JPH029573A - Tin surface reference plate of contactless polishing device - Google Patents

Tin surface reference plate of contactless polishing device

Info

Publication number
JPH029573A
JPH029573A JP63158479A JP15847988A JPH029573A JP H029573 A JPH029573 A JP H029573A JP 63158479 A JP63158479 A JP 63158479A JP 15847988 A JP15847988 A JP 15847988A JP H029573 A JPH029573 A JP H029573A
Authority
JP
Japan
Prior art keywords
surface plate
tin
polishing
board
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63158479A
Other languages
Japanese (ja)
Inventor
Miki Kusao
幹 草尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP63158479A priority Critical patent/JPH029573A/en
Publication of JPH029573A publication Critical patent/JPH029573A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enhance anti-abrasiveness of a tin surface reference board and prolong its lifetime by applying Ni plating to the tin surface reference board, and cutting minor grooves at the surface using a diamond cutter. CONSTITUTION:A surface reference board spindle is furnished to bear and rotate a tin surface reference board 1, and a processing trough is arranged in such a way as surrounding this board 1. Grinding liquid containing free abrasive grains is fed onto this tin surface reference board 1, and the spindle is put into relative rotation with a head for work, and a work attached to the undersurface of this head is polished in the condition that the head is put afloat. At this time, the surface of the board 1 is plated 14 with Ni containing 10-20% P, and minor grooves 13 are cut spirally using a diamond cutter. This Ni plating 14 increases the hardness of the board surface, enhances its anti- abrasiveness, reduces the wear of the minor grooves 13, and prolongs the lifetime, while cutting with diamond cutter enhances the surface accuracy of the tin board.

Description

【発明の詳細な説明】 に)技術分野 この発明は、非接触研磨装置の錫定盤の改良に関する。[Detailed description of the invention] ) technical field The present invention relates to an improvement of a tin surface plate for a non-contact polishing device.

非接触研磨は、ウィンドウやミラーなどの平面を高精度
の平坦面に研磨するために用いられる。
Non-contact polishing is used to polish flat surfaces such as windows and mirrors to highly accurate flat surfaces.

被加工物と、研磨定盤が接触しないので、非接触という
It is called non-contact because there is no contact between the workpiece and the polishing surface plate.

(イ)従来技術 非接触研磨方法は、表面に螺旋溝を切った錫の定盤を回
転させ、この上に研磨液を供給し、被加工物を研磨液の
動圧力によって浮かせた状態で研磨する方法である。
(b) Conventional non-contact polishing method involves rotating a tin surface plate with a spiral groove cut on its surface, supplying polishing liquid onto it, and polishing the workpiece while it is suspended by the dynamic pressure of the polishing liquid. This is the way to do it.

研磨液は遊離砥粒を含んでいる。研磨液が激しく流動し
、砥粒が被加工物の下面に接触する。このため、被加工
物下面が、徐々に研磨されてゆく。
The polishing liquid contains free abrasive grains. The polishing liquid flows violently and the abrasive grains come into contact with the lower surface of the workpiece. Therefore, the lower surface of the workpiece is gradually polished.

定盤と被加工物とが接触しないので、研磨速度は遅い。Since there is no contact between the surface plate and the workpiece, the polishing speed is slow.

しかし、凹凸の少ない高い平坦度の研磨面が得られる。However, a highly flat polished surface with few irregularities can be obtained.

高精度、高平坦度を必要とする物の研磨法として最適で
ある。
It is most suitable as a polishing method for objects that require high precision and high flatness.

錫定盤と被加工物とが接触しないので、非接触研磨のカ
テゴリーに入る。
Since there is no contact between the tin surface plate and the workpiece, it falls into the category of non-contact polishing.

非接触研磨というのは、しかしながら、比・咬的広い意
味をもつ言葉である。本発明が対象にするのは、この中
でもフロートポリッシングと呼ばれる方法である。これ
は被加工物が研磨液の中に浮遊しているのでフロートと
いうのである。
However, non-contact polishing is a term that has a broad meaning. Among these methods, the present invention targets a method called float polishing. This is called a float because the workpiece is suspended in the polishing liquid.

