JPH0261092A - Peeling apparatus for plating equipment - Google Patents
Peeling apparatus for plating equipmentInfo
- Publication number
- JPH0261092A JPH0261092A JP21082188A JP21082188A JPH0261092A JP H0261092 A JPH0261092 A JP H0261092A JP 21082188 A JP21082188 A JP 21082188A JP 21082188 A JP21082188 A JP 21082188A JP H0261092 A JPH0261092 A JP H0261092A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- plating
- wire
- peeling
- stripping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title claims abstract description 47
- 230000007246 mechanism Effects 0.000 claims abstract description 9
- 229910000679 solder Inorganic materials 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 14
- 238000005406 washing Methods 0.000 claims description 14
- 230000008569 process Effects 0.000 claims description 13
- 238000005192 partition Methods 0.000 claims description 4
- 238000005554 pickling Methods 0.000 claims description 3
- 238000000465 moulding Methods 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- 238000012423 maintenance Methods 0.000 abstract description 4
- 230000008439 repair process Effects 0.000 abstract description 3
- 230000001174 ascending effect Effects 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000012545 processing Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 2
- 101100165177 Caenorhabditis elegans bath-15 gene Proteins 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明はメッキ装置に組合わせて用いる剥離装置に関
するものであり、はんだメッキ装置に用いるはんだの剥
離装置として好適なものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a stripping device used in combination with a plating device, and is suitable as a solder stripping device used in a solder plating device.
〔従来の技術]
電気メッキ装置では、メッキを施す対象物にカソード電
流を流さねばならず、この−手段としてワイヤを採用し
メッキ槽中で水平方向にカソード用のエンドレスワイヤ
の移動路を形成し、対象物を縦形状態にしてこのエンド
レスワイヤに接触させつつメッキ槽中を移動させその間
にメッキ処理を施す技術を本出願人は先に提案した。(
特開昭63−33599号公報参照)。[Prior Art] In an electroplating apparatus, a cathode current must be passed through the object to be plated, and a wire is used as a means for this purpose to form an endless path for the cathode wire to move horizontally in the plating tank. The applicant has previously proposed a technique in which the object is moved in a plating tank in a vertical state while being brought into contact with the endless wire, and the plating process is performed during that time. (
(See Japanese Patent Application Laid-open No. 63-33599).
[発明が解決しようとする課題]
上記のような従来技術では、カソード用のエンドレスワ
イヤにメッキがどうしても着いてしまうため、エンドレ
スワイヤの付着物(金属)をエンドレスワイヤから剥離
しないとカソード電流を対象物に流し難くなる。そこで
メッキ装置に剥離装置を組合わせエンドレスワイヤを通
しながら上記付着物を剥離することが考えられる。しか
し、剥離装置は剥離工程に応じた複数の処理槽を独立的
に設けねばならず各独立槽にエンドレスワイヤを通すに
しても単に挿通状態にして通すことは無理がある。更に
、ワイヤを「エンドレスワイヤ」として使用するので、
エンドレスワイヤの保守管理のためには、必要時剥離装
置よりエンドレスワイヤを外さねばならない。[Problem to be solved by the invention] In the above-mentioned conventional technology, since plating inevitably adheres to the endless wire for the cathode, if the deposits (metal) on the endless wire are not peeled off from the endless wire, the cathode current cannot be affected. It becomes difficult to flush things. Therefore, it is conceivable to combine a peeling device with a plating device and peel off the deposits while passing an endless wire through the plating device. However, the stripping device must be provided with a plurality of processing tanks that correspond to the stripping process independently, and even if the endless wire were to be passed through each independent tank, it would be impossible to simply pass the endless wire through the individual tanks. Furthermore, since the wire is used as an "endless wire",
In order to maintain and manage the endless wire, it is necessary to remove the endless wire from the stripping device when necessary.
