JPH0262553U - - Google Patents
Info
- Publication number
- JPH0262553U JPH0262553U JP14100288U JP14100288U JPH0262553U JP H0262553 U JPH0262553 U JP H0262553U JP 14100288 U JP14100288 U JP 14100288U JP 14100288 U JP14100288 U JP 14100288U JP H0262553 U JPH0262553 U JP H0262553U
- Authority
- JP
- Japan
- Prior art keywords
- light
- workpiece
- lamp
- processing chamber
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010586 diagram Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第1図は、本考案の実施例である光処理装置の
概略説明図、第2図は、光拡散板を使用した場合
と使用しない場合の照度分布を比較データとして
示した図で、そのうち同図イは、光拡散板を使用
しない場合の照度分布を示す図、同図ロは、光拡
散板を使用した場合の照度分布を示す図である。
図中、1……ランプ、2……平板状ミラー、1
4……第一の処理室側壁、5……第二の処理室側
壁、A……処理室のガスフロー領域、B……処理
室の処理領域、4……光拡散板、12……光透過
板、13……透光性多孔板、15……ガス導入孔
、6……処理ステージ、W……被処理物としての
レジストが塗布された半導体ウエハ、9……排気
孔。
Fig. 1 is a schematic explanatory diagram of a light processing device that is an embodiment of the present invention, and Fig. 2 is a diagram showing comparative data of illuminance distribution with and without a light diffusing plate. Figure A is a diagram showing the illuminance distribution when the light diffusing plate is not used, and Figure B is a diagram showing the illuminance distribution when the light diffusing plate is used. In the figure, 1... lamp, 2... flat mirror, 1
4... First processing chamber side wall, 5... Second processing chamber side wall, A... Gas flow area of the processing chamber, B... Processing area of the processing chamber, 4... Light diffusion plate, 12... Light Transmissive plate, 13...Transparent porous plate, 15...Gas introduction hole, 6...Processing stage, W...Semiconductor wafer coated with resist as processing object, 9...Exhaust hole.
Claims (1)
理される被処理物が配置される処理室を有する光
処理装置において、前記ランプと被処理物の間に
光拡散板が被処理物を覆うように設けられたこと
を特徴とする光処理装置。 In a light processing apparatus having a rod-shaped lamp and a processing chamber in which a workpiece to be processed by light from the lamp is placed, a light diffusing plate is provided between the lamp and the workpiece so as to cover the workpiece. A light processing device characterized by being provided.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14100288U JPH0262553U (en) | 1988-10-31 | 1988-10-31 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14100288U JPH0262553U (en) | 1988-10-31 | 1988-10-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0262553U true JPH0262553U (en) | 1990-05-10 |
Family
ID=31405682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14100288U Pending JPH0262553U (en) | 1988-10-31 | 1988-10-31 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0262553U (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6236666A (en) * | 1985-08-10 | 1987-02-17 | Fujitsu Ltd | Ashing method |
JPS63271933A (en) * | 1987-04-28 | 1988-11-09 | Tokyo Electron Ltd | Ashing method |
-
1988
- 1988-10-31 JP JP14100288U patent/JPH0262553U/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6236666A (en) * | 1985-08-10 | 1987-02-17 | Fujitsu Ltd | Ashing method |
JPS63271933A (en) * | 1987-04-28 | 1988-11-09 | Tokyo Electron Ltd | Ashing method |
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