JPH04154193A - Manufacture of multilayer printed board - Google Patents

Manufacture of multilayer printed board

Info

Publication number
JPH04154193A
JPH04154193A JP2277884A JP27788490A JPH04154193A JP H04154193 A JPH04154193 A JP H04154193A JP 2277884 A JP2277884 A JP 2277884A JP 27788490 A JP27788490 A JP 27788490A JP H04154193 A JPH04154193 A JP H04154193A
Authority
JP
Japan
Prior art keywords
inner layer
printed wiring
brown
copper oxide
board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2277884A
Other languages
Japanese (ja)
Inventor
Yasuhiro Shoji
東海林 靖宏
Takamasa Kawakami
川上 殷正
Kazuhiro Ando
和弘 安藤
Yasuo Tanaka
田中 恭夫
Takeo Kaneoka
金岡 威雄
Norio Sayama
憲郎 佐山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP2277884A priority Critical patent/JPH04154193A/en
Priority to DE69122573T priority patent/DE69122573T2/en
Priority to EP91112509A priority patent/EP0469470B1/en
Priority to US07/738,013 priority patent/US5252355A/en
Priority to KR1019910013125A priority patent/KR940009177B1/en
Publication of JPH04154193A publication Critical patent/JPH04154193A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To enhance reliability, improve productivity and eliminate pubic hazards as well by chemically oxidizing a copper clad surface of an inner layer board and processing said surface in a hydrazine gas prevailing atmosphere after having formed a brown or dark-colored copper oxide surface. CONSTITUTION:A copper clad surface of an inner layer board which has formed a printed wiring net used an inner layer is chemically oxidized and then, it is processed in a hydrazine gas prevailing atmosphere after the formation of a brown or dark colored copper oxide surface. The pressure of the hydrazine gas is specified to be 50% or below saturated vapor pressure in a processing temperature. In a through hole plating process where electric continuity is made between printed wirings of a multilayer board, brown or dark colored copper oxide is dissolved in a plating solution, which serves to reduce dramatically the generation of 'hollow' which is mainly responsible for the generation of defects, such as electric short circuit or eliminate definitely. It is, therefore, possible to manufacture highly reliable multilayer printed wiring boards without causing any public hazards.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、中間層(内層)となるプリント配線板の銅箔
面を、気相にて還元処理を特徴とする多層プリント配線
板の製造法であり、好適には、銅箔表面の酸化処理膜の
表面形状を実質的に変えずに金属銅表面とするものであ
り、酸化銅から酸性水溶液の作用で酸化銅が溶けること
による「ハロー」或いは「ピンクリング」現象を実質的
に無くしたものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to the production of a multilayer printed wiring board characterized by reducing the copper foil surface of the printed wiring board serving as an intermediate layer (inner layer) in a gas phase. It is preferable that the oxidized film on the surface of the copper foil be made into a metallic copper surface without substantially changing the surface shape of the oxidized film on the surface of the copper foil. ” or virtually eliminates the “pink ring” phenomenon.

〔従来の技術およびその課題〕[Conventional technology and its problems]

多層プリント板において、中間層とするプリント配線網
の形成された内層板の多層化接着力を向上させる方法と
しては、予め両面が凹凸化された銅箔を用いる方法;内
層用のプリント配線網を形成した後、■、酸化処理水溶
液により銅箔表面に酸化銅膜を形成する方法、■、銅箔
面をシランカップリング剤や有機チタネートカップリン
グ剤で処理する方法などが知られているが、従来は接着
性と経済性の点から通常、光沢面を有する銅張積層板に
内層用のプリント配線網を形成した後、酸化性のアルカ
リ水溶液で処理して褐色或いは黒色の酸化銅皮膜を形成
したものが用いられている。
In a multilayer printed board, a method of improving the multilayer adhesion of an inner layer board on which a printed wiring network is formed as an intermediate layer is to use a copper foil that has been textured on both sides in advance; After the formation, there are two known methods: (1) forming a copper oxide film on the copper foil surface using an oxidation treatment aqueous solution; (2) treating the copper foil surface with a silane coupling agent or an organic titanate coupling agent; Conventionally, from the viewpoint of adhesion and economy, after forming a printed wiring network for the inner layer on a copper-clad laminate with a glossy surface, it is treated with an oxidizing alkaline aqueous solution to form a brown or black copper oxide film. is used.

