JPH03113722A - Production of magnetic disk - Google Patents
Production of magnetic diskInfo
- Publication number
- JPH03113722A JPH03113722A JP24845189A JP24845189A JPH03113722A JP H03113722 A JPH03113722 A JP H03113722A JP 24845189 A JP24845189 A JP 24845189A JP 24845189 A JP24845189 A JP 24845189A JP H03113722 A JPH03113722 A JP H03113722A
- Authority
- JP
- Japan
- Prior art keywords
- protective film
- substrate
- liquid lubricant
- magnetic disk
- lubricant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 63
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000010687 lubricating oil Substances 0.000 claims abstract description 34
- 239000010408 film Substances 0.000 claims abstract description 28
- 230000001681 protective effect Effects 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 230000001050 lubricating effect Effects 0.000 claims abstract description 18
- 238000010438 heat treatment Methods 0.000 claims abstract description 14
- 239000010409 thin film Substances 0.000 claims abstract description 8
- 238000007598 dipping method Methods 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 6
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 8
- 239000000314 lubricant Substances 0.000 abstract description 9
- 238000005461 lubrication Methods 0.000 abstract description 7
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 30
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910018134 Al-Mg Inorganic materials 0.000 description 1
- 229910018467 Al—Mg Inorganic materials 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910020676 Co—N Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- -1 spin cord methods Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野]
この発明は、コンピュータなどの外部メモリとして使用
される固定磁気ディスク装置に搭載される磁気ディスク
の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a magnetic disk mounted in a fixed magnetic disk device used as an external memory of a computer or the like.
近年、情報処理の増大につれてコンピュータなどのメモ
リの大容量化が進み、磁気ディスク装置の記憶素子は、
従来の塗布型磁気ディスクにかわって、より高密度記録
が可能な強磁性金属からなる連続磁性薄膜を記録層とす
る、いわゆる薄膜磁気ディスクが主流となってきている
。In recent years, with the increase in information processing, the capacity of memory in computers and other devices has increased, and the storage elements of magnetic disk drives have become
In place of conventional coated magnetic disks, so-called thin-film magnetic disks, in which the recording layer is a continuous magnetic thin film made of ferromagnetic metal that enables higher-density recording, have become mainstream.
固定磁気ディスク装置では、一般にC8S方式が採られ
る。磁気ディスクは磁気ヘッドと組み合わせて装置内に
組み込まれ、磁気ヘッドは装置停止中は停止している磁
気ディスク表面に接触して停止しており、装置駆動時(
情報の記録・再生時)には高速回転している磁気ディス
ク表面上を僅かに浮上して走行し、装置の駆動開始時と
中止時には磁気ディスク表面と接触摺動する。従って、
磁気ディスクは高密度記録に対応できる優れた磁気特性
とともに、その表面に対して、磁気ヘッドとの接触摺動
が良好に行われ、しかも停止中の磁気ヘッドの吸着が起
きないように適度に粗れた面で優れた潤滑特性を有し、
かつ、高密度記録を可能とするための磁気ヘッドの低浮
上走行を乱すような微小突起が存在しないことが要求さ
れる。Fixed magnetic disk drives generally use the C8S system. The magnetic disk is built into the device in combination with a magnetic head, and when the device is stopped, the magnetic head comes into contact with the surface of the stopped magnetic disk, and when the device is running (
When recording/reproducing information), the magnetic disk travels slightly floating above the surface of a magnetic disk rotating at high speed, and slides into contact with the surface of the magnetic disk when starting and stopping drive of the device. Therefore,
A magnetic disk has excellent magnetic properties that can support high-density recording, and its surface has a suitable roughness that allows good sliding contact with the magnetic head and prevents the magnetic head from attracting the magnetic head when it is stopped. It has excellent lubrication properties on hard surfaces.
In addition, it is required that there be no minute protrusions that would disturb the low flying motion of the magnetic head to enable high-density recording.
