JPH0267248A - Novel (meth)acrylic ester - Google Patents
Novel (meth)acrylic esterInfo
- Publication number
- JPH0267248A JPH0267248A JP63217300A JP21730088A JPH0267248A JP H0267248 A JPH0267248 A JP H0267248A JP 63217300 A JP63217300 A JP 63217300A JP 21730088 A JP21730088 A JP 21730088A JP H0267248 A JPH0267248 A JP H0267248A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- optical
- meth
- compound
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 acrylic ester Chemical class 0.000 title claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 5
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 230000003287 optical effect Effects 0.000 abstract description 17
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract description 10
- 238000006243 chemical reaction Methods 0.000 abstract description 10
- 239000011347 resin Substances 0.000 abstract description 10
- 229920005989 resin Polymers 0.000 abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 8
- 239000000178 monomer Substances 0.000 abstract description 7
- 229920000642 polymer Polymers 0.000 abstract description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 6
- 150000001875 compounds Chemical class 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 5
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 abstract description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 abstract description 2
- 230000018044 dehydration Effects 0.000 abstract description 2
- 238000006297 dehydration reaction Methods 0.000 abstract description 2
- 125000005395 methacrylic acid group Chemical group 0.000 abstract description 2
- 239000013307 optical fiber Substances 0.000 abstract description 2
- 230000005693 optoelectronics Effects 0.000 abstract description 2
- 238000009833 condensation Methods 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 238000007789 sealing Methods 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 21
- 238000000034 method Methods 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- 239000007789 gas Substances 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 6
- 238000005160 1H NMR spectroscopy Methods 0.000 description 5
- 238000002329 infrared spectrum Methods 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- HSPRVWPULGKMRC-UHFFFAOYSA-N 57526-50-8 Chemical compound C12CCCC2C2CC(CO)C1C2 HSPRVWPULGKMRC-UHFFFAOYSA-N 0.000 description 3
- KQMQVQGNEANJEG-UHFFFAOYSA-N CO.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1 Chemical compound CO.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1 KQMQVQGNEANJEG-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 2
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 2
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000000039 congener Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229920006037 cross link polymer Polymers 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔発明の背景〕
(産業上の利用分野)
本発明は、新規なトリシクロデカン構造又はペンタシク
ロペンタデカン構造を有する耐熱性、耐水性および光学
特性が優れた樹脂原料(メタ)アクリル酸エステルに関
する。なお、本発明で「(メタ)アクリル酸エステル」
ということは、アクリル酸エステルおよびメタクリル酸
エステルのいずれをも意味するものである。DETAILED DESCRIPTION OF THE INVENTION [Background of the Invention] (Industrial Application Field) The present invention provides a resin raw material having a novel tricyclodecane structure or pentacyclopentadecane structure and having excellent heat resistance, water resistance, and optical properties ( Regarding meth)acrylic acid ester. In addition, in the present invention, "(meth)acrylic acid ester"
This means both acrylic esters and methacrylic esters.
(従来の技術)
メタクリル酸メチルを構成単位とするメタクリル系樹脂
(PMMA樹脂)は、良好な光学特性を持ち、軽量かつ
成型が容易なことより、多方面に使用されて、近年需要
が増大しつつある。(Prior art) Methacrylic resin (PMMA resin), which has methyl methacrylate as a constituent unit, has good optical properties, is lightweight and easy to mold, and is used in many fields, and demand has increased in recent years. It's coming.
しかし、一方では、用途が拡がるにつれて原料樹脂に要
求される性能も高くなり、その改良を要望される分野も
ある。例えば、光学用素子として使用する場合は、その
樹脂特性としてポリオレフィン系樹脂、ポリスチレン系
樹脂、あるいはポリカーボネート系樹脂に比べて吸水性
が大きいという欠点があり、環境条件変化によって寸法
変化、ソリ、屈折率の変化等を生じるので、光学系とし
ては不安定である。しかしながら、PMMA樹脂を用い
た光学用素子は、樹脂の吸湿による寸法変化を除けば非
常に優れており、近年、PMMA樹脂と同等の光学特性
を有しつつ吸湿性を改善を試みた新しい樹脂が検討され
つつある。例えば、特開昭58−5318号公報、特開
昭58−5354号公報、および特開昭58−1151
5号公報に、メタクリル酸メチルにメタクリル酸シクロ
ヘキシルやメタクリル酸ベンジルを共重合させることが
提案されている。しかし、これらの共重合体は、確かに
吸湿性は改良されるものの、耐熱性が低下するという問
題も生じる。However, on the other hand, as the uses expand, the performance required of the raw material resin also increases, and there are fields in which improvements are desired. For example, when used as an optical element, the resin has the disadvantage of higher water absorption than polyolefin resin, polystyrene resin, or polycarbonate resin, and changes in environmental conditions may cause dimensional changes, warping, and refractive index. This causes changes in the optical system, making it unstable as an optical system. However, optical elements using PMMA resin are very good except for dimensional changes due to moisture absorption of the resin, and in recent years, new resins that have optical properties equivalent to PMMA resin but have improved moisture absorption have been developed. It is being considered. For example, JP-A-58-5318, JP-A-58-5354, and JP-A-58-1151.
