JPH0272700A - Composition of paste for forming insulating layer - Google Patents

Composition of paste for forming insulating layer

Info

Publication number
JPH0272700A
JPH0272700A JP22346188A JP22346188A JPH0272700A JP H0272700 A JPH0272700 A JP H0272700A JP 22346188 A JP22346188 A JP 22346188A JP 22346188 A JP22346188 A JP 22346188A JP H0272700 A JPH0272700 A JP H0272700A
Authority
JP
Japan
Prior art keywords
epoxy
resin
insulating layer
thermosetting resin
fluororesin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22346188A
Other languages
Japanese (ja)
Other versions
JPH0719951B2 (en
Inventor
Hisakazu Nakamura
久和 中村
Masahiro Takeuchi
正浩 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP22346188A priority Critical patent/JPH0719951B2/en
Publication of JPH0272700A publication Critical patent/JPH0272700A/en
Publication of JPH0719951B2 publication Critical patent/JPH0719951B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Epoxy Resins (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Organic Insulating Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To improve adhesive property and heat resistance with low permittivity property being maintained by using epoxy denatured polybutadiene, mixing epoxy resin, and adding fluororesin powder. CONSTITUTION:The main components of thermosetting resin vanish are epoxy denatured polybutadiene, epoxy resin, carboxylic acid anhydride and radical polymerization starting agent. Plasma treated fluororesin powder of 10-200 weight parts is added into the unhardened resin mixture of said thermosetting resin vanish of 100 weight parts. It is desirable that the maximum grain size of the fluororesin powder is 50mum or less. The thermosetting resin and the fluororesin are mixed the solid material. For the solid material, the adding quantity of silane coupling agent incorporating epoxy group of 20-100mol PPM is desirable. It is important that any added material is uniformly dispersed in the paste. In this constitution, permittivity is low, and adhesive property, heat resistance, moisture resistance, water resistance and the like are made excellent.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、誘電率(以下εと略す)が低く、回路基板及
び多層回路基板中の接着剤層・厚さ調整層・オーバーレ
イ層等に用いる絶縁層形成用ペースト組成物に関する。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention has a low dielectric constant (hereinafter abbreviated as ε) and is suitable for adhesive layers, thickness adjustment layers, overlay layers, etc. in circuit boards and multilayer circuit boards. The present invention relates to a paste composition for forming an insulating layer to be used.

〔従来技術〕[Prior art]

近年、エレクトロニクス分野でプラスチック絶縁層は導
体層と組み合わせて回路基板等極めて広範囲の用途に使
用され、要求特性も多岐にわたっている。これらのうち
、信号の伝播速度を高速化することを目的として、εの
低い絶縁層の開発が必要とされ、特に最近はεが3以下
であることが要求されている。絶縁層を形成する方法と
して熱硬化性樹脂ペースト組成物から絶縁層を形成する
方法が従来からあったが、絶縁層のεは樹脂そのものの
有するεが大きく影響し、従来の熱硬化性樹脂を用いた
場合εを低くすることはできない。
In recent years, in the field of electronics, plastic insulating layers have been used in combination with conductor layers for an extremely wide range of applications such as circuit boards, and the required properties have also been wide-ranging. Among these, for the purpose of increasing the signal propagation speed, it is necessary to develop an insulating layer with a low ε, and in particular, recently, ε is required to be 3 or less. Conventionally, there has been a method of forming an insulating layer from a thermosetting resin paste composition, but the ε of the insulating layer is greatly influenced by the ε of the resin itself, making it difficult to use conventional thermosetting resins. If used, ε cannot be lowered.

εの低いプラスチック絶縁層を形成する手段としては、
フン素樹脂、ポリエチレン樹脂、ポリブタジェン樹脂、
ポリスルホン樹脂等εの低い熱可塑性樹脂をフィルム状
として使用する方法が検討されている。しかしこのよう
な絶縁層多層成形性、寸法変化、ドリル加工性、耐熱性
等が劣り、回路基板そのものとして信頼性の高いものが
得られていなかった。
As a means of forming a plastic insulating layer with low ε,
Fluorine resin, polyethylene resin, polybutadiene resin,
A method of using a thermoplastic resin with a low ε such as polysulfone resin in the form of a film is being considered. However, such insulating layer multilayer moldability, dimensional change, drilling workability, heat resistance, etc. are inferior, and a highly reliable circuit board itself has not been obtained.

