JPH0252816B2 - - Google Patents
Info
- Publication number
- JPH0252816B2 JPH0252816B2 JP57125730A JP12573082A JPH0252816B2 JP H0252816 B2 JPH0252816 B2 JP H0252816B2 JP 57125730 A JP57125730 A JP 57125730A JP 12573082 A JP12573082 A JP 12573082A JP H0252816 B2 JPH0252816 B2 JP H0252816B2
- Authority
- JP
- Japan
- Prior art keywords
- slab
- brush
- light
- receiving end
- radiation thermometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005855 radiation Effects 0.000 claims description 18
- 239000003595 mist Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 3
- 206010047555 Visual field defect Diseases 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 238000009749 continuous casting Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/05—Means for preventing contamination of the components of the optical system; Means for preventing obstruction of the radiation path
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/0205—Mechanical elements; Supports for optical elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/0255—Sample holders for pyrometry; Cleaning of sample
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0818—Waveguides
Description
【発明の詳細な説明】
この発明は、高温鋳片の温度測定装置に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a temperature measuring device for hot slabs.
従来、連続鋳造機によつて鋳造された高温鋳片
の表面温度は、放射温度計によつて測定してい
た。 Conventionally, the surface temperature of a high-temperature slab cast by a continuous casting machine has been measured using a radiation thermometer.
しかし、鋳片表面にはパウダーやスケール等が
付着していること、および、鋳片に冷却水が接触
した際に生じる水蒸気や、ミストスプレー冷却に
よつて鋳片を冷却した場合には、エアミストが鋳
片周囲の雰囲気中に存在すること、さらに、外部
からの散乱光や鋳片表面からの反射光が存在する
こと等の理由によつて、鋳片から放射される真の
熱放射の測定が困難であつた。 However, powder, scale, etc. adhere to the surface of the slab, and water vapor generated when cooling water comes into contact with the slab, or air mist when the slab is cooled by mist spray cooling. The true thermal radiation emitted from the slab is measured due to the presence of heat radiation in the atmosphere around the slab, as well as the presence of scattered light from the outside and reflected light from the slab surface. was difficult.
上述の問題点のうちスケール等の付着による問
題点は、放射温度計で測定する鋳片表面を予めグ
ラインダやカツタ等で削つたり、またはシヨツト
ブラスト法の如き研摩手段により研摩すれば解決
できるが、鋳片表面に広範囲に傷が付き表面性状
が悪化するとともに、狭いロール間隔にグライン
ダ、カツタまたはシヨツトブラスト装置等を設置
することは困難である。しかも、これらの方法は
外部雰囲気や散乱光や鋳片表面からの反射光に対
しては全く無力である。 Among the above-mentioned problems, problems caused by adhesion of scale, etc. can be solved by grinding the surface of the slab to be measured with a radiation thermometer with a grinder, cutter, etc., or by polishing it with a polishing method such as shot blasting. However, the surface of the slab is damaged over a wide range, resulting in poor surface quality, and it is difficult to install a grinder, cutter, shot blasting device, etc. in a narrow space between the rolls. Moreover, these methods are completely powerless against the external atmosphere, scattered light, and reflected light from the surface of the slab.
この発明は、上述のような問題点を解決するた
めになされたものであつて、放射温度計の受光端
にブラシを取付け、前記ブラシを前記受光端を中
心として回転可能にしてなることに特徴を有す
る。 This invention has been made to solve the above-mentioned problems, and is characterized in that a brush is attached to the light-receiving end of a radiation thermometer, and the brush is rotatable around the light-receiving end. has.
この発明を実施例により図面を参照しながら説
明する。 The present invention will be described by way of examples with reference to the drawings.
第1図は、この発明の一実施例の温度測定装置
の使用態様を示す斜視図、第2図は、第1図の部
分斜視図である。 FIG. 1 is a perspective view showing how a temperature measuring device according to an embodiment of the present invention is used, and FIG. 2 is a partial perspective view of FIG. 1.
