JPH03104888A - Plasma device - Google Patents

Plasma device

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Publication number
JPH03104888A
JPH03104888A JP24185089A JP24185089A JPH03104888A JP H03104888 A JPH03104888 A JP H03104888A JP 24185089 A JP24185089 A JP 24185089A JP 24185089 A JP24185089 A JP 24185089A JP H03104888 A JPH03104888 A JP H03104888A
Authority
JP
Japan
Prior art keywords
plasma
microwave
transmission window
window
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24185089A
Other languages
Japanese (ja)
Inventor
Takuyuki Motoyama
本山 琢之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP24185089A priority Critical patent/JPH03104888A/en
Publication of JPH03104888A publication Critical patent/JPH03104888A/en
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To prevent the crack of transmission windows by the heat of plasma by dividing the microwave transmission window for heat resistance disposed in proximity to the microwave transmission window for holding vacuum to plural constituting parts whose boundaries are brought into contact with the plasma. CONSTITUTION:Microwaves are introduced from a waveguide 2 through the transmission windows 3, 4 into a plasma forming chamber 1 to convert the gas introduced therein to the plasma in the plasma forming chamber 5 maintained under reduced pressure. A substrate is worked by the formed plasma 6. The microwave transmission window 4 for heat resistance made of alumina, etc., whose one surface is exposed in the plasma forming chamber 5 of the above-mentioned plasma device, is divided to the plural constituting parts 4a, 4b and is so formed that the greater part of the boundaries on which these parts are abutted covers the plasma 6 contact region. The microwave transmission window 3 for holding vacuum consisting of one sheet is provided in proximity to the upper part of the above-mentioned microwave transmission window 4 for heat resistance to avert the generation of the plasma in the spacing between both and to hermetically isolate the waveguide 2 from the plasma forming chamber 1. Thus, the generation of the crack in the two transmission windows 3, 4 is obviated even if the windows are heated by the plasma 6.

Description

【発明の詳細な説明】 〔概要〕 マイクロ波に依って減圧下で発生させたプラズマを用い
て半導体装置の加工を行うプラズマ装置の改良に関し、 アルξナからなる透過窓が加熱されても割れないように
したプラズマ装置の提供を目的とし、ガス並びにマイク
ロ波を導入してプラズマを発生させるプラズマ生成室と
、該プラズマ生成室に一面が表出され且つ衝き合わされ
た界面の大部分がプラズマ接触領域に掛かるように複数
の構戒部分に分割された耐熱用マイクロ波透過窓と、該
耐熱用マイクロ波透過窓との間隙に於いてプラズマが発
生しないように接近して設けられた真空保持用マイクロ
波透過窓と、該真空保持用マイクロ波透過窓で前記プラ
ズマ生成室と気密に隔離され且つ該プラズマ生成室内に
マイクロ波を供給する導波管とを備えてなるよう構成す
る。
[Detailed Description of the Invention] [Summary] Regarding the improvement of a plasma device for processing semiconductor devices using plasma generated under reduced pressure by microwaves, the transmission window made of aluminum does not crack even when heated. The purpose of the present invention is to provide a plasma generation chamber that generates plasma by introducing gas and microwaves, and a plasma generation chamber in which most of the exposed and abutting interfaces are in contact with the plasma. A heat-resistant microwave-transmitting window divided into a plurality of control parts so as to span the area, and a vacuum-maintaining window provided close to the heat-resistant microwave-transmitting window to prevent plasma from being generated in the gap between the windows. It is configured to include a microwave transmission window and a waveguide that is airtightly isolated from the plasma generation chamber by the vacuum-maintaining microwave transmission window and that supplies microwaves into the plasma generation chamber.

〔産業上の利用分野〕[Industrial application field]

本発明は、マイクロ波に依って減圧下で発生させたプラ
ズマを用いて半導体装置の加工を行うプラズマ装置の改
良に関する。
The present invention relates to an improvement in a plasma apparatus for processing semiconductor devices using plasma generated under reduced pressure by microwaves.

半導体装置の微細化が進展するに伴い、その加工を行う
のにマイクロ波に依って減圧下で発生させたプラズマを
用いる様々な装置が実現されている。
As the miniaturization of semiconductor devices progresses, various devices have been realized that use plasma generated under reduced pressure by microwaves to process the devices.

即ち、例えば、マイクロ波プラズマ・アッシング装置、
マイクロ波プラズマ・エッチング装置、マイクロ波プラ
ズマ・ダウン・フロー・アッシング装置、マイクロ波プ
ラズマ・ダウン・フロー・エッチング装置、マイクロ波
プラズマ・ダウン・フロー・ドライ現像装置などが知ら
れ、そして、これ等各装置が多用されようとしている。
That is, for example, a microwave plasma ashing device,
Microwave plasma etching equipment, microwave plasma down flow ashing equipment, microwave plasma down flow etching equipment, microwave plasma down flow dry developing equipment, etc. are known. The device is about to be used extensively.