No. 5 proposes copolymerizing methyl methacrylate with cyclohexyl methacrylate or benzyl methacrylate. However, although these copolymers certainly have improved hygroscopicity, they also have the problem of reduced heat resistance.
更に、耐熱性向上のために、特開昭58−113214
号公報、および特開昭58−183714号公報に、メ
タクリルアミドや無水マレイン酸との共重合が提案され
ているが、未だ充分とはいえない。Furthermore, in order to improve heat resistance, JP-A-58-113214
Copolymerization with methacrylamide and maleic anhydride has been proposed in Japanese Patent Application Laid-Open No. 58-183714, but it is still not satisfactory.
(発明が解決しようとする問題点)
本発明は、上記の様な問題点を解決し、光学特性、耐熱
性、および耐水性が優れた樹脂の原料モノマーを提供し
ようとするものである。(Problems to be Solved by the Invention) The present invention aims to solve the above-mentioned problems and provide a raw material monomer for a resin having excellent optical properties, heat resistance, and water resistance.
(問題を解決するための手段)
本発明の新規な化合物は、下記−数式CI)で表わされ
るものである。(Means for solving the problem) The novel compound of the present invention is represented by the following formula CI).
を表わす)
(本発明の効果)
式〔I〕で表わされる特定の(メタ)クリル酸エステル
を単独重合または共重合させることにより、この特定の
モノマー由来の光学特性、耐熱性および耐水性をその重
合量ないし含量に応じて生成重合体に与えることができ
る。(Effects of the present invention) By homopolymerizing or copolymerizing a specific (meth)acrylic acid ester represented by formula [I], the optical properties, heat resistance, and water resistance derived from this specific monomer can be improved. It can be added to the produced polymer depending on the polymerization amount or content.
(メタ)アクリル酸エステル
(七ツマ−)
本発明による(メタ)アクリル酸エステルは前記の式〔
I〕で表わされるものである。(Meth)acrylic acid ester (meth)acrylic acid ester (meth)acrylic acid ester according to the present invention has the above formula [
I].
Rおよびnは前記の通りであるが、前記した本発明によ
る効果を特に享有するのは、Rがメチルのもの、特にそ
のうちでnが1のもの、すなわちメタクリル酸ペンタシ
クロデカンメチル、である。R and n are as described above, but those in which R is methyl, particularly those in which n is 1, particularly those in which R is methyl, that is, pentacyclodecanemethyl methacrylate, particularly enjoy the effects of the invention described above.
(合成)
本発明の新規なモノマーは種々の方法で合成できるが、
下式(II)に示すアルコールをエステル化することに
より容易に得られる。(Synthesis) The novel monomer of the present invention can be synthesized by various methods,
It can be easily obtained by esterifying the alcohol represented by the following formula (II).
(nは0または1)
(n)に示すアルコールは、ジシクロペンタジェンをオ
キソ反応に付すことにより容易に得られる。また、オキ
ソ反応の触媒により、アルデヒド体を経由し更に還元反
応することによっても合成できる。(n is 0 or 1) The alcohol shown in (n) can be easily obtained by subjecting dicyclopentadiene to an oxo reaction. It can also be synthesized by further reduction reaction via an aldehyde using an oxo reaction catalyst.
エステル化反応は種々あるが、以下に示す方法を用いる
と容易に式(1)に示す化合物が合成できる。Although there are various esterification reactions, the compound shown in formula (1) can be easily synthesized by using the method shown below.
