JPH03118986A - Laser beam marking apparatus - Google Patents
Laser beam marking apparatusInfo
- Publication number
- JPH03118986A JPH03118986A JP1253869A JP25386989A JPH03118986A JP H03118986 A JPH03118986 A JP H03118986A JP 1253869 A JP1253869 A JP 1253869A JP 25386989 A JP25386989 A JP 25386989A JP H03118986 A JPH03118986 A JP H03118986A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- mirror
- rotary
- optional
- reflecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010330 laser marking Methods 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 3
- 230000001678 irradiating effect Effects 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/465—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using masks, e.g. light-switching masks
- B41J2/4655—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using masks, e.g. light-switching masks using character templates
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本考案は、レーザマーキング装置の光学系ユニットの構
造に関するもので、特にビームを反射するミラーの構造
に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the structure of an optical system unit of a laser marking device, and particularly to the structure of a mirror that reflects a beam.
[発明の概要]
本考案は、ロータリマスクを使用したレーザマーキング
装置において、ロータリマスクの後方に反射角度の異な
るミラーを複数装着したロータリミラーを設置し、ビー
ムショツト時に任意の゛マスクと任意の反射角度のミラ
ーをコントローラによって組み合せることにより、任意
のパターンを任意の捺印位置に捺印できるようにしたも
のである[従来の技術]
従来この種のレーザマーキング装置は、第2図(α)に
実施例を示すが、複数のマスク11を円周上に並べたロ
ータリマスク4を回転させ、任意のマスク11が、ビー
ム3の照射位置に来たときにレーザ発振器1よりビーム
6を発射し、固定又は第2図′(b)のようなIJ ニ
ア移動式の(2枚〜4枚の)ミラー12によってビーム
を反射し、フォーカスレンズ7を介して捺印するように
なっていた。[Summary of the Invention] The present invention is a laser marking device using a rotary mask, in which a rotary mirror equipped with a plurality of mirrors with different reflection angles is installed behind the rotary mask, and when a beam is shot, an arbitrary mask and an arbitrary reflection By combining angular mirrors using a controller, it is possible to stamp any pattern at any marking position [Prior art] Conventionally, this type of laser marking device was implemented as shown in Fig. 2 (α). As an example, a rotary mask 4 in which a plurality of masks 11 are arranged on the circumference is rotated, and when any mask 11 comes to the irradiation position of the beam 3, the laser oscillator 1 emits the beam 6, and the rotary mask 4 is fixed. Alternatively, the beam is reflected by IJ near movable mirrors 12 (2 to 4 mirrors) as shown in FIG. 2'(b), and stamped via a focus lens 7.
[発明が解決しようとする課題]
しかし、上述の従来のレーザマーキング装置はロータリ
マスクによって任意の捺印パターンを選択して捺印でき
るものの、捺印位置を任意に選択することはほとんどで
きない(最大4箇所程度しか選択できない)という欠点
がある。[Problems to be Solved by the Invention] However, although the conventional laser marking device described above can select and mark any marking pattern using a rotary mask, it is almost impossible to arbitrarily select the marking position (up to 4 positions). The disadvantage is that you can only select
そこで本発明は、このような問題を解決するもので、そ
の目的とするところは、任意の捺印パターンを任意の位
置に捺印できる光学系ユニットを提供することにある。SUMMARY OF THE INVENTION The present invention is intended to solve these problems, and an object of the present invention is to provide an optical system unit that can print an arbitrary seal pattern at an arbitrary position.
[課題を解決するための手段]
本発明のレーザマーキング装置は、レーザ発振器と、レ
ーザ発振器からのビームを中継する反射ミラーと、捺印
パターンを形成したマスクとマスクを装着するロータリ
プレート(マスクと合わせてロータリマスクと呼ぶ)と
、コントローラと、マスクを通過したビームの反射ミラ
ーと、フォーカスレンズから成るレーザマーキング装M
において、マスク通過後のビームを反射するミラーをロ
ータリプレート上に反射角度を変えて装着し、コントロ
ーラによりマスクとタイミングを合わせて任意の文字を
半導体装置などの捺印面上の任意の反射位置に捺印する
レーザマーキング装置光学系ユニット用ロータリミラー
を有することを特徴とする。[Means for Solving the Problems] The laser marking device of the present invention includes a laser oscillator, a reflecting mirror that relays a beam from the laser oscillator, a mask on which a marking pattern is formed, and a rotary plate (combined with the mask) on which the mask is attached. A laser marking device M consists of a rotary mask (called a rotary mask), a controller, a mirror that reflects the beam that has passed through the mask, and a focus lens.
