JPH0283802A - Magnetic disk device - Google Patents
Magnetic disk deviceInfo
- Publication number
- JPH0283802A JPH0283802A JP23604588A JP23604588A JPH0283802A JP H0283802 A JPH0283802 A JP H0283802A JP 23604588 A JP23604588 A JP 23604588A JP 23604588 A JP23604588 A JP 23604588A JP H0283802 A JPH0283802 A JP H0283802A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- magnetic disk
- film
- recording medium
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 125
- 239000010408 film Substances 0.000 claims abstract description 59
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 22
- 239000010409 thin film Substances 0.000 claims abstract description 19
- 230000001681 protective effect Effects 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 14
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 7
- 230000000052 comparative effect Effects 0.000 description 15
- 230000003746 surface roughness Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910003437 indium oxide Inorganic materials 0.000 description 4
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 229910018134 Al-Mg Inorganic materials 0.000 description 2
- 229910018467 Al—Mg Inorganic materials 0.000 description 2
- 229910017888 Cu—P Inorganic materials 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 101150114104 CROT gene Proteins 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910001566 austenite Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Magnetic Heads (AREA)
- Recording Or Reproducing By Magnetic Means (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は磁気ディスク装置、とくにビーカス硬度が１
５００程度の薄膜ヘッドに対する磁気ディスクの構成に
関するものである。[Detailed Description of the Invention] [Industrial Application Field] This invention relates to a magnetic disk device, particularly a magnetic disk device with a beaker hardness of 1.
This paper relates to the structure of a magnetic disk for approximately 500 thin film heads.
〔従来の技術］
近年、コンピュータシステムにおける磁気ディスク装置
などの外部記憶装置の重要性が増大し、高記録密度に対
する要求がまずまず高まっている。[Prior Art] In recent years, the importance of external storage devices such as magnetic disk drives in computer systems has increased, and the demand for high recording densities has increased considerably.
磁気ディスク装置は記録再生へノドおよび磁気ディスク
の主構成部から構成され、磁気ディスクは高速で回転し
、記録再生ヘッドすなわち、磁気ヘッドは磁気ディスク
より微小間隔浮上している。A magnetic disk device consists of a main component of a recording/reproducing head and a magnetic disk.The magnetic disk rotates at high speed, and the recording/reproducing head, that is, the magnetic head, floats a minute distance above the magnetic disk.
磁気ディスクの高記録密度化、高性能化を図るためには
、磁気記録媒体の薄層化、均−一様化、磁気特性の改良
（保磁力、角形比の向上）、磁気へノドの低浮上化など
が挙げられる。In order to increase the recording density and performance of magnetic disks, it is necessary to make the magnetic recording medium thinner and more uniform, improve magnetic properties (improvement of coercive force and squareness ratio), and lower the magnetic helix. Examples include levitation.
これまで磁気ディスクは塗布形といい、バインダーなど
の高分子材料とｒ−ＦｅｚＣｚ磁気記録媒体粒子を混合
して塗布して製作していた。この方法では、磁気記録媒
体の薄層化、均−一様化に限界がある。このため最近で
は、磁気記録媒体をスパンクリングなどの方法により連
続薄膜として基材上に設けるようになってきた。γ−Ｆ
ｅｚｅｓを連続薄膜媒体とした磁気ディスクの構成の一
例を第９図に示す。第９図は例えば電電公社研究実用化
報告第３１巻第９号の１７３１〜１７４４頁に報告され
た薄膜磁気ディスクの断面を示す図である。図において
、ｆｌ＋はディスク状のアルミニウム合金基材、（２）
はアルマイトから成る磁気記録媒体の下地層、（３）は
磁気記録媒体となるγ−Ｆｅ、Ｏ，薄膜である。So far, magnetic disks have been of the coating type, and have been manufactured by coating a mixture of polymeric materials such as binders and r-FezCz magnetic recording medium particles. This method has limitations in making the magnetic recording medium thinner and more uniform. For this reason, recently, magnetic recording media have been provided as continuous thin films on substrates by methods such as spanking. γ-F
FIG. 9 shows an example of the configuration of a magnetic disk using Ezes as a continuous thin film medium. FIG. 9 is a diagram showing a cross section of a thin film magnetic disk reported, for example, in Vol. 31, No. 9, pages 1731 to 1744 of the Research and Practical Application Report of the Telecommunications Public Corporation. In the figure, fl+ is a disk-shaped aluminum alloy base material, (2)
(3) is the underlayer of the magnetic recording medium made of alumite, and (3) is the γ-Fe, O, thin film that becomes the magnetic recording medium.
