JPH01168712A - Resin for optical material - Google Patents
Resin for optical materialInfo
- Publication number
- JPH01168712A JPH01168712A JP32786887A JP32786887A JPH01168712A JP H01168712 A JPH01168712 A JP H01168712A JP 32786887 A JP32786887 A JP 32786887A JP 32786887 A JP32786887 A JP 32786887A JP H01168712 A JPH01168712 A JP H01168712A
- Authority
- JP
- Japan
- Prior art keywords
- meth
- parts
- acrylate
- resin
- mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011347 resin Substances 0.000 title claims abstract description 16
- 229920005989 resin Polymers 0.000 title claims abstract description 16
- 239000000463 material Substances 0.000 title claims description 15
- 230000003287 optical effect Effects 0.000 title claims description 14
- 239000000178 monomer Substances 0.000 claims abstract description 19
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 16
- 239000000203 mixture Substances 0.000 claims abstract description 14
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims abstract description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims abstract description 3
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229920000642 polymer Polymers 0.000 claims description 7
- QYFACSDTKGXDDM-UHFFFAOYSA-N OC.OC.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1 Chemical compound OC.OC.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1 QYFACSDTKGXDDM-UHFFFAOYSA-N 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 3
- 238000005886 esterification reaction Methods 0.000 abstract description 10
- 230000032050 esterification Effects 0.000 abstract description 9
- 239000003999 initiator Substances 0.000 abstract description 5
- 239000004342 Benzoyl peroxide Substances 0.000 abstract description 3
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 abstract description 3
- 235000019400 benzoyl peroxide Nutrition 0.000 abstract description 3
- 239000011261 inert gas Substances 0.000 abstract description 3
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 230000000379 polymerizing effect Effects 0.000 abstract 1
- 239000000047 product Substances 0.000 abstract 1
- 150000003254 radicals Chemical class 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 6
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000000704 physical effect Effects 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000006297 dehydration reaction Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- -1 alcohol esters Chemical class 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical compound C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- RJCXTLSYTKVXEI-UHFFFAOYSA-N 15,16-dimethyltriacontanedioic acid Chemical compound OC(=O)CCCCCCCCCCCCCC(C)C(C)CCCCCCCCCCCCCC(O)=O RJCXTLSYTKVXEI-UHFFFAOYSA-N 0.000 description 1
- HGUFODBRKLSHSI-UHFFFAOYSA-N 2,3,7,8-tetrachloro-dibenzo-p-dioxin Chemical compound O1C2=CC(Cl)=C(Cl)C=C2OC2=C1C=C(Cl)C(Cl)=C2 HGUFODBRKLSHSI-UHFFFAOYSA-N 0.000 description 1
- MVWPVABZQQJTPL-UHFFFAOYSA-N 2,3-diphenylcyclohexa-2,5-diene-1,4-dione Chemical compound O=C1C=CC(=O)C(C=2C=CC=CC=2)=C1C1=CC=CC=C1 MVWPVABZQQJTPL-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- NFPBWZOKGZKYRE-UHFFFAOYSA-N 2-propan-2-ylperoxypropane Chemical compound CC(C)OOC(C)C NFPBWZOKGZKYRE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- GNVMUORYQLCPJZ-UHFFFAOYSA-M Thiocarbamate Chemical compound NC([S-])=O GNVMUORYQLCPJZ-UHFFFAOYSA-M 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- AVGYVDOSBJFXFR-UHFFFAOYSA-N diphenyl sulfite Chemical compound C=1C=CC=CC=1OS(=O)OC1=CC=CC=C1 AVGYVDOSBJFXFR-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229960003505 mequinol Drugs 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、エチレン性不飽和単量体のラジカル重合体か
らなる光学材料用樹脂に関する。具体的には、重置させ
て樹脂とすべきエチレン性不飽和単量体に主要な特徴を
有する光学用樹脂材料に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a resin for optical materials comprising a radical polymer of ethylenically unsaturated monomers. Specifically, the present invention relates to an optical resin material having a main feature in an ethylenically unsaturated monomer to be superimposed to form a resin.