従って、これ等各装置が障害を発生することなく円滑に
稼働できるようにすることが重要である.〔従来の技術
〕 一般に、マイクロ波に依って減圧下で発生させたプラズ
マを利用して半導体装置を加工するプラズマ装置のうち
、プラズマを生或するガスとしてCF4などフッ素を含
むものを用いる場合、マイクロ波の透過窓として石英を
利用することはできない。その理由は、透過窓の近傍に
発生するフッ素含有プラズマで石英がエッチングされる
ことに依る。そこで、通常は、アルミナ(Afz 03
)からなる透過窓を使用している。
Therefore, it is important to ensure that each of these devices can operate smoothly without any failures. [Prior Art] In general, among plasma devices that process semiconductor devices using plasma generated under reduced pressure by microwaves, when a gas containing fluorine such as CF4 is used as the plasma generating gas, Quartz cannot be used as a microwave transmission window. The reason for this is that quartz is etched by fluorine-containing plasma generated near the transmission window. Therefore, alumina (Afz 03
) is used.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

前記したマイクロ波の透過窓にアルミナを用いたプラズ
マ装置では、石英を材料とするものに比較して耐熱性が
低く、稼働中に割れを生じることが多く、窓を交換する
為の時間を長くとるので稼働率が低下する旨の問題を生
じている。
Plasma devices that use alumina for the microwave transmission window mentioned above have lower heat resistance than those made of quartz, and often crack during operation, which increases the time it takes to replace the window. This creates a problem in that the operating rate decreases.

本発明は、アルミナからなる透過窓が加熱されても割れ
ないようにしたプラズマ装置を提供しようとする。
The present invention aims to provide a plasma device in which a transmission window made of alumina does not break even when heated.

〔課題を解決するための手段〕[Means to solve the problem]

本発明に依るプラズマ装置に於いては、ガス並びにマイ
クロ波を導入してプラズマを発生させるプラズマ生成室
(例えばプラズマ生成室l)と、該プラズマ生成室に一
面が表出され且つ衝き合わされた界面の大部分がプラズ
マ接触領域に掛かるように複数の構成部分(例えば構戒
部分4A及び4B)に分割された耐熱用マイクロ波透過
窓(例えば耐熱用マイクロ波透過窓4)と、該耐熱用マ
イクロ波透過窓との間隙に於いてプラズマが発生しない
ように接近して設けられた真空保持用マイクロ波透過窓
(例えば真空保持用マイクロ波透過窓3)と、該真空保
持用マイクロ波透過窓で前記プラズマ生成室と気密に隔
離され且つ該プラズマ生成室内にマイクロ波を供給する
導波管(例えば導波管2)とを備えている。
In the plasma device according to the present invention, there is provided a plasma generation chamber (for example, plasma generation chamber 1) in which gas and microwaves are introduced to generate plasma, and an interface that is exposed on one side of the plasma generation chamber and abuts against the plasma generation chamber. A heat-resistant microwave-transmitting window (e.g., heat-resistant microwave-transmitting window 4) divided into a plurality of component parts (e.g., structural parts 4A and 4B) so that most of the window covers the plasma contact area; A vacuum-maintaining microwave-transmitting window (e.g. vacuum-maintaining microwave-transmitting window 3) provided close to the wave-transmitting window so as not to generate plasma in the gap between the vacuum-maintaining microwave-transmitting window and the vacuum-maintaining microwave-transmitting window. A waveguide (for example, waveguide 2) is provided, which is airtightly isolated from the plasma generation chamber and supplies microwaves into the plasma generation chamber.

(作用) 前記手段を採ることに依り、プラズマで耐熱用マイクロ
波透過窓が加熱されても、その膨張及び収縮は各構戒部
分が吸収できるから、それ等が割れることはなく、そし
て、真空保持用マイクロ波透過窓は耐熱用マイクロ波透
過窓に依ってプラズマから隔離されているので、これに
も割れを生ずる虞はなく、従って、プラズマ生成室側と
導波管側との気密分離を良好に達戒することができる。
(Function) By adopting the above method, even if the heat-resistant microwave transmission window is heated by plasma, the expansion and contraction can be absorbed by each structural part, so that they will not break and the vacuum Since the holding microwave transmission window is isolated from the plasma by the heat-resistant microwave transmission window, there is no risk of cracking in this window either. Able to master the precepts well.

