JPH027453B2 - - Google Patents
Info
- Publication number
- JPH027453B2 JPH027453B2 JP57063960A JP6396082A JPH027453B2 JP H027453 B2 JPH027453 B2 JP H027453B2 JP 57063960 A JP57063960 A JP 57063960A JP 6396082 A JP6396082 A JP 6396082A JP H027453 B2 JPH027453 B2 JP H027453B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- resin layer
- image carrier
- support
- halftone image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011347 resin Substances 0.000 claims description 72
- 229920005989 resin Polymers 0.000 claims description 72
- 238000007639 printing Methods 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 19
- 230000005855 radiation Effects 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 239000003302 ferromagnetic material Substances 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 43
- 239000000463 material Substances 0.000 description 10
- -1 for example Substances 0.000 description 5
- 230000005291 magnetic effect Effects 0.000 description 5
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- VAYOSLLFUXYJDT-RDTXWAMCSA-N Lysergic acid diethylamide Chemical compound C1=CC(C=2[C@H](N(C)C[C@@H](C=2)C(=O)N(CC)CC)C2)=C3C2=CNC3=C1 VAYOSLLFUXYJDT-RDTXWAMCSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 229940081735 acetylcellulose Drugs 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57063960A JPS58181046A (ja) | 1982-04-19 | 1982-04-19 | 印刷版の製造方法 |
| AU13282/83A AU558858B2 (en) | 1982-04-19 | 1983-04-08 | Printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57063960A JPS58181046A (ja) | 1982-04-19 | 1982-04-19 | 印刷版の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58181046A JPS58181046A (ja) | 1983-10-22 |
| JPH027453B2 true JPH027453B2 (enrdf_load_stackoverflow) | 1990-02-19 |
Family
ID=13244381
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57063960A Granted JPS58181046A (ja) | 1982-04-19 | 1982-04-19 | 印刷版の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS58181046A (enrdf_load_stackoverflow) |
| AU (1) | AU558858B2 (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04316912A (ja) * | 1991-04-17 | 1992-11-09 | Chiyoufu Seisakusho:Kk | ガス給湯器の送風機制御方法 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2886254B2 (ja) * | 1990-04-25 | 1999-04-26 | 旭化成工業株式会社 | 感光性樹脂版の製造方法及びそれに用いる製版装置 |
| JP2001093816A (ja) * | 1999-09-24 | 2001-04-06 | Clariant (Japan) Kk | ドライエッチング耐性の向上したレジストパターンを形成する方法 |
| EP3435156A1 (de) * | 2017-07-26 | 2019-01-30 | Covestro Deutschland AG | Schutzschicht für photopolymer |
-
1982
- 1982-04-19 JP JP57063960A patent/JPS58181046A/ja active Granted
-
1983
- 1983-04-08 AU AU13282/83A patent/AU558858B2/en not_active Ceased
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04316912A (ja) * | 1991-04-17 | 1992-11-09 | Chiyoufu Seisakusho:Kk | ガス給湯器の送風機制御方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| AU558858B2 (en) | 1987-02-12 |
| JPS58181046A (ja) | 1983-10-22 |
| AU1328283A (en) | 1983-10-27 |
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