第一の方法は、式(I[]のアルコールとメタクリル酸
及び/又はアクリル酸との脱水縮合反応である。この反
応には適当な触媒、例えば濃硫酸、パラトルエンスルホ
ン酸、無水リン酸などが用いられることがふつうである
。The first method is a dehydration condensation reaction between an alcohol of formula (I[] and methacrylic acid and/or acrylic acid. For this reaction, a suitable catalyst such as concentrated sulfuric acid, p-toluenesulfonic acid, phosphoric anhydride, etc. is usually used.
第二の方法は、下式Cm)に示す不飽和脂肪酸エステル
とのエステル交換反応である。The second method is a transesterification reaction with an unsaturated fatty acid ester shown in the following formula Cm).
(RはCHまたはH,MはOCH3または0CH2CH
3)
この反応においても適当な触媒、例えばナトリウムメチ
ラート、t−BuOK、パラトルエンスルホン酸等が用
いられる。(R is CH or H, M is OCH3 or 0CH2CH
3) Also in this reaction, a suitable catalyst such as sodium methylate, t-BuOK, para-toluenesulfonic acid, etc. is used.
更に第三の方法は、下式(mV)に示す不飽和脂肪酸ハ
ロゲン化物との脱ハロゲン化水素反応による方法である
。Furthermore, a third method is a method using a dehydrohalogenation reaction with an unsaturated fatty acid halide shown in the following formula (mV).
O
(RはCH3またはHSXはCIまたはBr)この反応
にはハロゲン化水素受容体としてのアミンをアルコール
より過剰に加えなければならないが、そのアミンとして
は、トリエチルアミン、ピリジン等が望ましい。O (R is CH3 or HSX is CI or Br) In this reaction, an amine as a hydrogen halide acceptor must be added in excess of the alcohol, and the amine is preferably triethylamine, pyridine, or the like.
上記の反応で得られる粗生成物は、減圧蓋面などの通常
の精製法により精製可能である。The crude product obtained in the above reaction can be purified by a conventional purification method such as vacuum capping.
重 合
(重合)
これらの七ツマ−は通常の(メタ)アクリル酸エステル
と同様の重合性を持つから、たとえばラジカル重合を行
わせることによって、重合物(無色透明のものであるこ
とが多い)とすることができる。Polymerization (Polymerization) These seven polymers have the same polymerizability as ordinary (meth)acrylic acid esters, so they can be made into polymers (often colorless and transparent) by performing radical polymerization, for example. It can be done.
ラジカル重合開始剤としては、例えばベンゾイルパーオ
キサイド、ラウロイルパーオキサイド、ジクミルパーオ
キサイド等の過酸化物(レドックス系を包含する)、ア
ゾイソブチロニトリル等のアゾ化合物、光増感剤を用い
ることができ、熱重合、光重合または放射線重合により
重合させることもできる。重合方式としては、塊状重合
、溶液重合、乳化重合、懸濁重合、その他(メタ)アク
リル酸エステルに適用可能な任意のものが利用可能であ
る。As the radical polymerization initiator, for example, peroxides (including redox systems) such as benzoyl peroxide, lauroyl peroxide, and dicumyl peroxide, azo compounds such as azoisobutyronitrile, and photosensitizers may be used. It can also be polymerized by thermal polymerization, photopolymerization, or radiation polymerization. As the polymerization method, bulk polymerization, solution polymerization, emulsion polymerization, suspension polymerization, and any other methods applicable to (meth)acrylic esters can be used.
