JPH029417B2 - - Google Patents
Info
- Publication number
- JPH029417B2 JPH029417B2 JP57173989A JP17398982A JPH029417B2 JP H029417 B2 JPH029417 B2 JP H029417B2 JP 57173989 A JP57173989 A JP 57173989A JP 17398982 A JP17398982 A JP 17398982A JP H029417 B2 JPH029417 B2 JP H029417B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive liquid
- shadow mask
- metal plate
- photosensitive
- applying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007788 liquid Substances 0.000 claims description 95
- 239000002184 metal Substances 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 19
- 238000007790 scraping Methods 0.000 claims description 3
- 238000000576 coating method Methods 0.000 description 21
- 239000011248 coating agent Substances 0.000 description 20
- 238000009826 distribution Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 235000021110 pickles Nutrition 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
- H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
- H01J2209/01—Generalised techniques
- H01J2209/012—Coating
- H01J2209/015—Machines therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明はシヤドウマスク用金属板の感光液塗布
方法に係り、特に成膜品位の極めて良好なシヤド
ウマスク用金属板の感光液塗布方法に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a method of applying a photosensitive liquid to a metal plate for a shadow mask, and more particularly to a method of applying a photosensitive liquid to a metal plate for a shadow mask, which provides extremely good film formation quality.
シヤドウマスク用金属板の感光液塗布方法とし
ては、例えば本発明者らが先に出願した特公昭54
−21824号公報に記載の技術がある。この方法に
よれば簡単な装置で均一な感光液を塗布すること
が可能であるが、この方法はシヤドウマスク用金
属板を槽内の感光液中から引き上げながら成膜す
るため、成膜に不必要な感光液がたれ落ちるなか
で膜乾燥が行なわれるので、感光膜の不均一が生
じ易く、一般のカラーブラウン管用のシヤドウマ
スクではよいが、キヤラクターデイスプレイ管に
用いられている円形状の電子ビーム通過孔部を有
するシヤドウマスクのようにピツチが0.2〜0.3
mm、且つ電子銃側孔径が0.090〜0.140mmというよ
うな微細なシヤドウマスクなどに要求される成膜
品位、特にその膜厚の均一性を得ることができな
いという問題が点がある。
As a method for applying a photosensitive liquid to a metal plate for a shadow mask, for example, the present inventors have applied
There is a technique described in the -21824 publication. According to this method, it is possible to apply a uniform photosensitive solution using a simple device, but since this method deposits the film while pulling up the metal plate for the shadow mask from the photosensitive solution in the tank, unnecessary parts are needed for film formation. Since the film is dried while the photosensitive liquid drips down, the photosensitive film tends to become uneven.Although a shadow mask for general color cathode ray tubes is fine, it is not suitable for the circular electron beam passage hole used in character display tubes. Like a shadow mask with a pitch of 0.2 to 0.3
There is a problem in that it is not possible to obtain the film formation quality, especially the uniformity of the film thickness, required for a fine shadow mask with a hole diameter of 0.090 to 0.140 mm on the electron gun side.
また、他の方法としてシヤドウマスク用金属板
を長手方向に連続的に移動させながら、脱脂、酸
洗及び水洗を行なつた後、感光液槽内の感光液を
くぐらせて感光液を塗布し、次にスクイズローラ
を通過させて余分な感光液を除去すると共に乾燥
させる方法もある。 Another method is to degrease, pickle, and wash the metal plate for a shadow mask while continuously moving it in the longitudinal direction, and then apply the photosensitive liquid by passing it through the photosensitive liquid in the photosensitive liquid tank. There is also a method of passing the photosensitive liquid through a squeeze roller to remove excess photosensitive liquid and drying it.
しかしこの方法ではシヤドウマスク用金属板を
感光液に浸漬したのち、単純に余分な感光液をか
き落とす方法であるため、シヤドウマスク用金属
板に感光液が充分になじまず、感光液の乾燥中に
ピンホール（塗り欠陥）が発生し易いという問題
点がある。 However, in this method, the metal plate for the shadow mask is immersed in the photosensitive liquid and then the excess photosensitive liquid is simply scraped off, so the photosensitive liquid does not fully spread onto the metal plate for the shadow mask, causing the photosensitive liquid to become concentrated during drying. There is a problem in that holes (coating defects) are likely to occur.