情報処理の分野において発展が著しい光学機器の一つと
して光で読み出しを行う方式のディスク(ビデオディス
ク・メモリーディスク、デジタルオーディオディスク等
)を使用するものがある。BACKGROUND ART One type of optical equipment that is rapidly developing in the field of information processing is one that uses optically readable discs (video discs, memory discs, digital audio discs, etc.).
たとえば光ディスクは、記録密度が著しく高く、また再
生される画質ないし音質が優れていることなどから、画
像や音声の記録・再生、多量の情報の記録・再生等に広
く実用されつつある。For example, optical discs have extremely high recording density and excellent reproduced image and sound quality, and are therefore becoming widely used for recording and reproducing images and sounds, and for recording and reproducing large amounts of information.
従来このようなディスクに使用さ九ている材料には一長
一短があって未だ十分に満足すべきものが提案されてい
るとはいえな−。例えばメモリーディスク材料としては
無機ガラス、ポリメチルメタフリレート樹脂及びポリカ
ーボネイト樹脂が実用化されているが、耐熱性、複屈折
、軽量化、経済性等を全て満足する材料はなく、とりわ
け書き換え可能型光ディスク用基板材料については実用
化の大きな支障となっている。The materials conventionally used for such discs have their advantages and disadvantages, and it cannot be said that a fully satisfactory material has yet been proposed. For example, inorganic glass, polymethyl methacrylate resin, and polycarbonate resin have been put into practical use as memory disk materials, but there is no material that satisfies all of the requirements such as heat resistance, birefringence, weight reduction, and economic efficiency, especially rewritable type. Substrate materials for optical discs are a major hindrance to practical application.
既に本発明者らは、耐熱性が高く、かつ複屈折が少ない
樹脂として、例えばビス(オキシメチル)トリシクロ(
5,2,1,0”−)デカンジ(メタ)アクリレートの
ラジカル重合体(特開昭−62−225508号公報)
及びビス(オキシメチル〕ペンタシクロ(R2,1,1
,1j04.?01,11)ペンタジェンジ(メタ)ア
クリレートのラジカル重合体(特願昭62−7292号
明細書)を提案し、高度の耐熱性、熱安全性及び低複屈
折を満足させ得ることを見出した。The present inventors have already found a resin with high heat resistance and low birefringence, such as bis(oxymethyl)tricyclo(
Radical polymer of 5,2,1,0''-)decane di(meth)acrylate (JP-A-62-225508)
and bis(oxymethyl]pentacyclo(R2,1,1
, 1j04. ? 01,11) We have proposed a radical polymer of pentadiene di(meth)acrylate (Japanese Patent Application No. 7292/1982) and found that it can satisfy a high degree of heat resistance, thermal safety, and low birefringence.
しかしながら記録層等が積層された光ディスクとしての
実用上の耐久性、すなわち、CZN比の保持、記録保存
等の立場から基板に対して極めて高度の耐環境性(耐湿
性)が要求さ九ておシ、そのような観点からディスク用
樹脂材料に要求さ九る更に高度の性能を満足する(メタ
)アクリレート系光学材料用樹脂が要望されている。However, from the standpoint of practical durability as an optical disc with a laminated recording layer, that is, maintenance of the CZN ratio, record preservation, etc., the substrate is required to have extremely high environmental resistance (humidity resistance). From this point of view, there is a need for a (meth)acrylate-based resin for optical materials that satisfies the even higher performance required for resin materials for disks.
