JPH03236974A - Liquid crystal mask printing method and apparatus therefor - Google Patents
Liquid crystal mask printing method and apparatus thereforInfo
- Publication number
- JPH03236974A JPH03236974A JP2031514A JP3151490A JPH03236974A JP H03236974 A JPH03236974 A JP H03236974A JP 2031514 A JP2031514 A JP 2031514A JP 3151490 A JP3151490 A JP 3151490A JP H03236974 A JPH03236974 A JP H03236974A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- crystal mask
- printing
- light beam
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 36
- 238000007639 printing Methods 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title claims description 7
- 238000007493 shaping process Methods 0.000 claims description 9
- 230000002194 synthesizing effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
Landscapes
- Dot-Matrix Printers And Others (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
- Liquid Crystal (AREA)
- Projection-Type Copiers In General (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、液晶マスクを用いた印字方法とその装置に関
するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a printing method and apparatus using a liquid crystal mask.
散乱型等の液晶マスクはパターンの分割数を大きくすれ
ば、1枚のパターン上に多くの文字、あるいは図形情報
を表現できる。A liquid crystal mask such as a scattering type can express a large amount of character or graphic information on one pattern by increasing the number of pattern divisions.
ところが従来の液晶マスクを用いた印字方法及びその装
置は、第4図に示すように、レーザ発振器1から出射さ
れたビームをビームエキスパンダ2にて液晶マスク3の
全面にわたって広げて照射し、これの透過光を結像レン
ズ4て集光して印字面5に1シヨツトで印字するように
していた。However, in the conventional printing method and apparatus using a liquid crystal mask, as shown in FIG. The transmitted light is condensed by an imaging lens 4 and printed on a printing surface 5 in one shot.
上記従来例での印字範囲はレーザ出力と印字面5の材質
によって決まり、かなり狭い範囲しか印字することがで
きなかった。The printing range in the above conventional example is determined by the laser output and the material of the printing surface 5, and it was possible to print only in a fairly narrow range.
例えば、0. 1 m5ec% 4 J / Pのレー
ザでフェノール樹脂のICパッケージに印字する場合、
せいぜい3X12m醜(36mm2)の印字範囲が限界
である。For example, 0. When printing on a phenolic resin IC package with a 1 m5ec% 4 J/P laser,
The printing range is at most 3x12m (36mm2).
印字範囲を大きくするには、出力の高いレーザを使う方
法もあるが装置全体が高価となり、実用的でない。One way to increase the printing range is to use a high-output laser, but the entire device becomes expensive and is not practical.
上記従来の印字方法では、液晶マスクのバタン上に多く
の文字情報が表現されても、1個1個の文字が非常に小
さくなって読みずらくなり、液晶マスクの特徴を活かせ
ない事態が生じる。In the conventional printing method described above, even if a lot of character information is expressed on the button of the liquid crystal mask, each character becomes very small and difficult to read, resulting in a situation where the characteristics of the liquid crystal mask cannot be utilized. .
本発明は上記のことにかんかみなされたもので、1枚の
液晶マスクのパターンを印字面に転写する場合に、その
印字範囲を広げることができるようにした液晶マスク印
字方法及びその装置を提供することを目的とするもので
ある。The present invention has been made in view of the above, and provides a liquid crystal mask printing method and apparatus thereof that can widen the printing range when transferring the pattern of one liquid crystal mask onto a printing surface. The purpose is to
上記目的を遠戚するために、本発明に係る液晶マスク印
字方法は、レーザビーム等の光ビームを液晶マスクの分
割面を順次照射して、この液晶マスク上のパターンを印
字面上に合成して印字する。In order to achieve the above object, the liquid crystal mask printing method according to the present invention sequentially irradiates the divided surfaces of the liquid crystal mask with a light beam such as a laser beam, and synthesizes the pattern on the liquid crystal mask onto the printing surface. to print.
またその装置は、レーザ発振器等の光ビーム発生源と液
晶マスクとの間に、光ビーム成形手段と、この光ビーム
成形手段にて成形された光ビームを液晶マスクの分割面
上に順次選択的に照射する照射位置選択用ミラーを介装
した構成となっている。The device also includes a light beam shaping means between a light beam generation source such as a laser oscillator and the liquid crystal mask, and a light beam shaped by the light beam shaping means is selectively applied to the divided planes of the liquid crystal mask. The configuration includes a mirror for selecting the irradiation position that irradiates the area.