ところが、この酸化銅膜、特に酸化第2銅は塩酸、硫酸
などの酸性水溶液に溶は易い。このため、積層成形され
た多層板に小孔をあけ、スルーホ−ルメッキ工程や無電
解メツキ又はその後の電解メツキ工程などを施す際に、
孔壁に露出した酸化銅膜から順次、酸化銅が酸性液によ
り溶かされる、いわゆる「ハロー」或いはrピンクリン
グjが発生し、絶縁性などのプリント配線板の信頼性の
低下の原因となる欠点があった。
However, this copper oxide film, especially cupric oxide, is easily dissolved in acidic aqueous solutions such as hydrochloric acid and sulfuric acid. For this reason, when making small holes in a laminated multilayer board and performing a through-hole plating process, electroless plating, or subsequent electrolytic plating process,
A so-called "halo" or pink ring occurs when the copper oxide film exposed on the hole wall is sequentially dissolved by the acidic liquid, which is a drawback that causes a decrease in the reliability of printed wiring boards such as insulation. was there.

この褐色或いは黒色の酸化銅皮膜を用いた場合に発生す
るハロー或いはピンクリングを防止する方法として、最
近、■、■で得られた銅箔表面の酸化銅膜を還元剤水溶
液で還元して亜酸化銅膜或いは銅膜に変更する方法(特
開昭56−153797号、など)が開示されるに至っ
ている。これらの方法は、実用化可能なレベルの接着力
とすることが可能であるが、新たな液相還元処理工程を
必要とし、かつ、褐色或いは黒色の酸化銅膜より接着力
が低下するので実用化に耐える接着力とするための還元
条件が極めて厳密とする必要がある。さらにrハローJ
の発生防止効果にバラツキかあり、また、新たに還元剤
水溶液の廃液処理の問題が発生するものであった。
As a method to prevent the halo or pink ring that occurs when this brown or black copper oxide film is used, recently, the copper oxide film on the surface of the copper foil obtained in steps A method of changing to a copper oxide film or a copper film (Japanese Unexamined Patent Publication No. 153797/1983, etc.) has been disclosed. These methods can achieve adhesion strength at a level that can be put to practical use, but they require a new liquid phase reduction treatment process, and the adhesive strength is lower than that of brown or black copper oxide films, so they are not practical. In order to obtain adhesive strength that can withstand corrosion, the reducing conditions must be extremely strict. More r Hello J
There were variations in the effectiveness of preventing the occurrence of aqueous reducing agents, and a new problem occurred in the treatment of waste liquid of the aqueous reducing agent solution.

〔課題を解決するための手段〕[Means to solve the problem]

本発明者らは、褐色或いは黒色酸化処理された酸化銅膜
を還元処理して「ハロー」の防止効果にバラツキがない
ばかりでなく、接着力の低下がない又は小さ(、かつ、
廃液処理の新たな課題の生じない方法について鋭意検討
した。
The present inventors have found that by reducing a copper oxide film that has been oxidized to brown or black, not only is there no variation in the "halo" prevention effect, but there is no or only a small decrease in adhesive strength (and
We worked hard to find a method for wastewater treatment that would not create new problems.

その結果、本発明者は気相還元法を研究課題とすること
を提案した。ところが、従来のプリント配線板の製造工
程は全て水或いは有機溶剤溶液を用いる工程により組み
上げられている。そして、プリント配線板の分野におい
て、ヒドラジンガスを用いた例はな(、また、これらの
ガスは有毒で容易に燃焼し、場合によっては爆発事故を
起こすことも周知である。従って、このようなガスを取
り扱う本課題を研究開発すること自体の決断が極めて困
難であった。
As a result, the present inventor proposed that the gas phase reduction method be a research subject. However, all conventional printed wiring board manufacturing processes involve processes using water or organic solvent solutions. In the field of printed wiring boards, there are no examples of using hydrazine gas (and it is well known that these gases are toxic, easily combust, and can cause explosions in some cases. The decision to research and develop this subject, which deals with gas, was extremely difficult.

しかしながら、幸いにも、小スケールの予備的研究の結
果、この気相還元法は極めて優れた性能を発揮する可能
性が確認され、これに基づいてその実用化のための研究
開発に取り組んだ結果、本発明を完成するに至った。
However, fortunately, as a result of small-scale preliminary research, it was confirmed that this gas-phase reduction method has the potential to exhibit extremely excellent performance, and based on this, research and development efforts were conducted to put it into practical use. , we have completed the present invention.

