JPH01295494A - Manufacture of multilayer printed board - Google Patents

Manufacture of multilayer printed board

Info

Publication number
JPH01295494A
JPH01295494A JP12490288A JP12490288A JPH01295494A JP H01295494 A JPH01295494 A JP H01295494A JP 12490288 A JP12490288 A JP 12490288A JP 12490288 A JP12490288 A JP 12490288A JP H01295494 A JPH01295494 A JP H01295494A
Authority
JP
Japan
Prior art keywords
inner layer
cyanato
printed wiring
copper oxide
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12490288A
Other languages
Japanese (ja)
Inventor
Morio Take
杜夫 岳
Atsushi Yokoi
淳 横井
Takamasa Nakai
中井 孝昌
Yoshitaka Miura
三浦 美孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP12490288A priority Critical patent/JPH01295494A/en
Publication of JPH01295494A publication Critical patent/JPH01295494A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/385Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by conversion of the surface of the metal, e.g. by oxidation, whether or not followed by reaction or removal of the converted layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To prevent the generation of hollows, by using an inner layer plate obtained by a method wherein, after a black or brown copper oxide surface is formed, said copper oxide surface is treated by dilute solution of specified cyanato compound, and dried. CONSTITUTION:For an inner layer plate wherein printed wiring network for the inner layer is formed for an intermediate layer, the following is used; a copper foil surface is chemically oxidized, a black or brown copper oxide surface is formed, and the copper oxide foil surface is treated by dilute solution of cyanato compound having two or more cyanato radicals in a molecule, thereby obtaining the inner layer plate to be used after drying. As the cyanato compound having two or more cyanato radicals in a molecule, the following are used; for example, 1,3- or 1,4-dicyanatobenzene, 1,3,5-tricyanatobenzene, 1,3- 1,4- 1,6- 1,8- 2,6- or 2,7-dicyanatonaphthalene, and 1,3,6-tricyanatonaphthalene. Thereby, the generation of hollows can be prevented.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、中間層(内層)となるプリント配線板の銅箔
面の処理方法を特徴とする多層プリント配線板の製造法
であり、特に、多層プリント配線板の製造工程で孔壁に
露出している酸化銅から酸性水溶液の作用で酸化銅が溶
けることによるハローの減少或いは無くしたものである
[Detailed Description of the Invention] [Industrial Application Field] The present invention is a method for manufacturing a multilayer printed wiring board, which is characterized by a method for treating a copper foil surface of a printed wiring board serving as an intermediate layer (inner layer). , the halo is reduced or eliminated due to the copper oxide exposed on the hole wall being dissolved by the action of an acidic aqueous solution during the manufacturing process of a multilayer printed wiring board.

〔従来の技術およびその問題点〕[Conventional technology and its problems]

多層プリント板において、中間層とするプリント配線網
の形成された内層板の多層化接着力を向上させる方法と
しては、化学的或いは電気化学的に処理して予め両面が
凹凸化された銅箔を使用したものを用いる方法;内層用
のプリント配線網を形成した後、化学的処理により銅箔
表面に酸化銅膜を形成する方法;内層用のプリント配線
網を形成した後、光沢性の銅箔面をシランカップリング
剤で処理する方法などが知られている。
In a multilayer printed board, a method for improving the multilayer adhesion of an inner layer board on which a printed wiring network is formed is to use copper foil that has been chemically or electrochemically treated to have roughness on both sides. A method of using a printed wiring network for the inner layer, and then forming a copper oxide film on the surface of the copper foil by chemical treatment; After forming a printed wiring network for the inner layer, a glossy copper foil is used. A method of treating the surface with a silane coupling agent is known.

しかし、予め両面が凹凸化された銅箔を使用する方法は
、銅箔が高価であること、又、銅箔をエツチング処理し
てプリント配線網を形成した場合のエツチングされた銅
箔側面(エツチング面)は何らの接着力を向上させる為
の処理がなされていないという欠点を有し、又、光沢性
の銅箔面をシランカップリング剤で処理する方法は接着
力が不足し易い欠点がある。また銅箔面を酸化処理する
方法にも種々あるが、種類によっては接着力が不足する
ものが多い。
However, the method of using copper foil that has been textured on both sides in advance has the disadvantage that the copper foil is expensive, and that when a printed wiring network is formed by etching the copper foil, the side surfaces of the etched copper foil (etched The disadvantage is that there is no treatment to improve the adhesive strength, and the method of treating the glossy copper foil surface with a silane coupling agent has the disadvantage that the adhesive strength tends to be insufficient. . There are also various methods of oxidizing the copper foil surface, but many of them lack adhesive strength depending on the type.