本発明の実施例を第1図から第3図に基ついて説明する
。Embodiments of the present invention will be described with reference to FIGS. 1 to 3.
レーザ発振器1と液晶マスク3の間に、レザ発振器1か
ら出射されたレーザビームを略矩形状に成形するビーム
成形レンズ6と、このビーム成形レンズ6を経たレーザ
ビームを液晶マスク3の面上で、例えばASB、Cの3
つの面に分割された各分割面を順次照射するスキャナミ
ラー7を介装する。Between the laser oscillator 1 and the liquid crystal mask 3, there is a beam shaping lens 6 that shapes the laser beam emitted from the laser oscillator 1 into a substantially rectangular shape, and the laser beam that has passed through the beam shaping lens 6 is shaped onto the surface of the liquid crystal mask 3. , for example, ASB, C 3
A scanner mirror 7 is interposed to sequentially illuminate each divided surface.
しかして、レーザ発振器1から出射されたレーザビーム
は、ビーム成形レンス6にて略矩形状に成形されてから
スキャナミラー7にて液晶マスク3の分割面A、B、C
を順次結像照射され、印字面5には、上記液晶マスク3
の各分割面A、B、Cの部分のパターンか順次位置がず
れて印字される。The laser beam emitted from the laser oscillator 1 is shaped into a substantially rectangular shape by a beam shaping lens 6 and then passed through a scanner mirror 7 to the dividing planes A, B, and C of the liquid crystal mask 3.
are sequentially imaged and irradiated, and the above-mentioned liquid crystal mask 3 is placed on the printing surface 5.
The patterns on each of the divided planes A, B, and C are printed with their positions shifted sequentially.
上記液晶マスク3上の分割数は3個にかぎるものではな
く、5分割、10分割とさらに分割数を増やすことが可
能であり、分割数に応じて印字範囲を広げることができ
る。The number of divisions on the liquid crystal mask 3 is not limited to three, but can be further increased to five or ten, and the printing range can be expanded according to the number of divisions.
第2図は液晶マスク印字装置の他側を示すもので、レー
ザ発振器1と液晶マスク3の間に、レーザビームを略矩
形に成形するために、シリンドリカルミラー8とシリン
ドリカルスキャナミラー9を介装してあり、シリンドリ
カルスキャナミラー9にて液晶マスク3上にレーザビー
ムを分割照射するようになっている。FIG. 2 shows the other side of the liquid crystal mask printing device, in which a cylindrical mirror 8 and a cylindrical scanner mirror 9 are interposed between the laser oscillator 1 and the liquid crystal mask 3 in order to shape the laser beam into a substantially rectangular shape. A cylindrical scanner mirror 9 irradiates the liquid crystal mask 3 with a laser beam in parts.
また液晶マスク3への分割照射パターンも第1図、第2
図に示すもののほかに第3図に示すように、格子枠状に
分割照射してもよい。The divided irradiation pattern on the liquid crystal mask 3 is also shown in Figs. 1 and 2.
In addition to what is shown in the figure, as shown in FIG. 3, irradiation may be performed in a lattice frame.
次に本発明の具体的な実施例を第1図に示す例で説明す
る。Next, a specific embodiment of the present invention will be described using an example shown in FIG.
(1)レーザ YAGパルスレーザ、0.1mm、4J/P。(1) Laser YAG pulse laser, 0.1mm, 4J/P.
ビーム径1.0 mm
(2)ビーム成形レンズ
シリンドリカルレンズ、f=150
(3)スキャナミラー
2個、ミラー形状20 X 35 +++m(4)液晶
マスク
パターン部、70 X 70 +n+n(5)結像レン
ズ
直径120m、メニスカスレンズ
(6)照射分割数
格子状に6分割
上記条件でフェノール樹脂の印字面に照射印字し、8×
8關、印字の6倍、つまり24X]、6mmの印字がで
きた。Beam diameter 1.0 mm (2) Beam shaping lens cylindrical lens, f=150 (3) 2 scanner mirrors, mirror shape 20 x 35 +++m (4) Liquid crystal mask pattern section, 70 x 70 +n+n (5) Imaging lens Diameter 120m, Meniscus lens (6) Number of irradiation divisions Divided into 6 in a grid pattern Irradiation printing was performed on the printing surface of phenolic resin under the above conditions, 8×
8 times, 6 times the printing size, that is, 24X], and 6 mm printing was possible.