本発明は、エチレン性不飽和単量体のラジカル重合体か
らなる光学材料用樹脂において該エチレン性不飽和単量
体がトリシクロデカンジメタノール及びペンタシクロデ
カンジメタノール1モルに対してアクリル酸及びメタク
リル酸2モルの混せ物をエステル化して得られるジ(メ
タ)アクリレート混付物50〜99重量鳴と、下式(1
)で示さ九る(メタ)アクリレート1〜50重t%から
なることを特徴とする良好な耐湿性、耐熱性、光学特性
及び機械的特性を有している光学材料用樹脂を提供せん
とするものである。The present invention provides a resin for optical materials comprising a radical polymer of an ethylenically unsaturated monomer, in which the ethylenically unsaturated monomer is acrylic acid and A di(meth)acrylate mixture obtained by esterifying a mixture of 2 moles of methacrylic acid has a weight of 50 to 99%, and the following formula (1
) It is an object of the present invention to provide a resin for optical materials having good moisture resistance, heat resistance, optical properties, and mechanical properties, which is characterized by being composed of 1 to 50% by weight of (meth)acrylate represented by It is something.
鳥
■も5−CHx−OC−C=CH2(1)R2はH又は
CHA基を示す。)
本発明に用いられる前記のジ(メタ)アクリレート混せ
物は公知の方法で合成できる。例えばトリシクロデカン
ジメタノール及び/又はペンタシクロペンタデカンジメ
タノール1モルをメタクリル酸とアクリル酸の混せ物2
モルで下式(2)の様に脱水エステル化をして得られる
。Bird ■ is also 5-CHx-OC-C=CH2 (1) R2 represents H or a CHA group. ) The di(meth)acrylate mixture used in the present invention can be synthesized by a known method. For example, 1 mol of tricyclodecane dimethanol and/or pentacyclopentadecane dimethanol is mixed with 2 mol of a mixture of methacrylic acid and acrylic acid.
It can be obtained by dehydration and esterification in moles as shown in the following formula (2).
ここで鳥、R2はH又は0M3基を、鳥はの化合物をP
CPDDM−MAと略す)t−表わす。Here, bird, R2 is H or 0M3 group, bird is a compound of P
(abbreviated as CPDDM-MA) t-represented.
不発明の式(1)で示さnる(メタ)アクリレート単量
体は、テトラシクロドデセンメタノール及び/又はテト
ラシクロドデカンメタノール(以下こnらをまとめてT
ECDD−M と略す)と(メタ)アクリル酸とのエ
ステル化生成物である。The (meth)acrylate monomer represented by the uninvented formula (1) is tetracyclododecenemethanol and/or tetracyclododecanemethanol (hereinafter collectively referred to as T).
It is an esterification product of (abbreviated as ECDD-M) and (meth)acrylic acid.
TECDD−Mはシクロペンタジェンとアリルアルコー
ルとの付加物をシクロペンタジェント反応させて、更に
必要に応じて水添触媒(例えばバラジクムカーボン)を
用いて水素と反応させることにより得られる。また、シ
クロペンタジェンとアクロレインを用いて甘酸されるテ
トラシクロドデカンカーボアルデヒドを還元することに
よってもTECDD−M t−得ることができる。下式
(3)参照。TECDD-M is obtained by subjecting an adduct of cyclopentadiene and allyl alcohol to a cyclopentadiene reaction, and further reacting with hydrogen using a hydrogenation catalyst (for example, baladicum carbon) as necessary. TECDD-M t- can also be obtained by reducing sweetened tetracyclododecanecarbaldehyde using cyclopentadiene and acrolein. See formula (3) below.