新しい技術であるが、フロートポリッシングは、遊鰍砥
粒を使った、高精度の平坦面を得る事のでき5方法とし
て広く知られている。
Although it is a new technology, float polishing is widely known as a method that uses floating abrasive grains to obtain a highly accurate flat surface.

非接触研磨方法に関する文献として、多くのものがある
。例えば、 Y、 Namba and H,Tsuwa、 ”Ul
tra−Fine Polishingof 5app
hire Single Crystal 、Anna
ls of theCARP胚1. p325(197
7)Y+ Namba  and  H,Tsuwa、
  ”Mechanism  and  SomeAp
plications of Ultra−Fine 
Polishing、”Annalsof CIRP 
271. p511(1978)  などがある。
There are many documents related to non-contact polishing methods. For example, Y, Namba and H, Tsuwa, “Ul
tra-Fine Polishingof 5app
hire Single Crystal, Anna
ls of the CARP embryo 1. p325 (197
7) Y+ Namba and H, Tsuwa,
”Mechanism and SomeAp
plications of Ultra-Fine
Polishing, “Annals of CIRP
271. p511 (1978), etc.

り)発明が解決しようとする問題点 フロートポリッシングは、錫の定盤を高速回転し、研磨
液を中心近傍に供給する。被加工物は、加工物ヘッドに
貼りつけである。加工物ヘッドは高速回転するが、上下
方向には自由に動きうるように支持してある。
(ii) Problems to be Solved by the Invention In float polishing, a tin surface plate is rotated at high speed and polishing liquid is supplied near the center. The workpiece is pasted onto the workpiece head. Although the workpiece head rotates at high speed, it is supported so that it can move freely in the vertical direction.

定盤の上面に加工物ヘッドを位置させ、定盤も、加工物
ヘッドも回転させる。加工物へ・ノドの回転中心は、も
ちろん定盤の中心から側方へ番よずれている。定盤の公
転運動と、へ・ノドの自転運動力;存在する。このため
、流体の動圧力が高くなり、力11工物ヘッドが研磨液
の上に浮き上る。
The workpiece head is positioned on the upper surface of the surface plate, and both the surface plate and the workpiece head are rotated. Of course, the center of rotation of the gutter to the workpiece is shifted to the side from the center of the surface plate. The rotational motion of the surface plate and the rotational force of the top and bottom; they exist. Therefore, the dynamic pressure of the fluid becomes high and the force 11 workpiece head floats above the polishing liquid.

流体に動圧力を与えるには、定盤の回転力を流体に効率
よく伝達しなければならなり)。このためには、研磨液
が定盤の上に、比較的長く滞溜できるようにしなければ
ならない。
In order to apply dynamic pressure to the fluid, the rotational force of the surface plate must be efficiently transmitted to the fluid). For this purpose, it is necessary to allow the polishing liquid to stay on the surface plate for a relatively long time.

ところが、定盤が高速に回転するので、遠心力のため、
研磨液は半径方向に飛散してしまう。
However, as the surface plate rotates at high speed, due to centrifugal force,
The polishing liquid scatters in the radial direction.

これを防ぐために、定盤の上には、螺旋溝が刻まれてい
る。この溝は、同心円の集合ではなく、半径が徐々に増
えてゆく溝であってひとつづきものである。渦巻溝とい
うこともできるが、ここでは螺旋溝と呼ぶ。
To prevent this, a spiral groove is carved on the top of the surface plate. This groove is not a collection of concentric circles, but a series of grooves whose radius gradually increases. It can also be called a spiral groove, but here it is called a spiral groove.

これには、大溝と小溝がある。大溝と塾)うのをよ幅も
、深さも大きい溝である。この溝の間の上面に、さらに
、細い小溝が刻まれてν)る。pzずれも、螺旋溝であ
る。
It has a major groove and a minor groove. It is a groove that is both wider and deeper than Uno (Omizo and Juku). Furthermore, thin small grooves are carved on the upper surface between these grooves. The pz shift is also a spiral groove.

この溝は、回転方向に刻まれているから、研磨液が、遠
心力によって速やかに飛散するのを防ぐ1丁ができろ。
Since this groove is carved in the direction of rotation, it is possible to prevent the polishing liquid from quickly scattering due to centrifugal force.