そこでこの発明では、エンドレスワイヤの付着物を除去
するために剥離槽を用いるが、エンドレスワイヤを懸回
するホイール群の一部を剥離槽とはいわば独立させて剥
離槽内へ臨ませ且つ剥離槽に上下機構を組合わせてエン
ドレスワイヤの保守管理に必要な時には上記のホイール
群の一部はそのままに剥離槽全体を下降させてホイール
群の一部ごとそこへ懸回されているエンドレスワイヤの
一部を外部へ露出させ得るようにした。Therefore, in this invention, a stripping tank is used to remove the deposits from the endless wire, but a part of the wheel group around which the endless wire is suspended is made independent of the stripping tank and faces into the stripping tank. When necessary for maintenance and management of the endless wire, a part of the wheel group is lowered as a whole and a part of the endless wire suspended there is removed. part can be exposed to the outside.
そして、複数の独立槽を連設する剥離槽にあって各独立
槽の入側・出側と内部とにホイールを口nませることに
より、エンドレスワイヤが各独立槽に対し出たり入った
りする状態にして、剥離工程に対応せしめることにした
。In a stripping tank where multiple independent tanks are arranged in series, wheels are installed at the inlet and outlet sides and inside of each independent tank, allowing the endless wire to move in and out of each independent tank. We decided to make it compatible with the peeling process.
エンドレスワイヤはメッキ槽内を移動しつつ接触してい
る対象物にカソード電流を施して対象物のメッキ処理を
し、次いでメッキ槽より出たエンドレスワイヤの部分は
ホイール群に懸回されている如くに剥離槽の各独立槽へ
入側より案内されて内部に入り込み次いで出側よ、り出
て次工程の独立槽へ入り内部を通って出側より出ること
を繰返しその間にエンドレスワイヤの付着物(金属)は
剥離され剥離の済んだ部分が再びメッキ槽内へと案内さ
れてゆき、かかる処理がエンドレスワイヤの懸回・移動
に合わせ順次且つ連続的に行われる。The endless wire moves through the plating tank and applies cathode current to the objects it comes in contact with, plating the objects, and then the part of the endless wire that comes out of the plating tank is suspended around a group of wheels. It is guided into each independent tank of the stripping tank from the inlet side, enters the inside, then comes out from the outlet side, enters the independent tank of the next process, passes through the inside, and exits from the outlet side. During this process, endless wire deposits are removed. The (metal) is peeled off, and the peeled portion is guided into the plating tank again, and this process is performed sequentially and continuously in accordance with the hanging and movement of the endless wire.
そしてエンドレスワイヤを保守管理のために手入れした
い場合上下機構を介して剥離槽全体を下降させれば、剥
離槽内に臨まされていたホイール群はその位置に残され
たまま剥離槽だけが下降してしまうので、ホイール群と
そこに懸回されているエンドレスワイヤの部分とが外部
に全く露呈された状態となる。そこで適宜エンドレスワ
イヤの手入れを施し再び剥離槽全体を上下機構にて復帰
上昇せしめて元の状態とし、メッキ槽に続いて剥離槽へ
とエンドレスワイヤを移動させて常に付着物を剥離済み
としたいわば新しいエンドレスワイヤでメッキ槽中の対
象物にメッキ処理を施してゆく。If you wish to perform maintenance on the endless wire, you can lower the entire stripping tank using the up-and-down mechanism, and only the stripping tank will be lowered, leaving the wheels facing the stripping tank in the same position. As a result, the wheel group and the portion of the endless wire suspended therein are completely exposed to the outside. Therefore, after taking appropriate care of the endless wire, the entire stripping tank was returned to its original state using the vertical mechanism, and the endless wire was moved to the stripping tank following the plating tank, so that the deposits were always peeled off. The new endless wire is used to plate the objects in the plating bath.