現在、磁気ディスク装置では、起動および停止時に磁気
ディスクと磁気ヘッドが接触するコンタクト・スタート
・ストンプ（Ｃ３Ｓ）方式を採用しており、起動および
停止時には磁気ヘッドと磁気ディスク表面が接触したま
ま回転する。この接触摩擦状態における磁気ヘッドと磁
気ディスクの間に生じる摩擦力は、磁気ヘッドと磁気デ
ィスク表面を摩耗させ、ついには磁気ヘッドおよび磁気
記録媒体膜に傷を作ることがある。磁気記録媒体に連続
薄膜を用いた場合、わずがな傷であっても記録媒体の欠
如となり、記録信号の消失につながる。このことは、磁
気ディスク装置の外部記憶装置としての信顧性に関わる
重大な問題である。Currently, magnetic disk drives use the contact start/stomp (C3S) method in which the magnetic disk and magnetic head come into contact when starting and stopping, and the magnetic head and magnetic disk surface rotate while in contact during starting and stopping. . The frictional force generated between the magnetic head and the magnetic disk in this contact friction state causes wear on the surfaces of the magnetic head and the magnetic disk, and may eventually cause scratches on the magnetic head and the magnetic recording medium film. When a continuous thin film is used as a magnetic recording medium, even a slight scratch results in a defect in the recording medium, leading to loss of recorded signals. This is a serious problem concerning the reliability of magnetic disk devices as external storage devices.
このため、磁気ディスクの表面に、磁気ヘッドと磁気記
録媒体との接触摩擦および接触破壊から磁気記録媒体を
保護するために、Ｓｉｎ、膜、カーボン膜、Ａ１□０．
膜のような保護膜を設けることが考案されている（例え
ば、田子章男ら、第８凹口本応用磁気学会学術講演概要
集（１９８４）、２２２頁ｉ木町良弘ら、昭和６１年度
電子通信学会総合全国大会Ｙ稿集（１９８６） 、ｌ−
１６６頁；刈木博保ら、日本潤滑学会筒３０期春期研究
発表回予稿集（＋９８６）、１４］ 頁などに発表され
ている。）。また、磁気記録媒体が金属の場合、この保
ｊＩ膜は金属膜の腐食を防く保護も兼ねる役目がある。Therefore, in order to protect the magnetic recording medium from contact friction and contact damage between the magnetic head and the magnetic recording medium, the surface of the magnetic disk is coated with a film of Sin, a carbon film, A1□0.
It has been devised to provide a protective film such as a film (for example, Akio Tago et al., Vol. 8, Uguguchi Book Abstracts of Academic Lectures of the Japan Society of Applied Magnetics (1984), p. 222, Yoshihiro Kimachi et al., 1985 Electronic Communication Proceedings of the National Conference of Academic Societies (1986), l-
Page 166; Hiroyasu Kariki et al., Proceedings of the 30th Spring Research Presentation of the Japan Society of Lubricants (+986), page 14]. ). Furthermore, when the magnetic recording medium is metal, the protective film also serves to protect the metal film from corrosion.
一方、磁気−・ノドの低浮上化も進められている。On the other hand, efforts are being made to lower the flying height of the magnetic throat.
低浮上量における安定したヘット浮上状態を確保し、磁
気ヘッドと磁気ディスクの衝突（ヘッドクラッシュ）を
防止するためのディスク表面精度の向」二、耐ヘツドク
ラツシユ性の向上が検討されている。特にディスク表面
精度の向」二は著しく、従来のディスクのＲｍａχは２
０００人Ａｉｌ後以上あったのが、現在ではＲｍａｘが
１００人前後と１桁以上小さくなっている。このように
ディスクの表面精度が年々向上するので、磁気ヘッドが
磁気ディスク表面に吸着し、磁気ディスクが回転を始め
ても磁気ヘッドが浮上できず磁気ヘッドなどが破損する
問題が起きてきた（例えば、ジャーナル・オブ・ア（４
ン
ブライド・フィジフクス（Ｊ 、 Ａｐｐｌ、 Ｐｈｙ
ｓ、） ５５巻、６号、２２５４頁（Ｅ、Ｍ、Ｒｏｓｓ
ｉ他）。このため、一端鏡面のように仕上げられた基板
表面に微粉末を塗布する、再度研磨あるいはエツチング
して微小な突起を表面に設けるといった手法が考えられ
ている（例えば、５９−１１７７’３５．６０−３８７
２０．６０−４０５２８．６１−２９４１８．６１２０
３２５９．６１−２６１８２０）。そしてこの後に磁気
記録媒体及び保護膜が設けられる。In order to ensure a stable head flying state at low flying heights and prevent collisions between the magnetic head and the magnetic disk (head crash), improvements in disk surface precision and head crash resistance are being studied. In particular, the improvement in disk surface accuracy is remarkable, and the Rmaχ of conventional disks is 2.