このために、薄膜磁気ディスクは、通常、A1合金基板
に無電解めっき法でN1−P合金層を形成した非磁性基
板、あるいはガラスを材料とする非磁性基板上に、必要
に応じて磁気特性を向上させるための非磁性金属下地層
9例えばCr下地層を設け、その上にスパッタ法あるい
は蒸着法などで強磁性金属2例えばCO合金からなる連
続磁性薄膜と同じく薄膜の硬質保護膜とが順次成膜積層
されている。For this reason, thin-film magnetic disks are usually manufactured using a non-magnetic substrate made of an A1 alloy substrate with an N1-P alloy layer formed by electroless plating, or a non-magnetic substrate made of glass. A non-magnetic metal underlayer 9 for example, a Cr underlayer is provided, and a continuous magnetic thin film made of a ferromagnetic metal 2, for example a CO alloy, and a similarly thin hard protective film are sequentially formed thereon by sputtering or vapor deposition. Films are laminated.
硬質保護膜は磁性薄膜を保護するために設けられるもの
で、炭素、二酸化シリコンなどの酸化物。The hard protective film is provided to protect the magnetic thin film, and is made of oxides such as carbon and silicon dioxide.
あるいは他のセラミック材料などの安定で硬質な材料か
らなる。この硬質保護膜の表面は、良好な潤滑特性と磁
気ヘッドの安定な低浮上走行(浮上量0.1μl′11
〜0.3μm)とを実現するために、中心線平均粗さR
aで20人〜100人に微細に粗れた面とされ、かつ、
表面の微小突起は除去されている。Alternatively, it may be made of stable, hard materials such as other ceramic materials. The surface of this hard protective film has good lubrication properties and stable low flying motion of the magnetic head (flying height 0.1μl'11
~0.3 μm), the center line average roughness R
A has a finely roughened surface of 20 to 100 grains, and
Surface microprotrusions have been removed.
そうして、この保護膜表面には潤滑特性をさらに改善す
るために液体潤滑剤の塗布された潤滑層が形成されてい
る。A lubrication layer coated with a liquid lubricant is then formed on the surface of this protective film to further improve the lubrication properties.
液体潤滑剤としては、フォンプリン(商品名モンテジソ
ン社製)、タライトックス(商品名;デュポン社製)、
デムナム(商品名;ダイキンエ業■製)などのフロロカ
ーボン系の液体潤滑剤が有効であることが知られている
。また、液体潤滑剤の塗布方法としては、スピンコード
法、スプレー法、パフ法、浸漬法などが知られているが
、生産性の高い浸漬法が多用されている。Examples of liquid lubricants include Fonpurin (product name: manufactured by Montegisson), Talitox (product name: manufactured by DuPont),
Fluorocarbon-based liquid lubricants such as Demnum (trade name; manufactured by Daikin Industries, Ltd.) are known to be effective. Further, as methods for applying liquid lubricants, spin cord methods, spray methods, puff methods, dipping methods, and the like are known, but the dipping method is often used because of its high productivity.
磁気ディスクの表面に形成される潤滑層の膜厚は10人
〜20人程度の薄層であることが要求される。The thickness of the lubricating layer formed on the surface of the magnetic disk is required to be about 10 to 20 layers thick.
10人程度より薄いと均一な安定な層の形成が難しく、
良好な潤滑特性が得られない。20人程度以上に厚くな
ると磁気ヘッドの吸着が起きやすくなる。If it is thinner than about 10 people, it will be difficult to form a uniform and stable layer.
Good lubrication properties cannot be obtained. When the number of people increases to about 20 or more, the magnetic head tends to be attracted.
液体潤滑剤をこのように薄く均一に塗布することは非常
に難しい。It is extremely difficult to apply liquid lubricant in such a thin and uniform manner.