(発明が解決しようとする課題〕 本発明は、εが3以下の低εであり、他の層との密着性
・耐熱性・耐湿性水性等に優れ信頼性を有する絶縁層を
形成でき、かつ回路基板に加工することが可能なベース
+−m酸物を提供することを課題とする。
(Problems to be Solved by the Invention) The present invention has a low ε of 3 or less, and can form a reliable insulating layer with excellent adhesion to other layers, heat resistance, moisture resistance, water resistance, etc. It is an object of the present invention to provide a base+-m acid that can be processed into a circuit board.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は、エポキシ変性ポリブタジェンと、エポキシ樹
脂と、カルボン酸、無水物とラジカル重合開始剤とを主
成分とする熱硬化性樹脂ワニスにこの樹脂成分100重
量部に対して最大粒子径が50μm以下でありプラズマ
表面処理を行ったフッ素樹脂粉末を10〜200重量部
添加し、該熱硬化性樹脂と該フッ素樹脂を合わせた固形
分に対して20〜100モルPPMのエポキシ基台存シ
ランカップリング剤を添加して混合することにより得ら
れる。絶縁層形成用ペースト組成物に関する。
The present invention provides a thermosetting resin varnish containing epoxy-modified polybutadiene, an epoxy resin, a carboxylic acid, an anhydride, and a radical polymerization initiator as main components, with a maximum particle size of 50 μm or less based on 100 parts by weight of the resin component. Adding 10 to 200 parts by weight of fluororesin powder that has been subjected to plasma surface treatment, and 20 to 100 mol PPM of epoxy-based silane coupling based on the solid content of the thermosetting resin and the fluororesin. It is obtained by adding and mixing the agent. The present invention relates to a paste composition for forming an insulating layer.

エポキシ変性ポリブタジェンは、ポリブタジェンの主鎖
及び末端にエポキシ基を付与したいずれであってもよく
、エポキシ樹脂は、ビスフェノールAタイプ、脂環式タ
イプなどの汎用エポキシ樹脂やテトラブロモビスフェノ
ールAタイプ、ジブロモビスフェノールAタイプなどの
難燃化エポキシ樹脂があげられる。
The epoxy-modified polybutadiene may be polybutadiene with an epoxy group added to the main chain or end. The epoxy resin may be general-purpose epoxy resins such as bisphenol A type, alicyclic type, tetrabromobisphenol A type, or dibromobisphenol. Examples include flame-retardant epoxy resins such as A type.

カルボン酸無水物は、クロレンド酸無水物、メチルブテ
ニルテトラヒドロ無水フタル酸、アルケニルコハク酸無
水物、5−(2,5−ジオキソテトラヒドロフリル)−
3メチル3シクロヘキセン−L2ジカルボン酸無水物な
どがあげられ、ラジカル重合開始剤としては、ジクシル
バーオキサイド、t−ブチルパーベンゾエート、t−ブ
チルパーオキシラウレート、ヘントイルバーオキサイド
等の有機過酸化物があげられる。これらをワニスとする
ためにジメチルホルムアミド、メチルイソブチルケトン
、メチルセロソルブ等の有機溶媒を一種または2種以上
使用する。
Carboxylic anhydrides include chlorendic anhydride, methylbutenyltetrahydrophthalic anhydride, alkenylsuccinic anhydride, 5-(2,5-dioxotetrahydrofuryl)-
Examples of radical polymerization initiators include organic peroxides such as dixyl silver oxide, t-butyl perbenzoate, t-butyl peroxylaurate, and hentyl peroxide. can be given. To make these into varnishes, one or more organic solvents such as dimethylformamide, methyl isobutyl ketone, and methyl cellosolve are used.

本発明に用いるフッ素樹脂粉末としては、4フフ化エチ
レン樹脂、4フッ化エチレン−6フツ化プロピレン共重
合体樹脂、47フ化エチレン・パーフルオロアルキルビ
ニルエーテル共重合体樹脂の粉末等がありこれらをプラ
ズマ処理したものを用いる。
Examples of the fluororesin powder used in the present invention include powders of 4-fluorinated ethylene resin, 4-fluorinated ethylene-hexafluorinated propylene copolymer resin, and 47-fluorinated ethylene/perfluoroalkyl vinyl ether copolymer resin. Use one that has been plasma treated.

