JPH0311057U - - Google Patents
Info
- Publication number
- JPH0311057U JPH0311057U JP7070389U JP7070389U JPH0311057U JP H0311057 U JPH0311057 U JP H0311057U JP 7070389 U JP7070389 U JP 7070389U JP 7070389 U JP7070389 U JP 7070389U JP H0311057 U JPH0311057 U JP H0311057U
- Authority
- JP
- Japan
- Prior art keywords
- cvd apparatus
- reaction tube
- atmospheric pressure
- utility
- immediately before
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010926 purge Methods 0.000 claims description 3
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Cleaning In General (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7070389U JPH0311057U (sv) | 1989-06-16 | 1989-06-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7070389U JPH0311057U (sv) | 1989-06-16 | 1989-06-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0311057U true JPH0311057U (sv) | 1991-02-01 |
Family
ID=31607085
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7070389U Pending JPH0311057U (sv) | 1989-06-16 | 1989-06-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0311057U (sv) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006016677A1 (ja) * | 2004-08-13 | 2006-02-16 | Tokyo Electron Limited | 成膜装置および気化器 |
-
1989
- 1989-06-16 JP JP7070389U patent/JPH0311057U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006016677A1 (ja) * | 2004-08-13 | 2006-02-16 | Tokyo Electron Limited | 成膜装置および気化器 |
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