大溝と小溝の作用によって、研磨液の定盤上での滞溜時
間を長くシ、流体圧を高める事ができる。
The action of the large grooves and small grooves allows the polishing liquid to stay on the surface plate for a longer time and to increase the fluid pressure.

つまり、フロートポリッシングに於て、大溝、小溝は重
要な役割を果しているのである。
In other words, the major and minor grooves play an important role in float polishing.

フロートボリツンユの定盤には、大小の溝を切削しなけ
ればならないので、被切削性のよい錫が使われる。錫は
耐蝕性もあって、理想的な材料で、ちる。
Because it is necessary to cut large and small grooves into the surface plate of a float float, tin is used because it has good machinability. Tin is also corrosion resistant, making it an ideal material.

しかし、被切削性に優れているのは、錫が柔かいからで
ある。柔かいというのは、反面欠点にも奇る。
However, tin has excellent machinability because it is soft. Being soft has its drawbacks as well.

フローI・ポリッシングを何回も繰返すと、柔かい謁定
盤の溝が、研磨液の作用により磨滅してくる。特に、小
溝の先端が磨耗したり、つぶれたりして、丸く鈍くなる
事がある。
When Flow I polishing is repeated many times, the soft grooves of the throne plate become worn away by the action of the polishing liquid. In particular, the tips of the small grooves may become worn or crushed, causing them to become round and dull.

小溝が鈍磨してくると、同じ定盤回転数であっても、所
定の動圧力が発生しないという事になる。
If the small grooves become dull, the predetermined dynamic pressure will not be generated even if the surface plate rotation speed is the same.

もしも動圧力が不足すると、被加工物が下って、定盤と
接触する可能性もある。こうなると、接触新暦という事
になり、所望の平坦度が得られない。
If the dynamic pressure is insufficient, the workpiece may fall and come into contact with the surface plate. In this case, the contact new calendar occurs, and the desired flatness cannot be obtained.

また、定盤を甚しく傷つける。It also seriously damages the surface plate.

そこまでゆかなくても、動圧力が不足すると、加工速度
が低下し、仕上り精度も、使用時間とともに著しく悪化
してしまう。
Even if it does not go that far, if the dynamic pressure is insufficient, the machining speed will decrease and the finishing accuracy will deteriorate significantly over time.

このような事態に対し、従来、無策であったというので
はない。錫が磨耗しやすいのははじめから分っていた事
である。もちろん対策がある。
This is not to say that there have been no measures taken in the past to deal with such situations. It was known from the beginning that tin wears easily. Of course there are countermeasures.

従来は、小溝が丸く磨滅すると、定盤を取外し、小溝を
いったん全て削り落し平坦にする、という事が行われる
。平坦にした後、再び小溝を螺旋状に刻みつけるのであ
る。こうすると、小溝の高さ分だけ、大溝が浅くなる。
Conventionally, when the small grooves have worn out into a round shape, the surface plate is removed and all the small grooves are once removed to make them flat. After flattening it, small grooves are carved in a spiral again. This will make the major groove shallower by the height of the minor groove.

これはやむをえない事である。This is unavoidable.

従来は、このよう1テ、錫定盤を再切削していたのであ
る。
Previously, the tin surface plate had to be re-cut once in this manner.

何度も小溝を再切削するようにすれば、長く錫定盤を使
用できる。
If you re-cut the small grooves many times, you can use the tin surface plate for a long time.

とはいうものの、再切削するには、費用と時間がかかる
However, recutting is expensive and time consuming.

それよりも、小溝が磨耗しないようにした方が便利であ
る。
Rather, it is more convenient to prevent the small grooves from wearing out.

に)構 成 本発明に於ては、錫定盤の表面を硬くし、磨滅しにくく
する。錫定盤の表面に、10%〜20%のP(リン)を
含むNiにニッケル)をメツキし、さらに、ダイヤモン
ドバイトで小溝の上部を僅かに切削して、高精度の平面
出しを行なう。
B) Structure In the present invention, the surface of the tin surface plate is hardened to prevent wear and tear. The surface of the tin surface plate is plated with Ni containing 10% to 20% P (phosphorous), and the upper part of the small groove is slightly cut with a diamond cutting tool to achieve highly accurate planarization.