また、いったん潤滑層を形成した液体潤滑剤は、ディス
ク表面に強固に密着していて、使用中にマイグレーショ
ンをおこしたり離脱したすせずに安定に存在することが
必要である。ところが、潤滑層の下地の保護膜表面は極
めて微細にあれた粗面であるために液体潤滑剤との機械
的密着力は弱く、かつ、保護膜の材質は不活性であり、
物理的、化学的結合力も弱く、強固な密着性が得られに
くいという問題があった。In addition, once the liquid lubricant has formed a lubricating layer, it is necessary that the liquid lubricant adheres firmly to the disk surface and exists stably without causing migration or detachment during use. However, since the surface of the protective film underlying the lubricating layer is a rough surface with extremely fine roughness, the mechanical adhesion with the liquid lubricant is weak, and the material of the protective film is inert.
There was a problem that the physical and chemical bonding strength was weak, making it difficult to obtain strong adhesion.
さらに、高分子材料である液体潤滑剤は分子量分布をも
ち、低分子量成分は気化しやすい。このために、磁気デ
ィスク表面に塗布された液体潤滑剤の低分子量成分は使
用中に揮発していき、潤滑層の潤滑特性が変化するとい
う問題もあった。Furthermore, liquid lubricants that are polymeric materials have a molecular weight distribution, and low molecular weight components are easily vaporized. For this reason, there is a problem in that the low molecular weight components of the liquid lubricant applied to the surface of the magnetic disk volatilize during use, changing the lubricating properties of the lubricating layer.
これらの問題を解消するために、保護膜材料。To eliminate these problems, protective film materials.
潤滑剤材料、あるいは潤滑層の形成方法などについて多
くの提案がなされているが、まだ充分満足できる状況に
はいたっていない。Many proposals have been made regarding lubricant materials and methods for forming lubricant layers, but none have yet reached a fully satisfactory state.
この発明は、上述の点に鑑みてなされたものであって、
磁気ディスク表面に密着性が良好で、経時的に安定で耐
久性に優れた潤滑層を形成できる、磁気ディスクの製造
方法を提供することを課題とする。This invention was made in view of the above points, and
An object of the present invention is to provide a method for manufacturing a magnetic disk, which can form a lubricating layer with good adhesion, stability over time, and excellent durability on the surface of a magnetic disk.
上記の課題は、この発明によれば、ディスク状の非磁性
基板上に強磁性金属連続磁性薄膜および硬質保護膜をこ
の順に形成し、さらにこの硬質保護膜上に液体潤滑剤を
塗布して潤滑層を形成する工程を含む磁気ディスクの製
造方法において、前記硬質保護膜まで形成された非磁性
基板を加熱処理し、続いてその表面に浸漬法により液体
潤滑剤を塗布し、続いて後加熱処理し、さらに続いて少
なくとも3600rpITlで少なくとも30分間ディ
スク状の非磁性基板の垂直中心軸を軸として回転させて
潤滑層を形成する方法を採ることによって解決される。According to the present invention, the above problem can be solved by forming a ferromagnetic metal continuous magnetic thin film and a hard protective film in this order on a disk-shaped non-magnetic substrate, and then applying a liquid lubricant on the hard protective film to lubricate it. In a method for manufacturing a magnetic disk including a step of forming a layer, the non-magnetic substrate on which the hard protective film has been formed is heat-treated, a liquid lubricant is then applied to the surface by a dipping method, and then post-heat treatment is performed. However, the problem can be solved by forming a lubricating layer by subsequently rotating the disk-shaped nonmagnetic substrate about its vertical central axis at at least 3600 rpITl for at least 30 minutes.
保護膜形成後液体潤滑剤塗布までの放置期間中に保護膜
表面は雰囲気の影響を受けるが、一般的には水分の影響
が最も大きい。液体潤滑剤塗布前に加熱処理を行うこと
により、保護膜表面の吸着水の状態、あるいは水分によ
る変質の状態(例えば、炭素保護膜表面のハイドロカー
ボンの状態など)を放置期間の長短に左右されることな
く一定化させることができ、密着性が良好で均一な潤滑
層を形成することができる。加熱温度は110℃〜20
0℃の範囲内でよく、加熱時間は少なくとも1時間加熱
すれば充分である。The surface of the protective film is affected by the atmosphere during the period of time after the protective film is formed and until the liquid lubricant is applied, but generally the influence of moisture is the greatest. By performing heat treatment before applying liquid lubricant, the state of adsorbed water on the surface of the protective film or the state of deterioration due to moisture (for example, the state of hydrocarbon on the surface of the carbon protective film) can be changed depending on the length of time it is left. The lubricating layer can be kept constant without any fluctuation, and a uniform lubricating layer with good adhesion can be formed. Heating temperature is 110℃~20℃
The temperature may be within the range of 0°C, and heating for at least 1 hour is sufficient.