[実施例] 第1図は本発明一実施例の要部切断側面図を、また、第
2図は第1図に見られる実施例6要部平面図をそれぞれ
表している。
[Embodiment] FIG. 1 shows a cutaway side view of the essential parts of an embodiment of the present invention, and FIG. 2 shows a plan view of the essential parts of the sixth embodiment shown in FIG. 1.

図に於いて、1はプラズマ生成室、IAは冷却水流路、
2は導波管、3は真空保持用マイクロ波透過窓、4は耐
熱用マイクロ波透過窓、4A及び4Bは耐熱用マイクロ
波透過窓4の構成部分、5は減圧下にあるプラズマ生成
室内、6はプラズマ、7はプラズマ接触領域をそれぞれ
示している。
In the figure, 1 is a plasma generation chamber, IA is a cooling water flow path,
2 is a waveguide, 3 is a vacuum-maintaining microwave-transmitting window, 4 is a heat-resistant microwave-transmitting window, 4A and 4B are constituent parts of the heat-resistant microwave-transmitting window 4, 5 is a plasma generation chamber under reduced pressure, Reference numeral 6 indicates the plasma, and 7 indicates the plasma contact area.

図から明らかなように、本実施例では、真空保持用マイ
クロ波透過窓3は一枚板で形或され、耐熱用マイクロ波
透過窓4は構成部分4A及び4Bとして二分されている
As is clear from the figure, in this embodiment, the vacuum-maintaining microwave-transmitting window 3 is formed of a single plate, and the heat-resistant microwave-transmitting window 4 is divided into two component parts 4A and 4B.

また、マイクロ波透過窓3は真空保持用であるから、導
波管2側の真空が破られないようにプラズマ生成室内5
側との間を画然と分離する役割を果たしているのである
が、マイクロ波透過窓4はプラズマに依る加熱でマイク
ロ波透過窓3が割れるのを防ぐ役割を果たすものであっ
て、膨張或いは収縮に対する耐性を向上する為、図示の
ように略中央で分割して構成部分4A及び4Bからなっ
ている。マイクロ波透過窓4の分割は、支持手段さえ適
切に選択すれば、更に多分割にしても良いのであるが、
何れにせよ、主たる分割線、即ち、構成部分4Aと4B
との衝き合わせ界面がプラズマ接触領域7に掛かってい
ることが割れに対する耐性を向上する為の鍵になる。更
にまた、マイクロ波透過窓3は、プラズマ6が例えばC
F4で構威されていても、それに直接触れることはない
のであるから、石英で構成して耐熱性を向上させるよう
にしても良い。
Furthermore, since the microwave transmission window 3 is for maintaining vacuum, the plasma generation chamber 5 should be
The microwave transmitting window 4 plays the role of clearly separating the two sides from each other, but the microwave transmitting window 4 also plays the role of preventing the microwave transmitting window 3 from cracking due to heating by plasma, and prevents the microwave transmitting window 3 from expanding or contracting. In order to improve the resistance to damage, it is divided approximately at the center into constituent parts 4A and 4B as shown in the figure. The microwave transmission window 4 may be divided into even more parts if the supporting means are appropriately selected.
In any case, the main dividing line, i.e. components 4A and 4B
The key to improving the resistance to cracking is that the abutting interface with the plasma contact area 7 extends over the plasma contact area 7. Furthermore, the microwave transmission window 3 allows the plasma 6 to e.g.
Even if it is made of F4, it is not directly touched, so it may be made of quartz to improve heat resistance.

〔発明の効果〕〔Effect of the invention〕

本発明に依るプラズマ装置に於いては、ガス並びにマイ
クロ波を導入してプラズマを発生させるプラズマ生成室
と、該プラズマ生成室に一面が表出され且つ衝き合わさ
れた界面の大部分がプラズマ接触領域に掛かるように複
数の構成部分に分割された耐熱用マイクロ波透過窓と、
該耐熱用マイクロ波透過窓との間隙に於いてプラズマが
発生しないように接近して設けられた真空保持用マイク
ロ波透過窓と、該真空保持用マイクロ波透過窓で前記プ
ラズマ生成室と気密に隔離され且つ該プラズマ生成室内
にマイクロ波を供給する導波管とを備えている。
In the plasma device according to the present invention, there is a plasma generation chamber that generates plasma by introducing gas and microwaves, and a plasma contact area in which most of the interface that is exposed to the plasma generation chamber and abuts against each other is a plasma contact area. A heat-resistant microwave transparent window divided into multiple component parts so as to hang over the
A vacuum-maintaining microwave-transmitting window is provided in close proximity to the heat-resistant microwave-transmitting window so as not to generate plasma, and the vacuum-maintaining microwave-transmitting window is airtight with the plasma generation chamber. and a waveguide which is isolated and supplies microwaves into the plasma generation chamber.