第1図は錫定盤の大溝、小溝の部分を示す断面図である
FIG. 1 is a sectional view showing major grooves and minor grooves of a tin surface plate.

錫定盤1は円形の板であって、表面に、螺旋条である大
溝11が切っである。切り残った部分が螺旋状に残る。
The tin surface plate 1 is a circular plate, and a large spiral groove 11 is cut on the surface. The uncut portion remains in a spiral shape.

この隆起条12の上面に、小溝13が螺旋条に切っであ
る。
A small groove 13 is cut into the upper surface of this raised strip 12 in a spiral strip.

本発明に於ては、表面に薄く、無電解ニッケルメッキを
施してある。この部分を細い斜線で示している。ニッケ
ルメッキ層14である。
In the present invention, the surface is thinly plated with electroless nickel. This part is indicated by thin diagonal lines. This is a nickel plating layer 14.

ニッケルメッキといっても、リンを10〜2096含む
ニッケルである。ニッケルメッキ層14はダイヤモンド
バイトで切削するが、ダイヤモンドの成分である炭素C
とニッケルとが反応しやすい。この反応を抑えるため、
ニッケルにリンを添加するのである。
Although it is called nickel plating, it is nickel containing 10 to 2096 phosphorus. The nickel plating layer 14 is cut with a diamond cutting tool, but carbon C, which is a component of diamond,
reacts easily with nickel. To suppress this reaction,
Phosphorus is added to nickel.

ニッケルメッキN14の厚みは、10〜20μm程度の
薄いものである。
The thickness of the nickel plating N14 is as thin as about 10 to 20 μm.

メツキ温度が80〜90℃程度で、かなり高い温度であ
る。このため、錫定盤が熱変形し、そりが生じる事があ
る。
The plating temperature is about 80 to 90°C, which is quite high. As a result, the tin surface plate may be thermally deformed and warped.

また、溝の多い表面にメツキするので、メツキ厚みが均
一にならない。不均一であるので、小溝の形状が変わる
Also, since plating is applied to a surface with many grooves, the plating thickness is not uniform. Due to the non-uniformity, the shape of the small groove changes.

このようなそりやメツキネ均一を修正するために、ダイ
ヤモンドバイトで小溝の上部をわずかに研削する。
To correct such warpage or unevenness, slightly grind the top of the small groove with a diamond cutting tool.

この研削によって、高精度の平面出しを行なう事ができ
る。
This grinding allows highly accurate planarization.

(4)作 用 研磨装置としての外観や操作方法は従来のものと同じで
ある。
(4) Function The appearance and operation method of the polishing device are the same as the conventional ones.

第4図に非接触研磨装置の概略を示す。FIG. 4 shows an outline of the non-contact polishing apparatus.

錫定盤1は下面中心に定盤主軸2が取付けられていて、
これとともに回転する。錫定盤1のまわりには、加工槽
3がある。
The tin surface plate 1 has a surface plate main shaft 2 attached to the center of the bottom surface.
It rotates with this. A processing tank 3 is provided around the tin surface plate 1.

賜定盤1の中心上部には、研磨液供給パイプ4が設けら
れる。これから、研磨液5が錫定盤1の上に供給される
A polishing liquid supply pipe 4 is provided at the upper center of the polishing surface plate 1. From this, the polishing liquid 5 is supplied onto the tin surface plate 1.

定盤主軸2の中心から離れた位置に、これと平行な軸を
持つ加工物ヘッド6が設けられる。
A workpiece head 6 having an axis parallel to the main spindle 2 of the surface plate is provided at a position away from the center of the main spindle 2 of the surface plate.

被ttn工物7は、加工物ヘッド6の下面に貼付けられ
ている。加工物ヘッド6は、回転力を与えられているが
、上下方向には拘束されていないので、研磨液の流体動
圧力によって浮き上る。
The ttn workpiece 7 is attached to the lower surface of the workpiece head 6. Although the workpiece head 6 is given a rotational force, it is not restrained in the vertical direction, and therefore floats due to the fluid dynamic pressure of the polishing liquid.