プラズマ処理の方法としては、電極と反応器の位置関係
から外部電極・内部電極の方法があり、電力の供給形式
では容量結合・誘導結合・導波管を用いる方法があり、
電源周波数では直流からGH2帯までの範囲があり、い
ずれの方法でも可能である。反応器内に仕込んだ粉末全
体を一様にプラズマ処理するために、処理中粉末が反応
器内で攪拌していることが必要である。
Plasma processing methods include methods using external electrodes and internal electrodes depending on the positional relationship between the electrodes and the reactor, and methods for supplying power using capacitive coupling, inductive coupling, and waveguides.
The power supply frequency ranges from DC to GH2 band, and any method is possible. In order to uniformly plasma-treat the entire powder charged in the reactor, it is necessary that the powder be stirred in the reactor during treatment.

本発明のペーストを用いて作製した絶縁層を含む回路基
板をドリル加工したときスルホールの内壁の粗さの点で
フッ素樹脂粉末の最大粒子径は50μm以下が好ましく
、更には20μm以下が望ましい。
In view of the roughness of the inner wall of through-holes when a circuit board containing an insulating layer prepared using the paste of the present invention is drilled, the maximum particle size of the fluororesin powder is preferably 50 μm or less, more preferably 20 μm or less.

フッ素樹脂粉末の粒子径が大きいとスルホール時の該絶
縁層の内壁粗さが大きくなる。スルホールの内壁粗さが
大きいと耐薬品性、耐メツキ性更に電気特性に悪影響を
及ぼす。
If the particle size of the fluororesin powder is large, the inner wall roughness of the insulating layer during through-hole formation becomes large. If the inner wall roughness of the through hole is large, it will adversely affect chemical resistance, plating resistance, and electrical properties.

プラズマ処理済フッ素樹脂粉末を樹脂ワニス中に添加す
る際の組成としては、未硬化樹脂混合物100重量部に
対してプラズマ処理済フッ素樹脂粉末は10〜200重
量部である。
The composition when adding the plasma-treated fluororesin powder to the resin varnish is 10 to 200 parts by weight of the plasma-treated fluororesin powder per 100 parts by weight of the uncured resin mixture.

10重量部以下では低ε化の効果が薄く、200重量部
以上では結合材としての熱硬化性樹脂の機能が低下し、
強度・外観等が悪(なる。特に50〜180重量部が好
ましい。
If it is less than 10 parts by weight, the effect of lowering ε will be weak, and if it is more than 200 parts by weight, the function of the thermosetting resin as a binder will decrease.
Strength, appearance, etc. become poor (50 to 180 parts by weight is particularly preferred).

フッ素樹脂粉末を樹脂の混合物からなるワニス中に均一
分散させることが重要である。
It is important to uniformly disperse the fluororesin powder in the varnish made of the resin mixture.

エポキシ基台をシランカップリング剤としては、T−グ
リシドキシプロピルトリメトキシシラン、Tグリシドキ
シプロピルメチルジメトキシシラン等があり、該熱硬化
性樹脂と該フッ素樹脂を合わせた固形分に対して20〜
100モルPPMの添加量が望ましい。
Examples of silane coupling agents for the epoxy base include T-glycidoxypropyltrimethoxysilane, T-glycidoxypropylmethyldimethoxysilane, etc., based on the combined solid content of the thermosetting resin and the fluororesin. 20~
A desirable addition amount is 100 mol PPM.

20モルPPM以下では、接着効果が薄く、100モル
PPM以上では電気性能が悪化する。該シランカップリ
ング剤の添加もペースト中に均一分散させることが重要
である。添加順序は、熱硬化性樹脂ワニスの調整時にワ
ニス中に添加しても、フッ素樹脂粉末添加時に同時に添
加しても何れでも良い。
If the amount is less than 20 mol PPM, the adhesive effect will be weak, and if it is more than 100 mol PPM, the electrical performance will deteriorate. It is also important to uniformly disperse the silane coupling agent in the paste. The addition order may be either added into the varnish when preparing the thermosetting resin varnish or added at the same time as the fluororesin powder is added.

得られたペーストの塗布方法としては、ロールコータ−
・バーコータースクリーン印刷等の方法があり、その後
大気圧または真空中で加熱のみまたは加熱加圧して樹脂
を硬化させ、絶縁層を形成する。
The method for applying the obtained paste is a roll coater.
- There are methods such as bar coater screen printing, and then the resin is cured by heating alone or by heating and pressurizing at atmospheric pressure or vacuum to form an insulating layer.