この為、中間層用のプリント配線板としては、通常、光
沢面を有する銅張積層板の片面或いは両面に内層用のプ
リント配線網を形成した後、N a OItと次亜塩素
酸ソーダなどの加温した濃アルカリ水溶液中に浸漬し、
その後、水洗・乾燥して酸化第1銅や酸化第2銅膜から
なる褐色或いは黒色の皮膜を形成したものが、接着力や
経済性から用いられる。ところが、この酸化銅膜、特に
酸化第2銅は塩酸、硫酸などの酸性水溶液に溶けやすい
欠点を有している。このため、積層成形された多層板に
小孔をあけ、スルーホールメツキ工程や無電解メツキ又
はその後の電解メツキ工程などを施す場合、孔壁に露出
した酸化銅膜が酸性液により溶かされる、いわゆる「ハ
ロー」現象が発生する。ハローは、絶縁性などのプリン
ト配線板の信頼性の低下の原因となる。
For this reason, for printed wiring boards for intermediate layers, after forming a printed wiring network for inner layers on one or both sides of a glossy copper-clad laminate, a layer of NaOIt and sodium hypochlorite or the like is usually used. immersed in a heated concentrated alkaline aqueous solution,
Thereafter, it is washed with water and dried to form a brown or black film made of cuprous oxide or cupric oxide, which is used for its adhesive strength and economic efficiency. However, this copper oxide film, particularly cupric oxide, has the disadvantage that it easily dissolves in acidic aqueous solutions such as hydrochloric acid and sulfuric acid. For this reason, when making small holes in a laminated multilayer board and performing a through-hole plating process, electroless plating process, or subsequent electrolytic plating process, the copper oxide film exposed on the hole wall is dissolved by the acidic liquid. A "halo" phenomenon occurs. Halos cause a decrease in the reliability of printed wiring boards, such as insulation properties.

〔問題点を解決するための手段〕[Means for solving problems]

本発明者らは、褐色或いは黒色酸化銅処理の優れた接着
性と経済性とを活かし、しかもハローの発生を著しく防
止する容易な方法について鋭意検討した結果、多官能性
シアナト化合物処理を見出し、本発明を完成させるに至
った。
The inventors of the present invention have conducted extensive research into an easy method that takes advantage of the excellent adhesion and economic efficiency of brown or black copper oxide treatment and also significantly prevents the formation of halos, and as a result, they have discovered a polyfunctional cyanato compound treatment. The present invention has now been completed.

すなわち、本発明は、多層プリント配線板の製造法にお
いて、中間層として用いるプリント配線網を形成した内
層板の銅箔面を化学的に酸化し黒色或いは褐色の酸化銅
面を形成した後、1分子中に2個以上のシアナト基を有
するシアナト化合物の希薄溶液で該酸化銅面を処理し、
乾燥してなる内層板を用いることを特徴とする多層プリ
ント配線板の製造法である。
That is, in the method of manufacturing a multilayer printed wiring board, the present invention involves chemically oxidizing the copper foil surface of an inner layer board on which a printed wiring network used as an intermediate layer is formed to form a black or brown copper oxide surface; treating the copper oxide surface with a dilute solution of a cyanato compound having two or more cyanato groups in the molecule,
This is a method for manufacturing a multilayer printed wiring board characterized by using a dried inner layer board.

以下、本発明の構成について説明する。The configuration of the present invention will be explained below.

本発明の多層プリント配線板とは、上記した中間層に使
用する内層用プリント配線網を形成した内層板として銅
箔面を化学的に酸化し黒色或いは褐色の酸化銅面を形成
した後、1分子中に2個以上のシアナト基を有するシア
ナト化合物の希薄溶液で該酸化銅箔面を処理し、乾燥し
てなるものを使用する他は、多層化積層成形に使用する
内層板、多層化接着に使用するプリプレグ、外層を形成
するためのプリプレグおよび銅箔或いは片面銅張積層板
などの積層材料並びに積層成形の方法など従来公知のも
の並びに方法が使用できるもきであり、特に限定されな
いものである。
The multilayer printed wiring board of the present invention is an inner layer board on which an inner layer printed wiring network used for the above-mentioned intermediate layer is formed, and after chemically oxidizing a copper foil surface to form a black or brown copper oxide surface, In addition to treating the surface of the copper oxide foil with a dilute solution of a cyanato compound having two or more cyanato groups in the molecule and drying it, we also use inner layer plates and multilayer adhesives used in multilayer lamination molding. Conventionally known materials and methods can be used, such as prepreg used for forming the outer layer, prepreg for forming the outer layer, laminated materials such as copper foil or single-sided copper-clad laminate, and laminated molding methods, and are not particularly limited. be.