前記構戒を採ることに依り、プラズマで耐熱用マイクロ
波透過窓が加熱されても、その膨張及び収縮は各構成部
分が吸収できるから、それ等が割れることはなく、そし
て、真空保持用マイクロ波透過窓は耐熱用マイクロ波透
過窓に依ってプラズマから隔離されているので、これに
も割れを生ずる虞はなく、従って、プラズマ生成室側と
導波管側との気密分離を良好に達成することができる。
By adopting the above-mentioned precautions, even if the heat-resistant microwave transmission window is heated by plasma, each component can absorb the expansion and contraction, so it will not break. Since the wave-transmitting window is isolated from the plasma by the heat-resistant microwave-transmitting window, there is no risk of cracks occurring there either, thus achieving good airtight separation between the plasma generation chamber side and the waveguide side. can do.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明一実施例の要部切断側面図、第2図は第
1図に見られる実施例の要部平面図をそれぞれ表してい
る。 図に於いて、1はプラズマ生成室、IAは冷却水流路、
2は導波管、3は真空保持用マイクロ波透過窓、4は耐
熱用マイクロ波透過窓、4A及び4Bは耐熱用マイクロ
波透過窓4の構成部分、5は減圧下にあるプラズマ生成
室内、6はプラズマ、7はプラズマ接触領域をそれぞれ
示している。 本発明一実施例の要部切断側面図 第1図 第2図
FIG. 1 is a cutaway side view of an essential part of an embodiment of the present invention, and FIG. 2 is a plan view of an essential part of the embodiment shown in FIG. In the figure, 1 is a plasma generation chamber, IA is a cooling water flow path,
2 is a waveguide, 3 is a vacuum-maintaining microwave-transmitting window, 4 is a heat-resistant microwave-transmitting window, 4A and 4B are constituent parts of the heat-resistant microwave-transmitting window 4, 5 is a plasma generation chamber under reduced pressure, Reference numeral 6 indicates the plasma, and 7 indicates the plasma contact area. Main part cutaway side view of one embodiment of the present invention FIG. 1 FIG. 2

Claims (1)

【特許請求の範囲】  ガス並びにマイクロ波を導入してプラズマを発生させ
るプラズマ生成室と、 該プラズマ生成室に一面が表出され且つ衝き合わされた
界面の大部分がプラズマ接触領域に掛かるように複数の
構成部分に分割された耐熱用マイクロ波透過窓と、 該耐熱用マイクロ波透過窓との間隙に於いてプラズマが
発生しないように接近して設けられた真空保持用マイク
ロ波透過窓と、 該真空保持用マイクロ波透過窓で前記プラズマ生成室と
気密に隔離され且つ該プラズマ生成室内にマイクロ波を
供給する導波管と を備えてなることを特徴とするプラズマ装置。
[Scope of Claims] A plasma generation chamber that generates plasma by introducing gas and microwaves; a heat-resistant microwave-transmitting window divided into component parts; a vacuum-maintaining microwave-transmitting window provided close to the heat-resistant microwave-transmitting window so as not to generate plasma in the gap between the heat-resistant microwave-transmitting window; A plasma device comprising: a waveguide airtightly isolated from the plasma generation chamber by a vacuum-maintaining microwave transmission window and supplying microwaves into the plasma generation chamber.
JP24185089A 1989-09-20 1989-09-20 Plasma device Pending JPH03104888A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24185089A JPH03104888A (en) 1989-09-20 1989-09-20 Plasma device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24185089A JPH03104888A (en) 1989-09-20 1989-09-20 Plasma device

Publications (1)

Publication Number Publication Date
JPH03104888A true JPH03104888A (en) 1991-05-01

Family

ID=17080438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24185089A Pending JPH03104888A (en) 1989-09-20 1989-09-20 Plasma device

Country Status (1)

Country Link
JP (1) JPH03104888A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11251089A (en) * 1998-02-27 1999-09-17 Shibaura Mechatronics Corp Plasma processing device
CN111312411A (en) * 2018-12-11 2020-06-19 核工业西南物理研究院 Method for preventing plasma from cracking by injecting liquefied inert gas jet

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11251089A (en) * 1998-02-27 1999-09-17 Shibaura Mechatronics Corp Plasma processing device
CN111312411A (en) * 2018-12-11 2020-06-19 核工业西南物理研究院 Method for preventing plasma from cracking by injecting liquefied inert gas jet

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