JPH0277700U - - Google Patents

Info

Publication number
JPH0277700U
JPH0277700U JP15708788U JP15708788U JPH0277700U JP H0277700 U JPH0277700 U JP H0277700U JP 15708788 U JP15708788 U JP 15708788U JP 15708788 U JP15708788 U JP 15708788U JP H0277700 U JPH0277700 U JP H0277700U
Authority
JP
Japan
Prior art keywords
chamber
pressure vessel
tritium
gas
chambers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15708788U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15708788U priority Critical patent/JPH0277700U/ja
Publication of JPH0277700U publication Critical patent/JPH0277700U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案に係る装置の一実施例を示すブ
ロツクダイアグラムである。第２図は本考案の耐
圧容器に管継手を利用した場合の部分拡大断面図
である。 １：チタン蒸着層を有する基板、２：耐圧容器
、３：ヒータ、４：トリチウム供給源、５：計量
タンク、６：不活性ガス供給源、７：真空ポンプ
、８：トリチウムゲツター、９：制御手段、２１
：チタン蒸着層、２２……基板。 FIG. 1 is a block diagram showing one embodiment of the device according to the present invention. FIG. 2 is a partially enlarged sectional view of the pressure vessel of the present invention in which a pipe joint is used. DESCRIPTION OF SYMBOLS 1: Substrate having a titanium vapor deposited layer, 2: Pressure resistant container, 3: Heater, 4: Tritium supply source, 5: Measuring tank, 6: Inert gas supply source, 7: Vacuum pump, 8: Tritium getter, 9: control means, 21
: Titanium vapor deposited layer, 22...Substrate.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] (a)チタン蒸着層を有する銅板又は銅基合金板
を挿設することで２室に区画される耐圧容器と、
(b)その耐圧容器に接続され、容器内のガスを排
気するための真空ポンプと、(c)耐圧容器の一方
の室に接続され、その室にトリチウムガスを供給
するためのトリチウムガス供給源と、(d)耐圧容
器の他方の室に接続され、その室に不活性ガスを
供給するための不活性ガス供給源と、(e)耐圧容
器内の２室を実質的に等しい圧力に保持するため
の制御手段を備えていることを特徴とする加速器
用トリチウムターゲツト製造装置。 (a) A pressure-resistant container that is divided into two chambers by inserting a copper plate or copper-based alloy plate having a titanium vapor-deposited layer;
(b) a vacuum pump connected to the pressure vessel to exhaust the gas in the vessel; and (c) a tritium gas supply source connected to one chamber of the pressure vessel to supply tritium gas to that chamber. (d) an inert gas source connected to the other chamber of the pressure vessel for supplying an inert gas to that chamber; and (e) maintaining the two chambers within the pressure vessel at substantially equal pressures. A tritium target production device for an accelerator, characterized in that it is equipped with a control means for controlling the tritium target.
JP15708788U 1988-11-30 1988-11-30 Pending JPH0277700U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15708788U JPH0277700U (en) 1988-11-30 1988-11-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15708788U JPH0277700U (en) 1988-11-30 1988-11-30

Publications (1)

Publication Number Publication Date
JPH0277700U true JPH0277700U (en) 1990-06-14

Family

ID=31436221

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15708788U Pending JPH0277700U (en) 1988-11-30 1988-11-30

Country Status (1)

Country Link
JP (1) JPH0277700U (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004061865A1 (en) * 2002-12-27 2004-07-22 Hamamatsu Photonics K.K. Target for generating deuteron and target apparatus for generating deuteron comprising the same
KR101041177B1 (en) * 2009-08-11 2011-06-13 한국전력공사 A manufacturing apparatus and method with surface cleaning process to make thin film tritium source for tritium batteries
KR101049346B1 (en) * 2009-06-18 2011-07-13 한국전력공사 Tritium Weighing Dispenser
KR101069510B1 (en) * 2009-08-11 2011-09-30 한국전력공사 A manufacturing apparatus and method preventing oxidation of tritium source for the production of solid tritium source for tritium batteries

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004061865A1 (en) * 2002-12-27 2004-07-22 Hamamatsu Photonics K.K. Target for generating deuteron and target apparatus for generating deuteron comprising the same
JP2004212181A (en) * 2002-12-27 2004-07-29 Hamamatsu Photonics Kk Target and target device for generating deuteron
KR101049346B1 (en) * 2009-06-18 2011-07-13 한국전력공사 Tritium Weighing Dispenser
KR101041177B1 (en) * 2009-08-11 2011-06-13 한국전력공사 A manufacturing apparatus and method with surface cleaning process to make thin film tritium source for tritium batteries
KR101069510B1 (en) * 2009-08-11 2011-09-30 한국전력공사 A manufacturing apparatus and method preventing oxidation of tritium source for the production of solid tritium source for tritium batteries

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