図面を参照して次に実施例を説明する。第1図はrメッ
キ装置Jとしてのはんだメッキ装置1と、「メッキ槽j
としてのはんだメッキ槽2とを示している。はんだメッ
キ装置1の全体を工程順に述べれば、3がロード部で「
対象物jとしての樹脂モールド後のICリードフレーム
(以下フレーム)4を前処理工程部5へ逐次供給する。Next, embodiments will be described with reference to the drawings. Figure 1 shows a solder plating device 1 as r plating device J and a plating tank
A solder plating tank 2 is shown. If we describe the entire solder plating equipment 1 in order of process, 3 is the load section.
An IC lead frame (hereinafter referred to as a frame) 4 after resin molding as a target object j is sequentially supplied to a pretreatment process section 5.
前処理工程部5は、電解脱脂部6、水洗部7、酸化膜除
去部8、水洗部9、化学研磨部10、水洗部11、活性
化部12、水洗部13、酸洗部14の各工程順に処理槽
が連設されており、これら各工程の処理槽内を、フレー
ム4は水平状態で移動させられてゆく。そしてはんだメ
ッキ槽2内はフレーム4が縦形の状態で移動するように
してあり、且つそこに水平方向で移動路16を形成して
いるエンドレスワイヤ17の上に乗るような状態でエン
ドレスワイヤと接触するようにしである。はんだメッキ
槽15の次には、後処理工程部18として回収部19、
水洗部20、中和部21、水洗部22、水洗部23、温
純水洗部24.25脱水部26、エアブロ一部27、そ
して乾燥部28の各工程順に処理槽が連設されており、
最後に処理済みのフレーム4をラインより取出すアンロ
ード部29がある。The pretreatment process section 5 includes an electrolytic degreasing section 6, a water washing section 7, an oxide film removal section 8, a water washing section 9, a chemical polishing section 10, a water washing section 11, an activation section 12, a water washing section 13, and a pickling section 14. Processing tanks are arranged in series in the order of the steps, and the frame 4 is moved horizontally in the processing tanks of each of these steps. The frame 4 is arranged to move vertically in the solder plating tank 2, and comes into contact with the endless wire 17 in such a way as to ride on the endless wire 17 forming a horizontal movement path 16. That's what I do. Next to the solder plating tank 15, there is a recovery section 19 as a post-processing section 18,
Processing tanks are successively arranged in the order of each process: a water washing section 20, a neutralization section 21, a water washing section 22, a water washing section 23, a warm pure water washing section 24, 25, a dehydration section 26, an air blow section 27, and a drying section 28.
Finally, there is an unloading section 29 that takes out the processed frames 4 from the line.
このようなはんだメッキ装置lに対し、〔直接的にはは
んだメンキ槽2にたいし、〕剥離槽30が付設されてい
る。剥離槽30は水洗、剥離、水洗そして酸洗の順で処
理を行うための独立槽31.32.33.34が連設さ
れている。A stripping tank 30 is attached to such a solder plating apparatus 1 (in contrast to the solder coating tank 2 directly). The stripping tank 30 is connected with independent tanks 31, 32, 33, and 34 for carrying out processing in the order of water washing, stripping, water washing, and pickling.
エンドレスワイヤ17を懸回するホイール群35は、先
ずはんだメ・ンキ槽15内で「往路」を形成させるため
の一対の第1ホイール36、同じ(「復路」を形成させ
る一対の第2ホイール37、次にはんだメッキ槽15と
剥離槽30間に3ケ所配置させた中間ホイール38.3
9.40.ff1l離槽30の内部即ち水洗用独立槽3
1の内部ホイール41、仕切壁42上の上部ホイール4
3、剥離用独立槽32の一対の内部ホイール44、仕切
壁45上の上部ホイール46、水洗用独立槽33の内部
ホイール47、仕切壁48上の上部ホイール49、そし
て酸洗用独立槽34の内部ホイール50とから構成され
ている。ホイール群35を構成するこれらの各ホイール
には種々の機能が付与されている。即ち、一対の第1ボ
イール36はカソード用の電極ホイールとされ、中間ホ
イール3日は駆動ホイールとされてチェーン51を介し
て一方の第2ホイール37及び上部ホイール43に接続
されている。又他の中間ホイール39.40は張力付与
ホイールとされ、ホイール群35よりエンドレスワイヤ
17を外したり又は懸けたりする場合に位置を大きく変
えるようにしである。更に内部ホイール41.47は剥
離処理用の電極ホイールとしである。The wheel group 35 that suspends the endless wire 17 consists of a pair of first wheels 36 for forming an "outward path" in the soldering bath 15, and a pair of second wheels 37 for forming the "return path". Next, intermediate wheels 38.3 are placed at three locations between the solder plating tank 15 and the stripping tank 30.
