JPH0271586A - Manufacture of multilayer printed board - Google Patents

Manufacture of multilayer printed board

Info

Publication number
JPH0271586A
JPH0271586A JP63221373A JP22137388A JPH0271586A JP H0271586 A JPH0271586 A JP H0271586A JP 63221373 A JP63221373 A JP 63221373A JP 22137388 A JP22137388 A JP 22137388A JP H0271586 A JPH0271586 A JP H0271586A
Authority
JP
Japan
Prior art keywords
inner layer
copper
layer board
copper foil
printed wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63221373A
Other languages
Japanese (ja)
Inventor
Yasuo Tanaka
田中 恭夫
Naohito Yoshimura
吉村 直仁
Koichi Nakano
孝一 中野
Toru Notomi
徹 納富
Morio Take
杜夫 岳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP63221373A priority Critical patent/JPH0271586A/en
Priority to MYPI89001201A priority patent/MY104191A/en
Priority to DE68920383T priority patent/DE68920383T2/en
Priority to KR1019890012890A priority patent/KR970004029B1/en
Priority to US07/403,519 priority patent/US5076864A/en
Priority to EP89309018A priority patent/EP0358480B1/en
Publication of JPH0271586A publication Critical patent/JPH0271586A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To remarkably decrease or eliminate halos or pink rings by treating the copper foil face of an inner layer board with an acid reductant water solution containing zinc formaldehydesulfoxylate after oxidizing chemically its copper foil face and forming a black or brown copper oxide face. CONSTITUTION:After polishing and washing the copper foil face of an inner layer board, pre-etching (soft-etching and chemical polishing) is performed with a water solution containing copper chloride or ammonium persulfate. After that, for example, its face is oxidized at a temperature of 70-100 deg.C with chemicals consisting of 15g/l of sodium hydroxide (NaOH), 31g/l of sodium hypochlorite (NaClO2), and 15g/l of sodium phosphate (Na3PH4) and then, a brown or black inner layer board is purified. Subsequently, it is treated with an acid reductant water solution containing zinc formaldehydesulfoxylate and then, the washed and dried inner layer board is obtained. Further, treatment with the acid reductant water solution is performed on condition that the concentration of zinc formaldehydesulfoxylate is 5-30g/l, pH is 0.1-7.0, a treatment temperature is 40-80 deg.C, and time of treatment is 0.5-5 minutes.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、中間層(内層)となるプリント配線板の銅箔
面の処理方法を特徴とする多層プリント配線板の製造法
であり、特に、多層プリント配線板の製造工程で孔壁に
露出している酸化銅から酸性水溶液の作用で酸化銅が溶
けることによる「ハロー」或いは「ビンクリング」現象
を著しく減少或いは無くしたものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention is a method for manufacturing a multilayer printed wiring board, which is characterized by a method for treating a copper foil surface of a printed wiring board serving as an intermediate layer (inner layer). This method significantly reduces or eliminates the "halo" or "binkling" phenomenon caused by the copper oxide exposed on the hole wall being dissolved by the action of an acidic aqueous solution during the manufacturing process of multilayer printed wiring boards.

〔従来の技術およびその課題〕[Conventional technology and its problems]

多層プリント板において、中間層とするプリント配線網
の形成された内層板の多層化接着力を向上させる方法と
しては、予め両面が凹凸化された銅箔を用いる方法;内
層用のプリント配線網を形成した後、■、化学的処理に
より銅箔表面に酸化銅膜を形成する方法、■、銅箔面を
シランカップリング剤や有機チタネートカップリング剤
で処理する方法などが知られているが、従来は接着性と
経済性の点から通常、光沢面を有する銅張積層板に内層
用のプリント配線網を形成した後、酸化性のアルカリ水
溶液で処理して褐色或いは黒色の酸化銅皮膜を形成した
ものが用いられる。
In a multilayer printed board, a method of improving the multilayer adhesion of an inner layer board on which a printed wiring network is formed as an intermediate layer is to use a copper foil that has been textured on both sides in advance; After formation, there are two known methods: (1) forming a copper oxide film on the surface of the copper foil through chemical treatment; and (2) treating the copper foil surface with a silane coupling agent or an organic titanate coupling agent. Conventionally, from the viewpoint of adhesion and economy, after forming a printed wiring network for the inner layer on a copper-clad laminate with a glossy surface, it is treated with an oxidizing alkaline aqueous solution to form a brown or black copper oxide film. is used.