XニーCH,O)I又は−CHo
本発明で使用する式(1)で示さnる(メタ)アクリレ
ートは、TECDIJ−M 1モルと(メタ)アクリル
!1.0〜1.5モル程ft−脱水エステル化して得ら
れる。すなわち、こnらの原料を反応容器内に仕込み、
脱水剤をかねた反応溶媒及びエステル化触媒、必要に応
じて重合禁止剤を加えて、反応温度50〜200℃(好
ましくは、80〜150℃)で空気又は不活性ガス下で
エステル化を行う。このとき重合禁止剤としては、例え
ば、ラジカル重合防止として用いら几るハイドロキノン
、ハイドロキノン七ツメチルエーテルなどフェノール類
、ベンゾキノン、ジフェニルベンゾキノンなどのキノン
類、フェノチアジン、銅塩等が挙ケラ几る。これらの重
@−須止剤の使用量は(メタ)アクリル酸100重量部
に対して0.001〜lO重量部、好ましくは0.1〜
5重量部である。脱水共那剤としては、n−ヘキサン、
シクロヘキサン、ベンゼン、トルエン、トリクロロエチ
レンl’が好ましく用いられる。XneyCH,O)I or -CHO The (meth)acrylate n represented by formula (1) used in the present invention is composed of 1 mol of TECDIJ-M and (meth)acrylic! It is obtained by ft-dehydration esterification of about 1.0 to 1.5 moles. That is, these raw materials are placed in a reaction vessel,
Add a reaction solvent that also serves as a dehydrating agent, an esterification catalyst, and if necessary a polymerization inhibitor, and perform esterification at a reaction temperature of 50 to 200°C (preferably 80 to 150°C) under air or inert gas. . Examples of the polymerization inhibitor used for inhibiting radical polymerization include phenols such as hydroquinone and hydroquinone methyl ether, quinones such as benzoquinone and diphenylbenzoquinone, phenothiazine, and copper salts. The amount of these heavy @-stoppers used is 0.001 to 10 parts by weight, preferably 0.1 to 10 parts by weight, per 100 parts by weight of (meth)acrylic acid.
It is 5 parts by weight. As a dehydration synergist, n-hexane,
Cyclohexane, benzene, toluene and trichloroethylene l' are preferably used.
エステル化触媒としては、恢酸、塩酸、リン酸、p−ト
ルエンスルホン酸、カチオン型父換樹脂など通常のエス
テル化触媒が適宜用いらnる。As the esterification catalyst, common esterification catalysts such as diabolic acid, hydrochloric acid, phosphoric acid, p-toluenesulfonic acid, and cationic father-converted resins can be used as appropriate.
エステル化反応終了後、反応液はアルカリ水溶液及び水
で洗浄し、水層を分離し有機層を減圧下で脱水共沸剤を
除去する。After the esterification reaction is completed, the reaction solution is washed with an aqueous alkaline solution and water, the aqueous layer is separated, and the organic layer is dehydrated under reduced pressure to remove the entrainer.
ここでエステル化は、必ずしも両反応体をアルコール及
びカルボン酸の形態として使用する脱水反応に限定さ几
ることを意味するものではなくてその機能的誘導体の形
(例えば低級アルコールエステルの形態)でエステル交
換によりエステルを生成させる場合をも包含するもので
ある。Esterification here is not necessarily meant to be limited to dehydration reactions in which both reactants are used in the form of alcohol and carboxylic acid, but also in the form of their functional derivatives (e.g. in the form of lower alcohol esters). This also includes cases where esters are produced by transesterification.
重合方法
本発明による光学材料用樹脂は、前記のエチレン性不飽
和単量体混合物、すなわち前記ジ(メタ)アクリレート
混’f# ?!l (’L’CDDM ・MA及び/又
はPCPDDM−MA)50〜99重量部と式(1)で
示される(メタ)アクリレート1〜50重量部の混合物
をラジカル重合することにより得ら九る。式(1)で示
さnる(メタ)アクリレートが50重量部以上になると
耐水性は向上するものの耐熱性が著しく劣る。従って高
耐熱性かつ低吸水性を発現する為には、20〜40重量
部が好ましい。Polymerization method The resin for optical materials according to the present invention comprises the above-mentioned ethylenically unsaturated monomer mixture, that is, the above-mentioned di(meth)acrylate mixture. ! It is obtained by radical polymerization of a mixture of 50 to 99 parts by weight of L'CDDM-MA and/or PCPDDM-MA and 1 to 50 parts by weight of the (meth)acrylate represented by formula (1). If the amount of (meth)acrylate represented by formula (1) is 50 parts by weight or more, the water resistance will improve, but the heat resistance will be significantly inferior. Therefore, in order to exhibit high heat resistance and low water absorption, the amount is preferably 20 to 40 parts by weight.