このような積層材料はEガラス、Sガラス、Dガラス、
石英ガラスなどの種々のガラス織布、アルミナペーパー
などの無機質の織布機材:全芳香属ポリアミド、ポリイ
ミド、フッ素樹脂、ポリフェニレンサルファイド、ポリ
エーテルエーテルケトン、ポリエーテルイミド、その他
の超耐熱性樹脂製の織布;上記の無機質の繊維と超耐熱
製樹脂製の繊維とを用いた複合糸を使用した織布;上記
を適宜組み合わせたものなどの織布を補強基材とし、ビ
スフェノールA型、ノボラック型、ノ飄ロゲン化ビスフ
ェノールA型、ハロゲン化ノボラック型、その他の3官
能以上の多官能性エポキシ化合物などのエポキシ樹脂;
シアナト樹脂、シアン酸エステル−エポキシ樹脂、シア
ン酸エステル−マレイミド−エポキシ樹脂などを典型と
するシアン酸エステル系樹脂;ビスマレイミドなどの多
官能性マレイミド類とビス(4−アミノフェニル)メタ
ンなどの多官能性アミンを主成分とするマレイミド系樹
脂;さらには耐熱性の熱可塑性樹脂や熱可塑性樹脂と熱
硬化性樹脂との組成物からなる樹脂などを使用してなる
プリプレグ、電解銅箔や圧延銅箔などの銅箔、銅箔とプ
リプレグとを積層成形してなる両面或いは片面銅張積層
板、銅張積層板の片面或いは両面に内層用のプリント配
線網を形成した内層用プリント配線板(内層板)が例示
される。また積層成形方法としては、従来の熱盤プレス
、熱盤真空プレス、オートクレーブ成形などが例示され
る。
Such laminated materials include E glass, S glass, D glass,
Various glass woven fabrics such as quartz glass, inorganic woven fabrics such as alumina paper: Fully aromatic polyamide, polyimide, fluororesin, polyphenylene sulfide, polyetheretherketone, polyetherimide, and other super heat-resistant resins. Woven fabric: Woven fabric using composite yarn using the above-mentioned inorganic fibers and super heat-resistant resin fibers; Woven fabric such as a suitable combination of the above is used as a reinforcing base material, and bisphenol A type, novolac type , epoxy resins such as halogenated bisphenol A type, halogenated novolac type, and other trifunctional or higher polyfunctional epoxy compounds;
Cyanate ester resins, typically cyanate resins, cyanate ester-epoxy resins, cyanate ester-maleimide-epoxy resins; Maleimide resins whose main component is functional amines; prepregs made of heat-resistant thermoplastic resins and resins made of compositions of thermoplastic resins and thermosetting resins; electrolytic copper foils and rolled copper. Copper foil such as foil, double-sided or single-sided copper-clad laminate made by laminating and molding copper foil and prepreg, inner-layer printed wiring board (inner-layer printed wiring board) with inner-layer printed wiring network formed on one or both sides of copper-clad laminate board) is exemplified. Examples of the lamination molding method include conventional hot plate press, hot plate vacuum press, and autoclave molding.

本発明の内層板に褐色或いは黒色の酸化銅皮膜を形成す
る方法は公知であり、通常、内層板の銅箔面を研磨、洗
浄した後、塩化銅又は過硫酸アンモニウムなどの水溶液
によりプレエツチングした後、酸化性水溶液で処理する
方法で行う。ここに、酸化性水溶液並びに処理条件とし
ては具体的には下記の如きものが例示されるが、これら
に限定されるものではなく、公知方法が使用できる。
The method of forming a brown or black copper oxide film on the inner layer plate of the present invention is known, and is usually performed after polishing and cleaning the copper foil surface of the inner layer plate, and then pre-etching with an aqueous solution such as copper chloride or ammonium persulfate. , treatment with an oxidizing aqueous solution. Here, the oxidizing aqueous solution and treatment conditions are specifically exemplified below, but are not limited thereto, and known methods can be used.