ところが、この酸化銅膜、特に酸化第2銅は塩酸、硫酸
などの酸性水溶液に溶けやすい欠点を有している。この
ため、積層成形された多層板に小孔をあけ、スルーホー
ルメツキ工程や無電解メツキ又はその後の電解メツキ工
程などを施す場合、孔壁に露出した酸化銅膜が酸性液に
より溶かされる、いわゆる「ハロー」或いは「ビンクリ
ング」が発生し、絶縁性などのプリント配線板の信頼性
の低下の原因となる欠点があった。
However, this copper oxide film, particularly cupric oxide, has the disadvantage that it easily dissolves in acidic aqueous solutions such as hydrochloric acid and sulfuric acid. For this reason, when making small holes in a laminated multilayer board and performing a through-hole plating process, electroless plating process, or subsequent electrolytic plating process, the copper oxide film exposed on the hole wall is dissolved by the acidic liquid. There is a drawback that "halo" or "binkling" occurs, which causes a decrease in the reliability of the printed wiring board, such as insulation properties.

この褐色或いは黒色の酸化銅皮膜を用いた場合に発生す
るハロー或いはビンクリングの発生を防止する方法とし
て、アルカリ性の還元性水溶液で処理する方法が知られ
ている(特開昭56−153797号)。この方法は、
褐色或いは黒色の酸化銅膜より接着力は低下するものの
実用化に耐える接着力を示すが、「ハロー」の発生防止
効果にバラツキがあり、実用化されるには至っていない
As a method for preventing the halo or bink ring that occurs when this brown or black copper oxide film is used, a method of treating it with an alkaline reducing aqueous solution is known (Japanese Patent Laid-Open No. 153797/1983). . This method is
Although the adhesion strength is lower than that of brown or black copper oxide films, it exhibits an adhesion strength sufficient for practical use, but its effectiveness in preventing the occurrence of "halos" varies, and it has not yet been put into practical use.

〔問題点を解決するための手段〕 本発明者らは、褐色或いは黒色酸化銅処理の還元処理し
て「ハロー」の防止効果にバラツキのない方法について
鋭意検討した。その結果、アルカリ性の還元剤水溶液に
代えて、意外にも、特定の還元剤を用いた酸性還元剤水
溶液を用いる方法を見出した。
[Means for Solving the Problems] The present inventors have conducted intensive studies on a method for reducing the brown or black copper oxide treatment so that the effect of preventing "halo" is uniform. As a result, we surprisingly discovered a method of using an acidic reducing agent aqueous solution containing a specific reducing agent instead of an alkaline reducing agent aqueous solution.

すなわち、本発明は、多層プリント配線板の製造法にお
いて、中間層として用いるプリント配線網を形成した内
層板の銅箔面を化学的に酸化し黒色或いは褐色の酸化銅
面を形成した後、亜鉛ホルムアルデヒドスルホキシレー
トを含有する酸性還元剤水溶液で該酸化銅面を処理し、
乾怪してなる内層板を用いることを特徴とする多層プリ
ント配線板の製造法であり、特に該酸性還元剤水溶液が
、亜鉛ホルムアルデヒドスルホキシレーl・の濃度が5
g/ 12〜30g/CpHが1.0以上7.0未満で
あり、処理温度が 40〜80℃、処理時間が0.5〜
5分間の条件を用いる多層プリント配線板の製造法であ
る。
That is, in the method of manufacturing a multilayer printed wiring board, the present invention chemically oxidizes the copper foil surface of an inner layer board on which a printed wiring network used as an intermediate layer is formed to form a black or brown copper oxide surface, and then oxidizes the copper foil surface with zinc. treating the copper oxide surface with an acidic reducing agent aqueous solution containing formaldehyde sulfoxylate;
A method for producing a multilayer printed wiring board characterized by using an inner layer board formed by drying, and in particular, the acidic reducing agent aqueous solution has a concentration of zinc formaldehyde sulfoxylate l.
g/12~30g/CpH is 1.0 or more and less than 7.0, treatment temperature is 40~80℃, treatment time is 0.5~
This is a method for manufacturing a multilayer printed wiring board using conditions of 5 minutes.