In this process, mirrors that reflect the beam after passing through the mask are mounted on a rotary plate at different reflection angles, and a controller is used to match the timing with the mask to imprint arbitrary characters at arbitrary reflection positions on the marking surface of semiconductor devices, etc. The present invention is characterized by having a rotary mirror for a laser marking device optical system unit.
[作用コ
本発明の上記の構成によれば・、ロータリマスクで任意
のパターンを選び、ロータリミラーで任意の反射角度を
選んでビームを照射することにより任意のパターンを任
意の位置へ捺印できる。[Function] According to the above configuration of the present invention, an arbitrary pattern can be imprinted on an arbitrary position by selecting an arbitrary pattern using a rotary mask, selecting an arbitrary reflection angle using a rotary mirror, and irradiating a beam.
[実施例]
本発明のレーザマーキング装置は、第1図(α)に本発
明の実施例を示すが、レーザ発振器1の先端に中継用反
射ミラー2を設け、ビーム5は中継用反射ミラー2.ロ
ータリマスク4.ロータリミラー5.フォーカスレンズ
7、半導体装置などの捺印物8の順に到達するように構
成している。[Embodiment] In the laser marking device of the present invention, an embodiment of the present invention is shown in FIG. .. Rotary mask 4. Rotary mirror 5. It is configured to reach the focus lens 7 and the printed object 8 such as a semiconductor device in this order.
まず、ロータリマスク4とロータリミラー5を回転させ
、コントローラ乙により、任意のマスク11と任意の反
射角度のミラー12がビーム3の照射位置に来た時に各
々マスク11とミラー12をストップさせる。この時マ
スク11とミラー12の組み合せをあらかじめ決めてお
き、第1図(C)のように対応させておけばストップさ
せずに連続とて回転させたままで良い。次にビーム3を
発振器1より発射すると中継用反射ミラー2を介したビ
ーム5は、任意のマス、り11を通過し、任意のミラー
12で反射され、フォーカスレンズ7を通って所望のパ
ターンを所望の位置へ捺印する。連続して回転している
場合は、タイミングをとり、任意のマスク11とミラー
12が照射位置に来たときにビーム3を発射すれば、同
様の捺印ができる。First, the rotary mask 4 and the rotary mirror 5 are rotated, and when an arbitrary mask 11 and a mirror 12 having an arbitrary reflection angle come to the irradiation position of the beam 3, the mask 11 and the mirror 12 are respectively stopped by the controller B. At this time, if the combination of the mask 11 and the mirror 12 is determined in advance and made to correspond as shown in FIG. 1(C), the rotation can be continued continuously without stopping. Next, when the beam 3 is emitted from the oscillator 1, the beam 5 passes through the relay reflecting mirror 2, passes through an arbitrary mass 11, is reflected by an arbitrary mirror 12, passes through the focus lens 7, and forms a desired pattern. Stamp it in the desired position. In the case of continuous rotation, if the timing is set and the beam 3 is emitted when any mask 11 and mirror 12 come to the irradiation position, a similar imprint can be made.
なお、興なる反射角度のミラーによるビーム反射状態の
違いは第1図<b>のとおりで、反射角度をわずかに変
えるだけで、広い範囲にビームを振ることができる。The difference in the beam reflection state depending on the mirror angle of reflection is as shown in Fig. 1<b>, and by just slightly changing the reflection angle, the beam can be spread over a wide range.
捺印物としては、半導体装置の外に、機械部品や電子部
品等、レーザ加工可能なすべての部品に適用できる。In addition to semiconductor devices, the marking material can be applied to all parts that can be laser processed, such as mechanical parts and electronic parts.
[発明の効果]
以上述べたように本発明によれば、ロータリミラーによ
って任意の方向にレーザビームを反射することにより、
次のような効果を有する。[Effects of the Invention] As described above, according to the present invention, by reflecting a laser beam in an arbitrary direction by a rotary mirror,
It has the following effects.
1) ロータリミラーにより任意の反射角度を選択でき
るので、捺印位置の設定を任意に行えフンキシプルな捺
印が可能になる。1) Since any reflection angle can be selected using the rotary mirror, the marking position can be set arbitrarily, allowing for flexible marking.
2) 捺印物を固定したままビームを広範囲に振ること
ができるので、捺印物を位置決めした状態でも広い範囲
に捺印できる。2) Since the beam can be swung over a wide range while keeping the object fixed, it is possible to imprint a wide area even when the object is positioned.