■、水酸化ナトリウム(Na011 (15g/ 1 
))/次亜塩素酸ナトリウム(NaC10z (31g
/ (1))/リン酸ナトリウム(15g#) 、70
〜100℃、0.5〜10分間。
■, Sodium hydroxide (Na011 (15g/1
))/Sodium hypochlorite (NaC10z (31g)
/ (1)) / Sodium phosphate (15g#), 70
~100°C, 0.5-10 minutes.

■、硫酸銅(50g/ l ) /塩化ナトリウム(2
00g、#)、40〜80℃、3〜15分間。
■, Copper sulfate (50g/l)/sodium chloride (2
00g, #), 40-80°C, 3-15 minutes.

■、酢酸(20g/l)/塩化アンモニウム(20g/
 1 )/酢酸銅(10g#り 、30〜80℃、1〜
10分間。
■, acetic acid (20g/l)/ammonium chloride (20g/l)
1)/Copper acetate (10g #, 30~80℃, 1~
10 minutes.

■、酢酸銅(10g/l)/硫酸銅(24g/ II 
) /硫化バリウム(24g/ 12 ) /塩化アン
モニウム(24g/ j2 )、40〜50℃、 1〜
10分間。
■, Copper acetate (10g/l)/Copper sulfate (24g/II
)/Barium sulfide (24g/12)/Ammonium chloride (24g/j2), 40~50℃, 1~
10 minutes.

■、硫酸銅(25g/ (1) /硫酸ニッケル(25
g/ 12 ) /塩素酸カリウム(25g/l 、7
0〜90℃、1〜10分間。
■, Copper sulfate (25g/ (1) / Nickel sulfate (25
g/12)/potassium chlorate (25g/l, 7
0-90°C, 1-10 minutes.

上記で黒色或いは褐色処理した内層板を清浄化した後、
1分子中に2個以上のシアナト基を有するシアナト化合
物の希薄溶液で処理し乾燥して該酸化銅面にシアナト化
合物層を形成した内層板を本発明においては使用して、
「ハロー」の発生を減少或いは無くする。
After cleaning the inner layer plate treated with black or brown as above,
In the present invention, an inner layer plate is used, which is treated with a dilute solution of a cyanato compound having two or more cyanato groups in one molecule and dried to form a cyanato compound layer on the copper oxide surface.
Reduce or eliminate the occurrence of "halo".

