JPH0311886Y2 - - Google Patents
Info
- Publication number
- JPH0311886Y2 JPH0311886Y2 JP1985011677U JP1167785U JPH0311886Y2 JP H0311886 Y2 JPH0311886 Y2 JP H0311886Y2 JP 1985011677 U JP1985011677 U JP 1985011677U JP 1167785 U JP1167785 U JP 1167785U JP H0311886 Y2 JPH0311886 Y2 JP H0311886Y2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor element
- ring
- fixing jig
- insulator
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 19
- 239000012212 insulator Substances 0.000 claims description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- 239000011810 insulating material Substances 0.000 claims description 5
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 238000002161 passivation Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 230000006698 induction Effects 0.000 description 4
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
Landscapes
- Die Bonding (AREA)
- Thyristors (AREA)
Description
【考案の詳細な説明】
(イ)産業上の利用分野
本考案は静電誘導形サイリスタやゲートターン
オフサイリスタなど、圧接型半導体素子に関し、
特にそのシール構造の改良に関する。[Detailed description of the invention] (a) Industrial application field The present invention relates to pressure contact type semiconductor devices such as electrostatic induction thyristors and gate turn-off thyristors.
In particular, it relates to improvements in its seal structure.
(ロ)従来の技術
一般に、静電誘導形サイリスタなどの圧接型半
導体素子においては素子の表面の外周部分にパツ
シベーシヨンとしての絶縁物が塗布され、その内
部に多数のカソード電極が備えられている。(B) Prior Art Generally, in pressure contact type semiconductor devices such as electrostatic induction thyristors, an insulating material is applied as a passivation to the outer peripheral portion of the surface of the device, and a large number of cathode electrodes are provided inside the insulating material.
第2図は従来の静電誘導サイリスタのシール構
造の一例を示す説明図であり、1はシールとして
の銅ブロツク、2はキヤツプとして半導体素子6
の下側に設けられている銅ブロツク、3はゲート
電極の引き出し線、4は多数のカソード電極を圧
接せしめるリング、5は半導体素子6を固定する
断面L字状の固定治具、7はパツシベーシヨンと
して使用される例ればシリコンゴムなどの絶縁物
である。 FIG. 2 is an explanatory diagram showing an example of the seal structure of a conventional electrostatic induction thyristor, in which 1 is a copper block as a seal, 2 is a semiconductor element 6 as a cap.
3 is a lead wire for the gate electrode, 4 is a ring for press-contacting a large number of cathode electrodes, 5 is a fixing jig with an L-shaped cross section for fixing the semiconductor element 6, and 7 is a passivation. An example of this is an insulating material such as silicone rubber.
第2図においては、半導体素子6の表面の外周
部分に絶縁物7が塗布され、その内部に多数のカ
ソード電極(図示せず)と接触するモリブデンな
どのリング4が備えられ、更に絶縁物7を覆う如
くリング4、半導体素子6および銅ブロツク2の
それぞれの外周端に係合せしめて素子を固定する
例えばテフロンなどの固定治具5が備えられてい
る。また、半導体素子6のゲート電極(図示せ
ず)からリング4の中央部分および銅ブロツク1
の中を経てゲートの引き出し線3が外部に引き出
され、リング4上の銅ブロツク1と半導体素子6
の下面に接触するキヤツプとしての銅ブロツク2
とによつて、リング4および半導体素子6などが
圧接せしめられている。 In FIG. 2, an insulator 7 is applied to the outer circumferential portion of the surface of the semiconductor element 6, and a ring 4 made of molybdenum or the like is provided inside the insulator 7 to be in contact with a number of cathode electrodes (not shown). A fixing jig 5 made of, for example, Teflon is provided for fixing the elements by engaging with the outer peripheral ends of the ring 4, the semiconductor element 6, and the copper block 2 so as to cover the elements. Further, from the gate electrode (not shown) of the semiconductor element 6 to the center part of the ring 4 and the copper block 1
The gate lead wire 3 is led out through the inside, and the copper block 1 on the ring 4 and the semiconductor element 6 are connected to each other.
Copper block 2 as a cap that contacts the bottom surface of
The ring 4, the semiconductor element 6, etc. are brought into pressure contact with each other.
(ハ)考案が解決しようとする問題点
しかしながら、かようなシール構造では、素子
の固定の際固定治具5の内面が絶縁物7の表面に
当接するので、絶縁物7が半導体素子6から剥が
れ、素子の特性不良や劣化の原因の要素となるこ
とがあつた。(c) Problems to be solved by the invention However, in such a seal structure, the inner surface of the fixing jig 5 comes into contact with the surface of the insulator 7 when the element is fixed, so that the insulator 7 is separated from the semiconductor element 6. This could be a factor that causes peeling, poor characteristics of the device, and deterioration.
本考案の目的とするところは上述したような問
題点を解決し、絶縁物7が固定治具5の内面に接
触しないものを提供することにある。 The purpose of the present invention is to solve the above-mentioned problems and provide a fixture in which the insulator 7 does not come into contact with the inner surface of the fixing jig 5.