これらのモノマーは、単独重合あるいはモノエチレン性
不飽和モノマーたとえばメタクリル酸メチル、同ヘキシ
ル、同ベンジル、メタクリルアミド、スチレン等との共
重合によって熱可塑ポリマーを与えるので、必要に応じ
てペレット化してから射出成型、その他のポリマー溶融
を伴う成型法によって任意の成型品にすることができ、
また、ジまたはトリエチレン性不飽和七ツマ−たとえば
エチレングリコールジ(メタ)アクリレート、トリメチ
ロールプロパントリ(メタ)アクリレート、トリシクロ
デカンジメタノールジ(メタ)アクリレート、メチレン
ビス(メタ)アクリルアミド、ジビニルベンゼン等と共
重合させて、注型重合によって架橋ポリマーを製造する
こともできる。架橋剤七ツマ−としてはトリシクロデカ
ンジメタノールジ(メタ)アクリレートは特に好ましい
ものであって、同族体をも含めてその製造については特
開昭61−176618、特開昭61−287913号
、特開昭62−225508号各公報は1米国特許第4
,131,729号明細書等を参照することができる。These monomers give thermoplastic polymers by homopolymerization or copolymerization with monoethylenically unsaturated monomers such as methyl methacrylate, hexyl methacrylate, benzyl methacrylate, methacrylamide, styrene, etc., so they may be pelletized if necessary. Can be made into any molded product by injection molding or other molding methods that involve polymer melting,
In addition, di- or triethylenically unsaturated hexamers such as ethylene glycol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, tricyclodecane dimethanol di(meth)acrylate, methylenebis(meth)acrylamide, divinylbenzene, etc. It is also possible to produce a crosslinked polymer by copolymerizing with cast polymerization. Tricyclodecane dimethanol di(meth)acrylate is particularly preferred as a crosslinking agent, and its production, including its congeners, is described in JP-A-61-176618, JP-A-61-287913, JP-A No. 62-225508 Each publication is 1 U.S. Patent No. 4
, No. 131,729, etc. can be referred to.
なお、式〔I〕で表わされる2種以上の七ツマ−を重合
させることができることはいうまでもない。Incidentally, it goes without saying that two or more types of heptamers represented by formula [I] can be polymerized.
(重合物の用途)
これらの重合物は、レンズ、光デイスク基板をはじめと
する光学材料の他、光ファイバーのような光伝送体、発
光ダイオードの封止剤等のオプトエレクトロニクス用の
光学素子の材料に有用である。(Applications of polymers) These polymers can be used as materials for optical materials such as lenses and optical disk substrates, as well as optical elements for optoelectronics such as optical transmission bodies such as optical fibers and sealants for light-emitting diodes. It is useful for
実験例
参考例1
内容積500m1のステンレス鋼製オートクレーブに、
ジシクロペンタジェン132g、RhH(CO) (
P P ha ) a 69− 0mg1Fリフエニル
ホスフイン261.1mgおよびトルエン88gを仕込
んだ後、−酸化炭素と水素の等モル混合ガスで器内を数
回パージした後、同混合ガスを室温で100barまで
圧入した。この反応器を、130℃まで昇温した。昇温
中(105℃付近)から急激なガス吸収があり、50分
後にほぼ理論量のガスが吸収された。反応容器を冷却し
た後、未反応ガスをパージし、内容物をトルエンで希釈
し、トルエンを留去して、目的物であるトリシクロデカ
ンカルボアルデヒド127.0gを減圧下蓋面採取した
。Experimental Example Reference Example 1 In a stainless steel autoclave with an internal volume of 500 m1,
132 g of dicyclopentadiene, RhH(CO) (
After charging 261.1 mg of 1F rifenylphosphine and 88 g of toluene, the inside of the vessel was purged several times with an equimolar mixed gas of carbon oxide and hydrogen, and the mixed gas was heated to 100 bar at room temperature. It was press-fitted until the end. This reactor was heated to 130°C. Rapid gas absorption occurred during the temperature rise (around 105° C.), and approximately the theoretical amount of gas was absorbed after 50 minutes. After cooling the reaction vessel, unreacted gas was purged, the contents were diluted with toluene, toluene was distilled off, and 127.0 g of tricyclodecanecarbaldehyde, the target product, was collected from the lid under reduced pressure.
次に、内容積500m1のステンレス鋼製オートクレー
ブに、上記で得たアルデヒド100g、イオン交換水1
10.、メタノール112gおよびルテニウム−アルミ
ナ粉末5.02gを仕込み、水素ガスで器内を置換した
後、同ガスを室温で50barまで圧入し、この反応器
を130℃まで昇温した。5時間後にほぼ理論量のガス
の吸収が終了した。反応容器を冷却した後、未反応ガス
をパージし、内容物をメタノールで希釈採取し、触媒を
炉別した。メタノールを留去して、目的物であるトリシ
クロデカンメタノール96.2gを得た。ジシクロペン
タジェンの代りにシクロペンタジェントリマーを用い、
上記と同様にして、ペンタシクロペンタデカンメタノー
ルを得た。Next, in a stainless steel autoclave with an internal volume of 500 m1, 100 g of the aldehyde obtained above and 1 g of ion-exchanged water were placed.