ここに、本発明の1分子中に2個以上のシアナト基を有
するシアナト化合物として好適なものは、下記一般式(
1); %式%(1) (式中のmは2以上、通常5以下の整数であり、Rは芳
香族の有機基であって、上記シアナト基は該有機基の芳
香環に結合しているもの) で表される化合物である。具体的な化合物としては1.
3−又は1.4−ジシアナトベンゼン、1.3.5− 
)リシアナトベンゼン、1.3−、1.4−、1.6−
、1.8−、2.6−又は2.7−ジシアナトナフタレ
ン、1.3.6− )リシアナトナフタレン、4.4’
−ジシアナトビフェニル、ビス(4−シアナトフェニル
)メタン、2,2−ビス(4−シアナトフェニル)プロ
パン、2.2−ビス(3,5−ジクロロ−4=シアナト
フエニル)プロパン、2.2−ビス(3,5−ジメチル
−4−シアナトフェニル)プロパン、2,2−ビス(3
,5−ジブロモ−4−シアナトフェニル)プロパン、ビ
ス(4−シアナトフェニル)エーテル、ビス(4−シア
ナトフェニル)チオエーテル、ビス(4−シアナトフェ
ニル)スルホン、トリス(4−シアナトフェニル)ホス
ファイト、トリス(4−シアナトフェニル)ホスフェー
ト、および末端OH基含有ポリカーボネートオリゴマー
とハo/7’ン化シアンとの反応によりえられるシアン
酸エステル(USP−4026913) 、/ボラック
とハロゲン化シアンとの反応により得られるシアン酸エ
ステル(USP−4022755、USP−34480
79)、およびポリヒドロキシ−スチリル−ピリジン等
とハロゲン化シアンとの反応により得られるスチリル−
ピリジン−シアネート (口5P−4578439)な
どである。これらのほかに特公昭41−1928 、同
43−18468、同44−4791、同45−117
12、同46−41112、同47−26853、特開
昭51−63149、USP−3553244,375
5402,3740348,3595900、3694
410及び4116946などに記載のシアン酸エステ
ルが例示される。
Here, preferred cyanato compounds having two or more cyanato groups in one molecule of the present invention are represented by the following general formula (
1); % formula % (1) (m in the formula is an integer of 2 or more and usually 5 or less, R is an aromatic organic group, and the cyanato group is bonded to the aromatic ring of the organic group. It is a compound represented by Specific compounds include 1.
3- or 1,4-dicyanatobenzene, 1.3.5-
) Lecyanatobenzene, 1.3-, 1.4-, 1.6-
, 1.8-, 2.6- or 2.7-dicyanatonaphthalene, 1.3.6-) dicyanatonaphthalene, 4.4'
-dicyanatobiphenyl, bis(4-cyanatophenyl)methane, 2,2-bis(4-cyanatophenyl)propane, 2.2-bis(3,5-dichloro-4=cyanatophenyl)propane, 2.2 -bis(3,5-dimethyl-4-cyanatophenyl)propane, 2,2-bis(3
, 5-dibromo-4-cyanatophenyl)propane, bis(4-cyanatophenyl)ether, bis(4-cyanatophenyl)thioether, bis(4-cyanatophenyl)sulfone, tris(4-cyanatophenyl) ) phosphite, tris(4-cyanatophenyl) phosphate, and a cyanate ester obtained by the reaction of a polycarbonate oligomer containing terminal OH groups with cyanide halogenated (USP-4026913), /borac and halogenated Cyanic acid esters obtained by reaction with cyanide (USP-4022755, USP-34480
79), and styryl-styryl obtained by reacting polyhydroxy-styryl-pyridine etc. with cyanogen halide.
Pyridine-cyanate (5P-4578439) and the like. In addition to these, Special Publications No. 41-1928, No. 43-18468, No. 44-4791, No. 45-117
12, 46-41112, 47-26853, JP-A-51-63149, USP-3553244,375
5402, 3740348, 3595900, 3694
Examples include cyanate esters described in 410 and 4116946.

また、上述した多官能性シアン酸エステルを単に加熱す
るか又は触媒の存在下に重合させてシアン酸エステル中
のシアン基が三量化することによって形成されるsym
 −)リアジン環を有する数平均分子量300〜6.0
00のプレポリマー、さらにアミンとのプレポリマーと
しても、また、シアナト化合物はエポキシ樹脂、シラン
タップリング剤などを混合したものとしても使用できる
In addition, sym is formed by simply heating the above-mentioned polyfunctional cyanate ester or by polymerizing it in the presence of a catalyst to trimerize the cyanide groups in the cyanate ester.
-) Number average molecular weight 300 to 6.0 with riazine ring
The cyanato compound can be used as a prepolymer of 00 or as a prepolymer with an amine, or as a mixture with an epoxy resin, a silane tapping agent, etc.

しかし、本発明で使用する黒色或いは褐色の酸化銅膜は
微細な多孔質状となっており、この膜中の孔を含む全面
に均質にシアナト化合物の膜を形成することが好ましい
こと、さらに中間層用のプリント配線板に付着させる厚
みとしては11以下でも十分に効果を示すものであるこ
とからモノマー乃至低分子量のものが好適である。
However, the black or brown copper oxide film used in the present invention has fine pores, and it is preferable to form a cyanato compound film homogeneously over the entire surface including the pores in the film, and furthermore, As for the thickness of the layer to be adhered to the printed wiring board, monomers or those of low molecular weight are preferable because they are sufficiently effective even at a thickness of 11 or less.

上記のシアナト化合物の溶媒としては、シアナト化合物
の公知の溶媒であればいずれも使用可能であり、具体的
にはアセトン、メチルエチルケトンなどのケトン類;ベ
ンゼン、トルエン、キシレンなどの芳香族炭化水素;塩
化メチレン、トメチルピロリドン、酢酸ビニル、アセト
ニトリル、酢酸エチル、エチレングリコールジメチルエ
ーテルその他種々の溶媒が挙げられる。
As the solvent for the above cyanato compound, any known solvent for cyanato compounds can be used; specifically, ketones such as acetone and methyl ethyl ketone; aromatic hydrocarbons such as benzene, toluene, and xylene; and chloride. Examples include methylene, tomethylpyrrolidone, vinyl acetate, acetonitrile, ethyl acetate, ethylene glycol dimethyl ether and other various solvents.