Rmax was more than 000 people after Ail, but now it is around 100 people, which is more than an order of magnitude smaller. As the surface precision of disks improves year by year, problems have arisen in which the magnetic head sticks to the surface of the magnetic disk, and even when the magnetic disk begins to rotate, the magnetic head cannot fly, resulting in damage to the magnetic head (for example, Journal of a (4)
Embryophysiology (J, Appl, Phys.
s,) Volume 55, No. 6, Page 2254 (E, M, Ross
i et al). For this reason, methods have been considered, such as applying fine powder to the surface of a substrate that has been finished like a mirror at one end, or polishing or etching it again to form minute protrusions on the surface (for example, 59-1177'35.60 -387
20.60-40528.61-29418.6120
3259.61-261820). After this, a magnetic recording medium and a protective film are provided.
従来の磁気ディスクは以」二のように構成され、保護膜
として酸化膜を設ける簡便な方法として、溶液から成膜
することが知られている。ゾルゲル法などのように溶液
からＳ ｊＯｚ膜、Ａ ｌ ｚ Ｏｓ膜などを成膜する
場合熱処理を行うが、磁気記録媒体の特性を変質させな
い程度の熱処理（約４００℃以下）では、十分ガラス化
せず、通常のセラミックに比べて硬度、強度などがかな
り劣る（柳沢雅弘、日本潤滑学会創立３０周年記念全国
大会予稿集（１９８５） 、４５頁）。例えば金属アル
コキシドからガラスを合成する場合、金属アルコキシド
を加水分解させたゲルをガラス化させるのに必要な熱処
理温度は６００〜Ｉ（１０（１′Ｃであり、溶融法によ
るシリカガラスと同一の性質を示すのは９００〜ｌ００
０℃の熱処理をした場合であると言われている（作花済
夫「ガラス非晶質の化学」、内田老鶴田（１，９８３）
１４７〜１６４頁）。このため、溶液から作成した酸化
膜では硬度、強度共に十分ではなかった。A conventional magnetic disk has the following structure, and a simple method for forming an oxide film as a protective film is known to be formed from a solution. When forming a SjOz film, an AlzOs film, etc. from a solution using the sol-gel method, etc., heat treatment is required, but heat treatment (at about 400°C or less) that does not change the characteristics of the magnetic recording medium is enough to vitrify the film. However, it is considerably inferior in hardness and strength compared to ordinary ceramics (Masahiro Yanagisawa, Proceedings of the 30th Anniversary National Conference of the Japanese Society of Lubrication (1985), p. 45). For example, when synthesizing glass from metal alkoxide, the heat treatment temperature required to vitrify the gel obtained by hydrolyzing the metal alkoxide is 600 to 10 (1'C), which has the same properties as silica glass produced by the melting method. indicates 900 to 100
It is said that this is the case when heat treatment is carried out at 0℃ (Sakubana Masao, "Chemistry of Glass Amorphous", Uchida Rotsuta (1,983)
147-164). For this reason, the oxide film created from a solution did not have sufficient hardness or strength.
この点では、スパッタリングなどによって成膜される酸
化膜やカーボン膜は、強度的には優れたものができる（
例えば、本町良弘ら、昭和６１年度電子通信学会総合全
国大会予稿集（１９８６） １１６６頁）。しかし
、現在のように表面に微小な突起を設けである基材にお
いては、多くの学会発表例にみられるようなＳｉＯ□膜
、Ａ１□０３膜、カボン膜などの保＃！膜では硬いが脆
いという欠点があった。すなわち微小な突起の上を磁気
ヘッドが接触するため、突起部に相当する保護膜部が脆
いために折れて削り取られてしまう。この性質について
は、薄膜酸化物であってもバルクのセラミツクＬ同様で
ある。このため、ビッカース硬度が１５００程度の、例
えばＡ１□Ｏｙ ／ Ｔ ｉ Ｃを用いた硬い薄膜ヘッ
ドに対しては、保護膜が削られてさらに磁気記録媒体ま
で削られて記録された信号が消えてしまうという問題点
が生じた。In this respect, oxide films and carbon films formed by sputtering etc. can have excellent strength (
For example, Yoshihiro Honmachi et al., Proceedings of the 1986 National Conference of the Institute of Electronics and Communication Engineers (1986), p. 1166). However, in the case of current substrates that have minute protrusions on their surfaces, the retention of ##! The film had the disadvantage of being hard but brittle. In other words, since the magnetic head comes into contact with the top of the minute protrusion, the protective film corresponding to the protrusion is fragile and is likely to break and be scraped off. Regarding this property, even the thin film oxide is similar to the bulk ceramic L. For this reason, for hard thin-film heads using A1□Oy/TiC, for example, with a Vickers hardness of about 1500, the protective film is scraped and the magnetic recording medium is further scraped, causing recorded signals to disappear. There was a problem with it being put away.