本発明は前述した問題点に鑑みなされたもので
あり、ピンホールがなく、且つ均一な膜厚を得る
ことが可能なシヤドウマスク用金属板の感光液塗
布方法を提供することを目的としている。
The present invention has been made in view of the above-mentioned problems, and it is an object of the present invention to provide a method of applying a photosensitive liquid to a metal plate for a shadow mask, which is free from pinholes and can obtain a uniform film thickness.
即ち、本発明はシヤドウマスク用金属板に連続
的に感光液を塗布する工程と、シヤドウマスク用
金属板に感光液が付着している状態で例えばワイ
パーやゴムローラなどの弾性部材によりシヤドウ
マスク用金属板に感光液を強制的に塗り付ける工
程と、感光液が強制的に塗り付けられたシヤドウ
マスク用金属板を感光液内を通過させて再度感光
液を塗布する工程と、その感光液槽内の感光液の
液面または液面上に設けられた例えば金属からな
るローラにより前記再度塗布された感光液の膜厚
が所望厚になるようにかき落す工程とを具備する
ものと、例えばワイパーやゴムローラなどの弾性
部材によりシヤドウマスク用金属板に感光液を強
制的に塗りつける工程と再度感光液を塗布する工
程とを感光液槽内で行なうようにしたものであ
る。
That is, the present invention involves a step of continuously applying a photosensitive liquid to a metal plate for a shadow mask, and a process of exposing the metal plate for a shadow mask to light using an elastic member such as a wiper or a rubber roller while the photosensitive liquid is attached to the metal plate for a shadow mask. The process of forcibly applying the photosensitive liquid, the process of passing the metal plate for the shadow mask on which the photosensitive liquid has been forcibly applied through the photosensitive liquid and applying the photosensitive liquid again, and the process of applying the photosensitive liquid in the photosensitive liquid tank. a step of scraping off the reapplied photosensitive liquid using a roller made of metal, for example, provided on the surface or liquid surface so that the film thickness of the reapplied photosensitive liquid becomes a desired thickness; and an elastic member such as a wiper or a rubber roller. Accordingly, the process of forcibly applying the photosensitive liquid to the metal plate for a shadow mask and the process of applying the photosensitive liquid again are performed in the photosensitive liquid tank.
次に本発明の第１の実施例に適用する感光液塗
布装置を第１図及び第２図により説明する。
Next, a photosensitive liquid coating apparatus applied to the first embodiment of the present invention will be explained with reference to FIGS. 1 and 2.
即ち、長尺のシヤドウマスク用金属板１は純水
２を満した槽３内に設けられたガイドローラ４か
ら垂直に矢印５方向に移動され、ガイドローラ６
を介して乾燥工程に移動するが、その間に２個の
感光液塗布槽１０1，１０2が設置されている。こ
の２個の感光液塗布槽１０1，１０2は例えば高さ
100mm、幅100mm、長さ600mmの長方形の枠体７1，
７2の底面に弾性物質、例えば厚さ２mm、硬度45、
弾性率95％以上のネオプレンゴム板からなる底板
８1，８2を設け、この底板８1，８2の中央にその
長手方向に長さ600mmの切れ目、すなわち幅のほ
とんどないスリツトを形成し、給液管９1，９2か
ら感光液を適当な速度で供給し、感光液塗布槽１
０1，１０2内に約50mmの深さの感光液１１1，１
１2があるようになされている。更に上部の感光
液塗布槽１０2内の感光液１１2の液面にロツドコ
ータまたはスクイズコータからなる金属ローラ１
２が設けられている。 That is, the long metal plate 1 for a shadow mask is vertically moved from a guide roller 4 provided in a tank 3 filled with pure water 2 in the direction of an arrow 5, and then moved from a guide roller 6
During the drying step, two photosensitive liquid coating tanks 10 1 and 10 2 are installed. These two photosensitive liquid coating tanks 10 1 and 10 2 have a height of, for example,
Rectangular frame 7 1 , 100mm wide, 600mm long,
7 Elastic material on the bottom of 2 , for example, 2 mm thick, hardness 45,
Bottom plates 8 1 and 8 2 made of neoprene rubber plates with an elastic modulus of 95% or more are provided, and a slit with a length of 600 mm, that is, a slit with almost no width, is formed in the center of the bottom plates 8 1 and 8 2 in the longitudinal direction. The photosensitive liquid is supplied from the liquid supply pipes 9 1 and 9 2 at an appropriate speed, and the photosensitive liquid coating tank 1 is
Photosensitive liquid 11 1 , 1 approximately 50 mm deep in 0 1 , 10 2
It is designed so that there are 1 2 . Furthermore, a metal roller 1 made of a rod coater or a squeeze coater is applied to the surface of the photosensitive liquid 11 2 in the upper photosensitive liquid coating tank 10 2 .