すなわち、本発明は、多層プリント配線板の製造法にお
いて、中間層として用いるプリント配線網を形成した内
層板の銅箔面を化学的に酸化し褐色或いは黒色の酸化銅
面を形成した後、ヒドラジンガス存在雰囲気中で処理し
てなる内層板を用いることを特徴とする多層プリント配
線板の製造法であり、該ヒドラジンガスの圧力が、処理
温度における飽和蒸気圧の50%以下であることを特徴
とする多層プリント配線板の製造法である。
That is, in the method of manufacturing a multilayer printed wiring board, the present invention involves chemically oxidizing the copper foil surface of an inner layer board on which a printed wiring network used as an intermediate layer is formed to form a brown or black copper oxide surface, and then applying hydrazine to the copper foil surface. A method for manufacturing a multilayer printed wiring board characterized by using an inner layer board treated in a gas-present atmosphere, characterized in that the pressure of the hydrazine gas is 50% or less of the saturated vapor pressure at the treatment temperature. This is a method for manufacturing a multilayer printed wiring board.

以下、本発明の構成について説明する。The configuration of the present invention will be explained below.

本発明の多層プリント配線板とは、上記した中間層に使
用する内層用プリント配線網を形成した内層板として銅
箔面を化学的に酸化し黒色或いは褐色の酸化銅面を形成
した後、気相下に乾燥並びにヒドラジンガス存在雰囲気
で処理したものを使用することの他は、多層化積層成形
に使用する内層板、多層化接着に使用するプリプレグ、
外層を形成するためのプリプレグおよび銅箔或いは片面
銅張積層板などの積層材料並びに積層成形の方法など従
来公知の概念にはいるものであればいずれも使用できる
もきであり、特に限定されないものである。
The multilayer printed wiring board of the present invention is an inner layer board on which an inner layer printed wiring network used for the above-mentioned intermediate layer is formed, and after chemically oxidizing the copper foil surface to form a black or brown copper oxide surface, In addition to using those that have been dried and treated in an atmosphere containing hydrazine gas, inner layer plates used for multilayer lamination molding, prepregs used for multilayer adhesion,
Any laminated materials such as prepreg and copper foil or single-sided copper-clad laminates for forming the outer layer, and laminated molding methods can be used as long as they fall within the conventionally known concept, and are not particularly limited. It is.