また、磁気記録媒体にまで損傷が及ばなくとも、表面の
微小な突起が消失するために磁気ヘッドが吸着して、磁
気ヘッドが浮上できなくなるという問題点が生じた。Furthermore, even if the magnetic recording medium is not damaged, the minute protrusions on the surface disappear, causing the magnetic head to be attracted to it, making it impossible for the magnetic head to fly.
この発明は上記のような問題点を解決するためのなされ
たもので、磁気ヘッドによる磁気ディスクへの損傷を防
ぎ、保護膜の剥離を防止して、磁気ヘッドの磁気ディス
ク基板に対する吸着を防止し、信軌性の高い磁気ディス
ク装置を得ることを目的とする。This invention was made to solve the above problems, and it prevents damage to the magnetic disk by the magnetic head, prevents peeling of the protective film, and prevents the magnetic head from adhering to the magnetic disk substrate. , the purpose is to obtain a magnetic disk device with high reliability.
Ｃ課題を解決するための手段〕
この発明に係る磁気ディスク装置は、ビッカース硬度が
１４００〜１５５０の薄膜へンドに対し、磁気記録媒体
層の保護膜として、酸化イツトリウムを６ｍｏ１％以上
含有する、１００〜１ｏｏｏ人厚さの酸化ジルコニウム
膜を用いるものである。Means for Solving Problem C] The magnetic disk device according to the present invention provides a thin film head having a Vickers hardness of 1,400 to 1,550, as a protective film of a magnetic recording medium layer. A zirconium oxide film with a thickness of ~100 mm is used.
この発明に係る磁気ディスク装置は、表面に硬度と靭性
に冨む酸化ジルコニウム膜を設けることにより、ビッカ
ース硬度が１５００程度の硬い薄膜ヘッドに対して、磁
気ディスク表面の膜の耐久性が従来の酸化物膜やカーボ
ン膜に比べ格段に強化され、（、ｔ ｅＮ性が増加する
。By providing a zirconium oxide film with high hardness and toughness on the surface of the magnetic disk device according to the present invention, the durability of the film on the surface of the magnetic disk is lower than that of the conventional oxide film, compared to a hard thin film head with a Vickers hardness of about 1500. It is significantly strengthened compared to a material film or a carbon film, and its teN properties are increased.
以下、この発明の一実施例を図について説明する。第１
図はこの発明の一実施例に係る磁気ディスクを示す断面
図で、図において（１）はＡ Ｉ −Ｍｇ合金基板、（
２）は磁気記録媒体層の下地層、（３）は磁気記録媒体
層、（４）は酸化ジルコニウム膜よりなる保護膜である
。An embodiment of the present invention will be described below with reference to the drawings. 1st
The figure is a cross-sectional view showing a magnetic disk according to an embodiment of the present invention. In the figure (1) is an AI-Mg alloy substrate, (
2) is the underlayer of the magnetic recording medium layer, (3) is the magnetic recording medium layer, and (4) is a protective film made of a zirconium oxide film.
Ａ ｌ−Ｍｇ合金基板（１１の表面にＮ１−Ｐあるいは
Ｎ１−Ｃｕ−Ｐメツキ膜よりなる下地層（２）を成膜し
、鏡面加工しである基板に対して、テープ研磨機を用い
、ラッピングテープＷ Ａ ＃６０００、押し圧１ｋｇ
、基板回転数２００ｒｐｍ 、テープ送り速度２０ｍ／
ｕｒｎの条件でテクスチャ加工を行った。これによりＲ
ｗａｘ ５００人程度の基板が得られる。この基板上に
磁気記録媒体をスパッタリングにより成膜した。Using a tape polisher, a base layer (2) made of N1-P or N1-Cu-P plating film was formed on the surface of the Al-Mg alloy substrate (11) and mirror-finished. Wrapping tape W A #6000, pressure 1kg
, substrate rotation speed 200 rpm, tape feed speed 20 m/
Texture processing was performed under the conditions of urn. This allows R
About 500 wax boards can be obtained. A magnetic recording medium was formed on this substrate by sputtering.
実施例１ 磁気記録媒体としてγ−Ｆ ｅｔ Ｏｓを用いた。Example 1 γ-F et Os was used as a magnetic recording medium.
この磁気記録媒体層【３）の上に酸化インドリウム８ｍ
ｏ１％含有の酸化ジルコニウムをスパッタリングにより
成膜した。スパッタ条件はＲＦパワー３００Ｗ／８イン
チ、Ａ「圧力３ｍＴｏｒｒで基板加熱は行わなかった。8 m of indium oxide is placed on this magnetic recording medium layer [3].