ラジカル重合の手法は周知であって、例えばエチレン性
不飽和単量体混合物に有機過酸化物、アゾ化合物等のラ
ジカル開始剤を配合し、加熱する方法及び光増感剤を配
合して、紫外線、電子線、放射線等を照射する方法等に
よりラジカル共重会することができる。その際に使用さ
几るラジカル開始剤としては、例えば過酸化ベンゾイル
、ジイソプロピルパーオキサイド、ターシャ゛リープチ
ルパーオキシピパレート、ラウロイルパーオキサイド等
の5機過酸化物、アゾイソブチロニトリル等のアゾ化合
物、ベンゾフェノン、ベンゾインエチルエーテル、ベン
ジル、アセトフェノン、アントラキノン等の光増感剤、
ジフェニルスルフイツト、チオカーバメート等硫黄化せ
物などのラジカル開始剤が使用できる。ラジカル開始剤
の使用量は、前記単量体混合物100部に対して0.0
1〜20部、更に好ましくは0.01−10部、の範囲
である。Radical polymerization techniques are well known, such as a method in which a radical initiator such as an organic peroxide or an azo compound is blended into an ethylenically unsaturated monomer mixture and heated, and a method in which a photosensitizer is blended and exposed to ultraviolet light Radical copolymerization can be carried out by irradiation with electron beams, radiation, etc. Examples of radical initiators used in this case include five-organic peroxides such as benzoyl peroxide, diisopropyl peroxide, tertiary butyl peroxypiperate, and lauroyl peroxide, and azoyl peroxides such as azoisobutyronitrile. compounds, photosensitizers such as benzophenone, benzoin ethyl ether, benzyl, acetophenone, anthraquinone,
Radical initiators such as sulfurized products such as diphenyl sulfite and thiocarbamate can be used. The amount of radical initiator used is 0.0 parts per 100 parts of the monomer mixture.
It ranges from 1 to 20 parts, more preferably from 0.01 to 10 parts.
不発明の単量体温付物のラジカル共重合方法は、大気中
もしくは不活性ガス中で、10〜150℃の温度で行う
のが好ましい。The method of radical copolymerization of monomers of the present invention is preferably carried out at a temperature of 10 to 150° C. in the atmosphere or in an inert gas.
本発明の特色をなす単量体はジエチレン性不飽和単量体
を含むものであるから、生成重合体は架橋していて、融
解を伴う手段によって底形することはできない。従って
、重合は所謂「注型重合」によって行なって、生成重合
体を板状あるいは塊状で得ることが好まし騒といえる。Since the monomers that characterize the present invention include diethylenically unsaturated monomers, the resulting polymers are crosslinked and cannot be shaped into shapes by means involving melting. Therefore, it is preferable to carry out the polymerization by so-called "cast polymerization" to obtain the resulting polymer in the form of plates or blocks.
以下に実験例を示して本発明をより具体的に説明する。 The present invention will be explained in more detail with reference to experimental examples below.
以下の実験例中の部は重量部qbFi重量基準である。Parts in the following experimental examples are based on parts by weight qbFi.
また実施例において得られた樹脂の諸物性は、下記の試
験法により測定した。Further, various physical properties of the resins obtained in the Examples were measured by the following test methods.
(1) 光透過率二分光光度計にて500部mの光透
過率を測定
(2)複屈折 :偏光顕微鏡にて測定
(3)飽和吸水″a:60℃で水中に浸漬した時の飽和
吸水率
(4)弾性率 :ダイナミックメカニカルアナリシス(
DMA)によって側足
(50℃における貯蔵弾性率)
(5) 耐熱性 :同上、損失弾性率のピーク温度製
造例
攪拌装置、温度計、窒素導入管、水分離器を備えた30
0−四ツ目フラスコ内にテトラシクロドデカンメタノー
ル0.27モル(52部)メタクリル酸帆39モル(3
4部)トルエン(75部)p−トルエンスルホン酸−水
和物(2,5部)及び銅粉(0,02部)を同時に仕込
み、窒素ガス雰囲気下、反応温度90〜120℃で2時
間反応させた。(1) Light transmittance: Measure the light transmittance of 500 parts m with a two-spectrophotometer (2) Birefringence: Measure with a polarizing microscope (3) Saturation water absorption"a: Saturation when immersed in water at 60°C Water absorption rate (4) Elastic modulus: Dynamic mechanical analysis (
DMA) by side legs (storage modulus at 50°C) (5) Heat resistance: Same as above, peak temperature of loss modulus Production example 30 equipped with a stirrer, thermometer, nitrogen inlet tube, and water separator
In a 0-4-eye flask, add 0.27 moles (52 parts) of tetracyclododecane methanol and 39 moles (3 parts) of methacrylic acid.