10. After charging 112 g of methanol and 5.02 g of ruthenium-alumina powder and purging the inside of the reactor with hydrogen gas, the same gas was pressurized at room temperature to 50 bar, and the reactor was heated to 130°C. After 5 hours, absorption of almost the theoretical amount of gas was completed. After cooling the reaction vessel, unreacted gas was purged, the contents were diluted and collected with methanol, and the catalyst was separated from the furnace. Methanol was distilled off to obtain 96.2 g of tricyclodecane methanol, the target product. Using cyclopentadiene trimer instead of dicyclopentadiene,
Pentacyclopentadecane methanol was obtained in the same manner as above.
実施例1
トリシクロデカンメタノール30g (0,18モル)
、メタクリル酸18.9g (0,22モル)トルエン
30g1パラトルエンスルホン酸1.2gおよび少量の
銅粉を200m1四ツ目フラスコ内に仕込み、窒素雰囲
気下に反応温度90〜130℃で3時間反応させた。反
応終了後、冷却し、過剰の酸を水酸化ナトリウム水溶液
で中和した後、更に有機層を硫酸ナトリウム水溶液で3
回洗浄し、トルエンを留去して、トリシクロデカンメチ
ルメタクリレート25. 1g (0,107nof
)を得た。生成物の’H−NMRスペクトルデータは下
記の通りであり、またIRスペクトルは第1図に示す通
りであった。Example 1 Tricyclodecane methanol 30g (0.18 mol)
, 18.9 g (0.22 mol) of methacrylic acid, 30 g of toluene, 1.2 g of para-toluenesulfonic acid, and a small amount of copper powder were placed in a 200 ml four-eye flask, and reacted for 3 hours at a reaction temperature of 90 to 130°C under a nitrogen atmosphere. I let it happen. After the reaction was completed, the organic layer was cooled, the excess acid was neutralized with an aqueous sodium hydroxide solution, and the organic layer was further diluted with an aqueous sodium sulfate solution.
After washing twice and distilling off toluene, tricyclodecane methyl methacrylate 25. 1g (0,107nof
) was obtained. The 'H-NMR spectrum data of the product was as shown below, and the IR spectrum was as shown in FIG.
δ:6.06.5.48 2HE3−C−)迅
δ:1.93 3H(CH2−C−)δ:0.7
〜2.6715H(脂環プロトン)実施例2
トリシクロデカンメタノール16.9g(0,10m1
) 、アクリル酸8. gg(0,12mol ) 、
)ルエン17g5銅粉8.0ngおよびパラトルエンス
ルホン酸671.7mgを用いた以外は実施例1と全く
同様にして、トリシクロデカンメチルアクリレート16
.7g (0,076nof )を得た。生成物の’H
−NMRスペクトルデータは下記の通りであり、またI
Rスペクトルは第2図に示す通りであった。δ: 6.06.5.48 2HE3-C-) δ: 1.93 3H(CH2-C-) δ: 0.7
~2.6715H (alicyclic proton) Example 2 Tricyclodecane methanol 16.9g (0.10ml
), acrylic acid8. gg (0.12 mol),
) Tricyclodecane methyl acrylate 16
.. 7g (0,076nof) was obtained. 'H of the product
-NMR spectral data are as follows and I
The R spectrum was as shown in FIG.
’H−NMR:
δ:6.oo〜6.602H(只”t−C−)δ:5.
59〜5.90 1H(CH2−C−)δ:3.83〜
3.96 2H(−C−0−9顆−)δ二0.67〜2
.8415H(脂環プロトン)実施例3
ペンタシクロペンタデカンメタノール30g(0,13
匝01)、メタクリル酸13.5g(0,15mol
) 、)ルエン30g1パラトルエンスルホン酸1.2
gおよび銅粉12.4ff1gを用いて、実施例1と同
様にして、ペンタシクロペンタデカンメチルメタクリレ
ート32.0sr(0,107nof )を得た。生成
物の’H−NMRスペクトルデータは下記の通りであり
、またIRスペクトルは第3図に示す通りであった。'H-NMR: δ:6. oo~6.602H (only "t-C-) δ: 5.
59-5.90 1H(CH2-C-)δ: 3.83-
3.96 2H (-C-0-9 condyle-) δ2 0.67-2
.. 8415H (alicyclic proton) Example 3 Pentacyclopentadecane methanol 30g (0,13
01), methacrylic acid 13.5g (0.15mol
) ,)30g of toluene 1.2 paratoluenesulfonic acid
32.0sr (0,107nof) of pentacyclopentadecane methyl methacrylate was obtained in the same manner as in Example 1 using 1g of copper powder and 12.4ff of copper powder. The 'H-NMR spectrum data of the product was as shown below, and the IR spectrum was as shown in FIG.