〔作用〕[Effect]

ポリブタジェンは低εであるが着色性・耐熱性が劣って
いる。この主鎖及び末端にエポキシ基を付与したエポキ
シ変性ポリブタジェンを使用すること、及びエポキシ樹
脂を混合することにより、低εの性質は保持しつつ接着
性、耐熱性が改良される。エポキシ樹脂は臭素化物を用
いて難燃化でき、フッ素樹脂粉末を添加することにより
低ε化は一層促進され、eを3以下にすることができる
Although polybutadiene has a low ε, it has poor colorability and heat resistance. By using this epoxy-modified polybutadiene with epoxy groups added to its main chain and terminals, and by mixing an epoxy resin, adhesiveness and heat resistance can be improved while maintaining low ε properties. The epoxy resin can be made flame retardant using a bromide, and by adding fluororesin powder, the reduction in ε is further promoted, and e can be made 3 or less.

フッ素樹脂は無極性なのでこれを添加することによりペ
ーストは接着性が低下する。この低下を抑えるためフッ
素樹脂粉末をプラズマ処理し表面を活性化してお(。
Since fluororesin is non-polar, adding it reduces the adhesiveness of the paste. In order to suppress this degradation, the fluororesin powder is treated with plasma to activate its surface (.

エポキシ基含有シランカップリング剤は、ペースト−銅
箔、フッ素樹脂−熱硬化性樹脂間の接着性を改善するこ
とが出来る。
The epoxy group-containing silane coupling agent can improve the adhesiveness between paste and copper foil and between fluororesin and thermosetting resin.

〔実施例〕〔Example〕

実施例1 1.2結合が90%、エポキシ当量550のエポキシ変
性ポリブタジェン、臭素化ビスフェノールA型エポキシ
樹脂、5−(2,5〜ジオキソテトラフリル)−3−メ
チル3−シクロヘキセン−1,2−ジカルボン酸無水物
、ジクミルパーオキサイドを第1表に示される組成でメ
チルイソブチルケトンとジメチルホルムアミドに混合溶
解して樹脂含有量58.3重量%のワニスを調整した。
Example 1 Epoxy-modified polybutadiene with 90% 1.2 bonds and epoxy equivalent weight 550, brominated bisphenol A type epoxy resin, 5-(2,5-dioxotetrafuryl)-3-methyl 3-cyclohexene-1,2 - A varnish having a resin content of 58.3% by weight was prepared by mixing and dissolving dicarboxylic acid anhydride and dicumyl peroxide in the composition shown in Table 1 in methyl isobutyl ketone and dimethyl formamide.

第   1   表 該ワニスにプラズマ処理した最大粒子径20μの4フッ
化エチレン樹脂粉末58.3重量部、メチルセロソルブ
21重量部を加え、更にT−グリシドキシプロビルトリ
メトキシシラン1重量部(30モルPPM)を添加し、
市販のホモジナイザーで10000rpa+5分間混合
し、ペースト状組成物を得た。
Table 1 58.3 parts by weight of plasma-treated tetrafluoroethylene resin powder with a maximum particle size of 20μ and 21 parts by weight of methyl cellosolve were added to the varnish, and 1 part by weight of T-glycidoxyprobyltrimethoxysilane (30 parts by weight) was added to the varnish. mol PPM),
The mixture was mixed using a commercially available homogenizer at 10,000 rpm for 5 minutes to obtain a paste composition.

4フツ化エチレン樹脂粉末のプラズマ処理は、13.5
6M Hzの電源を使用、外部電極方式でArをガスと
し0.01 トルの真空度、100Wの電力、60分間
行った。尚プラズマ処理反応器内は攪拌装置を使い撹拌
した。
Plasma treatment of tetrafluoroethylene resin powder is 13.5
A 6 MHz power source was used, an external electrode method was used, Ar was used as a gas, a vacuum degree of 0.01 Torr, and a power of 100 W was used for 60 minutes. The inside of the plasma treatment reactor was stirred using a stirring device.

