JPH0262553U - - Google Patents

Info

Publication number
JPH0262553U
JPH0262553U JP14100288U JP14100288U JPH0262553U JP H0262553 U JPH0262553 U JP H0262553U JP 14100288 U JP14100288 U JP 14100288U JP 14100288 U JP14100288 U JP 14100288U JP H0262553 U JPH0262553 U JP H0262553U
Authority
JP
Japan
Prior art keywords
light
workpiece
lamp
processing chamber
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14100288U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14100288U priority Critical patent/JPH0262553U/ja
Publication of JPH0262553U publication Critical patent/JPH0262553U/ja
Pending legal-status Critical Current

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Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本考案の実施例である光処理装置の
概略説明図、第2図は、光拡散板を使用した場合
と使用しない場合の照度分布を比較データとして
示した図で、そのうち同図イは、光拡散板を使用
しない場合の照度分布を示す図、同図ロは、光拡
散板を使用した場合の照度分布を示す図である。 図中、1……ランプ、2……平板状ミラー、1
4……第一の処理室側壁、5……第二の処理室側
壁、A……処理室のガスフロー領域、B……処理
室の処理領域、4……光拡散板、12……光透過
板、13……透光性多孔板、15……ガス導入孔
、6……処理ステージ、W……被処理物としての
レジストが塗布された半導体ウエハ、9……排気
孔。
Fig. 1 is a schematic explanatory diagram of a light processing device that is an embodiment of the present invention, and Fig. 2 is a diagram showing comparative data of illuminance distribution with and without a light diffusing plate. Figure A is a diagram showing the illuminance distribution when the light diffusing plate is not used, and Figure B is a diagram showing the illuminance distribution when the light diffusing plate is used. In the figure, 1... lamp, 2... flat mirror, 1
4... First processing chamber side wall, 5... Second processing chamber side wall, A... Gas flow area of the processing chamber, B... Processing area of the processing chamber, 4... Light diffusion plate, 12... Light Transmissive plate, 13...Transparent porous plate, 15...Gas introduction hole, 6...Processing stage, W...Semiconductor wafer coated with resist as processing object, 9...Exhaust hole.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 棒状のランプと、このランプからの光により処
理される被処理物が配置される処理室を有する光
処理装置において、前記ランプと被処理物の間に
光拡散板が被処理物を覆うように設けられたこと
を特徴とする光処理装置。
In a light processing apparatus having a rod-shaped lamp and a processing chamber in which a workpiece to be processed by light from the lamp is placed, a light diffusing plate is provided between the lamp and the workpiece so as to cover the workpiece. A light processing device characterized by being provided.
JP14100288U 1988-10-31 1988-10-31 Pending JPH0262553U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14100288U JPH0262553U (en) 1988-10-31 1988-10-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14100288U JPH0262553U (en) 1988-10-31 1988-10-31

Publications (1)

Publication Number Publication Date
JPH0262553U true JPH0262553U (en) 1990-05-10

Family

ID=31405682

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14100288U Pending JPH0262553U (en) 1988-10-31 1988-10-31

Country Status (1)

Country Link
JP (1) JPH0262553U (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6236666A (en) * 1985-08-10 1987-02-17 Fujitsu Ltd Ashing method
JPS63271933A (en) * 1987-04-28 1988-11-09 Tokyo Electron Ltd Ashing method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6236666A (en) * 1985-08-10 1987-02-17 Fujitsu Ltd Ashing method
JPS63271933A (en) * 1987-04-28 1988-11-09 Tokyo Electron Ltd Ashing method

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