このような動作は、従来のものと同じである。Such operation is the same as the conventional one.

研磨液は遊離砥粒を含み、これは、被加工物7の下面を
研磨する。同時に、錫定盤の表面にも研ノ舎作用を及ぼ
す。
The polishing liquid contains free abrasive grains, which polish the lower surface of the workpiece 7. At the same time, the polishing effect is also exerted on the surface of the tin surface plate.

しかし、本発明の錫定盤は、ニッケルメッキがしてある
ので、錫そのままのものより、ずっと硬い表面になって
いる。
However, since the tin surface plate of the present invention is nickel plated, it has a much harder surface than that made of pure tin.

従って、物理的な強度が高まり、耐磨耗性にすぐれたも
のになっている。
Therefore, it has increased physical strength and excellent wear resistance.

さらに、酸やアルカリにも強く、耐薬品性にも優れる。Furthermore, it is resistant to acids and alkalis, and has excellent chemical resistance.

このようなわけで、繰返し使用しても、小溝が磨耗しな
い。長寿命化する事ができる。
For this reason, the small grooves will not wear out even after repeated use. It can extend the lifespan.

また、メツキした後、ダイヤモンド切削してあるので、
定盤の面精度は高い。
In addition, after being plated, it is diamond cut, so
The surface accuracy of the surface plate is high.

a)実施例 錫定盤に、幅2fl、深さ0.7111の大溝を螺旋状
に切削した。さらに、隆起条の表面に、幅0.3ff。
a) Example A large groove with a width of 2 fl and a depth of 0.7111 mm was cut in a spiral shape on a tin surface plate. Furthermore, the surface of the raised stripes has a width of 0.3ff.

深さ013ffの小溝を螺旋状に刻んだ。A small groove with a depth of 013 ff was cut in a spiral shape.

切削油をきれいに洗い落し、加工槽を定盤下面にとりつ
ける。アルコールに浸して、汚れを除く。
Thoroughly wash off the cutting oil and attach the machining tank to the bottom of the surface plate. Soak in alcohol to remove dirt.

乾燥する。こつ後、メツキ液を入れ、90℃で、無電解
ニッケルメッキをした。
dry. After getting the hang of it, a plating solution was added and electroless nickel plating was performed at 90°C.

メツキが終ると、流水によって、シミ、むらが残らない
ように、洗った。つづいて温風乾燥を行なった。
When the plating was finished, I washed it under running water to make sure there were no stains or unevenness left. Subsequently, hot air drying was performed.

加工槽を取外す。ダイヤモンドバイトにヨッテ小溝の上
部のごくわずかを削った。これにより、±1μm/φ4
60の高精度ポリラシャ平面を創成した。
Remove the processing tank. I used a diamond tool to cut a small portion of the top of the small groove. As a result, ±1μm/φ4
We created 60 high-precision polyrasia planes.

こうして、本発明の錫定盤が製作された。In this way, the tin surface plate of the present invention was manufactured.

この定盤を使って、実際にフロートポリッシングを行な
った。
I actually performed float polishing using this surface plate.

研磨液は、70人Si 02の296懸濁液である。The polishing liquid is a 296 suspension of 70 Si02.

被加工物はφ160 X 10 tのBK−7ガラスで
ある。
The workpiece is BK-7 glass of φ160×10t.

これを加工物ヘッドに貼りつけ、前加工をする。Attach this to the workpiece head and perform pre-processing.

この後、フロートポリッシュを行なった。条件は、 定盤主軸回転数   1100rp 加工物ヘッド回転数   1100rp研磨圧力 26
0g/at であった。
After this, float polishing was performed. The conditions are: Surface plate main shaft rotation speed 1100 rp Workpiece head rotation speed 1100 rp Polishing pressure 26
It was 0g/at.

本発明の、ニッケルメッキ錫定盤でも、従来のものと同
じく、良好な、浮上性があるという事が確められた。た
しかに非接触であるという事が確認された。
It was confirmed that the nickel-plated tin surface plate of the present invention had good floating properties as well as the conventional one. It was confirmed that there was no contact.