希薄溶液とした場合の濃度としては特に制限はないが、
好適には0.001〜3.0重量%の範囲であり、有機
金属塩類、その他のシアナト化合物の公知の触媒を併用
してもよい。
There is no particular limit to the concentration when it is made into a dilute solution, but
It is preferably in the range of 0.001 to 3.0% by weight, and known catalysts such as organic metal salts and other cyanato compounds may be used in combination.

上記のシアナト化合物の希薄溶液で内層板を処理する方
法は、公知方法でよく、具体的には内層板を上記の希薄
溶液中に浸漬する方法、内層板に希薄溶液をスプレー、
刷毛、コーターなどで塗布する方法が例示される。
The method for treating the inner layer plate with the above-mentioned dilute solution of the cyanato compound may be any known method, such as immersing the inner layer plate in the above-mentioned dilute solution, spraying the inner layer plate with the dilute solution,
Examples include methods of applying with a brush, coater, etc.

処理済の内層板を風乾、加熱などの公知の方法で乾繰し
て少なくとも溶剤を除去して本発明の処理された内層板
とする。
The treated inner layer plate is dried by a known method such as air drying or heating to remove at least the solvent, thereby obtaining the treated inner layer plate of the present invention.

〔実施例〕〔Example〕

以下、実施例により本発明を説明する。 The present invention will be explained below with reference to Examples.

なお、実施例中の%は重量基準である。Note that the percentages in the examples are based on weight.

実施例 1 厚み1 n++n、銅箔厚み70虜の両面銅張ガラスエ
ポキシ積層板の両面にモデルパターンを公知エツチング
法で形成した後、NaOH(15g/ l ) /次亜
塩素酸ナトリウム(31g/β)/リン酸ナトリウム(
15g/ l)の水溶液で95℃、5分間処理し、水洗
し、130℃、30分間乾繰して黒色酸化銅処理内層板
を得た。
Example 1 After forming a model pattern on both sides of a double-sided copper-clad glass epoxy laminate with a thickness of 1n++n and a copper foil thickness of 70mm by a known etching method, NaOH (15g/l)/sodium hypochlorite (31g/β) )/sodium phosphate (
A black copper oxide treated inner layer plate was obtained by treating with an aqueous solution of 15 g/l) at 95°C for 5 minutes, washing with water, and drying at 130°C for 30 minutes.

この内層板をそれぞれ2,2−ビス(4−シアナトフェ
ニル)プロパンの濃度0.05.0,1.0.5.1.
0゜3.0%のメチルエチルケトン溶液に浸漬した後、
130℃、30分間乾繰して処理内層板を得た。
This inner layer plate was coated with a concentration of 2,2-bis(4-cyanatophenyl)propane of 0.05.0, 1.0.5.1, respectively.
After immersion in 0°3.0% methyl ethyl ketone solution,
A treated inner layer plate was obtained by drying at 130°C for 30 minutes.

黒色酸化銅処理並びに処理内層板の両面にそれぞれガラ
スエポキシプリプレグ(樹脂量52%、厚み0.1mm
)  3枚、さらに厚み18−の電解銅箔を重ねて温度
175℃、圧力40kg/cafで2時間積層成形して
4層シールド板とした後、冷却し、次いで孔径0.4閣
φ、8万r、p、m、、 20−/回転の条件で1,0
00個、 2.54mmの間隔の孔あけした。
Black copper oxide treatment and glass epoxy prepreg (resin content 52%, thickness 0.1mm
) Three sheets of electrolytic copper foil with a thickness of 18 mm were stacked and laminated for 2 hours at a temperature of 175° C. and a pressure of 40 kg/caf to form a 4-layer shield plate, and then cooled, and then the hole diameter was 0.4 mm, 8 mm. 1,0,000 r, p, m, 20-/rotation condition
00 holes were drilled at intervals of 2.54 mm.

この孔あけした4層シールド板を4NのHCI水溶液に
5分間浸漬して内層の孔周囲のハローを観察するととも
にその長さを測定した。
This perforated four-layer shield plate was immersed in a 4N HCI aqueous solution for 5 minutes, and the halo around the hole in the inner layer was observed and its length was measured.