4 parts) Toluene (75 parts), p-toluenesulfonic acid hydrate (2.5 parts) and copper powder (0.02 parts) were simultaneously charged, and the reaction temperature was 90 to 120°C for 2 hours under a nitrogen gas atmosphere. Made it react.
反応終了後、冷却し過剰の酸を炭酸カリウム水溶液で中
和し、更に有機層を純水で3回洗浄し、エバポレーター
でトルエンを留去して目的物のメタクリレート67部を
得た。After the reaction was completed, the mixture was cooled and the excess acid was neutralized with an aqueous potassium carbonate solution.The organic layer was further washed with pure water three times, and the toluene was distilled off using an evaporator to obtain 67 parts of the target methacrylate.
実施例1
製造例で得た単量体20部に対し、PCPDDM・MA
80ftB、ベンゾイルパーオキサイド(0,5部)1
−ヒドロキシシクロへキシルフェニルケトン(チバガイ
ギー社商品名I rgacure 184 ) (0,
3部)を加え均一に加熱攪拌混会し、ガラス板とシリコ
ーンゴムのスペーサーで構成された型の中に注入して紫
外11!ilt照射した後、150℃で2時間保持して
重合を行い、型より取り出し硬化物を得た。硬化物の物
性測定結果を表−1に示す。Example 1 PCPDDM/MA was added to 20 parts of the monomer obtained in the production example.
80ftB, benzoyl peroxide (0.5 parts) 1
-Hydroxycyclohexylphenylketone (Ciba Geigy's product name Irgacure 184) (0,
3 parts) was added, heated and stirred evenly, and poured into a mold made of a glass plate and a silicone rubber spacer. After the ilt irradiation, it was held at 150° C. for 2 hours to perform polymerization, and then taken out from the mold to obtain a cured product. Table 1 shows the physical property measurement results of the cured product.
実施例2
実施例1において製造例で得な単量体40部PCPDD
M−MA 60部を用いた以外は全く同様にして硬化物
を得た。硬化物の物性測定結果を表−1に示す。Example 2 40 parts of monomer obtained in the production example in Example 1 PCPDD
A cured product was obtained in exactly the same manner except that 60 parts of M-MA was used. Table 1 shows the physical property measurement results of the cured product.
実施例3
実施例1においてPCPDDM−MA 80部の代りに
TCDDM−MA80部全用いた以外は全く同様にして
硬化物を得た。硬化物の物性測定結果を表−1に示す。Example 3 A cured product was obtained in exactly the same manner as in Example 1 except that all 80 parts of TCDDM-MA was used instead of 80 parts of PCPDDM-MA. Table 1 shows the physical property measurement results of the cured product.
実施例4
実施例2において製造例で得た単量体40部とTCDD
M−MA60部を用いた以外は全く同様にして硬化物を
得た。硬化物の物性測定結果を表−1に示す。Example 4 40 parts of the monomer obtained in the production example in Example 2 and TCDD
A cured product was obtained in exactly the same manner except that 60 parts of M-MA was used. Table 1 shows the physical property measurement results of the cured product.
比較例1〜4
実施例1において、単量体として各々PCPDDNI・
MA 100部(比較例1)、TCDDM−MA 10
0体80部とPCPDDM−MA 20部(比較例2)
及び製造例で得た単量体80部とTCDDM−MA 2
0部(比較例3)を用いた以外は全く同様にして硬化物
を得た。硬化物の物性測定結果を表−1に示す。Comparative Examples 1 to 4 In Example 1, each monomer was PCPDDNI.