褐色或いは黒色の酸化銅膜は酸化第二銅を主体とする酸
化銅から形成されたものであり、上記した「ハロー現象
」或いは「ピンクリング現象」はこの酸化第二銅がスル
ーホールの洗浄やスルーホールメツキ等に使用する酸性
水溶液に溶解するために起こるものである。これに対し
て、本発明はこれらの処理液と同じ酸性水溶液を使用し
て、酸化第二銅を主体とする銅膜を酸性水溶液に溶解し
難い亜酸化銅を生成させるものである。本発明の処理に
よって、酸化第二銅を主体とする褐色或いは黒色の酸化
銅膜からの銅の溶解という新たな問題の発生もなく、実
用化可能な接着力を持ったハロー或いはビンクリングを
大幅に減少或いは無くすることができることは予想され
ないことであった。
The brown or black copper oxide film is formed from copper oxide mainly containing cupric oxide, and the above-mentioned "halo phenomenon" or "pink ring phenomenon" is caused by this cupric oxide cleaning through-holes and This occurs due to dissolution in acidic aqueous solutions used for through-hole plating, etc. In contrast, the present invention uses the same acidic aqueous solution as these treatment solutions to generate cuprous oxide, which is difficult to dissolve in the acidic aqueous solution, from a copper film mainly composed of cupric oxide. The treatment of the present invention eliminates the new problem of copper dissolution from brown or black copper oxide films, which are mainly made of cupric oxide, and significantly improves the ability to form halos or bink rings with adhesive strength that can be put to practical use. It was unexpected that this could be reduced or even eliminated.

以下、本発明の構成について説明する。The configuration of the present invention will be explained below.

本発明の多層プリント配線板とは、上記した中間層に使
用する内層用プリント配線網を形成した内層板として銅
箔面を化学的に酸化し黒色或いは褐色の酸化銅面を形成
した後、亜鉛ホルムアルデヒドスルホキシレートを含有
する酸性還元剤水溶液で該酸化銅面を処理し、乾燥して
なるものを使用する他は、多層化積層成形に使用する内
層板、多層化接着に使用するプリプレグ、外層を形成す
るためのプリプレグおよび銅箔或いは片面銅張積層板な
どの積層材料並びに積層成形の方法など従来公知のもの
並びに方法が使用できるもきであり、特に限定されない
ものである。
The multilayer printed wiring board of the present invention is an inner layer board on which an inner layer printed wiring network used for the above-mentioned intermediate layer is formed, and after chemically oxidizing the copper foil surface to form a black or brown copper oxide surface, zinc The copper oxide surface is treated with an acidic reducing agent aqueous solution containing formaldehyde sulfoxylate and dried. In addition, the inner layer plate used for multilayer lamination molding, the prepreg used for multilayer adhesion, and the outer layer are used. Conventionally known materials and methods can be used, such as prepregs and laminated materials such as copper foil or single-sided copper-clad laminates, and laminated molding methods, and are not particularly limited.