3) ビームを広範囲に振る方式は他にガルバノメータ
式ミラーを用いる方式があるが、本発明は、構造が簡単
な上に、ガルバノメータ式ミラーのように2枚のミラー
を組み合せて任意の角度をつ(るのではな(各ミラーと
捺印位置とが1:1の対応をするので、調整が容易で装
置価格が安価である。3) There is another method that uses a galvanometer mirror to spread the beam over a wide range, but the present invention has a simple structure and can be used at any angle by combining two mirrors like a galvanometer mirror. (Since there is a 1:1 correspondence between each mirror and the marking position, adjustment is easy and the device cost is low.
第1図(α)は、本発明のレーザマーキング装置の実施
例を示す説明図、第1図(b)は、本発明による実施例
における異なる反射角度のミラーによるビーム反射状態
の詳細図、第1図(C)は、本発明によるロータリマス
クとロータリミラーの組合せ図、第2図(α)、(b)
は、従来の実施例を示す説明図である。
なお、図中(おいて
1・・・・・・・・・レーザ発振器
2・・・・・・・・・中継用反射ミラー5・・・・・・
・・・レーザビーム
4・・・・・・・・・ロータリマスク
5・・・・・・・・・ロータリミラー
6・・・・・・・・・ロータリマスク・コントローラ
7・・・・・・・・・フォーカスレンズ8・・・・・・
・・・捺印物
9・・・・・・・・・モータ
10・・・・・・・・・ミラー
11・・・・・・・・・マスク
12・・・・・・・・・ミラー
ロータリ
ラー用FIG. 1(α) is an explanatory diagram showing an embodiment of the laser marking device of the present invention, FIG. 1(b) is a detailed diagram of the state of beam reflection by mirrors with different reflection angles in the embodiment of the present invention, Figure 1 (C) is a combination diagram of the rotary mask and rotary mirror according to the present invention, and Figures 2 (α) and (b)
FIG. 2 is an explanatory diagram showing a conventional example. In addition, in the figure (1... Laser oscillator 2... Relay reflection mirror 5...
...Laser beam 4...Rotary mask 5...Rotary mirror 6...Rotary mask controller 7... ...Focus lens 8...
...Printed item 9...Motor 10...Mirror 11...Mask 12...Mirror rotary for color
Claims (1)
ターンを形成したマスクとマスクを装着するロータリプ
レート(マスクと合わせてロータリマスクと呼ぶ)と、
コントローラと、マスクを通過したビームの反射ミラー
とフォーカスレンズから成るレーザマーキング装置にお
いて、マスク通過後のビームを反射するミラーをロータ
リプレート上に反射角度を変えて複数装着し、コントロ
ーラによりマスクとタイミングを合せて任意の文字を半
導体装置などの捺印面上の任意の反射位置に捺印するこ
とを特徴とするレーザマーキング装置。A laser oscillator, a reflecting mirror that relays the beam, a mask with a marking pattern formed on it, and a rotary plate on which the mask is attached (together with the mask, it is called a rotary mask).
In a laser marking device that consists of a controller, a mirror that reflects the beam that has passed through the mask, and a focus lens, multiple mirrors that reflect the beam that has passed through the mask are mounted on a rotary plate at different reflection angles, and the mask and timing are adjusted by the controller. Additionally, a laser marking device is characterized in that it stamps arbitrary characters at arbitrary reflection positions on a stamping surface of a semiconductor device or the like.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1253869A JPH03118986A (en) | 1989-09-29 | 1989-09-29 | Laser beam marking apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1253869A JPH03118986A (en) | 1989-09-29 | 1989-09-29 | Laser beam marking apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03118986A true JPH03118986A (en) | 1991-05-21 |
Family
ID=17257264
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1253869A Pending JPH03118986A (en) | 1989-09-29 | 1989-09-29 | Laser beam marking apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03118986A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004026586A1 (en) * | 2002-09-17 | 2004-04-01 | Miller Timothy J | Random laser image projector system and method |
WO2020188657A1 (en) * | 2019-03-15 | 2020-09-24 | 三菱電機ビルテクノサービス株式会社 | Elevator device |
-
1989
- 1989-09-29 JP JP1253869A patent/JPH03118986A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004026586A1 (en) * | 2002-09-17 | 2004-04-01 | Miller Timothy J | Random laser image projector system and method |
US7136084B2 (en) | 2002-09-17 | 2006-11-14 | Miller Timothy J | Random laser image projector system and method |
WO2020188657A1 (en) * | 2019-03-15 | 2020-09-24 | 三菱電機ビルテクノサービス株式会社 | Elevator device |
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