〔発明の効果〕
本発明によれば、1個の分割照射当りの印字面積が従来
と同じ印字面積がとれるので、分割照射したものを合成
することにより、結果として広い範囲の印字を行なうこ
とができる。[Effects of the Invention] According to the present invention, the printing area per divided irradiation can be the same as that of the conventional method, so by combining the divided irradiations, it is possible to print over a wide range as a result. can.
第1図、第2図は本発明の異なる実施例を示す概略的な
説明図、第3図は照射パターン図である。第4図は従来
例を示す概略的な説明図である。
]はレーザ発振器、3は液晶マスク、5は印字面、6は
ビーム成形レンズ、7はスキャナミラー 8はシリンド
リカルミラー 9はシリンドリカルスキャナミラー1 and 2 are schematic explanatory diagrams showing different embodiments of the present invention, and FIG. 3 is an irradiation pattern diagram. FIG. 4 is a schematic explanatory diagram showing a conventional example. ] is a laser oscillator, 3 is a liquid crystal mask, 5 is a printing surface, 6 is a beam shaping lens, 7 is a scanner mirror, 8 is a cylindrical mirror, 9 is a cylindrical scanner mirror
Claims (2)
割面を順次照射して、この液晶マスク3上のパタンを印
字面5上に合成して印字するようにしたことを特徴とす
る液晶マスク印字方法。(1) A liquid crystal display characterized in that a light beam such as a laser beam 1 is sequentially irradiated onto the divided surfaces of the liquid crystal mask 3, and the patterns on the liquid crystal mask 3 are combined and printed on the printing surface 5. Mask printing method.
3との間に、光ビーム成形手段と、この光ビーム成形手
段にて成形された光ビームを液晶マスク3の分割面上に
順次選択的に照射する照射位置選択用ミラーを介装した
ことを特徴とする液晶マスク印字装置。(2) A light beam shaping means is provided between the light beam generation source such as the laser oscillator 1 and the liquid crystal mask 3, and the light beam shaped by the light beam shaping means is sequentially selected onto the divided plane of the liquid crystal mask 3. A liquid crystal mask printing device characterized by interposing a mirror for selecting an irradiation position to irradiate a target.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2031514A JPH03236974A (en) | 1990-02-14 | 1990-02-14 | Liquid crystal mask printing method and apparatus therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2031514A JPH03236974A (en) | 1990-02-14 | 1990-02-14 | Liquid crystal mask printing method and apparatus therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03236974A true JPH03236974A (en) | 1991-10-22 |
Family
ID=12333318
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2031514A Pending JPH03236974A (en) | 1990-02-14 | 1990-02-14 | Liquid crystal mask printing method and apparatus therefor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03236974A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7227610B2 (en) * | 2003-11-08 | 2007-06-05 | Lg.Philips Lcd Co., Ltd. | Pattern mask, liquid crystal injection process, and method of fabricating LCD device using the same |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0296782A (en) * | 1988-10-04 | 1990-04-09 | Matsushita Electric Ind Co Ltd | Laser printer |
-
1990
- 1990-02-14 JP JP2031514A patent/JPH03236974A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0296782A (en) * | 1988-10-04 | 1990-04-09 | Matsushita Electric Ind Co Ltd | Laser printer |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7227610B2 (en) * | 2003-11-08 | 2007-06-05 | Lg.Philips Lcd Co., Ltd. | Pattern mask, liquid crystal injection process, and method of fabricating LCD device using the same |
US7362411B2 (en) | 2003-11-08 | 2008-04-22 | Lg.Philips Lcd Co., Ltd. | Pattern mask, liquid crystal injection process, and method of fabricating LCD device using the same |
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