9.40. Inside of the ff1l separation tank 30, that is, the independent tank 3 for water washing
1 inner wheel 41, upper wheel 4 on the partition wall 42
3. A pair of inner wheels 44 of the independent peeling tank 32, an upper wheel 46 on the partition wall 45, an inner wheel 47 of the independent water washing tank 33, an upper wheel 49 on the partition wall 48, and It consists of an internal wheel 50. Each of these wheels constituting the wheel group 35 is provided with various functions. That is, the pair of first boilers 36 are used as electrode wheels for the cathode, and the middle wheel 3 is used as a drive wheel and is connected to one of the second wheels 37 and the upper wheel 43 via a chain 51. The other intermediate wheels 39 and 40 are used as tensioning wheels, and are designed to change their position significantly when the endless wire 17 is removed from or hung from the wheel group 35. Furthermore, the inner wheels 41, 47 serve as electrode wheels for the stripping process.
そして各独立槽31.32.33.34の入側・出側位
置に配された上部ホイール43.46.49と内部位置
に配された内部ホイール41.44.47.50とは、
剥離槽30に対して別途独立的に設けられている。The upper wheels 43.46.49 placed at the entrance and exit positions of each independent tank 31.32.33.34 and the internal wheels 41.44.47.50 placed at the inside positions are as follows:
It is provided separately and independently from the peeling tank 30.
次に剥離槽30に組合わせる上下機構52について述べ
る剥離槽30の縁部53にネジ孔54が設けてあり、こ
のネジ孔54にボールネジ55が挿通されている。ボー
ルネジ55の上下両端は軸受56で支持され下方に設け
たチェーンホイール57そこへ懸回したチェーン58、
駆動ホイール59、この駆動ホイール59に接続のモー
タ60等で回転駆動系61を形成している。62は一対
のガイドバーであり、剥離槽30のガイド63に係合し
てその「下降」と「復帰上昇」を案内する。Next, the vertical mechanism 52 combined with the peeling tank 30 will be described.A screw hole 54 is provided in the edge 53 of the peeling tank 30, and a ball screw 55 is inserted into the screw hole 54. Both upper and lower ends of the ball screw 55 are supported by bearings 56, and a chain 58 is suspended from a chain wheel 57 provided below.
A rotation drive system 61 is formed by a drive wheel 59, a motor 60 connected to the drive wheel 59, and the like. A pair of guide bars 62 engage with the guide 63 of the peeling tank 30 to guide its "downward" and "return-up".
ボールネジ55とガイドバー62は、剥離槽30の両側
に対をなして設けられておりモータ60の作動により駆
動ホイール59、チェーン58チェーンホイール57杏
介し両側のボールネジ55を同時に回転せしめ剥離槽3
0はネジ孔54を介しボールネジ55の回転を受けると
下降又は復帰上昇する。そして、剥離槽30が最下降位
置に至ると、元の位置に残されたままの上部ホイール4
3.46.49、内部ホイール41.44.47.50
はそこに懸回したエンドレスワイヤ17の部分ごと外部
に対して露呈されてしまう。そこで中間ホイール39.