2 is provided.
次にこの様な感光液塗布装置による塗布方法を
説明すると、先ず長尺のシヤドウマスク用金属板
１は純水２を通過した後、感光液塗布槽１０1で
感光液１１1が塗布され、その後感光液塗布槽１
０1のワイパーとしての底板８2で感光液１１1を
強制的に塗り付け、再度感光液塗布槽１０2内を
通過することにより感光液１１2が塗布され、金
属ローラ１２により感光液の膜厚が所望厚になる
ようにかき落される。 Next, to explain the coating method using such a photosensitive liquid coating device, first, the long metal plate 1 for a shadow mask passes through pure water 2, and then is coated with a photosensitive liquid 11 1 in a photosensitive liquid coating tank 10 1 . Photosensitive liquid coating tank 1
The photosensitive liquid 11 1 is forcibly applied with the bottom plate 8 2 serving as a wiper of 0 1 , and the photosensitive liquid 11 2 is applied by passing through the photosensitive liquid coating tank 10 2 again, and the metal roller 12 spreads the photosensitive liquid film. The thickness is scraped down to the desired thickness.
この金属ローラ１２は第２図に示すように例え
ば外径が40mmφ、長さ750mmのステンレス製のロ
ーラコータであり、例えばａ＝1.0mm、ｂ＝0.75
mm、ｃ＝ｄ＝0.2mm、ｅ＝60゜となつており、この
コータをシヤドウマスク用金属板の両面に加圧接
触させ、矢印５方向に移動するシヤドウマスク用
金属板１の移動速度と同じ速度で回転させる。実
験によればコータを上述したデイメンシヨンに
し、シヤドウマスク用金属板１の速度を２ｍ／
min、感光液１１1，１１2の粘度を20CPSにして
膜厚約4.7±0.3μｍを得ることができた。 As shown in FIG. 2, this metal roller 12 is a stainless steel roller coater with an outer diameter of 40 mmφ and a length of 750 mm, for example, a=1.0 mm, b=0.75
mm, c = d = 0.2 mm, e = 60°, and this coater is brought into pressure contact with both sides of the metal plate for a shadow mask, and is moved at the same speed as the moving speed of the metal plate 1 for a shadow mask, which moves in the direction of arrow 5. Rotate with . According to experiments, the coater was set to the above-mentioned dimension, and the speed of the shadow mask metal plate 1 was set to 2 m/min.
min, and the viscosity of the photosensitive liquids 11 1 and 11 2 was set to 20 CPS to obtain a film thickness of approximately 4.7±0.3 μm.
この膜厚分布を第３図及び第４図に示す。即
ち、第３図は表側の感光液の膜厚のシヤドウマス
ク用金属板の幅（460mm）方向の分布であり、曲
線２１1は特公昭54−21824号公報のもの、曲線２
２1は本実施例のものを示し、また第４図は裏側
の幅方向の分布であり、曲線２１1は特公昭54−
21824号公報のもの、曲線２２1は本実施例のもの
を示したものである表裏共に本実施例の方法がよ
り均一な膜厚分布が得られることがわかる。 This film thickness distribution is shown in FIGS. 3 and 4. That is, Fig. 3 shows the distribution of the film thickness of the photosensitive liquid on the front side in the width (460 mm) direction of the metal plate for a shadow mask.
