JPH0274363U - - Google Patents

Info

Publication number
JPH0274363U
JPH0274363U JP15060288U JP15060288U JPH0274363U JP H0274363 U JPH0274363 U JP H0274363U JP 15060288 U JP15060288 U JP 15060288U JP 15060288 U JP15060288 U JP 15060288U JP H0274363 U JPH0274363 U JP H0274363U
Authority
JP
Japan
Prior art keywords
substrate holder
rotating substrate
sputtering apparatus
vacuum chamber
processing container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15060288U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15060288U priority Critical patent/JPH0274363U/ja
Publication of JPH0274363U publication Critical patent/JPH0274363U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図は、本考案の一実施例を示すスパツタ装
置の構成図、第２図は、従来のスパツタ装置の構
成図である。 尚、図中１は真空室、２は回転基板ホルダー、
３は基板、４はターゲツト、５は排気系、６はス
パツタ用ガス導入系、８はガス処理容器、９は排
気系、１０はフレキシブルチユーブ、１１は処理
ガス導入系。 FIG. 1 is a block diagram of a sputtering apparatus showing an embodiment of the present invention, and FIG. 2 is a block diagram of a conventional sputtering apparatus. In the figure, 1 is a vacuum chamber, 2 is a rotating substrate holder,
3 is a substrate, 4 is a target, 5 is an exhaust system, 6 is a sputtering gas introduction system, 8 is a gas processing container, 9 is an exhaust system, 10 is a flexible tube, and 11 is a processing gas introduction system.

Claims (1)

【実用新案登録請求の範囲】 真空室内に回転基板ホルダー及びターゲツトを
設けるとともに排気系及びガス導入系を備えてな
るスパツタ装置において、 前記排気系及びガス導入系とは独立した排気系
及びガス導入系を備えるとともに、 前記回転基板ホルダーに保持された基板を覆つ
て密閉するガス処理容器を、前記回転基板ホルダ
ーと対向させて前記真空室内に上下動可能に設け
たことを特徴とするスパツタ装置。[Scope of Claim for Utility Model Registration] A sputtering apparatus comprising a rotating substrate holder and a target in a vacuum chamber, as well as an exhaust system and a gas introduction system, which are independent of the exhaust system and gas introduction system. What is claimed is: 1. A sputtering apparatus comprising: a gas processing container that covers and seals a substrate held by the rotating substrate holder; and a gas processing container that faces the rotating substrate holder and is movable up and down in the vacuum chamber.
JP15060288U 1988-11-18 1988-11-18 Pending JPH0274363U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15060288U JPH0274363U (en) 1988-11-18 1988-11-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15060288U JPH0274363U (en) 1988-11-18 1988-11-18

Publications (1)

Publication Number Publication Date
JPH0274363U true JPH0274363U (en) 1990-06-06

Family

ID=31423895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15060288U Pending JPH0274363U (en) 1988-11-18 1988-11-18

Country Status (1)

Country Link
JP (1) JPH0274363U (en)

Similar Documents

Publication Publication Date Title
AU463161B2 (en) Exhaust gas recirculation control valve assemblies
CA987559A (en) Exhaust gas recirculation flow control system
CA984248A (en) Engine spark control and exhaust gas recirculation vacuum signal selector
CA1017527A (en) Method and system for humidifying a portable gas sterilizer
CA968952A (en) Purge gas admission control for flare system
JPS53131319A (en) Exhaust brake arrangement
JPH0274363U (en)
CA972642A (en) Exhaust gas recirculation control valve
CA1019587A (en) Vapor saving amblent air intake system for a dry cleaner
AU1697576A (en) Engine exhaust port liner
JPS63127125U (en)
JPH0338358U (en)
SU687292A1 (en) Gas portioning valve
JPH0411460U (en)
IT7922616A0 (en) PRESSURE REDUCING VALVE FOR HIGH PRESSURE GAS CYLINDERS.
JPH0351834U (en)
JPS5379121A (en) Egr device
JPS5216012A (en) Vacuum system
JPH0214359U (en)
JPH0437260U (en)
JPS6258853U (en)
JPS61167934U (en)
JPH0374665U (en)
JPS6436955U (en)
JPS6331369U (en)