また、前述のように、有機高分子材料である液体潤滑剤
は分子量分布を有し、低分子量成分は揮発しやすいが、
液体潤滑剤塗布後、後加熱処理を行うことにより、塗布
された液体潤滑剤中の低分子量成分が揮発し除去され、
安定に存在し得る液体潤滑剤だけが保護膜上にとどまり
、経時的に安定な潤滑層を形成することになる。低分子
を成分およびその含有量は液体潤滑剤により異なるが、
100℃以上200℃以下の温度で少なくとも1時間加
熱処理を行うことにより、不安定な低分子量成分を実用
上問題とならない程度に除去することができる。In addition, as mentioned above, liquid lubricants that are organic polymer materials have a molecular weight distribution, and low molecular weight components easily volatilize.
After applying the liquid lubricant, by performing post-heat treatment, the low molecular weight components in the applied liquid lubricant are volatilized and removed.
Only the liquid lubricant that can exist stably remains on the protective film, forming a stable lubricant layer over time. The low molecular components and their content vary depending on the liquid lubricant, but
By performing the heat treatment at a temperature of 100° C. or more and 200° C. or less for at least 1 hour, unstable low molecular weight components can be removed to the extent that they do not pose a practical problem.
さらに、引き続いて少なくとも3600rpmの高速回
転で少なくとも30分間回転させることにより、単に浸
漬するだけでは必ずしも保護膜上に均一に存在していな
かった液体潤滑剤は非常に均一化された状態で存在する
ようになる。通常、固定磁気ディスク装置においては、
磁気ディスクの回転は3600rpm程度で実用化され
ているケースが多く、少なくとも3600rpmで安定
化させておけば実用に耐え得る。また、少なくとも30
分間回転させれば、液体潤滑剤は保護膜表面に均一な膜
厚で安定して存在するようになり、その後マイグレーシ
ョンなどを起こすことはない。Furthermore, by subsequently rotating at a high speed of at least 3600 rpm for at least 30 minutes, the liquid lubricant, which was not necessarily uniformly present on the protective film by mere immersion, is present in a highly homogeneous state. become. Usually, in fixed magnetic disk drives,
In many cases, the rotation of a magnetic disk is put into practical use at about 3600 rpm, and it can withstand practical use if it is stabilized at at least 3600 rpm. Also, at least 30
By rotating for a minute, the liquid lubricant will stably exist on the surface of the protective film with a uniform thickness, and no migration will occur thereafter.
かくして、保護膜まで形成された非磁性基板を、前加熱
した後液体潤滑剤を塗布し、続いて後加熱し、その後高
速回転させるという工程で潤滑層を形成することにより
、密着性が良好で、経時的に安定で耐久性に優れた潤滑
層を有する磁気ディスクを得ることができる。In this way, good adhesion can be achieved by forming a lubricant layer through the steps of pre-heating the non-magnetic substrate on which a protective film has been formed, applying a liquid lubricant, then post-heating, and then rotating at high speed. , it is possible to obtain a magnetic disk having a lubricating layer that is stable over time and has excellent durability.