このような積層材料はEガラス、Sガラス、Dガラス、
石英ガラスなどの種々のガラス織布、アルミナペーパー
などの無機質の織布機材:全芳香属ポリアミド、ポリイ
ミド、フッ素樹脂、ポリフェニレンサルファイド、ポリ
エーテルエーテルケトン、ポリエーテルイミド、液晶ポ
リエステル樹脂、その他の超耐熱性樹脂製の織布;ポリ
イミド、フッ素樹脂、ポリフェニレンサルファイド、ポ
リエーテルエーテルケトン、ポリエーテルイミド、液晶
ポリエステル樹脂、その他の超耐熱性樹脂製のフィルム
或いはシート;上記の無機質の繊維と超耐熱製樹脂製の
繊維とを用いた複合糸を使用した織布;上記を適宜組み
合わせたものなどの織布を補強基材とし、ビスフェノー
ルA型、ノボラック型、ハロゲン化ビスフェノールA型
、ハロゲン化ノボラック型、その他の3官能以上の多官
能性エポキシ化合物などのエポキシ樹脂;シアナト樹脂
、シアン酸エステル−エポキシ樹脂、シアン酸エステル
−マレイミド−エポキシ樹脂などを典型とするシアン酸
エステル系樹脂:ビスマレイミドなどの多官能性マレイ
ミド類とビス(4−アミノフェニル)メタンなどの多官
能性アミンを主成分とするマレイミド系樹脂;さらには
耐熱性の熱可塑性樹脂や熱可塑性樹脂と熱硬化性樹脂と
の組成物からなる樹脂などを使用してなるプリプレグ、
電解銅箔や圧延銅箔などの銅箔、銅箔とプリプレグとを
積層成形してなる両面或いは片面銅張積層板、銅張積層
板の片面或いは両面に内層用のプリント配線網を形成し
た内層用プリント配線板(内層板)が例示される。また
積層成形方法としては、従来の熱盤プレス、熱盤真空プ
レス、オートクレーブ成形、連続プレスなどが例示され
る。
Such laminated materials include E glass, S glass, D glass,
Various glass woven fabrics such as quartz glass, inorganic woven materials such as alumina paper: fully aromatic polyamide, polyimide, fluororesin, polyphenylene sulfide, polyetheretherketone, polyetherimide, liquid crystalline polyester resin, and other super heat-resistant materials woven fabrics made of polyimide, fluororesin, polyphenylene sulfide, polyetheretherketone, polyetherimide, liquid crystal polyester resin, and other super heat-resistant resins; films or sheets made of the above inorganic fibers and super heat-resistant resins Woven fabrics using composite yarns using fibers made from manufactured products; Woven fabrics made of appropriate combinations of the above are used as a reinforcing base material, and bisphenol A type, novolac type, halogenated bisphenol A type, halogenated novolac type, etc. Epoxy resins such as trifunctional or higher polyfunctional epoxy compounds; Cyanate ester resins typically include cyanate resins, cyanate ester-epoxy resins, cyanate ester-maleimide-epoxy resins; Polyfunctional epoxy compounds such as bismaleimide; Maleimide-based resins whose main components are polyfunctional amines such as polyfunctional maleimides and bis(4-aminophenyl)methane; furthermore, they are composed of heat-resistant thermoplastic resins or compositions of thermoplastic resins and thermosetting resins. Prepreg made using resin etc.
Copper foil such as electrolytic copper foil or rolled copper foil, double-sided or single-sided copper-clad laminate made by laminating and molding copper foil and prepreg, inner layer with a printed wiring network formed on one or both sides of the copper-clad laminate. An example is a printed wiring board (inner layer board). Examples of the lamination molding method include conventional hot plate press, hot plate vacuum press, autoclave molding, and continuous press.

本発明の内層板に褐色或いは黒色の酸化銅皮膜を形成す
る方法は公知であり、通常、内層板の銅箔面を研磨、洗
浄した後、塩化銅又は過硫酸アンモニウムなどの水溶液
によりプレエツチング(ソフトエツチング、化学研磨)
した後、アルカリ性の酸化性水溶液で処理する方法で行
う。ここに、アルカリ性の酸化性水溶液並びに処理条件
としては具体的には下記の如きものが例示されるが、こ
れらに限定されるものではな(、公知方法が使用できる
The method of forming a brown or black copper oxide film on the inner layer plate of the present invention is known. Usually, after polishing and cleaning the copper foil surface of the inner layer plate, pre-etching (softening) is performed with an aqueous solution such as copper chloride or ammonium persulfate. etching, chemical polishing)
After that, it is treated with an alkaline oxidizing aqueous solution. Here, the alkaline oxidizing aqueous solution and treatment conditions are specifically exemplified by the following, but are not limited to these (although known methods can be used).

■、水酸化ナトリウム(NaOH(15g/ l ) 
)/次亜塩素酸ナトリウム(NaCIO□(31g# 
))/リン酸ナトリウム(15g#’ ) 、70〜1
00°C10,5〜lO分間。
■ Sodium hydroxide (NaOH (15g/l)
)/Sodium hypochlorite (NaCIO□(31g#
))/sodium phosphate (15g#'), 70-1
00°C for 10,5-10 minutes.

■、硫酸銅(50g# )/塩化ナトリウム(200g
/l)、40〜80℃、3〜15分間。
■, Copper sulfate (50g #) / Sodium chloride (200g
/l), 40-80°C, 3-15 minutes.

■、酢酸(20g# )/塩化アンモニウム(20g/
Iり/酢酸銅(10g、# ) 、30〜80°C,1
−10分間。
■, Acetic acid (20g#)/Ammonium chloride (20g/
Copper acetate (10g, #), 30-80°C, 1
-10 minutes.

■、酢酸銅(10g#’ )/硫酸銅(24g/l )
/硫化バリウム(24g# )/塩化アンモニウム(2
4g/Iり 、40〜50℃、 1〜10分間。
■, Copper acetate (10g#')/Copper sulfate (24g/l)
/ Barium sulfide (24g#) / Ammonium chloride (2
4 g/l, 40-50°C, 1-10 minutes.