第1図および第2図において、1は放射温度
計、2は放射温度計1に固定された導光管、3は
導光管2の下半部外周に同心円状に押付バネ4を
介して取付けられた回転軸、5は回転軸3の下端
に固定されたブラシである。ブラシ5には、導光
管2の受光端2′を囲むように多数の針金5′が植
設されている。6は回転軸3の上部に固定された
長尺のギヤ、そして、7はギヤ6を回転させる、
放射温度計1に取付金具8を介して固定された駆
動機構である。駆動機構7はギヤ6と噛合う駆動
ギヤ9と、駆動ギヤ9に取付けられたモータ10
とから構成されている。 In FIGS. 1 and 2, 1 is a radiation thermometer, 2 is a light guide tube fixed to the radiation thermometer 1, and 3 is a concentric pressure spring 4 that presses on the outer periphery of the lower half of the light guide tube 2. The attached rotating shaft 5 is a brush fixed to the lower end of the rotating shaft 3. A large number of wires 5' are embedded in the brush 5 so as to surround the light receiving end 2' of the light guide tube 2. 6 is a long gear fixed to the upper part of the rotating shaft 3, and 7 rotates the gear 6.
This is a drive mechanism fixed to the radiation thermometer 1 via a mounting bracket 8. The drive mechanism 7 includes a drive gear 9 that meshes with the gear 6, and a motor 10 attached to the drive gear 9.
It is composed of.
次に、上記構成からなる温度測定装置の使用態
様について説明する。 Next, the manner of use of the temperature measuring device having the above configuration will be explained.
温度測定装置を鋳片11のロール12間に、昇
降自在な架台(図示せず)を介して垂直に固定す
る。ロール12間を鋳片11が通過し始めたら、
駆動機構7によりブラシ5を回転させながらブラ
シ5が鋳片11の表面に接触するまで前記装置を
下降させる。これによつて、鋳片11の表面に付
着しているスケール等はブラシ5により剥離除去
される。ブラシ5の回転中、ブラシ5は常に押付
バネ2によつて鋳片11の表面に一定圧力で押付
けられるのでブラシ5は常に鋳片11の形状に追
従しながら回転する。この際、ブラシ5が回転中
に上下動してもギヤ6の長さが長いので、ギヤ6
が駆動ギヤ9から外れる虞れはない。 A temperature measuring device is vertically fixed between the rolls 12 of the slab 11 via a movable frame (not shown). When the slab 11 begins to pass between the rolls 12,
While rotating the brush 5 by the drive mechanism 7, the device is lowered until the brush 5 comes into contact with the surface of the slab 11. As a result, scale and the like adhering to the surface of the slab 11 are peeled off and removed by the brush 5. While the brush 5 is rotating, the brush 5 is always pressed against the surface of the slab 11 by the pressing spring 2 with a constant pressure, so the brush 5 always rotates while following the shape of the slab 11. At this time, even if the brush 5 moves up and down during rotation, the length of the gear 6 is long, so the gear 6
There is no risk that the gear will come off from the drive gear 9.
ブラシ5が回転すると、鋳片11の表面に付着
しているスケール等が除去されるので、スケール
等により影響されない鋳片11からの熱放射が受
光端2′から放射温度計1内に取り込まれる。 When the brush 5 rotates, scale etc. adhering to the surface of the slab 11 are removed, so heat radiation from the slab 11 that is not affected by scale etc. is taken into the radiation thermometer 1 from the light receiving end 2'. .
さらに、ブラシ5が回転すると、受光端2′の
周囲が遮へいされるので、冷却水やミストは全て
遮断されると共に、外部からの散乱光や鋳片表面
からの反射光等も全て遮断され、鋳片11からの
熱放射のみが受光端2′に入射する。 Furthermore, when the brush 5 rotates, the area around the light-receiving end 2' is shielded, so all cooling water and mist are blocked, and all scattered light from the outside and reflected light from the surface of the slab are also blocked. Only the thermal radiation from the slab 11 enters the light receiving end 2'.
外部からの散乱光等の遮断効果は、ブラシ5の
針金の本数を増加させるだけでなく、針金をいく
重にも配列することによつてより一層期待でき
る。 The effect of blocking scattered light from the outside can be further expected not only by increasing the number of wires in the brush 5 but also by arranging the wires in multiple layers.