実施例1
外径95mm、内径25■、 厚さ2.7m+nのディ
スク状のAl−Mg合金基板の表面に無電解めっき法で
Ni2合金層を形成し、その表面を研磨して平滑にした
後、さらに研磨テープにより円周方向にテクスチャアを
施し、表面粗さが中心線平均粗さRaで約35人の磁気
ディスクの基板とした。この基板上にスパッタ法により
膜厚1500人のCr下地層、膜厚450人のCo−N
i−Cr合金磁性層、膜厚200人の8102保護層を
順次成膜した。Example 1 A Ni2 alloy layer was formed by electroless plating on the surface of a disk-shaped Al-Mg alloy substrate with an outer diameter of 95 mm, an inner diameter of 25 mm, and a thickness of 2.7 m+n, and the surface was polished to make it smooth. Further, texture was applied in the circumferential direction with an abrasive tape, and the surface roughness was made into a substrate for a magnetic disk of about 35 people with a center line average roughness Ra. On this substrate, a Cr underlayer with a thickness of 1500 layers and a Co-N layer with a thickness of 450 layers were formed by sputtering.
An i-Cr alloy magnetic layer and an 8102 protective layer having a thickness of 200 mm were sequentially formed.
このSin、保護層まで形成した基板を、クリーンオー
ブン内で120℃の温度で1時間加熱処理した。The substrate on which the Sin and protective layers were formed was heat-treated at a temperature of 120° C. for 1 hour in a clean oven.
その後、フロロカーボン系液体潤滑剤(フォンブリンZ
:モンテジソン>1)ラフロン113(CF C113
)で0.2%に希釈した溶液中に浸漬し、5102保護
層上に液体潤滑剤を塗布した。続いて、クリーンオーブ
ン内で150℃の温度で1時間、後加熱処理を行った。After that, fluorocarbon liquid lubricant (Fomblin Z
:Montegison>1) Lafron 113 (CF C113
Liquid lubricant was applied onto the 5102 protective layer by dipping it into a solution diluted to 0.2% with Subsequently, post-heat treatment was performed at a temperature of 150° C. for 1 hour in a clean oven.
さらに続いて、基板をスピンスタンドにセットして36
00rpmで30分間高速回転させて潤滑層を形成し、
磁気ディスクを作製した。Next, set the board on the spin stand and
00 rpm for 30 minutes to form a lubricating layer.
A magnetic disk was created.
比較例1
潤滑層形成工程での最後の高速回転処理を行わなかった
こと以外は、実施例1と同様にして磁気ディスクを作製
した。Comparative Example 1 A magnetic disk was produced in the same manner as in Example 1, except that the final high-speed rotation treatment in the lubricant layer forming step was not performed.
比較例2
潤滑層形成工程で液体潤滑剤塗布前後の加熱処理右よび
塗布後の高速回転処理を行わなかったこと以外は、実施
例1と同様にして磁気ディスクを作製した。Comparative Example 2 A magnetic disk was produced in the same manner as in Example 1, except that the heat treatment before and after applying the liquid lubricant and the high-speed rotation treatment after applying the liquid lubricant were not performed in the lubricant layer forming step.
これらの磁気ディスクについて、へf203/TiCス
ライダ磁気ヘッド(ホイットニータイプのフレクシャー
、荷重15gf )によりCS S (Contact
5tartStop )を行い、摩擦係数の測定を行
った。For these magnetic disks, CS S (Contact
5tartStop) to measure the friction coefficient.
比較例2の磁気ディスクにおいては、磁気ヘッドを磁気
ディスク表面に接触させるとすぐ磁気ヘッドが吸着し、
C8Sを行うことができなかった。In the magnetic disk of Comparative Example 2, as soon as the magnetic head was brought into contact with the surface of the magnetic disk, the magnetic head was attracted.
I was unable to perform C8S.
実施例1および比較例1についての測定結果を第1図の
線図に示す。The measurement results for Example 1 and Comparative Example 1 are shown in the diagram of FIG.