21 shows the distribution in the width direction of the back side, and curve 211 shows the distribution in the width direction of the back side.
21824 and the curve 22 1 is that of this example. It can be seen that the method of this example provides a more uniform film thickness distribution on both the front and back sides.
またコータとして、外径30mmφで長さ750mmの
ステンレス製ローラに0.8mmφのワイパーを例え
ば1.0mmの等間隔に巻きつけても同様な結果が得
られた。 Similar results were also obtained using a coater in which wipers of 0.8 mmφ were wound around a stainless steel roller with an outer diameter of 30 mmφ and a length of 750 mm at equal intervals of, for example, 1.0 mm.
次に、本発明の第２の実施例に適用する感光液
塗布装置を第５図により説明する。図中第１の実
施例と同一符号は同一部分を示し、特に説明しな
い。 Next, a photosensitive liquid coating apparatus applied to a second embodiment of the present invention will be explained with reference to FIG. In the figure, the same reference numerals as those in the first embodiment indicate the same parts, and no particular explanation will be given.
即ち本実施例は感光液塗布槽１０2の長方形枠
体７2の深さを深くし、その内部の感光液１１2中
に感光液１１2をシヤドウマスク用金属板１に強
制的に塗り付ける底板８2と同様の１対のワイパ
ー１３を設けたものである。この場合第１の実施
例の感光液塗布槽１０1は必要としない。 That is, in this embodiment, the depth of the rectangular frame 7 2 of the photosensitive liquid coating tank 10 2 is increased, and the bottom plate 8 is used to forcibly apply the photosensitive liquid 11 2 to the metal plate 1 for a shadow mask in the photosensitive liquid 11 2 inside. A pair of wipers 13 similar to No. 2 are provided. In this case, the photosensitive liquid coating tank 101 of the first embodiment is not required.
次に、本発明の第３の実施例に適用する感光液
塗布装置を第６図により説明する。図中第１の実
施例と同一符号は同一部分を示し、特に説明しな
い。 Next, a photosensitive liquid coating apparatus applied to a third embodiment of the present invention will be explained with reference to FIG. In the figure, the same reference numerals as those in the first embodiment indicate the same parts, and no particular explanation will be given.
即ち本実施例では槽３中に感光液１１を給液管
９から適当な速度で供給し、ガイドローラ４でシ
ヤドウマスク用金属板１を矢印５方向に引き上げ
る場合で２対のワイパー１３1，１３2及び液面に
設けられた金属ローラ１２を介して引き上げるよ
うになつている。この場合第１の実施例の感光液
塗布槽１０1，１０2は不用である。 That is, in this embodiment, when the photosensitive liquid 11 is supplied into the tank 3 from the liquid supply pipe 9 at an appropriate speed and the shadow mask metal plate 1 is pulled up in the direction of the arrow 5 by the guide roller 4, two pairs of wipers 13 1 , 13 are used. 2 and a metal roller 12 provided on the liquid surface. In this case, the photosensitive liquid coating tanks 10 1 and 10 2 of the first embodiment are unnecessary.
前述した実施例に於ては感光液の膜厚が所望厚
になるようにかき落す金属ローラ１２例えばロツ
ドコータまたはスクイズコータを感光液の液面と
同一面上に軸を有するように配設したが、これに
限定されるものではなく例えば第７図に示すよう
に感光液１１の液面１１ａより上方に金属ローラ
１２または他の部分からなるローラを設けてもよ
い。また感光液を強制的に塗りつけるのにワイパ
ー１３，１３1，１３2やワイパーとしての底板８
２を使用したが、これに限定されるものではなく、
弾性部材からなるローラを使用してもよいことは
勿論である。 In the embodiment described above, the metal roller 12, for example, a rod coater or a squeeze coater, which scrapes off the photosensitive liquid to a desired thickness, is disposed so that its axis is on the same level as the surface of the photosensitive liquid. However, the present invention is not limited to this, and for example, as shown in FIG. 7, a metal roller 12 or a roller made of another portion may be provided above the liquid level 11a of the photosensitive liquid 11. In addition, the wipers 13, 13 1 , 13 2 and the bottom plate 8 as a wiper are used to forcibly apply the photosensitive liquid.