■、硫酸銅(25g、# )/硫酸ニッケル(25g/
f )/塩素酸カリウム(25g#’ ) 、70〜9
0℃、 1〜10分間。
■, Copper sulfate (25g, #)/Nickel sulfate (25g/
f)/potassium chlorate (25g#'), 70-9
0℃, 1-10 minutes.

■、過硫酸カリウム(20g# )/水酸化ナトリウム
50g#’ ) 、50〜800C,1〜3分間。
(2) Potassium persulfate (20g#)/sodium hydroxide 50g#'), 50-800C, 1-3 minutes.

上記の褐色或いは黒色の酸化銅皮膜を形成する方法の内
、実用化されている具体的な方法は得られた酸化処理膜
自体を多層化積層成形した場合に好適な、又はこれらを
液相で還元処理した場合に好適な条件である。しかしな
がら、本発明は、これらを気相還元処理して用いるもの
であることから、酸化処理膜又はそれを液相で還元処理
したものとしての接着強度が最良のものが還元処理後最
良と必ずなるものではない。
Among the above-mentioned methods for forming brown or black copper oxide films, the specific methods that have been put into practical use are those that are suitable for forming the obtained oxidized film itself in a multilayered layered manner, or those that are suitable for forming these into a liquid phase. These conditions are suitable for reduction treatment. However, since the present invention uses these after being subjected to gas phase reduction treatment, the one with the best adhesive strength as an oxidized film or a product obtained by reducing it in a liquid phase is necessarily the best after reduction treatment. It's not a thing.

すなわち、本発明の還元処理前後の銅表面は、顕微鏡写
真や38M写真ではややその凹凸模様が細身と成ってい
るように見えないことはないが、見した範囲内では実質
的にその区別がつかないものであり、酸化銅から酸素が
抜けることによる収縮以外の変化は実質的に起こってい
ない。従って、酸化処理膜の持っている外形は実質的に
保たれるものの、結晶自体は収縮し、凹凸度も縮小した
ものとなると共に、凹凸を形成している銅は酸化銅に比
較して強度が大幅に向上したものと成っている。故に、
酸化処理膜としては、従来に比較して凹凸度の大きい、
やや弱いものであり、汚染の原因などに成りやすい場合
であっても、本発明ではより接着力が向上した処理法と
して適用可能なものである。
In other words, the copper surface before and after the reduction treatment of the present invention does not seem to have a slightly slender uneven pattern in micrographs or 38M photographs, but it is virtually impossible to distinguish between them within the range of observation. There is no substantial change other than shrinkage caused by the loss of oxygen from copper oxide. Therefore, although the external shape of the oxidized film is substantially maintained, the crystal itself shrinks and the degree of unevenness is reduced, and the copper forming the unevenness is stronger than copper oxide. has been significantly improved. Therefore,
As an oxidized film, it has a higher degree of unevenness than conventional films.
Even in cases where the adhesive is somewhat weak and easily causes contamination, the present invention can be applied as a treatment method that further improves the adhesive strength.

上記で褐色或いは黒色処理した内層板を洗浄・清浄化し
た後、本発明の気相還元処理を行った内層板を使用して
、「ハロー」が極めて減少した或いは実質的に発生しな
いものとする。
After washing and cleaning the inner layer plate that has been treated with brown or black color as described above, the inner layer plate that has been subjected to the gas phase reduction treatment of the present invention is used, so that "halo" is extremely reduced or does not occur substantially. .

本発明の内層板を還元処理するヒドラジンガス存在雰囲
気とは、ヒドラジン、ヒドラジン・−水和物、又はメチ
ルヒドラジンのように気化性のヒドラジン誘導体のガス
を含む雰囲気であり、その圧力が処理温度に於ける飽和
蒸気圧以下、好ましくはその50%以下であり、適宜、
非酸化性のガスで希釈してなる気相雰囲気である。
The atmosphere containing hydrazine gas in which the inner layer plate of the present invention is subjected to the reduction treatment is an atmosphere containing gas of a volatile hydrazine derivative such as hydrazine, hydrazine-hydrate, or methylhydrazine, and the pressure thereof is equal to the treatment temperature. saturated vapor pressure or less, preferably 50% or less, and as appropriate,
This is a gas phase atmosphere diluted with non-oxidizing gas.