第1図より、実施例1の磁気ディスクにおいては、C3
S1万回まで摩擦係数の変化はほとんど認められず、実
用上充分な低い値を示しており、良好で耐久性の優れた
潤滑層が形成されていることが判る。これに対°して、
比較例1の磁気ディスクにふいては、C3S1万回の途
中で摩擦係数が増大して極大値を示すような大きな変動
が見られ、潤滑層が不安定であることが判る。実施例1
の磁気ディスクの製造方法の優位性は明らかである。From FIG. 1, in the magnetic disk of Example 1, C3
Almost no change in the friction coefficient was observed up to 10,000 cycles of S, showing a sufficiently low value for practical use, indicating that a good and durable lubricating layer was formed. In contrast,
In the magnetic disk of Comparative Example 1, large fluctuations were observed in which the coefficient of friction increased and reached a maximum value during 10,000 cycles of C3S, indicating that the lubricating layer was unstable. Example 1
The superiority of this magnetic disk manufacturing method is obvious.
この発明によれば、磁気ディスクの保護膜表面に液体潤
滑剤を浸漬塗布する前後に、基板をそれぞれ加熱処理し
、さらに塗布後の加熱の後に最終的に基板を高速回転さ
せて、液体潤滑剤からなる潤滑層を形成する。このよう
な製造方法を採ることにより、磁気ディスク表面に、密
着性が良好で経時的に安定で耐久性に優れた潤滑層を形
成することができ、潤滑特性の優れた信頼性の高い磁気
ディスクを得ることができる。According to this invention, the substrate is heat-treated before and after dip-coating the liquid lubricant on the surface of the protective film of the magnetic disk, and after the coating is heated, the substrate is finally rotated at high speed to apply the liquid lubricant. Forms a lubricating layer consisting of By adopting this manufacturing method, a lubricating layer with good adhesion, stability over time, and excellent durability can be formed on the magnetic disk surface, resulting in highly reliable magnetic disks with excellent lubrication properties. can be obtained.
第1図は実施例1および比較例1の磁気ディスクのC8
S回数と摩擦係数との関係を示す線図でC8S回数(X
IO3)
第
図Figure 1 shows C8 of the magnetic disks of Example 1 and Comparative Example 1.
In the diagram showing the relationship between S number and friction coefficient, C8S number (X
IO3) Figure
Claims (1)
膜および硬質保護膜をこの順に形成し、さらにこの硬質
保護膜上に液体潤滑剤を塗布して潤滑層を形成する工程
を含む磁気ディスクの製造方法において、前記硬質保護
膜まで形成された非磁性基板を加熱処理し、続いてその
表面に浸漬法により液体潤滑剤を塗布し、続いて後加熱
処理し、さらに続いて少なくとも3600rpmで少な
くとも30分間ディスク状の非磁性基板の垂直中心軸を
軸として回転させて潤滑層を形成することを特徴とする
磁気ディスクの製造方法。1) A magnetic disk comprising the steps of forming a ferromagnetic metal continuous magnetic thin film and a hard protective film in this order on a disc-shaped nonmagnetic substrate, and further applying a liquid lubricant on the hard protective film to form a lubricating layer. In the manufacturing method, the non-magnetic substrate on which the hard protective film has been formed is heat-treated, and then a liquid lubricant is applied to the surface thereof by a dipping method, followed by post-heat treatment, and then at least 3600 rpm. A method for manufacturing a magnetic disk, which comprises forming a lubricating layer by rotating a disk-shaped nonmagnetic substrate about its vertical central axis for 30 minutes.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24845189A JPH03113722A (en) | 1989-09-25 | 1989-09-25 | Production of magnetic disk |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24845189A JPH03113722A (en) | 1989-09-25 | 1989-09-25 | Production of magnetic disk |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03113722A true JPH03113722A (en) | 1991-05-15 |
Family
ID=17178329
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24845189A Pending JPH03113722A (en) | 1989-09-25 | 1989-09-25 | Production of magnetic disk |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03113722A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9153465B2 (en) | 2010-06-30 | 2015-10-06 | Tokyo Electron Limited | Substrate stage, substrate processing apparatus and substrate processing system |
-
1989
- 1989-09-25 JP JP24845189A patent/JPH03113722A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9153465B2 (en) | 2010-06-30 | 2015-10-06 | Tokyo Electron Limited | Substrate stage, substrate processing apparatus and substrate processing system |
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