δ:6.12〜’5.542H(り一一〇−)只1
δ: 1.79 3H(CH2−C)δ:0.
65〜2.72 21H(脂環プロトン)実施例4
ペンタシクロペンタデカンメタノール21.7g (0
,093nof ) 、アクリル酸(0,11mol
) 、トルエン21.7g、銅粉8.0mgおよびパラ
トルエンスルホン酸869.1■を用いた以外は実施例
1と全く同様にして、ペンタシクロペンタデカンメチル
アクリレート16.2g(0,057a+ol )を得
た。δ: 6.12~'5.542H (ri110-) only 1 δ: 1.79 3H (CH2-C) δ: 0.
65-2.72 21H (alicyclic proton) Example 4 Pentacyclopentadecane methanol 21.7g (0
,093nof), acrylic acid (0.11 mol
), 16.2 g (0,057 a+ol) of pentacyclopentadecane methyl acrylate was obtained in exactly the same manner as in Example 1, except that 21.7 g of toluene, 8.0 mg of copper powder and 869.1 μg of para-toluenesulfonic acid were used. Ta.
生成物の’H−NMRスペクトルデータは下記の通りで
あり、またIRスペクトルは第4図に示す通りであった
。The 'H-NMR spectrum data of the product was as shown below, and the IR spectrum was as shown in FIG.
’H−NMR:
δ:6.02〜6.502H(3−C−)6: 5.6
7〜5.93 1H(CH2−C−)δ:3.82〜3
.93 2H(−C−0−3−)δ:0.67〜2.6
8 21H(脂環プロトン)参考例2
実施例1で得た単量体36重量部にトリシクロデカンジ
メタツールジメタクリレート64TJ量部、ジクミルパ
ーオキサイド1.2重量部、および「イルガキュアー1
844 (チバガイギー社製の光増感剤)0.3重量
部を加えて加熱均一混合した後、シリコーンゴムとガラ
ス板で構成したスペーサー内へ流し込み、紫外線を照射
した後、オーブン内で160℃で2時間加熱して、無色
透明の硬化物を得た。この硬化物の熱変形温度は148
℃、60℃水中での飽和吸水率は、0.57%、複屈折
は極めて少なかった。'H-NMR: δ: 6.02-6.502H(3-C-)6: 5.6
7-5.93 1H(CH2-C-)δ: 3.82-3
.. 93 2H(-C-0-3-)δ: 0.67-2.6
8 21H (alicyclic proton) Reference Example 2 To 36 parts by weight of the monomer obtained in Example 1, 64 TJ parts of tricyclodecane dimetatool dimethacrylate, 1.2 parts by weight of dicumyl peroxide, and "Irgacure 1" were added.
After adding 0.3 parts by weight of 844 (photosensitizer manufactured by Ciba Geigy) and uniformly mixing by heating, the mixture was poured into a spacer made of silicone rubber and a glass plate, irradiated with ultraviolet light, and heated at 160°C in an oven. After heating for 2 hours, a colorless and transparent cured product was obtained. The heat distortion temperature of this cured product is 148
The saturated water absorption in water at 60°C and 60°C was 0.57%, and the birefringence was extremely low.
を模写したものである。It is a copy of.
第3図は、実施例3の化合物のIRスペクトルを模写し
たものである。FIG. 3 is a reproduction of the IR spectrum of the compound of Example 3.
第4図は、実施例4の化合物のIRスペクトルを模写し
たものである。FIG. 4 is a reproduction of the IR spectrum of the compound of Example 4.