ヒドラジンガスを供給する方法は、特に限定されるもの
ではなく、例えば、気化性のヒドラジンを蒸発させ、こ
れを非酸化性のガス中に供給すること;気化性のヒドラ
ジン中に非酸化性のガスをバブルさせ、ガス下したヒド
ラジンと共に還元処理場に供給すること;或いは減圧下
に気化性のヒドラジンガスを供給することなどが挙げら
れる。
The method of supplying hydrazine gas is not particularly limited, and examples include evaporating volatile hydrazine and supplying it into non-oxidizing gas; Examples include bubbling the gas and supplying it to a reduction treatment plant together with the degassed hydrazine; or supplying vaporizable hydrazine gas under reduced pressure.

次に、還元処理温度は、通常、140°C以下、好まし
くは130°C〜20°Cの範囲であり、処理時間1分
間〜24時間、好ましくは2〜90分間の範囲から適宜
選択される。ここに上限温度は、主に処理する内層板の
寸法安定性により決定され、下限温度はヒドラジンガス
が凝縮して酸化銅膜に液膜が発生し液膜中で還元反応が
進行して表面状態が著しく変化しない範囲から選択され
る。例えば、温度に比較してヒドラジンガスの圧力が高
い場合には、目に見えるような液相は存在しないにも関
わらず、銅箔表面の凹凸が減少し多層化積層成形後の層
間接着力が低下して(る。従って、ヒドラジンガスの分
圧又は水蒸気の分圧は、その処理温度における飽和蒸気
圧の50%以下の低めに設定し、かつ、還元反応で生成
した水が容易に気相となるように乾燥した状態を保つこ
とが好ましい。
Next, the reduction treatment temperature is usually 140°C or less, preferably in the range of 130°C to 20°C, and the treatment time is appropriately selected from the range of 1 minute to 24 hours, preferably 2 to 90 minutes. . The upper limit temperature here is mainly determined by the dimensional stability of the inner layer plate to be treated, and the lower limit temperature is determined by the hydrazine gas condensing to form a liquid film on the copper oxide film, and the reduction reaction progressing in the liquid film, resulting in the surface condition. is selected from a range in which there is no significant change. For example, when the pressure of hydrazine gas is high compared to the temperature, the unevenness of the copper foil surface decreases and the interlayer adhesive strength after multilayer lamination molding decreases, even though there is no visible liquid phase. Therefore, the partial pressure of hydrazine gas or the partial pressure of water vapor should be set to a low value of 50% or less of the saturated vapor pressure at the processing temperature, and the water produced by the reduction reaction should be easily transferred to the gas phase. It is preferable to keep it in a dry state so that

以上、本発明の気相還元処理を行った内層板は、そのま
ま多層化積層成形に使用して両面が銅箔である多層シー
ルド板とされ、ついで、穴明け、研磨、デスミア処理、
無電解メツキ、電解メツキなどされた後、両表面のプリ
ント配線パターンを形成するなとの方法により多層プリ
ント配線板とされる。
As described above, the inner layer plate subjected to the vapor phase reduction treatment of the present invention is used as it is in multilayer lamination molding to form a multilayer shield plate with copper foil on both sides, and then subjected to drilling, polishing, desmear treatment,
After electroless plating, electrolytic plating, etc., a multilayer printed wiring board is produced by forming printed wiring patterns on both surfaces.

また、本発明の気相還元処理においては、液相還元処理
の如き廃液処理問題が全く発生しないものであり、例え
ば、未反応のヒドラジンカスは水中を通過させれば容易
に除去され、この水溶液に分解触媒と空気を供給すれば
容易に無害なものとなり、また、触媒燃焼装置などに導
き、酸化することも容易である。
In addition, in the gas phase reduction treatment of the present invention, there are no problems with waste liquid treatment as in liquid phase reduction treatment. For example, unreacted hydrazine scum is easily removed by passing it through water, and this aqueous solution If a decomposition catalyst and air are supplied to the decomposition catalyst, it becomes harmless, and it is also easy to lead it to a catalytic combustion device and oxidize it.

〔実施例〕〔Example〕

以下、実施例により本発明を説明する。 The present invention will be explained below with reference to Examples.