このような積層材料はEガラス、Sガラス、Dガラス、
石英ガラスなどの種々のガラス織布、アルミナペーパー
などの無機質の織布機材;全芳香属ポリアミド、ポリイ
ミド、フッ素樹脂、ポリフェニレンサルファイド、ポリ
エーテルエーテルケトン、ポリエーテルイミド、その他
の超耐熱性樹脂製の織布;上記の無機質の繊維と超耐熱
製樹脂製の繊維とを用いた複合糸を使用した織布;上記
を適宜組み合わせたものなどの織布を補強基材とし、ビ
スフェノールA型、ノボラック型、ハロゲン化ビスフェ
ノールA型、ハロゲン化ノボラック型、その他の3官能
以上の多官能性エポキシ化合物などのエポキシ樹脂;シ
アナト樹脂、シアン酸エステル−エポキシ樹脂、シアン
酸エステル−マレイミド−エポキシ樹脂などを典型とす
るシアン酸エステル系樹脂;ビスマレイミドなどの多官
能性マレイミド類とビス(4−アミノフェニル)メタン
などの多官能性アミンを主成分とするマレイミド系樹脂
;さらには耐熱性の熱可塑性樹脂や熱可塑性樹脂と熱硬
化性樹脂との組成物からなる樹脂などを使用してなるプ
リプレグ、電解銅箔や圧延銅箔などの銅箔、銅箔とプリ
プレグとを積層成形してなる両面或いは片面銅張積層板
、銅張積層板の片面或いは両面に内層用のプリント配線
網を形成した内層用プリント配線板(内層板)が例示さ
れる。また積層成形方法としては、従来の熱盤ブレス、
熱盤真空プレス、オートクレーブ成形などが例示される
Such laminated materials include E glass, S glass, D glass,
Various glass woven fabrics such as quartz glass, inorganic woven fabrics such as alumina paper; fully aromatic polyamide, polyimide, fluororesin, polyphenylene sulfide, polyetheretherketone, polyetherimide, and other super heat-resistant resins. Woven fabric: Woven fabric using composite yarn using the above-mentioned inorganic fibers and super heat-resistant resin fibers; Woven fabric such as a suitable combination of the above is used as a reinforcing base material, and bisphenol A type, novolac type Epoxy resins such as , halogenated bisphenol A type, halogenated novolak type, and other trifunctional or higher polyfunctional epoxy compounds; Typical examples include cyanato resin, cyanate ester-epoxy resin, cyanate ester-maleimide-epoxy resin, etc. cyanate ester resins; maleimide resins whose main components are polyfunctional maleimides such as bismaleimide and polyfunctional amines such as bis(4-aminophenyl)methane; Prepreg made of resin made from a composition of plastic resin and thermosetting resin, copper foil such as electrolytic copper foil or rolled copper foil, double-sided or single-sided copper cladding made by laminating and molding copper foil and prepreg. An example is a printed wiring board for inner layers (inner layer board) in which a printed wiring network for inner layers is formed on one or both sides of a laminate or a copper-clad laminate. In addition, as a lamination molding method, conventional hot platen press,
Examples include hot platen vacuum press and autoclave molding.

本発明の内層板に褐色或いは黒色の酸化銅皮膜を形成す
る方法は公知であり、通常、内層板の銅箔面を研磨、洗
浄した後、塩化銅又は過硫酸アンモニウムなどの水溶液
によりプレエツチング(ソフトエツチング、化学研磨)
した後、アルカリ性の酸化性水溶液で処理する方法で行
う。ここに、アルカリ性の酸化性水溶液並びに処理条件
としては具体的には下記の如きものが例示されるが、こ
れらに限定されるものではなく、公知方法が使用できる
The method of forming a brown or black copper oxide film on the inner layer plate of the present invention is known. Usually, after polishing and cleaning the copper foil surface of the inner layer plate, pre-etching (softening) is performed with an aqueous solution such as copper chloride or ammonium persulfate. etching, chemical polishing)
After that, it is treated with an alkaline oxidizing aqueous solution. Here, the alkaline oxidizing aqueous solution and treatment conditions are specifically exemplified below, but are not limited thereto, and known methods can be used.

■、水酸化ナトリウム(NaOll (15g/ l 
) )/次亜塩素酸ナトリウム(Na[:IL(31g
/ It >)/リン酸ナトリウム(15g/l 、7
0〜100℃、0.5〜10分間。
■ Sodium hydroxide (NaOll (15g/l)
) ) / Sodium hypochlorite (Na[:IL (31g
/It>)/sodium phosphate (15g/l, 7
0-100°C, 0.5-10 minutes.

■、硫酸銅(50g/ 12 ) /塩化ナトリウム(
200g#り、40〜80℃、3〜15分間。
■, Copper sulfate (50g/12)/sodium chloride (
200 g, 40-80°C, 3-15 minutes.

■、酢酸(20g#り/塩化アンモニウム(20g/ 
l)/酢酸銅(10g、#) 、30〜80℃、1〜1
0分間。
■, acetic acid (20 g/ammonium chloride (20 g/
l)/copper acetate (10g, #), 30-80℃, 1-1
0 minutes.

■、酢酸銅(10g/ 12 ) /硫酸銅(24g/
l)/硫化バリウム(24g/ Il ) /塩化アン
モニウム(24g/ (1)、40〜50℃、1〜10
分間。
■, Copper acetate (10g/12) / Copper sulfate (24g/
l)/barium sulfide (24g/Il)/ammonium chloride (24g/(1), 40-50°C, 1-10
minutes.

■、硫酸銅(25g/ 12 ) /硫酸ニッケル(2
5g/l)/塩素酸カリウム(25g/j2) 、70
〜90℃、1〜10分間。
■, Copper sulfate (25g/12) / Nickel sulfate (2
5g/l)/potassium chlorate (25g/j2), 70
~90°C, 1-10 minutes.