MA 100 parts (Comparative Example 1), TCDDM-MA 10
0 body and 20 parts of PCPDDM-MA (Comparative Example 2)
and 80 parts of the monomer obtained in the production example and TCDDM-MA 2
A cured product was obtained in exactly the same manner except that 0 part (Comparative Example 3) was used. Table 1 shows the physical property measurement results of the cured product.
(以下余白)(Margin below)
Claims (1)
学材料用樹脂において、該エチレン性不飽和単量体がト
リシクロデカンジメタノール及び/又はペンタシクロペ
ンタデカンジメタノール1モルに対してアクリル酸及び
メタクリル酸2モルの混合物をエステル化して得られる
ジ(メタ)アクリレート混合物50〜99重量%と下式
(1)で示される(メタ)アクリレート1〜50重量%
からなることを特徴とする光学材料用樹脂。 ▲数式、化学式、表等があります▼(1) (式中、R_1は▲数式、化学式、表等があります▼又
は▲数式、化学式、表等があります▼、 R_2はH又はCH_3基を示す。)[Scope of Claim] A resin for optical materials comprising a radical polymer of an ethylenically unsaturated monomer, in which the ethylenically unsaturated monomer is added to 1 mole of tricyclodecane dimethanol and/or pentacyclopentadecane dimethanol. 50 to 99% by weight of a di(meth)acrylate mixture obtained by esterifying a mixture of 2 moles of acrylic acid and methacrylic acid and 1 to 50% by weight of a (meth)acrylate represented by the following formula (1)
A resin for optical materials characterized by comprising: ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (1) (In the formula, R_1 is ▲There are mathematical formulas, chemical formulas, tables, etc.▼ or ▲There are mathematical formulas, chemical formulas, tables, etc.▼, R_2 indicates H or CH_3 group. )
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32786887A JPH01168712A (en) | 1987-12-24 | 1987-12-24 | Resin for optical material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32786887A JPH01168712A (en) | 1987-12-24 | 1987-12-24 | Resin for optical material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01168712A true JPH01168712A (en) | 1989-07-04 |
Family
ID=18203872
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32786887A Pending JPH01168712A (en) | 1987-12-24 | 1987-12-24 | Resin for optical material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01168712A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10265645A (en) * | 1997-03-24 | 1998-10-06 | Murata Mfg Co Ltd | Curable resin composition |
WO2011030792A1 (en) | 2009-09-08 | 2011-03-17 | Jx日鉱日石エネルギー株式会社 | Vinyl ether compound, vinyl ether polymer, and method for producing vinyl ether compound |
JP2011057593A (en) * | 2009-09-08 | 2011-03-24 | Jx Nippon Oil & Energy Corp | Vinyl ether compound, and method for producing the same |
JP2011057801A (en) * | 2009-09-08 | 2011-03-24 | Jx Nippon Oil & Energy Corp | Vinyl ether polymer |
-
1987
- 1987-12-24 JP JP32786887A patent/JPH01168712A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10265645A (en) * | 1997-03-24 | 1998-10-06 | Murata Mfg Co Ltd | Curable resin composition |
WO2011030792A1 (en) | 2009-09-08 | 2011-03-17 | Jx日鉱日石エネルギー株式会社 | Vinyl ether compound, vinyl ether polymer, and method for producing vinyl ether compound |
JP2011057593A (en) * | 2009-09-08 | 2011-03-24 | Jx Nippon Oil & Energy Corp | Vinyl ether compound, and method for producing the same |
JP2011057801A (en) * | 2009-09-08 | 2011-03-24 | Jx Nippon Oil & Energy Corp | Vinyl ether polymer |
US8410234B2 (en) | 2009-09-08 | 2013-04-02 | Jx Nippon Oil & Energy Corporation | Vinyl ether compound, vinyl ether polymer, and method for producing vinyl ether compound |
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