2 was used, but it is not limited to this,
Of course, a roller made of an elastic member may also be used.
上述のように本発明のシヤドウマスク用金属板
の感光液塗布方法によれば塗り欠陥がなく、ほぼ
均一な厚さの感光液をシヤドウマスク用金属板に
塗布することが可能であり、微細な電子ビーム通
過孔部を有するシヤドウマスクの製造に当つても
全面にわたつて均一な電子ビーム通過孔部を形成
することが可能となるので、その工業的価値は極
めて大である。
As described above, according to the method of applying a photosensitive liquid to a metal plate for a shadow mask according to the present invention, there is no coating defect, it is possible to apply a photosensitive liquid to a metal plate for a shadow mask with a substantially uniform thickness, and it is possible to apply a photosensitive liquid to a metal plate for a shadow mask using a fine electron beam. Even in the production of a shadow mask having a passage hole, it is possible to form uniform electron beam passage holes over the entire surface, so its industrial value is extremely large.
第１図及び第２図は本発明の第１の実施例に適
用する感光液塗布装置を示す図であり、第１図は
説明用断面図、第２図は金属ローラの一部拡大説
明図、第３図は従来と本実施例とによるシヤドウ
マスク用金属板の幅方向の表側の感光液膜の厚さ
を対比して示すグラフ、第４図は従来と本実施例
とによるシヤドウマスク用金属板の幅方向の裏側
の感光液膜の厚さを対比して示すグラフ、第５図
は本発明の第２の実施例に適用する感光液塗布装
置の要部説明用断面図、第６図は本発明の第３の
実施例に適用する感光液塗布装置の要部説明用断
面図、第７図は金属ローラの別な配設位置を示す
要部拡大説明用断面図である。
１……シヤドウマスク用金属板、３……槽、
４，６……ガイドローラ、７1，７2……枠体、８
１，８2……底板、１０1，１０2……感光液塗布
槽、１１，１１1，１１2……感光液、１２……金
属ローラ、１３，１３1，１３2……ワイパー。
1 and 2 are diagrams showing a photosensitive liquid coating device applied to the first embodiment of the present invention, FIG. 1 is an explanatory cross-sectional view, and FIG. 2 is a partially enlarged explanatory view of a metal roller. , FIG. 3 is a graph showing a comparison of the thickness of the photosensitive liquid film on the front side in the width direction of the metal plates for shadow masks according to the conventional method and the present example, and FIG. 4 shows the metal plates for shadow masks according to the conventional method and the present example. 5 is a sectional view for explaining the main parts of the photosensitive liquid coating device applied to the second embodiment of the present invention, and FIG. 6 is a graph showing the thickness of the photosensitive liquid film on the back side in the width direction in comparison. FIG. 7 is a cross-sectional view for explaining the main part of a photosensitive liquid coating device applied to the third embodiment of the present invention, and FIG. 7 is an enlarged cross-sectional view for explaining the main part showing another arrangement position of the metal roller. 1...metal plate for shadow mask, 3...tank,
4, 6... Guide roller, 7 1 , 7 2 ... Frame, 8
1 , 8 2 ... bottom plate, 10 1 , 10 2 ... photosensitive liquid coating tank, 11, 11 1 , 11 2 ... photosensitive liquid, 12 ... metal roller, 13, 13 1 , 13 2 ... wiper.
