法人团体 | 用于超低温实验和极高真空（xhv）条件的低温冷却真空室辐射屏障 |
-
1985
- 1985-03-06 JP JP4393685A patent/JPS61205382A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61205382A (ja) | 1986-09-11 |
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