■、過硫酸カリウム(20g/l)/水酸化ナトリウム
50g/j’) 、50〜80℃、1〜3分間。
(2) Potassium persulfate (20 g/l)/sodium hydroxide 50 g/j'), 50-80°C, 1-3 minutes.

上記で褐色或いは黒色処理した内層板を清浄化した後、
本発明の亜鉛ホルムアルデヒドスルホキシレートを含有
する酸性還元剤水溶液で処理し、水洗し、乾燥した内層
板を本発明においては使用して、「ハロー」の発生を大
幅に減少或いは無くする。
After cleaning the inner layer plate treated brown or black above,
Inner plates treated with an aqueous acidic reducing agent solution containing the zinc formaldehyde sulfoxylate of the present invention, washed with water, and dried are used in the present invention to significantly reduce or eliminate the occurrence of "halos".

ここに、本発明の亜鉛ホルムアルデヒドスルホキシレー
トを含有する酸性還元剤水溶液とは、還元剤である亜鉛
ホルムアルデヒドスルホキシレート(=ZnSO□・C
H2O・211□0)の濃度が5〜30g/(1,好ま
しくは5〜20g#!、pHが1.0以上7.0未満、
好ましくは2〜4であり、処理温度 40〜80℃、処
理時間0.5〜5分間の条件を使用する。
Here, the acidic reducing agent aqueous solution containing zinc formaldehyde sulfoxylate of the present invention refers to zinc formaldehyde sulfoxylate (=ZnSO□・C
The concentration of H2O・211□0) is 5 to 30 g/(1, preferably 5 to 20 g#!), the pH is 1.0 or more and less than 7.0,
Preferably, the temperature is 2 to 4, the treatment temperature is 40 to 80°C, and the treatment time is 0.5 to 5 minutes.

なお、piは、蟻酸、酢酸などの有機酸や蟻酸銅、酢酸
銅の酸性塩を加えることにより調製するものであり、有
機酸の場合の濃度としては1〜50mf/gの範囲が例
示される。
In addition, pi is prepared by adding an organic acid such as formic acid or acetic acid, or an acid salt of copper formate or copper acetate, and the concentration in the case of an organic acid is exemplified in the range of 1 to 50 mf/g. .

処理済の内層板を水洗し、風乾、加熱(特に80〜20
0℃)などの公知の方法で乾燥して本発明の処理された
内層板とする。
Wash the treated inner layer board with water, air dry, and heat (especially at 80 to 20
The treated inner layer plate of the present invention is obtained by drying by a known method such as at 0° C.).

〔実施例〕〔Example〕

以下、実施例により本発明を説明する。 The present invention will be explained below with reference to Examples.

実施例1 厚み0.8on、銅箔厚み701の両面銅張ガラスエポ
キシ積層板の両面の約半分を公知エツチング法で除去し
た後、Na0Il (15g/ Il ) /次亜塩素
酸ナトリウム(31g/(1)/リン酸ナトリウム(1
5g/ j2 )の水溶液で90℃、5分間処理し、水
洗した後、この内層板を亜鉛ホルムアルデヒドスルホキ
シレート(ZnSO□・CI+20−2112010g
#り /酢酸(10ml/ A )のpH3〜4の水溶
液を用い、80℃で1.5分間処理した後、十分に水洗
し、130℃、30分間乾燥して処理内層板を得た。
Example 1 After removing about half of both sides of a double-sided copper-clad glass epoxy laminate with a thickness of 0.8 on and a copper foil thickness of 701 cm using a known etching method, Na0Il (15g/Il)/sodium hypochlorite (31g/( 1)/sodium phosphate (1)
After treating with an aqueous solution of 5g/j2) at 90°C for 5 minutes and washing with water, this inner layer plate was treated with zinc formaldehyde sulfoxylate (ZnSO□・CI+20-2112010g).
After treating with an aqueous solution of acetic acid/acetic acid (10 ml/A) at pH 3 to 4 at 80°C for 1.5 minutes, it was thoroughly washed with water and dried at 130°C for 30 minutes to obtain a treated inner layer plate.