A film of zirconium oxide containing 0.1% was formed by sputtering. The sputtering conditions were RF power of 300 W/8 inches, A pressure of 3 mTorr, and no substrate heating.
酸化ジルコニウムの膜厚は５００人であった。The thickness of the zirconium oxide film was 500 mm.
実施例２ 磁気記録媒体としてＣｏ−Ｎｉ−Ｃｒを用いた。Example 2 Co--Ni--Cr was used as the magnetic recording medium.
この磁気記録媒体層の上に酸化イツトリウム８ｍｏ１％
含をの酸化ジルコニウムを電子ビーム蒸着により成膜し
た。蒸着条件は加速電圧１０にν、電流１＋ＡＳ基板温
度１５０℃、酸素圧力］ｍＴｏｒｒにした。On this magnetic recording medium layer, 8 mo1% of yttrium oxide was added.
A film containing zirconium oxide was formed by electron beam evaporation. The deposition conditions were an acceleration voltage of 10 ν, a current of 1+AS substrate temperature of 150° C., and an oxygen pressure of mTorr.
酸化ジルコニウムの膜厚は６００人であった。The thickness of the zirconium oxide film was 600.
比較例１ 磁気記録媒体としてｒ ＦｅｚＯｚを用いた。Comparative example 1 rFezOz was used as a magnetic recording medium.
この磁気記録媒体層の上にＳｉｎ、膜をスパッタにより
成膜した。スパッタ条件はほぼ実施例１と同様である。A Sin film was formed on this magnetic recording medium layer by sputtering. The sputtering conditions are almost the same as in Example 1.
Ｓ ｒ Ｏｚ の膜厚は５００人にした。The film thickness of SrOz was set to 500 people.
比較例２ 磁気記録媒体としてγ−ＦｅｚＯｚを用いた。Comparative example 2 γ-FezOz was used as a magnetic recording medium.
この磁気記録媒体層の上に酸化イツトリウム３ｍｏ１％
含有の酸化ジルコニウムをスパッタリングにより成膜し
た。スパッタ条件はＲＦパワー３００／８インチ、Ａｒ
圧力３ｍＴｏｒｒで基板加熱は行わなかった。酸化ジル
コニウムの膜厚は５００人であった。On this magnetic recording medium layer, 3 mo1% of yttrium oxide was added.
A film containing zirconium oxide was formed by sputtering. Sputtering conditions are RF power 300/8 inch, Ar
The substrate was not heated at a pressure of 3 mTorr. The thickness of the zirconium oxide film was 500 mm.
これらの比較例を含めた磁気ディスクの初期特性を以下
に示す。The initial characteristics of magnetic disks including these comparative examples are shown below.
実施例１による磁気ディスクの表面粗さを触針式表面粗
ざ計で測定した特性図を第２図に示した。A characteristic diagram of the surface roughness of the magnetic disk according to Example 1 measured using a stylus type surface roughness meter is shown in FIG.
実施例２、比較例１．２とも同様の特性を示したので、
特性図は省略する。ディスクの表面には微小な凹凸が認
められた。Since Example 2 and Comparative Example 1.2 showed similar characteristics,
Characteristic diagrams are omitted. Minute irregularities were observed on the surface of the disk.
実施例１．２？こよる磁気ディスクと比較例１、２によ
る磁気ディスクの表面に、３３８０形薄膜ヘツドを接触
させ静摩擦計数を測定した。実施例１による磁気ディス
クでは０．１９、実施例２による磁気ディスクでは０．
２０、比較例１による磁気ディスクでは０．２０、比較
例２による磁気ディスクでは０．１９であった。すべて
良好な特性を示した。Example 1.2? A 3380 type thin film head was brought into contact with the surfaces of the magnetic disks thus prepared and those of Comparative Examples 1 and 2, and the static friction coefficient was measured. 0.19 for the magnetic disk according to Example 1, and 0.19 for the magnetic disk according to Example 2.
20, 0.20 for the magnetic disk according to Comparative Example 1, and 0.19 for the magnetic disk according to Comparative Example 2. All showed good characteristics.
ここで、磁気ディスクの耐久試験であるＣ３Ｓ試験を行
った。ヘッドとしてはスライダ材料がＡｌｔｏｓ／Ｔｉ
ｃである３３８０形薄膜ヘツドを使用した。第３図はＣ
８Ｓ試験を行った結果を示しており、縦軸は初期再生出
力を１とした規格化再生出力、横軸はＣ８Ｓ回数（Ｘ
１０’）をとっである。Here, a C3S test, which is a durability test for magnetic disks, was conducted. The slider material for the head is Altos/Ti.