又、孔あけした4層シールド板を5cm角に取り、12
1℃、2気圧、3時間水蒸気処理(=PCT) した後
、260℃のハンダに30秒浸漬する試験をした。
Also, take a 5cm square piece of the 4-layer shield plate with holes, and
After steam treatment (PCT) at 1°C and 2 atm for 3 hours, a test was conducted by immersing it in solder at 260°C for 30 seconds.

結果を第1表に示した。The results are shown in Table 1.

第1表 実施例 2 実施例1において、内層板として両面銅張ガラスシアン
酸エステル−マレイミド−エポキシ樹脂積層板(三菱瓦
斯化学Gl製、HL 810)を用いたものを使用し、
多層化接着用プリプレグとしてガラスシアン酸エステル
−マレイミド−エポキシ樹脂プリプレグ(三菱瓦斯化学
0勾製、GHPL 810)を用い、表面処理用シアナ
ト化合物の希薄溶液として1.4−ジシアナトベンゼン
溶解したものを用い、多層化積層成形条件を温度200
℃、2時間に変更する他は同様とした。結果を第2表に
示した。
Table 1 Example 2 In Example 1, a double-sided copper-clad glass cyanate ester-maleimide-epoxy resin laminate (manufactured by Mitsubishi Gas Chemical GL, HL 810) was used as the inner layer board.
A glass cyanate ester-maleimide-epoxy resin prepreg (manufactured by Mitsubishi Gas Chemical Co., Ltd., GHPL 810) was used as a prepreg for multilayer adhesion, and a dilute solution of a cyanato compound for surface treatment in which 1,4-dicyanatobenzene was dissolved was used. using multilayer lamination molding conditions at a temperature of 200
The procedure was the same except that the temperature was changed to 2 hours. The results are shown in Table 2.

第2表 〔発明の作用および効果〕 以上、詳細な説明および実施例から本発明の製造法によ
る多層プリント板は、多層板のプリント配線間の電気的
導通を行うスルーホールメツキ工程において、メツキ液
に褐色或いは黒色酸化銅が溶解して電気的短絡などの不
良発生の原因となりやすい「ハロー」の発生が大幅に減
少するか、又は全く無くなるものであり、信顆性に優れ
た多層プリント配線板を提供出来るものであり、工業的
な意義は極めて高いものである。
Table 2 [Operations and Effects of the Invention] From the detailed description and examples above, the multilayer printed board manufactured by the manufacturing method of the present invention is manufactured using a plating solution in the through-hole plating process for establishing electrical continuity between the printed wirings of the multilayer board. A multilayer printed wiring board with excellent reliability, as the occurrence of "halos", which tend to cause defects such as electrical short circuits due to the dissolution of brown or black copper oxide, is greatly reduced or completely eliminated. It is of extremely high industrial significance.

特許出願人  三菱瓦斯化学株式会社Patent applicant: Mitsubishi Gas Chemical Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 多層プリント配線板の製造法において、中間層として用
いるプリント配線網を形成した内層板の銅箔面を化学的
に酸化し黒色或いは褐色の酸化銅面を形成した後、1分
子中に2個以上のシアナト基を有するシアナト化合物の
希薄溶液で該酸化銅面を処理し、乾燥してなる内層板を
用いることを特徴とする多層プリント配線板の製造法。
In the manufacturing method of multilayer printed wiring boards, after chemically oxidizing the copper foil surface of the inner layer board that forms the printed wiring network used as the intermediate layer to form a black or brown copper oxide surface, two or more oxides in one molecule are formed. 1. A method for producing a multilayer printed wiring board, comprising treating the copper oxide surface with a dilute solution of a cyanato compound having a cyanato group and drying the inner layer.
JP12490288A 1988-05-24 1988-05-24 Manufacture of multilayer printed board Pending JPH01295494A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12490288A JPH01295494A (en) 1988-05-24 1988-05-24 Manufacture of multilayer printed board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12490288A JPH01295494A (en) 1988-05-24 1988-05-24 Manufacture of multilayer printed board

Publications (1)

Publication Number Publication Date
JPH01295494A true JPH01295494A (en) 1989-11-29

Family

ID=14896937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12490288A Pending JPH01295494A (en) 1988-05-24 1988-05-24 Manufacture of multilayer printed board

Country Status (1)

Country Link
JP (1) JPH01295494A (en)

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