処理内層板の両面にガラスエポキシプリプレグ(樹脂量
52%、厚み0.1mm)  3枚、さらに厚み18−
の電解銅箔を重ねて温度175℃、圧力40kg/ct
lで2時間積層成形して4層板とした後、冷却し、次い
で孔径0.4mmφ、8万r、 p、 m、、20虜/
回転の条件でi、 ooo個、 2.54nnoの間隔
の孔あけした。
3 sheets of glass epoxy prepreg (resin content 52%, thickness 0.1 mm) on both sides of the treated inner laminate, and a further thickness of 18 mm.
layered with electrolytic copper foil at a temperature of 175℃ and a pressure of 40kg/ct.
After laminating and forming a 4-layer plate for 2 hours at l, it was cooled and then laminated with a hole diameter of 0.4 mmφ, 80,000 r, p, m, 20 prisoners/
Under rotation conditions, holes were drilled at intervals of i, ooo, and 2.54 nno.

この孔あけした4層板を4NのllCl水溶液に5分間
浸漬して内層のある孔周囲のハローを全孔の任意の1/
4 (125個)について観察するとともにその最大の
ものの長さを測定した。
This perforated 4-layer board was immersed in a 4N llCl aqueous solution for 5 minutes to remove the halo around the hole in the inner layer at an arbitrary 1/2 inch of the total hole.
4 (125 pieces) were observed and the length of the largest one was measured.

又、孔あけした4層板を5CII+角に取り、100℃
、6時間煮沸した後、260℃のハンダに30秒浸漬す
る試験をした。
Also, take the perforated four-layer board at 5CII+ corner and heat it at 100°C.
After boiling for 6 hours, a test was conducted by immersing it in solder at 260°C for 30 seconds.

又、上記において、孔あけした4N板を用い、通常の銅
スルーホールメツキを実施した後に、同様にハローにつ
いて測定した。
In addition, in the above, using the 4N plate with holes drilled, after carrying out ordinary copper through-hole plating, the halo was similarly measured.

結果を第1表に示した。The results are shown in Table 1.

実施例2 実施例1において、還元処理液として亜鉛ホルムアルデ
ヒドスルホキシレート(ZnS02・CH2[1・22
H2O20#)/酢酸(20ml/ n )の水溶液を
用いる他は同様とした結果を第1表に示した。
Example 2 In Example 1, zinc formaldehyde sulfoxylate (ZnS02.CH2[1.22
Table 1 shows the results obtained in the same manner except that an aqueous solution of H2O20#)/acetic acid (20 ml/n) was used.

実施例3 実施例1において、同じ還元処理液を用い、内層板の処
理面積/処理液体積の比を0101m”/ 11として
、処理液に還元剤を補充することなく還元処理を10回
行い、10回目の結果を第1表に示した。
Example 3 In Example 1, using the same reducing treatment liquid and setting the ratio of treatment area of the inner layer plate/treatment liquid volume to 0101 m''/11, the reduction treatment was performed 10 times without replenishing the reducing agent to the treatment liquid. The results of the 10th test are shown in Table 1.

比較例1.2 実施例1において、黒色酸化銅処理内層板の還元処理を
アルカリ性還元剤水溶液(30重量%ホルマリン水溶液
30m1/ l、 K[]H38g、# 、温度75℃
)に15分間浸漬で比較例1)及びアルカリ性還元剤水
溶液(次亜リン酸ナトリウム30g/ 1、Na[]I
I 5g/l、温度65℃)に10分間浸漬(比較例2
)する他は同様とした。この結果、一部には「ハロー」
0のものもあったが、最大のものは第1表に記載の通り
であり、バラツキが大きいものであった。
Comparative Example 1.2 In Example 1, the black copper oxide treated inner layer plate was reduced using an alkaline reducing agent aqueous solution (30 wt% formalin aqueous solution 30 ml/l, K[]H 38 g, #, temperature 75°C).
) for 15 minutes in Comparative Example 1) and an alkaline reducing agent aqueous solution (sodium hypophosphite 30g/1, Na[]I).
I 5g/l, temperature 65°C) for 10 minutes (Comparative Example 2)
) The rest was the same. As a result, some say “hello”
There were some that were 0, but the largest ones were as shown in Table 1, and there was a large variation.