(ニ)問題点を解決するための手段
その手段は、絶縁物の上部が固定治具の内面に
当接しないように、固定治具の内面に堀り込み溝
を設けた構造である。以下本考案にかかるものの
作用を第1図に示す例えば静電誘導形サイリスタ
の実施例に基づいて詳述する。(d) Means for solving the problem The means is a structure in which a groove is dug into the inner surface of the fixing jig so that the upper part of the insulator does not come into contact with the inner surface of the fixing jig. The operation of the present invention will be described below in detail based on an example of an electrostatic induction thyristor shown in FIG.
(ホ)実施例
第1図は本考案にかかるものの第2図に類した
説明図であり、第2図と同符合のものは同じ構成
部分を示す。(E) Embodiment FIG. 1 is an explanatory diagram similar to FIG. 2 according to the present invention, and the same reference numerals as in FIG. 2 indicate the same components.
第1図において、半導体素子6の表面の外周部
分に塗布された絶縁物7の上部には、固定治具5
1の内面に当接しないように、固定治具51の内
面に堀り込まれた堀り込み溝51aが設けられて
間隙Qが形成されている。 In FIG. 1, a fixing jig 5 is placed on the top of the insulator 7 applied to the outer peripheral portion of the surface of the semiconductor element 6.
A groove Q is formed by providing a groove 51a dug into the inner surface of the fixing jig 51 so as not to contact the inner surface of the fixing jig 51.
また、固定治具51によつて半導体素子6の固定
を行うに際し、図示の如く固定治具51の一方側
の側溝上部51bが半導体素子6の表面に当接す
るため、従来のものより安定した状態で素子を固
定することができる。Furthermore, when fixing the semiconductor element 6 with the fixing jig 51, the groove upper part 51b on one side of the fixing jig 51 comes into contact with the surface of the semiconductor element 6 as shown in the figure, so the state is more stable than in the conventional case. The element can be fixed with.
(ヘ)考案の効果
以上説明したように本考案によつて、固定治具
51の内面が絶縁物7の上部に当接しなくなつた
ので絶縁物が剥がれることがなくなつた。このこ
とによつて、素子が特性不良になつたりあるいは
劣化したりすることがなくなつた。また、側溝の
上部が素子の表面と当接するので従来のものより
リングのずれが少なくなる。更に、従来の製作工
程で且つ部品も同じものを使用することができる
ので、実用性のあるものである。(f) Effects of the invention As explained above, according to the invention, the inner surface of the fixing jig 51 no longer comes into contact with the upper part of the insulator 7, so that the insulator does not peel off. This prevents the device from having poor characteristics or deteriorating. Furthermore, since the upper part of the side groove comes into contact with the surface of the element, there is less misalignment of the ring than in the conventional case. Furthermore, it is practical because the same manufacturing process and the same parts can be used.
第1図は本考案にかかる半導体装置のシール構
造の一実施例を説明するための説明図、第2図は
従来のものの説明図である。
1,2……銅ブロツク、4……リング、5,5
1……固定治具、51a……堀り込み溝、6……
半導体素子、7……絶縁物。
FIG. 1 is an explanatory diagram for explaining one embodiment of a seal structure for a semiconductor device according to the present invention, and FIG. 2 is an explanatory diagram of a conventional one. 1, 2...Copper block, 4...Ring, 5,5
1...Fixing jig, 51a...Drilling groove, 6...
Semiconductor element, 7...insulator.
Claims (1)
としての絶縁物を塗布し、その内部カソード電極
としてのリングを備え、前記絶縁物を覆う如くリ
ングおよび半導体素子のそれぞれの外周端に係合
せしめて素子を固定する固定治具を備え、素子の
両面側に備えられている銅ブロツクによつて、リ
ングおよび半導体素子などを圧接せしめるシール
構造において、前記絶縁物の上部が固定治具の内
面に当接しないように、該固定治具の内面に堀り
込み溝を設けることを特徴とする半導体装置のシ
ール構造。 A fixing method in which an insulating material is applied as a passivation to the outer peripheral part of the surface of a semiconductor element, a ring is provided as an internal cathode electrode, and the element is fixed by engaging the ring and each outer peripheral end of the semiconductor element so as to cover the insulating material. In a seal structure that includes a jig and presses a ring and a semiconductor element, etc., by means of copper blocks provided on both sides of the element, the upper part of the insulator does not come into contact with the inner surface of the fixing jig. A sealing structure for a semiconductor device, characterized in that a groove is provided on the inner surface of the fixing jig.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985011677U JPH0311886Y2 (en) | 1985-01-30 | 1985-01-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985011677U JPH0311886Y2 (en) | 1985-01-30 | 1985-01-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61127649U JPS61127649U (en) | 1986-08-11 |
JPH0311886Y2 true JPH0311886Y2 (en) | 1991-03-20 |
Family
ID=30494018
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985011677U Expired JPH0311886Y2 (en) | 1985-01-30 | 1985-01-30 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0311886Y2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54144871A (en) * | 1978-05-04 | 1979-11-12 | Hitachi Ltd | Semiconducor device |
-
1985
- 1985-01-30 JP JP1985011677U patent/JPH0311886Y2/ja not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54144871A (en) * | 1978-05-04 | 1979-11-12 | Hitachi Ltd | Semiconducor device |
Also Published As
Publication number | Publication date |
---|---|
JPS61127649U (en) | 1986-08-11 |
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