本発明の効果を調べるため、長時間研磨して、研磨速度
の変化、定盤表面の鈍磨を調べた。
In order to examine the effects of the present invention, polishing was performed for a long time, and changes in polishing rate and dullness of the surface plate surface were examined.

第2図は、研磨時間とともに、研磨速度が低下してゆく
様子を調べたものである。横軸は研磨時間、縦軸は研磨
速度(人/m1n)  である。実線はNiメツキをし
た本発明の定盤によるものを示す。破線がNiメツキの
ない従来例の定盤によるものを示す。
FIG. 2 shows how the polishing rate decreases with polishing time. The horizontal axis is polishing time, and the vertical axis is polishing speed (people/m1n). The solid line shows the surface plate of the present invention plated with Ni. The broken line indicates a conventional surface plate without Ni plating.

いずれも、最初は450人/m 1 nの研磨速度であ
る。
In both cases, the initial polishing rate was 450 people/m 1 n.

従来の定盤では、研磨速度の低下が著しく、40時間で
約半分に低下する。これは、小溝が磨滅したからである
With the conventional surface plate, the polishing speed decreases significantly, and decreases to about half in 40 hours. This is because the small grooves were worn out.

本発明に於ては、60時間後でも、約370人/rn1
 nの研磨速度である。研磨速度の低下が少い。これは
、小溝の磨損が殆どないという事である。
In the present invention, even after 60 hours, about 370 people/rn1
The polishing rate is n. There is little decrease in polishing speed. This means that there is almost no wear and tear on the small grooves.

第3図は、被加工物のBK−7ガラスの表面粗さを、研
磨時間を変えて測定したものである。横軸は研磨時間、
縦軸はBK−7ガラスの表面粗さ(人Rms)である。
FIG. 3 shows the surface roughness of BK-7 glass as a workpiece, measured by changing the polishing time. The horizontal axis is polishing time,
The vertical axis is the surface roughness (human Rms) of BK-7 glass.

最初の粗さが180人Rmsである。The initial roughness is 180 Rms.

本発明の場合、10時間の研磨で60人Rmllになっ
た。従来例のものでは、60人Rm8にするには20時
間かかる。これも、本発明の錫定盤のtJX溝の磨滅が
少いという事を意味しているのである。
In the case of the present invention, polishing for 10 hours resulted in 60 Rml. In the conventional example, it takes 20 hours to reach Rm8 for 60 people. This also means that the tJX grooves of the tin surface plate of the present invention are less likely to wear out.

(1)効 果 本発明の錫定盤はNiメツキしてあり、さらにダイヤモ
ンドバイトで小溝を切削してあるので、次の効果がある
(1) Effects Since the tin surface plate of the present invention is plated with Ni and has small grooves cut with a diamond cutting tool, it has the following effects.

(1)錫定盤の耐磨耗性が向上する。錫定盤の寿命がの
びる。
(1) The wear resistance of the tin surface plate is improved. Extends the life of tin surface plates.

(2)研磨速度の低下が僅かになった。(2) The polishing rate decreased slightly.

(3)  フロートポリッシュの加工時間を短かくする
事ができる。
(3) Processing time for float polishing can be shortened.

(4)耐薬品性があるので、研磨液に酸やアルカリなど
の薬品を混ぜる事が可能となった。
(4) Since it has chemical resistance, it is now possible to mix chemicals such as acids and alkalis into the polishing liquid.

これにより、フロートポリッシュの応用範囲が拡がる。This expands the range of applications for float polish.