Claims (1)
塗布する工程と、前記シヤドウマスク用金属板に
前記感光液が付着している状態で弾性部材により
前記シヤドウマスク用金属板に前記感光液を強制
的に塗り付ける工程と、前記感光液が強制的に塗
り付けられたシヤドウマスク用金属板を感光液槽
内を通過させて再度感光液を塗布する工程と、前
記感光液槽内の感光液の液面または液面上に設け
られたローラにより前記シヤドウマスク用金属板
に塗布された感光液の膜厚が所望厚さになるよう
にかき落とす工程とを具備することを特徴とする
シヤドウマスク用金属板の感光液塗布方法。 ２ シヤドウマスク用金属板に連続的に感光液を
塗布する感光液槽内で弾性部材により前記シヤド
ウマスク用金属板に前記感光液を強制的に塗り付
けた後、再度前記感光液を塗布する工程と、前記
感光液槽内の感光液の液面または液面上に設けら
れたローラにより前記シヤドウマスク用金属板に
再度塗布された感光液の膜厚が所望厚さになるよ
うにかき落とす工程とを具備することを特徴とす
るシヤドウマスク用金属板の感光液塗布方法。[Scope of Claims] 1. A step of continuously applying a photosensitive liquid to a metal plate for a shadow mask, and applying the photosensitive liquid to the metal plate for a shadow mask using an elastic member while the photosensitive liquid is attached to the metal plate for a shadow mask. a step of forcibly applying the photosensitive liquid; a step of passing the shadow mask metal plate to which the photosensitive liquid has been forcibly applied through a photosensitive liquid tank and applying the photosensitive liquid again; and a step of applying the photosensitive liquid in the photosensitive liquid tank again. a step of scraping off the photosensitive liquid applied to the metal plate for a shadow mask using a liquid level or a roller provided on the liquid level so that the film thickness becomes a desired thickness. How to apply photosensitive liquid to a board. 2. Continuously applying a photosensitive liquid to the metal plate for a shadow mask, forcibly applying the photosensitive liquid to the metal plate for a shadow mask using an elastic member in a photosensitive liquid tank, and then applying the photosensitive liquid again; a step of scraping off the photosensitive liquid reapplied to the shadow mask metal plate using a liquid surface of the photosensitive liquid in the photosensitive liquid tank or a roller provided on the liquid surface so that the film thickness becomes a desired thickness; A method for applying a photosensitive liquid to a metal plate for a shadow mask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57173989A JPS5963643A (en) | 1982-10-05 | 1982-10-05 | Photosensitive solution-coating process of metal plate used for shadow mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57173989A JPS5963643A (en) | 1982-10-05 | 1982-10-05 | Photosensitive solution-coating process of metal plate used for shadow mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5963643A JPS5963643A (en) | 1984-04-11 |
| JPH029417B2 true JPH029417B2 (en) | 1990-03-01 |
Family
ID=15970708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57173989A Granted JPS5963643A (en) | 1982-10-05 | 1982-10-05 | Photosensitive solution-coating process of metal plate used for shadow mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5963643A (en) |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2577904A (en) * | 1948-02-03 | 1951-12-11 | Armco Steel Corp | Method for hot dip coating of metal strip |
| US2759850A (en) * | 1952-11-24 | 1956-08-21 | Wheeling Steel Corp | Coating sheets with molten metal and apparatus therefor |
| US3238058A (en) * | 1960-09-27 | 1966-03-01 | Accumulateurs Fixes | Process and device for adjusting the thickness of paste layers and use of same for manufacturing sintered electrodes |
| JPS509328U (en) * | 1973-05-24 | 1975-01-30 | ||
| JPS50116170A (en) * | 1974-02-25 | 1975-09-11 | ||
| JPS534850A (en) * | 1976-07-05 | 1978-01-17 | Hitachi Ltd | Method of fixing microstrip line substrate |
| JPS5579067A (en) * | 1978-12-11 | 1980-06-14 | Toshiba Corp | Coating method and apparatus for photosensitive liquid |