A 3380 type thin film head, which was manufactured by C. Figure 3 is C
It shows the results of the 8S test, where the vertical axis is the normalized playback output with the initial playback output as 1, and the horizontal axis is the C8S number (X
10').
図中○印を結ぶ線はこの発明の実施例１，２によるディ
スクの場合、×印を結ぶ線は比較例、Δ印を結ぶ線は比
較例２によるディスクの場合を示している。In the figure, the line connecting the O marks indicates the case of the disks according to Examples 1 and 2 of the present invention, the line connecting the X marks indicates the case of the comparative example, and the line connecting the Δ marks indicates the case of the disk according to the second comparative example.
この発明の実施例１，２によるディスクの場合には、Ｃ
Ｓ Ｓ ２００００回においても再生出力の低下は認め
られなかった。これに対し、比較例Ｉ、２では当初再生
出力の低下は認められないものの、ｃ ｓ ５ｓｏｏｏ
回前後から次第に再生出力が低下し始め、比較例１．２
共にＣＳ Ｓ ２００００回では初期の５０％になった
。In the case of the disks according to embodiments 1 and 2 of this invention, C
No decrease in reproduction output was observed even after 20,000 SS cycles. On the other hand, in Comparative Examples I and 2, although no decrease in playback output was observed at the beginning, cs 5sooo
The playback output gradually started to decrease around the time, and Comparative Example 1.2
Both were 50% of the initial value after 20,000 CSs.
ＣＳ ５５０００回を行った磁気ディスクの表面粗さを
触針式表面粗さ計で測定した。第４図は実施例１による
磁気ディスクの表面粗さを示す特性図、第５図は実施例
２による磁気ディスクの表面粗さを示す特性図、第６図
は比較例１による磁気ディスクの表面粗さを示す特性図
、第７図は比較例２による磁気ディスクの表面粗さを示
す特性図である。図中の（５）は磁気ヘッドがコンタク
ト・スタート・ストップにより磁気ディスクに接触した
領域を表す。周辺の粗さとの比較から実施例１．２によ
る磁気ディスクでは初期の表面粗さを保っていることが
分かる。これに対して、比較例１．２による磁気ディス
クでは微小突起部に相当する部分が削り取られているこ
とが分かる。酸化イツトリウムの添加量により耐久性に
違いが出たことが明白である。The surface roughness of the magnetic disk subjected to CS 55,000 times was measured using a stylus type surface roughness meter. FIG. 4 is a characteristic diagram showing the surface roughness of the magnetic disk according to Example 1, FIG. 5 is a characteristic diagram showing the surface roughness of the magnetic disk according to Example 2, and FIG. 6 is a characteristic diagram showing the surface roughness of the magnetic disk according to Comparative Example 1. FIG. 7 is a characteristic diagram showing the surface roughness of the magnetic disk according to Comparative Example 2. (5) in the figure represents the area where the magnetic head contacts the magnetic disk by contact start/stop. A comparison with the roughness of the surrounding area shows that the magnetic disk according to Example 1.2 maintains the initial surface roughness. On the other hand, it can be seen that in the magnetic disk according to Comparative Example 1.2, the portions corresponding to the minute protrusions are shaved off. It is clear that there was a difference in durability depending on the amount of yttrium oxide added.
また、このｃ ｓ ｓ ５ｏｏｏ回を行った磁気ディス
ク表面にヘッドを接触させ６０℃、８５％の状態で８時
間数１し、静摩擦係数を測定した。実施例１による磁気
ディスクでは０．２２、実施例２による磁気ディスクで
は０．２４、比較例１．２による磁気ディスクでは０．
９を越えており吸着現象が認められた。Further, a head was brought into contact with the surface of the magnetic disk which had been subjected to this css 5ooo times for several hours at 60° C. and 85%, and the coefficient of static friction was measured. 0.22 for the magnetic disk according to Example 1, 0.24 for the magnetic disk according to Example 2, and 0.24 for the magnetic disk according to Comparative Example 1.2.
It exceeded 9, and an adsorption phenomenon was observed.
第８図に酸化ジルコニウムの硬度と酸化インドリウムと
添加量の関係を示す。ビッカース硬度にして１５００程
度のＡＩｚＯ＊／ＴｉＣ等を材料とする薄膜ヘッドに対
する保護膜としては、高い硬度を実現するため酸化イツ
トリウムが６〜１５ｍｏ１％の範囲がいいことが分かる
。FIG. 8 shows the relationship between the hardness of zirconium oxide and the amount of indium oxide added. As a protective film for a thin film head made of AIzO*/TiC or the like having a Vickers hardness of about 1500, it is found that yttrium oxide should preferably be in the range of 6 to 15 mo1% in order to achieve high hardness.