実施例1〜3及び比較例1 厚み0.8mm、銅箔厚み70mの両面銅張ガラスエポ
キシ積層板の両面の約半分を公知エツチング法で除去し
た後、銅箔面の黒色酸化処理を従来公知であるNa0H
(15g/ l )/次亜塩素酸ナトリウム(31g/
i! )/リン酸ナトリウム(15g#’)の水溶液で
90℃、5分間処理しにて行い、水洗して黒色酸化処理
内層板を得た。
Examples 1 to 3 and Comparative Example 1 After removing about half of both sides of a double-sided copper-clad glass epoxy laminate with a thickness of 0.8 mm and a copper foil thickness of 70 m using a known etching method, the copper foil surface was subjected to a black oxidation treatment as conventionally known. is Na0H
(15g/l)/sodium hypochlorite (31g/l)
i! )/sodium phosphate (15 g #') at 90° C. for 5 minutes, followed by washing with water to obtain a black oxidized inner layer plate.

黒色酸化処理内層板を、真空吸引可能な乾燥機中に投入
し、常圧で温度130℃、30分間乾燥した後、第1表
に記載の還元処理温度とし、乾燥機内を減圧吸引し、乾
燥した窒素ガスを投入し、再び、真空吸引した後、窒素
ガス中にヒドラジンを下記第1表に示した分圧で供給し
還元処理し、乾燥機から還元処理された内層板を取り出
した。
The black oxidized inner layer plate was placed in a dryer capable of vacuum suction, and after drying at normal pressure at a temperature of 130°C for 30 minutes, the reduction treatment temperature was set as shown in Table 1, and the interior of the dryer was vacuumed and dried. After introducing the nitrogen gas, and vacuum suction again, hydrazine was supplied into the nitrogen gas at the partial pressure shown in Table 1 below for reduction treatment, and the reduced inner layer plate was taken out from the dryer.

上記で得た内層板を用い、その両面にガラスエポキシプ
リプレグ(樹脂量52%、厚み0.1mm)  3枚、
さらに厚みI8−の電解鋼箔を重ねて175℃、40k
g/Ciで2時間積層成形して4層板を得た。
Using the inner layer plate obtained above, 3 sheets of glass epoxy prepreg (resin content 52%, thickness 0.1 mm) were placed on both sides.
Further, layered with electrolytic steel foil with a thickness of I8-, the temperature was 175°C and 40k.
g/Ci for 2 hours to obtain a 4-layer board.

これらの一部について、銅箔の接着強度を測定した。The adhesion strength of copper foil was measured for some of these.

また、残りについて、孔径0.4mmφ、8万r、 p
In addition, for the rest, hole diameter 0.4 mmφ, 80,000 r, p
.

m9.20ts/回転の条件で1.000個、 2.5
4mrnの間隔のドリル孔あけし、この孔あけした4層
板を4NのMCI水溶液に5分間浸漬して内層のある孔
周囲のハローを全孔の任意の1/4(125個)につい
て観察するとともにその最大のものの長さを測定した。
m9.1.000 pieces under the condition of 20ts/rotation, 2.5
Drill holes at intervals of 4 mrn, immerse the drilled 4-layer board in a 4N MCI aqueous solution for 5 minutes, and observe the halo around the hole where the inner layer is located for an arbitrary 1/4 of the holes (125 holes). The length of the largest one was also measured.

結果を第1表に示した。The results are shown in Table 1.

第1表 〔発明の作用および効果〕 以上、詳細な説明および実施例から本発明の製造法によ
る多層プリント板は、多層板のプリント配線間の電気的
導通を行うスルーホールメツキ工程において、メツキ液
に褐色或いは黒色酸化銅が溶解して電気的短絡などの不
良発生の原因となりやすい「ハロー」の発生が大幅に減
少するが、又は全く無くなる。
Table 1 [Operations and Effects of the Invention] From the detailed description and examples above, the multilayer printed board manufactured by the manufacturing method of the present invention is manufactured using a plating solution in the through-hole plating process for establishing electrical continuity between the printed wirings of the multilayer board. The occurrence of "halos", which tend to cause defects such as electrical short circuits due to the dissolution of brown or black copper oxide, is greatly reduced or completely eliminated.

また、内層板の処理は、気相であることがら、スケール
アップも極めて容易なものである。
Furthermore, since the inner layer plate is treated in a gas phase, it is extremely easy to scale up.