40の位置を変えればホイール群35に対するエンドレ
スワイヤ17の取外しと懸回とを容易に行うことができ
る。A ball screw 55 and a guide bar 62 are provided as a pair on both sides of the peeling tank 30, and when the motor 60 is operated, the ball screws 55 on both sides are simultaneously rotated through a drive wheel 59, a chain 58, and a chain wheel 57.
0 is rotated by the ball screw 55 through the screw hole 54 and then lowered or returned to the upper position. When the peeling tank 30 reaches the lowest position, the upper wheel 4 remains in its original position.
3.46.49, internal wheel 41.44.47.50
The entire portion of the endless wire 17 suspended therein is exposed to the outside. Therefore, the intermediate wheel 39.
By changing the position of 40, the endless wire 17 can be easily removed and hung from the wheel group 35.
この発明に係るメッキ装置用の剥離装置は以上説明して
来た如き内容のものなので、メッキ槽でカソードとして
利用しているエンドレスワイヤに付着物(金属)が付い
ても常に剥離槽で迅速にエンドレスワイヤより剥離して
しまうので対象物にカソード電流を常に効率よく流せる
ことは勿論のこと、!、す離槽内にエンドレスワイヤを
通すに当って各独立槽の入側・出側と内部とに配したホ
イール群によって剥離処理に合わせ支障なく各独立槽へ
導入してはそこより導出でき、しかもエンドレスワイヤ
を懸回するホイール群の内、剥離装置に組合わせるホイ
ールを、剥離槽とは別途独立的に設けるようにしたので
上下機構を介し剥離槽を下降・復帰上昇させるのにホイ
ールが支障とはならず、又剥離槽の下降時、ホイールご
とそこに懸回されているエンドレスワイヤを外部に露呈
できるのでエンドレスワイヤの修理の交換その他の保守
管理がやり易いという多くの効果がある。Since the stripping device for plating equipment according to the present invention has the content as described above, even if there is deposits (metal) on the endless wire used as a cathode in the plating tank, it can always be quickly removed in the stripping tank. Of course, since it peels off from the endless wire, cathode current can always be efficiently passed through the target object! When passing the endless wire through the separation tank, a group of wheels are placed on the inlet and outlet sides and inside of each independent tank so that it can be introduced into and taken out from each independent tank without any trouble in accordance with the removal process. Moreover, among the wheel group that suspends the endless wire, the wheel that is combined with the stripping device is installed separately from the stripping tank, so the wheel becomes an obstacle when lowering and returning to raising the stripping tank via the vertical mechanism. Moreover, when the peeling tank is lowered, the endless wire suspended therewith together with the wheel can be exposed to the outside, which has many advantages such as making repair, replacement, and other maintenance of the endless wire easier.
第1図は、メッキ装置としてのはんだメッキ装置の全体
を示す概略側面図、
第2図は、ホイール群に対するエンドレスワイヤの懸回
状態と剥離槽とを示す概略側面図。
第3図は第2図に示したエンドレスワイヤと剥離槽の概
略斜視図、
そして第4図は剥離槽に対する上下機構の組合わせ状態
を示す部分拡大斜視図である。
l・・・メッキ装置(はんだメッキ装置)2・・・メン
キ槽(はんだメンキ槽)
4・・・対象物(フレーム)
17・・・エンドレスワイヤ
30・・・剥離槽
35・・・ホイール群
52・・・上下機構
61・・・回転駆動系FIG. 1 is a schematic side view showing the entire solder plating apparatus as a plating apparatus, and FIG. 2 is a schematic side view showing a state in which endless wires are suspended around a wheel group and a stripping tank. FIG. 3 is a schematic perspective view of the endless wire and peeling tank shown in FIG. 2, and FIG. 4 is a partially enlarged perspective view showing the combination of the vertical mechanism with respect to the peeling tank. l... Plating equipment (solder plating equipment) 2... Solder coating tank (solder coating tank) 4... Target object (frame) 17... Endless wire 30... Peeling tank 35... Wheel group 52 ... Vertical mechanism 61 ... Rotation drive system
Claims (5)
ワイヤの移動路を形成し、このエンドレスワイヤに接触
しつつメッキ槽内を移動する対象物にメッキを施すよう
にしたメッキ装置用の剥離装置であって、 剥離工程に応じた複数の独立槽を連設させた剥離槽を有
し、上記エンドレスワイヤを懸回させたホィール群の一