さらに、放射温度計1や駆動機構7はロール1
2から離れた場所に設置することができるので、
ロール間隔が狭くても温度測定装置を容易に設置
することができる。 Furthermore, the radiation thermometer 1 and the drive mechanism 7 are connected to the roll 1.
Since it can be installed in a location away from 2,
Even if the roll spacing is narrow, the temperature measuring device can be easily installed.
次に、この発明の光学系について第3図を参照
しながら説明する。 Next, the optical system of the present invention will be explained with reference to FIG.
放射温度計1の受光レンズに入射する鋳片表面
からの光は、受光端2′(内径d)から導光管2
を伝わつてくる。放射温度計を用いる温度測定で
は、この光学系に視野欠けが生じると測定誤差の
原因となるので、視野欠けを回避する必要があ
る。その具体例を説明する。 The light from the slab surface that enters the light receiving lens of the radiation thermometer 1 is transmitted from the light receiving end 2' (inner diameter d) to the light guide tube 2.
It's transmitted to me. In temperature measurement using a radiation thermometer, a lack of field of view in the optical system causes measurement errors, so it is necessary to avoid the lack of field of view. A specific example will be explained.
受光レンズ径D2=9mm、焦点距離l=600mm、
焦点面直径D1=9mm、受光端2′の内径d=14.3
mmとした場合、導光管2の長さLを次式により求
められる長さLnax以下にすれば、視野欠けを回避
できる。 Receiving lens diameter D 2 = 9mm, focal length l = 600mm,
Focal plane diameter D 1 = 9 mm, inner diameter d of light receiving end 2' = 14.3
mm, visual field defects can be avoided by making the length L of the light guide tube 2 equal to or less than the length L nax determined by the following equation.
Lnax=l/2+d/D1×l/2=776mm
従つて、導光管2の長さLを例えば、700mmと
した場合には、導光管2による視野欠けは全く生
じない。 L nax = l/2 + d/D 1 × l/2 = 776 mm Therefore, when the length L of the light guide tube 2 is set to 700 mm, for example, no visual field loss due to the light guide tube 2 occurs.
一方、ブラシ5も視野欠けが生じないような径
にする必要がある。具体的には、ブラシ5の長さ
L′=25mmとすると、鋳片11の表面での視野直径
πは、
π=(L−l/2)+L′/l/2・D1
で表わされ、L=700mmの場合には、
π=12.8mm
となる。従つて、ブラシ径を例えば、40mm程度と
した場合は、ブラシによる視野欠けは全く生じな
い。 On the other hand, the brush 5 also needs to have a diameter that does not cause visual field defects. Specifically, the length of brush 5
When L' = 25 mm, the field of view diameter π at the surface of the slab 11 is expressed as π = (L - l/2) + L' / l / 2 · D 1 , and when L = 700 mm, π=12.8mm. Therefore, when the diameter of the brush is set to about 40 mm, for example, no visual field loss occurs due to the brush.
以上説明したように、この発明によれば、鋳片
表面にスケール等が付着していても、これを完全
に除去でき、水蒸気やミストが鋳片周囲の雰囲気
に存在していても、さらに、散乱光や鋳片表面か
らの反射光が存在していても、これらを完全に受
光端から遮断できるので、鋳片表面からの真の熱
放射を測定することができる。この結果、鋳片の
表面温度を正確に測定することができるといつた
きわめて有用な効果がもたらされる。 As explained above, according to the present invention, even if scale or the like is attached to the surface of the slab, it can be completely removed, and even if water vapor or mist is present in the atmosphere around the slab, it can be completely removed. Even if there is scattered light or reflected light from the surface of the slab, these can be completely blocked from the light receiving end, making it possible to measure the true heat radiation from the surface of the slab. As a result, extremely useful effects such as being able to accurately measure the surface temperature of the slab are brought about.