また、本発明のヒドラジンガスの使用量或いは分圧は、
低濃度で秋分てあり、爆発限界以下で使用可能であり、
還元処理により発生する廃棄もカスであり、未反応分は
触媒燃焼などにより極めて容易に除去できるものであり
、本質的に無公害である。
Furthermore, the amount or partial pressure of hydrazine gas used in the present invention is as follows:
It has a low concentration and can be used below the explosive limit.
The waste generated by the reduction treatment is also waste, and unreacted components can be removed extremely easily by catalytic combustion, etc., and are essentially non-polluting.

さらに、本発明の気相還元処理され、X線分析にて金属
銅まで還元された銅箔表面形状は、少なくともその顕微
鏡或いはSEMによる表面観察では還元処理前の酸化処
理面と殆ど同等であり、接着用の酸化処理表面との注意
深い比較観察した場合に、やや細身となっているように
見える程度である。このことが、接着力等の物性にも優
れたものであることを裏付けるものである。
Furthermore, the surface shape of the copper foil that has been subjected to the vapor phase reduction treatment of the present invention and reduced to metallic copper by X-ray analysis is almost the same as the oxidized surface before the reduction treatment, at least when the surface is observed using a microscope or SEM. When carefully compared and observed with the oxidized surface for adhesion, it appears to be slightly slender. This proves that it has excellent physical properties such as adhesive strength.

以上であり、本発明の多層板の製造法によれば、信頼性
に優れた多層プリント配線板を生産性よく、無公害で製
造できるもので、工業的な意義は極めて高いものである
As described above, according to the method for manufacturing a multilayer board of the present invention, a multilayer printed wiring board with excellent reliability can be manufactured with high productivity and without pollution, and has extremely high industrial significance.

特許出願人  三菱瓦斯化学株式会社Patent applicant: Mitsubishi Gas Chemical Co., Ltd.

Claims (1)

【特許請求の範囲】 1 多層プリント配線板の製造法において、中間層とし
て用いるプリント配線網を形成した内層板の銅箔面を化
学的に酸化し褐色或いは黒色の酸化銅面を形成した後、
ヒドラジンガス存在雰囲気中で処理してなる内層板を用
いることを特徴とする多層プリント配線板の製造法。 2 該ヒドラジンガスの圧力が、処理温度における飽和
蒸気圧の50%以下である請求項1記載の多層プリント
配線板の製造法。
[Claims] 1. In a method for manufacturing a multilayer printed wiring board, after chemically oxidizing the copper foil surface of an inner layer board on which a printed wiring network used as an intermediate layer is formed to form a brown or black copper oxide surface,
A method for manufacturing a multilayer printed wiring board, characterized by using an inner layer board processed in an atmosphere containing hydrazine gas. 2. The method for manufacturing a multilayer printed wiring board according to claim 1, wherein the pressure of the hydrazine gas is 50% or less of the saturated vapor pressure at the processing temperature.
JP2277884A 1990-07-30 1990-10-18 Manufacture of multilayer printed board Pending JPH04154193A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2277884A JPH04154193A (en) 1990-10-18 1990-10-18 Manufacture of multilayer printed board
DE69122573T DE69122573T2 (en) 1990-07-30 1991-07-25 Process for the production of multilayer boards
EP91112509A EP0469470B1 (en) 1990-07-30 1991-07-25 Process for producing multilayered printed board
US07/738,013 US5252355A (en) 1990-07-30 1991-07-30 Process for producing multilayered printed board
KR1019910013125A KR940009177B1 (en) 1990-07-30 1991-07-30 Manufacture of multi-layer printed

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2277884A JPH04154193A (en) 1990-10-18 1990-10-18 Manufacture of multilayer printed board

Publications (1)

Publication Number Publication Date
JPH04154193A true JPH04154193A (en) 1992-05-27

Family

ID=17589633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2277884A Pending JPH04154193A (en) 1990-07-30 1990-10-18 Manufacture of multilayer printed board

Country Status (1)

Country Link
JP (1) JPH04154193A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180135915A (en) * 2016-04-16 2018-12-21 라시크 아이엔씨. Method, system and apparatus for transferring process gas

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180135915A (en) * 2016-04-16 2018-12-21 라시크 아이엔씨. Method, system and apparatus for transferring process gas
JP2019521948A (en) * 2016-04-16 2019-08-08 ラサーク インコーポレイテッド Method, system and apparatus for delivery of process gas

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