部を各独立槽の入側・出側と内部とへ剥離槽とは別途独
立して臨ませ、 各独立槽の内部に臨ませたホィール群の一部を外側へ露
呈せしめるべく剥離槽全体を下降・復帰上昇自在とする
上下機構を、剥離槽へ布設して成るメッキ装置用の剥離
装置。(1) A stripping device for a plating machine that forms a moving path for an endless cathode wire in the plating tank in the horizontal direction, and applies plating to an object that moves within the plating tank while contacting the endless wire. The peeling tank has a plurality of independent tanks arranged in series according to the peeling process, and a part of the wheel group around which the endless wire is suspended is connected to the inlet and outlet sides and the inside of each independent tank. A vertical mechanism is installed in the peeling tank, which is placed separately from the peeling tank, and allows the entire peeling tank to be lowered and raised to expose a part of the wheel group facing the inside of each independent tank to the outside. Peeling device for plating equipment that is installed.
だメッキ装置であり、対象物が樹脂モールド後のICリ
ードフレームである、請求項1記載のメッキ装置用の剥
離装置。(2) The peeling device for a plating device according to claim 1, wherein the plating tank is a solder plating tank, the plating device is a solder plating device, and the object is an IC lead frame after resin molding.
て、水洗、剥離、水洗、酸洗等の複数の独立槽を連設し
たものである、請求項1又は2記載のメッキ装置用の剥
離装置。(3) The stripping tank for a plating apparatus according to claim 1 or 2, wherein the stripping tank is a plurality of independent tanks for washing, stripping, washing, pickling, etc., arranged in series from the input side to the output side of the endless wire. Device.
に配した複数のホィールが、ホィール群の一部を構成す
るものである、請求項3記載のメッキ装置用の剥離装置
。(4) The stripping device for a plating apparatus according to claim 3, wherein the plurality of wheels arranged inside each independent tank and above the partition wall between each independent tank constitute a part of a wheel group. Device.
されている複数のボールネジと、これらボールネジを回
転させる回転駆動系と、剥離槽の下降・復帰上昇を案内
する複数のガイドバーとから構成される、請求項1乃至
4のいずれかに記載のメッキ装置用の剥離装置。(5) The vertical mechanism includes a plurality of ball screws inserted into screw holes provided at the edge of the peeling tank, a rotation drive system that rotates these ball screws, and a plurality of guides that guide the descent and return rise of the peeling tank. A stripping device for a plating device according to any one of claims 1 to 4, comprising a bar.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21082188A JPH07122159B2 (en) | 1988-08-26 | 1988-08-26 | Stripping device for plating equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21082188A JPH07122159B2 (en) | 1988-08-26 | 1988-08-26 | Stripping device for plating equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0261092A true JPH0261092A (en) | 1990-03-01 |
JPH07122159B2 JPH07122159B2 (en) | 1995-12-25 |
Family
ID=16595679
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21082188A Expired - Lifetime JPH07122159B2 (en) | 1988-08-26 | 1988-08-26 | Stripping device for plating equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07122159B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105648510A (en) * | 2016-04-11 | 2016-06-08 | 天津市津南区晟北电镀厂 | Hanging rack for electroplating |
-
1988
- 1988-08-26 JP JP21082188A patent/JPH07122159B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105648510A (en) * | 2016-04-11 | 2016-06-08 | 天津市津南区晟北电镀厂 | Hanging rack for electroplating |
Also Published As
Publication number | Publication date |
---|---|
JPH07122159B2 (en) | 1995-12-25 |
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