なお、酸化ジルコニウムの膜厚は１００Å以下では均一
な膜にはなっておらず、１０００Å以上では磁気ヘッド
と磁気ディスクの磁気記録媒体層までの距離が広がり再
生出力が低下するという悪影響が出てくる。このため、
酸化ジルコニウム膜は１００〜１０００人が適している
。成膜のしやすさ、均一性、再生出力からは３００〜８
００人が望ましい。Note that if the thickness of the zirconium oxide film is less than 100 Å, it will not be a uniform film, and if it is more than 1000 Å, the distance between the magnetic head and the magnetic recording medium layer of the magnetic disk will increase, resulting in an adverse effect of reducing the reproduction output. . For this reason,
Zirconium oxide membrane is suitable for 100 to 1000 people. 300-8 in terms of ease of film formation, uniformity, and playback output
00 people is desirable.
また、酸化ジルコニウムの添加成分として、酸化アルミ
ニウム、酸化セリウム、炭化ンリコン、炭化チタンなど
が考えられるが、靭性の高い酸化ジルコニウムの膜を実
現するには酸化イツトリウムの添加が必須である。In addition, aluminum oxide, cerium oxide, silicon carbide, titanium carbide, etc. can be considered as additive components of zirconium oxide, but addition of yttrium oxide is essential to realize a zirconium oxide film with high toughness.
また、基材の表面粗さはＲｍａｘ１００Å以下では吸着
が必ず発生し、１０００Å以上では突起が浮上中の磁気
ヘッドに衝突するなど磁気へノドの浮上特性に悪影響を
与えるため好ましくない。静摩擦力を再現性よく小さく
安定させるためには、Ｒｍａｘ４００〜８００人が望ま
しい。Further, if the surface roughness of the base material is Rmax less than 100 Å, adhesion will inevitably occur, and if it is more than 1000 Å, the protrusions will collide with the flying magnetic head, which will adversely affect the flying characteristics of the magnetic nod, which is not preferable. In order to keep the static frictional force small and stable with good reproducibility, Rmax is preferably 400 to 800 people.
上記実施例では磁気記録媒体層（３）がγ−Ｆ ａ、
Ｏ。In the above embodiment, the magnetic recording medium layer (3) has γ-Fa,
O.
の場合について説明したが、他のＣｒ Ｏｔのような金
属酸化物媒体であってもよく上記実施例と同様の効果を
奏する。Although the above case has been described, other metal oxide media such as CrOt may also be used and the same effects as in the above embodiments can be obtained.
また、−Ｆ記実施例では磁気記録媒体層（３）がＣ０Ｎ
ｉ−Ｃｒの場合について説明したが、他のＣ０Ｎｉ、Ｃ
ｏ−Ｃｒ、Ｆｅなどの合金媒体、金属媒体であってもよ
く上記実施例と同様の効果を奏する。Moreover, in the embodiment described in -F, the magnetic recording medium layer (3) is C0N.
Although the case of i-Cr has been explained, other C0Ni, C
An alloy medium such as o-Cr or Fe, or a metal medium may be used, and the same effects as in the above embodiments can be obtained.
また、上記実施例では下地層（２）としてＮ１−Ｐメツ
キ膜、Ｎ１−Ｃｕ−Ｐメツキ膜の場合について説明した
が、他のアルマイト膜などあってもよく上記実施例と同
様の効果を奏する。In addition, in the above embodiment, the case where an N1-P plating film and a N1-Cu-P plating film were used as the base layer (2) was explained, but other alumite films etc. may also be used and the same effect as in the above embodiment can be achieved. .
また、上記実施例では下地層（２）に凹凸をつけて所定
の表面粗さを得るようにしたが、保護膜（４）に凹凸処
理を施すようにしてもよい。また、上記実施例では薄膜
ヘッドのビッカース硬度は１５００程度のものを示した
が、１４００〜１５５０の範囲のものでも同様の効果が
ある。Further, in the above embodiment, the base layer (2) is made uneven to obtain a predetermined surface roughness, but the protective film (4) may be subjected to an uneven treatment. Further, in the above embodiment, the Vickers hardness of the thin film head was about 1,500, but a Vickers hardness in the range of 1,400 to 1,550 has the same effect.
さらに、上記実施例では保護膜（４）として、酸化イツ
トリウムが６〜１５ ｍ ｏｆ％含有する酸化ジルコニ
ウムを示したが、酸化インドリウムの含有量は、酸化ジ
ルコニウムが成膜できる範囲において、これ以上のｍｏ
１％であっても、上記薄膜ヘッドと同じ程度の硬度を示
し、上記実施例と同様の効果を示す。Furthermore, in the above example, zirconium oxide containing 6 to 15 m of yttrium oxide was used as the protective film (4), but the content of indium oxide may be greater than this within the range in which zirconium oxide can be formed into a film. mo of
Even if it is 1%, it shows the same hardness as the thin film head described above, and exhibits the same effect as the example described above.