この組成物を35μm厚銅箔にスクリーン印刷し、10
0°CIO分乾燥後、銅箔/塗布層のシートを塗布層が
内側になる様2枚合わせて温度170°C圧力30kg
/mn(、時間2時間30分でプレスし総厚130μm
の両面銅張板を得た。
This composition was screen printed on a 35 μm thick copper foil, and
After drying for 0°CIO, combine two sheets of copper foil/coating layer with the coating layer on the inside at a temperature of 170°C and a pressure of 30kg.
/mn (, pressed in 2 hours 30 minutes, total thickness 130 μm
A double-sided copper clad plate was obtained.

該銅張板の誘電率、誘電正接、ビール強度をJIS−C
−6486に準拠して評価した。
The dielectric constant, dielectric loss tangent, and beer strength of the copper clad plate were determined by JIS-C.
-6486.

実施例2 添加したγ−グリシドキシプロピルトリメトキシシラン
が2重量部(60モルPPM)である他は実施例1と同
様に実施した。
Example 2 The same procedure as in Example 1 was carried out except that 2 parts by weight (60 mol PPM) of γ-glycidoxypropyltrimethoxysilane was added.

比較例I γ−グリシドキシプロピルトリメトキシシランを加えな
い他は実施例1と同様。
Comparative Example I Same as Example 1 except that γ-glycidoxypropyltrimethoxysilane was not added.

比較例2 T−グリシドキシプロピルトリメトキシシランが3重量
部(120モルPPM)である他は、実施例1と同様。
Comparative Example 2 Same as Example 1 except that T-glycidoxypropyltrimethoxysilane was 3 parts by weight (120 mol PPM).

実施例、比較例の評価結果を第2表に示す。Table 2 shows the evaluation results of Examples and Comparative Examples.

第   2   表 〔発明の効果〕 本発明の絶縁層形成用ペースト状組成物から得られる絶
縁層は、従来のペースト状組成物からなる絶縁層に比べ
て、低εであり、加えてフッ素樹脂の量や種類を変える
ことにより、任意にεを調整できる。
Table 2 [Effects of the Invention] The insulating layer obtained from the paste composition for forming an insulating layer of the present invention has a lower ε than an insulating layer made of a conventional paste composition, and in addition, it has a lower ε. By changing the amount and type, ε can be adjusted arbitrarily.

更に本発明の絶縁層形成用ペースト組成物は接着性や耐
水性が非常に優れたものである。
Furthermore, the paste composition for forming an insulating layer of the present invention has extremely excellent adhesive properties and water resistance.

本発明の絶縁層形成用ペースト状組成物からなる絶縁層
を含む回路基板は通常の積層板からなる基板と同様、穴
明け、メツキ−エツチング・半田処理等が可能である。
A circuit board containing an insulating layer made of the paste-like composition for forming an insulating layer of the present invention can be subjected to drilling, metal etching, soldering, etc. in the same manner as a board made of an ordinary laminate.

また、エポキシ樹脂のうち、臭素化されたものを用いれ
ば、ペースト組成物により形成された絶縁層に難燃性を
付与することができる。
Furthermore, if a brominated epoxy resin is used, flame retardancy can be imparted to the insulating layer formed from the paste composition.

従って本発明の絶縁層形成用ペースト状組成物は、例え
ば信号回路を含むような内層面に塗布乾燥して、半硬化
として絶縁層を形成し、これを複数枚か又はその他の外
層を形成する層とを組み合わせて積層し、加熱加圧して
多層回路基板を得た時、該絶縁層が厚み調整層となるよ
うな用途に最適である。
Therefore, the paste-like composition for forming an insulating layer of the present invention is coated and dried on the surface of an inner layer containing a signal circuit, for example, to form an insulating layer as a semi-cured material, and then a plurality of insulating layers or other outer layers are formed. It is ideal for applications where the insulating layer becomes a thickness adjustment layer when a multilayer circuit board is obtained by combining and laminating layers and applying heat and pressure.