実施例4 実施例1において、内層板として両面鋼張ガラス−シア
ン酸エステル・マレイミド・エポキシ樹脂積層板(三菱
瓦斯化学■製、IIL 810)を用いたものを使用し
、多層化接着用プリプレグとしてガラスシアン酸エステ
ル−マレイミド−エポキシ樹脂プリプレグ(三菱瓦斯化
学q@製、GIIPL 810)を用い、表面処理用シ
アナト化合物の希薄溶液として1.4−ジシアナトベン
ゼン溶解したものを用い、多層化積層成形条件を温度2
00℃、2時間に変更する他は同様とした結果を第2表
に示した。
Example 4 In Example 1, a double-sided steel-clad glass-cyanate ester maleimide epoxy resin laminate (manufactured by Mitsubishi Gas Chemical, IIL 810) was used as the inner layer plate, and used as a prepreg for multilayer adhesive. Using glass cyanate ester-maleimide-epoxy resin prepreg (manufactured by Mitsubishi Gas Chemical q@, GIIPL 810), and using 1,4-dicyanatobenzene dissolved as a dilute solution of cyanato compound for surface treatment, multilayer laminate molding was performed. Conditions: Temperature 2
The results are shown in Table 2 under the same conditions except that the temperature was changed to 00°C for 2 hours.

多層プリント配線板を生産性よく製造できるもので、工
業的な意義は極めて高いものである。
It allows multilayer printed wiring boards to be manufactured with high productivity, and has extremely high industrial significance.

特許出願人  三菱瓦斯化学株式会社 代理人 弁理士(9070)  小堀 貞文〔発明の作
用および効果〕
Patent applicant Mitsubishi Gas Chemical Co., Ltd. Agent Patent attorney (9070) Sadafumi Kobori [Operation and effects of the invention]

Claims (1)

【特許請求の範囲】 1 多層プリント配線板の製造法において、中間層とし
て用いるプリント配線網を形成した内層板の銅箔面を化
学的に酸化し褐色或いは黒色の酸化銅面を形成した後、
亜鉛ホルムアルデヒドスルホキシレートを含有する酸性
還元剤水溶液で該酸化銅面を処理し、乾燥してなる内層
板を用いることを特徴とする多層プリント配線板の製造
法。 2 該酸性還元剤水溶液が、亜鉛ホルムアルデヒドスル
ホキシレートの濃度が5g/l〜30g/l、pHが1
.0以上7.0未満であり、処理温度が40〜80℃、
処理時間が0.5〜5分間である請求項1記載の多層プ
リント配線板の製造法。
[Claims] 1. In a method for manufacturing a multilayer printed wiring board, after chemically oxidizing the copper foil surface of an inner layer board on which a printed wiring network used as an intermediate layer is formed to form a brown or black copper oxide surface,
A method for manufacturing a multilayer printed wiring board, comprising treating the copper oxide surface with an aqueous acidic reducing agent solution containing zinc formaldehyde sulfoxylate and drying the inner layer board. 2 The acidic reducing agent aqueous solution has a zinc formaldehyde sulfoxylate concentration of 5 g/l to 30 g/l and a pH of 1.
.. 0 or more and less than 7.0, and the processing temperature is 40 to 80°C,
The method for manufacturing a multilayer printed wiring board according to claim 1, wherein the processing time is 0.5 to 5 minutes.
JP63221373A 1988-09-06 1988-09-06 Manufacture of multilayer printed board Pending JPH0271586A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP63221373A JPH0271586A (en) 1988-09-06 1988-09-06 Manufacture of multilayer printed board
MYPI89001201A MY104191A (en) 1988-09-06 1989-09-05 Process for producing multilayer printed wiring board
DE68920383T DE68920383T2 (en) 1988-09-06 1989-09-06 Process for producing a multilayer printed circuit board.
KR1019890012890A KR970004029B1 (en) 1988-09-06 1989-09-06 Process for producing multilayer printed wiring board
US07/403,519 US5076864A (en) 1988-09-06 1989-09-06 Process for producing multilayer printed wiring board
EP89309018A EP0358480B1 (en) 1988-09-06 1989-09-06 Process for producing multilayer printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63221373A JPH0271586A (en) 1988-09-06 1988-09-06 Manufacture of multilayer printed board

Publications (1)

Publication Number Publication Date
JPH0271586A true JPH0271586A (en) 1990-03-12

Family

ID=16765777

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63221373A Pending JPH0271586A (en) 1988-09-06 1988-09-06 Manufacture of multilayer printed board

Country Status (1)

Country Link
JP (1) JPH0271586A (en)

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