第1図は、この発明の一実施例による使用態様
を示す斜視図、第2図は、第1図の部分斜視図、
第3図は、光学系の説明図である。図面におい
て、
1……放射温度計、2……導光管、3……回転
軸、4……押付バネ、5……ブラシ、6……ギ
ヤ、7……駆動機構、8……取付板、9……駆動
ギヤ、10……モータ、11……鋳片、12……
ロール。
FIG. 1 is a perspective view showing a mode of use according to an embodiment of the present invention, FIG. 2 is a partial perspective view of FIG. 1,
FIG. 3 is an explanatory diagram of the optical system. In the drawings, 1... Radiation thermometer, 2... Light guide tube, 3... Rotating shaft, 4... Pressing spring, 5... Brush, 6... Gear, 7... Drive mechanism, 8... Mounting plate. , 9... Drive gear, 10... Motor, 11... Slab, 12...
roll.
Claims (1)
前記ブラシを前記受光端を中心として回転可能と
し、前記ブラシを回転させることによつて鋳片表
面に付着しているスケール等を除去するととも
に、前記受光端を遮へいし、かくして鋳片からの
真の熱放射のみを前記受光端から取り込むことを
特徴とする、高温鋳片の温度測定装置。1 A brush is attached to the light receiving end of the radiation thermometer,
The brush is rotatable around the light-receiving end, and by rotating the brush, scale and the like adhering to the surface of the slab are removed, and the light-receiving end is shielded. A device for measuring the temperature of a high-temperature slab, characterized in that only heat radiation from the light receiving end is taken in from the light receiving end.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57125730A JPS5917118A (en) | 1982-07-21 | 1982-07-21 | Apparatus for measuring temperature of high temperature billet |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57125730A JPS5917118A (en) | 1982-07-21 | 1982-07-21 | Apparatus for measuring temperature of high temperature billet |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5917118A JPS5917118A (en) | 1984-01-28 |
JPH0252816B2 true JPH0252816B2 (en) | 1990-11-14 |
Family
ID=14917359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57125730A Granted JPS5917118A (en) | 1982-07-21 | 1982-07-21 | Apparatus for measuring temperature of high temperature billet |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5917118A (en) |
-
1982
- 1982-07-21 JP JP57125730A patent/JPS5917118A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5917118A (en) | 1984-01-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5081796A (en) | Method and apparatus for mechanical planarization and endpoint detection of a semiconductor wafer | |
USRE34425E (en) | Method and apparatus for mechanical planarization and endpoint detection of a semiconductor wafer | |
JPH0752032A (en) | Wafer polishing method and device therefor | |
KR101638584B1 (en) | Method for evaluating silica glass crucible, method for producing silicon single crystals | |
US20050054268A1 (en) | Methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control | |
PT100448A (en) | PROCESS AND APPROVAL DEVICE OF AN OPTICAL PYROMETER AND CORRESPONDING CALIBRATION PLATES | |
US4619681A (en) | Method and apparatus for measurement of stress in float glass | |
EP0121617A1 (en) | Method and apparatus for measuring wear in the lining of refractory furnaces | |
JP4587431B2 (en) | Method for manufacturing fluorescent plate and method for manufacturing radiation detection apparatus | |
JPH0252816B2 (en) | ||
JPS5599034A (en) | Optical transducer for detecting temperature | |
TW432452B (en) | Detection of wafer fragments in a wafer processing apparatus | |
JP2001144059A (en) | Method of manufacturing semiconductor device | |
JPH0813340B2 (en) | Optical nondestructive inspection method for quartz crucible and its equipment | |
US3527097A (en) | Temperature measurement system for rotary kilns | |
EP0011896B1 (en) | Apparatus for checking the operation of a plurality of liquid sprays, especially for use in a continuous casting apparatus | |
JPH0743331B2 (en) | Detector | |
JPS6242325Y2 (en) | ||
JP3508747B2 (en) | Polishing pad and wafer polishing apparatus | |
JPS5763408A (en) | Flatness detector | |
BE903288A (en) | APPARATUS FOR MEASURING SURFACE CONTAMINATION BY THE FROTTIS METHOD | |
JP3427833B2 (en) | Monitor device and polishing device | |
JPH02240925A (en) | Polishing apparatus for wafer | |
JPS56122906A (en) | Measuring method for surface flatness of magnetic recording medium | |
JPH0419494Y2 (en) |