以上 特許出願人 住友ベークライト株式会社手続補正書(自
発) 昭和63年IO月26日
Patent applicant: Sumitomo Bakelite Co., Ltd. Procedural amendment (voluntary) IO, 26th year of 1988

Claims (1)

【特許請求の範囲】[Claims] (1)エポキシ変性ポリブタジエンとエポキシ樹脂とカ
ルボン酸無水物とラジカル重合開始剤とを主成分とする
熱硬化性樹脂ワニスに、前記樹脂成分100重量部に対
して最大粒子径が50μm以下であり、プラズマ表面処
理を行ったフッ素樹脂粉末を10〜200重量部添加し
、該熱硬化性樹脂と該フッ素樹脂を合わせた固形分に対
して20〜100モルPPMのエポキシ基含有シランカ
ップリング剤を添加し混合した絶縁層形成用ペースト組
成物。
(1) A thermosetting resin varnish containing epoxy-modified polybutadiene, an epoxy resin, a carboxylic acid anhydride, and a radical polymerization initiator as main components has a maximum particle size of 50 μm or less based on 100 parts by weight of the resin component, 10 to 200 parts by weight of fluororesin powder subjected to plasma surface treatment is added, and 20 to 100 mol PPM of an epoxy group-containing silane coupling agent is added to the solid content of the thermosetting resin and the fluororesin. and a paste composition for forming an insulating layer.
JP22346188A 1988-09-08 1988-09-08 Insulating layer forming paste composition Expired - Lifetime JPH0719951B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22346188A JPH0719951B2 (en) 1988-09-08 1988-09-08 Insulating layer forming paste composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22346188A JPH0719951B2 (en) 1988-09-08 1988-09-08 Insulating layer forming paste composition

Publications (2)

Publication Number Publication Date
JPH0272700A true JPH0272700A (en) 1990-03-12
JPH0719951B2 JPH0719951B2 (en) 1995-03-06

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1026704A3 (en) * 1999-02-03 2001-10-10 Degussa AG Surface-modified insulator and method thereof
JP2006241252A (en) * 2005-03-01 2006-09-14 Sekisui Chem Co Ltd Epoxy resin cured product, sheet made thereof and manufacturing method of the epoxy resin cured product
JP2009167360A (en) * 2008-01-18 2009-07-30 Yaskawa Electric Corp Vacuum sealing resin, and vacuum device and vacuum magnetic sensor using the resin
CN101892925A (en) * 2010-06-23 2010-11-24 中北大学 Aircraft range-extending technique
JP2011102344A (en) * 2009-11-10 2011-05-26 Three M Innovative Properties Co One-pack type liquid epoxy resin composition and adhesion method using the same
JP2011137092A (en) * 2009-12-28 2011-07-14 Nippon Soda Co Ltd Curable composition
JP2012007150A (en) * 2010-06-23 2012-01-12 Samsung Electro-Mechanics Co Ltd Insulating resin composition and printed circuit substrate using the same
JP2012121980A (en) * 2010-12-08 2012-06-28 Ube Industries Ltd Modified homopolymeric diene rubber and method for producing the same, and rubber composition using the same
JP2014055233A (en) * 2012-09-12 2014-03-27 Panasonic Corp Liquid epoxy resin composition and semiconductor electronic component
JP2019183118A (en) * 2018-03-30 2019-10-24 Agc株式会社 Molded body, laminate, powder dispersion, and manufacturing method of powder dispersion

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1026704A3 (en) * 1999-02-03 2001-10-10 Degussa AG Surface-modified insulator and method thereof
JP2006241252A (en) * 2005-03-01 2006-09-14 Sekisui Chem Co Ltd Epoxy resin cured product, sheet made thereof and manufacturing method of the epoxy resin cured product
JP2009167360A (en) * 2008-01-18 2009-07-30 Yaskawa Electric Corp Vacuum sealing resin, and vacuum device and vacuum magnetic sensor using the resin
JP2011102344A (en) * 2009-11-10 2011-05-26 Three M Innovative Properties Co One-pack type liquid epoxy resin composition and adhesion method using the same
JP2011137092A (en) * 2009-12-28 2011-07-14 Nippon Soda Co Ltd Curable composition
CN101892925A (en) * 2010-06-23 2010-11-24 中北大学 Aircraft range-extending technique
JP2012007150A (en) * 2010-06-23 2012-01-12 Samsung Electro-Mechanics Co Ltd Insulating resin composition and printed circuit substrate using the same
JP2012121980A (en) * 2010-12-08 2012-06-28 Ube Industries Ltd Modified homopolymeric diene rubber and method for producing the same, and rubber composition using the same
JP2014055233A (en) * 2012-09-12 2014-03-27 Panasonic Corp Liquid epoxy resin composition and semiconductor electronic component
JP2019183118A (en) * 2018-03-30 2019-10-24 Agc株式会社 Molded body, laminate, powder dispersion, and manufacturing method of powder dispersion

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Publication number Publication date
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