以上のように、この発明によればビッカース硬度が１４
００〜１５５０の薄膜ヘッドに対し、磁気記録媒体層の
保護膜として、酸化インドリウムを６ｍｏ１％以上含有
する１００〜１０００人厚さの酸化ジルコニウム膜を用
いたので、ヘッドに対応する高い硬度と靭性に冨む保護
膜が形成でき、磁気ディスクと磁気ヘノトスライタ間の
摩擦力、吸着力が小さく、十分に耐久性及び信較性の高
い磁気ディスク装置が得られる効果がある。As described above, according to the present invention, the Vickers hardness is 14
For the 00 to 1550 thin film head, a 100 to 1000 mm thick zirconium oxide film containing 6 mo1% or more of indium oxide was used as the protective film for the magnetic recording medium layer, so it has high hardness and toughness corresponding to the head. The present invention has the effect that a protective film with a high degree of corrosion resistance can be formed, the frictional force and attraction force between the magnetic disk and the magnetic henoto writer are small, and a magnetic disk device with sufficiently high durability and reliability can be obtained.
第１図はこの発明の一実施例に係る磁気ディスクを示す
断面図、第２図は表面粗さ計による初期の表面粗さを示
す特性図、第３図はこの発明の実施例に係る磁気ディス
クと、従来の磁気ディスクそれぞれに加速試験を行った
結果を示し、Ｃ８Ｓ回数と再生出力の関係を示す特性図
、第４図、第５図及び第６図、第７図は各々ＣＳ ５５
０００回を行ったこの発明の実施例に係る磁気ディスク
及び従来の磁気ディスクの表面粗さ計による表面粗さを
示す特性図、第８図は酸化ジルコニウムの硬度を表す特
性図、並びに第９図は従来の薄膜磁気ディスクを示す断
面図である。
（１）・・・Ａ ｌ−Ｍｇ合金基板、（２）・・・下地
層、（３）・・・磁気記録媒体層、（４）・・・保護膜
なお、図中、同一符号は同−又は相当部分を示す。FIG. 1 is a sectional view showing a magnetic disk according to an embodiment of the present invention, FIG. 2 is a characteristic diagram showing initial surface roughness measured by a surface roughness meter, and FIG. 3 is a magnetic disk according to an embodiment of the present invention. Figures 4, 5, 6, and 7 show the results of acceleration tests on the disk and conventional magnetic disks, and show the relationship between the number of C8S and the playback output, respectively.
8 is a characteristic diagram showing the hardness of zirconium oxide, and FIG. 1 is a sectional view showing a conventional thin film magnetic disk. (1)... Al-Mg alloy substrate, (2)... Underlayer, (3)... Magnetic recording medium layer, (4)... Protective film. - or a corresponding portion.
Claims (1)
上に設けられ、酸化イットリウム６ｍｏｌ％以上含有す
る１００〜１０００Å厚さの酸化ジルコニウム膜よりな
る保護膜、及び上記磁気記録媒体に情報を記録または記
録された情報を再生する、ビッカース硬度が１４００〜
１５５０の薄膜ヘッドを備えた磁気ディスク装置。A magnetic recording medium layer provided on the substrate, a protective film made of a zirconium oxide film having a thickness of 100 to 1000 Å and containing 6 mol% or more of yttrium oxide, and recording information on the magnetic recording medium. Or reproduce recorded information, Vickers hardness is 1400~
A magnetic disk drive equipped with a 1550 thin film head.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23604588A JPH0283802A (en) | 1988-09-20 | 1988-09-20 | Magnetic disk device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23604588A JPH0283802A (en) | 1988-09-20 | 1988-09-20 | Magnetic disk device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0283802A true JPH0283802A (en) | 1990-03-23 |
Family
ID=16994942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23604588A Pending JPH0283802A (en) | 1988-09-20 | 1988-09-20 | Magnetic disk device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0283802A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6366722A (en) * | 1986-04-03 | 1988-03-25 | コ−マグ，インコ−ポレイテツド | Corrosion and wear resistant magnetic disc |
| JPS6398816A (en) * | 1986-10-14 | 1988-04-30 | Hitachi Metals Ltd | Substrate for thin film magnetic head and its production |
-
1988
- 1988-09-20 JP JP23604588A patent/JPH0283802A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6366722A (en) * | 1986-04-03 | 1988-03-25 | コ−マグ，インコ−ポレイテツド | Corrosion and wear resistant magnetic disc |
| JPS6398816A (en) * | 1986-10-14 | 1988-04-30 | Hitachi Metals Ltd | Substrate for thin film magnetic head and its production |
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