| JPS5588872A (en) * | 1978-12-27 | 1980-07-04 | Nippon Telegr & Teleph Corp <Ntt> | Plastic covering apparatus |
| JPS55111878A (en) * | 1979-02-19 | 1980-08-28 | Sumitomo Electric Ind Ltd | Coating of paint to filament material |
| JPS5763162A (en) * | 1980-09-30 | 1982-04-16 | Fujitsu Ltd | Resin coating device for optical fiber |
| JPS6133633A (en) * | 1984-07-25 | 1986-02-17 | 松下電器産業株式会社 | Electric cleaner |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5455259U (en) * | 1977-09-27 | 1979-04-17 |
-
1982
- 1982-10-05 JP JP57173989A patent/JPS5963643A/en active Granted
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2577904A (en) * | 1948-02-03 | 1951-12-11 | Armco Steel Corp | Method for hot dip coating of metal strip |
| US2759850A (en) * | 1952-11-24 | 1956-08-21 | Wheeling Steel Corp | Coating sheets with molten metal and apparatus therefor |
| US3238058A (en) * | 1960-09-27 | 1966-03-01 | Accumulateurs Fixes | Process and device for adjusting the thickness of paste layers and use of same for manufacturing sintered electrodes |
| JPS509328U (en) * | 1973-05-24 | 1975-01-30 | ||
| JPS50116170A (en) * | 1974-02-25 | 1975-09-11 | ||
| JPS534850A (en) * | 1976-07-05 | 1978-01-17 | Hitachi Ltd | Method of fixing microstrip line substrate |
| JPS5579067A (en) * | 1978-12-11 | 1980-06-14 | Toshiba Corp | Coating method and apparatus for photosensitive liquid |
| JPS5588872A (en) * | 1978-12-27 | 1980-07-04 | Nippon Telegr & Teleph Corp <Ntt> | Plastic covering apparatus |
| JPS55111878A (en) * | 1979-02-19 | 1980-08-28 | Sumitomo Electric Ind Ltd | Coating of paint to filament material |
| JPS5763162A (en) * | 1980-09-30 | 1982-04-16 | Fujitsu Ltd | Resin coating device for optical fiber |
| JPS6133633A (en) * | 1984-07-25 | 1986-02-17 | 松下電器産業株式会社 | Electric cleaner |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5963643A (en) | 1984-04-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH029417B2 (en) | ||
| JP3034292B2 (en) | Photosensitive solution application method | |
| US6193897B1 (en) | Shadow mask manufacturing method, shadow mask manufacturing apparatus, and cleaning device used in the method and apparatus | |
| KR100260657B1 (en) | A method for manufacturing a shadowmask and a coating device of anti-etching layer using thereto | |
| JP4300961B2 (en) | Roll coating method | |
| JPH10154461A (en) | Manufacture of shadow mask and etching-resistant layer coating device used for it | |
| JPS6133633B2 (en) | ||
| JPS6145512B2 (en) | ||
| JP3078581B2 (en) | Method and apparatus for washing metal sheet after chemical etching | |
| KR940002258B1 (en) | Surface treatment method and apparatus of metallic sheets | |
| JPS5938696B2 (en) | Manufacturing method of shadow mask for color picture tube | |
| JP3203764B2 (en) | Coating method and applicator using bar coater | |
| JP2005342643A (en) | Roll coating method and apparatus | |
| JPS6223575Y2 (en) | ||
| JP3489276B2 (en) | Manufacturing method of shadow mask | |
| JP2703279B2 (en) | Manufacturing method of shadow mask | |
| JPH1094871A (en) | Method and device for applying brazing coition | |
| JPH0731920A (en) | Rod for coating apparatus | |
| JPH0377235A (en) | Apparatus for manufacturing shadow mask | |
| JPS6196085A (en) | Manufacture of shadow mask | |
| JPH09248504A (en) | Resist applicator | |
| JPS6313818Y2 (en) | ||
| JPH0325828A (en) | Manufacture of shadow mask | |
| JPH08111174A (en) | Manufacture of shadow mask | |
| DE2511320A1 (en) | Metal strip coating continuous strand - has coating troughs with flexible seals and overflow trough recycling system |