(5)  高精度の加工平面を安定して得る事ができる
ようになった。
(5) It is now possible to stably obtain a highly accurate machining plane.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の錫定盤の一部拡大断面図。 第2図は研磨時間と研磨速度の関係につ(1ての、本発
明と従来例の測定値を示すグラフ。 第3図は研磨時間と被加工物の表面粗さの関係について
の、本発明と従来例の測定値を示すグラフ〇 第4図はフロートポリッジ装置の略断面図。 1・・・−・・・・・錫 定 盤 2・・・・・・・・・・・・定盤主軸 3・・・・・・・・・・・・加 工 槽4・・・・・・
・・・・・・研磨液供給パイプ5・・・・・・・・・・
・・研 暦 液6・・・・・・・・・・・・加工物ヘッ
ド7・・・・・・・・・・・・被加工物 11・・・・・・・・・・・・大   溝12・・・・
・・・・・・・・隆 起 条13・・・・・・・・・・
・・小   溝14・・・・・・・・・・・・ニッケル
メッキ層発明者  草尾 幹 特許出願人  住友電気工業株式会社
FIG. 1 is a partially enlarged sectional view of the tin surface plate of the present invention. Figure 2 is a graph showing the relationship between polishing time and polishing rate (1), which shows the measured values of the present invention and the conventional example. Figure 3 is a graph showing the relationship between polishing time and surface roughness of the workpiece. Graph showing the measured values of the invention and the conventional example Figure 4 is a schematic cross-sectional view of the float porridge device. Board spindle 3...... Machining tank 4...
...... Polishing liquid supply pipe 5 ......
・・Ken Calendar Liquid 6・・・・・・・・・ Workpiece head 7・・・・・・・・・Workpiece 11・・・・・・・・・・・・・・・Oomizo 12...
・・・・・・・・・Rise Article 13・・・・・・・・・・
・・Small groove 14・・・・・・・・・Nickel plating layer Inventor: Miki Kusao Patent applicant: Sumitomo Electric Industries, Ltd.

Claims (1)

【特許請求の範囲】[Claims] 表面に大溝11、小溝13が螺旋状に刻んである錫定盤
1と、錫定盤1を支持し回転させる定盤主軸2と、錫定
盤1を囲むように設けられた加工槽3と、被加工物7を
下面に貼りつけた加工物ヘッド6とよりなり、錫定盤1
の上に遊離砥粒を含んだ研磨液を供給しながら、定盤主
軸2と加工物ヘッド6とを回転させ、加工物ヘッド6を
浮き上らせた状態で被加工物7を研磨する非接触研磨装
置に使われる錫定盤であつて、表面に、リンを10%〜
20%含むニッケルメッキを旋した後、小溝13をダイ
ヤモンドバイトで切削してある事を特徴とする非接触研
磨装置の錫定盤。
A tin surface plate 1 having large grooves 11 and small grooves 13 spirally carved on its surface, a surface plate main shaft 2 that supports and rotates the tin surface plate 1, and a processing tank 3 provided so as to surround the tin surface plate 1. , a workpiece head 6 with a workpiece 7 attached to the bottom surface, and a tin surface plate 1
While supplying a polishing liquid containing free abrasive grains onto the surface, the main shaft 2 of the surface plate and the workpiece head 6 are rotated, and the workpiece 7 is polished with the workpiece head 6 floating. It is a tin surface plate used for contact polishing equipment, and the surface is coated with 10% or more of phosphorus.
A tin surface plate for a non-contact polishing device, characterized in that after turning 20% nickel plating, small grooves 13 are cut with a diamond cutting tool.
JP63158479A 1988-06-27 1988-06-27 Tin surface reference plate of contactless polishing device Pending JPH029573A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63158479A JPH029573A (en) 1988-06-27 1988-06-27 Tin surface reference plate of contactless polishing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63158479A JPH029573A (en) 1988-06-27 1988-06-27 Tin surface reference plate of contactless polishing device

Publications (1)

Publication Number Publication Date
JPH029573A true JPH029573A (en) 1990-01-12

Family

ID=15672641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63158479A Pending JPH029573A (en) 1988-06-27 1988-06-27 Tin surface reference plate of contactless polishing device

Country Status (1)

Country Link
JP (1) JPH029573A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6802761B1 (en) 2003-03-20 2004-10-12 Hitachi Global Storage Technologies Netherlands B.V. Pattern-electroplated lapping plates for reduced loads during single slider lapping and process for their fabrication

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6802761B1 (en) 2003-03-20 2004-10-12 Hitachi Global Storage Technologies Netherlands B.V. Pattern-electroplated lapping plates for reduced loads during single slider lapping and process for their fabrication

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