Claims (1)
たはメタクリル酸エステル ▲数式、化学式、表等があります▼〔 I 〕 (nは0または1を、Rは水素またはメチル基を表わす
)[Claims] Alicyclic acrylic ester or methacrylic ester represented by the following formula [I] ▲ Numerical formulas, chemical formulas, tables, etc. are available ▼ [I] (n is 0 or 1, R is hydrogen or methyl (represents a group)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63217300A JPH0267248A (en) | 1988-08-31 | 1988-08-31 | Novel (meth)acrylic ester |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63217300A JPH0267248A (en) | 1988-08-31 | 1988-08-31 | Novel (meth)acrylic ester |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0267248A true JPH0267248A (en) | 1990-03-07 |
Family
ID=16701980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63217300A Pending JPH0267248A (en) | 1988-08-31 | 1988-08-31 | Novel (meth)acrylic ester |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0267248A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006051803A1 (en) * | 2004-11-09 | 2006-05-18 | Idemitsu Kosan Co., Ltd. | Optical semiconductor sealing material |
JP2008037890A (en) * | 2006-08-01 | 2008-02-21 | Kuraray Co Ltd | Poly(vinylacetal) resin |
DE112007001060T5 (en) | 2006-05-01 | 2009-03-12 | Idemitsu Kosan Co., Ltd. | Encapsulating material for optical semiconductors |
JP2010053291A (en) * | 2008-08-29 | 2010-03-11 | Mitsubishi Gas Chemical Co Inc | Resin and resin composition which use tricyclodecane derivative as raw material |
JP2010215799A (en) * | 2009-03-17 | 2010-09-30 | Fujifilm Corp | Ink composition and method for inkjet recording |
JP2010215798A (en) * | 2009-03-17 | 2010-09-30 | Fujifilm Corp | Ink composition and method for inkjet recording |
WO2011016356A1 (en) | 2009-08-04 | 2011-02-10 | 出光興産株式会社 | Acrylate composition |
JP2018529789A (en) * | 2015-07-10 | 2018-10-11 | アルケマ フランス | Curable composition comprising monofunctional acrylate |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62209156A (en) * | 1986-03-10 | 1987-09-14 | Hitachi Chem Co Ltd | Resin composition for optical device use |
JPS63213506A (en) * | 1987-02-27 | 1988-09-06 | Japan Synthetic Rubber Co Ltd | Material for optical use |
JPH01313513A (en) * | 1988-06-10 | 1989-12-19 | Hitachi Ltd | Optical disc |
-
1988
- 1988-08-31 JP JP63217300A patent/JPH0267248A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62209156A (en) * | 1986-03-10 | 1987-09-14 | Hitachi Chem Co Ltd | Resin composition for optical device use |
JPS63213506A (en) * | 1987-02-27 | 1988-09-06 | Japan Synthetic Rubber Co Ltd | Material for optical use |
JPH01313513A (en) * | 1988-06-10 | 1989-12-19 | Hitachi Ltd | Optical disc |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012117079A (en) * | 2004-11-09 | 2012-06-21 | Idemitsu Kosan Co Ltd | Optical semiconductor sealing material |
US8648160B2 (en) | 2004-11-09 | 2014-02-11 | Idemitsu Kosan Co., Ltd. | Optical semiconductor sealing material |
JPWO2006051803A1 (en) * | 2004-11-09 | 2008-05-29 | 出光興産株式会社 | Optical semiconductor encapsulant |
WO2006051803A1 (en) * | 2004-11-09 | 2006-05-18 | Idemitsu Kosan Co., Ltd. | Optical semiconductor sealing material |
JP5022709B2 (en) * | 2004-11-09 | 2012-09-12 | 出光興産株式会社 | Optical semiconductor encapsulant |
DE112007001060T5 (en) | 2006-05-01 | 2009-03-12 | Idemitsu Kosan Co., Ltd. | Encapsulating material for optical semiconductors |
JP2008037890A (en) * | 2006-08-01 | 2008-02-21 | Kuraray Co Ltd | Poly(vinylacetal) resin |
JP2010053291A (en) * | 2008-08-29 | 2010-03-11 | Mitsubishi Gas Chemical Co Inc | Resin and resin composition which use tricyclodecane derivative as raw material |
JP2010215798A (en) * | 2009-03-17 | 2010-09-30 | Fujifilm Corp | Ink composition and method for inkjet recording |
JP2010215799A (en) * | 2009-03-17 | 2010-09-30 | Fujifilm Corp | Ink composition and method for inkjet recording |
WO2011016356A1 (en) | 2009-08-04 | 2011-02-10 | 出光興産株式会社 | Acrylate composition |
JP2018529789A (en) * | 2015-07-10 | 2018-10-11 | アルケマ フランス | Curable composition comprising monofunctional acrylate |
JP2021080458A (en) * | 2015-07-10 | 2021-05-27 | アルケマ フランス | Curable compositions comprising mono-functional acrylates |
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